CN103809382B - For lithographic equipment even smooth regulating device and use the illuminator of this device - Google Patents
For lithographic equipment even smooth regulating device and use the illuminator of this device Download PDFInfo
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- CN103809382B CN103809382B CN201210437459.9A CN201210437459A CN103809382B CN 103809382 B CN103809382 B CN 103809382B CN 201210437459 A CN201210437459 A CN 201210437459A CN 103809382 B CN103809382 B CN 103809382B
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Abstract
The present invention discloses a kind of even smooth regulating device for lithographic equipment, this even smooth regulating device comprises an enclosed volume formed by optical lens, the built-in conducting solution of this enclosed volume, the external electric field controllable of this enclosed volume, changes this conducting solution refractive index to change the light penetration of this even smooth regulating device by the voltage changing this electric field controllable.The present invention is a kind of illuminator for lithographic equipment simultaneously.
Description
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, particularly relate to a kind of even smooth regulating device for lithographic equipment and use the illuminator of this device.
Background technology
In the illuminator of lithographic equipment, illumination heterogeneity can change in time.Lighting condition changes, i.e. Sigma change, the difference that illuminated field also can be caused to distribute and silicon chip face light distribution difference, for different lighting condition, illumination uniformity can change.Therefore, need to do suitable adjustment and compensation, under meeting different lighting condition, illumination profile is even.
By changing the axial location of pre-horizontal glass group in illuminator, or about X, Y-axis tilts, can correct for illumination heterogeneity.But pre-horizontal glass group is generally made up of the eyeglass with certain curvature, causes the homogeneity of mask face illuminating bundle coherence factor Sigma to be destroyed sometimes, thus the wide homogeneity of silicon chip upper thread is reduced, live width control accuracy reduces.Along with live width is more and more narrow, require also higher to live width control accuracy.Therefore, require that bearing calibration should make light field even further, do not destroy again the homogeneity of coherence factor Sigma.Utilize have certain transmitance distribution the field distribution of thin flat plate correct for illumination, usually to coherence factor and illumination centrifugal impression less.
In prior art, three common classes regulate the method for illumination uniformity to have: regulate illumination system elements, utilize other element to change ray angles and transmitance correcting device.Even smooth method of throwing light on utilizes transmitance correcting device to carry out evenly light source.By in the even smooth regulating device of Apodzier(in patent US6771350, US5798824 and US6404499) plated film realizes transmitance change.As shown in fig. 1, Fig. 1 is the structural representation of even smooth regulating device disclosed in patent US6404499.Improve transmitance by plated film in even smooth regulating device in prior art, as shown in Figure 2, Fig. 2 is the schematic diagram of the transmitance of the even smooth regulating device of prior art.Even smooth regulating device can produce twice function transmittance curve of continually varying symmetry in certain limit in X-axis, and Y-axis is uniformly distributed.The shortcoming of the even light regulation method used in prior art is singlely to regulate symmetrical Quadratic Non-Uniform.
Summary of the invention
In order to overcome the defect existed in prior art, the invention provides a kind of even smooth regulating device for lithographic equipment and using the illuminator of this device, the non-uniformity in illuminator can be solved.
In order to realize foregoing invention object, the present invention discloses a kind of even smooth regulating device for lithographic equipment, and this even light regulates dress
Put and comprise an enclosed volume formed by optical lens, the built-in conducting solution of this enclosed volume, the external electric field controllable of this enclosed volume, changes this conducting solution refractive index to change the light penetration of this even smooth regulating device by the voltage changing this electric field controllable.
Further, this electric field controllable is made up of the transistor being marked with conducting solution.
Further, this optical lens comprises the first flat-plate lens and the second flat-plate lens.
The present invention discloses a kind of illuminator for lithographic equipment simultaneously, comprising: mercury lamp, coupled lens group, quartz pushrod, even
Light regulating device, relay lens group and mask plate, the light that this mercury lamp sends forms a uniform illumination field of view successively after this coupled lens group, quartz pushrod, even smooth regulating device, relay lens group on this mask plate; This even smooth regulating device comprises an enclosed volume formed by optical lens, the built-in conducting solution of this enclosed volume, the external electric field controllable of this enclosed volume, changes this conducting solution refractive index to change the light penetration of this even smooth regulating device by the voltage changing this electric field controllable.
Further, this electric field controllable is made up of the transistor being marked with conducting solution.
Further, this optical lens comprises the first flat-plate lens and the second flat-plate lens.
Further, this illuminator also comprises a detector, for detecting the heterogeneity characteristic curve on this mask plate.This illuminator also comprises a test cell and an electric control unit, and this test cell is according to this heterogeneity characteristic curve Calculation results, and this electric control unit controls the voltage of this electric field controllable voltage according to this analysis result.This even smooth regulating device is positioned at the conjugate plane of this mask plate.
