CN1038262C - Method for surface treatment of material by using pulsed high energy density plasma - Google Patents
Method for surface treatment of material by using pulsed high energy density plasma Download PDFInfo
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- CN1038262C CN1038262C CN 93107530 CN93107530A CN1038262C CN 1038262 C CN1038262 C CN 1038262C CN 93107530 CN93107530 CN 93107530 CN 93107530 A CN93107530 A CN 93107530A CN 1038262 C CN1038262 C CN 1038262C
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- plasma
- high energy
- material surface
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- electrodes
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- 239000000463 material Substances 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000004381 surface treatment Methods 0.000 title claims abstract 3
- 239000007772 electrode material Substances 0.000 claims abstract description 9
- 230000004927 fusion Effects 0.000 claims abstract description 8
- 239000007789 gas Substances 0.000 claims description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 230000009471 action Effects 0.000 claims description 5
- 229910002804 graphite Inorganic materials 0.000 claims description 5
- 239000010439 graphite Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 230000015556 catabolic process Effects 0.000 claims description 2
- 230000008569 process Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 230000004048 modification Effects 0.000 description 8
- 238000010894 electron beam technology Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 239000012530 fluid Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000000171 quenching effect Effects 0.000 description 4
- 229910001018 Cast iron Inorganic materials 0.000 description 3
- 238000004146 energy storage Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
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- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
The invention relates to a method for using pulsed high-energy density plasma for material surface treatment, which uses a conventional device for generating plasma by controlled nuclear fusion, wherein a sample is placed in a vacuum chamber facing a plasma gun mouth, and the vacuum degree in the vacuum chamber reaches 10-1-10-3Applying 1.5-100kv voltage on the electrode of the plasma gun, after charging, releasing part of energy to act the rapid pulse air inlet valve, the working gas is broken down through the plasma gun to form a plasma beam, and the plasma beam is heated and accelerated to carry the electrode material and the plasma beam to act on the surface of the processed material.
Description
The invention belongs to the Application Areas of plasma body, particularly impulse high energy-density plasma and be used for the method that material surface is handled.
The treatment process that is used at present material surface modifying in the world has:
A. with the energy momentary action of laser beam or electron beam in material surface, material surface is sharply heated up, after effect finishes,, make sharply cooling of surface, cold scooter 10 by the quenching certainly of material matrix
-3~10
-8K/S.This rapid quenching effect makes material surface obtain modification.
B. utilize the characteristic of ionic fluid, can carry out ion implantation and Ion Aided Film Coating.Make the material beyond the normal phase range of balance, and produce surface modification.
The document relevant with prior art:
1. " surface modification of laser beam, ionic fluid and electron beam and surface alloying "
(Snface?Modification?and?Alloying?by?Laser,Ion,and
Electron?Beams,edited?by?J.M?Poate,G.Foti,D.C.
Jacobson,Plenum?Press,New?York,1983)
2. " process for modifying surface-slip-stick artist's guide " (Fan Yudian etc. translate)
(Surface?Modification?technologies,an?engineer′s?guide,
edited?by?T.S.Sudarshan?Marcel?Dekker,Lne,1989)
The above-mentioned various treatment processs that are used for material surface modifying exist following shortcoming:
A. the Cement Composite Treated by Plasma in the document [2] only refers to it is the processing of in the atmosphere of plasma body material surface being carried out, and this plasma body is generally obtained by glow discharge, and energy is low, the density of plasma body: 10
8-10
10Cm
-3, temperature<1ev.
B. laser beam and electron beam are carrier of energy, act on material surface and only have the effect of quenching at a high speed.In addition, the efficient of laser is low, and lasing is when the material surface, and reflectivity is big, and specific absorption is low, and energy utilization ratio is low; Loss is big, and electron beam needs to produce under high vacuum, and the bundle spot is little; Compare with plasma body, the line of ionic fluid is very low, arrives required entire area on the pending object for making ionic fluid, requires complicated operations.Therefore three's cost is all higher.
