CN103788583A - High-temperature resistant antistatic artificial synthetic stone and manufacturing process thereof - Google Patents
High-temperature resistant antistatic artificial synthetic stone and manufacturing process thereof Download PDFInfo
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- CN103788583A CN103788583A CN201410014254.9A CN201410014254A CN103788583A CN 103788583 A CN103788583 A CN 103788583A CN 201410014254 A CN201410014254 A CN 201410014254A CN 103788583 A CN103788583 A CN 103788583A
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- 239000002969 artificial stone Substances 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims description 10
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 45
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 39
- 239000010439 graphite Substances 0.000 claims abstract description 39
- 239000011521 glass Substances 0.000 claims abstract description 38
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000003292 glue Substances 0.000 claims abstract description 25
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 21
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims abstract description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 239000002904 solvent Substances 0.000 claims abstract description 6
- FDPIMTJIUBPUKL-UHFFFAOYSA-N dimethylacetone Natural products CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000003822 epoxy resin Substances 0.000 claims description 38
- 229920000647 polyepoxide Polymers 0.000 claims description 38
- 239000007787 solid Substances 0.000 claims description 23
- 238000003756 stirring Methods 0.000 claims description 12
- MNAHQWDCXOHBHK-UHFFFAOYSA-N 1-phenylpropane-1,1-diol Chemical compound CCC(O)(O)C1=CC=CC=C1 MNAHQWDCXOHBHK-UHFFFAOYSA-N 0.000 claims description 7
- 238000000465 moulding Methods 0.000 claims description 7
- 238000005520 cutting process Methods 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 5
- 238000010792 warming Methods 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- 235000011194 food seasoning agent Nutrition 0.000 claims description 2
- 238000009775 high-speed stirring Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 17
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- 239000011324 bead Substances 0.000 abstract 1
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- 239000004744 fabric Substances 0.000 abstract 1
- 239000004843 novolac epoxy resin Substances 0.000 abstract 1
- 238000012805 post-processing Methods 0.000 abstract 1
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- 239000011325 microbead Substances 0.000 description 12
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- 239000002086 nanomaterial Substances 0.000 description 10
- 229960001866 silicon dioxide Drugs 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
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- 239000006229 carbon black Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
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- 239000005543 nano-size silicon particle Substances 0.000 description 6
- 229910052681 coesite Inorganic materials 0.000 description 5
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- 229920013657 polymer matrix composite Polymers 0.000 description 2
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- VDGJOQCBCPGFFD-UHFFFAOYSA-N oxygen(2-) silicon(4+) titanium(4+) Chemical compound [Si+4].[O-2].[O-2].[Ti+4] VDGJOQCBCPGFFD-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
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- 230000005641 tunneling Effects 0.000 description 1
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Abstract
The invention discloses a composite composition of antistatic artificial synthetic stone. The materials of the glue solution include polybismaleimide, bisphenol A novolac epoxy resin, bisphenol A epoxy resin, nanoscale silicon dioxide, high-strength hollow glass beads and conductive carbon ink; the solvent is dimethyl formamide and/or acetone/butanone; the reinforcing material is antistatic graphite glass fiber cloth and/or graphite glass fiber felt, wherein any one or two are used. The antistatic artificial synthetic stone disclosed by the invention solves the problems in high-temperature resistance of antistatic synthetic stone, high density of antistatic synthetic stone, uniform static conduction action of antistatic synthetic stone, thermal deformation of antistatic synthetic stone and influence on the health of users and operators caused by a little toxic smoke generated in the using process of the antistatic synthetic stone since the high-temperature resistance does not meet the requirements; moreover, the product density is reduced, and the problem of serious abrasion of the post-processing tool of the user is solved.
Description
Technical field
The present invention relates to a kind of novel material and production method of utilizing the artificial synthetic stone of novel material combinations produce novel antistatic of making full use of, specially refer to the first Application in antistatic artificial synthetic stone field such as antistatic graphite glasscloth, graphite glass mat, inorganic nano material, polyimide resin, promise volt clarke type epoxy resin, hollow glass microbead, improve the temperature classification of antistatic artificial synthetic stone, thermal conductivity, thermostability, mechanical property, has improved the quality of downstream product.
