CN103727389B - The pipe-line system that in a kind of production and application process, chemicals is supplied with automatically - Google Patents

The pipe-line system that in a kind of production and application process, chemicals is supplied with automatically Download PDF

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Publication number
CN103727389B
CN103727389B CN201210393826.XA CN201210393826A CN103727389B CN 103727389 B CN103727389 B CN 103727389B CN 201210393826 A CN201210393826 A CN 201210393826A CN 103727389 B CN103727389 B CN 103727389B
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valve body
feed tank
gas
application
pipe
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CN201210393826.XA
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CN103727389A (en
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汪明波
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Shenyang Core Source Microelectronic Equipment Co., Ltd.
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Shenyang Xinyuan Microelectronics Equipment Co Ltd
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Abstract

The present invention relates to the feed system field of chemicals in the process of production and application, the pipe-line system that specifically in a kind of production and application process, chemicals is supplied with automatically. Comprise the pipe-line system of control system, fluid infusion bucket, feed tank, application valve body, magnetic valve, generation negative pressure, upper hydrostatic sensor and the next hydrostatic sensor, wherein feed tank is provided with liquid import and export and gas import and export, described liquid import and export and gas import and export are respectively by independent described its open and close of application valve body control, and each application valve body is connected with magnetic valve respectively; Fluid infusion bucket is connected with the liquid-inlet on feed tank by liquid line, the pipe-line system that produces negative pressure is connected with the gas vent on feed tank by gas piping, upper hydrostatic sensor and the next hydrostatic sensor are arranged at respectively the upper and lower of feed tank, and upper hydrostatic sensor, the next hydrostatic sensor and magnetic valve are all connected with described control system. The present invention ensures the continuity of device fabrication and the security of the unartificial automatic supply of hazardous chemical.

