CN103551003B - Drip washing equipment - Google Patents
Drip washing equipment Download PDFInfo
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- CN103551003B CN103551003B CN201310553092.1A CN201310553092A CN103551003B CN 103551003 B CN103551003 B CN 103551003B CN 201310553092 A CN201310553092 A CN 201310553092A CN 103551003 B CN103551003 B CN 103551003B
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Abstract
The invention discloses a kind of drip washing equipment, drip washing equipment according to the embodiment of the present invention comprises: housing, housing have the air inlet being positioned at this lower housing portion, the gas outlet being positioned at this case top, be positioned at this housing upper inlet, be positioned at this housing bottom liquid outlet and be positioned at this lower housing portion and higher than the condensate outlet of described air inlet; Sieve plate, sieve plate to be located in housing and between inlet and condensate outlet; Liquid distribution trough, liquid distribution trough to be located in housing and to be connected with inlet; And gas distributor, gas distributor to be located in housing and to be connected with air inlet.This equipment flowsheet is simple and stable, effectively can improve the condensation efficiency of mist, thus significantly reduces energy consumption and operating cost.
Description
Technical field
The present invention relates to field of polysilicon production, specifically, the present invention relates to drip washing equipment.
Background technology
In traditional reduction vent gas treatment process, in the method that the dedusting in reduction tail gas is separated with chlorosilane, the method for more employing bubbling.The leacheate used passes into bubble tower after using refrigerant cooling, and also have the storage tank of some attached exterior liquid bodies, although the method can reach the object of chlorosilane in dedusting and initial gross separation reduction tail gas, flow process is complicated, have fluctuation, vibration equipment is larger, and energy consumption is higher.
Therefore, the dedusting of reduction tail gas in polycrystalline silicon production system and the separation equipment of chlorosilane need to be further improved.
Summary of the invention
The present invention one of is intended to solve the problems of the technologies described above at least to a certain extent or at least provides a kind of useful business to select.For this reason, one object of the present invention is to propose the drip washing equipment that a kind of flow process is simple, equipment is stablized, energy consumption is lower and condensation efficiency is higher.
According to an aspect of the present invention, the present invention proposes a kind of drip washing equipment, according to embodiments of the invention, comprise: housing, described housing have the air inlet being positioned at this lower housing portion, the gas outlet being positioned at this case top, be positioned at this housing upper inlet, be positioned at this housing bottom liquid outlet and be positioned at this lower housing portion and higher than the condensate outlet of described air inlet; Sieve plate, described sieve plate to be located in described housing and between described inlet and described condensate outlet; Liquid distribution trough, described liquid distribution trough to be located in described housing and to be connected with described inlet; And gas distributor, described gas distributor to be located in described housing and to be connected with described air inlet.According to the drip washing equipment of the embodiment of the present invention, by arranging multiple sieve plate in drip washing equipment, effectively can improve the condensation efficiency of mist, thus significantly reduce energy consumption and operating cost.
In addition, drip washing equipment according to the above embodiment of the present invention can also have following additional technical characteristic:
In some embodiments of the invention, described sieve plate has multiple through hole, and the diameter of described through hole is 10 ~ 20 millimeters.Thus, effectively can prevent the accumulation of impurity particle, to improve the condensation efficiency of mist further.
In some embodiments of the invention, described sieve plate comprises multilayer, and described multiple sieve plate is spaced apart from each other setting along the vertical direction.Thus, the condensation efficiency of mist can be improved further.
In some embodiments of the invention, described sieve plate comprises 1 ~ 10 layer, is preferably 2 ~ 5 layers.Thus, heat transfer, mass transfer effect can be improved, to improve the condensation efficiency of mist further.
In some embodiments of the invention, the distance between adjacent sieve plate is 100 ~ 400 millimeters.Thus, the condensation efficiency of mist can be improved further.
In some embodiments of the invention, the area sum of the fluid hole of described liquid distribution trough is greater than the area of described inlet.Thus, the condensation efficiency of mist can be improved further.
In some embodiments of the invention, the area sum of the venthole of described gas distributor is greater than the area of described air inlet.Thus, the condensation efficiency of mist can be improved further.
In some embodiments of the invention, gas-liquid separation device is provided with in described gas outlet.Thus, the condensation efficiency of mist can be improved further.
Additional aspect of the present invention and advantage will part provide in the following description, and part will become obvious from the following description, or be recognized by practice of the present invention.
