CN103502648A - Vacuum pump - Google Patents
Vacuum pump Download PDFInfo
- Publication number
- CN103502648A CN103502648A CN201280018841.4A CN201280018841A CN103502648A CN 103502648 A CN103502648 A CN 103502648A CN 201280018841 A CN201280018841 A CN 201280018841A CN 103502648 A CN103502648 A CN 103502648A
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- pump
- pump chamber
- rotatingshaft
- pump case
- chamber
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
- F04C18/18—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with similar tooth forms
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
- F04C29/04—Heating; Cooling; Heat insulation
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2240/00—Components
- F04C2240/30—Casings or housings
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2280/00—Arrangements for preventing or removing deposits or corrosion
- F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
Abstract
A vacuum pump (10) has a pump casing (54) including pump chambers (50a-50f) held in fluid communication with each other and arrayed in a longitudinal direction thereof, an inlet port (52a) and an outlet port (52b), a rotational shaft (58) rotatably supported at opposite ends thereof and extending in the longitudinal direction of the pump casing (54), and rotors (60a-60f) housed in the pump chambers (50a-50f) and coupled to the rotational shaft (58). The pump casing (54) includes a first thermally conductive member (72) extending parallel to the rotational shafts (58) substantially the full length of the pump casing (54) in the longitudinal direction thereof, and a second thermally conductive member (74) positioned near an end of the first thermally conductive member (72) at the outlet port (52b) and extending in a transverse direction of the pump casing (54).
Description
Technical field
The present invention relates to the vacuum pump used in a kind of technique such as CVD technique or etching technics serving as for the production of the part of the manufacture method of semiconductor, liquid crystal, solar cell, LED etc., and more specifically, relate to and a kind ofly at can distil gas or etchant gas, be tending towards flowing into the vacuum pump used in the technique of inside of vacuum pump.
Background technique
When the process gas by using vacuum pump will be introduced into vacuum chamber discharges under vacuum, the entrance region that is connected to vacuum chamber of vacuum pump remain on vacuum chamber in vacuum under the vacuum of same level, and the exit region of vacuum pump remains essentially under atmospheric pressure, because it leads to atmosphere.When vacuum pump activated during from vacuum chamber discharge technology gas, because process gas to be discharged is compressed by vacuum pump, to produce compression heat in vacuum pump under vacuum.
Especially, when by the use multistage vacuum pump, the process gas in vacuum chamber being discharged under vacuum, pressure in vacuum pump is along with the flow through continuous pump chamber (such as the first pump chamber, the second pump chamber and the 3rd pump chamber) of vacuum pump of process gas increases step by step, and along with process gas in pump chamber by compression generation compression heat continuously.Therefore, in vacuum pump, flow through pump chamber and simultaneously being pressurizeed step by step therein of process gas, and the temperature of process gas is also along with its pump chamber of flowing through rises step by step.In each pump chamber, the pressure and temperature of process gas is high in the ingress of pump chamber at the outlet port of pump chamber ratio.Therefore, when by the use multistage vacuum pump, process gas being discharged from vacuum chamber under vacuum, its temperature is tending towards lower in the area of low pressure of the entrance near multistage vacuum pump, and is being tending towards higher near in the part, high-pressure area that almost remains on the outlet under atmospheric pressure of multistage vacuum pump.
In the time of in the process gas that comprises sublimation substance flows into for example for the vacuum pump of emptying vacuum chamber, if the temperature in vacuum pump is lower than the sublimation curve of sublimation substance, the sublimation substance be included in so in the process gas that flows into vacuum pump becomes solid phase from gas phase conversion, and be deposited in vacuum pump, be tending towards closing vacuum pump.
On the other hand, if the regional area in the inside of vacuum pump has high temperature, its clean air or etching gas that is probably flowed into vacuum pump corrodes.
A kind of dry pump has been proposed, its at the pump chamber that remains on relatively-high temperature and remain between the lubricant chamber of relative low temperature there is the hollow heat insulation medial compartment and for refrigeration agent through its cooling channel of passing through, in order to the evaporation of oiling agent is minimized, thus the oiling agent in lubricant chamber is remained on to low temperature effectively, keep pump chamber at high temperature, to contribute to such as maybe can the distil gas purging (referring to Japanese kokai publication hei patent publication us No.2005-105829) of gas of condensable gas simultaneously.
