CN103941316A - Polarization-insensitive high-index-of-refraction metamaterial and preparation method thereof - Google Patents
Polarization-insensitive high-index-of-refraction metamaterial and preparation method thereof Download PDFInfo
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- CN103941316A CN103941316A CN201410102833.9A CN201410102833A CN103941316A CN 103941316 A CN103941316 A CN 103941316A CN 201410102833 A CN201410102833 A CN 201410102833A CN 103941316 A CN103941316 A CN 103941316A
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Abstract
The invention provides a material extremely high in index of refraction. The main body of the material is a metamaterial. The structural unit of the metamaterial comprises a medium material and two H-shaped metal materials embedded into the medium material and perpendicularly and symmetrically arranged. Structural units are periodically arrayed on a plane to form a single-layer two-dimensional metamaterial, and three two-dimensional metamaterial layers are stacked together to constitute a metamaterial extremely high in index of refraction. Specific steps of the manufacturing method of the material extremely high in index of refraction can be seen from the main body. By means of the material extremely high in index of refraction, multi-frequency response is achieved, wherein the structure has the high index of refraction property under two frequency conditions, but an existing material only has the high index of refraction under one frequency condition; isotropy is achieved, wherein the wide frequency and the high index of refraction of the material are maintained, the structure truly has the isotropy; the material is convenient to use, wherein the material is good in rigidity and easy to bend, and limitations in actual use are reduced.
Description
Technical field
The present invention relates to optical material, relate in particular to superelevation refraction materials and preparation method thereof.
Background technology
The refractive index of nature material be mostly one very little on the occasion of, only have some few semiconductors and insulator can in infrared and far infrared band there is high index of refraction.
The refractive index peak of the super material of existing high index of refraction is lower, and response frequency domain scope is narrower.Meanwhile polarisation of light direction is fairly obvious on the impact of its performance.
At present, people also in the budding stage, just had correlation theory to be suggested in 2009 for the research of high-index material.Known according to Maxwell equation, the refractive index of material is determined by its (relatively) specific inductive capacity and magnetic permeability.Therefore if increase the refractive index of material, top priority will improve ε and μ exactly as much as possible, and particularly, for super material, its (relatively) specific inductive capacity and magnetic permeability are electric capacity and the inductance that depends on its metal and dielectric structure.Therefore for design high-index material, top priority is exactly to realize large capacitor cell structure.Secondly also need to suppress diamagnetic effect.The design of high-index material theory and proposition, have very deep meaning to the development of imaging and photoetching.As shown in Figure 1, utilize the filled media of high-index material as 200 places, can increase microscope numerical aperture (NA=n*sin α), thereby greatly increase microscopical resolution.In figure, 100 is object lens, and 300 is objective table.
The current super material of superelevation refractive index is difficult to have the character of isotropy, high index of refraction peak value and wide response frequency domain simultaneously.In the time of the change of polarized direction of incident light, the super material of two kinds shown in Fig. 2 has all kept metastable refractive index curve, but the super material of cellular structure can only reach the peak value of refractive index in an extremely narrow scope, can not realize broadband high index of refraction, and although the super material of window structure has kept the stable of wide frequency domain refractive index, but its refractive index peak is less one times than the refractive index peak of the super material of cellular structure, it also cannot reach a broadband high index of refraction.
And in the time that super material can keep the high index of refraction compared with broadband simultaneously, it has very large dependence to incident light polarization direction again, as shown in Figure 3, the structure of super material is I shape, can see, when incident light polarization direction turns over 90 while spending, the peak value of its refractive index and its response frequency have very large change, prove that the high index of refraction of the super material of this two dimension has great incident light polarization dependence.
Summary of the invention
The deficiency existing for existing high-index material, in order to improve the peak value of refractive index, widen its response frequency domain simultaneously, and keep isotropy, the design of following high-index material is proposed, real realize " material of wideband, isotropic superelevation refractive index ".
A kind of superelevation refraction materials, its main body is super material, the structural unit of this super material is as follows, it comprises dielectric material and two I shape metal materials, and two I shape metal materials are embedded in dielectric material, and two I shape metal material vertical symmetry arrange, this structural unit is periodically arranged in the plane, form the super material of two dimension of individual layer, three layers of super material stacks of two dimension together, form the super material of superelevation refractive index.
As a further improvement on the present invention, structural unit period p=60 ± 5 micron, thickness H=1 ± 0.05 micron.Illustrate: 60 ± 5 microns represent that plus-minus tolerance is 5 microns, below relates to the meaning that similar expression all represents tolerance.
As a further improvement on the present invention, the lower-upper length of I-shaped metal material equates, is a=59 ± 0.1 micron.
As a further improvement on the present invention, the width of I-shaped metal material is d=8 ± 0.1 micron.
