CN103924192A - Preparation method of metallic silver thin film with nanometer microcavity structure - Google Patents
Preparation method of metallic silver thin film with nanometer microcavity structure Download PDFInfo
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- CN103924192A CN103924192A CN201410157241.7A CN201410157241A CN103924192A CN 103924192 A CN103924192 A CN 103924192A CN 201410157241 A CN201410157241 A CN 201410157241A CN 103924192 A CN103924192 A CN 103924192A
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Abstract
The invention relates to a preparation method of a metallic silver thin film with a nanometer microcavity structure. The preparation method comprises the following steps: selecting a metallic silver target and depositing the metallic silver target on a substrate by virtue of a direct current sputtering deposition system, thus obtaining the metallic silver thin film with the nanometer microcavity structure by using ion beam etching. In the method, no other assistant chemical substances are needed, thus new impurities can not be introduced to pollute the microcavity structure of the metallic silver thin film. Compared with other methods, the method in the invention is simple and time-saving; the preparation method in the invention is no-toxic and non-poisonous and can not cause damage to operators.
Description
Technical field
The present invention relates to a kind of making method of nanometer micro-cavity structure, particularly a kind of preparation method of the argent film with nanometer micro-cavity structure.
Background technology
Surface plasma body resonant vibration (Surface Plasmon Resonance, SPR) refer at metal and medium interface place, conduction electron collective resonance in incident field excitating surface metallics, produces the electromagnetic a kind of physical optics phenomenon of surface charge.In the time of the specific refractory power of dielectric surface or thickness generation subtle change, the coupling condition of SPR changes, cause the skew of resonance peak, so the excitation frequency of local surface plasma is relevant to the size and dimension of metallic particles with width, therefore by controlling size and pattern and the structure of metal nanoparticle, can regulate and control its surface plasma body resonant vibration peak position.
At present, conventionally utilize two kinds of methods of micro-nano processing technology and chemosynthesis, prepare metal nanoparticle and nanostructure that various surfaces have complex geometry, regulate and control the position at surface plasma body resonant vibration peak.And these methods have complex manufacturing technology, contaminate environment, cost is higher, is unfavorable for that big area preparation has the shortcoming of the surface plasma body resonant vibration substrate of economic benefit.
Summary of the invention
The present invention be directed to the high problem of complex manufacturing technology, cost of nanometer micro-cavity structure, proposed a kind of preparation method of the argent film with nanometer micro-cavity structure, do not introduce impurity, easy to operate simple.
Technical scheme of the present invention is: a kind of preparation method of the argent film with nanometer micro-cavity structure, specifically comprises the steps:
1) metallic silver target and glass substrate are put into respectively to cleaning device soaking and washing, remove the greasy dirt except metallic silver target and glass substrate surface;
2) substrate is put into d.c. sputtering depositing system, control d.c. sputtering depositing system operating power, spatter time, thin film deposition time in advance, argent is deposited on to glass basic surface uniformly, thereby form the uniform argent film of one deck at glass surface, the silver-colored film having deposited is taken out for subsequent use;
3) argent film is put into ion beam etching system, initialization system electric current, voltage, and after the surperficial angle of ion beam bombardment argent film, bombardment time, bombard, form surface and have the argent film of nanometer micro-cavity structure.
Described ion beam etching system etching electric current is 100～600mA, and acceleration voltage is 100～800V, etching angle 0～80 degree, and duration is 1～20 minute.
Soaking and washing in described step 1) cleaning device, can put into metallic silver target, substrate respectively acetone, dehydrated alcohol, deionized water for ultrasonic machine soaking and washing 1～20min and carry out decontamination.Described step 2) d.c. sputtering depositing system operating power is 50W, spatters in advance duration 1-20min, thin film deposition duration is 10min, and argent is deposited on to substrate surface uniformly.Argent film is put into ion beam etching system by described step 3), and ion beam bombardment angle is 50 degree, and bombarding current is 300mA, and voltage is 400V, and time span is 10min, bombards, and forms the surperficial argent film with nanometer micro-cavity structure.
Beneficial effect of the present invention is: the present invention has the preparation method of the argent film of nanometer micro-cavity structure, without using other assistant chemical material, can not introduce new contaminating impurity silver film microstructure; Compare with other method, easy saving time; Making method of the present invention is nontoxic, can not damage operator.
Brief description of the drawings
Fig. 1 is the X ray diffracting spectrum that the present invention has the argent film of nanometer micro-cavity structure;
Fig. 2 is the optical reflection collection of illustrative plates that the present invention has the argent film of nanometer micro-cavity structure;
Fig. 3 is atomic force microscope (AFM) image of the present invention's argent film with nanometer micro-cavity structure.
Embodiment
Find by research, after ion beam etching modified metal silverskin surface tissue, its surface has special nanometer micro-cavity structure, and this characteristic has determined that metal silverskin all will have significant application value at surface plasma resonance and in realizing monomolecular Raman signal detection.
Material used is that the silver-colored target of purity 99.99% is example, through d.c. sputtering depositing system, is deposited on substrate, utilizes ion beam etching to obtain having the argent film of nanometer micro-cavity structure, and concrete making step is as follows:
1, metallic silver target, substrate are put into respectively to acetone, dehydrated alcohol, deionized water for ultrasonic machine soaking and washing 10min, to remove the impurity such as the greasy dirt of metal targets and glass substrate surface.
