CN103540727A - Metal two-dimensional nano lamellar structure and preparation method thereof - Google Patents

Abstract

The invention relates to improved technologies of metal material structural performances, and specifically relates to a metal two-dimensional nano lamellar structure prepared by means of plastic deformation and a preparation method thereof, which are applicable to metal materials nickel, aluminum, copper, iron, titanium and alloys thereof. According to the invention, the two-dimensional nano lamellar structure with high strength and high thermal stability is obtained by applying high-speed, huge-stress and high-stress-gradient plastic deformation. The lamellar thickness is below 200 nanometers and the draw ratio is over 5. The nano lamellar structure has a strong deformation texture, and the crystallographic orientation different between the inner part of the lamellar layer and the lamellar layer is below 15 degrees. The two-dimensional nano lamellar structure prepared by the invention has superior comprehensive performance and considers both strength and heat stability.

Description

Metal two-dimensional nano synusia structure and preparation method

Technical field

The present invention relates to metal structure improvement in performance technology, be specially a kind of metal two-dimensional nano synusia structure and preparation method who utilizes viscous deformation to prepare, be applicable to metallic substance nickel, aluminium, copper, iron, titanium and alloy thereof.

Background technology

Nano crystal material refers to the single-phase or heterogeneous crystalline material that is less than the microstructure of 100nm by size.Due to its scantlings of the structure than common polycrystalline material little approximately three orders of magnitude, the shared ratio of crystal boundary increases substantially.The nanocrystalline of preparation is at present the three-dimensional axle shape that waits, and there is high big angle crystal boundary density and random crystalline orientation, this nano crystal material has the performance that is better than traditional material, such as: the wear resistance of high strength, high rigidity, high diffusibility energy, excellence etc., but its thermostability is very poor, conventionally show the inversion relation of intensity-thermostability.In addition, severe plastic deformation is the effective ways of preparing nano metal material present stage, comprise: high pressure torsion method (high pressure torsion, passage extruding (the equal channel angular pressing such as HPT),, ECAP) and accumulation ply rolling (accumulative roll bonding, ARB) etc.These grain refinings reduce the crystal grain of metal (as aluminium, iron, nickel etc.) to sub-micrometer scale, but but scantlings of the structure can not be further reduced to nanoscale (<100nm).Major cause is to increase a certain threshold value when dependent variable, and dislocation accumulation and annihilation have reached running balance, and dislocation desity can not continue to increase.Take pure nickel as example, and when dependent variable reaches certain value (approximately 5～10), grain-size reaches capacity (being about 200nm), and intensity is about 1000MPa(document 3:R.Pippan etc., Adv.Eng.Mater. (advanced engineering materials), and 2006,8:1046).Break through saturated structures limitation of size, further reinforced metal, obtaining Good All-around Property is the great difficult problem of nano metal research.

In recent years, by forming special twin-plane boundary, the saturated grain-size of metallic substance can be significantly reduced to nanoscale, and the over-all properties of nano crystal material is greatly improved simultaneously.People (the document 1:L.Lu etc. such as China material supply section scholar Lu, Science (science), 2004,304:422) by introduce high-density coherence twin-plane boundary in the crystal grain of submicron-scale, invented a kind of novel nano twin structure copper, it has high strength and high thermal stability.American scientist (document 2:T.Chookajorn etc., Science (science), 2012,337:951), by adding a large amount of alloying elements, make alloying element in grain boundaries segregation, reduce the energy of crystal boundary, thereby prepare, there is high strength, the nanostructure tungstenalloy of high thermal stability.Add trace alloying element, can significantly reduce the saturated grain-size that distortion causes, take pure nickel as example, when adding the Ti of 0.14wt%, its saturated grain-size can be reduced to below 50nm.By cold plasticity, be out of shape, the scantlings of the structure of pure metal material also can be refined to nanoscale.Yet these methods all have some limitations, such as, nano twin crystal structure is only in having, just easily obtain in the metallic substance of low stacking fault energy, alloying tends to change the physicochemical property of material, and nano metal prepared by low-temperature deformation is more unstable.