Accompanying drawing explanation
Above-mentioned and/or additional aspect of the present invention and advantage will become obvious and easy understand from accompanying drawing below combining to the description of embodiment, wherein:
Fig. 1 is drip washing device structure schematic diagram according to an embodiment of the invention.
Detailed description of the invention
Be described below in detail embodiments of the invention, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has element that is identical or similar functions from start to finish.Be exemplary below by the embodiment be described with reference to the drawings, be intended to for explaining the present invention, and can not limitation of the present invention be interpreted as.
In describing the invention, it will be appreciated that, term " " center ", " longitudinal direction ", " transverse direction ", " length ", " width ", " thickness ", " on ", D score, " front ", " afterwards ", " left side ", " right side ", " vertically ", " level ", " top ", " end " " interior ", " outward ", " clockwise ", orientation or the position relationship of the instruction such as " counterclockwise " are based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, instead of indicate or imply that the device of indication or element must have specific orientation, with specific azimuth configuration and operation, therefore limitation of the present invention can not be interpreted as.
In the present invention, unless otherwise clearly defined and limited, the term such as term " installation ", " being connected ", " connection ", " fixing " should be interpreted broadly, and such as, can be fixedly connected with, also can be removably connect, or connect integratedly; Can be mechanical connection, also can be electrical connection; Can be directly be connected, also indirectly can be connected by intermediary, can be the connection of two element internals.For the ordinary skill in the art, above-mentioned term concrete meaning in the present invention can be understood as the case may be.
In the present invention, unless otherwise clearly defined and limited, fisrt feature second feature it " on " or D score can comprise the first and second features and directly contact, also can comprise the first and second features and not be directly contact but by the other characterisation contact between them.And, fisrt feature second feature " on ", " top " and " above " comprise fisrt feature directly over second feature and oblique upper, or only represent that fisrt feature level height is higher than second feature.Fisrt feature second feature " under ", " below " and " below " comprise fisrt feature immediately below second feature and tiltedly below, or only represent that fisrt feature level height is less than second feature.
In prior art, drip washing equipment generally adopts void tower or fills the fillers such as a part of Pall ring, and top is provided with nozzle, condensate liquid from nozzles spray go out by reduction tail gas gaseous chlorine silane be condensed into liquid state.Because reduction tail gas can not all be arrived by spray, make vapor liquid heat exchange insufficient, understand some chlorosilane and remain in tail gas and lose, thus reduce the casting yield of chlorosilane.In order to improve the casting yield of chlorosilane, normally adopting liquid pump to make low temperature chlorosilane liquid produced forced circulation in drip washing equipment, needing preparation chlorosilane deep-cooling heat exchanger for this reason, drip washing device temperature is controlled in lower scope.Thus, energy consumption and operating cost is made to increase considerably.And the drip washing equipment being filled with Pall ring filler easily blocks for the reduction tail gas that solid impurity content is more.
For this reason, according to an aspect of the present invention, the present invention proposes a kind of drip washing equipment, below with reference to Fig. 1, the drip washing equipment of the embodiment of the present invention is described in detail.
According to a particular embodiment of the invention, this drip washing equipment comprises: housing 100, sieve plate 200, liquid distribution trough 300 and gas distributor 400.According to a particular embodiment of the invention, this drip washing equipment top is provided with two spray equipments, respectively for low temperature chlorosilane and circulation chlorosilane leacheate.It is to be understood that the low temperature chlorosilane condensate liquid that low temperature chlorosilane is follow-up deep cooling to be obtained, this part chlorosilane can use pump, or enters spray equipment by potential difference; And the chlorosilane leacheate that circulates is the cycling elution liquid of drip washing equipment self, this part chlorosilane uses pump to realize the circulation of chlorosilane.This drip washing equipment is utilized to process reduction tail gas, the dust in reduction tail gas can be removed, adopt the chlorosilane of low temperature as leacheate simultaneously, the part chlorosilane in reduction tail gas can be condensed, and after drip washing, reduce the temperature of reduction tail gas.Thus, reach simultaneously dedusting, initial gross separation chlorosilane and reduce reduction exhaust temperature object.And by arranging multiple sieve plate in drip washing equipment, effectively can improve leacheate and contacting with reduction the effective of tail gas, and then the dedusting cooling efficiency of reduction tail gas can be improved further.According to a particular embodiment of the invention, housing 100 have the air inlet 101 being positioned at this housing 100 bottom, the gas outlet 102 being positioned at this housing 100 top, be positioned at this housing 100 top inlet 103, be positioned at the liquid outlet 104 bottom this housing 100 and be positioned at this housing 100 bottom and higher than the condensate outlet 105 of air inlet 101.According to a particular embodiment of the invention, gas-liquid separation device 500 is provided with in gas outlet 102.Also protocercal tail enters drip washing equipment through air inlet 101, leacheate enters drip washing equipment through inlet 103, and reduction tail gas contacts with leacheate is reverse in drip washing equipment, significantly increases liquid gas contact area, reduction tail gas is all sprayed to thus, can effectively improve dedusting and condensation effect.
