CN103543601A

CN103543601A - Micrographic forming method

Info

Publication number: CN103543601A
Application number: CN201210245848.1A
Authority: CN
Inventors: 赵建平
Original assignee: Individual
Current assignee: Individual
Priority date: 2012-07-17
Filing date: 2012-07-17
Publication date: 2014-01-29

Abstract

The invention discloses a micrographic forming method and relates to a micrographic forming method with size from several microns to tens of microns or even hundreds microns. By filling pigment with different colors, different pattern colors can be obtained. The micrographic forming method can be widely used in fields such as micro characters/patterns anti-counterfeiting, three-dimensional/dynamic display/anti-counterfeiting and the like.

Description

A kind of micrographics manufacturing process

Affiliated technical field

The present invention relates to a kind of yardstick from several microns to tens microns the micrographics preparation method of up to a hundred microns even; By filling the pigment of different color, can obtain different pattern colors.The fields such as this technology can be widely used in micro text/pattern anti-fake, three-dimensional/dynamically to show/false proof.

Background technology

Since the nineties in last century, micro text, 3-D display, the technology such as false proof have just obtained developing rapidly, be mainly to take laser hologram as main, but this technology are semi-over, and antiforge function is challenged.In addition such as technology such as watermark anti-counterfeitings, also developed for a long time in addition, ultimate principle and implementation method are also understood by masses substantially.In the urgent need to developing new anti-counterfeiting technology.

The amplification that people have proposed based on optical principle for this reason shows method for anti-counterfeit, and this side's ratio juris is: under normal illumination condition, the ultimate resolution of human eye is 1 minute, and under distance of distinct vision 250mm condition, the ultimate resolution of human eye is 0.072mm.In general for making eyes not tired, the visual angle of human eye, about 4 minutes, can resolution distance be two points of 0.3mm left and right.In the ordinary course of things, 10 * 10 stippled composition simple patterns, its size is about 4mm * 4mm left and right, and other tiny object must adopt magnifier or microscope to amplify just can see its fine structure clearly.For the pattern that is less than this yardstick, must adopt the aids such as microscope, this observation brings very big inconvenience.

Subsequently, people have developed again three-dimensional based on microlens array, have dynamically shown and anti-counterfeiting technology, yet above-mentioned technology is subject to the restriction of existing pixel dimension (150 microns), is difficult to obtain smooth dynamic display effect and slim thickness.In like manner, in three-dimensional television, also have the problems referred to above, adopt existing pixel, the demonstration of 3-D view becomes phasic Chang with observation angle, only has the more small Pixel Dimensions of employing can obtain smooth Three-Dimensional Dynamic effect.

Yet, existing printing technology as: screen printing technique, relief printing plate should be brushed technology, intaglio printing technology etc. all can only complete the resolving power of 600DPI, i.e. per inch 600 lines pair, minimum approximately 40 microns of left and right of lines cycle.For width even less lines of 1-2 micron only, adopt existing typography cannot complete at all.Lines based on above-mentioned tens micron order width realize false proof and dynamic 3D show impossible especially.

In order to overcome the problems referred to above, we have proposed a kind of micrographics manufacturing process based on stamping technique, the impression that first the method utilizes stamping technique to complete micron order figure on two surfaces or the single surface of organic plastics rete, subsequently by realizing the shaping of micrometre-grade pattern at recessed portion filler pigment.Based on said method, can effectively overcome the not high problem of existing stamping technique resolving power, complete the shaping of micro-pattern with micron order resolving power, in fields such as 3D demonstration, micro pattern anti-fake, dynamic demonstrations, be with a wide range of applications.

Summary of the invention:

Based on above-mentioned consideration, a kind of yardstick is the micrographics preparation method of up to a hundred microns even from several microns to tens microns; By filling the pigment of different color, can obtain different pattern colors.This structure can be shaped and have micro-pattern of micron order resolving power.

Technical solution of the present invention completes by following steps: the dynamic micrographics manufacturing process of a kind of 3D/, is characterized in that comprising the following steps:

1, adopt the correlation techniques such as conventional lithography, electroforming to complete the preparation of two groups of target micrographics mother matrixs; Formation is including but not limited to the micrographics imprint masters of micron order lines,

2, adopt the nano impression mode that includes but not limited to volume to volume, two groups of micrographics imprint masters picture on surface that complete alignment order is as required impressed to two surfaces in substrate film.Substrate film described in above statement is the various materials including but not limited to plastics.

3, the pigment that includes but not limited to ink is coated on to the single surface of substrate film or two surfaces, pigment can be filled up and impressed in the micron order lines groove of rear generation.Employing includes but not limited to that the means such as scraper and instrument strike off the pigment of groove outside;

4, the lines in formation micrographics mother matrix claimed in claim 1 not only comprise micron-sized raised line, also comprise tens microns of even raised line of hundreds of micron, after having impressed, substrate film surface not only comprises micron-sized groove lines, also comprises tens microns of even groove lines of hundreds of micron.For being greater than in mother matrix in the raised line of 5 microns, the gap at diverse location random arrangement width in micron left and right, 200 nanometer～2.After having impressed, have the reinforcement of stochastic distribution in the groove on substrate film surface, in the process of avoiding in means such as later-stage utilization scrapers, substrate film surface groove external pigment being struck off, large scale groove produces distortion.

5, adopt the follow-up techniques such as dry and coating protective paint to carry out anti-damage processing to the micro-pattern being shaped.

6,, by there is the groove structure of Different structural parameters in substrate film surface working, can obtain by micron dimension groove lines to the hundreds of micron pattern that even millimeter magnitude lines form.If substrate film another side is microlens array, can form dynamically, 3-D display effect, the field such as can be applicable to show, false proof.

