CN103885080B - A kind of detection method to detector and device - Google Patents

A kind of detection method to detector and device Download PDF

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CN103885080B
CN103885080B CN201310637962.3A CN201310637962A CN103885080B CN 103885080 B CN103885080 B CN 103885080B CN 201310637962 A CN201310637962 A CN 201310637962A CN 103885080 B CN103885080 B CN 103885080B
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scatterplot
projection
equal pitch
pitch contour
crystal
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CN103885080A (en
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徐亮
吴国城
支力佳
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Shenyang Zhihe Medical Technology Co ltd
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Neusoft Medical Systems Co Ltd
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Abstract

The embodiment of the invention discloses a kind of detection method to detector and device, described method includes: the arbitrary crystal array in detector is defined as target crystal array;Obtain the crystal positions scatterplot of described target crystal array;In described crystal positions scatterplot, it is determined that wait, with default, the equal pitch contour that high threshold is corresponding;Based on described equal pitch contour, described crystal positions scatterplot is split, obtain segmentation block;In units of the segmentation block being positioned at same a line, to the direction projection parallel with this row, obtain the first projection, and in units of the segmentation block being positioned at same string, to the direction projection parallel with these row, obtain the second projection;According to described first projection and described second projection, it is determined that testing result.The present invention adopts objective effectively quantitative data analysis that detector is detected, and the testing result accuracy rate drawn is high, provides reference for staff to the design of detector.

Description

A kind of detection method to detector and device
Technical field
The present invention relates to technical field of medical equipment, be specifically related to a kind of detection method to detector and device.
Background technology
The medical diagnosis that bimodal medical diagnostic apparatus is current provides effective instrument, and PET/CT and SPECT/CT is all the Typical Representative of bimodal medical diagnostic apparatus.Detector as the parts of PET or SPECT device core the most, the ray that sends mainly for detection of the radionuclide introduced in patient body (such as gamma-rays).Detector mainly includes scintillation crystal and optical-electrical converter, wherein, scintillation crystal can be independent bulk crystals, or the crystal array of the multiple scintillation crystal unit composition for can recognise that, it is mainly used in detecting the γ photon discharged from the patient, and converts light photon to.And optical-electrical converter can be photomultiplier tube or photodiode, it is mainly used in converting light photon to the signal of telecommunication.
When the scintillation crystal in detector is crystal array, with reference to the two dimensional crystal position scatterplot that Fig. 1, Fig. 1 are crystal array.Ideally, the distribution of each pixel in this crystal positions scatterplot should be uniform.But, in a practical situation, due to the impact of the factors such as the not quite identical property by detector processing technology, the distribution of above-mentioned pixel is often uneven, and this reflects the performance of this detector to a certain extent.
At present, the detection of existing detector performance is based on the subjective judgment to crystal positions scatterplot more, namely when when being evenly distributed of each pixel in crystal positions scatterplot, determining that its function admirable, detector is not carried out performance detection by an objective effectively quantitative data analysis.Therefore, the method for prior art may get the wrong sow by the ear for detector performance, and this restricts and disturb the follow-up work personnel design to detector to a certain extent, it is possible to can reduce the resolution of detector, finally affects the image quality of detector.
Summary of the invention
The invention provides a kind of detection method to detector and device, it is possible to realize the detection to detector by quantitative data analysis.
The invention provides a kind of detection method to detector, described method includes:
Arbitrary crystal array in detector is defined as target crystal array;
Obtain the crystal positions scatterplot of described target crystal array;
In described crystal positions scatterplot, it is determined that wait, with default, the equal pitch contour that high threshold is corresponding;
Based on described equal pitch contour, described crystal positions scatterplot is split, obtain segmentation block;
In units of the segmentation block being positioned at same a line, to the direction projection parallel with this row, obtain the first projection, and in units of the segmentation block being positioned at same string, to the direction projection parallel with these row, obtain the second projection;
According to described first projection and described second projection, it is determined that testing result.
Preferably, after the crystal positions scatterplot of the described target crystal array of described acquisition, and before the described equal pitch contour determining described crystal positions scatterplot, also include:
Described crystal positions scatterplot is smoothed.
