CN103882630A - Pattern editing method of electronic pattern machine - Google Patents
Pattern editing method of electronic pattern machine Download PDFInfo
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- CN103882630A CN103882630A CN201210559193.5A CN201210559193A CN103882630A CN 103882630 A CN103882630 A CN 103882630A CN 201210559193 A CN201210559193 A CN 201210559193A CN 103882630 A CN103882630 A CN 103882630A
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Abstract
The invention provides a pattern editing method of an electronic pattern machine. The method includes: setting times of overlap seams, isometric distance among overlap seams and distance between very two needle points, wherein the times are at least two; determining data point passed by each overlap seam; fitting to obtain each overlap seam according to the corresponding data point; calculating whether intersection parts exist on the overlap seams or not, if so, removing the intersection parts to obtain corrected overlap seams; calculating to obtain the needle points according to the distance between every two needle points and the corrected overlap seams; sewing patterns according to the needle points. By the method, the intersection parts of the overlap seams can be removed while parallelism of the overlap seams is guaranteed, and processing quality of subsequent products can be guaranteed.
Description
Technical field
The present invention relates to mechanical technique, relate in particular to a kind of electro-pattern-sewing machine style edit methods.
Background technology
Electro-pattern-sewing machine is the novel intelligent electromechanical integration sewing device that adopts embedded system technology, is mainly used in the processing of the products such as clothes, case and bag, shoes and hats.Electro-pattern-sewing machine adopts upper and lower computer framework, and host computer provides friendly operation interface, setting parameter, and style editor, sends user's order and records the functions such as demonstration to slave computer; Slave computer receives the various information of host computer, and according to user's instruction action, and result and fault are fed back to host computer to inform the state of the current machine of user.
Style editor has been one of electro-pattern-sewing machine important core function now, and it provides powerful style customization function flexibly to user, facilitates user immediately beat version and make, and makes user's pattern design requirement of the side of satisfying the demands timely.Existing style edit methods comprises the following steps:
Specified the distance d between number of times and the curve of overlapping suture by user, and set the pin spacing of needle falling point; Be overlapping suture line1 and line2 herein.
User inputs the data point that this overlapping suture will pass through;
Simulate overlapping suture according to this data point;
The overlapping suture obtaining according to matching, calculates each needle falling point;
According to each needle falling point sewing pattern.
Adopt design sketch that above-mentioned prior art obtains referring to Fig. 1, the dotted line in Fig. 1 represents to walk empty needle.Overlapping suture refers to the boundary line of style, and the number of times of overlapping suture refers to the quantity of style boundary line.Herein, take the number of times of overlapping suture as twice as example.
At least there is following problem in prior art: the pattern that adopts existing style edit methods to obtain, its heavy seam depth of parallelism is bad, easily occurs crossover phenomenon.Follow-uply make according to this pattern the figure obtaining and easily tie a knot, product quality is bad.
Summary of the invention
The invention provides a kind of electro-pattern-sewing machine style edit methods, for optimizing existing method, improve the crudy of product.
The invention provides a kind of electro-pattern-sewing machine style edit methods, wherein, comprising:
Equidistant distance between number of times, the described overlapping suture of setting overlapping suture and the pin spacing between needle falling point, described number of times is at least twice;
Determine the data point that each described overlapping suture will pass through;
Obtain each described overlapping suture according to this data point matching;
Calculate on each described overlapping suture whether have crossing part, if having, remove crossing part, obtain revised overlapping suture;
According to described pin spacing and each described revised overlapping suture, calculate needle falling point;
Make style according to each needle falling point.
Whether method as above, preferably, there is crossing part on the each described overlapping suture of described calculating, if having, removes crossing part, obtains revised overlapping suture, comprising:
Calculate each the first sub-data point on a described overlapping suture wherein according to described pin spacing;
According to the data point of setting strategy and determine the first sub-data point ownership described in each;
According to described the first sub-data point and equidistant distance, calculate the second sub-data point on overlapping suture described in other, herein, each described the second sub-data point belongs to identical data point with the first sub-data point of its foundation;
For each described overlapping suture, each sub-data point included according to each data point, whether the sub-data point that calculating belongs to two adjacent data points intersects; Intersect if existed, the sub-data point intersection being comprised removes, and crossing part curve is removed from this overlapping suture, to obtain described revised overlapping suture.
Method as above, preferably, describedly calculates needle falling point according to each described revised overlapping suture, comprising:
Simulate each free curve according to the sub-data point of each described revised overlapping suture;
Calculate each needle falling point.
Method as above, preferably,
Described setting strategy is: each the first subtype value between two data points belongs to the data point being positioned at below.
The electro-pattern-sewing machine style edit methods that technique scheme provides, can guarantee, under the parallel prerequisite of each overlapping suture, to remove the intersection on overlapping suture, to guarantee subsequent product crudy.
