CN103835905A - Variable-cross-section channel of multi-stage cusped magnetic field plasma pusher - Google Patents
Variable-cross-section channel of multi-stage cusped magnetic field plasma pusher Download PDFInfo
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- CN103835905A CN103835905A CN201410074742.9A CN201410074742A CN103835905A CN 103835905 A CN103835905 A CN 103835905A CN 201410074742 A CN201410074742 A CN 201410074742A CN 103835905 A CN103835905 A CN 103835905A
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Abstract
The invention provides a variable-cross-section channel of a multi-stage cusped magnetic field plasma pusher, belongs to the field of cusped magnetic field plasma pushers, and particularly relates to a variable-cross-section channel of a cusped magnetic field plasma pusher. The problem that a gas working medium easily leaks from a wall surface of a straight channel of the existing cusped magnetic field plasma pusher is solved. The inner side wall of the ceramic channel of the plasma pusher is fixedly embedded with n ring-shaped bosses along the axial direction of the ceramic channel; inner side walls of the n bosses are cylindrical surfaces; inner side walls of axial sections of the n bosses are arch-shaped; and n is a positive integer. The section of the channel is changed by adding the bosses in the channel, so that the section of the wall surface of the straight ceramic channel of the plasma pusher is variable, the gas working medium can be sufficiently ionized on the wall surface, and the gas of the wall surface can be prevented from leaking, so that the secondary plume flow possibly existing in an exit is eliminated. The variable-cross-section channel is applicable to the cusped magnetic field plasma pusher.
Description
Technical field
The invention belongs to plasma pusher field, cusped magnetic field, relate in particular to the variable cross section passage of cusped magnetic field plasma pusher.
Background technique
Cusped magnetic field plasma pusher is that the class Novel electric that the current world emerges advances concept, different from traditional electrical advancing means, it mainly comprises ceramic discharge passage and opposite polarity permanent magnet, the electronics that negative electrode discharges levels off to the spiral motion of anode under electromagnetic field effect, this process Anodic discharges gas working medium and electron collision ionizes, and the ion ionizing out can accelerate ejection and form thrust under axial electric field effect.Because the magnetic confinement of axial magnetic field and the magnetic mirror effect at magnetic tip can be avoided the collision of electronics and vias inner walls, make that engine life is longer, the performance such as thrust and efficiency is more excellent.But, because electronics is difficult to arrive straight passage wall, this just makes gas working medium insufficient at wall place degree of ionization, and portion gas working medium is not just ionized and discharges, i.e. wall gas working medium escape, thereby cause the decline that ionizes insufficient and gas working medium utilization ratio, when gas working medium moves to the most advanced and sophisticated place of outlet magnetic, may ionize at the most advanced and sophisticated place of outlet, cause secondary plume, cause the expansion of plume divergence angle, cause the decline of effective push and efficiency thereof.
Summary of the invention
The present invention is the problem that easily occurs gas working medium escape in order to solve existing cusped magnetic field plasma pusher straight passage wall, and the variable cross section passage of multistage cusped magnetic field plasma pusher is now provided.
The invention provides the variable cross section passage of the multistage cusped magnetic field plasma pusher of two kinds of structures, wherein:
The first structure: the variable cross section passage of multistage cusped magnetic field plasma pusher, the ceramic passage madial wall of plasma pusher has the boss of n ring along the axial direction build-in of ceramic passage, the madial wall of n boss is cylndrical surface, the internal diameter of a described n boss and the difference of external diameter are all between 2mm to 10mm, the internal diameter of n boss increases gradually along anode to the negative electrode of ceramic passage, and wherein n is positive integer.
The second structure: the variable cross section passage of multistage cusped magnetic field plasma pusher, the ceramic channel interior of plasma pusher has the boss of n ring along the axial direction build-in of ceramic passage, and the madial wall of the axial cross section of n boss is all arch; The minimum diameter of n boss increases gradually along anode to the negative electrode of ceramic passage, and the magnetic line of force that keeps the inwall of n boss all not produce with plasma pusher is crossing; Wherein n is positive integer.
The variable cross section passage of multistage cusped magnetic field of the present invention plasma pusher, change cross section by increasing boss in channel interior, make the ceramic straight passage wall of plasma pusher present the form of variable cross section, this just makes gas working medium can fully ionize at wall place, prevents the escape of wall gas, thereby eliminates the secondary plume that outlet may exist, control the size of plume divergence angle, make ionizing efficiency improve 10%, thrust has improved 15%, realizes higher specific impulse and benefit.
