CN103482573A - Method and device for drying hydrogen chloride gas in polysilicon production - Google Patents
Method and device for drying hydrogen chloride gas in polysilicon production Download PDFInfo
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- CN103482573A CN103482573A CN201310443666.XA CN201310443666A CN103482573A CN 103482573 A CN103482573 A CN 103482573A CN 201310443666 A CN201310443666 A CN 201310443666A CN 103482573 A CN103482573 A CN 103482573A
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- hydrogen chloride
- chloride gas
- chlorosilane
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- hydrogenchloride
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CN201310443666.XA CN103482573B (en) | 2013-09-26 | 2013-09-26 | Method and device for drying hydrogen chloride gas in polysilicon production |
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CN201310443666.XA CN103482573B (en) | 2013-09-26 | 2013-09-26 | Method and device for drying hydrogen chloride gas in polysilicon production |
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CN103482573A true CN103482573A (en) | 2014-01-01 |
CN103482573B CN103482573B (en) | 2015-07-22 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106629604A (en) * | 2016-11-28 | 2017-05-10 | 昆明理工大学 | Method for preparing gas-phase hydrogen chloride by utilizing chlorosilane residue |
CN109368593A (en) * | 2018-11-26 | 2019-02-22 | 浙江博瑞电子科技有限公司 | A method of preparing the electronic grade hydrogen chloride gas of ppbv grades of moisture impurities |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102249244A (en) * | 2011-06-15 | 2011-11-23 | 四川瑞能硅材料有限公司 | HCl dehydration and purification method suitable for synthesis of trichlorosilane |
CN102417163A (en) * | 2011-07-28 | 2012-04-18 | 四川瑞能硅材料有限公司 | Improved Siemens method-HCL gas dehydration purifying method |
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2013
- 2013-09-26 CN CN201310443666.XA patent/CN103482573B/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102249244A (en) * | 2011-06-15 | 2011-11-23 | 四川瑞能硅材料有限公司 | HCl dehydration and purification method suitable for synthesis of trichlorosilane |
CN102417163A (en) * | 2011-07-28 | 2012-04-18 | 四川瑞能硅材料有限公司 | Improved Siemens method-HCL gas dehydration purifying method |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106629604A (en) * | 2016-11-28 | 2017-05-10 | 昆明理工大学 | Method for preparing gas-phase hydrogen chloride by utilizing chlorosilane residue |
CN106629604B (en) * | 2016-11-28 | 2019-07-16 | 昆明理工大学 | A method of gas phase chlorination hydrogen is produced using chlorosilane raffinate |
CN109368593A (en) * | 2018-11-26 | 2019-02-22 | 浙江博瑞电子科技有限公司 | A method of preparing the electronic grade hydrogen chloride gas of ppbv grades of moisture impurities |
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CN103482573B (en) | 2015-07-22 |
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Application publication date: 20140101 Assignee: Inner Mongolia Xinte silicon material Co.,Ltd. Assignor: XINTE ENERGY Co.,Ltd. Contract record no.: X2022990000326 Denomination of invention: A method and device for drying hydrogen chloride gas in polysilicon production Granted publication date: 20150722 License type: Common License Record date: 20220627 Application publication date: 20140101 Assignee: Xinte silicon based new materials Co.,Ltd. Assignor: XINTE ENERGY Co.,Ltd. Contract record no.: X2022990000325 Denomination of invention: A method and device for drying hydrogen chloride gas in polysilicon production Granted publication date: 20150722 License type: Common License Record date: 20220627 |
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EE01 | Entry into force of recordation of patent licensing contract |