The claimant has proposed a kind of rotor for the rotary gas machine, it comprises axis body (rotor shaft) and core, axially be limited with axial bore in axis body, core is embedded in axial bore and by the material such as aluminium and makes, the thermal conductivity of core is higher than the material of axis body, in order to reduce the temperature difference between inlet side and outlet side in the situation that do not sacrifice corrosion resistance and the mechanical strength of rotor, pin-point accuracy ground management rotor and rotor are supported in gap between housing wherein to realize maximum discharge ability (referring to Japanese kokai publication hei patent publication us No.H11-230060) thus.
Reference listing
Patent documentation
[PTL1] Japanese kokai publication hei patent publication us No.2005-105829
[PTL2] Japanese kokai publication hei patent publication us No.11-230060
Summary of the invention
Technical problem
But, traditional vacuum pump is not designed to keep the inside of vacuum pump at higher temperature on whole vacuum pump, in order to prevent that the regional area in vacuum pump is heated to the temperature higher than corrosion temperature, prevent that product is because the sublimation substance be included in the process gas that flows into vacuum pump is deposited in vacuum pump simultaneously.
The present invention makes in view of the above-mentioned situation in background technique.Therefore, the purpose of this invention is to provide a kind of vacuum pump, its can be by keeping vacuum pump on whole vacuum pump inside at certain high temperature (, temperature on whole vacuum pump in the homogenization vacuum pump) and in the situation that do not need simply heater or analog to prevent that product from producing and being deposited in vacuum pump, prevent that the regional area in vacuum pump is heated to the temperature higher than corrosion temperature simultaneously.
Technological scheme
To achieve these goals, the invention provides a kind of vacuum pump, comprise: pump case, described pump case comprises the outlet that the pump chamber fluid is communicated with that is positioned at waste side of entrance that a plurality of pump chambers, the maintenance that keeps each other fluid to be communicated with and arrange on its longitudinal direction and the pump chamber fluid that being arranged in pump chamber aspirated side are communicated with and maintenance and pump chamber; Rotatingshaft, described rotatingshaft extends on locating by bearing rotatably support and the longitudinal direction at pump case in its opposite end; With a plurality of rotors, described a plurality of rotors are contained in pump chamber and are connected to rotatingshaft for rotating in concert with rotatingshaft.Described pump case comprises: the first heat conduction member, and described the first heat conduction member is parallel to rotatingshaft and extends the roughly total length of pump case on its longitudinal direction; With the second heat conduction member, described the second heat conduction member near the first heat conduction member in location, the end of outlet side and in the extension in a lateral direction of pump case.
There is higher temperature in the pump chamber of the close outlet of multistage vacuum pump.There is minimum temperature in first order pump chamber, and there is maximum temperature in the pump chamber near outlet.In each pump chamber, the temperature in zone that is positioned at outlet side is higher than the temperature in the zone that is positioned at the upper inlet side.Be parallel to rotatingshaft extend pump case roughly total length the first heat conduction member and be arranged on the heat for the pump case that makes to define therein pump chamber near the second heat conduction member in the position of the end near outlet of the first heat conduction member and distribute equably on the vertical and horizontal direction of pump case, and for making heat effectively be delivered to the lower temperature zone from the higher temperatures zone, on whole vacuum pump, keep thus the inside of vacuum pump at higher constant temperature, , temperature on whole vacuum pump in the homogenization vacuum pump, prevent that the regional area in vacuum pump is heated to the temperature higher than corrosion temperature simultaneously.The first heat conduction member and the second heat conduction member by the thermal conductivity such as aluminium, aluminum alloy, copper or analog good material make.
The present invention also provides another kind of vacuum pump, comprise: pump case, described pump case comprises the outlet that the pump chamber fluid is communicated with that is positioned at waste side of entrance that a plurality of pump chambers, the maintenance that keeps each other fluid to be communicated with and arrange on its longitudinal direction and the pump chamber fluid that being arranged in pump chamber aspirated side are communicated with and maintenance and pump chamber; Rotatingshaft, described rotatingshaft extends on locating by bearing rotatably support and the longitudinal direction at pump case in its opposite end; With a plurality of rotors, described a plurality of rotors are contained in pump chamber and are connected to rotatingshaft for rotating in concert with rotatingshaft.Described pump case comprises: medial compartment, and the maintenance in the contiguous pump chamber of described medial compartment is with the pump chamber that exports that fluid is communicated with and in this pump chamber arranged outside, and maintenance is communicated with this pump chamber fluid in pump chamber; And divider, described divider is arranged in medial compartment and is defined for guiding and is introduced into the passage of the interior process gas of medial compartment around rotatingshaft.