Simultaneously, because the use of boss exists the larger irregular variation in cross section at the most advanced and sophisticated place of magnetic, can make gas form herein an eddy current, increase the flow resistance of gas, thereby increase the holdup time of gas at the most advanced and sophisticated place of magnetic, and the most advanced and sophisticated place of magnetic is main ionized region, make ionisation of gas rate improve 10%.In addition, it is Turbulence Flow that wave curved inner wall can change wall Laminar Flow, also can flow by mitigation of gases.
The variable cross section passage of the multistage cusped magnetic field plasma pusher described in we's invention, is applicable in the plasma pusher of cusped magnetic field.
Brief description of the drawings
Fig. 1 is the structural representation of boss described in embodiment one.
Fig. 2 is the A-A view of Fig. 1.
Fig. 3 is the sectional drawing of the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment two, and curve A represents the magnetic line of force.
Fig. 4 is the structural representation of boss described in embodiment four.
Fig. 5 is the B-B view of Fig. 4.
Fig. 6 is the sectional drawing of the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment four, and curve B represents the magnetic line of force.
Embodiment
Embodiment one: illustrate present embodiment with reference to Fig. 1, Fig. 2 and Fig. 3, the variable cross section passage of the multistage cusped magnetic field plasma pusher described in present embodiment, the ceramic passage madial wall of plasma pusher has the boss 1 of n ring along the axial direction build-in of ceramic passage, the madial wall of n boss 1 is cylndrical surface, the internal diameter of a described n boss 1 and the difference of external diameter are all between 2mm to 10mm, the internal diameter of n boss 1 increases gradually along anode to the negative electrode of ceramic passage, and wherein n is positive integer.
In present embodiment, the internal diameter of described boss and the difference of external diameter too conference affect the axial motion of ion, too little not obvious to the improvement of wall gas escape phenomenon, between 2mm to 10mm, are therefore optimum value.
Embodiment two: present embodiment is that the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment one is described further, in present embodiment, all corresponding magnetic tips between two adjacent magnetic poles of each boss 1.
Boss is positioned at ceramic passage magnetic tip can improve ionizing efficiency.
Embodiment three: present embodiment is that the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment one is described further, in present embodiment, the inwall undulate of the ceramic passage of described plasma pusher.
In the time adopting straight annulus boss, ceramic vias inner walls is made wave curved surface, can make wall gas flow for turbulent flow, ionizes more fully wall gas.
Embodiment four: illustrate present embodiment with reference to Fig. 4, Fig. 5 and Fig. 6, the variable cross section passage of the multistage cusped magnetic field plasma pusher described in present embodiment, the ceramic channel interior of plasma pusher has the boss 1 of n ring along the axial direction build-in of ceramic passage, the madial wall of the axial cross section of n boss 1 is all arch; The minimum diameter of n boss 1 increases gradually along anode to the negative electrode of ceramic passage, and the magnetic line of force that keeps the inwall of n boss 1 all not produce with plasma pusher is crossing; Wherein n is positive integer.
In present embodiment, different boss minimum diameter differences, and radian is also different with width; The minimum diameter of n boss increases gradually along anode to the negative electrode of ceramic passage, presents expanding, to reduce the obstruction of boss plasma, particularly ion.
Boss inner curve is parallel with the magnetic line of force, keeps the inwall of n boss all not crossing with the magnetic line of force of plasma pusher generation, can avoid the collision loss of too much electronics and wall.
Embodiment five: present embodiment is that the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment four is described further, in present embodiment, the intermediate portion of the equal corresponding one-level permanent magnet of each boss 1.
In present embodiment, the intermediate portion of the equal corresponding one-level permanent magnet of each boss, can avoid larger ionized region, the most advanced and sophisticated place of magnetic, thereby expands the ionization space of the most advanced and sophisticated ionized region of magnetic, improves ionizing efficiency.
Embodiment six: present embodiment is that the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment four is described further, in present embodiment, be provided with magnet case at the magnetic tip of the ceramic channel interior of plasma pusher.
Embodiment seven: present embodiment is that the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment six is described further, and in present embodiment, the material of described magnet case is pure iron.
Embodiment eight: present embodiment is that the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment one or four is described further, in present embodiment, the material of n boss 1 and the material of ceramic passage are boron nitride.
Embodiment nine: present embodiment is that the variable cross section passage of the multistage cusped magnetic field plasma pusher described in embodiment one or four is described further, in present embodiment, a described n boss 1 and the integral formula structure of ceramic passage.
Reliable for ensureing engine health, boss and motor pottery passage is made to integrated type, can realize by hot pressed sintering, or use refractory ceramics Bond, boss and ceramic passage are bonded to and are integrated.And wave curved inner wall also can be by making corresponding mould thermoforming.