Description

The pipe-line system that in a kind of production and application process, chemicals is supplied with automatically
Technical field
The invention belongs to liquid-supplying system field in the process of production and application, specifically a kind of productionThe pipe-line system that in use procedure, chemicals is supplied with automatically.
Background technology
At present, most semiconductor equipments except factory automation supply, also need in liquid supply processA lot of manual supply liquid, and these supply liquid to have be much poisonous or volatile liquid, some liquidCan frequently supply with, will bring a lot of unnecessary troubles to operator like this.
Summary of the invention
For the problems referred to above, the object of the present invention is to provide in a kind of production and application process chemicals automaticThe pipe-line system of supplying with. This pipe-line system ensures that continuity and the hazardous chemical of device fabrication is unartificialAutomatically the security of supplying with.
To achieve these goals, the present invention is by the following technical solutions:
The pipe-line system that in production and application process, chemicals is supplied with automatically, comprises control system, fluid infusionBucket H, feed tank G, application valve body, magnetic valve, the pipe-line system of generation negative pressure, upper hydrostatic sensorC1And the next hydrostatic sensor C2, wherein feed tank G is provided with liquid import and export and gas import and export,Described liquid import and export and gas import and export respectively by described application valve body control independently its open,Close, described each application valve body is connected and is controlled respectively by each magnetic valve with described magnetic valve independently respectively;Liquid-inlet on described feed tank G and liquid outlet are respectively by liquid line and fluid infusion bucket H and equipmentConnect, the gas feed on described feed tank G and gas vent respectively by gas piping and source nitrogen withThe pipe-line system that produces negative pressure connects, described upper hydrostatic sensor C1With the next hydrostatic sensor C2RespectivelyBe arranged at the upper and lower of feed tank G, described upper hydrostatic sensor C1, the next hydrostatic sensor C2And each magnetic valve is all connected with described control system.
The pipe-line system of described generation negative pressure comprises application valve body Y4, application valve body Y5And negative-pressure vacuum occursDevice Z, wherein the end air inlet of negative-pressure vacuum generator Z is connected with compressed gas source by gas piping,The sidewall of described negative-pressure vacuum generator Z is connected with the gas vent of feed tank G by gas piping, instituteState the end air inlet of negative-pressure vacuum generator Z and the sidewall of compressed gas source and negative-pressure vacuum generator ZAnd between the gas vent of feed tank G, be respectively equipped with application valve body Y4With application valve body Y5, described control valveBody Y4With application valve body Y5Respectively with magnetic valve D4With magnetic valve D5Connect, and respectively by magnetic valve D4WithMagnetic valve D5Control.
When the Compressed Gas that described compressed gas source is supplied with is discharged by negative-pressure vacuum generator Z, make feed flowGas in tank G is by application valve body Y5Be discharged from the tank body outside of feed tank G.
The gas exhaust piping of described feed tank G is provided with by magnetic valve D6The application valve body Y controlling6, described controlValve body Y processed6Be arranged in parallel with the pipe-line system that produces negative pressure. The gas import and export of described feed tank G alsoConnection arranges, and described gas import and export is communicated with feed tank G by common gas piping.
Described application valve body is pneumatic control valve body, the described magnetic valve and the gas that are connected with pneumatic control valve bodySource connects. Between described magnetic valve and source of the gas, be provided with compressed air pressure regulating valve T and pressure display table. DescribedFeed tank G is closed container.
Advantage of the present invention and beneficial effect are:
1. the inner not outer portion of the negative pressure vacuum line producing of feed tank of the present invention provides, but leans on certainlyThe negative pressure that the gas flow of body produces, has saved vacuum supply energy source.
2. the present invention automatically supplies with, the danger of avoiding personnel to operate bringing.
3. the present invention is simple to operate, and avoiding people is maloperation, and the continuous operation of support equipment is saved manpower.
Brief description of the drawings
Fig. 1 is pipeline schematic diagram of the present invention;
Fig. 2 is the local pipeline schematic diagram that the present invention produces negative pressure;
Wherein: 1 is magnetic valve D1, 2 is magnetic valve D2, 3 is magnetic valve D3, 4 is magnetic valve D6,5For magnetic valve D5, 6 is magnetic valve D4, 7 is application valve body Y6, 8 is application valve body Y5, 9 is control valveBody Y4, 10 is application valve body Y3, 11 is application valve body Y2, 12 is application valve body Y1, 13 is compression skyControlled atmosphere pressure valve T, 14 is pressure display table A, and 15 is negative-pressure vacuum generator Z, and 16 is feed tank G, 17For upper hydrostatic sensor C1, 18 is the next hydrostatic sensor C2, 19 is medicinal liquor barrel H.
Detailed description of the invention
Below in conjunction with accompanying drawing, the invention will be further described.
