CN103529644A - Nano embossing press - Google Patents
Nano embossing press Download PDFInfo
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- CN103529644A CN103529644A CN201310507352.1A CN201310507352A CN103529644A CN 103529644 A CN103529644 A CN 103529644A CN 201310507352 A CN201310507352 A CN 201310507352A CN 103529644 A CN103529644 A CN 103529644A
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- vacuum chamber
- nano
- pressure chamber
- bearing plate
- pressure
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Abstract
The invention discloses a nano embossing press. The nano embossing press comprises a vacuum cavity (2) and a high-pressure bin (7) arranged on the bottom in the vacuum cavity (2), wherein a leveling device (6), a heating disc (5) and an object carrying table (4) are sequentially arranged on the high-pressure bin (7); a bearing plate (3) is further arranged at the upper end of the object carrying table (4). The nano embossing press provided by the invention sufficiently utilizes pressure gas in the high-pressure bin to ensure balanced and uniform pressing-in of an embossing template; the leveling device can be used for ensuring flatness of the embossing template and an embossing base plate. Besides, the nano embossing press is simple in structure, low in cost and suitable for popularization and application.
Description
Technical field
The present invention relates to nanoscale structures and device fabrication field, be specifically related to a kind of nano marking press.
Background technology
Traditional nanometer embossing ubiquity applied pressure skewness, imbalance, impression figure deformation out, causes product defects.
Summary of the invention
Goal of the invention: in order to overcome the deficiencies in the prior art, nano marking press provided by the invention
Technical scheme: for solving the problems of the technologies described above, the technical solution used in the present invention is: a kind of nano marking press, comprise vacuum chamber, be arranged on the high-pressure chamber, high-pressure chamber of vacuum chamber inner bottom part and be provided with successively levelling device, heating plate and objective table, objective table upper end is also provided with bearing plate.
Further, described vacuum chamber top is provided with ultraviolet source, and user can select heating plate to solidify as required or ultraviolet source solidifies.
Further, described bearing plate is the bearing plate that quartz or copper coin are made, if user uses heating plate for a long time, this heat curing heating mode is cured, and for larger pressure, the serviceable life of prolongation bearing plate can be provided, should select copper coin.
Further, described high-pressure chamber, levelling device, heating plate and objective table are connected by rotating shaft.
Using method of the present invention comprises the steps:
A) sample of preparing impression is placed on objective table;
B) in vacuum chamber, vacuumize;
C) plus-pressure in high-pressure chamber, under the effect of levelling device, sample is evenly pressed on bearing plate;
D) heating plate heating is carried out heat curing or ultraviolet source carries out ultra-violet curing;
E) high-pressure chamber drain pressure gas, vacuum chamber inflation, takes out impression sample.
Beneficial effect: the pressed gas that nano marking press provided by the invention makes full use of in high-pressure chamber guarantees that impression block is pressed into balance, even; By levelling device, can guarantee the planarization of impression block and impression substrate; The present invention is simple in structure, cost is low, is applicable to applying.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the present invention is further described.
Nano marking press as shown in Figure 1, comprises ultraviolet source 1, vacuum chamber 2, bearing plate 3, objective table 4, heating plate 5, levelling device 6, high-pressure chamber 7; Described high-pressure chamber 7 is arranged on vacuum chamber 2 inner bottom parts, high-pressure chamber 7 and is connected with successively levelling device 6, heating plate 5 and objective table 4 by rotating shaft 8, and objective table 4 upper ends are provided with bearing plate 3; Vacuum chamber top is established ultraviolet source 1 is installed.
Use step of the present invention comprises:
A) sample of preparing impression is placed on objective table 4;
B) in vacuum chamber 2, vacuumize;
C) plus-pressure in high-pressure chamber 7, under the effect of levelling device 6, sample is evenly pressed on bearing plate 3;
D) heating plate 5 heating is carried out heat curing or ultraviolet source 1 carries out ultra-violet curing;
E) high-pressure chamber 7 drain pressure gases, vacuum chamber 2 inflations, take out impression sample.
The above is only the preferred embodiment of the present invention; be noted that for those skilled in the art; under the premise without departing from the principles of the invention, can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (5)
1. a nano marking press, it is characterized in that: comprise vacuum chamber (2), be arranged on the high-pressure chamber (7), high-pressure chamber (7) of vacuum chamber (2) inner bottom part and be provided with successively levelling device (6), heating plate (5) and objective table (4), objective table (4) upper end is also provided with bearing plate (3).
2. nano marking press according to claim 1, is characterized in that: described vacuum chamber (2) top is provided with ultraviolet source (1).
3. nano marking press according to claim 1, is characterized in that: described bearing plate (3) is the bearing plate (3) that quartz or copper coin are made.
4. nano marking press according to claim 1, is characterized in that: described high-pressure chamber (7), levelling device (6), heating plate (5) and objective table (4) are connected by rotating shaft (8).
5. application rights requires a method for the nano marking press described in 1, it is characterized in that, comprises the steps:
A) sample of preparing impression is placed on objective table (4);
B) in vacuum chamber (2), vacuumize;
C) plus-pressure in high-pressure chamber (7), under the effect of levelling device (6), sample is evenly pressed on bearing plate (3);
D) heating plate (5) heating is cured or ultraviolet source (1) carries out ultra-violet curing;
E) high-pressure chamber (7) drain pressure gas, vacuum chamber (2) inflation, takes out impression sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310507352.1A CN103529644A (en) | 2013-10-25 | 2013-10-25 | Nano embossing press |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310507352.1A CN103529644A (en) | 2013-10-25 | 2013-10-25 | Nano embossing press |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103529644A true CN103529644A (en) | 2014-01-22 |
Family
ID=49931757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310507352.1A Pending CN103529644A (en) | 2013-10-25 | 2013-10-25 | Nano embossing press |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103529644A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101403855A (en) * | 2008-11-07 | 2009-04-08 | 南京大学 | Ultraviolet/hot pressing curing type nano-printing method and stamping press |
| US20100102469A1 (en) * | 2008-10-24 | 2010-04-29 | Molecular Imprints, Inc. | Strain and Kinetics Control During Separation Phase of Imprint Process |
| CN102253597A (en) * | 2011-04-22 | 2011-11-23 | 郑州大学 | Compression type gas pressure method-based nano-scale pressure printing device |
| CN203217238U (en) * | 2013-02-19 | 2013-09-25 | 无锡市正先自动化设备有限公司 | Nano imprinting machine |
-
2013
- 2013-10-25 CN CN201310507352.1A patent/CN103529644A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100102469A1 (en) * | 2008-10-24 | 2010-04-29 | Molecular Imprints, Inc. | Strain and Kinetics Control During Separation Phase of Imprint Process |
| CN101403855A (en) * | 2008-11-07 | 2009-04-08 | 南京大学 | Ultraviolet/hot pressing curing type nano-printing method and stamping press |
| CN102253597A (en) * | 2011-04-22 | 2011-11-23 | 郑州大学 | Compression type gas pressure method-based nano-scale pressure printing device |
| CN203217238U (en) * | 2013-02-19 | 2013-09-25 | 无锡市正先自动化设备有限公司 | Nano imprinting machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140122 |