The objective of the invention is to overcome the shortcoming of above-mentioned prior art, the high energy-density plasma bundle technology that will be used for controlled nuclear fusion research is introduced the material surface modifying field, thereby provide a kind of impulse high energy-density plasma treatment process that is used for material surface modifying, because the plasma beam of this moment is a carrier of energy, it is again the carrier of material, therefore the impulse high energy-density plasma bundle is used for material surface modifying, except the quick refrigerative heat effect of the rapid heating with laser beam and electron beam, also can have the effect that plasma gas phase deposition and surface-element mix concurrently, use different plasma sources and electrode materials and working gas, promptly the discrete effect can be arranged, also complex effect can be arranged.
This purpose also can improve capacity usage ratio, reduces the cost of material surface modifying, reaches a tractor serves several purposes.
The object of the present invention is achieved like this:
The present invention will be used for the high energy-density plasma bundle technology of controlled nuclear fusion research and introduce the material surface modifying field.
The device of the impulse high energy-density plasma that material surface that the present invention uses is handled is by plasma source, energy storage and discharge and recharge control section, fast-pulse intake valve, vacuum section and sample holding frame five most of general-purpose equipment of forming.Plasma source (being plasma gun) is used to produce the impulse high energy plasma body.The plasma source that the present invention adopts has two kinds, i.e. a. coaxial plasma gun, the dull and stereotyped plasma gun of b.; Energy storage and discharge and recharge the energy storage device impulse electricity that control section is used to control storage power and has arrived predetermined value; The fast-pulse intake valve is to make working gas enter the control valve of plasma gun body; Vacuum section is used for work system is vacuumized; The sample holding frame is used for the processed material of clamping by step motor control, and it can make sample translation and rotation.
The method that impulse high energy-density plasma of the present invention is used for the material surface processing is to use conventional controlled nuclear fusion to produce the device of plasma beam, processed sample is clamped with holding frame, be placed in the vacuum chamber facing to plasma body muzzle place, plasma gun is made by two coaxial electrodes or two plate electrodes, and vacuum chamber is evacuated to 10
-1-10
-3Handkerchief applies voltage then and reaches 1.5kv-100kv on two electrodes, charging back part energy discharges and makes the action of fast-pulse intake valve, and working gas is breakdown by plasma gun fast, current discharge frequency f=0.01-1Hz, pulse width τ=10-10
4μ s forms plasma beam, and is heated and quickens, and becomes the line that carries electrode materials, with directed velocity v=10-1000km/s and density n=10
13-10
19Cm
-3, the action of plasma of temperature T e=10ev-5kev is on the surface of treated material sample.
Described two coaxial electrodes or plate electrode material are metal titanium or graphite; Described working gas is ammonia or argon gas; The voltage Vpoff=1.5kv-3kv of described fast-pulse intake valve; Air reservoir pressure P t=0.02 MPa~2 MPa.
The present invention has following advantage:
1. realize that the gas-solid element mixes altogether, utilize the solid material that required to mix to make electrode, under bigger rifle electric current,, can realize that the gas-solid element mixes altogether, enter material surface by the sputter of plasma body.The different elements that mix after the bombardment have different influences to the material surface performance.
2. existing laser beam and electron beam high speed quenching effect have the ionic fluid element to mix effect and plasma gas phase deposition effect again.
3. strong higher by 10 than ion implantation apparatus ion beam current
3~6Doubly.
4. material is after the bombardment of pulse plasma beam, and its mechanical property is strengthened.
Be elaborated below in conjunction with specific embodiments.
Fig. 1 (A) be primary sample and processed after the specimen material surface hardness with the change curve of sparking voltage.
Fig. 1 (B) be primary sample and processed after the curve that changes with the bombardment number of times of specimen material surface hardness.
Fig. 2 (A) is the laser raman scattering spectrogram of diamond-film-like.
Fig. 2 (B) is the Auger depth spectrum of quasi-diamond and titanium carbide hybrid films on the steel base.
