CN103555207A - Grinding liquid for grinding and polishing - Google Patents
Grinding liquid for grinding and polishing Download PDFInfo
- Publication number
- CN103555207A CN103555207A CN201310568471.8A CN201310568471A CN103555207A CN 103555207 A CN103555207 A CN 103555207A CN 201310568471 A CN201310568471 A CN 201310568471A CN 103555207 A CN103555207 A CN 103555207A
- Authority
- CN
- China
- Prior art keywords
- grinding
- polishing
- lapping liquid
- high purity
- purity water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 34
- 238000005498 polishing Methods 0.000 title claims abstract description 19
- 239000000375 suspending agent Substances 0.000 claims abstract description 18
- 239000012498 ultrapure water Substances 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 16
- 239000002245 particle Substances 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 239000000725 suspension Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 4
- 230000008569 process Effects 0.000 abstract description 4
- 239000000843 powder Substances 0.000 abstract 2
- -1 abrasive micropowder Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009967 tasteless effect Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a grinding liquid for grinding and polishing. The grinding liquid comprises the following components in grams by weight: 30-33 grams of grinding micro powder, 2500-2600 grams of high-purity water and 100-110 grams of suspending agent. The grinding liquid for grinding and polishing, disclosed by the invention, is simple, long-acting, stable and low in cost and is suitable for the preparation of most micro powder materials; the grinding liquid has the advantages that the preparation process is simple and easy to operate and the problems of machined part damage and the like do not occur in the using process.
Description
Technical field
The present invention relates to a kind of lapping liquid for grinding and polishing.
Background technology
Current domestic superhard material lapping liquid is produced less, and due to reasons such as technology, equipment, the removing material particle diameter in lapping liquid is inhomogeneous, easily work piece surface is produced the problems such as scuffing.Although and external lapping liquid is produced technology maturation, price is more expensive, generally, higher than home products 3-4 times of left and right, production cost is improved greatly.
Summary of the invention
The problem existing for prior art, the object of the present invention is to provide lower, the long-acting stable lapping liquid for grinding and polishing of a kind of cost.
For achieving the above object, the present invention is for the lapping liquid of grinding and polishing, and its component comprises abrasive micropowder, high purity water and suspension agent, and by weight, wherein abrasive micropowder content is 30-33, and high purity water content is 2500-2600, and suspension agent content is 100-110.
Further, described abrasive micropowder is micron particles.
Further, described abrasive micropowder is that several micropowder material is formulated.
Further, described abrasive micropowder is diadust.
Further, the electronic-grade scope of described high purity water is greater than 16m Ω.
Further, described suspension agent is that AQ TTV grinds suspension dispersive agent.
Further, described diadust content is 30, and high purity water is 2500, and suspension agent is 100.
The present invention is a kind of easy, long-acting stable lapping liquid for the lapping liquid of grinding and polishing, and it is applicable to the preparation of most of micropowder material, and cost is lower, and process for preparation is simple to operation, and does not in use find the problems such as workpiece damage.
Embodiment
Below, the present invention is more fully illustrated, show exemplary embodiment of the present invention.Yet the present invention can be presented as multiple multi-form, and should not be construed as the exemplary embodiment that is confined to narrate here.But, these embodiment are provided, thereby make the present invention comprehensively with complete, and scope of the present invention is fully conveyed to those of ordinary skill in the art.
The invention discloses the grinding and polishing course of processing that a kind of lapping liquid for grinding and polishing is applicable to most of mechanically resistant material, can be used for the grinding and polishing of crystalline material, metallic substance etc.In the grinding and polishing process of high hardness material, must to select suitable lapping liquid to process, to improve working (machining) efficiency, improve conforming product rate, the present invention uses the materials such as abrasive micropowder, high purity water, suspension agent for this reason, utilize suitable proportioning, produced a kind of long-acting, stable, lower-cost lapping liquid.Abrasive micropowder is micron particles, in use, can not occur occurring than the larger material of micron particles or particle, and liquid proportion is of crucial importance, must implement according to going within the scope of liquid proportion.Just can reach the best effect in product expection.
A kind of lapping liquid for grinding and polishing of the present invention, its component comprises abrasive micropowder, high purity water and suspension agent, and by weight, wherein abrasive micropowder content is 30-33, and high purity water content is 2500-2600, and suspension agent content is 100-110.The scope of this proportioning is not excessive, if cross conference, institute's processed wafer is produced to undesirable element, as; The consequences such as generation scratches, and roughness is excessive.Optimum ratio is: by weight, abrasive micropowder content is 30, and high purity water content is 2500, and suspension agent content is 100.