Accompanying drawing explanation
Fig. 1 is the pattern design sketch that adopts prior art to obtain;
Fig. 2 a provides a kind of electro-pattern-sewing machine style edit methods schematic flow sheet for the embodiment of the present invention;
Fig. 2 b adopts the overlapping suture schematic diagram that shown in Fig. 2 a, method obtains;
Fig. 2 c adopts the revised overlapping suture schematic diagram that shown in Fig. 2 a, method obtains;
Fig. 3 a provides a kind of electro-pattern-sewing machine style edit methods schematic flow sheet for the embodiment of the present invention
Fig. 3 b is the process schematic diagram of method editor shown in Fig. 3 a.
The specific embodiment
The embodiment of the present invention provides a kind of electro-pattern-sewing machine style edit methods, and referring to Fig. 2 a, the method specifically comprises the steps:
Equidistant distance between number of times, the described overlapping suture of step 11, setting overlapping suture and the pin spacing between needle falling point, described number of times is at least twice.
Equidistant distance between number of times, the described overlapping suture of overlapping suture and the pin spacing between needle falling point all require to determine according to actual production.In the present embodiment, the number of times of overlapping suture, to be set to twice as example, is respectively line1, line2.Certainly, the difference requiring according to actual production, also can be set to three times, four times or five times.Equidistant distance is with d signal in Fig. 2 b, and pin spacing has determined the dense degree of stitch.
In above-mentioned steps 12, data point has been determined two groups altogether, is respectively M1-M5, and N1-N5 specifically participates in Fig. 2 b.
Matching refers to that the curve that can fall with secondary connects each data point on each overlapping suture in turn, and the schematic diagram obtaining after connection is referring to Fig. 2 b, and the dotted line in Fig. 2 b represents to walk empty needle.
, calculate whether to exist on overlapping suture the computational methods of crossing part to have multiple herein, following embodiment will provide wherein a kind of preferred version, and this repeats no more.
Pin spacing provides in step 11, and first needle falling point is from the starting point of revised overlapping suture.
The electro-pattern-sewing machine style edit methods that technique scheme provides, can guarantee, under the parallel prerequisite of each overlapping suture, to remove the intersection on overlapping suture, to guarantee subsequent product crudy.
The embodiment of the present invention two also provides a kind of electro-pattern-sewing machine style edit methods, and the present embodiment is on above-described embodiment technical scheme basis, and referring to Fig. 3 a, preferably, step 14 specifically comprises:
, mainly can calculate the distance parameter between each first sub-data point herein, this distance parameter can be a times, two times or many times of pin spacing.The first sub-data point is the m21-m25 in Fig. 3 b, m31-m35, and m41-m45, m51-m55, referring to Fig. 3 b, the dotted line in Fig. 3 b represents to walk empty needle.
Herein, described setting strategy is: each the first subtype value between two data points belongs to the data point being positioned at below.According to above-mentioned strategy, the first sub-data point m21-m25 belongs to M2, and the first sub-data point m31-m35 belongs to M3, and the first sub-data point m41-m45 belongs to M4, and the first sub-data point m51-m55 belongs to M5, referring to Fig. 3 b.
The normal that calculates the first sub-data point place place overlapping suture, extends equidistant distance since the first sub-data point, sends to mutually on another overlapping suture, this joining is the second sub-data point on overlapping suture described in other, i.e. n21-n25 in Fig. 3 b, n31-n35, n41-n45, n51-n55.Known according to step 143, the second sub-data point n21-n25 belongs to M2, and the second sub-data point n31-n35 belongs to M3, and the second sub-data point n41-n45 belongs to M4, and the second sub-data point n51-n55 belongs to M5, referring to Fig. 3 b.
Calculate herein, belong to M2 with belong to M3 each data point, belong to M3 with belong to M4 each data point, belong to M4 and belong to each data point of M5, comprise the first data point and the second data point, whether the straight line at place exists crossing between two.
Calculate, between N2, N3 and N4, the line between n34 and n35, and line between n44 and n45, exist and intersect.So, need to remove intersection, that is, for the part between N2, N3, need to remove the later part of N3, i.e. part between N3 and n35; For the part between N3, N4, need to remove N3 part in the past, i.e. part between N3 and n45.The revised overlapping suture obtaining after removing is referring to shown in Fig. 2 c.
Further, step 15 specifically comprises:
Step 151, simulate each free curve according to the sub-data point of each described revised overlapping suture.
Matching herein refers to, the curve that can fall with secondary connects each data point on revised overlapping suture in turn.Revised overlapping suture is referring to Fig. 2 c.
Pin spacing provides in step 11, and first needle falling point is from the starting point of revised overlapping suture.
Technique scheme, had both solved the problem of the depth of parallelism, had also eliminated the phenomenon of equidistant curve selfing circle simultaneously.And can, under the prerequisite of required precision that meets user, reduce computing time, reach good fast-response energy.
One of ordinary skill in the art will appreciate that: all or part of step that realizes above-mentioned each embodiment of the method can complete by the relevant hardware of programmed instruction.Aforesaid program can be stored in a computer read/write memory medium.This program, in the time carrying out, is carried out the step that comprises above-mentioned each embodiment of the method; And aforesaid storage medium comprises: various media that can be program code stored such as ROM, RAM, magnetic disc or CDs.