As shown in Figure 1, the present invention includes control system, fluid infusion bucket H19, feed tank G16, application valve body,Pipe-line system, source of the gas, the upper hydrostatic sensor C of magnetic valve, generation negative pressure117 and the next hydraulic sensingDevice C218, wherein feed tank G16 is airtight container, feed tank G16 be provided with liquid import and export andGas import and export, gas feed and the gas vent on feed tank G16 is arranged in parallel, also passes through commonGas piping be connected with feed tank G16. Described liquid import and export and gas import and export pass through respectivelyIndependent described its open and close of application valve body control, described each application valve body is connected with described magnetic valve respectively,And controlled respectively by each magnetic valve. The liquid outlet of feed tank G16 is by liquid line and equipment connection,Liquid line between feed tank G16 and equipment is provided with by magnetic valve D2The 2 application valve body Y that control211,The liquid-inlet of feed tank G16 is connected with medicinal liquor barrel H19 by liquid line, feed tank G16 and liquidLiquid line between bucket H19 is provided with by magnetic valve D1The 1 application valve body Y controlling112. Feed tank G16Gas feed be connected with source nitrogen, the gas piping between gas feed and the source nitrogen of feed tank G16Be provided with by magnetic valve D3The 3 application valve body Y that control310. The pipe-line system of described generation negative pressure is passed through gasBody pipeline is connected with the gas vent on compressed gas source II and feed tank G16. Described in the present embodiment, respectively controlValve body all adopts bi-bit bi-pass pneumatic control valve body, each magnetic valve be two-position three way magnetic valve, and all with pressureContracting source of the gas I connects, and the gas outlet of compressed gas source I is provided with compressed air pressure regulating valve T13 and pressure is aobviousShow table 14; Upper hydrostatic sensor C117 and the next hydrostatic sensor C218 are arranged at respectively feed tank G16Upper and lower, upper hydrostatic sensor C117, the next hydrostatic sensor C218 and each magnetic valve all withDescribed control system connects, and described control system is prior art.
The pipe-line system of described generation negative pressure with comprise application valve body Y49 and application valve body Y58 and negative-pressure vacuumGenerator Z15, wherein the end air inlet of negative-pressure vacuum generator Z15 is by gas piping and compressed gas sourceII connects, and the sidewall of described negative-pressure vacuum generator Z15 is by the gas of gas piping and feed tank G16Outlet connects, the end air inlet of described negative-pressure vacuum generator Z15 and compressed gas source II and negative-pressure vacuumBetween the gas vent of the sidewall of generator Z15 and feed tank G16, be respectively equipped with application valve body Y49 and controlValve body Y58, described application valve body Y49 and application valve body Y58 respectively with magnetic valve D46 and magnetic valve D55Connect, and respectively by magnetic valve D46 and magnetic valve D55 control, application valve body Y58 with application valve body Y310Be arranged in parallel. On the gas exhaust piping of feed tank G16, be also provided with and application valve body Y58 be arranged in parallel by electromagnetismValve D6The 4 application valve body Y that control67. Application valve body Y67 always close, and are only opening feed tank G16Seal cover before just open, lay down feed tank G16 internal pressure and reach internal and external pressure balance.
Operation principle of the present invention is:
Feed tank G16 is during to equipment feed flow, application valve body Y112 is closed condition, application valve body Y211 areOpen state. When the liquid in feed tank G16 arrives the next hydrostatic sensor C less218 the next time, the nextHydrostatic sensor C218 send signal, and control system acknowledge(ment) signal also sends instruction, magnetic valve D22 controlsMake connected application valve body Y211 close, magnetic valve D11 controls connected application valve body Y112Open magnetic valve D33 control connected application valve body Y310 close, magnetic valve D64 control and itThe application valve body Y connecting67 close (Y67 always close, only opening before feed tank G16 seal coverOpen, lay down feed tank G16 internal pressure and reach internal and external pressure balance). Meanwhile, magnetic valve D46 controlConnected application valve body Y49 open, magnetic valve D55 control connected application valve body Y58 open,A large amount of like this Compressed Gas, by negative-pressure vacuum generator Z15, makes the gas in feed tank G16 pass through controlValve body Y processed58 are discharged to the tank body outside of feed tank G16, as shown in Figure 2. Thereby make feed tank G16Inside form negative pressure, in order to reach pressure balance, force the liquid in the medicinal liquor barrel H19 of supply liquidBe inhaled in feed tank G16. When the liquid in feed tank G16 rises to upper hydrostatic sensor C117When upper, upper hydrostatic sensor C117 send signal, and control system receives signal and sends instruction,Magnetic valve D11 controls connected application valve body Y112 close, magnetic valve D22 controls are connectedApplication valve body Y211 open, magnetic valve D33 control connected application valve body Y310 open, magnetic valveD55 control connected application valve body Y58 close, thereby the liquid that reaches feed tank G16 continues to establishingThe process that available is given.