As everyone knows, the propagation of dislocation, to reset be the essential reason of structure refinement, and the appearance of saturated mode comes from dislocation desity that distortion causes and increases the dislocation desity causing with dynamic recovery and reduce and reached running balance; And the stability of structure depend on the transfer ability at interface, store can and the homogeneity of structure.Break through the further raising of saturated limitation of size requirement dislocation desity-raising dislocation and accumulate or reduce dislocation disappearance, and raising structural stability claimed structure is even, storage energy is low and interfacial migration is difficult.Traditional pass through to increase method that deflection improves dislocation desity and locked into the dynamic recovery that structure refinement causes and aggravate, and the high-density big angle crystal boundary of ultra-fine grained structure, structural inhomogeneity, high storage energy and interfacial migration are difficult to the structural stability having had in essence.Consider that dislocation accumulation and rate of deformation and strain gradient are closely related, and this influence factor is not high with the attention rate being subject to for a long time.Nearest research shows that high speed plastic distortion accelerated structure evolution, and the dislocation desity when identical deflection is higher, and scantlings of the structure is less, and high strain gradient has obtained the dislocation desity far above saturated mode.In addition, high speed plastic distortion has obtained take low angle boundary as main nanostructure, and interfacial energy and interfacial migration are far below big angle crystal boundary.Therefore at a high speed, large strain and the distortion of high strain gradient plasticity will be expected to solve the difficult problem that nano metal faces.

Summary of the invention

The object of the present invention is to provide a kind of metal two-dimensional nano synusia structure and preparation method who utilizes viscous deformation to prepare, solve the problems such as saturated limitation of size and over-all properties (as: optimization of intensity-thermostability).

Technical scheme of the present invention is:

A two-dimensional nano synusia structure, synusia thickness is below 200 nanometers, and length-to-diameter ratio is more than 5, has strong deformation texture, and the crystalline orientation between synusia inside and synusia is poor below 15 °.

Described metal two-dimensional nano synusia structure, synusia thickness is preferably 5～150 nanometers, and length-to-diameter ratio is preferably 5～100.

Described metal two-dimensional nano synusia structure, crystalline orientation between synusia inside and synusia is poor is preferably 1 °～10 °.

The preparation method of described metal two-dimensional nano synusia structure, adopts viscous deformation, and processing parameters meets following characteristics:

Deformation strain speed range:>=1s ^-1;

Deformation strain weight range: >=2, method of calculation:

$\mathrm{\&epsiv;}=\sqrt{\frac{2}{9}[{({\mathrm{\&epsiv;}}_{\mathrm{xx}}-{\mathrm{\&epsiv;}}_{\mathrm{yy}})}^2+{({\mathrm{\&epsiv;}}_{\mathrm{yy}}-{\mathrm{\&epsiv;}}_{\mathrm{zz}})}^2+{({\mathrm{\&epsiv;}}_{\mathrm{zz}}-{\mathrm{\&epsiv;}}_{\mathrm{xx}})}^2+\frac{3}{2}({\mathrm{\&gamma;}}_{\mathrm{xy}}^2+{\mathrm{\&gamma;}}_{\mathrm{yz}}^2+{\mathrm{\&gamma;}}_{\mathrm{zx}}^2)]},$ Wherein ε is equivalent strain amount, the ε in formula _xx, ε _yy, ε _zzand γ _xy, γ _yz, γ _zxrepresent respectively line strain and the shear strain corresponding with selected rectangular coordinate system x-y-z;

If mode of texturing is unilateral stretching or compression, ε=| ε _xx|;

If mode of texturing is pure shear distortion,

Deformation strain gradient scope:>=0.05 μ m ^-1, method of calculation: χ=ε/x, wherein χ is strain gradient, ε is equivalent strain amount, the range scale that x is effects of strain, μ m.

The preparation method of described metal two-dimensional nano synusia structure, the method has high strain rate, large strain and high strain gradient mode of texturing.

The preparation method of described metal two-dimensional nano synusia structure, metallic substance is nickel, aluminium, iron, copper, titanium; Or metallic substance is the alloy of nickel, aluminium, iron, copper, titanium.

The preparation method of described metal two-dimensional nano synusia structure, deformation strain speed preferable range: 10～10 ⁵s ^-1; Deformation strain amount preferable range: 2～100; Deformation strain gradient preferable range: 0.05～1 μ m ^-1.

Tool of the present invention has the following advantages:

1. the present invention utilizes viscous deformation in the metallic substance of nickel, aluminium, copper, iron, titanium and alloy thereof, to prepare the method for novel nano structure, proposes the technology of preparing of high strain rate, large strain and high strain gradient, has broken through traditional saturated limitation of size problem.