Compared with prior art, a kind of even smooth regulating device for lithographic equipment provided by the present invention and use the illuminator of this device can produce twice function transmittance curve of continually varying symmetry in certain limit in X-axis, Y-axis is uniformly distributed.This patent is that electric field produces continually varying electric field in certain limit in X-axis, changes refractive index, then changes optical path difference, finally realizes transmitance change.Easily on even smooth regulating device face, changeable transmitance change curve figure is obtained by changing voltage compare.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is the structural representation of even smooth regulating device disclosed in patent US6404499;
Fig. 2 is the schematic diagram of the transmitance of the even smooth regulating device of prior art;
Fig. 3 is the structural representation of illustrated illuminator;
Fig. 4 is the schematic diagram of illustrated even smooth regulating device;
Fig. 5 is the energy diagram that the mask face of illustrated illuminator detects;
Fig. 6 is the technique effect schematic diagram of illustrated illuminator;
Fig. 7 is the control of illustrated illuminator and the structural representation of monitoring modular.
Embodiment
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
The even smooth regulating device used in prior art singlely can only regulate symmetrical Quadratic Non-Uniform, the invention provides a kind of even smooth regulating device being realized transmitance change by electric field change, can the heterogeneity of compensating illumination system.
In order to realize foregoing invention object, even smooth regulating device provided by the present invention comprises optical lens, conducting solution, electric field controls group.In the optical lens closed, load conducting solution, optical lens is isolated into numerous electric field controllable.Wherein electric field controllable is made up of the transistor being marked with conducting liquid, and upper and lower side has a both positive and negative polarity.By changing transistor both end voltage, thus change the refractive index of transistor, the final incident light beam strikes that changes is to the transmitance on transistor.Namely there is the consistent electrode tube of arrangement in non-scan direction, by the electrode tube that these are controlled, conducting solution arrangement is controlled, thus realizes conducting solution and can change to absorbing incident light.
One of the better embodiment of illumination provided by the present invention, system is described below with reference to Fig. 3.As shown in Figure 3, this illuminator comprises high-pressure sodium lamp 1, coupled lens group 2, quartz pushrod 3, relay lens group 4, even smooth regulating device (Apodizer) 7 and mask plate 5.The light that mercury lamp 1 sends incides the incident end face 2a of coupled lens 2 after ellipsoidal reflector is assembled.Light beam from outgoing end face 2b outgoing, is irradiated to the incident end face 3a of quartz pushrod 3 after the converging action of coupled lens 2.Light beam in quartz pushrod 3 after multiple total reflection, quartz pushrod outgoing end face 3b forms uniform illumination light, these Uniform Illumination light are from quartz pushrod outgoing end face 3b outgoing, after the amplification, transmitting effect of relay lens group 4, finally be imaged on mask plate 5, the illumination field of view with certain numerical value aperture, size and homogeneity needed for mask plate 5 is formed.But desirable uniform field can not be produced on mask plate 5, so to go to compensate by a dodging device.Wherein 7 is exactly an even smooth regulating device (Apodizer), and detector 6 is used for monitoring homogeneity on mask plate 5.Even smooth regulating device 7 is roughly in the outbound port of quartz pushrod 3 in whole illuminator, i.e. in the conjugate plane of mask plane 5.So just well can control the heterogeneity in mask plane 5.
Because system reason can cause mask plane 5 being produced heterogeneity change in whole illuminator.This even smooth regulating device 7(Apodizer) be just in the conjugation of mask plane 5.Then analyze by spotsize, the RMSradius of this even smooth regulating device hot spot, the heart far away, distortion, enlargement ratio impact.Nonuniformity compensation is realized eventually through this device of change.
Fig. 4 is the schematic diagram of illustrated even smooth regulating device.The principle of work of this even smooth regulating device, for change refractive index by voltage, then changes optical path difference, finally realizes transmitance change.As shown in Figure 4, this even smooth regulating device comprises optical lens (not shown), conducting solution 15, electric field controls group.Two panels optical lens forms an enclosed volume 14, loads conducting solution 15 in this enclosed volume 14.Optical lens is isolated into numerous electric field controllable.Wherein electric field controllable is made up of the transistor 13 being marked with conducting liquid, and upper and lower side has a both positive and negative polarity, and in Fig. 4,11 is positive electric field arrangement, and 12 is negative electric field arrangement.By changing transistor 13 both end voltage, thus change the refractive index of transistor, the final incident light beam strikes that changes is to the transmitance on transistor.Namely there is the consistent electrode tube of arrangement in non-scan direction, by the electrode tube that these are controlled, conducting solution arrangement is controlled, arranges inconsistent conducting solution and can change to absorbing incident light.