Finally it should be noted that: above each embodiment, only in order to technical scheme of the present invention to be described, is not intended to limit; Although the present invention is had been described in detail with reference to aforementioned each embodiment, those of ordinary skill in the art is to be understood that: its technical scheme that still can record aforementioned each embodiment is modified, or some or all of technical characterictic is wherein equal to replacement; And these modifications or replacement do not make the essence of appropriate technical solution depart from the scope of various embodiments of the present invention technical scheme.
Claims (4)
1. an electro-pattern-sewing machine style edit methods, is characterized in that, comprising:
Equidistant distance between number of times, the described overlapping suture of setting overlapping suture and the pin spacing between needle falling point, described number of times is at least twice;
Determine the data point that each described overlapping suture will pass through;
Obtain each described overlapping suture according to this data point matching;
Calculate on each described overlapping suture whether have crossing part, if having, remove crossing part, obtain revised overlapping suture;
According to described pin spacing and each described revised overlapping suture, calculate needle falling point;
Make style according to each needle falling point.
2. method according to claim 1, is characterized in that, on the each described overlapping suture of described calculating, whether has crossing part, if having, removes crossing part, obtains revised overlapping suture, comprising:
Calculate each the first sub-data point on a described overlapping suture wherein according to described pin spacing;
According to the data point of setting strategy and determine the first sub-data point ownership described in each;
According to described the first sub-data point and equidistant distance, calculate the second sub-data point on overlapping suture described in other, herein, each described the second sub-data point belongs to identical data point with the first sub-data point of its foundation;
For each described overlapping suture, each sub-data point included according to each data point, whether the sub-data point that calculating belongs to two adjacent data points intersects; Intersect if existed, the sub-data point intersection being comprised removes, and crossing part curve is removed from this overlapping suture, to obtain described revised overlapping suture.
3. method according to claim 2, is characterized in that, describedly calculates needle falling point according to each described revised overlapping suture, comprising:
Simulate each free curve according to the sub-data point of each described revised overlapping suture;
Calculate each needle falling point.
4. method according to claim 2, is characterized in that,
Described setting strategy is: each the first subtype value between two data points belongs to the data point being positioned at below.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105986366A (en) * | 2014-09-03 | 2016-10-05 | 蛇目缝纫机工业株式会社 | Sewing machine system, sewing machine, terminal device, and content display method in sewing machine system |
| CN106202593A (en) * | 2015-05-05 | 2016-12-07 | 北京大豪科技股份有限公司 | The generation method of equidistant curve |
| CN108130654A (en) * | 2016-12-01 | 2018-06-08 | 北京大豪科技股份有限公司 | Style method for platemaking and device |
| CN108708080A (en) * | 2018-06-06 | 2018-10-26 | 北京卫星环境工程研究所 | A kind of satellite protective cover single needle quilting track electronic chart rapid generation |
| CN110409064A (en) * | 2019-08-28 | 2019-11-05 | 拓卡奔马机电科技有限公司 | A kind of pattern sewing machine |
| CN113652803A (en) * | 2020-05-12 | 2021-11-16 | 诸暨兴大豪科技开发有限公司 | Pattern correction method, pattern correction device, electronic apparatus, and storage medium |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105986366A (en) * | 2014-09-03 | 2016-10-05 | 蛇目缝纫机工业株式会社 | Sewing machine system, sewing machine, terminal device, and content display method in sewing machine system |
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| CN106202593B (en) * | 2015-05-05 | 2020-01-24 | 北京大豪科技股份有限公司 | Equidistant curve generation method |
| CN108130654A (en) * | 2016-12-01 | 2018-06-08 | 北京大豪科技股份有限公司 | Style method for platemaking and device |
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| CN108708080B (en) * | 2018-06-06 | 2020-08-28 | 北京卫星环境工程研究所 | Rapid generation method of satellite protective cover single-needle quilting track electronic map |
| CN110409064A (en) * | 2019-08-28 | 2019-11-05 | 拓卡奔马机电科技有限公司 | A kind of pattern sewing machine |
| CN110409064B (en) * | 2019-08-28 | 2022-03-15 | 拓卡奔马机电科技有限公司 | Pattern machine |
| CN113652803A (en) * | 2020-05-12 | 2021-11-16 | 诸暨兴大豪科技开发有限公司 | Pattern correction method, pattern correction device, electronic apparatus, and storage medium |
| CN113652803B (en) * | 2020-05-12 | 2023-08-18 | 浙江大豪科技有限公司 | Pattern correction method, pattern correction device, electronic equipment and storage medium |
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| CN103882630B (en) | 2015-12-02 |
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Effective date of registration: 20210512 Address after: 101500 no.25-7, Keji Road, economic development zone, Miyun District, Beijing Patentee after: Beijing DAHAO industrial sewing Intelligent Control Technology Co.,Ltd. Address before: 100015 M7, No.1 Jiuxianqiao East Road, Chaoyang District, Beijing Patentee before: BEIJING DAHAO TECHNOLOGY Co.,Ltd. |
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