CN103551063A - Device for preparing nickel-plating solution - Google Patents
Device for preparing nickel-plating solution Download PDFInfo
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- CN103551063A CN103551063A CN201310531294.6A CN201310531294A CN103551063A CN 103551063 A CN103551063 A CN 103551063A CN 201310531294 A CN201310531294 A CN 201310531294A CN 103551063 A CN103551063 A CN 103551063A
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- China
- Prior art keywords
- nickel
- liquid
- circulating pump
- plating liquid
- storing barrel
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Abstract
The invention discloses a device for preparing a nickel-plating solution. The device comprises a liquid preparation barrel, a nickel group feeding hole, a water inlet pipeline, a liquid storage barrel and the like. The device is characterized in that a liquid preparation circulating pump is arranged on the liquid preparation barrel; a liquid storage circulating pump and a nickel-plating solution output pipeline are arranged on the liquid storage barrel; extracting pumps are also arranged on the liquid preparation barrel and the liquid storage barrel. The device has the beneficial effects that automation of preparation, storage and transportation of the nickel-plating solution is achieved by using three electric mechanical pumps; the production efficiency is greatly improved. Large-volume liquid preparation and storage barrels are utilized, so that the preparation quantity of the nickel-plating solution is increased; the field efficiency is improved; the device is simple and practical in structure.
Description
Technical field
What the present invention relates to is semiconductor electronic component manufacturing technology field, especially relates to a kind of improvement of nickel-plating liquid device for formulating.
Background technology
The production technology of semiconductor wafer need to be carried out chemical nickel plating on semiconductor wafer, the liquid of chemical nickel plating need carry out nickel-plating liquid preparation at any time according to output, its solute is nickel group, solvent is pure water, need mixing and stirring according to a certain ratio, for production line, because of its nickel-plating liquid consumption large, its preparation volume size of container and mixing plant become the influence factor that can production volume production, and its shortcoming is as follows: the volume of existing preparation container is little; The existing apparatus preparation frequency is higher, affects production efficiency; Existing nickel-plating liquid device for formulating need manually stir, and tired degree and uniformity impact are larger; After existing nickel-plating liquid preparation, need to be contained up to small container and use, use inconvenient; Can not supply with continuously, as supplied not in time, will restrict output, affect production efficiency.This is the deficiencies in the prior art parts.
Summary of the invention
The object of the invention is to, overcome the deficiencies in the prior art, a kind of simple in structure, a kind of nickel-plating liquid device for formulating that can non-interruptible supply nickel-plating liquid is provided.
For solving the problems of the technologies described above, technical scheme of the present invention is: a kind of nickel-plating liquid device for formulating, include dosing bucket, nickel group dog-house, inlet pipeline, liquid storing barrel etc., it is characterized in that: on described dosing bucket, be provided with dosing circulating pump, on described liquid storing barrel, be provided with liquid storage circulating pump, nickel-plating liquid output pipe, on described dosing bucket, liquid storing barrel, be also provided with and detach pump.This device can meet Production requirement for production line nickel plating liquid without interruption, has improved output.Utilize dosing circulating pump to carry out dosing timing agitation, its mixing effect meets technological requirement completely; Utilization detaches pump the nickel-plating liquid being stirred is evacuated in liquid storing barrel, and by liquid storage circulating pump, carries out not intermittent cyclic and prevent from staticly settling, and liquid storage circulating pump can be delivered to nickel-plating liquid and produce line terminal simultaneously, improves nickel-plating liquid transfer efficiency.
Further improvement of the present invention has, described in detach pump liquid input port be arranged on the bottom of described dosing bucket, described in detach pump liquid delivery outlet be arranged on described liquid storing barrel top.
Further improvement of the present invention also has, and described dosing circulating pump is connected to bottom and the top of described dosing bucket by two pipelines.
Further improvement of the present invention also has, and described liquid storage circulating pump is connected on the bottom and described nickel-plating liquid output pipe of described liquid storing barrel by two pipelines.
Further improvement of the present invention also has, and on described nickel-plating liquid output pipe, valve is set.
In description, do not have the structure of describing to belong to prior art.
The beneficial effect of this programme can be learnt according to the narration to such scheme, a kind of nickel-plating liquid device for formulating, include dosing bucket, nickel group dog-house, inlet pipeline, liquid storing barrel etc., it is characterized in that: on described dosing bucket, be provided with dosing circulating pump, on described liquid storing barrel, be provided with liquid storage circulating pump, nickel-plating liquid output pipe, on described dosing bucket, liquid storing barrel, be also provided with and detach pump.The invention has the beneficial effects as follows: this device utilizes 3 motor machine pumps to realize the automation of nickel-plating liquid preparation, storage and conveying, has improved greatly production efficiency; Use large volume dosing and liquid storing barrel, increased the amount of preparation of nickel-plating liquid, improved on-the-spot efficiency.And simple and practical.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.In figure: the 1st, dosing bucket, the 2nd, liquid storing barrel, the 3rd, dosing circulating pump, the 4th, detach pump, the 5th, liquid storage circulating pump, the 6th, nickel-plating liquid output pipe, the 7th, nickel group dog-house, the 8th, valve, the 9th, inlet pipeline.
