CN103713015A - Plasma flat panel detector - Google Patents

Plasma flat panel detector Download PDF

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Publication number
CN103713015A
CN103713015A CN201310730742.5A CN201310730742A CN103713015A CN 103713015 A CN103713015 A CN 103713015A CN 201310730742 A CN201310730742 A CN 201310730742A CN 103713015 A CN103713015 A CN 103713015A
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China
Prior art keywords
shadow mask
detector
read
gas
plasma flat
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Pending
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CN201310730742.5A
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Chinese (zh)
Inventor
张盼盼
屠彦
杨兰兰
陈仲珊
王莉莉
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Southeast University
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Southeast University
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Priority to CN201310730742.5A priority Critical patent/CN103713015A/en
Publication of CN103713015A publication Critical patent/CN103713015A/en
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Abstract

The invention discloses a plasma flat panel detector. The detector comprises a transparent electrode, a shadow mask, a dielectric barrier wall and a read-out electrode. The transparent electrode is separated from the shadow mask, so that a detected signal is enabled to be converted to free electrons at a high conversion rate. The dielectric barrier wall has a well-shaped grid structure, the entire detection area is divided into a plurality of detection intervals, and the shadow mask is supported. The shadow mask is a metal plate containing a mesh-pore array, and through pores which are distributed in the metal plate form micro-pore units of the detector. The shadow mask, the dielectric barrier wall and the read-out electrode are sequentially connected from top to bottom and form a relatively closed space with the transparent electrode. The detector space is filled with rare gases or mixed gas of the rare gases and cancellation gas. The plasma flat panel detector is simple in structure, easy to produce and good in performance and can detect different radiations.

