CN103762137A - Dielectric protective film of plasma display panel, preparation method of dielectric protective film, plasma display panel - Google Patents
Dielectric protective film of plasma display panel, preparation method of dielectric protective film, plasma display panel Download PDFInfo
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- CN103762137A CN103762137A CN201110460307.6A CN201110460307A CN103762137A CN 103762137 A CN103762137 A CN 103762137A CN 201110460307 A CN201110460307 A CN 201110460307A CN 103762137 A CN103762137 A CN 103762137A
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Abstract
The invention provides a dielectric protective film of a plasma display panel, a preparation method of the dielectric protective film, and a plasma display panel comprising the dielectric protective film. According to the preparation method of the dielectric protective film, an intermittent oxygen aeration technique is adopted in the manufacture process of the dielectric protective film, such that a dielectric protective film with a plurality of magnesium oxide layers can be obtained. According to the preparation method of the invention which is simple in process, only a system for controlling oxygen flow and ventilation time is required to be additionally arranged on existing equipment, and the preparation method can be realized under the premise that the structure of the equipment is not modified basically, and therefore, modification investment on processing equipment can be low. The dielectric protective film obtained through adopting the preparation method of the invention has the plurality of magnesium oxide layers, and the degree of crystallinity of magnesium oxide layers which are formed under an oxygen aeration condition is high, and magnesium oxide layers which are formed under an anaerobic condition are compact, and therefore, the plasma display panel comprising the dielectric protective film can have high luminous efficiency under low voltage.
Description
Technical field
The present invention relates to gas discharge technical field, in particular to medium protection film of a kind of plasma display and preparation method thereof and the plasma display that contains it.
Background technology
Plasma scope (PDP) is that one utilizes gas discharge to produce ultraviolet ray, and then excitated fluorescent powder sends visible ray and a kind of display of video picture.Plasmia indicating panel is the primary structure of realizing Discharge illuminating, and it is comprised of former and later two substrates, on prebasal plate, be provided with horizontal maintain electrode and scan electrode and on dielectric layer and medium protection film; On metacoxal plate, be provided with longitudinal addressing electrode and barrier structure, electric discharge occurs in the space that front-back baseboard and barrier form.The discharge performance of plasma display is determining the indexs such as the brightness, light efficiency, power consumption of plasma display, and the Main Means that improves discharge performance is the performance that improves Plasmia indicating panel medium protection film.
Current, plasma display medium protection film mainly consists of MgO, the features such as resistance to sputtering performance is good, resistivity is high, secondary electron yield is high, high visible light transmissivity that it has.This medium protection film can effectively protect the electrode of prebasal plate and dielectric layer, prolongation plasma display useful life, storage wall electric charge, performance internal memory effect, reduce voltage, restriction discharging current, thereby improve the discharge performance of plasma display.
In the preparation technology of existing Plasmia indicating panel diaphragm; conventionally use electron beam evaporation; the most ripe diaphragm material used is magnesium oxide; when evaporation is magnesian, generally to pass into appropriate oxygen; to promote the degree of crystallinity of MgO film, but it is lower under logical oxygen condition, can to obtain the luminous efficiency of lower firing voltage display screen.Desirable diaphragm should be to have higher light efficiency and lower voltage, and this is difficult to realize for existing medium protection film preparation technology.
Summary of the invention
The present invention aims to provide a kind of medium protection film of plasma display, to solve the problem that luminous efficiency is low and discharge voltage is high of prior art ionic medium display screen.
According to an aspect of the present invention; a kind of manufacture method of plasma display medium protection film is provided, has comprised that media protection membrane material grows on dielectric layer, formed the step of medium protection film; in the growth course of media protection membrane material, adopt the logical oxygen technique of batch (-type).
Further, above-mentioned manufacture method comprises the following steps: A. carries out anaerobic growth phase, and detects the magnesium oxide layer thickness forming, and reaches the first predetermined thickness; B. pass into oxygen, carry out the grow aerobically stage, reach the second predetermined thickness; And C. repeating step A and step B.