The specific embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail, by accompanying drawing, can find out, a kind of nickel-plating liquid device for formulating, include dosing bucket 1, nickel group dog-house 7, inlet pipeline 9, liquid storing barrel etc. 2, on dosing bucket 1, be provided with dosing circulating pump 3, on liquid storing barrel 1, be provided with liquid storage circulating pump 5, nickel-plating liquid output pipe 6, on dosing bucket 1, liquid storing barrel 2, be also provided with and detach pump 4.The input port that detaches pump 4 liquid is arranged on the bottom of dosing bucket 1, and the delivery outlet that detaches pump 4 liquid is arranged on liquid storing barrel 2 tops.Dosing circulating pump 3 is connected to bottom and the top of dosing bucket 1 by two pipelines.Liquid storage circulating pump 5 is connected on the bottom and nickel-plating liquid output pipe 6 of liquid storing barrel 2 by two pipelines.Valve 8 is set on nickel-plating liquid output pipe 6.
Certainly, above-mentioned explanation is not limitation of the present invention, and the present invention is also not limited only to above-mentioned giving an example, and the variation that those skilled in the art make in essential scope of the present invention, remodeling, interpolation or replacement, also belong to protection scope of the present invention.
Claims (5)
1. a nickel-plating liquid device for formulating, include dosing bucket, nickel group dog-house, inlet pipeline, liquid storing barrel etc., it is characterized in that: on described dosing bucket, be provided with dosing circulating pump, on described liquid storing barrel, be provided with liquid storage circulating pump, nickel-plating liquid output pipe, on described dosing bucket, liquid storing barrel, be also provided with and detach pump.
2. a kind of nickel-plating liquid device for formulating according to claim 1, is characterized in that: described in detach pump liquid input port be arranged on the bottom of described dosing bucket, described in detach pump liquid delivery outlet be arranged on described liquid storing barrel top.
3. a kind of nickel-plating liquid device for formulating according to claim 1 and 2, is characterized in that: described dosing circulating pump is connected to bottom and the top of described dosing bucket by two pipelines.
4. a kind of nickel-plating liquid device for formulating according to claim 3, is characterized in that: described liquid storage circulating pump is connected on the bottom and described nickel-plating liquid output pipe of described liquid storing barrel by two pipelines.
5. a kind of nickel-plating liquid device for formulating according to claim 1, is characterized in that: on described nickel-plating liquid output pipe, valve is set.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310531294.6A CN103551063A (en) | 2013-11-01 | 2013-11-01 | Device for preparing nickel-plating solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310531294.6A CN103551063A (en) | 2013-11-01 | 2013-11-01 | Device for preparing nickel-plating solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103551063A true CN103551063A (en) | 2014-02-05 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310531294.6A Pending CN103551063A (en) | 2013-11-01 | 2013-11-01 | Device for preparing nickel-plating solution |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103551063A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106799175A (en) * | 2016-12-16 | 2017-06-06 | 芜湖万向新元环保科技有限公司 | A kind of dispensing box |
| CN109352531A (en) * | 2018-10-24 | 2019-02-19 | 上海华力微电子有限公司 | A kind of supply method of lapping slurry feeding system and chemical-mechanical grinding liquid |
| CN109453714A (en) * | 2018-12-28 | 2019-03-12 | 东莞市银锐精密机械有限公司 | A kind of liquid medicine device for formulating |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0933000A (en) * | 1995-07-21 | 1997-02-07 | Toshiba Corp | Agitation system for liquid storage tank |
| CN202921182U (en) * | 2012-11-29 | 2013-05-08 | 烟台晨煜电子有限公司 | Clean nickel-dissolving device |
| CN203564977U (en) * | 2013-11-01 | 2014-04-30 | 山东科芯电子有限公司 | Nickel plating liquid preparation device |
-
2013
- 2013-11-01 CN CN201310531294.6A patent/CN103551063A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0933000A (en) * | 1995-07-21 | 1997-02-07 | Toshiba Corp | Agitation system for liquid storage tank |
| CN202921182U (en) * | 2012-11-29 | 2013-05-08 | 烟台晨煜电子有限公司 | Clean nickel-dissolving device |
| CN203564977U (en) * | 2013-11-01 | 2014-04-30 | 山东科芯电子有限公司 | Nickel plating liquid preparation device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106799175A (en) * | 2016-12-16 | 2017-06-06 | 芜湖万向新元环保科技有限公司 | A kind of dispensing box |
| CN109352531A (en) * | 2018-10-24 | 2019-02-19 | 上海华力微电子有限公司 | A kind of supply method of lapping slurry feeding system and chemical-mechanical grinding liquid |
| CN109453714A (en) * | 2018-12-28 | 2019-03-12 | 东莞市银锐精密机械有限公司 | A kind of liquid medicine device for formulating |
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| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140205 |