2. the metal two-dimensional nano synusia structure that prepared by the present invention has superior over-all properties, and such as having high strength and high thermal stability concurrently, this novel nanostructure can be improved the performance of material.Such as, at bearing class material surface, prepare one deck nano ply structure, can improve the fatigue property of member and abrasion resistance properties etc.

3. the present invention be take pure metal Ni as example, uses high speed shear to produce: equivalent strain amount>=10, strain rate>=10 ²s ^-1and strain gradient>=0.15 μ m ^-1viscous deformation, coarse grain is progressively refined to submicron-scale (0.1-0.5 μ m), and finally forms two-dimensional nano synusia structure.This novel metal two-dimensional nano synusia structure has following characteristics: the short-axis direction of synusia is of a size of 5～60nm, and average aspect ratio is greater than 10, has strong shearing strain texture, the poor <15 ° of crystalline orientation between synusia inside and synusia.Its hardness is 6 times of corresponding coarse-grain sample, be that the axle shapes such as conventional three-dimensional are received 2 times of Ultra-fine Grained, and its grain growth temperature is nanocrystalline higher 55 ℃ than axle shapes such as conventional three-dimensional.

Accompanying drawing explanation

Fig. 1 is the optical microscope photograph that utilizes the pure nickel rod cross section of surface mechanical attrition treatment technical finesse.

Fig. 2 utilizes in the pure nickel rod of surface mechanical attrition treatment technical finesse strain with the distribution curve of the degree of depth.

Fig. 3 utilizes in the pure nickel rod of surface mechanical attrition treatment technical finesse strain rate and strain gradient with the distribution curve of the degree of depth.

Fig. 4 utilizes transmission electron microscope photo (a), the interface spacing of the pure nickel rod top layer nano ply structure of surface mechanical attrition treatment technical finesse add up (b) and choose electron diffraction (c).

Fig. 5 (A) is the high resolution transmission electron microscopy photo of observing along [110] orientation of nano ply structure, (B), (C), (D), (E), (F) and (G) be the high resolution Fourier transform phase of corresponding synusia inside and lamellar boundary, disclose stacking fault, twin, Small angle misorientation.

Fig. 6 utilizes the size of two kinds of typical structures (nano ply structure and ultra-fine grained structure) of preparing in the pure nickel rod of surface mechanical attrition treatment technical finesse with the variation of annealing temperature.

Fig. 7 is the statistical distribution (c) of transmission electron microscope photo (a), electron diffraction (b) and synusia thickness of utilizing the IF rod iron top layer nano ply structure of surface mechanical attrition treatment technical finesse.

Fig. 8 is the transmission electron microscope photo that utilizes the 100 dark regions of μ m, pure nickel rod middle distance surface of surface mechanical attrition treatment technical finesse.

Embodiment

The present invention prepares a kind of New Two Dimensional nano ply structure in the metallic substance of nickel, aluminium, copper, iron, titanium and alloy thereof, this nano ply structure has following characteristics: synusia thickness is below 200 nanometers, length-to-diameter ratio is more than 5, have strong deformation texture, the crystalline orientation between synusia inside and synusia is poor below 15 °.

The present invention proposes a kind of high strain rate, large strain and the distortion of high strain gradient plasticity and prepare the method for novel nano structure, comprise following two steps:

Metallic substance is introduced the viscous deformation with following characteristics, can prepare two-dimensional nano synusia structure.

(1) deformation strain speed:>=1s ^-1;

(2) deformation strain weight range: >=2, method of calculation:

$\mathrm{\&epsiv;}=\sqrt{\frac{2}{9}[{({\mathrm{\&epsiv;}}_{\mathrm{xx}}-{\mathrm{\&epsiv;}}_{\mathrm{yy}})}^2+{({\mathrm{\&epsiv;}}_{\mathrm{yy}}-{\mathrm{\&epsiv;}}_{\mathrm{zz}})}^2+{({\mathrm{\&epsiv;}}_{\mathrm{zz}}-{\mathrm{\&epsiv;}}_{\mathrm{xx}})}^2+\frac{3}{2}({\mathrm{\&gamma;}}_{\mathrm{xy}}^2+{\mathrm{\&gamma;}}_{\mathrm{yz}}^2+{\mathrm{\&gamma;}}_{\mathrm{zx}}^2)]},$ Wherein ε is equivalent strain amount, the ε in formula _xx, ε _yy, ε _zzand γ _xy, γ _yz, γ _zxrepresent respectively line strain and the shear strain corresponding with selected rectangular coordinate system x-y-z.