Further, above-mentioned manufacture method comprises the following steps: a. carries out anaerobic growth phase, and growth time is 30～480s; B. pass into oxygen 30～480s, the intake of oxygen is 30～50SCCM, carries out the grow aerobically stage; And c. repeating step a and step b.
Further, the above-mentioned method without oxide growth and grow aerobically is electron beam evaporation plating method, ion beam vapour deposition method, sputtering method or chemical vapour deposition technique.
Further, above-mentioned the first predetermined thickness and/or the second predetermined thickness are 30～50nm.
Further, the thickness of above-mentioned medium protection film is 500～1000nm.
Further, above-mentioned media protection membrane material is magnesium oxide or doping type magnesium oxide, and wherein, doping type magnesium oxide is doped with Be, Ca, Sr or Ba.
According to a further aspect in the invention, also provide a kind of medium protection film of plasma display, it is characterized in that, the above-mentioned manufacture method of medium protection film is made.
According to another aspect of the invention, also provide a kind of plasma display, having comprised: prebasal plate, PDP sparking electrode and metacoxal plate, it is characterized in that, prebasal plate comprises above-mentioned medium protection film.
The technique effect that the present invention reaches: according to manufacture method of the present invention, technique implementation procedure is simple, only need on existing equipment, install the system of controlling oxygen flow and duration of ventilation additional, can on the basis that does not substantially change device structure, realize the transformation less investment of process equipment.The medium protection film that the present invention obtains has multilayer magnesium oxide layer; the magnesium oxide layer degree of crystallinity forming under logical oxygen condition is higher; the magnesium oxide layer forming under oxygen free condition is finer and close, makes the plasma display that contains it can under lower voltage, obtain higher luminous efficiency.
Except object described above, feature and advantage, the present invention also has other object, feature and advantage.Below with reference to figure and embodiment the present invention is further detailed explanation.
Accompanying drawing explanation
Figure of description is used to provide a further understanding of the present invention, forms a part of the present invention, and schematic description and description of the present invention is used for explaining the present invention, does not form inappropriate limitation of the present invention.In the accompanying drawings:
Fig. 1 shows according to the structural representation of the prebasal plate of plasma display of the present invention.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, technical scheme in embodiments of the invention is described in detail, but following embodiment and accompanying drawing are only to understand the present invention, and can not limit the present invention, the multitude of different ways that the present invention can be defined by the claims and cover is implemented.
In the typical execution mode of one of the present invention; a kind of manufacture method of plasma display medium protection film is provided, has comprised that media protection membrane material grows on dielectric layer, formed the step of medium protection film; in the growth course of media protection membrane material, adopt the logical oxygen technique of batch (-type).
The present invention is by leading to the formation of oxygen technology controlling and process magnesium oxide layer intermittence, thereby the magnesium oxide layer forming under aerobic conditions and the magnesium oxide layer alternative arrangement forming under oxygen free condition, the technique implementation procedure of this manufacture method is simple, only need on existing equipment, install the system of controlling oxygen flow and duration of ventilation additional, can on the basis that does not substantially change device structure, realize the transformation less investment of process equipment.
In a kind of embodiment of the present invention, this manufacture method comprises the following steps: A. carries out anaerobic growth phase, and detects the magnesium oxide layer thickness forming, and reaches the first predetermined thickness; B. pass into oxygen, carry out the grow aerobically stage, reach the second predetermined thickness; And C. repeating step A and step B.In the forming process of magnesium oxide layer, adopt the thickness of crystal calibrator control anaerobic growth phase and grow aerobically stage magnesium oxide layer, make both with more uniform thickness alternative arrangement, the controllability of every layer of magnesium oxide layer thickness is better, on small-sized magnesium oxide layer forming device, implement also than being easier to, thickness can be precisely controlled.
