CN103794715B - 一种基于电压控制的磁存储器 - Google Patents
一种基于电压控制的磁存储器 Download PDFInfo
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- CN103794715B CN103794715B CN201410072318.0A CN201410072318A CN103794715B CN 103794715 B CN103794715 B CN 103794715B CN 201410072318 A CN201410072318 A CN 201410072318A CN 103794715 B CN103794715 B CN 103794715B
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- 230000005291 magnetic effect Effects 0.000 title claims abstract description 83
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 230000004888 barrier function Effects 0.000 claims abstract description 18
- 230000005290 antiferromagnetic effect Effects 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 19
- RIVZIMVWRDTIOQ-UHFFFAOYSA-N cobalt iron Chemical compound [Fe].[Co].[Co].[Co] RIVZIMVWRDTIOQ-UHFFFAOYSA-N 0.000 claims description 15
- 239000007769 metal material Substances 0.000 claims description 15
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 10
- 229910019236 CoFeB Inorganic materials 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- 239000000395 magnesium oxide Substances 0.000 claims description 8
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 8
- 230000005294 ferromagnetic effect Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- 229910003321 CoFe Inorganic materials 0.000 claims description 6
- 229910000863 Ferronickel Inorganic materials 0.000 claims description 6
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 6
- 229910019041 PtMn Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 230000000694 effects Effects 0.000 claims description 5
- IGOJMROYPFZEOR-UHFFFAOYSA-N manganese platinum Chemical compound [Mn].[Pt] IGOJMROYPFZEOR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 3
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 3
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 238000001259 photo etching Methods 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 230000005641 tunneling Effects 0.000 claims description 3
- LBJNMUFDOHXDFG-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu].[Cu] LBJNMUFDOHXDFG-UHFFFAOYSA-N 0.000 claims description 2
- 229910052593 corundum Inorganic materials 0.000 claims description 2
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 claims description 2
- 238000000407 epitaxy Methods 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Chemical compound O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 230000008859 change Effects 0.000 abstract description 13
- 238000003860 storage Methods 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 89
- 238000010586 diagram Methods 0.000 description 10
- 238000001514 detection method Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 238000013500 data storage Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000002061 nanopillar Substances 0.000 description 2
- 230000008520 organization Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000013517 stratification Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000002885 antiferromagnetic material Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 229910000836 magnesium aluminium oxide Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000004223 radioprotective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1675—Writing or programming circuits or methods
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Hall/Mr Elements (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
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CN201410072318.0A CN103794715B (zh) | 2014-02-28 | 2014-02-28 | 一种基于电压控制的磁存储器 |
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CN201410072318.0A CN103794715B (zh) | 2014-02-28 | 2014-02-28 | 一种基于电压控制的磁存储器 |
Publications (2)
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CN103794715A CN103794715A (zh) | 2014-05-14 |
CN103794715B true CN103794715B (zh) | 2016-09-28 |
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Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104134748B (zh) * | 2014-07-17 | 2017-01-11 | 北京航空航天大学 | 一种信息传感及存储器件及其制备方法 |
CN105374934B (zh) * | 2015-12-01 | 2018-02-06 | 中电海康集团有限公司 | 一种应力辅助自旋转移扭矩磁电阻随机存储器及其制备、使用方法 |
CN107785481B (zh) * | 2016-08-25 | 2021-10-29 | 中电海康集团有限公司 | 一种三端式磁性随机存储器及其读写方法 |
CN106449970B (zh) * | 2016-11-03 | 2019-03-15 | 北京航空航天大学 | 一种低功耗磁性存储单元 |
CN106654002B (zh) * | 2016-11-03 | 2018-12-04 | 北京航空航天大学 | 一种低功耗磁性多阻态存储单元 |
CN109994599A (zh) * | 2017-12-29 | 2019-07-09 | 中国科学院半导体研究所 | 压电式磁性随机存储器及其制备方法 |
CN110061127B (zh) * | 2019-05-20 | 2023-08-08 | 中国科学院微电子研究所 | 磁隧道结的形成方法及磁阻式随机存储器 |
CN113330592A (zh) * | 2019-11-22 | 2021-08-31 | 西部数据技术公司 | 包括高介电常数帽盖层的磁阻存储器设备及其制造方法 |
CN111834522B (zh) * | 2020-07-31 | 2022-07-29 | 北京航空航天大学 | 磁性随机存储器、装置及读写控制方法 |
CN113791737B (zh) * | 2021-09-15 | 2024-02-02 | 北京航空航天大学 | 一种非易失性存储阵列的软错误检测方法及装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US8004881B2 (en) * | 2007-12-19 | 2011-08-23 | Qualcomm Incorporated | Magnetic tunnel junction device with separate read and write paths |
CN101866738B (zh) * | 2009-04-17 | 2012-06-27 | 中国科学院物理研究所 | 一种垂直磁各向异性的多层膜 |
WO2012159078A2 (en) * | 2011-05-19 | 2012-11-22 | The Regents Of The University Of California | Voltage-controlled magnetic anisotropy (vcma) switch and magneto-electric memory (meram) |
WO2013012800A2 (en) * | 2011-07-15 | 2013-01-24 | The Johns Hopkins University | Magneto-electronic devices and methods of production |
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TR01 | Transfer of patent right |
Effective date of registration: 20210303 Address after: 100191 rooms 504a and 504b, 5th floor, 23 Zhichun Road, Haidian District, Beijing Patentee after: Zhizhen storage (Beijing) Technology Co.,Ltd. Address before: 100191 No. 37, Haidian District, Beijing, Xueyuan Road Patentee before: BEIHANG University |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20231227 Address after: Room 1605, Building 1, No. 117 Yingshan Red Road, Huangdao District, Qingdao City, Shandong Province, 266400 Patentee after: Qingdao Haicun Microelectronics Co.,Ltd. Address before: 100191 rooms 504a and 504b, 5th floor, 23 Zhichun Road, Haidian District, Beijing Patentee before: Zhizhen storage (Beijing) Technology Co.,Ltd. |
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