Preferably, described described crystal positions scatterplot is smoothed, including:
Utilize formula (1), described crystal positions scatterplot be smoothed,
D (x, y, σ)=(G (x, y, k σ)-G (x, y, σ)) * I (x, y) (1)
Wherein, (x, y) for original crystal positions scatterplot for I, k is constant, G (x, y, σ) is the gauss of distribution function of σ for variance, G (x, y, k σ) for the gauss of distribution function that variance is k σ, D (x, y, σ) for the crystal positions scatterplot after smoothing processing;
Obtain the crystal positions scatterplot after smoothing processing.
Preferably, described in described crystal positions scatterplot, it is determined that to wait, with default, the equal pitch contour that high threshold is corresponding, including:
Obtain maximum and the minima of described crystal positions scatterplot;
Numerical value section between described maximum and minima is carried out equal difference division, obtains waiting high threshold;
Determine and the described equal pitch contour waiting high threshold corresponding.
Preferably, described based on described equal pitch contour, described crystal positions scatterplot is split, obtains segmentation block, including:
Described equal pitch contour is fitted, obtains fitting surface;
Obtain the intersection of adjacent described fitting surface;
With described intersection for cut-off rule, described crystal positions scatterplot is split, obtain segmentation block.
Preferably, described described equal pitch contour is fitted, obtains fitting surface, including:
Utilize dimensional Gaussian curved surface formula, described equal pitch contour is fitted;
After described equal pitch contour is fitted, obtain fitting surface.
Preferably, described described equal pitch contour is fitted, obtains fitting surface, including:
Judge that whether described equal pitch contour is symmetrical, if it is, described equal pitch contour is fitted, obtain fitting surface, if it is not, then obtain described isocontour asymmetric two parts, respectively described asymmetric two parts are fitted, obtain fitting surface.
Preferably, described according to described first projection with described second projection, it is determined that testing result, including:
Respectively in described first projection and described second projection, obtain peak value;
Obtain two valleies adjacent with each peak value;
According to described valley and described peak value, it is determined that peak valley ratio, described peak valley ratio is described peak value and the ratio of described valley;
Testing result is determined according to described peak valley ratio.
Preferably, described determine testing result according to described peak valley ratio, including:
Obtain the minima in described peak valley ratio;
Testing result is determined according to described minima.
Present invention also offers a kind of detecting device to detector, described device includes:
First determines module, for the arbitrary crystal array in detector is defined as target crystal array;
First acquisition module, for obtaining the crystal positions scatterplot of described target crystal array;
Second determines module, in described crystal positions scatterplot, it is determined that wait, with default, the equal pitch contour that high threshold is corresponding;
Segmentation module, for based on described equal pitch contour, being split by described crystal positions scatterplot, obtains segmentation block;
Projection module, for, in units of the segmentation block being positioned at same a line, to the direction projection parallel with this row, obtaining the first projection, and in units of the segmentation block being positioned at same string, to the direction projection parallel with these row, obtain the second projection;
3rd determines module, for according to described first projection and described second projection, it is determined that testing result.
Preferably, described device also includes:
Smoothing module, for being smoothed described crystal positions scatterplot.
Preferably, described segmentation module includes:
First matching submodule, for described equal pitch contour is fitted, obtains fitting surface;
3rd obtains submodule, for obtaining the intersection of adjacent described fitting surface;
Segmentation submodule, for described intersection for cut-off rule, being split by described crystal positions scatterplot, obtains segmentation block.
Preferably, described first matching submodule includes:
Judge submodule, be used for judging that whether described equal pitch contour is symmetrical;
3rd matching submodule, for when the described result judging submodule is as being, being fitted described equal pitch contour, obtain fitting surface;
4th matching submodule, for when the result of described judgement submodule is no, obtaining described isocontour asymmetric two parts, respectively described asymmetric two parts be fitted, obtain fitting surface.
Crystal positions scatterplot is split by detection method provided by the invention based on equal pitch contour, obtain some segmentation blocks, and segmentation block is projected, obtain the first projection and the second projection, testing result may finally be determined by the peak value in projection and valley.With prior art based on compared with the subjective judgment to crystal positions scatterplot, the present invention adopts objective effectively quantitative data analysis that detector is detected, and the testing result accuracy rate drawn is high, provides reference for staff to the design of detector.