2, substrate, silver-colored target are put into d.c. sputtering depositing system, operating power is 50W, spatter in advance duration 1-20min, thin film deposition duration is 10min, argent is deposited on to substrate surface uniformly, thereby form the uniform argent film of one deck high quality at glass surface, the film having deposited is taken out for subsequent use.
3, argent film is put into ion beam etching system, ionic fluid is with 0-80 degree (preferably 50 degree) angle, electric current is 100-600mA (preferably 300mA), voltage is the preferred 400V of 100-800V(), time span is the surface of 1-20min bombardment argent film, forms the surperficial argent film with nanometer micro-cavity structure.
Prepared argent film has nanometer micro-cavity structure, and if Fig. 1 is the X ray diffracting spectrum of argent film, wherein (111), (200), (311) are three crystal faces of metal silverskin; Fig. 2 is the optical reflection collection of illustrative plates of argent film, and it shows that argent film has high reflectivity; Fig. 3 is atomic force microscope (AFM) image of argent film, demonstrates metal silverskin surface and has nanometer micro-cavity structure.
Claims (5)
1. a preparation method with the argent film of nanometer micro-cavity structure, is characterized in that, specifically comprises the steps:
1) metallic silver target and glass substrate are put into respectively to cleaning device soaking and washing, remove the greasy dirt except metallic silver target and glass substrate surface;
2) substrate is put into d.c. sputtering depositing system, control d.c. sputtering depositing system operating power, spatter time, thin film deposition time in advance, argent is deposited on to glass basic surface uniformly, thereby form the uniform argent film of one deck at glass surface, the silver-colored film having deposited is taken out for subsequent use;
3) argent film is put into ion beam etching system, initialization system electric current, voltage, and after the surperficial angle of ion beam bombardment argent film, bombardment time, bombard, form surface and have the argent film of nanometer micro-cavity structure.
2. there is according to claim 1 the preparation method of the argent film of nanometer micro-cavity structure, it is characterized in that, described ion beam etching system etching electric current is 100～600mA, and acceleration voltage is 100～800V, etching angle 0～80 degree, duration is 1～20 minute.
3. there is according to claim 1 the preparation method of the argent film of nanometer micro-cavity structure, it is characterized in that, soaking and washing in described step 1) cleaning device, can put into metallic silver target, substrate respectively acetone, dehydrated alcohol, deionized water for ultrasonic machine soaking and washing 1～20min and carry out decontamination.
4. there is according to claim 3 the preparation method of the argent film of nanometer micro-cavity structure, it is characterized in that described step 2) d.c. sputtering depositing system operating power is 50W, spatters in advance duration 1-20min, thin film deposition duration is 10min, and argent is deposited on to substrate surface uniformly.
5. there is according to claim 4 the preparation method of the argent film of nanometer micro-cavity structure, it is characterized in that, argent film is put into ion beam etching system by described step 3), ion beam bombardment angle is 50 degree, bombarding current is 300mA, and voltage is 400V, and time span is 10min, bombard, form the surperficial argent film with nanometer micro-cavity structure.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410157241.7A CN103924192A (en) | 2014-04-21 | 2014-04-21 | Preparation method of metallic silver thin film with nanometer microcavity structure |
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| CN201410157241.7A CN103924192A (en) | 2014-04-21 | 2014-04-21 | Preparation method of metallic silver thin film with nanometer microcavity structure |
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Cited By (3)
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| CN104294228A (en) * | 2014-11-07 | 2015-01-21 | 上海纳米技术及应用国家工程研究中心有限公司 | Substrate having surface Raman scattering enhancement on glycerol molecules and preparation and application thereof |
| CN104556691A (en) * | 2015-01-16 | 2015-04-29 | 浙江大学 | Optical micro-cavity based on tellurate glass and preparation method of optical micro-cavity |
| CN110819941A (en) * | 2019-11-13 | 2020-02-21 | 上海卫星装备研究所 | Film modification method and system based on auxiliary deposition |
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| CN102092675A (en) * | 2011-01-14 | 2011-06-15 | 中国科学院物理研究所 | Method for preparing self-masking uni-junction multiport three-dimensional nano structure |
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| CN1764596A (en) * | 2003-02-28 | 2006-04-26 | 独立行政法人科学技术振兴机构 | Method for fabricating three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstructure |
| CN102092675A (en) * | 2011-01-14 | 2011-06-15 | 中国科学院物理研究所 | Method for preparing self-masking uni-junction multiport three-dimensional nano structure |
| CN103236395A (en) * | 2011-05-25 | 2013-08-07 | 新加坡科技研究局 | Method of forming nanostructures on a substrate and use of the same |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104294228A (en) * | 2014-11-07 | 2015-01-21 | 上海纳米技术及应用国家工程研究中心有限公司 | Substrate having surface Raman scattering enhancement on glycerol molecules and preparation and application thereof |
| CN104294228B (en) * | 2014-11-07 | 2017-02-15 | 上海纳米技术及应用国家工程研究中心有限公司 | Substrate having surface Raman scattering enhancement on glycerol molecules and preparation and application thereof |
| CN104556691A (en) * | 2015-01-16 | 2015-04-29 | 浙江大学 | Optical micro-cavity based on tellurate glass and preparation method of optical micro-cavity |
| CN110819941A (en) * | 2019-11-13 | 2020-02-21 | 上海卫星装备研究所 | Film modification method and system based on auxiliary deposition |
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Application publication date: 20140716 |