Background technology
After electronics, the unleaded ban enforcement of electric product, more and more stricter to the requirement of the fixtures such as insulation test tool, wave soldering, Reflow Soldering, vapour phase reflow welding, laser reflow soldering, SMT surface mount, mistake furnace tray, mistake tin stove.Under the environment that requires to raise gradually in temperature, guarantee the consistence of its physical property, make it in wave soldering or scolding tin process, reach high-level result and do not allow the generation of any geometric deformation, be placed in 360 ℃ and be placed in for a long time the severe rugged environment of 260 ℃ of working temperatures in the short period of time, do not allow antistatic artificial synthetic stone lamination to separate, do not allow the generation of geometric deformation, can derive static in time in case electronic component electric shock is damaged, low specific heat coefficient adapts to be rapidly heated with cooling to improve work efficiency and to reduce energy consumption fast; Processing characteristics is good, and machined surface is bright and clean, not stratified, phozy, can process at one time and substantially not damage process tool.Reach high temperature resistant, low density, high life cycle, leads electrostatic interaction uniformity, free of contamination object.
Traditional antistatic synthetic stone generally adopts conventional epoxy resin and woven fiber glass and/or glassmat to make main raw, increases static inhibitor, repressed moulding.This synthetic stone short period of time is placed in 360 ℃ and the severe rugged environment major defect that is placed in for a long time 260 ℃ of working temperatures: 1: resistance to elevated temperatures is poor, easily aging under hot conditions, reduce product life cycle, add some rare earth material can not solve synthetic this key issue of stone; 2: because static inhibitor cannot be uniformly distributed, leading electrostatic interaction can not uniformity, causes the electrical breakdown of user's electronic devices and components; 3: product density is high, cause consumer products post-treatment difficulty and heat capacity at constant volume large, consume the energy and can not reach rapidly consumer products and process needed temperature, when cooling, can not reach rapidly equally consumer products and process needed normal temperature, affect user job efficiency; 4: product density is high, user is facility serious wear in the time of machining, easily produces deformation when use.
Summary of the invention
The object of the invention is fundamentally to solve: the high temperature resistant problem of 1 antistatic synthetic stone; 2 antistatic synthetic stone high-density problems and cause thus machining time tool wear problem; 3 antistatic synthetic stones are led electrostatic interaction uniformity problem; 4 antistatic synthetic stone thermal distortion problems; 5 antistatic synthetic stone use procedures are because high temperature resistant not reaching requires a small amount of toxic smog of producing to user operator's health problem that exerts an influence.
The technical solution used in the present invention is as follows:
A kind of matrix material composition of antistatic artificial synthetic stone, its glue aspect material is polybismaleimide, dihydroxyphenyl propane promise volt clarke type epoxy resin, bisphenol A type epoxy resin, nanometer grade silica, high-intensity hollow glass microballon, conductive carbon ink; Solvent adopts dimethyl formamide and/or acetone/butanone, and strongthener is antistatic graphite glasscloth and/or graphite glass mat, uses wherein any and/or two kinds of uses simultaneously.
Described strongthener is antistatic graphite glasscloth and/or graphite glass mat, uses wherein any and/or two kinds of uses simultaneously, and consumption is 40～50% of single products total mass.
Mass percent in the solids content of described glue: polybismaleimide content is 23～25%, dihydroxyphenyl propane promise volt clarke type epoxy resin content is 15～20%, bisphenol A type epoxy resin content is 40～50%, nanometer grade silica content is 2～5%, high-intensity hollow glass microballon content is 4～8%, and conductive carbon ink content is 1～3%.