In another kind of embodiment of the present invention, manufacture method of the present invention comprises the following steps: a. carries out anaerobic growth phase, and growth time is 30～480s; B. pass into oxygen 30～480s, the intake of oxygen is 30～50SCCM, carries out the grow aerobically stage; And c. repeating step a and step b.Intake at intermittence chien shih anaerobic growth phase when passing into of controlling oxygen is different with the thickness of grow aerobically stage magnesium oxide layer, and, because the magnesium oxide layer forming under oxygen free condition is different with the refractive index of the magnesium oxide layer forming under aerobic conditions, when the magnesium oxide layer of different-thickness superposes mutually, cause the ultraviolet reflection rate of its corresponding thickness wavelength higher, the ultraviolet quantity of this ultraviolet reflection in can enhanced discharge unit, contribute to improving luminous efficiency, this manufacture method is applicable to large-scale magnesium oxide layer forming device.
The present invention comprises and is not limited to electron beam evaporation plating method, ion plating method, sputtering method, chemical vapour deposition technique without the method for oxide growth and grow aerobically.The formation method of magnesium oxide layer of the present invention is implemented according to prior art, just need to add the equipment that oxygen intermittently passes into of controlling, so the present invention can realize on the basis that does not substantially change existing method and apparatus structure, process costs reduces greatly.
The present invention's the first predetermined thickness and/or the second predetermined thickness are 30～50nm.The first predetermined thickness of the present invention and the second predetermined thickness can be the same or different; control thickness between 30～50nm; both the opposing moisture of the magnesium oxide layer forming under the magnesium oxide layer that forms under oxygen free condition and aerobic conditions and the contamination of carbon dioxide can have been brought into play; the alternately number of plies that can guarantee again enough magnesium oxide layers, has guaranteed that medium protection film obtains higher luminous efficiency under lower voltage.
The thickness of medium protection film of the present invention is 500～1000nm.The thickness of diaphragm that manufacture method according to the present invention obtains and the thickness of the medium protection film of prior art are more or less the same, thereby can be widely used in the plasma display of prior art.
The base material of medium protection film of the present invention is magnesium oxide or doping type magnesium oxide, and wherein, doping type magnesium oxide is doped with Be, Ca, Sr and Ba.Use method of the present invention; both can make the diaphragm take single magnesium oxide as base material; also the diaphragm that the magnesium oxide that can make other elements of doping is base material; on the basis that keeps the effect of magnesium oxide layer protective medium, improve the luminous efficiency of diaphragm, reduced the discharge voltage of diaphragm.
In the typical execution mode of another kind of the present invention, a kind of medium protection film of plasma display is also provided, it is characterized in that, the above-mentioned manufacture method of medium protection film is made.Because the degree of crystallinity of the magnesium oxide layer forming under aerobic conditions is higher, firing voltage when seasoned is lower; The magnesium oxide layer forming under oxygen free condition is finer and close, and the pollution capacity of opposing moisture and carbon dioxide is stronger, can make medium protection film have higher light efficiency.
In another typical execution mode of the present invention, a kind of plasma display is also provided, comprising: prebasal plate, PDP sparking electrode and metacoxal plate, it is characterized in that, prebasal plate comprises above-mentioned medium protection film.As shown in Figure 1, the structure of plasma display device front substrate is take glass substrate 1 as basis, on its surface, there is horizontal indium tin oxide (ITO) electrode pair 2, in order to increase the conductivity of electrode pair 2, BUS electrode pair 3 is set, on the surface of glass substrate 1, indium tin oxide (ITO) electrode pair 2 and BUS electrode pair 3, be provided with the dielectric layer 4 that thickness is 20-40 μ m, to limit the discharging current of electrode; The surface of dielectric layer 4 is provided with medium protection film 5, and medium protection film 5 is medium protection film of the present invention, and this plasma display has higher luminous efficiency under low voltage.
Below with reference to embodiment and comparative example, further illustrate and adopt beneficial effect of the present invention.