Accompanying drawing explanation
In order to be illustrated more clearly that the technical scheme in the embodiment of the present application, below the accompanying drawing used required during embodiment is described is briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the application, for those of ordinary skill in the art, under the premise not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the two dimensional crystal position scatterplot of crystal array;
The detection method flow chart to detector that Fig. 2 provides for the embodiment of the present invention one;
Fig. 3 is the isocontour schematic diagram of crystal positions scatterplot;
Fig. 4 is the schematic diagram of two adjacent crystal blocks after segmentation;
Fig. 5 is isocontour schematic diagram;
The crystal block being positioned at same a line that Fig. 6 is in target crystal array projects the first projection obtained;
The structure of the detecting device figure to detector that Fig. 7 provides for the embodiment of the present invention two.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present application, the technical scheme in the embodiment of the present application is clearly and completely described, it is clear that described embodiment is only some embodiments of the present application, rather than whole embodiments.Based on the embodiment in the application, the every other embodiment that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of the application protection.
Embodiment one
With reference to the detection method flow chart to detector that Fig. 2, Fig. 2 provide for the present embodiment, specifically may include that
Step 201: the arbitrary crystal array in detector is defined as target crystal array, and described target crystal array includes row and column.
In the present embodiment, owing to detector is made up of multiple crystal arrays, so, can pass through to detect crystal array realization to the detection of detector.Meanwhile, the performance of each crystal array is more or less the same, and one of them crystal array can only be detected by the present embodiment, and the testing result obtained can as the testing result to this detector.So, first any one crystal array in this detector can be defined as target crystal array by the present embodiment, and it can be used as the process object of the present embodiment.
Step 202: obtain the crystal positions scatterplot of described target crystal array.
In the present embodiment, after determining target crystal array, obtain the crystal positions scatterplot of this target crystal array.With reference to the crystal positions scatterplot that Fig. 1, Fig. 1 are target crystal array, concrete, that the present embodiment is not intended to obtain crystal positions scatterplot method.
In practical operation, it is possible to placing radioactive source in detector, crystal array can receive the γ photon that this radioactive source produces, and through processes such as opto-electronic conversion, finally gives crystal positions scatterplot.
In the present embodiment, the factor of testing result is affected owing to the crystal positions scatterplot of acquisition would be likely to occur noise spot etc., so before this crystal positions scatterplot is further processed, first this crystal positions scatterplot can be smoothed, to remove the impact of the undesirable elements such as noise spot.
In practical operation, the mode that crystal positions scatterplot is smoothed is a lot, and the present embodiment can utilize formula (1), and this crystal positions scatterplot is smoothed, and obtains the crystal positions scatterplot after smoothing processing;
D (x, y, σ)=(G (x, y, k σ)-G (x, y, σ)) * I (x, y) (1)
Wherein, (x, y) for original crystal positions scatterplot for I, k is constant, G (x, y, σ) is the gauss of distribution function of σ for variance, G (x, y, k σ) for the gauss of distribution function that variance is k σ, D (x, y, σ) for the crystal positions scatterplot after smoothing processing.
Step 203: in described crystal positions scatterplot, it is determined that wait the equal pitch contour that high threshold is corresponding with default.
In the present embodiment, for the crystal positions scatterplot obtained, first arranging and wait high threshold, concrete high threshold such as grade can arrange multiple according to the demand of user.Secondly, to wait high threshold for standard, obtain point equal with such high threshold in crystal positions scatterplot, equal point is linked to be curve as equal pitch contour.It is to say, equal pitch contour is exactly the closed curve that the equal point of crystal positions scatterplot intermediate value connects into.With reference to the isocontour schematic diagram that Fig. 3, Fig. 3 are crystal positions scatterplot, wherein each closed curve is the equal pitch contour of this crystal positions scatterplot.It addition, isocontour number is determined by the number waiting high threshold, say, that wait and there is between high threshold and equal pitch contour one-to-one relationship.
In practical operation, in order to make the testing result to detector more accurate, it is possible to use high thresholds such as following manner settings, specifically include:
First, maximum and the minima of this crystal positions scatterplot are obtained;Secondly, the numerical value section between described maximum and minima is carried out equal difference division, obtain waiting high threshold;Finally, it is determined that with the described equal pitch contour waiting high threshold corresponding.