As a further improvement on the present invention, golden as metal material, golden film thickness wd=100 ± 10 nanometer.
As a further improvement on the present invention, polyimide is as dielectric material.
As a further improvement on the present invention, two I shape metal materials are to be respectively embedded in the dielectric material that 250 ± 10nm is thick.
A method for making for superelevation refraction materials, concrete steps are as follows:
Step 1. is the thick polyimide solution of spin coating 250 ± 10nm on clean silicon chip, and it is dried 30 ± 5 minutes under 180 ± 10 DEG C of conditions, makes it to become the substrate with high tenacity;
Step 2. is heated to polyimide layer 350 ± 10 DEG C and carries out slaking in inert gas, makes polyamic acid be transformed into water-fast aromatic polyimide;
Step 3. is cleaned obtaining sample, and then spin coating photoresist, carries out carrying out rear baking after photoetching to it, then developed, and carries out hard baking and process acquisition ground floor I shape pattern after completing;
Step 4. utilizes the way of electron beam vacuum evaporation to plate the golden film of one deck 100 ± 10 nanometer thickness according to gained figure, obtains ground floor I-shaped structure after washing photoresist off;
Step 5., taking the bottom of golden film as benchmark, continues the thick polyimide solution of spin coating 250 ± 10nm, and it is repeated to the oven dry of 1,2 step, slaking operation;
Sample is cleaned rear spin coating photoresist by step 6., again it is carried out to photoetching treatment, the center of the I shape pattern of this photoetching is aimed at the I shape pattern center of photoetching for the first time, after completing, carry out rear baking, developed again, after completing, carry out hard baking and process acquisition second layer I shape pattern;
The way that step 7. recycles electron beam vacuum evaporation plates according to gained figure the golden film that one deck 100 ± 10nm is thick, obtains second layer I-shaped structure after washing photoresist off;
Step 8. continues the polyimide solution that spin coating 300 ± 10nm is thick, repeats the oven dry slaking operation of 1,2 steps, has so just completed the preparation of two-dimentional super material;
Step 9. repeats the preparation process of twice super material of above-mentioned individual layer two dimension, can obtain the super material of three layers, finally these three layers of super materials is peeled off from silicon base, has completed the preparation of high-performance high-index material.
As a further improvement on the present invention, in step 2, in open quartz tube furnace, polyimide layer is heated in inert gas.
The invention has the beneficial effects as follows:
Multifrequency response: this structure all embodies the character of high index of refraction under two frequencies, and existing material can only have high index of refraction under a frequency.
Isotropy: this structure is in having kept material wideband high index of refraction, and real makes it have isotropic character.
Be convenient to application: this toughness of material is good, flexible, has reduced its limitation in actual use.
Brief description of the drawings
Fig. 1 shoots high folding rate material as the filler structural representation between object lens in microscopic system and objective table;
Fig. 2 is real part and the imaginary part spectrogram of the refractive index of two kinds of super materials;
Fig. 3 is the specific inductive capacity of the super material of I shape under two kinds of polarization directions, magnetic permeability, refractive index spectrogram;
Fig. 4 is the schematic three dimensional views of metamaterial structure of the present invention unit;
Fig. 5 is the vertical view of metamaterial structure of the present invention unit;
Fig. 6 x(left side), the y(right side) transmission, reflection, loss spectra under direction polarized light;
Fig. 7 is the refractive index under x direction polarized light;
Fig. 8 is the refractive index under y direction polarized light;
Fig. 9 is three-dimensional super material schematic diagram.
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described.
In this design, utilize the super material with property to realize high capacitance coupling and low magnetic loss to realize high index of refraction.Have special optical character particularly the super material of optics electromagnetic response be generally to be formed by metal Nano structure, the super material of particular design can provide in part very high electroresponse, can reduce the magnetic loss of whole material by suitable design simultaneously.Known according to Maxwell equation, the refractive index of material is to be determined by its (relatively) specific inductive capacity and magnetic permeability,
therefore just realized the high index of refraction of material close to 1 time as the very high and magnetic permeability μ of DIELECTRIC CONSTANT ε.Existing design and test confirm, can reach 5000 in the DIELECTRIC CONSTANT ε of the super material with special nature, and magnetic permeability, close to 1, that is to say that the refractive index of material can reach more than 70 simultaneously.In the present invention, then the structure of super material is integrated, improved its symmetry.Owing to always having corresponding inner structure in material in the time that incident light polarization direction changes, incident light is responded, therefore this specially designed super material can have the character of isotropic, the character of the original wideband high index of refraction of the super material of combination again, so superelevation refraction materials of the present invention, it can meet wideband simultaneously, high index of refraction peak value and isotropic performance requirement.