Claims (7)

1. the pipe-line system that in production and application process, chemicals is supplied with automatically, comprises control system, itsBe characterised in that: also comprise fluid infusion bucket H (19), feed tank G (16), application valve body, magnetic valve, generationThe pipe-line system of negative pressure, upper hydrostatic sensor C1And the next hydrostatic sensor C (17)2(18), whereinFeed tank G (16) is provided with liquid import and export and gas import and export, and described liquid import and export is gentleBody import and export is respectively by independently described its open and close of application valve body control, and described each application valve body dividesNot be not connected and controlled respectively by each magnetic valve with described magnetic valve independently; On described feed tank G (16)Liquid-inlet and liquid outlet respectively by liquid line and fluid infusion bucket H (19) and equipment connection, described inGas feed on feed tank G (16) and gas vent are born with producing by gas piping and source nitrogen respectivelyThe pipe-line system of pressing connects, described upper hydrostatic sensor C1And the next hydrostatic sensor C (17)2(18)Be arranged at respectively the upper and lower of feed tank G (16), described upper hydrostatic sensor C1(17),Position hydrostatic sensor C2(18) and each magnetic valve be all connected with described control system;
The gas exhaust piping of described feed tank G (16) is provided with by magnetic valve D6(4) application valve body of controllingY6(7), described application valve body Y6(7) be arranged in parallel with the pipe-line system of described generation negative pressure; Control valveBody Y6(7) always close, only before the seal cover of opening feed tank G (16), just open, lay down confessionFlow container G (16) internal pressure, reaches internal and external pressure balance.
2. by the pipe-line system that in production and application process described in claim 1, chemicals is supplied with automatically, its spyLevy and be: the pipe-line system of described generation negative pressure comprises application valve body Y4(9), application valve body Y5(8) andNegative-pressure vacuum generator Z (15), wherein the end air inlet of negative-pressure vacuum generator Z (15) passes through gasBody pipeline is connected with compressed gas source, and the sidewall of described negative-pressure vacuum generator Z (15) passes through gas pipingBe connected the end air inlet of described negative-pressure vacuum generator Z (15) with the gas vent of feed tank G (16)Mouth goes out with the sidewall of compressed gas source and negative-pressure vacuum generator Z (15) and the gas of feed tank G (16)Between mouthful, be respectively equipped with application valve body Y4And application valve body Y (9)5(8), described application valve body Y4(9)With application valve body Y5(8) respectively with magnetic valve D4And magnetic valve D (6)5(5) connect, and respectively by electricityMagnet valve D4And magnetic valve D (6)5(5) control.
3. by the pipe-line system that in production and application process described in claim 2, chemicals is supplied with automatically, its spyLevy and be: when the Compressed Gas that described compressed gas source is supplied with is discharged by negative-pressure vacuum generator Z (15),Make the gas in feed tank G (16) pass through application valve body Y5(8) be discharged from the tank of feed tank G (16)External body.
4. by the pipe-line system that in production and application process described in claim 1, chemicals is supplied with automatically, its spyLevy and be: the gas import and export of described feed tank G (16) is arranged in parallel, described gas import and export is logicalCrossing common gas piping is communicated with feed tank G (16).
5. by the pipe-line system that in production and application process described in claim 1, chemicals is supplied with automatically, its spyLevy and be: described application valve body is pneumatic control valve body, the described magnetic valve being connected with pneumatic control valve bodyBe connected with source of the gas.
6. by the pipe-line system that in production and application process described in claim 5, chemicals is supplied with automatically, its spyLevy and be: between described magnetic valve and source of the gas, be provided with compressed air pressure regulating valve T (13) and pressure display table(14)。
7. by the pipe-line system that in production and application process described in claim 1, chemicals is supplied with automatically, its spyLevy and be: described feed tank G (16) is closed container.
CN201210393826.XA 2012-10-16 2012-10-16 The pipe-line system that in a kind of production and application process, chemicals is supplied with automatically Active CN103727389B (en)

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106111376B (en) * 2016-07-06 2019-01-18 南京利德东方橡塑科技有限公司 A kind of spray alcohol device and its control method automatically
CN109422227B (en) * 2017-08-25 2020-09-11 系统科技公司 Automatic chemical supply device
CN110005954A (en) * 2018-01-05 2019-07-12 上海弗川自动化技术有限公司 A kind of working media supply system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5383574A (en) * 1993-07-19 1995-01-24 Microbar Sytems, Inc. System and method for dispensing liquid from storage containers
CN1256241A (en) * 1998-09-22 2000-06-14 液体空气乔治洛德方法利用和研究有限公司 Method and system for distributing liquid chemicals
CN101358686A (en) * 2007-08-01 2009-02-04 上海正帆超净技术有限公司 Safety conveying method for phosphorus oxychloride
CN102092540A (en) * 2010-12-08 2011-06-15 北京七星华创电子股份有限公司 Chemical liquid storage equipment and chemical liquid storage and distribution control method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5383574A (en) * 1993-07-19 1995-01-24 Microbar Sytems, Inc. System and method for dispensing liquid from storage containers
CN1256241A (en) * 1998-09-22 2000-06-14 液体空气乔治洛德方法利用和研究有限公司 Method and system for distributing liquid chemicals
CN101358686A (en) * 2007-08-01 2009-02-04 上海正帆超净技术有限公司 Safety conveying method for phosphorus oxychloride
CN102092540A (en) * 2010-12-08 2011-06-15 北京七星华创电子股份有限公司 Chemical liquid storage equipment and chemical liquid storage and distribution control method

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Address after: 110168 No. 16 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province

Patentee after: Shenyang Core Source Microelectronic Equipment Co., Ltd.

Address before: 110168 No. 16 Feiyun Road, Hunnan New District, Shenyang City, Liaoning Province

Patentee before: Shenyang Siayuan Electronic Equipment Co., Ltd.

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