If mode of texturing is unilateral stretching or compression, ε=| ε _xx|; If mode of texturing is pure shear distortion,

(3) deformation strain gradient>=0.05 μ m ^-1, method of calculation: χ=ε/x, wherein χ is strain gradient, ε is equivalent strain amount, the range scale that x is effects of strain, μ m.

The present invention proposes high strain rate, large strain and high strain gradient three to combine and prepare the technical though of nano structural material first.For distortion three elements are incorporated in the middle of a certain concrete viscous deformation technology, selected (but being not limited to this technology) a kind of surface mechanical attrition treatment technology (document 6:W.L.Li etc., Scr.Mater. (material wall bulletin), 2008,59:546).This technology is by introducing shearing strain at a high speed at sample surfaces, by continuous accumulation shear strain, finally making the microtexture of skin-material be refined to nanoscale.Surface mechanical attrition treatment equipment consists of digital controlled lathe and sintering skin of cemented carbide cutter, pending axle metalloid sample is installed on to the rotation system output terminal of lathe, by rotation system with certain rotating speed V ₁drive treated sample high speed rotating; Spherical tool is arranged on the auto feed system bare terminal end of lathe, and cutter is from the direction contact sample surfaces perpendicular to axle class sample, and feed system presets the draught a of each processing _p, and with certain speed V ₂from a side direction opposite side relative movement of sample, cyclic process several like this, until each deformation parameter reaches design requirements of the present invention.

Below by one exemplary embodiment, the present invention is described.It is pointed out that and those skilled in the art will readily understand, following instance only for provide by way of example about one exemplary embodiment more of the present invention, it does not also mean that the present invention is carried out to any restriction.

Embodiment 1:

Utilize surface mechanical attrition treatment technology to prepare the steady nano ply structure of high-strength height on pure nickel rod surface:

Pure nickel stacking fault energy: 130mJ/m ²;

Pure nickel crystalline structure: face-centered cubic (FCC);

Pure nickel grain-size before processing: 500 μ m;

Pure nickel rod diameter: 10mm;

Pure nickel chemical composition (weight percent) is as following table:

C	Si	Mn	P	S	Cr	Fe	Al	Co	Cu	Ti	Mg	Ni
													0.003	0.009	0.003	0.003	0.001	0.004	0.021	0.014	0.004	0.005	0.048	0.003	99.882

Equipment: digital controlled lathe;

Main shaft (processed work) rotating speed V ₁: 300r/min;

Each draught a _p: 30 μ m/ time;

Axial feed velocity V ₂: 6mm/min;

Spherical processing tool diameter: 8mm;

Processing number of times: 8 times;

After surface mechanical attrition treatment, the material in nickel rod has from outward appearance to inner essence stood the dependent variable of graded, and similarly, strain rate and strain gradient also present Gradient distribution.The sample of handling is carried out to om observation from cross section, and its microstructure as shown in Figure 1.The structure on top layer is by serious refinement, but still obvious compared with the historical rudiment of deep regions distortion, one of them bends in plastic history gradually with annealing twin circle of white triangles shape mark.Using this twin boundary as the inherence sign in material deformation process, can estimate the distribution of dependent variable, strain rate and strain gradient in material deformation process, as shown in Figure 2 and Figure 3.

In the region dark apart from top layer 0～80 μ m, the variation range of dependent variable, strain rate and strain gradient is as shown in the table:

The degree of depth (μ m)	Dependent variable	Strain rate (s -1）	Strain gradient (μ m -1)
				0～80	33～13	（2～0.7）×10 3	0.4～0.15