The base material of medium protection film is magnesium oxide, and setting total media protection film thickness is 800nm, 20 layers of magnesium oxide layer alternative arrangement, and the thickness of every layer is 40nm.On prebasal plate, form electrode material layer, on electrode material layer, prepare dielectric layer, then on dielectric layer, form medium protection film: first, under oxygen free condition, adopt electron beam evaporation plating to form magnesium oxide layer, by the thickness of crystal calibrator control magnesium oxide layer; When thickness reaches 20nm, unlatching oxygen valve passes into the oxygen of 30SCCM, carries out the evaporation of the magnesium oxide layer under aerobic conditions; Repeat above-mentioned steps, carry out the alternately evaporation of anaerobic and aerobic, obtain medium protection film.By this prebasal plate and metacoxal plate involutory after, by envelope arrange technique seal row after, be filled with working gas, and then it carried out to aged test, measure its discharge voltage.
The base material of medium protection film is magnesium oxide, on prebasal plate, form electrode material layer, on electrode material layer, prepare dielectric layer, then on dielectric layer, form diaphragm: at prebasal plate, enter after deposited chamber, first, carry out the ion beam evaporation formation magnesium oxide layer of the oxygen free condition of 30 seconds; Then, open oxygen valve and pass into the oxygen of 45SCCM, logical oxygen time remaining cutting-off valve after 30 seconds; Repeat above-mentioned steps, until final thickness reaches 800nm, evaporation finishes.By this prebasal plate and metacoxal plate involutory after, by envelope, arrange technique and seal row, after be filled with working gas, and then it is carried out to aged test, measure its discharge voltage.
The base material of medium protection film is the magnesium oxide of doping Ca, setting total media protection film thickness is 1000nm, 34 layers of magnesium oxide layer alternative arrangement, the thickness of every layer is 30nm, forms electrode material layer on prebasal plate, prepares dielectric layer on electrode material layer, then on dielectric layer, form diaphragm: first, under oxygen free condition, adopt electron beam evaporation plating to form magnesium oxide layer, by the thickness of crystal calibrator control magnesium oxide layer; When thickness reaches 30nm, unlatching oxygen valve passes into the oxygen of 30SCCM, carries out the evaporation of the magnesium oxide layer under aerobic conditions; Repeat above-mentioned steps, carry out the alternately evaporation of anaerobic and aerobic, obtain medium protection film.By this prebasal plate and metacoxal plate involutory after, by envelope arrange technique seal row after, be filled with working gas, and then it carried out to aged test, measure its discharge voltage.
Embodiment 4
The base material of medium protection film is the magnesium oxide of doping Ba, setting total media protection film thickness is 500nm, 10 layers of magnesium oxide layer alternative arrangement, the thickness of every layer is 50nm, forms electrode material layer on prebasal plate, prepares dielectric layer on electrode material layer, then on dielectric layer, form diaphragm: first, under oxygen free condition, adopt electron beam evaporation plating to form magnesium oxide layer, by the thickness of crystal calibrator control magnesium oxide layer; When thickness reaches 50nm, unlatching oxygen valve passes into the oxygen of 50SCCM, carries out the evaporation of the magnesium oxide layer under aerobic conditions; Repeat above-mentioned steps, carry out the alternately evaporation of anaerobic and aerobic, obtain medium protection film.By this prebasal plate and metacoxal plate involutory after, by envelope arrange technique seal row after, be filled with working gas, and then it carried out to aged test, measure its discharge voltage.
The base material of medium protection film is the magnesium oxide of doping Sr, on prebasal plate, form electrode material layer, on electrode material layer, prepare dielectric layer, then on dielectric layer, form diaphragm: at prebasal plate, enter after deposited chamber, first, carry out the ion beam evaporation formation magnesium oxide layer of the oxygen free condition of 180 seconds; Then, open oxygen valve and pass into the oxygen of 45SCCM, logical oxygen time remaining cutting-off valve after 180 seconds; Repeat above-mentioned steps, until final thickness reaches 500nm, evaporation finishes.By this prebasal plate and metacoxal plate involutory after, by envelope, arrange technique and seal row, after be filled with working gas, and then it is carried out to aged test, measure its discharge voltage.