Claims (9)
1. the variable cross section passage of multistage cusped magnetic field plasma pusher, it is characterized in that, the ceramic passage madial wall of plasma pusher has the boss (1) of n ring along the axial direction build-in of ceramic passage, the madial wall of n boss (1) is cylndrical surface, the internal diameter of a described n boss (1) and the difference of external diameter are all between 2mm to 10mm, the internal diameter of n boss (1) increases gradually along anode to the negative electrode of ceramic passage, and wherein n is positive integer.
2. the variable cross section passage of multistage cusped magnetic field according to claim 1 plasma pusher, is characterized in that, each boss (1) is corresponding magnetic tip between two adjacent magnetic poles all.
3. the variable cross section passage of multistage cusped magnetic field according to claim 1 plasma pusher, is characterized in that the inwall undulate of the ceramic passage of described plasma pusher.
4. the variable cross section passage of multistage cusped magnetic field plasma pusher, it is characterized in that, the ceramic channel interior of plasma pusher has the boss (1) of n ring along the axial direction build-in of ceramic passage, the madial wall of the axial cross section of n boss (1) is all arch; The minimum diameter of n boss (1) increases gradually along anode to the negative electrode of ceramic passage, and the magnetic line of force that keeps the inwall of n boss (1) all not produce with plasma pusher is crossing; Wherein n is positive integer.
5. the variable cross section passage of multistage cusped magnetic field according to claim 4 plasma pusher, is characterized in that, the intermediate portion of the equal corresponding one-level permanent magnet of each boss (1).
6. the variable cross section passage of multistage cusped magnetic field according to claim 4 plasma pusher, is characterized in that, is provided with magnet case at the magnetic tip of the ceramic channel interior of plasma pusher.
7. the variable cross section passage of multistage cusped magnetic field according to claim 6 plasma pusher, is characterized in that, the material of described magnet case is pure iron.
8. according to the variable cross section passage of the multistage cusped magnetic field plasma pusher described in claim 1 or 4, it is characterized in that, the material of n boss (1) and the material of ceramic passage are boron nitride.
9. according to the variable cross section passage of the multistage cusped magnetic field plasma pusher described in claim 1 or 4, it is characterized in that a described n boss (1) and the integral formula structure of ceramic passage.
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| CN201410074742.9A CN103835905B (en) | 2014-03-03 | 2014-03-03 | The variable section channel of multistage cusped magnetic field plasma pusher |
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| CN201410074742.9A CN103835905B (en) | 2014-03-03 | 2014-03-03 | The variable section channel of multistage cusped magnetic field plasma pusher |
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| CN103835905B CN103835905B (en) | 2016-06-15 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108005868A (en) * | 2017-11-29 | 2018-05-08 | 哈尔滨工业大学 | A kind of anode-cold air thruster combining air feeding cusped magnetic field plasma thruster |
| CN112334594A (en) * | 2018-06-20 | 2021-02-05 | 密歇根州立大学董事会 | Single beam plasma source |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1314070A (en) * | 1998-06-26 | 2001-09-19 | 汤姆森管电子有限公司 | Plasma accelerator arrangement |
| DE10130464A1 (en) * | 2001-06-23 | 2003-01-02 | Thales Electron Devices Gmbh | Plasma accelerator configuration |
| CN1418290A (en) * | 2000-03-22 | 2003-05-14 | 塔莱斯电子设备有限公司 | Plasma accelerator arrangement |
| CN1736131A (en) * | 2003-01-11 | 2006-02-15 | 泰雷兹电子器件有限公司 | Ion accelerator arrangement |
-
2014
- 2014-03-03 CN CN201410074742.9A patent/CN103835905B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1314070A (en) * | 1998-06-26 | 2001-09-19 | 汤姆森管电子有限公司 | Plasma accelerator arrangement |
| CN1418290A (en) * | 2000-03-22 | 2003-05-14 | 塔莱斯电子设备有限公司 | Plasma accelerator arrangement |
| DE10130464A1 (en) * | 2001-06-23 | 2003-01-02 | Thales Electron Devices Gmbh | Plasma accelerator configuration |
| CN1736131A (en) * | 2003-01-11 | 2006-02-15 | 泰雷兹电子器件有限公司 | Ion accelerator arrangement |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108005868A (en) * | 2017-11-29 | 2018-05-08 | 哈尔滨工业大学 | A kind of anode-cold air thruster combining air feeding cusped magnetic field plasma thruster |
| CN112334594A (en) * | 2018-06-20 | 2021-02-05 | 密歇根州立大学董事会 | Single beam plasma source |
| CN112334594B (en) * | 2018-06-20 | 2023-12-29 | 密歇根州立大学董事会 | Single beam plasma source |
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| CN103835905B (en) | 2016-06-15 |
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