Shown in Fig. 4, electric field E is arranged evenly from left to right, by external control circuit plate, implements to control separately to each electric field.Control the change of voltage on whole x-axis direction.Can realize exporting transmittance function equation by change in voltage is F (X)=a1*X+b1*X2+offset.F (X) representative transmitance size in whole distribution field, unit is %; X is space displacement, and unit is mm.A1, b1 are related coefficient, work as a1=0, and during b1=0, even smooth regulating device 7 is equally distributed.Two parts can be decomposed into: Part I once tilts, and relates to the position of exposure field in non-scan direction (X-direction) according to illumination heterogeneity.Second is the part with quadratic distribution (convex/recessed distribution).Transmittance function has the distribution of function F (X) about X position, and establishes coefficient a1 to represent a sloping portion, and coefficient b1 represents convex/recessed Distributed parts of secondary.Quadratic distribution (convex/recessed distribution) is about the axisymmetric part of light.Utilize detector 6 to scan illuminated field, show that the distribution curve of direction of scanning integration light intensity in non-scan direction is as Fig. 5.Wherein Fig. 1 b relative to transmitance scatter chart.Work as a1, b1, offset(side-play amount) when not being 0, as curve a in figure; When a1 be not 0, b1 and offset is 0, as curve b in figure, when a1 and offset be 0, b1 is not 0, as curve c in figure.Curve a is approximately decomposed into linear b and c, has once and quafric curve.Shown in Fig. 6 by result schematic diagram after the even light of even smooth regulating device 7.
In order to realize above-mentioned technique effect, need the series of parameters determining this even smooth regulating device and illuminator, the method determined is specific as follows:
The first step accurately determines even smooth regulating device position and thickness by software simulation.When even smooth regulating device thickness and spacing change, distortion and the heart far away of image space have almost no change, but determine that the spotsize of picture element changes greatly, and have exceeded design load.By analyzing, the optical dimensions of preliminary selected even smooth regulating device is 104mm × 48mm × 3.5mm, then according to actual assessment Yun Guang regulating device mechanical dimension.Because spotsize (enclosedenergy80%), determine the penumbra width of picture element, affect image quality.Add the spotsize<0.35mm (enclosedenergy80%) after even smooth regulating device.For selected later even smooth regulating device, need to carry out a comprehensive assessment.
Second step adds the different visual fields RMSradius fiducial value before and after even smooth regulating device by software simulation computational analysis, as shown in table 1:
| Field | Before adding/um | After adding/um |
| 1 | 234.8 | 270.17 |
| 2 | 217.01 | 254.88 |
| 3 | 185.05 | 228.31 |
| 4 | 155.56 | 205.19 |
| 5 | 171.56 | 217.62 |
| 6 | 193.23 | 235.1 |
| 7 | 222.46 | 259.67 |
| 8 | 239.57 | 274.48 |
| 9 | 258.18 | 290.87 |
Table 1
3rd step adds the heart far away before and after even smooth regulating device by software simulation computational analysis, and the heart far away of Relaylens is defined as the angle of image space chief ray and optical axis, design load≤1.5mrad.Table 2 represents the center value far away added before and after even smooth regulating device, and its analysis result is without impact.
| Visual field/mm | The heart/mrad far away before adding | Add the rear heart/mrad far away |
| 16 | 0.286 | 0.297 |
| 14.4 | 0.134 | 0.163 |
| 12.8 | 0.021 | 0.068 |
| 11.2 | 0.057 | 0.004 |
| 9.6 | 0.105 | 0.045 |
| 8 | 0.127 | 0.068 |
| 6.4 | 0.127 | 0.075 |
| 4.8 | 0.111 | 0.068 |
| 3.2 | 0.081 | 0.051 |
| 1.6 | 0.043 | 0.027 |
Table 2
4th step adds the amount of distortion before and after even smooth regulating device by software simulation computational analysis, the distortion value <0.05% of design, and object is that to ensure to be amplified to after in mask plane can be still equally distributed rectangular field.Table 3 represents the amount of distortion added before and after even smooth regulating device, and its analysis result is without impact.
| Visual field/mm | Distortion/% | Distortion/% |
| 16 | 0.04 | 0.04 |
| 15.5 | 0.037 | 0.037 |
| 15 | 0.035 | 0.035 |
| 14 | 0.03 | 0.031 |
| 13 | 0.026 | 0.026 |
| 10 | 0.016 | 0.016 |
| 7 | 0.008 | 0.008 |
| 4 | 0.003 | 0.003 |
| 0 | 0 | 0 |
Table 3
5th step adds topmost uniformity index on the mask plate before and after even smooth regulating device by software simulation computational analysis, finally realizes demand.
| Top homogeneity | Integral uniformity | The heart far away of maximum field of view | |
| Design load | ＜2.00% | ＜1.00% | ≤1.50mrad |
| Before adding | ＜3.47% | ＜2.78% | ≤1.22mrad |
| After adding | ＜1.00% | ＜0.60% | ≤1.11mrad |
Table 4
As above-mentioned steps can determine the physical construction of this even smooth regulating device, size.