Specific embodiments is as follows:
The main body of high-performance superelevation refraction materials forms by surpassing material, and as shown in Figure 4, wherein 1 is dielectric material to the structural unit of this super material, and 2 and 3 is I shape metal materials, and they are embedded in dielectric material 1, its structure vertical symmetry.In the present invention, use gold as metal material, because the loss of gold is less at terahertz wave band.Using polyimide (polymide) as dielectric material, polyimide (polymide) is one of high-molecular organic material of current combination property the best, this base polymer has high insulating property, because of its performance and synthetic aspect the outstanding feature " expert who deals with problems that is known as.
This structural unit is carried out to periodicity in the plane and arrange, just formed the super material of two dimension of individual layer, then by three layers of super material stacks of two dimension together, just can obtain the super material of this high-performance superelevation refractive index.
The concrete steps of making this material are as follows:
1. the polyimide solution (PI-2610, HD MicroSystem) that spin coating 250 ± 10nm is thick on clean silicon chip is dried them 30 ± 5 minutes under 180 ± 10 DEG C of conditions, makes it to become the substrate with high tenacity.
2. in open quartz tube furnace, polyimide layer is heated in inert gas to 350 ± 10 DEG C and carries out slaking, make polyamic acid be transformed into water-fast aromatic polyimide.
3. clean obtaining sample, then spin coating photoresist, carries out carrying out rear baking after photoetching to it, then is developed, and carries out hard baking and process acquisition ground floor I shape pattern after completing.
4. utilize the way of electron beam vacuum evaporation to plate according to gained figure the golden film that one deck 100nm is thick.After washing photoresist off, obtain ground floor I-shaped structure.
5. taking the bottom of golden film as benchmark, continue the thick polyimide solution of spin coating 250 ± 10nm, it is repeated to the oven dry of 1,2 step, slaking operation.
6. sample is cleaned to rear spin coating photoresist, again it is carried out to photoetching treatment, the center of the I shape pattern of this photoetching is aimed at the I shape pattern center of photoetching for the first time.After completing, carry out rear baking, then developed, after completing, carry out hard baking and process acquisition second layer I shape pattern.
7. the way of recycling electron beam vacuum evaporation plates according to gained figure the golden film that one deck 100 ± 10nm is thick.After washing photoresist off, obtain second layer I-shaped structure.
8. continue the thick polyimide solution of spin coating 300 ± 10nm, repeat the oven dry slaking operation of 1,2 step.So just complete the preparation of two-dimentional super material.
9. the preparation process that repeats twice super material of above-mentioned individual layer two dimension, can obtain the super material of three layers, finally these three layers of super materials is peeled off from silicon base, has completed the preparation of high-performance high-index material.
The parameter that design adopts is golden film thickness wd=100 ± 10 nanometers, structural unit period p=60 ± 5 micron, thickness H=1 ± 0.05 micron.A=59 ± 0.1 micron, d=8 ± 0.1 micron.The incident light transmission of this structure to two kinds of direction polarizations and reflectance spectrum are as 6.
The resonance frequency of this structure is at 0.35 Terahertz and 0.9 Terahertz, and this is also simultaneously corresponding, and two kinds of structures of material internal are distinguished corresponding resonance wavelength.Further calculate its refractive index and can obtain its index of refraction diagram under two kinds of polarized lights.
The advantage of this structure is as follows:
1. this structure is in having kept material wideband high index of refraction, and real makes it have isotropic character.
2. this structure has two refractive index peak, and can regulate and control resonance location by the structural parameters of adjusting this super material, regulates and controls as required dielectric material thickness and regulates and controls with refractive index peak value simultaneously
3. to have size little for this structure, the advantage of thin thickness, and due to the special nature of dielectric material, this material has good toughness, flexible character simultaneously.
Above content is in conjunction with concrete preferred implementation further description made for the present invention, can not assert that specific embodiment of the invention is confined to these explanations.For general technical staff of the technical field of the invention, without departing from the inventive concept of the premise, can also make some simple deduction or replace, all should be considered as belonging to protection scope of the present invention.
Claims (9)
1. a superelevation refraction materials, it is characterized in that: its main body is super material, the structural unit of this super material is as follows, it comprises dielectric material and two I shape metal materials, and two I shape metal materials are embedded in dielectric material, and two I shape metal material vertical symmetry arrange, this structural unit is periodically arranged in the plane, form the super material of two dimension of individual layer, three layers of super material stacks of two dimension together, form the super material of superelevation refractive index.
2. superelevation refraction materials according to claim 1, is characterized in that: structural unit period p=60 ± 5 micron, thickness H=1 ± 0.05 micron.
3. superelevation refraction materials according to claim 1, is characterized in that: the lower-upper length of I-shaped metal material equates, is a=59 ± 0.1 micron.