Description

A kind of plasma flat detector
Technical field
The present invention relates to detector, be specifically related to a kind of novel plasma flat detector.
Background technology
Gas detector is a class detector with the longest history, and in physical development nucleus in early days, gas detector has been brought into play indispensable effect.Along with environmental monitoring, nuclear physics, biomedicine waits the reach of science to force people to improve constantly the demand of detector.Due to the advantage of gas detector uniqueness, gas detector becomes one of detector being most widely used at present.Gas detector refers to usings gas as probing medium, and the ionization electric charge that utilizes electrode collection incident particle to produce in gas carrys out particle detection, obtains the position of incident particle, time, the general designation of a class detector of the information such as quantity.Kind and the structure of gas detector are various, are applicable to various occasion.
The initial position sensitive gas detector occurring is multiwire proportional chamber, and this detector gain is high, and noise is little, and sensitive volume size, shape are unrestricted.But silk is difficult for fixing in multiwire proportional chamber manufacture craft, silk intensity also has much room for improvement.Micro-proportional chamber utilizes micro-the silk plane replacing in multiwire proportional chamber on same plane, and micro-proportional chamber response time is fast, and numerical ability is high, and energy resolution is good.But the gain stability of micro-proportional chamber need to improve.The microclearance gas detector counting rate occurring subsequently and gain are high, and the response time is fast, high but the technology of preparing of microclearance gas detector requires, and only can realize small-scale production.At present popular microgrid structure gas detector and gas electron multiplier are high except having gain, outside advantages of simple structure and simple, compare with other detectors, have remarkable superiority, are two kinds of gas detectors with good development prospect.
Although there is at present above-mentioned gas detector, novel gas detector still continues to bring out, to meet growing detection needs.In order further to reduce the production cost of detector, simplify manufacture craft, some researchists attempt other structure applications to field of detecting.The structure of plasma panel display (PDP) is exactly a good candidate.The Peter Friedman of the U.S. has proposed plasma flat sensor (PPS), and PPS utilizes PDP structure to realize the function of surveying, and PPS gain is high, response time is fast, resolution is high, is a detector very with potentiality to be exploited, and this detector is still in development at present.But this type of detector has proved the great potential of PDP structure in field of detecting.Through appropriate design, optimize, based on PDP structure, cost is cheaper, and the higher gas detector that gains is expected to be suggested.
A kind of novel PDP structure that shadow mask type PDP (SM-PDP) Shi You Southeast China University's display technique research centre proposes.This structure and subtend PDP structure are similar.Unique different be that SM-PDP utilizes metal shadow mask to replace the medium barrier of subtend PDP.The advantages such as it is low that research shows that this structure has firing voltage, and response frequency is high, and the life-span is long are a kind of very competitive structures.Detector in the present invention is that the structural evolution based on this SM-PDP obtains.
Summary of the invention
Goal of the invention: the object of the present invention is to provide the low and high gas detector that gains of a kind of production cost.There are a lot of similarities in the structure of this type of detector and the structure of plasma panel display, can herid the manufacture craft of plasma panel display partially, therefore on production cost, takes advantage.
Technical scheme: for achieving the above object, the scheme that the present invention adopts is: a kind of plasma flat detector, this detector comprises transparency electrode, shadow mask, medium barrier and read-out electrode from top to bottom successively;
Between described transparency electrode and shadow mask, there is distance, guarantee that signal to be detected is converted into free electron with higher conversion ratio; Described medium barrier is divided into some detection intervals by whole search coverage, and supports shadow mask; Described shadow mask is the sheet metal that comprises grid hole array, and the penetrating aperture distributing above forms the micropore unit of detector;
Transparency electrode, shadow mask, medium barrier form the space of relative closure together with read-out electrode; In described space, be filled with the mixed gas of rare gas or rare gas and cancellation gas.
Preferably, on described shadow mask, have groove.
Preferably, medium barrier is " well " font grating texture, and whole search coverage is divided into some detection intervals.
Beneficial effect: the present invention compared with prior art, has the following advantages:
Simple in structure, cost is low: the present invention can herid PDP manufacturing technology and technique partially.Therefore in cost of manufacture, take advantage.
Gain high: multiplication is carried out between shadow mask and read-out electrode, and the distance between shadow mask and read-out electrode is very short, even if apply voltage when very low, also easily in multiplication region, form highfield.Compare with other detectors, the present invention, under identical operating voltage, gains higher.
Spatial resolution is high: detector is comprised of identical cell array, and the signal between each unit is read separately, and crosstalking between adjacent cells signal is little, and spatial resolution is high.
Accompanying drawing explanation
The tomograph of a kind of plasma flat detector of Fig. 1;
The tomograph of a kind of plasma flat detector of Fig. 2 medium barrier;
Tomograph in a kind of plasma flat detector of Fig. 3 after shadow mask upset;
The tomograph of the single detection interval of a kind of plasma flat detector of Fig. 4.
The theoretical gain characteristic of a kind of plasma flat detector of Fig. 5.
Embodiment
Below in conjunction with accompanying drawing, the present invention is further described.
Plasma flat detector provided by the invention, this detector comprises transparency electrode 1, shadow mask 2, medium barrier 3 and read-out electrode 5 from top to bottom successively.
Between described transparency electrode 1 and shadow mask 2, there is distance, guarantee that signal to be detected is converted into free electron with higher conversion ratio; Described medium barrier 3 is divided into some detection intervals by whole search coverage, and supports shadow mask 2; The sheet metal of described shadow mask 2 for comprising grid hole array, the penetrating aperture 4 distributing above forms the micropore unit of detector.
Transparency electrode 1, shadow mask 2, medium barrier 3 form the space of relative closure together with read-out electrode 5; In described space, be filled with the mixed gas of rare gas or rare gas and cancellation gas.
On described shadow mask 2, have groove.
Medium barrier 3 is " well " font grating texture, and whole search coverage is divided into some detection intervals.