A kind of production method of utilizing the artificial synthetic stone glue formula of high-temperature resistant and antistatic and strongthener to make the artificial synthetic stone of high-temperature resistant and antistatic, it is characterized in that, glue preparation: by load weighted nanometer grade silica, high-intensity hollow glass microballon, conductive carbon ink is placed in the stainless steel vessel of special manufacture, add quantitative dimethyl formamide, under 2000 revs/min of conditions, high-speed stirring 120 minutes;
Again the pulpous state powder liquid pneumatic diaphragm pump being stirred is squeezed in another stainless steel vessel, add successively polybismaleimide, dihydroxyphenyl propane promise volt clarke type epoxy resin, bisphenol A type epoxy resin, add quantitative acetone and/or butanone, under 50 revs/min of conditions, stir 120 minutes, form glue, place stand-by after 30 minutes; Above-mentioned glue is immersed on graphite glasscloth equably, or coated is on graphite glass mat equably, hot-air seasoning becomes prepreg, cut into 105 centimetres of 125 cm x, coincide by the artificial synthetic stone thickness requirement of high-temperature resistant and antistatic, the film coinciding is put into vacuum pressing equipment, progressively be warming up to 270 ℃, be forced into 5MPa by the mode of echelon intensification pressurization, moulding in 120 minutes cuts into specified dimension by user's requirement on infrared cutting machine, and test package delivers from godown.
Compared with the prior art, beneficial effect of the present invention is as follows:
Bismaleimides (BMI) resin that the present invention adopts is the crosslinked polyimide of a class excellent performance, have the good high temperature resistant and moisture-resistance of polyimide concurrently, can adopt and the similar moulding process of epoxy resin, and compared with other condensation polymer type polyimide, in forming process, do not have small-molecule substance to emit.In epoxy resin, introduce after bismaleimides, because the reason of the aspects such as both polymerization mechanism differences and consistency can form interpenetrating(polymer)networks or two-phase system in polymerization process, thereby reach toughness reinforcing and improve stable on heating object; Equally, dihydroxyphenyl propane promise volt clarke type epoxy resin can further improve the synthetic high temperature resistant grade of stone, makes synthetic stone long term operation temperature reach 260 ℃, moment working temperature reach 360 ℃, guarantee that synthetic stone product is not stratified, non-foaming.
As long as 2 can be distributed to nanometer silicon dioxide particle in resin material fully, equably, can reach comprehensive object of improving resin-based materials performance completely.Nano silicon oxide has the special optical performance that conventional SiO2 does not have, and it has extremely strong uv-absorbing, infrared external reflection characteristic.Show through ultraviolet one visible spectrophotometer test, it to wavelength 400nm with interior uv absorption rate up to more than 70%, infrared reflectivity beyond wavelength 800nm is also reached more than 70%, reach the object of anti-ultraviolet ageing and thermal ageing, increased the sticking power between thermal insulation and resin and the strongthener of product.There is following functions simultaneously:
1, improve intensity and unit elongation.Epoxy resin is basic resin material, nano silicon is added in epoxy resin, structurally be different from the epoxy resin-base composite material that coarse-grain silicon-dioxide (white carbon black etc.) adds completely, coarse-grain SiO2 generally adds as strengthening agent, it is mainly distributed in the interchain of macromolecular material, and nano silicon is due to the serious coordination deficiency in surface, the features such as huge specific surface area and surface are oxygen debt, make it show extremely strong activity, be easy to play bonding action with the oxygen of epoxy ring molecule, improve intermolecular bonding force, still be distributed in the space of macromolecular chain with some nanometer silicon dioxide particle of fashion, with the comparison of coarse-grain SiO2 Particle Phase, show very high stream ripples, thereby the epoxide resin material intensity that nano silicon is added, toughness, ductility all increases substantially.
2, improve wear resistance and improve the smooth finish of material surface.Nanometer silicon dioxide particle is less 100-1000 times than SiO2, is added in epoxy resin, is conducive to draw wire.Due to high workability and the small-size effect of nano silicon, make material surface more fine and close carefully clean, frictional coefficient diminishes, and the high strength of nano particle in addition strengthens the wear resistance of material greatly.