As mentioned above, multistage vacuum pump has higher temperature in the pump chamber near outlet.In each pump chamber, the temperature in zone that is positioned at outlet side is higher than the temperature in the zone that is positioned at the upper inlet side.From the part of the high-temperature technology gas of rear class pump chamber discharge be introduced into medial compartment and in medial compartment along channel cycle, to heat the inlet side of rear class pump chamber, afterwards, high-temperature technology gas is discharged from outlet.Therefore, in the situation that do not need heater or analog to make the temperature of inside of rear class pump chamber higher, in order to prevent that product is deposited in vacuum pump.
The present invention also provides another vacuum pump, comprise: pump case, described pump case comprises the outlet that the pump chamber fluid is communicated with that is positioned at waste side of entrance that a plurality of pump chambers, the maintenance that keeps each other fluid to be communicated with and arrange on its longitudinal direction and the pump chamber fluid that being arranged in pump chamber aspirated side are communicated with and maintenance and pump chamber; Rotatingshaft, described rotatingshaft extends on locating by bearing rotatably support and the longitudinal direction at pump case in its opposite end; With a plurality of rotors, described a plurality of rotors are contained in pump chamber and are connected to rotatingshaft for rotating in concert with rotatingshaft.Described pump case comprises end wall, and described end wall is arranged on the end of pump case and the side plate arranged with this end of contiguous pump case separates.
Because pump case comprises, be arranged on its end and the end wall separated with the side plate of this end setting that is close to pump case, all rotors that are arranged in pump chamber are encapsulated by pump case.Therefore, by being supplied the process gas in the cooling pump chamber of the side plate cooling in order to the oiling agent of cooling for example bearing and pump case, prevent that thus product is deposited in vacuum pump.
Of the present invention preferred aspect, pump case comprises urceolus, described urceolus is the double-walled construction that limits therein gas channel.
Because urceolus is the double-walled construction that limits therein gas channel, the inside of pump chamber is by high-temperature technology gas and its outside reliable underground heat isolation of gas coming through passage, keep thus the inside of vacuum pump at low temperature, change into solid matter and be deposited in vacuum pump with the distilled gas that prevents from being included in process gas, that is, on the interior perimeter surface of pump case.
Of the present invention preferred aspect, pump case comprises the collet around its outer surface.
Inside around the collet heat isolation pump chamber of the periphery of pump case, temperature step-down with the inside that prevents vacuum pump, and prevent that thus the distilled gas be included in process gas from changing into solid matter and being deposited in vacuum pump, that is, and on the interior perimeter surface of pump case.
According to the present invention, vacuum pump can prevent that product from producing and being deposited on wherein, and the inside by keeping vacuum pump on whole vacuum pump at certain high temperature (, temperature on whole vacuum pump in the homogenization vacuum pump) and in the situation that do not need heater or analog to prevent that vacuum pump is corroded, make thus vacuum pump technique height reliable.
The accompanying drawing explanation
Fig. 1 is the vertical cross-section front elevation of vacuum pump according to the embodiment of the present invention.
Fig. 2 is the vertical cross-section side view of first order pump chamber of the main pump of the vacuum pump shown in Fig. 1.
Fig. 3 is the stereogram of pump case of the main pump of the vacuum pump shown in Fig. 1.
Fig. 4 is the sectional view along the line X-X intercepting of Fig. 2.
Fig. 5 is the sectional stereogram of first order pump chamber of the main pump of the vacuum pump shown in Fig. 1.
Fig. 6 is the view that the sidewall of observing from electric notor is shown, and this sidewall is near the outlet location of the pump case of the main pump of the vacuum pump shown in Fig. 1.
Embodiment
Now with reference to accompanying drawing, the preferred embodiment of the present invention is described.Fig. 1 is the vertical cross-section front elevation of vacuum pump 10 according to the embodiment of the present invention.As shown in Figure 1, vacuum pump 10 comprises the suction booster 12 that is arranged on inlet side and the main pump 14 that is arranged on atmospheric side, and suction booster 12 and main pump 14 are connected to each other by taking over 16.In this embodiment, main pump 14 comprises six grades of Roots pumps, and suction booster 12 comprises the single-stage Roots pump.