In the region dark apart from top layer 10～70 μ m, formed typical nano ply structure, as shown in Figure 4.Fig. 4 (a) is the transmission electron microscope photo of nano ply structure, the characteristic feature that shows this structure is the straight lamellar boundary being parallel to each other, synusia elongates along shear direction (being vertical direction in this figure), and minor axis dimension is 20 nanometers and major axis dimension can reach several microns.Inner at synusia, there are some substructures, as dislocation boundary and distortion twin boundary etc.Fig. 4 (b) is the statistics of synusia thickness, and average synusia thickness is 20nm.Fig. 4 (c) shows that for choosing electron diffraction its crystalline orientation is not random, has stronger shearing strain texture.Fig. 5 is high resolution transmission electron microscopy, shows that synusia inside contains fault, twin He little Jiao dislocation circle, and between synusia, has the misorientation of 3 °, and a large amount of Hrtem Observations are supported this observations.By 25g load, nano ply structure is carried out to the experiment of Vickers' hardness impression test, show that its hardness value is 6.4 ± 0.32GPa.To nano ply structure from 300 ℃ to 900 ℃ temperature range carry out the annealing experiment of 1h, show that the initial Coarsening Temperature of nanometer is about 506 ℃ of (see figure 6)s.

In the present embodiment, have the two-dimensional nano synusia structure of high strength and high thermal stability, synusia thickness is 20 nanometers, and length-to-diameter ratio can have strong shearing strain texture up to 100, is that little angular orientation is poor between synusia inside and synusia, is about 1～10 °.

Embodiment 2:

Utilize surface mechanical attrition treatment technology to prepare nano ply structure on IF rod iron surface:

IF steel stacking fault energy :～200mJ/m ²;

IF steel crystalline structure: body-centered cubic (BCC);

IF crystalline grain of steel size before processing: 27 μ m;

IF rod iron diameter: 12mm;

Equipment: digital controlled lathe;

Main shaft (processed work) rotating speed V ₁: 300r/min;

Each draught a _p: 30 μ m/ time;

Axial feed velocity V ₂: 6mm/min;

Spherical processing tool diameter: 8mm;

Processing number of times: 10 times;

In the region dark apart from top layer 0～10 μ m, the variation range of dependent variable, strain rate and strain gradient is as shown in the table:

The degree of depth (μ m)	Dependent variable	Strain rate (s -1）	Strain gradient (μ m -1)
				0～10	20～10	（1.5～0.7）×10 3	0.3～0.1

Similar surface mechanical attrition treatment is carried out on IF rod iron surface, in the region dark apart from surface 0～10 μ m, has formed nano ply structure.Fig. 7 a shows that this structure has typical synusia feature, and length-to-diameter ratio is greater than 10.Similarly, because being, under high strain gradient, localized shear deformation has occurred, this structure has stronger shear texture (seeing Fig. 7 b).Fig. 7 c is the statistical distribution of IF rod iron top layer nano ply structure, shows that synusia thickness distribution is comparatively concentrated, and average synusia thickness is 22nm.

In the present embodiment, have the two-dimensional nano synusia structure of high strength and high thermal stability, synusia thickness is 22 nanometers, and length-to-diameter ratio occurrence is 14.5, has strong shearing strain texture, is that little angular orientation is poor between synusia inside and synusia, is about 1～15 °.

Comparative example 1

The pure nickel sample of preparing by surface mechanical attrition treatment technology in embodiment 1, the approximately 100 dark regions of μ m, distance surface, its corresponding deformation parameter is as follows: dependent variable is 10, and strain rate is 6 * 10 ²s ^-1, strain gradient is 0.12 μ m ^-1.In this region, formed typical ultra-fine grained structure, as shown in Figure 8.The average grain size of this Ultra-fine Grained is 230nm, and length-to-diameter ratio is less than 2, and crystal grain has the crystalline orientation of stochastic distribution.By 25g load, ultra-fine grained structure is carried out to the experiment of Vickers' hardness impression test, show that its hardness value is 2.76 ± 0.26GPa.To ultra-fine grained structure from 300 ℃ to 900 ℃ temperature range carry out the annealing experiment of 1h, show that the initial Coarsening Temperature of Ultra-fine Grained is about 467 ℃ of (see figure 6)s.Nano ply structure prepared by the present invention and the most basic difference of ultra-fine grained structure are that former structure size is less, and hardness (or intensity) is higher, thermostability is better, are a kind of high-strength, high steady nano ply structures.

Comparative example 2

The grain-size that high pressure torsion (HPT) is processed rear pure nickel is about 130nm, and vickers hardness number is about 3.2GPa, and the initial Coarsening Temperature of ultra-fine grained structure is less than 160 ℃.The deformation parameter that this high pressure torsion is processed is as follows: dependent variable is 100, strain rate <20s ^-1, strain gradient is less than 0.06 μ m ^-1.The present invention and the method fundamental difference are to have adopted high strain rate, and in conjunction with the deformation technology of high strain gradient, can make the grain-size of pure nickel be reduced to nanoscale, realize the strengthening of pure material.