Embodiment 6
The base material of medium protection film is the magnesium oxide of doping Be, on prebasal plate, form electrode material layer, on electrode material layer, prepare dielectric layer, then on dielectric layer, form medium protection film: at prebasal plate, enter after deposited chamber, first, carry out the ion beam evaporation formation magnesium oxide layer of the oxygen free condition of 480 seconds; Then, open oxygen valve and pass into the oxygen of 30SCCM, logical oxygen time remaining cutting-off valve after 480 seconds; Repeat above-mentioned steps, until final thickness reaches 1000nm, evaporation finishes.By this prebasal plate and metacoxal plate involutory after, by envelope, arrange technique and seal row, after be filled with working gas, and then it is carried out to aged test, measure its discharge voltage.
Comparative example 1
On prebasal plate, form electrode material layer, on electrode material layer, prepare dielectric layer, then on dielectric layer, form individual layer anaerobic oxidation magnesium layer.By this prebasal plate and metacoxal plate involutory after, by envelope, arrange technique and seal row, after be filled with working gas, and then it is carried out to aged test, measure its discharge voltage.
Comparative example 2
On prebasal plate, form electrode material layer, on electrode material layer, prepare dielectric layer, then on dielectric layer, form individual layer aerobic oxidation magnesium layer.By this prebasal plate and metacoxal plate involutory after, by envelope, arrange technique and seal row, after be filled with working gas, and then it is carried out to aged test, measure its discharge voltage.
Comparative example 3
On prebasal plate, form electrode material layer, on electrode material layer, prepare dielectric layer, then on dielectric layer, form the magnesium oxide layer of individual layer anaerobic doping Ca.By this prebasal plate and metacoxal plate involutory after, by envelope, arrange technique and seal row, after be filled with working gas, and then it is carried out to aged test, measure its discharge voltage.
By by the prepared plasma panel of embodiment 1-6 and as shown in table 1 by the seasoned discharge voltage test result of the prepared plasma panel of comparative example 1-3.
Table 1
Data by table 1 can be found out; all low than comparative example 1-3 of the firing voltage of the multilayer resist that the logical oxygen in the interval of embodiment 1-6 ionic medium display screen obtains and fire extinguishing voltage; discharge performance is also better, can realize the high-luminous-efficiency under low voltage, reduces power consumption.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.
Claims (9)
1. the manufacture method of a plasma display medium protection film; comprise that media protection membrane material grows on dielectric layer, form the step of described medium protection film, it is characterized in that; in the growth course of described media protection membrane material, adopt the logical oxygen technique of batch (-type).
2. manufacture method according to claim 1, is characterized in that, described manufacture method comprises the following steps:
A. carry out anaerobic growth phase, and detect the magnesium oxide layer thickness forming, reach the first predetermined thickness;
B. pass into oxygen, carry out the grow aerobically stage, and detect the magnesium oxide layer thickness forming, reach the second predetermined thickness; And
C. repeating said steps A and described step B.
3. manufacture method according to claim 1, is characterized in that, described manufacture method comprises the following steps:
A. carry out anaerobic growth phase, growth time is 30～480s;
B. pass into oxygen 30～480s, the intake of oxygen is 30～50SCCM, carries out the grow aerobically stage; And
C. repeating said steps a and described step b.
4. according to the manufacture method described in claim 2 or 3, it is characterized in that, the described method without oxide growth and described grow aerobically is electron beam evaporation plating method, ion plating method, sputtering method or chemical vapour deposition technique.
5. manufacture method according to claim 2, is characterized in that, described the first predetermined thickness and/or described the second predetermined thickness are 30～50nm.
6. manufacture method according to claim 5, is characterized in that, the thickness of described medium protection film is 500～1000nm.
7. according to the manufacture method described in claim 1-3 any one, it is characterized in that, described media protection membrane material is magnesium oxide or doping type magnesium oxide, and wherein, described doping type magnesium oxide is doped with Be, Ca, Sr or Ba.
8. a medium protection film for plasma display, is characterized in that, described medium protection film is made by the manufacture method described in claim 1-7 any one.
9. a plasma display, comprising: prebasal plate, PDP sparking electrode and metacoxal plate, it is characterized in that, and described prebasal plate comprises medium protection film claimed in claim 8.
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Application publication date: 20140430 |