In this embodiment, the outer surface of the urceolus 20 of pump case 22 except entrance 20a and outlet 20b by the collet 30 of general hollow cylindrical shape around.Collet 30 makes inside and the isolation of its external heat of pump chamber 18, keeps thus the inside constant temperature of pump chamber 18.
Two side plate 32a, 32b are separately positioned on the axial end portion of pump case 22.Rotatingshaft 26 is at its place, outer end by being contained in bearing 36a, the 36b rotatably support in bearing housing 34a, 34b, and bearing housing 34a, 34b are arranged on respectively on side plate 32a, 32b.Be arranged on the respective outside surface of side plate 32a, 32b for two oiling agent case 40a, 40b that keep therein oiling agent.Electric notor 24 has the motor box that is connected to a 40b in the oiling agent case.
Side plate 32a, 32b have corresponding purge gas passage 42a, the 42b for the part supplying purging gas (such as nitrogen or analog) of the rotatingshaft 26 to side plate 32a, 32b, to prevent process gas, from pump chamber 18, flow out and enter bearing 36a, 36b.
The main pump 14 of this mode of execution comprises six grades of Roots pumps, and comprise pump case 54 and pair of rotary axes 58, pump case 54 has the roughly urceolus 52 of cylindricality, limit six pump chamber 50a-50f in urceolus 52, that is, first to the 6th grade of pump chamber 50a-50f, rotatingshaft 58 is in the interior extension of pump case 54, and pass through to electric notor 56 energy supplies, rotatingshaft 58 can synchronously rotate around the axis of himself on contrary respectively direction.As shown in Figure 2, the first order pump chamber 50a that is arranged on the suction side of main pump 14 is contained in wherein rotating a pair of rotor 60a, such as three lobe rotor.Similarly, second level pump chamber 50b is contained in wherein rotating a pair of rotor 60b, and such as three lobe rotor, and third level pump chamber 50c is contained in wherein rotating a pair of rotor 60c, such as three lobe rotor.Fourth stage pump chamber 50d is contained in wherein rotating a pair of rotor 60d, such as three lobe rotor, level V pump chamber 50e is contained in wherein rotating a pair of rotor 60e, such as three lobe rotor, and the 6th grade of pump chamber 50f that is arranged on the waste side of main pump 14 is contained in wherein rotating a pair of rotor 50f, such as three lobe rotor.The linear array of rotor 60a-60f is fixedly mounted in rotatingshaft 58, and another linear array of rotor 60a-60f is fixedly mounted on another rotatingshaft 58.
Five (that is, first to the 5th) next door 64a-64e that pump case 54 has pair of end walls 62a, the 62b of the corresponding opposite end of closed urceolus 52 and the inside of urceolus 52 is separated.End wall 62a and the first next door 64a limit the first order pump chamber 50a in urceolus 52 betwixt.The first next door 64a and the second next door 64b limit the second level pump chamber 50b in urceolus 52 betwixt.The second next door 64b and the 3rd next door 64c limit the third level pump chamber 50c in urceolus 52 betwixt.The 3rd next door 64c and the 4th next door 64d limit the fourth stage pump chamber 50d in urceolus 52 betwixt.The 4th next door 64d and the 5th next door 64e limit the level V pump chamber 50e in urceolus 52 betwixt.The 5th next door 64e and end wall 62b limit the 6th grade of pump chamber 50f in urceolus 52 betwixt.
As shown in Figure 2, when rotor 60a by electric notor 56 around himself axis on respectively contrary direction during synchronous the rotation, the upper inlet side that process gas takes over 16 from being connected to of first order pump chamber 50a introduces first order pump chamber 50a, by the compression of the rotor 60a in first order pump chamber 50a and discharge from first order pump chamber 50a by outlet side first order pump chamber 50a subsequently.Process gas is compressed similarly subsequently in second to the 6th grade of pump chamber 50b-50f.