Wherein, the electronic-grade scope of high purity water is greater than 16m Ω, and suspension agent is that AQ TTV grinds suspension dispersive agent.Abrasive micropowder can adopt multiple micropowder material according to user demand, and abrasive micropowder may be selected to be a kind of micro mist or several micropowder material is formulated, and in the present embodiment, abrasive micropowder is used diadust.
As adopt diadust 30g, high purity water 2500g, suspension agent 100g to be mixed with lapping liquid, adopt diadust 33g, high purity water 2600g, suspension agent 110g to be mixed with lapping liquid, adopt diadust 31g, high purity water 2550g, suspension agent 105g to be mixed with lapping liquid etc., the thick liquid that is creamy white of the lapping liquid after preparing.
Diadust (or other micro mists) is removing material.Suspension agent AQ TTV(grinds suspension dispersive agent) water white, tasteless, normally by effective ingredient, dispersion agent, thickening material, anti-sludging agent, defoamer, frostproofer and water etc., formed, can make diadust particle be scattered in more equably in water, form the higher suspension that a kind of particle is tiny, the stable liquid-solid state system that can flow, lubricating fluid Main Function is in order to reduce the frictional force between workpiece and removing material, and the course of processing can smoothness be carried out.
The present invention mainly utilizes the physical mechanical effect ground finish part of micro mist, reaches low-cost processing object.Diamond lap is a kind of precision sizing, and processing environment will clean, and used tool and equipment must be special-purpose, can not use with.According to different work materials, can change liquid proportion and deacclimatize machining kinds.Diamond grinding fluid is the continual rolling of abrasive material in process of lapping, and extruding and the shear action of producing, rough surface rubbing.
Claims (7)
1. for the lapping liquid of grinding and polishing, it is characterized in that, the component of this lapping liquid comprises abrasive micropowder, high purity water and suspension agent, and by weight, wherein abrasive micropowder content is 30-33, and high purity water content is 2500-2600, and suspension agent content is 100-110.
2. the lapping liquid for grinding and polishing as claimed in claim 1, is characterized in that, described abrasive micropowder is micron particles.
3. the lapping liquid for grinding and polishing as claimed in claim 1, is characterized in that, described abrasive micropowder is that several micropowder material is formulated.
4. the lapping liquid for grinding and polishing as claimed in claim 2, is characterized in that, described abrasive micropowder is diadust.
5. the lapping liquid for grinding and polishing as claimed in claim 1, is characterized in that, the electronic-grade scope of described high purity water is greater than 16m Ω.
6. the lapping liquid for grinding and polishing as claimed in claim 1, is characterized in that, described suspension agent is that AQ TTV grinds suspension dispersive agent.
7. the lapping liquid for grinding and polishing as claimed in claim 1, is characterized in that, described diadust content is 30, and high purity water is 2500, and suspension agent is 100.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310568471.8A CN103555207A (en) | 2013-11-15 | 2013-11-15 | Grinding liquid for grinding and polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310568471.8A CN103555207A (en) | 2013-11-15 | 2013-11-15 | Grinding liquid for grinding and polishing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103555207A true CN103555207A (en) | 2014-02-05 |
Family
ID=50009582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310568471.8A Pending CN103555207A (en) | 2013-11-15 | 2013-11-15 | Grinding liquid for grinding and polishing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103555207A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105734577A (en) * | 2016-05-10 | 2016-07-06 | 本钢板材股份有限公司 | Chromium oxide metallographic specimen precision polishing agent and preparation method thereof |
| CN108085686A (en) * | 2016-11-23 | 2018-05-29 | 本钢板材股份有限公司 | A kind of metallographic specimen polishing agent |
| CN109575813A (en) * | 2018-08-10 | 2019-04-05 | 优尔材料工业（深圳）有限公司 | Micro-nano diamond polishing liquid and preparation method thereof |
-
2013
- 2013-11-15 CN CN201310568471.8A patent/CN103555207A/en active Pending
Non-Patent Citations (1)
| Title |
|---|
| 广州克思曼研磨科技有限公司: "美国进口悬浮剂", 《HTTP://WWW.GLASS.COM.CN/KSMYMKJ/SUPPLYDETAIL-1660955.HTML》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105734577A (en) * | 2016-05-10 | 2016-07-06 | 本钢板材股份有限公司 | Chromium oxide metallographic specimen precision polishing agent and preparation method thereof |
| CN108085686A (en) * | 2016-11-23 | 2018-05-29 | 本钢板材股份有限公司 | A kind of metallographic specimen polishing agent |
| CN109575813A (en) * | 2018-08-10 | 2019-04-05 | 优尔材料工业（深圳）有限公司 | Micro-nano diamond polishing liquid and preparation method thereof |
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| PB01 | Publication | ||
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Application publication date: 20140205 |