Concrete, after the maximum obtaining crystal positions scatterplot and minima, with minima for initial value, and with maximum for stop value, it is pointed to the numerical value between initial value and stop value by arithmetic progression and carries out equal difference division, obtain several numerical value as waiting high threshold.Secondly illustrating, first using 1 as minima, 9 as maximum, by arithmetic progression, the numerical value between 1 and 9 is carried out equal difference division, it is possible to obtain 3,5 and 7, finally, it is possible to using 1,3,5,7 and 9 as etc. high threshold.
Step 204: based on described equal pitch contour, splits described crystal positions scatterplot, obtains segmentation block.
In the present embodiment, after determining the equal pitch contour of this crystal positions scatterplot, based on a determination that equal pitch contour described crystal positions scatterplot is split, multiple segmentation block may finally be obtained.Reference Fig. 4, Fig. 4 are the schematic diagram of two adjacent segmentation blocks after segmentation.
In practical operation, first, after the equal pitch contour obtaining crystal positions scatterplot, respectively equal pitch contour is fitted, it is possible to obtain fitting surface.Concrete, it is possible to use dimensional Gaussian curved surface formula, equal pitch contour is fitted to fitting surface.After all of equal pitch contour all completes fit operation, obtain the intersection of two adjacent fitting surfaces.Using these intersections as cut-off rule, crystal positions scatterplot is split, the segmentation block after may finally being split.
Additionally, in order to improve the accuracy of matching so that the fitting surface arrived is more accurate, and the present embodiment can before matching, first determine whether that whether equal pitch contour is symmetrical, if it is, can directly equal pitch contour be fitted, obtain fitting surface, if not, then obtain isocontour asymmetric two parts, asymmetric two parts are fitted respectively, finally can also obtain fitting surface.As it is shown in figure 5, Fig. 5 is isocontour schematic diagram, (a) represents symmetrical equal pitch contour, and (b) is asymmetrical equal pitch contour.
Concrete, the present embodiment is to judging that isocontour symmetric method does not limit.
Step 205: in units of the segmentation block being positioned at same a line, to the direction projection parallel with this row, obtains the first projection, and in units of the segmentation block being positioned at same string, to the direction projection parallel with these row, obtains the second projection.
In the present embodiment, after crystal positions scatterplot is split, obtaining some segmentation blocks, this step, first in units of the segmentation block being positioned at same a line, by segmentation block to the direction projection parallel with this row, obtains the first projection.Secondly, in units of the segmentation block being positioned at same string, then by segmentation block to the direction projection parallel with these row, obtain the second projection.In practical operation, the order obtaining the first projection and the second projection is not limited.
In the present embodiment, it is possible to the segmentation block of any a line in the crystal positions scatterplot after segmentation or any string is all completed projection step.As follows, the first projection obtained is projected for the segmentation block being positioned at same a line in crystal positions scatterplot, with reference to Fig. 6, the segmentation block being positioned at same a line that Fig. 6 is in crystal positions scatterplot projects the first projection obtained, from fig. 6 it can be seen that the difference that the segmentation block being significantly arranged in the first projection centre projects the adjacent crest of the waveform obtained and trough is little.
The Cleaning Principle of detector is by the present embodiment: if it is less to split the difference of adjacent crest and trough in the waveform that block projection obtains, then can illustrate that its performance would be likely to occur problem, contrary, if the difference of crest adjacent in waveform and trough is relatively big, then its function admirable can be described.
In the present embodiment, it will be appreciated from fig. 6 that the difference between adjacent crest and the trough in the waveform on the first projection both sides is relatively big, and adjacent crest and the trough difference in centrally located waveform is inconspicuous.In order to improve the detection efficiency to detector, the present embodiment can perform subsequent step just for the waveform being positioned in the middle of the first projection, that is, if carry out detecting the result obtained meet the demand of user for being positioned at the first waveform in the middle of projection, then the waveform that can illustrate to be positioned at both sides also complies with the demand of user.
Step 206: according to described first projection and described second projection, it is determined that testing result.
