CN103472693B - A kind of technique nozzle for chip developing process - Google Patents
A kind of technique nozzle for chip developing process Download PDFInfo
- Publication number
- CN103472693B CN103472693B CN201310379709.2A CN201310379709A CN103472693B CN 103472693 B CN103472693 B CN 103472693B CN 201310379709 A CN201310379709 A CN 201310379709A CN 103472693 B CN103472693 B CN 103472693B
- Authority
- CN
- China
- Prior art keywords
- developer solution
- main chamber
- flow
- stopping plate
- shaped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The invention provides a kind of technique nozzle for chip developing process, comprising: nozzle body and flow-stopping plate; Nozzle body comprises a U-shaped main chamber, and is positioned at main chamber both sides and the developer solution entrance be connected with main chamber and developer solution export; The xsect of flow-stopping plate is T-shaped, is plugged in main chamber, flow-stopping plate sealing main chamber oral area, and two T-shaped end faces of flow-stopping plate are affixed on the chamber wall of main chamber; Developer solution entrance and developer solution outlet lay respectively at the both sides of flow-stopping plate, and the space between flow-stopping plate and main chamber forms U-shaped developer solution runner.This technique nozzle is used for the output of developer solution in integrated circuit (IC) chip developing process, the problem of the assignment of traffic inequality existed when existing developer solution exports can be solved, in this technique nozzle, developer solution runner internal pressure is even, impact little to the working surface of wafer, can be used in the formation of the developing line of length, meet the requirement of developing process development.
Description
Technical field
The present invention relates to chip developing process field, be specifically related to a kind of technique nozzle for chip developing process.
Background technology
At present, developing process demand for development diameter wafer is increasing, Line width more and more less (90nm live width or less).This requires that developing nozzle can carry out uniform assignment of traffic on the length direction of at least 300mm, and requires that the working surface of outlet fluid to wafer has less impact.The structure of the assignment of traffic that tradition uses is simple T-shaped three-way pipe structure, and carries out the output of fluid along the perforate of three-way pipe length direction.This kind of structure can use when diameter wafer is less, but along with the increasing of diameter wafer, the length of three-way pipe also can strengthen, its internal flow has and larger prolongs stroke pressure loss when pipeline flows to two ends from center, cause runner internal pressure maldistribution, thus cause the outlet opening alongst distributed to go out to flow fluid flow inconsistent, easily form local developing defect.Meanwhile, the developer solution flowed out from tiny flow-out hole has larger flow velocity, and this can destroy the photoresist shape of crystal column surface, has a strong impact on development quality.
Summary of the invention
In view of the problem of the developer solution pressure flow skewness that technique nozzle in existing chip developing process exists, the invention provides a kind of technique nozzle for chip developing process, by to developer solution runner design, uniform assignment of traffic can be carried out in length, to achieve these goals, the present invention by the following technical solutions.
For a technique nozzle for chip developing process, comprising: nozzle body and flow-stopping plate; Described nozzle body comprises a U-shaped main chamber, and is positioned at described main chamber both sides and the developer solution entrance be connected with described main chamber and developer solution export; The xsect of described flow-stopping plate is T-shaped, is plugged in described main chamber, and described flow-stopping plate seals described main chamber oral area, and two T-shaped end faces of described flow-stopping plate are affixed on the chamber wall of described main chamber; Described developer solution entrance and developer solution outlet lay respectively at the both sides of described flow-stopping plate, and the space between described flow-stopping plate and described main chamber forms U-shaped developer solution runner.
Further, described developer solution outlet is slit.
Further, the described flow-stopping plate baffle plate that comprises cover plate flange and vertically extend from described cover plate flange.
Further, described main chamber oral area arranges mounting flange, and described cover plate flange is fixedly connected with by screw with described mounting flange.
Further, arrange O RunddichtringO between described cover plate flange and described mounting flange, described O RunddichtringO embeds in the seal groove on described mounting flange.
Further, described developer solution entrance contacts with the lower end of described mounting flange, and the height of described developer solution center line of discharge is not more than the height of described developer solution inlet axis.
Further, described developer solution entrance be positioned on described nozzle body length direction, the middle part of described nozzle body.
Further, the xsect of described baffle plate is U-shaped.
Further, the two ends on described main chamber length direction arrange the slot connected with described main chamber, and the two ends of described baffle plate coordinate with slot and contact.
Further, described developer solution outlet is consistent in the longitudinal direction with described main chamber.
