CN103949075A - Gasification reaction device - Google Patents

Gasification reaction device Download PDF

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Publication number
CN103949075A
CN103949075A CN201410177528.6A CN201410177528A CN103949075A CN 103949075 A CN103949075 A CN 103949075A CN 201410177528 A CN201410177528 A CN 201410177528A CN 103949075 A CN103949075 A CN 103949075A
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CN
China
Prior art keywords
gasification
sheet
gasification sheet
pore
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410177528.6A
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Chinese (zh)
Inventor
郭远军
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Individual
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Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201410177528.6A priority Critical patent/CN103949075A/en
Publication of CN103949075A publication Critical patent/CN103949075A/en
Pending legal-status Critical Current

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Abstract

The invention belongs to a gasification reaction device. The gasification reaction device comprises a pressure shell, a gasification sheet, air holes and an atomizer, wherein the gasification sheet is arranged on the pressure shell, the air holes are formed in the gasification sheet in an array manner, and the atomizer is arranged at an air inlet end of the pressure shell. Compared with the prior art, the gasification reaction device has the advantages of high gasification speed, simple structure, low production cost, long service life and convenience in maintenance; and working medium gas generated due to gasification is high in air pressure.

Description

A kind of gasification reactor apparatus
Technical field
The invention belongs to heating and gasifying device field, especially liquid organic working medium is gasificated into the gasification reactor apparatus of gaseous state.
Background technology
Thermal energy transfer is undertaken by organic working medium (heat-conducting medium) conventionally, and organic working medium has the characteristic of low boiling, high pressure, is used in organic Rankine circulation and replaces water vapour, in evaporimeter, gasify, and the acting of expanding in steam turbine; If the evaporimeter of introducing in CN201310674641.0 is to increase sheet fin (fin) heat absorption of gasifying in heat pipe, be applied in refrigerator and freeze, but also exist gasification rate slow, the gas pressure after gasification is not high.
Summary of the invention
The object of the invention is to solve prior art slow to organic working medium gasification rate, the technical problem that the gas atmosphere after gasification is not high, provide a kind of simple in structure, can Quick-gasifying organic working medium, produce the gasification reactor apparatus of gases at high pressure.
The technical solution used in the present invention is, a kind of gasification reactor apparatus comprises pressure vessel, gasification sheet, pore, atomizer, and gasification sheet is arranged on pressure vessel, and on gasification sheet, array is provided with pore, and pressure vessel inlet end is provided with atomizer.
Further, in described pressure vessel, be provided with at least one deck gasification sheet.
Further, described gasification sheet gap distribution.
Further, the gasification sheet clearance distance of described gap distribution is 1-15mm.
Further, the pore on the gasification sheet of described gap distribution is interspersed.
Further, in pressure vessel, be provided with the gasification sheet that three lamellar spacings distribute; The gasification sheet clearance distance that described three lamellar spacings distribute is 1-15mm.
Further, described pore opening setting is that the pore on last layer gasification sheet is the hole diameter half on adjacent lower one deck gasification sheet.
Further, above-mentioned pressure vessel gap arranges three layers of gasification sheet.
Further, the pore on described ground floor gasification sheet is the hole diameter half on second layer gasification sheet; Pore on second layer gasification sheet is the 3rd layer of hole diameter half on gasification sheet.
Further, the hole diameter on described ground floor gasification sheet is 1-10mm; Hole diameter on described second layer gasification sheet is 2-20mm; Hole diameter on described the 3rd layer of gasification sheet is 4-40mm.
Further, the thickness of described gasification sheet is 0.15-15mm.
Further, the pressure vessel outlet side opening of the last one deck of described gasification sheet below.
Further, described gasification sheet is provided with heat pipe, and heat pipe becomes S type to distribute or array is distributed on gasification sheet.
Further, described gasification sheet is that metal heat-conducting material is made; Described pressure vessel is that metal heat-conducting material is made.