4. superelevation refraction materials according to claim 1, is characterized in that: the width of I-shaped metal material is d=8 ± 0.1 micron.
5. superelevation refraction materials according to claim 1, is characterized in that: golden as metal material, and golden film thickness wd=100 ± 10 nanometer.
6. superelevation refraction materials according to claim 1, is characterized in that: polyimide is as dielectric material.
7. superelevation refraction materials according to claim 1, is characterized in that: two I shape metal materials are to be respectively embedded in the dielectric material that 250 ± 10nm is thick.
8. a method for making for superelevation refraction materials, is characterized in that, concrete steps are as follows:
Step 1. is the thick polyimide solution of spin coating 250 ± 10nm on clean silicon chip, and it is dried 30 ± 5 minutes under 180 ± 10 DEG C of conditions, makes it to become the substrate with high tenacity;
Step 2. is heated to polyimide layer 350 ± 10 DEG C and carries out slaking in inert gas, makes polyamic acid be transformed into water-fast aromatic polyimide;
Step 3. is cleaned obtaining sample, and then spin coating photoresist, carries out carrying out rear baking after photoetching to it, then developed, and carries out hard baking and process acquisition ground floor I shape pattern after completing;
Step 4. utilizes the way of electron beam vacuum evaporation to plate the golden film of one deck 100 ± 10 nanometer thickness according to gained figure, obtains ground floor I-shaped structure after washing photoresist off;
Step 5., taking the bottom of golden film as benchmark, continues the thick polyimide solution of spin coating 250 ± 10nm, and it is repeated to the oven dry of 1,2 step, slaking operation;
Sample is cleaned rear spin coating photoresist by step 6., again it is carried out to photoetching treatment, the center of the I shape pattern of this photoetching is aimed at the I shape pattern center of photoetching for the first time, after completing, carry out rear baking, developed again, after completing, carry out hard baking and process acquisition second layer I shape pattern;
The way that step 7. recycles electron beam vacuum evaporation plates according to gained figure the golden film that one deck 100 ± 10nm is thick, obtains second layer I-shaped structure after washing photoresist off;
Step 8. continues the polyimide solution that spin coating 300 ± 10nm is thick, repeats the oven dry slaking operation of 1,2 steps, has so just completed the preparation of two-dimentional super material;
Step 9. repeats the preparation process of twice super material of above-mentioned individual layer two dimension, can obtain the super material of three layers, finally these three layers of super materials is peeled off from silicon base, has completed the preparation of high-performance high-index material.
9. the method for making of superelevation refraction materials according to claim 8, is characterized in that: in step 2, in open quartz tube furnace, polyimide layer is heated in inert gas.
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| CN104749665A (en) * | 2015-04-08 | 2015-07-01 | 哈尔滨工业大学深圳研究生院 | Planar lens unit based on dielectric material, planar lens and preparation method |
| CN109638467A (en) * | 2019-01-24 | 2019-04-16 | 桂林电子科技大学 | A kind of high refractive index Meta Materials of the low dispersion in broadband |
| CN111572127A (en) * | 2020-05-28 | 2020-08-25 | 首都师范大学 | Flexible multilayer film metamaterial preparation and characterization method based on hot pressing process |
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| US20130243693A1 (en) * | 2010-06-17 | 2013-09-19 | Tufts University | Silk optical particles and uses thereof |
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| US20130243693A1 (en) * | 2010-06-17 | 2013-09-19 | Tufts University | Silk optical particles and uses thereof |
| US20130342915A1 (en) * | 2011-02-16 | 2013-12-26 | Bum Ki Min | High-refractive-index metalmaterial |
| CN102800987A (en) * | 2011-06-03 | 2012-11-28 | 深圳光启高等理工研究院 | Metamaterial reflecting mirror |
| CN102809771A (en) * | 2011-06-30 | 2012-12-05 | 深圳光启高等理工研究院 | Microwave grating |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104749665A (en) * | 2015-04-08 | 2015-07-01 | 哈尔滨工业大学深圳研究生院 | Planar lens unit based on dielectric material, planar lens and preparation method |
| CN104749665B (en) * | 2015-04-08 | 2016-08-24 | 哈尔滨工业大学深圳研究生院 | Planar lens unit based on dielectric material, planar lens and preparation method |
| CN109638467A (en) * | 2019-01-24 | 2019-04-16 | 桂林电子科技大学 | A kind of high refractive index Meta Materials of the low dispersion in broadband |
| CN111572127A (en) * | 2020-05-28 | 2020-08-25 | 首都师范大学 | Flexible multilayer film metamaterial preparation and characterization method based on hot pressing process |
| CN111572127B (en) * | 2020-05-28 | 2022-03-01 | 首都师范大学 | Flexible multilayer film metamaterial preparation and characterization method based on hot pressing process |
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