3, ageing resistance.In epoxy resin-base composite material use procedure, a fatal weakness is that ageing resistance is poor, its reason is mainly in electronic product welding process, in the ultraviolet ray of 280-400nm wave band of radiation, long wave effect, it is very serious to the destruction of polymer matrix composites, and the degraded of macromolecular chain causes polymer matrix composites aging rapidly.And nano silicon uv reflectance consumingly joins in resin system and can greatly reduce the Degradation of ultraviolet ray to epoxy resin, delay material aging thereby reach, the object increasing the service life.
4, the volume effect of nanometer Si02 and quantum tunneling effect make it produce osmosis, what can be deep into macromolecular compound " near key; overlap with its electronic cloud; form space reticulated structure, thereby has increased substantially mechanical strength, toughness, wear resistance and the ageing resistance etc. of macromolecular material.
5 synthetic stone users require synthetic stone body, table to have the electrostatic capacity of leading of uniformity, and general requirement is (10
7～10
9) between Ω, traditional synthetic stone is owing to using material and making method aspect, leads electrostatic efficiency undesirable, occurs that the inside and outside electrostatic efficiency of leading is inconsistent, occurs even the not antistatic situation in part.The antistatic network of the common formation of antistatic carbon ink that the present invention utilizes antistatic graphite glasscloth, graphite glass mat and stirs, guarantees inside and outside synthetic stone product and the consistence of the antistatic effect of product each point.
6, the application of hollow glass micropearl, has reduced product density, solves user's post-treatment cutter abrasion serious problems.
Accompanying drawing explanation
Fig. 1 is process flow sheet of the present invention
Embodiment
For the actual effect that makes technological line of the present invention, implementing method and reach is more clear, enforcement of the present invention is further described.
Embodiment 1
Make full use of novel material and a production method of utilizing the artificial synthetic stone of novel material combinations produce novel antistatic, specially refer to the first Application in antistatic artificial synthetic stone field such as antistatic graphite glasscloth, graphite glass mat, inorganic nano material, polyimide resin, promise volt clarke type epoxy resin, hollow glass microbead.Described inorganic nano material silicon-dioxide consumption is 3%, hollow glass microbead consumption is 5%, graphitized carbon black consumption is 1.5%, polyimide resin (solids content) consumption is 24%, promise volt clarke type epoxy resin (solids content) consumption is 22%, bisphenol A type epoxy resin (solids content) is 35%, composition glue.Antistatic graphite glasscloth, graphite glass mat consumption are 52% of above-mentioned glue (solids content).(other available silicon powders are filled)
By inorganic nano material silicon-dioxide, hollow glass microbead, graphitized carbon black is positioned in particular container, with the solvent dimethyl formamide mediation of 10 times of mass ratioes, stirs 120 minutes to being fully mixed evenly under 2000 revs/min of agitation conditions, squeezes in slaking tank.
By above-mentioned polyimide resin (solids content) consumption be 24%, promise volt clarke type epoxy resin (solids content) consumption is 22%, bisphenol A type epoxy resin (solids content) is 35% to squeeze into successively in slaking tank, under 50 revs/min of conditions, fully stir 120 minutes
Before use, always with 35 revs/min of stirrings, while being finished to glue, stop.
Adopt continuous gluing method to be coated in equably on antistatic graphite glasscloth, graphite glass mat above-mentioned glue, under 90-150 ℃ of condition, dry, form prepreg, cut in flakes and carry out superimposed by processing requirement.
The film coinciding is put into vacuum pressing equipment, adopt the mode that echelon heats up and pressurizes to be progressively warming up to 270 ℃, to be forced into 5MPa, moulding in 120 minutes from 90～270 ℃.
On infrared cutting machine, cut into specified dimension by user's requirement, test package delivers from godown.