The urceolus 52 of pump case 54 has the entrance 52a be limited in its sidewall and is limited to the outlet 52b in its sidewall, entrance 52a is connected to adapter 16 and maintenance is communicated with the upper inlet side liquid of first order pump chamber 50a, and outlet 52b keeps being communicated with the lower outlet side fluid of the 6th grade of (rear class) pump chamber 50f.The urceolus 52 of pump case 54 has double-walled construction, comprises inwall 66 and is arranged on inwall 66 outsides and separates the outer wall 68 of certain distance with inwall 66, limits the first to the 5th gas channel 70a-70e between inwall 66 and outer wall 68.Particularly, the first gas channel 70a extends around first order pump chamber 50a, and the second gas channel 70b extends around second level pump chamber 50b.The 3rd gas channel 70c extends around third level pump chamber 50c, and the 4th gas channel 70d extends around fourth stage pump chamber 50d, and the 5th gas channel 70e extends around level V pump chamber 50e.The 5th gas channel 70e also extends around the 6th grade of pump chamber 50f.
The corresponding lower outlet side that gas channel 70a-70e has by pump chamber 50a-50e keeps the appropriate section be communicated with respective pump chambers 50a-50e fluid, and the corresponding upper inlet side had by pump chamber 50b-50f keeps the appropriate section be communicated with respective pump chambers 50b-50f fluid.As shown in Figure 2, the process gas of upper inlet side inflow first order pump chamber 50a from entrance 52a by first order pump chamber 50a is compressed in first order pump chamber 50a, and the lower outlet side by first order pump chamber 50a flows into the first gas channel 70a from first order pump chamber 50a subsequently.Then, process gas in the first gas channel 70a on flow and arrive the upper inlet side of second level pump chamber 50b.Process gas is by the upper inlet side inflow second level pump chamber 50b of second level pump chamber 50b, and compressed in the pump chamber 50b of the second level, and the lower outlet side by second level pump chamber 50b flows into the second gas channel 70b from second level pump chamber 50b subsequently.Then, process gas in the second gas channel 70b on flow and arrive the upper inlet side of third level pump chamber 50c.Subsequently, process gas compressed and the 3rd to the 6th grade of pump chamber 50c-50f that flow through in the 3rd to the 6th grade of pump chamber 50c-50f.Afterwards, process gas outlet side from the 6th grade of pump chamber 50f is discharged from main pump 14 by outlet 52b.
For example the heat conduction member of rod type (the first heat conduction member) 72 longitudinally is embedded in the bottom of pump case 54, and it is positioned at below the lower outlet side of pump chamber 50a-50e.Heat conduction member 72 is at the center that roughly is positioned in a lateral direction of pump case 54 and be parallel to the roughly total length that rotatingshaft 58 extends pump cases 54.As shown in Figure 3, heat conduction member 72 has the end of exposing from pump case 54 below entrance 52a.In addition, each for example the heat conduction member of rod type (the second heat conduction member) 74 near heat conduction member 72, in the end of outlet 52b side, be embedded in the 5th next door 64e between the 4th next door 64d between fourth stage pump chamber 50d and level V pump chamber 50e and level V pump chamber 50e and the 6th grade of pump chamber 50f in this embodiment.Heat conduction member 74 is positioned at the lower outlet side below of pump chamber 50d-50f and the roughly full duration of extending pump case 54.As shown in Figure 3, heat conduction member 74 has the opposed end exposed from pump case 54.
There is higher temperature in the pump chamber of the close outlet 52b of multistage vacuum pump.According to this mode of execution, particularly, in first order pump chamber 50a, there is minimum temperature, and near in the level V pump chamber 50e that exports 52b and the 6th grade of pump chamber 50f, thering is maximum temperature.In each pump chamber, the temperature in zone (lower area) that is positioned at lower outlet side is higher than the temperature of the zone that is positioned at the upper inlet side (upper zone).Particularly, be arranged in the zone of lower outlet side of level V pump chamber 50e and the zone that is positioned at the lower outlet side of the 6th grade of pump chamber 50f and there is maximum temperature.
In this embodiment, be arranged on heat conduction member 74 in the 4th next door 64d and the 5th next door 64e for the zone that makes to have maximum temperature (that is, be positioned at level V pump chamber 50e lower outlet side zone and be positioned at the zone of the lower outlet side of the 6th grade of pump chamber 50e) heat distributing equably in a lateral direction at pump case 54.Be parallel to rotatingshaft 58 and extend the heat conduction member 72 of roughly total length of pump cases 54 for heat is delivered to the zone with lower temperature from the zone with higher temperature, in order to make the inside of main pump 14 remain on higher steady temperature on whole main pump 14,, make temperature homogenization on whole main pump 14 in main pump 14, prevent that the regional area in main pump 14 is heated to the temperature higher than corrosion temperature simultaneously.Therefore, by heat conduction member 72,74 is arranged in pump case 54 thus, can makes temperature on whole pump case 54 remain on scope and be deposited in the temperature of 110 ℃ in pump case 54 the stands corrosion necessary temp of the corrosion temperature of 200 ℃ to for example main pump 14 from for example product.
