CN103762148A - Micro-channel plate for photomultiplier - Google Patents
Micro-channel plate for photomultiplier Download PDFInfo
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- CN103762148A CN103762148A CN201410017489.3A CN201410017489A CN103762148A CN 103762148 A CN103762148 A CN 103762148A CN 201410017489 A CN201410017489 A CN 201410017489A CN 103762148 A CN103762148 A CN 103762148A
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Abstract
The invention discloses a micro-channel plate (MCP) for a photomultiplier. The MCP comprises a two-dimensional arrays composed of a plurality of parallel channels, the two end face channels are plated with metal layers to serve as an input electrode and an output electrode, a half of the input electrode is provided with the metal layer, the other half of the input electrode is not provided with the metal layer, when two or three MCPs are overlaid, the channels of every two adjacent MCPs are in mirror symmetry with the adjacent end faces as the symmetry plane, corresponding micro-channels of the two adjacent MCPs are in << shapes, the hole diameters of the channels are larger than or equal to ten micrometers, and the ratios of the lengths of the channels to the diameters of the channels range from 35 to 40. According to the MCP, the high gain performance and the low noise performance of the MCP can be sufficiently expressed, the MCP can work in the best state, the gain of the photomultiplier assembled with two overlaid MCPs is improved from 105 to 106, and one magnitude order is improved.
Description
Technical field
The present invention relates to a kind of microchannel plate for photomultiplier (MCP).
Background technology
Microchannel plate (MCP) is a kind of electron tube of two-dimentional continuous electronic multiplication, by many (10
6-10
7) passage with continuous electronic multiplication ability forms by certain geometrical pattern relevant permutation.The two-dimensional array that the structure of MCP is comprised of massive parallel channel electron multiplier.It is actually a vias inner walls and has good secondary performance and certain fine hollow passageway fiberglass panel of electric conductivity.The aperture of microchannel is generally 6-12 μ m(and determines according to resolution requirement).Open area ratio on end face is 55%-85%, and passage length is 40--60 with the representative value of the ratio in aperture.Two end faces at MCP are coated with metal level, form input electrode and output electrode.In the outer rim of MCP with solid edge reinforcing ring.Conventionally the passage of MCP is not orthogonal to end face, and has the inclination angle (as Fig. 1) of 5-15 °.
Some object is electron emission under the charged particle bombardment with enough kinetic energy.Process is as follows: lotus energy electron impact is to solid skin, with electronics in body continuously collision electronics is excited and overflows surface.This process is called secondary.The ratio of its outgoing electron number and incident electron number is defined as secondary electron yield, i.e. secondary electron multiplication constant.
MCP utilizes the secondary electron emission characteristic of solid to realize electron multiplication.Two end faces of MCP as electrode, are respectively input electrode 2 and output electrode 3 by the method evaporation layer of metal of vacuum coating.Like this, when two interpolars add voltage, in passage, set up vertically a uniform electric field.Microchannel plate secondary electron multiplicative process schematic diagram (as Fig. 2).The secondary electron of injecting at a certain angle the input electronics 5 of passage and being discharged by its collision channel wall 6, under the effect of this longitudinal electric field, will advance along tubular axis.Collision each time just produces once multiplication.Repeat this process until doubly electronation from channel outlet, penetrate.If getting the secondary emissionratio of each collision is δ, the collision frequency of accumulative total is 10 o'clock, and total electron gain of passage can reach δ
10.
MCP, in various non-image signal detections, brings into play more and more important effect.When MCP is applied in various non-image signal detection, the technical indicator that MCP is applied in gleam image intensifier proposes different requirements, its main distinction be while being applied in non-image signal detection, image resolution ratio is not required or is required very low, (image resolution ratio is very important index to the MCP in gleam image intensifier), and very tight to the high-gain of MCP (electronics multiplication factor) low noise index request.Therefore, how improving the signal to noise ratio of MCP in photomultiplier, reach high-gain low-noise, make the detectivity of photomultiplier higher, is problem in the urgent need to address in non-image signal detection.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of high-gain for photomultiplier, low noise microchannel plate (MCP) and using method thereof.
For solving above technical problem, the invention provides a kind of microchannel plate for photomultiplier, comprise the two-dimensional array being formed by several parallel channels, two end faces are coated with metal level as input electrode and output electrode, half of each passage of input electrode end face has metal level, second half does not have metal level, and the degree of depth of metal level is less than 0.5 times of channel diameter, the metal level degree of depth of output electrode end face is channel diameter 0.5 times.Adopt electrode structure of the present invention to reduce electronics and be transfused to the probability that output electrode absorbs, improved signal collection efficiency, thereby improved gain and the signal to noise ratio (see figure 3) of multiplier tube.