Electrode is the titanium electrode in selecting for use, dispatch from foreign news agency is the coaxial electrode done of Graphite Electrodes very, select for use the CrMoNi chilled cast iron as processed material, scantling is 25 * 100mm, the material surface polishing, the microhardness of starting materials is HV50 746 (with reference to the ASTM standard), processed chilled cast iron is clamped with the holding frame of clamping material after the acetone ultrasonic cleaning, put into vacuum chamber, muzzle is facing to material, and with the distance of material surface be 260mm, it is Pv=10 that vacuum chamber is evacuated down to vacuum tightness
-3Pa, air reservoir pressure P t=0.1MPa, adjust the parameter in the pull up circuit, by charging energy is stored in accumulator, the control voltage of fast-pulse intake valve is Vpoff=2.0kv, and working gas is a nitrogen, the discharge of part accumulator, control fast-pulse intake valve, make inlet open, nitrogen is sprayed in the coaxial plasma gun body by the rifle end, and rifle body and processed material are in the atmosphere of nitrogen, another part accumulator electric capacity is underdamping state, by the internal and external electrode discharge of rifle body, the work rifle of internal and external electrode is pressed for Vgun=20kv, under bigger rifle electric current, current pulse width=60 μ s, discharge frequency f=0.01Hz will enter the intravital nitrogen of rifle and puncture, and form plasma body and plasma heating is quickened, become impulse high energy-density plasma, the density n=10 of plasma body
19Cm
-3Temperature is Te=15ev, directed velocity V=1000km/s, when plasma body moves in bore, make that internal and external electrode material titanium sputters out in the plasma gun, realization gas (plasma body), solid element are mixed altogether, and take one and play motion, speed change, alternating temperature and be mingled with the plasma body ejection muzzle of electrode materials, act on and enter processed material surface, bombard 50 times,, realized the modification of material at the film of the good containing metal titanium of the deposition one deck on its surface smooth smooth and matrix bond.
Treatment process as previously mentioned, material is after pulse bombardment, the microhardness of chilled cast iron material surface has all improved 35%-85% and has seen accompanying drawing 1 (B).Have the nitrogenize cenotype to generate in the modification top layer of material, and the experience wear test as can be known, after material surface is subject to processing, than starting materials anti-friction wear-resistant.
Bombardment number of times 20 times
Vgun is 35KV, and other working conditions, working gas, processed material etc. are identical with embodiment 1.
Treatment process as previously mentioned, sample surfaces after treatment, its surperficial microhardness has all obtained raising in various degree.See accompanying drawing 1 (A).
Select for use the conventional controlled nuclear fusion with the coaxial plasma source of 5KV to produce the device of plasma beam, its internal and external electrode all is a Graphite Electrodes, selects (CH for use
4+ H
2) gas is as working gas, selects for use silicon single crystal as handling material, surface finish is cleaned through acetone, and material is put into vacuum chamber, and the distance between muzzle and material surface is 140mm, and treatment condition are as follows:
Vgun=2.5KV,Vpuff=2.0KV,τ=60us,f=0.01HZ
Pt=0.12MPa,Pv=10
-3Pa
Treatment process as mentioned above, material after 150 bombardments, at its surface deposition one smooth smooth and matrix bond good film, by the laser raman scattering spectrum of film as can be known, this film is diamond-film-like or amorphous hydrocarbon film (a-C:H film), sees accompanying drawing 2 (A).
Embodiment 4
Select for use conventional controlled nuclear fusion to produce the device of plasma beam with the coaxial plasma source of 50KV, its interior electrode is the titanium electrode, dispatch from foreign news agency is Graphite Electrodes very, selects for use argon gas (Ar) as working gas, select for use the surface through the monocrystalline silicon piece of polished and cleaned as body material.Adjust the circuit parameter in the pull up circuit, make the electrical condenser discharge, make the material of internal and external electrode all obtain sputter for underdamping state.Distance between muzzle and material surface is 200mm, and treatment condition are as follows:
Vgun=30KV,Vpuff=2.0KV,τ=120us,f=0.01HZ
Pt=0.1MPa,Pv=10
-3Pa
Treatment process as mentioned above, material after 50 bombardments, at its surface deposition one smooth smooth and matrix bond good, the carbon film of containing metal titanium is seen accompanying drawing 2 (B)
Select for use and have the dull and stereotyped rifle of 5KV produces plasma beam as the conventional controlled nuclear fusion of plasma source device, its plate electrode material is a metal titanium, select for use argon gas (Ar) as working gas, select for use the surface through the monocrystalline silicon piece of polished and cleaned as body material.Treating processes is carried out in atmosphere, and before the flat board discharge, the control electromagnetic intake valve is opened earlier, charges into working gas by the rifle end, and dull and stereotyped rifle and modification sample are in the middle of the atmosphere of working gas, and then triggers dull and stereotyped rifle discharge, bombardment sample.Sample is placed on the exit end of dull and stereotyped rifle.Treatment condition are as follows:
Vgun=3.0KV,Pt=2kgf/cm,τ=60us,f=0.01HZ
The bombardment number of times is: 30 times
Sample surfaces after the processing has deposited evenly fine and closely woven metal titanium membrane of one deck.