According to a particular embodiment of the invention, sieve plate 200 to be located in housing 100 and between inlet 103 and condensate outlet 105.According to a particular embodiment of the invention, sieve plate has multiple through hole, and the diameter of its through hole 201 is also not particularly limited, and according to concrete example of the present invention, the diameter of through hole 201 can be 10 ~ 20 millimeters.If through-hole aperture is too small, after system a period of time out of service, through hole may be caused blocked; And hole is excessive, hydraulic performance declines, and causes veneer efficiency to decline, finally causes condensation dust removing effects bad.Therefore, select through-hole diameter between 10 ~ 20 millimeters, condensation good dedusting effect can be ensured, through hole can be avoided again to block.According to embodiments of the invention, sieve plate 200 can be multiple sieve plate, the setting and multiple sieve plate is spaced apart from each other along the vertical direction.According to a particular embodiment of the invention, the number of plies of sieve plate 200 is also not particularly limited, and according to concrete example of the present invention, sieve plate 200 can be 1 ~ 10 layer, preferably 2 ~ 5 layers.If sieve plate is very few, makes mass-and heat-transfer insufficient, thus affect dust removing effects.Therefore, by arranging multiple sieve plate, can effectively improve heat transfer, mass transfer effect, to reach rectifying better, dust removing effects.According to a particular embodiment of the invention, the distance between adjacent sieve plate 200 is also not particularly limited, and according to concrete example of the present invention, the distance between adjacent sieve plate 200 can be 100 ~ 400 millimeters.If adjacent sieve plate spacing is too small, reduction tail gas is serious by carrying phenomenon during sieve plate secretly, affect dust removing effects, and between adjacent sieve plate, spacing is excessive, will affect rectification effect.Thus, the distance set between adjacent sieve plate is 100 ~ 400 millimeters, can reach better rectifying, dust removing effects.
According to a particular embodiment of the invention, liquid distribution trough 300 to be located in housing 100 and to be connected with inlet 103.According to embodiments of the invention, liquid distribution trough 300 has fluid hole 301, and according to a particular embodiment of the invention, the size of fluid hole 301 is also not particularly limited, according to concrete example of the present invention, the area sum of fluid hole 301 can be greater than the area of inlet 103.Thus, can prevent condensate flow-rate from crossing the Accumulation Phenomenon caused slowly, thus affect dust removing effects.
According to a particular embodiment of the invention, gas distributor 400 to be located in housing 100 and to be connected with air inlet 101.According to embodiments of the invention, gas distributor 400 has venthole 401, and according to a particular embodiment of the invention, the size of venthole 301 is also not particularly limited, according to concrete example of the present invention, the area sum of venthole 401 can be greater than the area of air inlet 101.Thus, can prevent gas flow rate from crossing the phenomenon of feeling suffocated caused slowly, thus affect dust removing effects.
As mentioned above, can have according to the drip washing equipment of the embodiment of the present invention and be selected from following advantage one of at least:
Utilize drip washing equipment of the present invention can realize dedusting, initial gross separation chlorosilane and reduce the object of reduction exhaust temperature;
Drip washing equipment according to the embodiment of the present invention has simple to operate, stable advantage;
According to the drip washing equipment of the embodiment of the present invention, the low temperature chlorosilane condensate liquid produced in subsequent handling can be used as a part for leacheate, fully reclaimed cold thus; Simultaneously low temperature chlorosilane condensate liquid and do not need before entering drip washing equipment to cool again, has saved cold;
Drip washing equipment according to an embodiment of the invention, the chlorosilane leacheate of discharging drip washing equipment is normal temperature, the low temperature chlorosilane of outer row before comparing, decrease and be dissolved in hydrogen chloride in chlorosilane and amounts of hydrogen, thus substantially reduce the number the fixed gas gas flow of chlorosilane tank field generation, both save the cold consumption of chlorosilane tank field, decrease chlorosilane tank field material loss;
Drip washing equipment according to an embodiment of the invention, by increasing the structure that sieve plate improves existing drip washing equipment in inside, significantly improves mass transfer and heat-transfer effect thus; Adopt this drip washing equipment can reduce the liquid level of bubbling simultaneously, solve the problem that vibration equipment is large.