Because the urceolus 52 of pump case 54 has the double-walled construction that defines therein gas channel 70a-70e, the inside of pump chamber 50a-50f is by high-temperature technology gas and its outside reliable underground heat isolation of gas coming through passage 70a-70e, make thus the inside of main pump 14 remain on high temperature, change into solid matter and be deposited in main pump 14 with the distilled gas that prevents from being included in process gas, that is, on the interior perimeter surface of pump case 54.Especially, the high-temperature technology gas that outlet side flow to the upper inlet side of the pump chamber in next stage through gas channel 70a-70e from pump chamber 50a-50e heats pump chamber 50a-50f effectively.
In this embodiment, the outer surface of the urceolus 52 of pump case 54 except entrance 52a and outlet 52b by the collet 80 of general hollow cylindrical shape around.Collet 80 makes inside and the isolation of its external heat of pump chamber 50a-50f, keeps thus the inside constant temperature of pump chamber 50a-50f.
Two side plate 82a, 82b are separately positioned on the end wall 62a of pump case 54, the outside of 62b.Rotatingshaft 58 is at its place, outer end by being contained in bearing 86a, the 86b rotatably support in bearing housing 84a, 84b, and bearing housing 84a, 84b are arranged on respectively on side plate 82a, 82b.Be arranged on the respective outside surface of side plate 82a, 82b for two oiling agent case 90a, 90b that keep therein oiling agent.Electric notor 56 has the motor box that is connected to a 90b in the oiling agent case.Side plate 82a, 82b have corresponding purge gas passage 92a, the 92b for the part supplying purging gas (such as nitrogen or analog) of the rotatingshaft 58 to side plate 82a, 82b, to prevent process gas, from pump chamber 50a-50f, flow out and enter bearing 86a, 86b.
In this embodiment, the rotor 60a of the end wall 62a of the restriction first order pump chamber 50a of pump case 54 in being contained in first order pump chamber 50a and being arranged between the side plate 82a in the rotor 60a outside.The end wall 62b of the 6th grade of pump chamber 50f of the restriction of pump case 54 is being contained in the 6th grade of rotor 60f in pump chamber 50f and is being arranged between the side plate 82b in the rotor 60f outside.Therefore, all rotor 60a-60f that are arranged in pump chamber 50a-50f are encapsulated in pump case 54.Therefore, by being supplied the process gas in the cooling pump chamber 50a-50f of side plate 82a, 82b cooling in order to the oiling agent of cooling for example bearing 86a, 86b and pump case 54, prevent that thus product is deposited in vacuum pump 10.
In this embodiment, medial compartment 94 be limited to pump case 54 the 6th grade of (rear class) pump chamber 50f of restriction end wall 62b and be arranged between the side plate 82b in the end wall 62b outside.As shown in Fig. 4 and 6, end wall 62b has the discharge orifice 96 that is limited in a lateral direction approximate centre wherein and locates near the lower outlet side of the 6th grade of (rear class) pump chamber 50f at it.As shown in Figure 6, end wall 62b also has two reverse flow hole 98 that are limited to wherein, and each is in a side of discharge orifice 96.Two dividers 100 are positioned at respectively between discharge orifice 96 and reverse flow hole 98 medial compartment 94 is interior, and extend to the bottom of medial compartment 94 from corresponding rotatingshaft 58.Divider 100 flows directly into reverse flow hole 98 for preventing from the process gas of discharge orifice 96 discharges.By this structure, as shown in Figure 6, divider 100 can limit the gas channel 102 in medial compartment 94, and this gas channel 102 extends up to the position of rotatingshaft 58 tops from discharge orifice 96, then around rotatingshaft 58 and downwards towards reverse flow hole 98 extensions.
In this embodiment, divider 100 is to separate and be fixed to the form of the plate of pump case 54 with pump case 54.But divider 100 can be integrally formed with pump case 54.