Claims (3)
1. an impulse high energy-density plasma is used for material surface treatment method, use conventional controlled nuclear fusion to produce the device of plasma beam, processed sample is clamped with holding frame, be placed in the vacuum chamber facing to plasma body muzzle place, plasma gun is made by two coaxial electrodes or two plate electrodes, and vacuum chamber is evacuated to 10
-1-10
-3Handkerchief applies voltage then and reaches 1.5kv-100kv on two electrodes, charging back part energy discharges and makes the action of fast-pulse intake valve, and working gas is breakdown by plasma gun fast, current discharge frequency f=0.01-1 Hz pulse width τ=10-10
4μ s forms plasma beam, and is heated and quickens, and becomes the line that carries electrode materials, with directed velocity v=10-1000kv/s and density n=10
13-10
19Cm
-3, the action of plasma of temperature T e=10ev-5kev is on the surface of treated material sample.
2. be used for the method that material surface is handled by the described impulse high energy-density plasma of claim 1, it is characterized in that working gas is nitrogen or argon gas.
3. be used for the method that material surface is handled by the described impulse high energy-density plasma of claim 1, it is characterized in that described two coaxial electrodes or plate electrode material are metal titanium or graphite.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 93107530 CN1038262C (en) | 1993-07-03 | 1993-07-03 | Method for surface treatment of material by using pulsed high energy density plasma |
Applications Claiming Priority (1)
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---|---|---|---|
CN 93107530 CN1038262C (en) | 1993-07-03 | 1993-07-03 | Method for surface treatment of material by using pulsed high energy density plasma |
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CN1097223A CN1097223A (en) | 1995-01-11 |
CN1038262C true CN1038262C (en) | 1998-05-06 |
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Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
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CN100385034C (en) * | 1999-12-23 | 2008-04-30 | 西南交通大学 | Process for preparing TiO2-X membrane on material using plasma submerged ion implantation method and application thereof |
JP5189256B2 (en) * | 2006-07-06 | 2013-04-24 | 株式会社ソディック | Electron beam irradiation surface modification equipment |
CN101760709B (en) * | 2009-12-28 | 2012-06-06 | 东北大学 | Method for making rare earth elements uniformly distributed on surface of aluminum-silicon alloy |
CN101974298A (en) * | 2010-11-11 | 2011-02-16 | 复旦大学 | Method for processing metal surface by using argon plasma |
CN105463386B (en) * | 2014-09-30 | 2018-10-12 | 芝浦机械电子装置株式会社 | Film formation device and substrate for film deposition manufacturing method |
CN104651569B (en) * | 2015-03-02 | 2016-10-12 | 江西省科学院应用物理研究所 | A kind of surface modifying method of cast iron |
CN105316472B (en) * | 2015-08-13 | 2017-11-17 | 江苏大学 | A kind of method and device for improving induced with laser shock wave pressure |
CN105269413B (en) * | 2015-09-25 | 2018-01-16 | 安庆市凯立金刚石科技有限公司 | A kind of diamond film polishing method |
CN106435430B (en) * | 2016-12-13 | 2019-02-05 | 江西省科学院应用物理研究所 | A method of improving thermal spraying MCrAlY coating antioxygenic property |
CN109847580B (en) * | 2019-03-21 | 2022-04-08 | 青岛大学 | Denitration filter material based on plasma pretreatment and impregnation method and preparation method thereof |
CN109847807B (en) * | 2019-03-21 | 2022-04-08 | 青岛大学 | Denitration filter material based on plasma treatment and in-situ deposition method and preparation method thereof |
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1993
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