Organic working medium is by the atomizer atomization on pressure vessel inlet end, enter into ground floor gasification sheet, heat energy makes the organic working medium Quick-gasifying of atomization by pressure vessel and gasification sheet, atomization gas and gaseous state organic working medium enter into second layer gasification sheet and continue gasification, form to enter into the 3rd layer of gasification sheet after certain air pressure and continue gasification supercharging and get rid of.Because the hole diameter of three layers of ground floors to the increases step by step, gaseous state organic working medium speed of expansion is accelerated step by step, and air pressure increases gradually.
It is fast that the present invention compared with prior art has gasification rate, simple in structure, and production cost is low, and long service life is convenient to safeguard, the Working medium gas air pressure that gasification produces is large.
Brief description of the drawings
Fig. 1 is cutaway view of the present invention;
Fig. 2 is the present invention's chip architecture schematic diagram that gasifies;
Fig. 3 is the gas cell distribution figure on ground floor gasification sheet of the present invention and second layer gasification sheet;
Fig. 4 is heat pipe distribution map of the present invention;
Fig. 5 is heat pipe distribution map of the present invention;
1. pressure vessels 2. sheet 3. pore 4. atomizer 5. heat pipe 6. control valves that gasify in figure.
Detailed description of the invention
With reference to accompanying drawing, describe embodiments of the present invention in detail.
Embodiment 1
A kind of gasification reactor apparatus, comprises pressure vessel 1, gasification sheet 2, pore 3, atomizer 4, and gasification sheet 2 is arranged on pressure vessel 1, and on gasification sheet 2, array is provided with 3, three layers of gasification sheet 2 gap of pore and is arranged on pressure vessel 1, and pressure vessel 1 inlet end is provided with atomizer 4; In pressure vessel 1, be provided with the gasification sheet 2 that three lamellar spacings distribute; Gasification sheet 2 clearance distances that three lamellar spacings distribute are 1mm; Pore on ground floor gasification sheet 2 is the hole diameter half on second layer gasification sheet 2; Pore on second layer gasification sheet 2 is the 3rd layer of hole diameter half on gasification sheet 2; Hole diameter on ground floor gasification sheet 2-1 is 1mm; Hole diameter on second layer gasification sheet 2-2 is 2mm; Hole diameter on the 3rd layer of gasification sheet 2-3 is 4mm; Gasification sheet 2 thickness are 0.25mm.
Embodiment 2
Gasification sheet 2 clearance distances that in above-described embodiment 1, three lamellar spacings distribute are 1.5mm; Pore on ground floor gasification sheet 2 is the hole diameter half on second layer gasification sheet 2; Pore on second layer gasification sheet 2 is the 3rd layer of hole diameter half on gasification sheet 2; Hole diameter on ground floor gasification sheet 2-1 is 1mm; Hole diameter on second layer gasification sheet 2-2 is 2mm; Hole diameter on the 3rd layer of gasification sheet 2-3 is 4mm; Gasification sheet 2 thickness are 0.25mm.
Embodiment 3
Gasification sheet 2 clearance distances that in above-described embodiment 1 or 2, three lamellar spacings distribute are 2mm; Pore on ground floor gasification sheet 2 is the hole diameter half on second layer gasification sheet 2; Pore on second layer gasification sheet 2 is the 3rd layer of hole diameter half on gasification sheet 2; Hole diameter on ground floor gasification sheet 2-1 is 1.5mm; Hole diameter on second layer gasification sheet 2-2 is 3mm; Hole diameter on the 3rd layer of gasification sheet 2-3 is 6mm; Gasification sheet 2 thickness are 0.5mm; Gasification sheet 2 is provided with heat pipe 5; Gasification sheet 2 is sheets that gold, silver, copper or alloy are made; Pressure vessel 2 is that the stainless steel of compression resistance is made.
Embodiment 4
Gasification sheet 2 clearance distances that in above-described embodiment 3, three lamellar spacings distribute are 2.5mm; Pore on ground floor gasification sheet 2 is the hole diameter half on second layer gasification sheet 2; Pore on second layer gasification sheet 2 is the 3rd layer of hole diameter half on gasification sheet 2; Hole diameter on ground floor gasification sheet 2-1 is 2mm; Hole diameter on second layer gasification sheet 2-2 is 4mm; Hole diameter on the 3rd layer of gasification sheet 2-3 is 8mm; Gasification sheet 2 thickness are 1mm.
Embodiment 5
Above-mentioned gasification reactor apparatus, the interior one deck gasification sheet 2 that arranges of pressure vessel 1, pore 3 diameters are 10mm, and gasification sheet 2 is 15mm with atomizer 4 gaps, and gasification sheet 2 thickness are 5mm or 10mm or 15mm.
Embodiment 6
Above-mentioned gasification reactor apparatus, is provided with in pressure vessel 1 and is greater than the gasification sheet 2 that three lamellar spacings distribute; Gasification sheet 2 thickness are 0.15mm; Gasification sheet 2 clearance distances are 3.5mm.