In multiplier tube assembling, when two or the stack of three microchannel plates, the passage of adjacent two microchannel plates be take adjacent face as plane of symmetry mirror image symmetry, the corresponding microchannel of adjacent two microchannel plates (MCP) is become " < < " type (as Fig. 4), thus improved two MCP " coupling coefficient ".In two MCP stack gain, can't meet the demands need to superpose the 3rd MCP time, the channel direction of second MCP and the 3rd plate coupling still will be assembled into " < < " type.
Passage length and the diameter ratio of the MCP of the present invention's design are chosen as 35-40, passage aperture >=10 micron.
Consider the requirement of photomultiplier to noise, due to operating voltage, more strong noise is larger, and the operating voltage of MCP can not be too high, is typically chosen in 700--800 volt more suitable, and it is the highest that draw ratio is preferably MCP gain in 35 to 40 o'clock.
Compare with conventional microchannel plate, (1) has considered the operating characteristic of MCP, when the present invention has adjusted two MCP stacks, by channel direction assembling mode and the coating that has changed MCP metal electrode, has given full play to high-gain, the low-noise performance of MCP.(2) less demanding but detectivity is required to high feature to image resolution ratio according to photomultiplier itself, in MCP structural design, adjust pore size and draw ratio design parameter, make MCP work in the best condition.(3) without increase equipment and material, thereby saving fund.Only adjusting process parameter and parameter of structure design, the creation economic benefit of just enhancing product performance.(4), according to result of the test, take new process.The photomultiplier of two MCP stack assemblings, it gains from 10
5be increased to 10
6, improved an order of magnitude.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of MCP.
Fig. 2 is the multiplicative process of secondary electron in MCP.
Fig. 3 is input of the present invention, output electrode schematic diagram.
Fig. 4 is the adjacent two MCP mutual channel direction installation diagrams of the present invention.
In figure, 1-passage, 2-input electrode, 3-output electrode, 4-solid edge, 5-inputs electronics, 6-conduit wall.
Embodiment
In order to make those skilled in the art better understand the present invention, below in conjunction with accompanying drawing, the present invention is done to further clear, complete explanation.
Microchannel plate for photomultiplier of the present invention, comprises the two-dimensional array being comprised of several parallel channels 1, and two end faces are coated with metal level as input electrode 2 and output electrode 3, and outer rim is with solid edge 4.
Two end faces of MCP use the method evaporation layer of metal of vacuum coating as electrode.In traditional technique, gleam image intensifier is inputted 0.5--0.7 times that the degree of depth is channel diameter with the electrode of MCP.For what reduce super aperture, disperse electronic effect resolution, gleam image intensifier is deep with the metal level of MCP output electrode evaporation, reach more than 2 times of aperture.The a large amount of signal electron of this technique is transfused to and the electrode exported has absorbed, and MCPD gain is declined greatly.
In multiplier tube assembling, when two or the stack of three microchannel plates, it is symmetrical as plane of symmetry mirror image that the passage 1 of adjacent two microchannel plates be take adjacent face, the corresponding microchannel of adjacent two microchannel plates (MCP) is become " < < " type.Fig. 4 is adjacent two MCP mutual channel directions assembling schematic diagram.The output electronic energy of a slice MCP is fully received by rear a slice MCP above, more hit to the conduit wall of second MCP, (the electronics hitting on the electrode of second is absorbed by electrode to reduce the electronics hitting on the electrode of second, cannot carry out secondary electron multiplication), improved two MCP " coupling coefficient ".In two MCP stack gain, can't meet the demands need to superpose the 3rd MCP time, the channel direction of second MCP and the 3rd plate coupling still will be assembled into " < < " type.
Select passage 1 length and the diameter ratio of MCP to be chosen as 35-40.Consider the requirement of photomultiplier to noise, due to operating voltage, more strong noise is larger, so it is more suitable to be typically chosen in 700--800 volt, draw ratio is preferably 35 to 40.Consider in addition photomultiplier to resolution require lowly, the large aperture MCP of 1 aperture >=10, selector channel micron, can simplify technique like this, improves rate of finished products, lowers MCP manufacturing cost.