Embodiment 2
Make full use of novel material and a production method of utilizing the artificial synthetic stone of novel material combinations produce novel antistatic, specially refer to the first Application in antistatic artificial synthetic stone field such as antistatic graphite glasscloth, graphite glass mat, inorganic nano material, polyimide resin, promise volt clarke type epoxy resin, hollow glass microbead.Described inorganic nano material silicon-dioxide consumption is 2%, hollow glass microbead consumption is 4%, graphitized carbon black consumption is 1%, polyimide resin (solids content) consumption is 23%, promise volt clarke type epoxy resin (solids content) consumption is 20%, bisphenol A type epoxy resin (solids content) is 40%, composition glue.Antistatic graphite glasscloth, graphite glass mat consumption are 50% of above-mentioned glue (solids content).(other available silicon powders are filled)
By inorganic nano material silicon-dioxide, hollow glass microbead, graphitized carbon black is positioned in particular container, with the solvent dimethyl formamide mediation of 10 times of mass ratioes, stirs 120 minutes to being fully mixed evenly under 2000 revs/min of agitation conditions, squeezes in slaking tank.
By above-mentioned polyimide resin (solids content) consumption be 23%, promise volt clarke type epoxy resin (solids content) consumption is 20%, bisphenol A type epoxy resin (solids content) is 40% to squeeze into successively in slaking tank, under 50 revs/min of conditions, fully stir 120 minutes
Before use, always with 35 revs/min of stirrings, while being finished to glue, stop.
Adopt continuous gluing method to be coated in equably on antistatic graphite glasscloth, graphite glass mat above-mentioned glue, under 90-150 ℃ of condition, dry, form prepreg, cut in flakes and carry out superimposed by processing requirement.
The film coinciding is put into vacuum pressing equipment, adopt the mode that echelon heats up and pressurizes to be progressively warming up to 270 ℃, to be forced into 5MPa, moulding in 120 minutes from 90～270 ℃.
On infrared cutting machine, cut into specified dimension by user's requirement, test package delivers from godown.
Embodiment 3
Make full use of novel material and a production method of utilizing the artificial synthetic stone of novel material combinations produce novel antistatic, specially refer to the first Application in antistatic artificial synthetic stone field such as antistatic graphite glasscloth, graphite glass mat, inorganic nano material, polyimide resin, promise volt clarke type epoxy resin, hollow glass microbead.Described inorganic nano material silicon-dioxide consumption is 3%, hollow glass microbead consumption is 8%, graphitized carbon black consumption is 3%, polyimide resin (solids content) consumption is 25%, promise volt clarke type epoxy resin (solids content) consumption is 20%, bisphenol A type epoxy resin (solids content) is 50%, composition glue.Antistatic graphite glasscloth, graphite glass mat consumption are 40% of above-mentioned glue (solids content).(other available silicon powders are filled)
By inorganic nano material silicon-dioxide, hollow glass microbead, graphitized carbon black is positioned in particular container, with the solvent dimethyl formamide mediation of 10 times of mass ratioes, stirs 120 minutes to being fully mixed evenly under 2000 revs/min of agitation conditions, squeezes in slaking tank.
By above-mentioned polyimide resin (solids content) consumption be 25%, promise volt clarke type epoxy resin (solids content) consumption is 20%, bisphenol A type epoxy resin (solids content) is 50% to squeeze into successively in slaking tank, under 50 revs/min of conditions, fully stir 120 minutes
Before use, always with 35 revs/min of stirrings, while being finished to glue, stop.
Adopt continuous gluing method to be coated in equably on antistatic graphite glasscloth, graphite glass mat above-mentioned glue, under 90-150 ℃ of condition, dry, form prepreg, cut in flakes and carry out superimposed by processing requirement.
The film coinciding is put into vacuum pressing equipment, adopt the mode that echelon heats up and pressurizes to be progressively warming up to 270 ℃, to be forced into 5MPa, moulding in 120 minutes from 90～270 ℃.
On infrared cutting machine, cut into specified dimension by user's requirement, test package delivers from godown.