Comparative example 3

The synusia thickness that rear pure nickel is processed in dynamic plasticity distortion (DPD) is about 110nm, and vickers hardness number is about 3.0GPa.The deformation parameter of this dynamic deformation technology is as follows: dependent variable is 2.3, and strain rate is 10 ²～10 ³s ^-1, strain gradient is little.Superiority of the present invention is to apply the distortion of large dependent variable, and in conjunction with high strain gradient, material microstructure is refine to nanoscale, further strengthening material.

Comparative example 4

The grain-size that rear IF steel is processed in ply rolling (ARB) is about 210nm.The deformation parameter of this ply rolling deformation technology is as follows: dependent variable is 4, strain rate <20s ^-1, strain gradient is little.The present invention is by applying two-forty gross distortion, and ties the strain gradient of overall height, can in IF steel, prepare nano ply structure.

Embodiment and comparative example result show, the present invention utilizes viscous deformation to prepare intensity and thermostability that New Two Dimensional nano ply structure has superelevation, is better than the axle shape nanostructures such as three-dimensional prepared by traditional gross distortion technology.The present invention by applying at a high speed, large strain and the distortion of high strain gradient plasticity realize, metal and alloy that to be applicable to take dislocation glide be main mode of texturing.

Claims (7)

1. a metal two-dimensional nano synusia structure, is characterized in that: synusia thickness is below 200 nanometers, and length-to-diameter ratio is more than 5, has strong deformation texture, and the crystalline orientation between synusia inside and synusia is poor below 15 °.

2. according to metal two-dimensional nano synusia structure claimed in claim 1, it is characterized in that: synusia thickness is preferably 5～150 nanometers, and length-to-diameter ratio is preferably 5～100.

3. according to metal two-dimensional nano synusia structure claimed in claim 1, it is characterized in that: crystalline orientation between synusia inside and synusia is poor is preferably 1 °～10 °.

4. a preparation method for metal two-dimensional nano synusia structure claimed in claim 1, is characterized in that: adopt viscous deformation, processing parameters meets following characteristics:

Deformation strain speed range:>=1s ^-1;

Deformation strain weight range: >=2, method of calculation:

$\mathrm{\&epsiv;}=\sqrt{\frac{2}{9}[{({\mathrm{\&epsiv;}}_{\mathrm{xx}}-{\mathrm{\&epsiv;}}_{\mathrm{yy}})}^2+{({\mathrm{\&epsiv;}}_{\mathrm{yy}}-{\mathrm{\&epsiv;}}_{\mathrm{zz}})}^2+{({\mathrm{\&epsiv;}}_{\mathrm{zz}}-{\mathrm{\&epsiv;}}_{\mathrm{xx}})}^2+\frac{3}{2}({\mathrm{\&gamma;}}_{\mathrm{xy}}^2+{\mathrm{\&gamma;}}_{\mathrm{yz}}^2+{\mathrm{\&gamma;}}_{\mathrm{zx}}^2)]},$ Wherein ε is equivalent strain amount, the ε in formula _xx, ε _yy, ε _zzand γ _xy, γ _yz, γ _zxrepresent respectively line strain and the shear strain corresponding with selected rectangular coordinate system x-y-z;

If mode of texturing is unilateral stretching or compression, ε=| ε _xx|;

If mode of texturing is pure shear distortion,

Deformation strain gradient scope:>=0.05 μ m ^-1, method of calculation: χ=ε/x, wherein χ is strain gradient, ε is equivalent strain amount, the range scale that x is effects of strain, μ m.

5. according to the preparation method of metal two-dimensional nano synusia structure claimed in claim 4, it is characterized in that, the method has high strain rate, large strain and high strain gradient mode of texturing.

6. according to the preparation method of metal two-dimensional nano synusia structure claimed in claim 4, it is characterized in that, metallic substance is nickel, aluminium, iron, copper, titanium; Or metallic substance is the alloy of nickel, aluminium, iron, copper, titanium.

7. according to the preparation method of metal two-dimensional nano synusia structure claimed in claim 4, it is characterized in that,

Deformation strain speed preferable range: 10～10 ⁵s ^-1;

Deformation strain amount preferable range: 2～100;

Deformation strain gradient preferable range: 0.05～1 μ m ^-1.

Images