Present invention process nozzle is used for the output of developer solution in integrated circuit (IC) chip developing process, the problem of the assignment of traffic inequality existed when existing developer solution exports can be solved, in this technique nozzle, developer solution runner internal pressure is even, impact little to the working surface of wafer, can be used in the formation of the developing line of length, meet the requirement of developing process development.
Accompanying drawing explanation
Fig. 1 is the structural representation of the present invention for the technique nozzle embodiments of chip developing process;
Fig. 2 is the enlarged drawing that Fig. 1 centre circle shows part;
Fig. 3 is the sectional view of Fig. 1;
Fig. 4 is the side view of flow-stopping plate in Fig. 1;
Fig. 5 is the sectional view of nozzle body in Fig. 1;
Fig. 6 is the vertical view of nozzle body in Fig. 5.
Embodiment
The realization of the object of the invention, functional characteristics and advantage will in conjunction with the embodiments, are described further with reference to accompanying drawing.
With reference to Fig. 1-6, be depicted as the technique nozzle embodiment 1 of the present invention for chip developing process, this technique nozzle comprises nozzle body 1 and flow-stopping plate 2.
Nozzle body 1 mainly comprises main chamber 11, developer solution entrance 12, developer solution outlet 13 and mounting flange 14.Main chamber 11 is U-shaped, and developer solution entrance 12 and developer solution outlet 13 lay respectively at the both sides of main chamber 11, and are connected with main chamber 11.The conveniently quick input of developer solution, developer solution entrance 12 can be connected with rapid-acting coupling, and rapid-acting coupling exports developer solution to developer solution entrance 12.Developer solution outlet 13 is long straight slit, and this slit is consistent in the longitudinal direction with main chamber 11, and namely from the Width of main chamber 11, the two ends of this slit overlap with the two ends of main chamber, and the width of this slit is identical at the wall thickness at this place with main chamber 11.The oral area of main chamber 11 arranges mounting flange 14, and developer solution entrance 12 contacts with the lower end of mounting flange 14, and developer solution outlet 13 is roughly equal with the height of developer solution entrance 12, and as shown in Figure 3, developer solution outlet 13 is a little less than the center of developer solution entrance 12.
The xsect of flow-stopping plate 2 is T-shaped, comprises cover plate flange 21 and baffle plate 22, and baffle plate 22 forms from vertical extension of cover plate flange 21.This flow-stopping plate 2 is plugged in main chamber 11, by screw (not shown) connection cover plate flange 21 and mounting flange 14, flow-stopping plate 2 and nozzle body 1 are fixed, cover plate flange 21 seals the oral area of main chamber 11, baffle plate 22 is arranged in main chamber 11, and the space between flow-stopping plate 2 and main chamber 11 forms U-shaped developer solution runner.In the present embodiment, the U-shaped profile of baffle plate 22, and it is identical with main chamber 11 shape, size is relatively little, make the developer solution uniform flow passage that the space between flow-stopping plate and main chamber is formed, developer solution enters after this runner through developer solution entrance, assignment of traffic and developer solution internal pressure even, evenly export in the developer solution outlet of long straight slit shape, can be used in the formation of the developing line of length.
In order to improve and keep sealing effectiveness, arrange O RunddichtringO (not shown) between cover plate flange 21 and mounting flange 14, this O RunddichtringO embeds in the seal groove on mounting flange 14.In order to when flow-stopping plate 2 is plugged in main chamber 11, location is convenient, two ends on main chamber 11 length direction arrange the slot 16 connected with main chamber 11, the two ends of baffle plate 22 coordinate with slot 16 and contact, and according to seal request, fit system selects interference fit or transition fit.In order to reduce technology difficulty, baffle plate 22 liang of T-shaped end faces do not contact with two groove sides of slot 16, and the location on length direction utilizes the positioning strip of cover plate flange 21 to coordinate with the locating slot 18 on mounting flange 14 and realizes.
Because developer solution is alkalescence, nozzle body and flow-stopping plate are made by engineering plastics, the engineering plastics that prioritizing selection machining property is good, corrosion resistivity is strong, such as PEEK etc.
Mounting flange 14 distribute as shown in Figure 6 with the threaded hole 17 of screw fit, when nozzle body selects engineering plastic product, stress relief when Long-Time Service rear thread is fixed makes locking loosen, in order to prevent this situation, pre-plugged some stainless steel screw shells (not shown) on the mounting flange of nozzle body, screw spiral shell, in stainless steel screw shell, ensures permanently effective locking.