The present invention adopts graphite alkali-free glasscloth/graphite alkali-free glass mat of coating and the common composition of electrically conductive graphite to lead static network, together forms semiconductor structure with resin, makes product generate inside and outside consistent antistatic effect uniformly; Polyimide resin, promise lie prostrate the application of clarke type epoxy resin in artificial synthetic stone, have improved the temperature classification of antistatic artificial synthetic stone; Hollow glass microbeads etc., in the first Application in antistatic artificial synthetic stone field, have reduced the density of antistatic artificial synthetic stone, have improved the quality of thermal conductivity and product post-treatment, burr and burr while having avoided product post-treatment; Nanometer titanium dioxide silicon materials and hollow glass microbead have improved the thermostability of product jointly, guarantee product long term operation and indeformable under hot and cold alternation condition for a long time, have improved product surface smooth finish simultaneously.
Claims (4)
1. the matrix material of antistatic artificial synthetic stone composition, is characterized in that: its glue aspect material is polybismaleimide, dihydroxyphenyl propane promise volt clarke type epoxy resin, bisphenol A type epoxy resin, nanometer grade silica, high-intensity hollow glass microballon, conductive carbon ink; Solvent adopts dimethyl formamide and/or acetone/butanone, and strongthener is antistatic graphite glasscloth and/or graphite glass mat, uses wherein any and/or two kinds of uses simultaneously.
2. the matrix material of a kind of antistatic artificial synthetic stone according to claim 1 composition, it is characterized in that: described strongthener is antistatic graphite glasscloth and/or graphite glass mat, use wherein any and/or two kinds of uses simultaneously, consumption is 40～50% of single products total mass.
3. the matrix material of a kind of antistatic artificial synthetic stone according to claim 1 and 2 composition, it is characterized in that: mass percent in the solids content of described glue: polybismaleimide content is 23～25%, dihydroxyphenyl propane promise volt clarke type epoxy resin content is 15～20%, bisphenol A type epoxy resin content is 40～50%, nanometer grade silica content is 2～5%, high-intensity hollow glass microballon content is 4～8%, and conductive carbon ink content is 1～3%.
4. a production method of utilizing the artificial synthetic stone glue formula of high-temperature resistant and antistatic and strongthener to make the artificial synthetic stone of high-temperature resistant and antistatic, it is characterized in that, glue preparation: by load weighted nanometer grade silica, high-intensity hollow glass microballon, conductive carbon ink is placed in the stainless steel vessel of special manufacture, add quantitative dimethyl formamide, under 2000 revs/min of conditions, high-speed stirring 120 minutes;
Again the pulpous state powder liquid pneumatic diaphragm pump being stirred is squeezed in another stainless steel vessel, add successively polybismaleimide, dihydroxyphenyl propane promise volt clarke type epoxy resin, bisphenol A type epoxy resin, add quantitative acetone and/or butanone, under 50 revs/min of conditions, stir 120 minutes, form glue, place stand-by after 30 minutes; Above-mentioned glue is immersed on graphite glasscloth equably, or be coated in equably on graphite glass mat, hot-air seasoning becomes prepreg, coincide by the artificial synthetic stone thickness requirement of high-temperature resistant and antistatic, the film coinciding is put into vacuum pressing equipment, be progressively warming up to 270 ℃, be forced into 5MPa, moulding in 120 minutes by the mode of echelon intensification pressurization, on infrared cutting machine, cut into specified dimension by user's requirement, test package delivers from godown.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410014254.9A CN103788583B (en) | 2014-01-13 | 2014-01-13 | A kind of artificial synthesis stone of high-temperature resistant and antistatic and manufacturing process thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410014254.9A CN103788583B (en) | 2014-01-13 | 2014-01-13 | A kind of artificial synthesis stone of high-temperature resistant and antistatic and manufacturing process thereof |
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| CN103788583B CN103788583B (en) | 2016-04-06 |
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| CN113059867A (en) * | 2021-03-26 | 2021-07-02 | 威海和利源碳纤维科技有限公司 | Carbon fiber structural member and preparation method thereof |
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| CN113059867A (en) * | 2021-03-26 | 2021-07-02 | 威海和利源碳纤维科技有限公司 | Carbon fiber structural member and preparation method thereof |
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| CN103788583B (en) | 2016-04-06 |
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