The scope of protection of present invention is not limited to above embodiment; to those skilled in the art; the present invention can have various deformation and change, all any modifications of doing within design of the present invention and principle, improves and is equal within replacement all should be included in protection scope of the present invention.
Claims (3)
1. the microchannel plate for photomultiplier, comprise the two-dimensional array being formed by several parallel channels (1), two end faces are coated with metal level as input electrode (2) and output electrode (3), it is characterized in that: half of input electrode (2) each passage of end face has metal level, second half does not have metal level, the degree of depth of metal level is less than 0.5 times of channel diameter, and the metal level degree of depth of output electrode (3) end face is 0.5 times of passage (1) diameter.
2. the microchannel plate for photomultiplier according to claim 1, it is characterized in that: in multiplier tube assembling, when two or the stack of three microchannel plates, it is symmetrical as plane of symmetry mirror image that the passage of adjacent two microchannel plates (1) be take adjacent face, the corresponding microchannel of adjacent two microchannel plates (MCP) is become " < < " type.
3. the microchannel plate for photomultiplier according to claim 1 and 2, is characterized in that: passage (1) length and diameter ratio are chosen as 35-40 passage (1) aperture >=10 micron.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410017489.3A CN103762148B (en) | 2014-01-15 | 2014-01-15 | A kind of microchannel plate for photomultiplier |
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| CN201410017489.3A CN103762148B (en) | 2014-01-15 | 2014-01-15 | A kind of microchannel plate for photomultiplier |
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| CN103762148B CN103762148B (en) | 2016-03-02 |
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| CN201410017489.3A Expired - Fee Related CN103762148B (en) | 2014-01-15 | 2014-01-15 | A kind of microchannel plate for photomultiplier |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104465295A (en) * | 2014-10-27 | 2015-03-25 | 中国电子科技集团公司第五十五研究所 | Novel micro-channel plate electrode with ion blocking function and manufacturing method thereof |
| CN106158554A (en) * | 2015-03-23 | 2016-11-23 | 北方夜视技术股份有限公司 | A kind of manufacture method of V-type passage microchannel plate |
| CN108139324A (en) * | 2015-09-25 | 2018-06-08 | 优志旺电机株式会社 | Optical detecting device |
Citations (3)
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| JPH02291658A (en) * | 1989-03-02 | 1990-12-03 | Galileo Electro Opt Corp | Electron multiplier accompanied by reduction in ion feedback |
| JP2003004640A (en) * | 2001-03-30 | 2003-01-08 | Fuji Photo Film Co Ltd | Method and system for generating data for biochemical analysis |
| CN1967770A (en) * | 2005-11-17 | 2007-05-23 | 中国科学院西安光学精密机械研究所 | Photoelectron multiplier |
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2014
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02291658A (en) * | 1989-03-02 | 1990-12-03 | Galileo Electro Opt Corp | Electron multiplier accompanied by reduction in ion feedback |
| JP2003004640A (en) * | 2001-03-30 | 2003-01-08 | Fuji Photo Film Co Ltd | Method and system for generating data for biochemical analysis |
| CN1967770A (en) * | 2005-11-17 | 2007-05-23 | 中国科学院西安光学精密机械研究所 | Photoelectron multiplier |
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| 孙建宁: "小孔径微通道板电极性能研究", 《中国优秀硕士学位论文全文数据库信息科技辑》 * |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104465295A (en) * | 2014-10-27 | 2015-03-25 | 中国电子科技集团公司第五十五研究所 | Novel micro-channel plate electrode with ion blocking function and manufacturing method thereof |
| CN104465295B (en) * | 2014-10-27 | 2018-02-27 | 中国电子科技集团公司第五十五研究所 | A kind of AT-MCP electrode with ion barrier functionality and preparation method thereof |
| CN106158554A (en) * | 2015-03-23 | 2016-11-23 | 北方夜视技术股份有限公司 | A kind of manufacture method of V-type passage microchannel plate |
| CN106158554B (en) * | 2015-03-23 | 2018-01-16 | 北方夜视技术股份有限公司 | A kind of preparation method of V-type passage microchannel plate |
| CN108139324A (en) * | 2015-09-25 | 2018-06-08 | 优志旺电机株式会社 | Optical detecting device |
| CN108139324B (en) * | 2015-09-25 | 2021-02-02 | 优志旺电机株式会社 | Optical measuring instrument |
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| CN103762148B (en) | 2016-03-02 |
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