The present invention is enclosure space, by transparency electrode 1, and shadow mask 2, medium barrier 3 and bar shaped read-out electrode 5 form.In work time space, be filled with the mixed gas of rare gas or rare gas and cancellation gas.Shadow mask 2, medium barrier 3 and read-out electrode 5 are connected successively, form one by one independently multiplication region, and multiplication region is cut off by medium barrier 3.Between transparency electrode 1 and shadow mask 2, there is drift region.First detector when work need to be in Fig. 1 transparency electrode 1, on shadow mask 2 and read-out electrode 5, apply respectively voltage.On transparency electrode 1 and shadow mask 2, voltage is generally negative hundreds of volt, the slightly high several volts of shadow mask 2 voltage ratio transparency electrode 1 voltage.Read-out electrode 5 ground connection.Because the existence of aperture on shadow mask, in the drift region of detector, form ambipolar electric field, ambipolar electric field has collecting action to electronics, after initiating electron produces in drift region, under the effect of ambipolar electric field, can see through smoothly the aperture on shadow mask 2, enter by shadow mask 2 multiplication region that medium barrier 3 and read-out electrode 5 surround.Multiplication length is the height of medium barrier 3, generally shorter, and the voltage that applies several hectovolts in this distance can guarantee that multiplication region internal electric field is very strong.The embodiment of this flat panel detector is as follows thus: ray to be detected is injected by transparency electrode 1 top, and ray can see through transparency electrode 1, and between transparency electrode and shadow mask 2, drift region, is converted into free electron.Under the effect of free electron ambipolar electric field in drift region, through aperture 4, enter the multiplication region that medium barrier 3 surrounds, because multiplication region internal electric field is very strong, electronics is exaggerated in enclosure space.After finally amplifying, electronic signal continues, to read-out electrode motion, to be finally read out electrode and to read.The ion producing in amplification process is motion in the opposite direction slowly, finally, again through aperture, enters drift region, and in this invention, medium barrier 3 is on the one hand as pad, separated shadow mask 2 and read-out electrode 5; As barrier, each cell isolation is opened on the other hand, realized the position sensing of incoming signal.
Fig. 3 is shadow mask (after the upset) tomograph of detector.Fig. 3 shows, shadow mask lower surface can recessing, to guarantee higher gain.
Fig. 5 is the result of utilizing gain in Garfield software emulation flat panel detector.Now suppose length and the wide 280 μ m that are of single detection interval in detector, drift region length 200 μ m, the thick 30 μ m of whole shadow mask, have the dark groove of 20 μ m above, in the groove of the shadow mask of a unit, evenly have 16 cylindrical apertures, hole diameter is 35 μ m, and aperture pitch is also 35 μ m.Medium barrier height 30 μ m.The working gas being filled with in detector is Ar/CO 2(70/30), air pressure is a standard atmospheric pressure.In emulation, initiating electron is directly placed on photocathode surface, and initiating electron gains and executes alive relation curve as Fig. 5 with detector after the multiplication of probe unit.Fig. 5 shows that detector gain increases with voltage index, and when operating voltage is 350V, gain reaches 10000, and this is worth than under equal conditions, and the theoretical gain of gas electron multiplier is also high.Explanation thus, this flat panel detector has very large potentiality realizing aspect high-gain.
Plasma flat detector of the present invention, described detector is mainly comprised of transparency electrode, shadow mask, medium barrier and read-out electrode four parts, as Fig. 1.This four part forms the space exploration of sealing, and inside is filled with working gas.Described medium barrier is " well " font grating texture, as Fig. 2, in detector, bring into play two effects: on the one hand whole search coverage is divided into some detection intervals, on the other hand, medium barrier supports shadow mask, makes to have gap between described shadow mask and read-out electrode.Between read-out electrode and shadow mask, there is voltage difference, in the region that highfield surrounds at medium barrier, shadow mask and read-out electrode, form.Shadow mask, medium barrier and read-out electrode are connected successively, and the strong electric field region that three surrounds is also referred to as multiplication region (clear in order to explain, in Fig. 1 by they separation).Described shadow mask is the sheet metal that comprises grid hole array, and its material can be coated with for iron, iron containing alloy, other metal alloys or surface the nonmetallic materials of conductive material membrane.Structure after shadow mask upset in Fig. 1, as Fig. 3, has the groove corresponding with medium barrier on the metal shadow mask upper surface in Fig. 3, have again penetrating aperture in groove, forms the micropore unit of detector.During specific implementation, in order to simplify the manufacture craft of detector, shadow mask can be reduced to a metal plate that is distributed with penetrating micropore on it.Transparency electrode is transparent to radiation signal to be detected, and signal to be detected can see through transparency electrode and enter detector.Between described transparency electrode place plane and shadow mask place plane, have certain area, this region is called as drift region.Read-out electrode is one group of bonding jumper parallel to each other, independent mutually between every bonding jumper.The signal of reading on one strip metal bar is the signal in this bonding jumper top a line probe unit.
Whole detector can be regarded as by some detection intervals and form, and in each detection interval, is divided into some micropore probe units again by the micropore of shadow mask.The structure of single detection interval is as Fig. 4, under the certain condition of single detection interval area, and can be by adjusting number, shape, the size of micropore unit and distribute, the characteristic of change detector.
The single detection interval size that medium barrier is divided into can regulate by changing the structural parameters of medium barrier.
Input signal is converted into free electron in drift region, it is variable that free electron produces principle: can be input signal direct ionization neutral operation γ-ray emission electronics, also can apply photoelectric material in transparency electrode or shadow mask upper surface, incoming signal is converted into free electron through photoelectric material, or other feasible programs.
Described shade mask structure, under ideal conditions, has groove on shadow mask.But under actual conditions, can, according to process conditions, groove structure be accepted or rejected.The number of the aperture distributing on shadow mask, distributes, and length and shape etc. are all adjustable, and aperture can be cylindrical, single taper or biconial.Orifice size is adjustable.
It should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention, can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.In the present embodiment not clear and definite each ingredient all available prior art realized.