In the present embodiment, after obtaining the first projection and the second projection, it is possible to the difference size according to the adjacent peaks of waveform in projection and trough, it is determined that testing result.Concrete, it is possible to using the first projection and the second projection as processing object, the difference size of adjacent peaks and trough by judging the waveform in projection, it is determined that testing result.
It addition, by above-mentioned steps it can be seen that in order to improve the detection efficiency to detector, the present embodiment can only analyze the fluctuation situation of the waveform being positioned at projection centre position.As long as it is to say, the fluctuation situation coincidence detection requirement of the waveform in centre position, then can illustrate the detection of this detector is met the requirements.
In practical operation, it is possible to determine testing result as follows:
S1: respectively in described first projection and described second projection, obtains peak value;
S2: obtain two valleies adjacent with each peak value;
S3: according to described valley and described peak value, it is determined that peak valley ratio, described peak valley ratio is described peak value and the ratio of described valley;
S4: determine testing result according to described peak valley ratio.
Concrete, first obtain the peak value in the first projection and the second projection, secondly, obtain two valleies adjacent with peak value, the ratio of this peak value He this valley is defined as peak valley ratio, as the foundation determining testing result.Due to corresponding two valleies of a peak value, then it certainly exists two peak valley ratios.
It addition, for the operand reducing the present embodiment, improve the detection efficiency to detector, the present embodiment can only obtain the minima in two peak valley ratios corresponding to the first projection and two peak valley ratios corresponding to the second projection;That is, it is possible to only determine testing result according to this minima.Cleaning Principle according to the present embodiment, as long as minima meets the requirement of detection, then can illustrate that this detector meets testing requirement.
Crystal positions scatterplot is split by the detection method that the present embodiment provides based on equal pitch contour, obtain some segmentation blocks, and segmentation block is projected, obtain the first projection and the second projection, testing result may finally be determined by the peak value in projection and valley.With prior art based on compared with the subjective judgment to crystal positions scatterplot, the present embodiment adopts objective effectively quantitative data analysis that detector is detected, and the testing result accuracy rate drawn is high, provides reference for staff to the design of detector.
Embodiment two
With reference to the structure of the detecting device figure to detector that Fig. 7, Fig. 7 provide for the present embodiment, described device may include that
First determines module 701, for the arbitrary crystal array in detector is defined as target crystal array;
First acquisition module 702, for obtaining the crystal positions scatterplot of described target crystal array;
Second determines module 703, in described crystal positions scatterplot, it is determined that wait, with default, the equal pitch contour that high threshold is corresponding;
Segmentation module 704, for based on described equal pitch contour, being split by described crystal positions scatterplot, obtains segmentation block;
Projection module 705, for, in units of the segmentation block being positioned at same a line, to the direction projection parallel with this row, obtaining the first projection, and in units of the segmentation block being positioned at same string, to the direction projection parallel with these row, obtain the second projection;
3rd determines module 706, for according to described first projection and described second projection, it is determined that testing result.
In order to improve the accuracy of testing result, described device can also include:
Smoothing module, for being smoothed described crystal positions scatterplot.
Concrete, described smoothing module may include that
Smoothing processing submodule, is used for utilizing formula (1), described crystal positions scatterplot is smoothed,
D (x, y, σ)=(G (x, y, k σ)-G (x, y, σ)) * I (x, y) (1)
Wherein, (x, y) for original crystal positions scatterplot for I, k is constant, G (x, y, σ) is the gauss of distribution function of σ for variance, G (x, y, k σ) for the gauss of distribution function that variance is k σ, D (x, y, σ) for the crystal positions scatterplot after smoothing processing;
First obtains submodule, for obtaining the crystal positions scatterplot after smoothing processing.
In order to improve the accuracy of testing result, described second determines that module may include that
Second obtains submodule, for obtaining maximum and the minima of described crystal positions scatterplot;
Divide submodule, for the numerical value section between described maximum and minima is carried out equal difference division, obtain waiting high threshold;
First determines submodule, is used for determining and the described equal pitch contour waiting high threshold corresponding.