The feature of maximum of the present invention is: adopt this technology can obtain characteristic dimension from several microns to hundreds of micron, even the line image of grade yardstick; And adopt traditional printing technology can only obtain the lines of tens microns.The lines of micron order resolving power live width are configured as 3-D display, dynamically show and anti-counterfeiting printing technology provides new means and realized approach.

The present invention compared with prior art has the following advantages:

1, present technique can realize the shaping of micron order lines, for manufacturing high resolution pattern, lays a good foundation;

2, adopt present technique can realize once accurately aiming at and be shaped of upper and lower two surfacial patterns of substrate film;

3, upper and lower two the surfacial pattern actings in conjunction of substrate film that prepared by present technique, can obtain 3-D display, dynamically show and the false proof texts of micro, this is that traditional printing technology cannot complete;

Accompanying drawing explanation

Fig. 1 is the structural representation of nano impression facility in the embodiment of the present invention one; This device forms with the impression substrate film that is labeled as 3 with two cylinders that are labeled as 2 by being labeled as 1, and two cylinders lay respectively at the both sides of impression substrate film.Mark 1 cylinder surface carries the imprint masters 4 for coining pattern, marks 2 cylinder surface and carries the imprint masters 5 for coining pattern.

Fig. 2 is the structural representation for generation of the imprint masters 4 of the micrographics such as straight line annulus; In figure, gray area represents recessed region, and white portion represents protruding region; All gray areas are positioned at sustained height, and the region of institute's adularescent is positioned at sustained height.6 gaps that represent the 1um of random arrangement in protruding large scale microstructure in figure;

Fig. 3 is the microstructure that adopts the substrate film surface that mother matrix 4 impressed in embodiment.In figure, gray area represents recessed region, and white portion represents protruding region; All gray areas are positioned at sustained height, in gray area, will in subsequent process, be filled pigment.The region of institute's adularescent is positioned at sustained height.

Fig. 4 is the technological process schematic diagram that in embodiment mono-, the substrate film rectangular raster face after impression completes applies the pigment that includes but not limited to ink.In figure, 3 is substrate film, and 7 for estimating the pigment of filling, and 8 is scraper;

Embodiment

1, one group of preparation of carrying the substrate film of two-sided micro-nano graph of embodiment; One side is the annulus that comprises live width 2um straight line, live width 20um, and the structures such as equilateral triangle that the length of side is 50um are at interior micrographics, the inner red ink of filling of micrographics figure; Another side is the microlens array of bore 100um;

First adopt the correlation techniques such as conventional lithography, electroforming to complete the preparation of micrographics mother matrix; Two groups of mother matrixs are loaded on respectively to two cylinder surfaces of the nano-imprinting device shown in Fig. 1; This device forms with the impression substrate film that is labeled as 3 with two cylinders that are labeled as 2 by being labeled as 1, and two cylinders lay respectively at the both sides of impression substrate film.Mark 1 cylinder surface carries for impressing the imprint masters 4 (profile) of micrographics, marks 2 cylinder surface and carries for impressing lenticular imprint masters 5 (profile).

Two groups of micrographics imprint masters picture on surface that complete are impressed to two surfaces in substrate film.Substrate film described in above statement is the various materials including but not limited to plastics, and moulding process can be ultraviolet stamping, can be also hot padding.For impressing imprint masters 4 vertical views of micrographics, see Fig. 2, the micrographics vertical view after having impressed is shown in Fig. 3.

Finally, red ink is coated on to substrate film micrographics surface, and pigment is filled up impressed in the lines groove of rear generation, finally adopt scraper that the pigment of groove outside is struck off, form one side and carry microlens array, one side is carried the substrate film of red micro-nano graph, and Fig. 4 is shown in by implementing process schematic diagram.

Claims

1. adopt the correlation techniques such as conventional lithography, electroforming to complete the preparation of two groups of target micrographics mother matrixs; Formation is including but not limited to the micrographics imprint masters of micron order lines.

2. adopt the nano impression mode that includes but not limited to volume to volume, two groups of micrographics imprint masters picture on surface that complete alignment order is as required impressed to two surfaces in substrate film.Substrate film described in above statement is the various materials including but not limited to plastics.

3. the pigment that includes but not limited to ink is coated on to the single surface of substrate film or two surfaces, pigment can be filled up and impressed in the micron order lines groove of rear generation.Employing includes but not limited to that the means such as scraper and instrument strike off the pigment of groove outside.

4. the lines in formation micrographics mother matrix claimed in claim 1 not only comprise micron-sized raised line, also comprise tens microns of even raised line of hundreds of micron, after having impressed, substrate film surface not only comprises micron-sized groove lines, also comprises tens microns of even groove lines of hundreds of micron.For being greater than in mother matrix in the raised line of 5 microns, the gap at diverse location random arrangement yardstick in micron left and right, 200 nanometer～2.After having impressed, have the reinforcement of stochastic distribution in the groove on substrate film surface, in the process of avoiding in means such as later use scrapers, substrate film surface groove external pigment being struck off, large scale groove produces distortion.

5. adopt the follow-up techniques such as dry and coating protective paint to carry out anti-damage processing to the micro-pattern being shaped.

6. by there is the groove structure of Different structural parameters in substrate film surface working, can obtain by micron dimension groove lines to the hundreds of micron pattern that even millimeter magnitude lines form.If substrate film another side is microlens array, can form dynamically, 3-D display effect, the field such as can be applicable to show, false proof.