Claims (3)

1. a plasma flat detector, is characterized in that: this detector comprises transparency electrode (1), shadow mask (2), medium barrier (3) and read-out electrode (5) from top to bottom successively;
Between described transparency electrode (1) and shadow mask (2), there is distance, guarantee that signal to be detected is converted into free electron with higher conversion ratio; Described medium barrier (3) is divided into some detection intervals by whole search coverage, and supports shadow mask (2); The sheet metal of described shadow mask (2) for comprising grid hole array, the penetrating aperture (4) distributing above forms the micropore unit of detector;
Transparency electrode (1), shadow mask (2), medium barrier (3) and read-out electrode (5) form the space of relative closure together; In described space, be filled with the mixed gas of rare gas or rare gas and cancellation gas.
2. a kind of plasma flat detector according to claim 1, is characterized in that: described shadow mask has groove on (2).
3. a kind of plasma flat detector according to claim 1, is characterized in that: medium barrier (3) is " well " font grating texture, and whole search coverage is divided into some detection intervals.
CN201310730742.5A 2013-12-26 2013-12-26 Plasma flat panel detector Pending CN103713015A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7518119B2 (en) * 2004-06-19 2009-04-14 Integrated Sensors, Llc Plasma panel based ionizing radiation detector
JP4280833B2 (en) * 2006-08-09 2009-06-17 大学共同利用機関法人 高エネルギー加速器研究機構 Gas electronic amplifier and radiation measuring apparatus
CN101762820A (en) * 2009-12-18 2010-06-30 东南大学 Flat panel detector
CN103065920A (en) * 2012-12-20 2013-04-24 东南大学 Flat panel detector

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7518119B2 (en) * 2004-06-19 2009-04-14 Integrated Sensors, Llc Plasma panel based ionizing radiation detector
JP4280833B2 (en) * 2006-08-09 2009-06-17 大学共同利用機関法人 高エネルギー加速器研究機構 Gas electronic amplifier and radiation measuring apparatus
CN101762820A (en) * 2009-12-18 2010-06-30 东南大学 Flat panel detector
CN103065920A (en) * 2012-12-20 2013-04-24 东南大学 Flat panel detector

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
张盼盼 等.: "《荫罩式平板探测器的探测性能与优化》", 《真空科学与技术学报》 *

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Application publication date: 20140409