Fig. 7 is the control of illustrated illuminator and the structural representation of monitoring modular.In this illuminator, in mask plane 5 non-scan direction, a detector 6 is installed, is used for monitoring heterogeneity characteristic curve in mask plane 5.Obtained characteristic curve diagram again by test cell 30 computational analysis, pass to electric control unit 20 by result will be controlled.Each single electric field can be independent go control break.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (9)
1. the even smooth regulating device for lithographic equipment, it is characterized in that, described even smooth regulating device comprises an enclosed volume formed by optical lens, the built-in conducting solution of described enclosed volume, the external electric field controllable of described enclosed volume, changes the refractive index of described conducting solution to change the light penetration of described even smooth regulating device by the voltage changing described electric field controllable.
2., as claimed in claim 1 for the even smooth regulating device of lithographic equipment, it is characterized in that, described electric field controllable is made up of the transistor being marked with conducting solution.
3., as claimed in claim 1 for the even smooth regulating device of lithographic equipment, it is characterized in that, described optical lens comprises the first flat-plate lens and the second flat-plate lens.
4. the illuminator for lithographic equipment, comprise: mercury lamp, coupled lens group, quartz pushrod, even smooth regulating device, relay lens group and mask plate, the light that described mercury lamp sends forms a uniform illumination field of view successively after described coupled lens group, quartz pushrod, even smooth regulating device, relay lens group on described mask plate; It is characterized in that, described even smooth regulating device comprises an enclosed volume formed by optical lens, the built-in conducting solution of described enclosed volume, the external electric field controllable of described enclosed volume, changes the refractive index of described conducting solution to change the light penetration of described even smooth regulating device by the voltage changing described electric field controllable.
5., as claimed in claim 4 for the illuminator of lithographic equipment, it is characterized in that, described electric field controllable is made up of the transistor being marked with conducting solution.
6., as claimed in claim 4 for the illuminator of lithographic equipment, it is characterized in that, described optical lens comprises the first flat-plate lens and the second flat-plate lens.
7., as claimed in claim 4 for the illuminator of lithographic equipment, it is characterized in that, described illuminator also comprises a detector, for detecting the heterogeneity characteristic curve on described mask plate.
8. as claimed in claim 7 for the illuminator of lithographic equipment, it is characterized in that, described illuminator also comprises a test cell and an electric control unit, described test cell is according to described heterogeneity characteristic curve Calculation results, and described electric control unit controls the voltage of described electric field controllable according to described analysis result.
9., as claimed in claim 4 for the illuminator of lithographic equipment, it is characterized in that, described even smooth regulating device is positioned at the conjugate plane of described mask plate.
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| CN201210437459.9A CN103809382B (en) | 2012-11-06 | 2012-11-06 | For lithographic equipment even smooth regulating device and use the illuminator of this device |
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| CN109426091B (en) * | 2017-08-31 | 2021-01-29 | 京东方科技集团股份有限公司 | Exposure apparatus, exposure method, and photolithography method |
| CN109917544A (en) * | 2019-03-19 | 2019-06-21 | 北京遥感设备研究所 | A kind of transmission-type scanning is steady as optical system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6404499B1 (en) * | 1998-04-21 | 2002-06-11 | Asml Netherlands B.V. | Lithography apparatus with filters for optimizing uniformity of an image |
| CN102221785A (en) * | 2010-04-14 | 2011-10-19 | 上海微电子装备有限公司 | Photolithographic illumination device using mercury lamp light source |
| CN102375238A (en) * | 2011-11-08 | 2012-03-14 | 中国科学院上海光学精密机械研究所 | Micro cylindrical mirror array for generating uniform illumination and designing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3571945B2 (en) * | 1998-12-07 | 2004-09-29 | キヤノン株式会社 | Illumination apparatus and projection exposure apparatus using the same |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6404499B1 (en) * | 1998-04-21 | 2002-06-11 | Asml Netherlands B.V. | Lithography apparatus with filters for optimizing uniformity of an image |
| CN102221785A (en) * | 2010-04-14 | 2011-10-19 | 上海微电子装备有限公司 | Photolithographic illumination device using mercury lamp light source |
| CN102375238A (en) * | 2011-11-08 | 2012-03-14 | 中国科学院上海光学精密机械研究所 | Micro cylindrical mirror array for generating uniform illumination and designing method thereof |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |