CN103566193B - Remove the method that Chinese crude drug superficial silicon dioxide sulfur is residual - Google Patents
Remove the method that Chinese crude drug superficial silicon dioxide sulfur is residual Download PDFInfo
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- CN103566193B CN103566193B CN201310556497.0A CN201310556497A CN103566193B CN 103566193 B CN103566193 B CN 103566193B CN 201310556497 A CN201310556497 A CN 201310556497A CN 103566193 B CN103566193 B CN 103566193B
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Abstract
The present invention relates to a kind of method removed Chinese crude drug superficial silicon dioxide sulfur and remain, it is characterized in that step is as follows: Chinese crude drug is carried out dried by (1); (2) the Chinese crude drug superficial silicon dioxide sulfur residual content after dried is detected; (3) for the sulfur dioxide residue content detected, the consumption of required hydrogen peroxide is calculated; (4) required hydrogen peroxide is dissolved in purified water, the consumption of described purified water is the 9%-28% of the Chinese crude drug weight after dried; (5) be evenly sprayed on the surface of the Chinese crude drug after dried by the aqueous hydrogen peroxide solution of gained in step (4), leave standstill 5-60 minute, the ambient temperature left standstill, for being greater than 4 DEG C, being less than 16.8 DEG C, then drying.The present invention can remove the sulfur dioxide residue of Chinese crude drug at short notice quickly and effectively, also has that cost is low, efficiency is high, the feature of easy to operate and applicable large-scale production.
Description
Technical field
The present invention relates to a kind of method removed Chinese crude drug superficial silicon dioxide sulfur and remain.
Background technology
Use sulfur fumigation to be a kind of common method in some Chinese crude drug place of production roughing processes, object is mildew-resistant, anticorrosion and dry etc.For the problem preventing in Chinese crude drug roughing process abuse or excessively use sulfur stifling, ensure Chinese medicine quality and safe and effective, State Food and Drug Administration's tissue has worked out Traditional Chinese Medicine sulfur dioxide residue limit standard; Chinese Pharmacopoeia Commission was studied with regard to set up the project sulfur dioxide residual quantity assay method in centering Medicinal material and cut crude drug and limitation in 2003, and its assay method started to record in version " Chinese Pharmacopoeia " enlarged edition in 2005.
Chinese patent " a kind of method removing Chinese crude drug superficial silicon dioxide sulfur ", application number: 201210117625.7, this patent application adopts microwave generator to heat Chinese crude drug, then carry out dehumidifier cooling process, remove while Chinese crude drug superficial silicon dioxide sulfur remains and drying and sterilizing are carried out to Chinese crude drug.Removal SO described in this patent application
2residual method belongs to physical treatment method.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of method adopting the removal Chinese crude drug superficial silicon dioxide sulfur of chemical treatments residual.
The technical solution adopted for the present invention to solve the technical problems:
Remove the method that Chinese crude drug superficial silicon dioxide sulfur is residual, it is characterized in that step is as follows:
(1) Chinese crude drug is carried out dried;
(2) the Chinese crude drug superficial silicon dioxide sulfur residual content after dried is detected;
(3) for the sulfur dioxide residue content detected, the consumption of required hydrogen peroxide is calculated by following chemical equation (1):
SO
2+H
2O
2=SO
3+H
2O（1）；
(4) required hydrogen peroxide is dissolved in purified water, the consumption of described purified water is the 9%-28% of the Chinese crude drug weight after dried;
(5) be evenly sprayed on the surface of the Chinese crude drug after dried by the aqueous hydrogen peroxide solution of gained in step (4), leave standstill 5-60 minute, the ambient temperature left standstill, for being greater than 4 DEG C, being less than 16.8 DEG C, then drying.
As preferred version of the present invention, in the method that removal Chinese crude drug superficial silicon dioxide sulfur of the present invention is residual, described dried adopts oven drying, and baking temperature is 40 ~ 70 DEG C, and drying time is 0.5 ~ 3 hour.
As another preferred version of the present invention, in the method that removal Chinese crude drug superficial silicon dioxide sulfur of the present invention is residual, described dried is for drying.
As preferred version of the present invention, in the method that removal Chinese crude drug superficial silicon dioxide sulfur of the present invention is residual, described Chinese crude drug is the Radix Paeoniae Alba, Rhizoma Dioscoreae, Radix Asparagi, Radix Achyranthis Bidentatae, Pseudobulbus Bletillae (Rhizoma Bletillae), Radix Codonopsis, Pachyrhizua angulatus or Radix Trichosanthis.
The invention has the beneficial effects as follows that the present invention utilizes sulfur dioxide and hydrogen peroxide generation chemical reaction to generate the principle of sulfur trioxide and water, aqueous solution containing hydrogen peroxide is sprayed at the top layer of medical material, the sulfur dioxide residue of Chinese crude drug can be removed at short notice quickly and effectively.The present invention also has that cost is low, efficiency is high, the feature of easy to operate and applicable large-scale production.
Detailed description of the invention
Embodiment 1(carries out scrubbing CO_2 to the Chinese crude drug Radix Paeoniae Alba and remains):
(1) 10kg Radix Paeoniae Alba baking oven is carried out dried, temperature 40 ~ 70 DEG C, 0.5 ~ 3 hour time;
(2) the dried Radix Paeoniae Alba is carried out to the detection of sulfur dioxide residue content, testing result is for containing sulfur dioxide 1.92g, and detection method adopts the assay method of version " Chinese Pharmacopoeia " the middle sulfur dioxide residue recorded in 2010;
(3) consumption of required hydrogen peroxide is calculated according to following chemical equation (1):
SO
2+H
2O
2=SO
3+H
2O（1）
Work as SO
2during for 1.92g, required hydrogen peroxide is 1.02g;
(4) hydrogen peroxide of 1.02g is dissolved in purified water, the consumption of purified water is 9% of dried Radix Paeoniae Alba weight;
(5) aqueous solution of above-mentioned hydrogen peroxide is sprayed at the dried Radix Paeoniae Alba on the surface, leaves standstill 5-60 minute, the ambient temperature left standstill, for being greater than 4 DEG C, is then dried.
Embodiment 2(carries out scrubbing CO_2 to Radix Codonopsis and remains):
(1) 10kg Radix Codonopsis is dried;
(2) dried Radix Codonopsis is carried out to the detection of sulfur dioxide residue content, detection method is with embodiment 1, and measurement result is for containing sulfur dioxide 2.0g;
(3) needed for above-mentioned chemical equation (1) calculating, the consumption of hydrogen peroxide is 1.06g;
(4) hydrogen peroxide of 1.06g is dissolved in purified water, the consumption of purified water is 28% of dried Radix Codonopsis weight;
(5) aqueous solution of above-mentioned hydrogen peroxide is sprayed at the dried Radix Paeoniae Alba on the surface, leaves standstill 5-60 minute, the ambient temperature left standstill is lower than 16.8 DEG C, then dries.
The present invention is also applicable to the Chinese crude drugs such as Rhizoma Dioscoreae, Radix Asparagi, Radix Achyranthis Bidentatae, Pseudobulbus Bletillae (Rhizoma Bletillae), Pachyrhizua angulatus or Radix Trichosanthis, specifically removes SO
2residual method and embodiment 1,2 identical, differ here and one to list.
About SO
2with SO
3chemical reaction temperature be chosen for and be greater than 4 DEG C, being less than 16.8 DEG C, is because reaction product SO
3be solid state in this temperature range, be convenient to SO
3directly process.
Claims (4)
1. remove the method that Chinese crude drug superficial silicon dioxide sulfur is residual, it is characterized in that step is as follows:
(1) Chinese crude drug is carried out dried;
(2) the Chinese crude drug superficial silicon dioxide sulfur residual content after dried is detected;
(3) for the sulfur dioxide residue content detected, the consumption of required hydrogen peroxide is calculated by following chemical equation (1):
SO
2+H
2O
2=SO
3+H
2O（1）；
(4) required hydrogen peroxide is dissolved in purified water, the consumption of described purified water is the 9%-28% of the Chinese crude drug weight after dried;
(5) be evenly sprayed on the surface of the Chinese crude drug after dried by the aqueous hydrogen peroxide solution of gained in step (4), leave standstill 5-60 minute, the ambient temperature left standstill, for being greater than 4 DEG C, being less than 16.8 DEG C, then drying.
2. the method removed Chinese crude drug superficial silicon dioxide sulfur and remain as claimed in claim 1, it is characterized in that described dried adopts oven drying, baking temperature is 40 ~ 70 DEG C, and drying time is 0.5 ~ 3 hour.
3. the method removed Chinese crude drug superficial silicon dioxide sulfur and remain as claimed in claim 1, is characterized in that described dried is for drying.
4. the method that the removal Chinese crude drug superficial silicon dioxide sulfur as described in claim 1 or 2 or 3 is residual, is characterized in that described Chinese crude drug is the Radix Paeoniae Alba, Rhizoma Dioscoreae, Radix Asparagi, Radix Achyranthis Bidentatae, Pseudobulbus Bletillae (Rhizoma Bletillae), Radix Codonopsis, Pachyrhizua angulatus or Radix Trichosanthis.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310556497.0A CN103566193B (en) | 2013-11-12 | 2013-11-12 | Remove the method that Chinese crude drug superficial silicon dioxide sulfur is residual |
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|---|---|---|---|
| CN201310556497.0A CN103566193B (en) | 2013-11-12 | 2013-11-12 | Remove the method that Chinese crude drug superficial silicon dioxide sulfur is residual |
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|---|---|
| CN103566193A CN103566193A (en) | 2014-02-12 |
| CN103566193B true CN103566193B (en) | 2015-12-30 |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106309885B (en) * | 2016-10-21 | 2019-10-01 | 内蒙古博奥蒙中药工程研究院有限公司 | A method of reducing Chinese medicine sulfur dioxide residual quantity |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1502266A (en) * | 2002-11-21 | 2004-06-09 | 福州超大现代农业发展有限公司 | Method for removing sulfur from food containing residual sulphur dioxide |
| CN1966111A (en) * | 2005-11-17 | 2007-05-23 | 宋小焱 | Method for removing harmful sulfur dioxide from food additive material hydrosol |
-
2013
- 2013-11-12 CN CN201310556497.0A patent/CN103566193B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1502266A (en) * | 2002-11-21 | 2004-06-09 | 福州超大现代农业发展有限公司 | Method for removing sulfur from food containing residual sulphur dioxide |
| CN1966111A (en) * | 2005-11-17 | 2007-05-23 | 宋小焱 | Method for removing harmful sulfur dioxide from food additive material hydrosol |
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| SE01 | Entry into force of request for substantive examination | ||
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Inventor after: Ji Shengqiang Inventor after: Wang Ning Inventor after: Wang Man Inventor after: Li Xiaoen Inventor before: Li Xiaoen |
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