In the description of this description, specific features, structure, material or feature that the description of reference term " embodiment ", " some embodiments ", " example ", " concrete example " or " some examples " etc. means to describe in conjunction with this embodiment or example are contained at least one embodiment of the present invention or example.In this manual, identical embodiment or example are not necessarily referred to the schematic representation of above-mentioned term.And the specific features of description, structure, material or feature can combine in an appropriate manner in any one or more embodiment or example.
Although illustrate and describe embodiments of the invention above, be understandable that, above-described embodiment is exemplary, can not be interpreted as limitation of the present invention, those of ordinary skill in the art can change above-described embodiment within the scope of the invention when not departing from principle of the present invention and aim, revising, replacing and modification.
Claims (4)
1., for a drip washing equipment for the reduction tail gas in polycrystalline silicon production system, it is characterized in that, comprising:
Housing, described housing have the air inlet being positioned at this lower housing portion, the gas outlet being positioned at this case top, be positioned at this housing upper inlet, be positioned at this housing bottom liquid outlet and be positioned at this lower housing portion and higher than the condensate outlet of described air inlet;
Sieve plate, described sieve plate to be located in described housing and between described inlet and described condensate outlet;
Liquid distribution trough, described liquid distribution trough to be located in described housing and to be connected with described inlet; And
Gas distributor, described gas distributor to be located in described housing and to be connected with described air inlet,
This drip washing equipment top is provided with two spray equipments, and respectively for low temperature chlorosilane and circulation chlorosilane leacheate, low temperature chlorosilane is the low temperature chlorosilane condensate liquid that follow-up deep cooling obtains, and circulation chlorosilane leacheate is the cycling elution liquid of drip washing equipment self,
Wherein, described sieve plate has multiple through hole, and the diameter of described through hole is 10 ~ 20 millimeters,
Described sieve plate comprises multilayer, and described multiple sieve plate is spaced apart from each other setting along the vertical direction, and the distance between adjacent sieve plate is 100 ~ 400 millimeters,
Described sieve plate is 2 ~ 5 layers.
2. the drip washing equipment for the reduction tail gas in polycrystalline silicon production system according to claim 1, is characterized in that, the area sum of the fluid hole of described liquid distribution trough is greater than the area of described inlet.
3. the drip washing equipment for the reduction tail gas in polycrystalline silicon production system according to claim 1, is characterized in that, the area sum of the venthole of described gas distributor is greater than the area of described air inlet.
4. the drip washing equipment for the reduction tail gas in polycrystalline silicon production system according to claim 1, is characterized in that, be provided with gas-liquid separation device in described gas outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310553092.1A CN103551003B (en) | 2013-11-08 | 2013-11-08 | Drip washing equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310553092.1A CN103551003B (en) | 2013-11-08 | 2013-11-08 | Drip washing equipment |
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| Publication Number | Publication Date |
|---|---|
| CN103551003A CN103551003A (en) | 2014-02-05 |
| CN103551003B true CN103551003B (en) | 2015-09-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310553092.1A Active CN103551003B (en) | 2013-11-08 | 2013-11-08 | Drip washing equipment |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103551007B (en) * | 2013-11-08 | 2015-12-02 | 中国恩菲工程技术有限公司 | The method and system of process polycrystalline silicon reduction exhaust |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6863874B1 (en) * | 1998-10-12 | 2005-03-08 | Johnson Matthey Public Limited Company | Process and apparatus for treating combustion exhaust gas |
| CN201906538U (en) * | 2010-11-18 | 2011-07-27 | 湖南省湘维有限公司 | Novel acetylene gas dry washing tower |
| CN203598642U (en) * | 2013-11-08 | 2014-05-21 | 中国恩菲工程技术有限公司 | Leaching device |
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2013
- 2013-11-08 CN CN201310553092.1A patent/CN103551003B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6863874B1 (en) * | 1998-10-12 | 2005-03-08 | Johnson Matthey Public Limited Company | Process and apparatus for treating combustion exhaust gas |
| CN201906538U (en) * | 2010-11-18 | 2011-07-27 | 湖南省湘维有限公司 | Novel acetylene gas dry washing tower |
| CN203598642U (en) * | 2013-11-08 | 2014-05-21 | 中国恩菲工程技术有限公司 | Leaching device |
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| CN103551003A (en) | 2014-02-05 |
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