Claims (10)

1. a gasification reactor apparatus, comprises pressure vessel, gasification sheet, pore, atomizer, and gasification sheet is arranged on pressure vessel, and on gasification sheet, array is provided with pore, and pressure vessel inlet end is provided with atomizer.
2. gasification reactor apparatus as claimed in claim 1, is characterized in that, is provided with at least one deck gasification sheet in described pressure vessel; Described gasification sheet gap distribution.
3. gasification reactor apparatus as claimed in claim 2, is characterized in that, the gasification sheet clearance distance of described gap distribution is 1-15mm.
4. gasification reactor apparatus as described in claim 2 or 3, is characterized in that, the pore on the gasification sheet of described gap distribution is interspersed.
5. gasification reactor apparatus as claimed in claim 4, is characterized in that, described pore opening setting is that the pore on last layer gasification sheet is the hole diameter half on adjacent lower one deck gasification sheet.
6. gasification reactor apparatus as claimed in claim 5, is characterized in that, on described pressure vessel, gap arranges three layers of gasification sheet.
7. gasification reactor apparatus as claimed in claim 6, is characterized in that, the pore on described ground floor gasification sheet is the hole diameter half on second layer gasification sheet; Pore on second layer gasification sheet is the 3rd layer of hole diameter half on gasification sheet.
8. gasification reactor apparatus as claimed in claim 6, is characterized in that, the hole diameter on described ground floor gasification sheet is 1-10mm; Hole diameter on described second layer gasification sheet is 2-20mm; Hole diameter on described the 3rd layer of gasification sheet is 4-40mm.
9. gasification reactor apparatus as claimed in claim 8, is characterized in that, the thickness of described gasification sheet is 0.15-15mm.
10. gasification reactor apparatus as claimed in claim 9, is characterized in that, the pressure vessel outlet side opening of the last one deck of described gasification sheet below; Described gasification sheet is provided with heat pipe, and heat pipe becomes S type to distribute or array is distributed on gasification sheet; Described gasification sheet is that metal heat-conducting material is made; Described pressure vessel is that metal heat-conducting material is made.
CN201410177528.6A 2014-04-30 2014-04-30 Gasification reaction device Pending CN103949075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410177528.6A CN103949075A (en) 2014-04-30 2014-04-30 Gasification reaction device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410177528.6A CN103949075A (en) 2014-04-30 2014-04-30 Gasification reaction device

Publications (1)

Publication Number Publication Date
CN103949075A true CN103949075A (en) 2014-07-30

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410177528.6A Pending CN103949075A (en) 2014-04-30 2014-04-30 Gasification reaction device

Country Status (1)

Country Link
CN (1) CN103949075A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2179777Y (en) * 1994-02-01 1994-10-19 莫钊 Evaporator with honeycomb
CN201101899Y (en) * 2007-09-10 2008-08-20 河南润恒生物能源有限公司 Film evaporimeter
CN202083099U (en) * 2011-04-19 2011-12-21 沈阳工程学院 S-shaped electric hot plate type gas electric heating device
CN203886206U (en) * 2014-04-30 2014-10-22 郭远军 Gasification reactor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2179777Y (en) * 1994-02-01 1994-10-19 莫钊 Evaporator with honeycomb
CN201101899Y (en) * 2007-09-10 2008-08-20 河南润恒生物能源有限公司 Film evaporimeter
CN202083099U (en) * 2011-04-19 2011-12-21 沈阳工程学院 S-shaped electric hot plate type gas electric heating device
CN203886206U (en) * 2014-04-30 2014-10-22 郭远军 Gasification reactor

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Application publication date: 20140730