As mentioned above, the pump chamber near rear class of multistage vacuum pump has maximum temperature, and higher than the temperature in the zone near its inlet side near each the temperature in zone of outlet side in these pump chambers.According to this mode of execution, therefore, from the part of the high-temperature technology gas of the 6th grade of (rear class) pump chamber 50f discharge be introduced into medial compartment 94 through discharge orifice 96 and along gas channel 102 in the interior circulation of medial compartment 94, with the inlet side by the 6th grade of pump chamber 50f of end wall 62b heating, afterwards, high-temperature technology gas is discharged from outlet 52b by reverse flow hole 98.Therefore, make the temperature of inside of the 6th grade of (rear class) pump chamber 50f higher.
The electric notor 24 of the vacuum pump 10 of structure by giving suction booster 12 and electric notor 56 energy supplies of main pump 14 operate with discharge technology gas to activate suction booster 12 and main pump 14 thus, and this process gas is for example introduced from vacuum chamber in vacuum chamber.
Now, the inside of vacuum pump 10 remains on higher temperature on whole vacuum pump 10, for preventing that the regional area in vacuum pump 10 is heated to the temperature higher than corrosion temperature, prevent that product is because the sublimation substance be included in the process gas flowed in vacuum pump 10 is deposited in vacuum pump 10 simultaneously.
Although with reference to preferred implementation, invention has been described, but be understandable that, the invention is not restricted to above-mentioned mode of execution, but may be used on dissimilar vacuum pump here in the scope of the inventive concept as expressed, for example, pawl type vacuum pump, screw-type vacuum pump etc.
Industrial applicibility
The present invention may be used on the vacuum pump used in can distil gas or etchant gas are tending towards flowing into the technique of vacuum pump inside.
Claims (9)
1. a vacuum pump comprises:
Pump case, described pump case comprises the outlet that the pump chamber fluid is communicated with that is positioned at waste side of entrance that a plurality of pump chambers, the maintenance that keeps each other fluid to be communicated with and arrange on its longitudinal direction and the pump chamber fluid that being arranged in pump chamber aspirated side are communicated with and maintenance and pump chamber;
Rotatingshaft, described rotatingshaft extends on locating by bearing rotatably support and the longitudinal direction at pump case in its opposite end; With
A plurality of rotors, described a plurality of rotors are contained in pump chamber and are connected to rotatingshaft for rotating in concert with rotatingshaft;
Wherein, described pump case comprises:
The first heat conduction member, described the first heat conduction member is parallel to rotatingshaft and extends the roughly total length of pump case on its longitudinal direction; With
The second heat conduction member, described the second heat conduction member near the first heat conduction member in location, the end of outlet side and in the extension in a lateral direction of pump case.
2. vacuum pump according to claim 1, wherein, described pump case comprises urceolus, described urceolus is the double-walled construction that limits therein gas channel.
3. vacuum pump according to claim 1, wherein, described pump case comprises the collet around its outer surface.
4. a vacuum pump comprises:
Pump case, described pump case comprises the outlet that the pump chamber fluid is communicated with that is positioned at waste side of entrance that a plurality of pump chambers, the maintenance that keeps each other fluid to be communicated with and arrange on its longitudinal direction and the pump chamber fluid that being arranged in pump chamber aspirated side are communicated with and maintenance and pump chamber;
Rotatingshaft, described rotatingshaft extends on locating by bearing rotatably support and the longitudinal direction at pump case in its opposite end; With
A plurality of rotors, described a plurality of rotors are contained in pump chamber and are connected to rotatingshaft for rotating in concert with rotatingshaft;
Wherein, described pump case comprises:
Medial compartment, the maintenance in the contiguous pump chamber of described medial compartment is with the pump chamber that exports that fluid is communicated with and in this pump chamber arranged outside, and maintenance is communicated with this pump chamber fluid in pump chamber; With
Divider, described divider is arranged in medial compartment and is defined for guiding and is introduced into the passage of the interior process gas of medial compartment around rotatingshaft.
5. vacuum pump according to claim 4, wherein, described pump case comprises urceolus, described urceolus is the double-walled construction that limits therein gas channel.
6. vacuum pump according to claim 4, wherein, described pump case comprises the collet around its outer surface.
7. a vacuum pump comprises:
Pump case, described pump case comprises the outlet that the pump chamber fluid is communicated with that is positioned at waste side of entrance that a plurality of pump chambers, the maintenance that keeps each other fluid to be communicated with and arrange on its longitudinal direction and the pump chamber fluid that being arranged in pump chamber aspirated side are communicated with and maintenance and pump chamber;
Rotatingshaft, described rotatingshaft extends on locating by bearing rotatably support and the longitudinal direction at pump case in its opposite end; With
A plurality of rotors, described a plurality of rotors are contained in pump chamber and are connected to rotatingshaft for rotating in concert with rotatingshaft;
Wherein, described pump case comprises:
End wall, described end wall is arranged on the end of pump case and the side plate arranged with this end of contiguous pump case separates.