Concrete, described segmentation module may include that
First matching submodule, for described equal pitch contour is fitted, obtains fitting surface;
3rd obtains submodule, for obtaining the intersection of adjacent described fitting surface;
Segmentation submodule, for described intersection for cut-off rule, being split by described crystal positions scatterplot, obtains segmentation block.
Wherein, described first matching submodule may include that
Second matching submodule, is used for utilizing dimensional Gaussian curved surface formula, described equal pitch contour is fitted;
4th obtains submodule, after described equal pitch contour is fitted, acquires fitting surface.
Further, described first matching submodule may include that
Judge submodule, be used for judging that whether described equal pitch contour is symmetrical;
3rd matching submodule, for when the described result judging submodule is as being, being fitted described equal pitch contour, obtain fitting surface;
4th matching submodule, for when the result of described judgement submodule is no, obtaining described isocontour asymmetric two parts, respectively described asymmetric two parts be fitted, obtain fitting surface.
It addition, the described 3rd determines that module may include that
5th obtains submodule, for, respectively in described first projection and described second projection, obtaining peak value;
6th obtains submodule, for obtaining two adjacent with each peak value valley;
Second determines submodule, for according to described valley and described peak value, it is determined that peak valley ratio, described peak valley ratio is described peak value and the ratio of described valley;
3rd determines submodule, for determining testing result according to described peak valley ratio.
In order to improve detection efficiency, the described 3rd determines that submodule may include that
7th obtains submodule, for obtaining the minima in described peak valley ratio;
4th determines submodule, for determining testing result according to described minima.
Crystal positions scatterplot is split by the detection method that the present embodiment provides based on equal pitch contour, obtain some segmentation blocks, and segmentation block is projected, obtain the first projection and the second projection, testing result may finally be determined by the peak value in projection and valley.With prior art based on compared with the subjective judgment to crystal positions scatterplot, the present embodiment adopts objective effectively quantitative data analysis that detector is detected, and the testing result accuracy rate drawn is high, provides reference for staff to the design of detector.
For being for device embodiment, owing to it corresponds essentially to embodiment of the method, so relevant part illustrates referring to the part of embodiment of the method.Device embodiment described above is merely schematic, the wherein said unit illustrated as separating component can be or may not be physically separate, the parts shown as unit can be or may not be physical location, namely may be located at a place, or can also be distributed on multiple NE.Some or all of module therein can be selected according to the actual needs to realize the purpose of the present embodiment scheme.Those of ordinary skill in the art, when not paying creative work, are namely appreciated that and implement. 
It should be noted that, in this article, the relational terms of such as first and second or the like is used merely to separate an entity or operation with another entity or operating space, and not necessarily requires or imply the relation that there is any this reality between these entities or operation or sequentially.And, term " includes ", " comprising " or its any other variant are intended to comprising of nonexcludability, so that include the process of a series of key element, method, article or equipment not only include those key elements, but also include other key elements being not expressly set out, or also include the key element intrinsic for this process, method, article or equipment.When there is no more restriction, statement " including ... " key element limited, it is not excluded that there is also other identical element in including the process of described key element, method, article or equipment.
The detection method to detector and the device that above the embodiment of the present invention are provided are described in detail, principles of the invention and embodiment are set forth by specific case used herein, and the explanation of above example is only intended to help to understand method and the core concept thereof of the present invention;Simultaneously for one of ordinary skill in the art, according to the thought of the present invention, all will change in specific embodiments and applications, in sum, this specification content should not be construed as limitation of the present invention.

Claims (12)

1. the detection method to detector, it is characterised in that described method includes:
Arbitrary crystal array in detector is defined as target crystal array;
Obtain the crystal positions scatterplot of described target crystal array;
In described crystal positions scatterplot, it is determined that wait, with default, the equal pitch contour that high threshold is corresponding;
Based on described equal pitch contour, described crystal positions scatterplot is split, obtain segmentation block;
In units of the segmentation block being positioned at same a line, to the direction projection parallel with this row, obtain the first projection, and in units of the segmentation block being positioned at same string, to the direction projection parallel with these row, obtain the second projection;
According to described first projection and described second projection, it is determined that testing result;
Described in described crystal positions scatterplot, it is determined that to wait, with default, the equal pitch contour that high threshold is corresponding, including:
Obtain maximum and the minima of described crystal positions scatterplot;
Numerical value section between described maximum and minima is carried out equal difference division, obtains waiting high threshold;
Determine and the described equal pitch contour waiting high threshold corresponding.