8. vacuum pump according to claim 7, wherein, described pump case comprises urceolus, described urceolus is the double-walled construction that limits therein gas channel.
9. vacuum pump according to claim 7, wherein, described pump case comprises the collet around its outer surface.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-123979 | 2011-06-02 | ||
| JP2011123979A JP5793004B2 (en) | 2011-06-02 | 2011-06-02 | Vacuum pump |
| PCT/JP2012/064347 WO2012165646A1 (en) | 2011-06-02 | 2012-05-29 | Vacuum pump |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103502648A true CN103502648A (en) | 2014-01-08 |
Family
ID=47259491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280018841.4A Pending CN103502648A (en) | 2011-06-02 | 2012-05-29 | Vacuum pump |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20140112814A1 (en) |
| EP (1) | EP2715138B1 (en) |
| JP (1) | JP5793004B2 (en) |
| KR (1) | KR101760549B1 (en) |
| CN (1) | CN103502648A (en) |
| TW (1) | TWI558917B (en) |
| WO (1) | WO2012165646A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109026707A (en) * | 2018-08-22 | 2018-12-18 | 中北大学 | The combination pump that claw pumps are combined with slide valve pump |
| CN112664460A (en) * | 2019-10-15 | 2021-04-16 | 株式会社荏原制作所 | Vacuum pump device |
| CN112664453A (en) * | 2019-10-15 | 2021-04-16 | 株式会社荏原制作所 | Vacuum pump device |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2615307B1 (en) * | 2012-01-12 | 2019-08-21 | Vacuubrand Gmbh + Co Kg | Screw vacuum pump |
| JP6472653B2 (en) * | 2014-03-17 | 2019-02-20 | 株式会社荏原製作所 | Vacuum pump with abatement function |
| DE202016001950U1 (en) * | 2016-03-30 | 2017-07-03 | Leybold Gmbh | vacuum pump |
| EP3382203B1 (en) | 2017-03-30 | 2024-05-15 | Roper Pump Company LLC | Progressive cavity pump with integrated heating jacket |
| JP2021063503A (en) | 2019-10-15 | 2021-04-22 | 株式会社荏原製作所 | Vacuum pump device |
| JP7348132B2 (en) * | 2020-04-30 | 2023-09-20 | 株式会社豊田自動織機 | roots pump |
| FR3112175B1 (en) * | 2020-07-01 | 2022-07-08 | Pfeiffer Vacuum | Dry Type Vacuum Pump |
| JP2022151996A (en) | 2021-03-29 | 2022-10-12 | 株式会社荏原製作所 | vacuum pump device |
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- 2012-05-29 CN CN201280018841.4A patent/CN103502648A/en active Pending
- 2012-05-29 EP EP12791988.4A patent/EP2715138B1/en active Active
- 2012-05-29 KR KR1020137028884A patent/KR101760549B1/en active IP Right Grant
- 2012-05-29 WO PCT/JP2012/064347 patent/WO2012165646A1/en active Application Filing
- 2012-05-29 US US14/119,851 patent/US20140112814A1/en not_active Abandoned
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| CN109026707B (en) * | 2018-08-22 | 2024-05-14 | 中北大学 | Composite pump combining claw pump and slide valve pump |
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| CN112664453A (en) * | 2019-10-15 | 2021-04-16 | 株式会社荏原制作所 | Vacuum pump device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140017635A (en) | 2014-02-11 |
| KR101760549B1 (en) | 2017-07-21 |
| EP2715138A1 (en) | 2014-04-09 |
| JP5793004B2 (en) | 2015-10-14 |
| EP2715138A4 (en) | 2014-12-17 |
| TW201307686A (en) | 2013-02-16 |
| TWI558917B (en) | 2016-11-21 |
| US20140112814A1 (en) | 2014-04-24 |
| JP2012251470A (en) | 2012-12-20 |
| WO2012165646A1 (en) | 2012-12-06 |
| EP2715138B1 (en) | 2018-01-10 |
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| PB01 | Publication | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
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Application publication date: 20140108 |