2. method according to claim 1, it is characterised in that after the crystal positions scatterplot of the described target crystal array of described acquisition, and before the described equal pitch contour determining described crystal positions scatterplot, also include:
Described crystal positions scatterplot is smoothed.
3. method according to claim 2, it is characterised in that described described crystal positions scatterplot is smoothed, including:
Utilize formula (1), described crystal positions scatterplot be smoothed,
D (x, y, σ)=(G (x, y, k σ)-G (x, y, σ)) * I (x, y) (1)
Wherein, (x, y) for original crystal positions scatterplot for I, k is constant, G (x, y, σ) is the gauss of distribution function of σ for variance, G (x, y, k σ) for the gauss of distribution function that variance is k σ, D (x, y, σ) for the crystal positions scatterplot after smoothing processing;
Obtain the crystal positions scatterplot after smoothing processing.
4. method according to claim 1, it is characterised in that described based on described equal pitch contour, splits described crystal positions scatterplot, obtains segmentation block, including:
Described equal pitch contour is fitted, obtains fitting surface;
Obtain the intersection of adjacent described fitting surface;
With described intersection for cut-off rule, described crystal positions scatterplot is split, obtain segmentation block.
5. method according to claim 4, it is characterised in that described described equal pitch contour is fitted, obtains fitting surface, including:
Utilize dimensional Gaussian curved surface formula, described equal pitch contour is fitted;
After described equal pitch contour is fitted, obtain fitting surface.
6. method according to claim 4, it is characterised in that described described equal pitch contour is fitted, obtains fitting surface, including:
Judge that whether described equal pitch contour is symmetrical, if it is, described equal pitch contour is fitted, obtain fitting surface, if it is not, then obtain described isocontour asymmetric two parts, respectively described asymmetric two parts are fitted, obtain fitting surface.
7. method according to claim 1, it is characterised in that described according to described first projection with described second projection, it is determined that testing result, including:
Respectively in described first projection and described second projection, obtain peak value;
Obtain two valleies adjacent with each peak value;
According to described valley and described peak value, it is determined that peak valley ratio, described peak valley ratio is described peak value and the ratio of described valley;
Testing result is determined according to described peak valley ratio.
8. method according to claim 7, it is characterised in that described determine testing result according to described peak valley ratio, including:
Obtain the minima in described peak valley ratio;
Testing result is determined according to described minima.
9. the detecting device to detector, it is characterised in that described device includes:
First determines module, for the arbitrary crystal array in detector is defined as target crystal array;
First acquisition module, for obtaining the crystal positions scatterplot of described target crystal array;
Second determines module, in described crystal positions scatterplot, it is determined that wait, with default, the equal pitch contour that high threshold is corresponding;
Segmentation module, for based on described equal pitch contour, being split by described crystal positions scatterplot, obtains segmentation block;
Projection module, for, in units of the segmentation block being positioned at same a line, to the direction projection parallel with this row, obtaining the first projection, and in units of the segmentation block being positioned at same string, to the direction projection parallel with these row, obtain the second projection;
3rd determines module, for according to described first projection and described second projection, it is determined that testing result.
10. device according to claim 9, it is characterised in that described device also includes:
Smoothing module, for being smoothed described crystal positions scatterplot.
11. device according to claim 9, it is characterised in that described segmentation module includes:
First matching submodule, for described equal pitch contour is fitted, obtains fitting surface;
3rd obtains submodule, for obtaining the intersection of adjacent described fitting surface;
Segmentation submodule, for described intersection for cut-off rule, being split by described crystal positions scatterplot, obtains segmentation block.
12. device according to claim 11, it is characterised in that described first matching submodule includes:
Judge submodule, be used for judging that whether described equal pitch contour is symmetrical;
3rd matching submodule, for when the described result judging submodule is as being, being fitted described equal pitch contour, obtain fitting surface;
4th matching submodule, for when the result of described judgement submodule is no, obtaining described isocontour asymmetric two parts, respectively described asymmetric two parts be fitted, obtain fitting surface.
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