In order to improve the resistance to corrosion of O RunddichtringO, ensure the sealing between flow-stopping plate and main chamber, O RunddichtringO adopts FFKM to make.
Above by specific embodiment to invention has been detailed description, these concrete descriptions can not think that the present invention is only only limitted to the content of these embodiments.Those skilled in the art according to the present invention's design, these describe and any improvement made in conjunction with general knowledge known in this field, equivalents, all should be included in the protection domain of the claims in the present invention.
Claims (9)
1. for a technique nozzle for chip developing process, it is characterized in that, comprising: nozzle body and flow-stopping plate;
Described nozzle body comprises a U-shaped main chamber, and is positioned on described main chamber two side in the longitudinal direction, and the developer solution entrance be connected with described main chamber and developer solution export; Wherein, the height of described developer solution center line of discharge is not more than the height of described developer solution inlet axis, and described developer solution outlet is long straight slit;
The xsect of described flow-stopping plate is T-shaped, is plugged in described main chamber, and described flow-stopping plate seals described main chamber oral area, and two T-shaped end faces of described flow-stopping plate are affixed on the chamber wall of described main chamber; Described developer solution entrance and developer solution outlet are positioned at the both sides of described flow-stopping plate, and the space between described flow-stopping plate and described main chamber forms U-shaped developer solution runner; Developer solution, after described developer solution entrance enters this runner, forms the uniform developer solution of internal pressure, evenly flows out and the liquidus that develops along the sidewall of described nozzle body to dirty formation from described developer solution outlet.
2. technique nozzle according to claim 1, is characterized in that, the baffle plate that described flow-stopping plate comprises cover plate flange and vertically extends from described cover plate flange.
3. technique nozzle according to claim 2, is characterized in that, described main chamber oral area arranges mounting flange, and described cover plate flange is fixedly connected with by screw with described mounting flange.
4. technique nozzle according to claim 3, is characterized in that, arranges O RunddichtringO between described cover plate flange and described mounting flange, and described O RunddichtringO embeds in the seal groove on described mounting flange.
5. technique nozzle according to claim 3, is characterized in that, described developer solution entrance contacts with the lower end of described mounting flange.
6. technique nozzle according to claim 5, is characterized in that, described developer solution entrance is positioned on described nozzle body length direction, the middle part of described nozzle body.
7. technique nozzle according to claim 2, is characterized in that, the xsect of described baffle plate is U-shaped.
8. technique nozzle according to claim 2, is characterized in that, the two ends on described main chamber length direction arrange the slot connected with described main chamber, and the two ends of described baffle plate coordinate with slot and contact.
9. technique nozzle according to claim 1, is characterized in that, described developer solution outlet is consistent in the longitudinal direction with described main chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310379709.2A CN103472693B (en) | 2013-08-28 | 2013-08-28 | A kind of technique nozzle for chip developing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310379709.2A CN103472693B (en) | 2013-08-28 | 2013-08-28 | A kind of technique nozzle for chip developing process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103472693A CN103472693A (en) | 2013-12-25 |
| CN103472693B true CN103472693B (en) | 2016-01-20 |
Family
ID=49797593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310379709.2A Expired - Fee Related CN103472693B (en) | 2013-08-28 | 2013-08-28 | A kind of technique nozzle for chip developing process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103472693B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101209437A (en) * | 2006-12-28 | 2008-07-02 | 显示器生产服务株式会社 | Nozzle for jetting fluid |
| CN103246165A (en) * | 2013-04-25 | 2013-08-14 | 深圳市华星光电技术有限公司 | Photoresist coating device and coating method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003093944A (en) * | 2001-09-27 | 2003-04-02 | Dainippon Screen Mfg Co Ltd | Apparatus for applying coating liquid to substrate |
| CN102387868B (en) * | 2009-03-19 | 2015-04-29 | 龙云株式会社 | Device for coating substrate |
-
2013
- 2013-08-28 CN CN201310379709.2A patent/CN103472693B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101209437A (en) * | 2006-12-28 | 2008-07-02 | 显示器生产服务株式会社 | Nozzle for jetting fluid |
| CN103246165A (en) * | 2013-04-25 | 2013-08-14 | 深圳市华星光电技术有限公司 | Photoresist coating device and coating method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103472693A (en) | 2013-12-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103472693B (en) | A kind of technique nozzle for chip developing process | |
| CN202834533U (en) | Water-supply double-thread joint | |
| CN208474751U (en) | A kind of anti-effect returning water isocon | |
| CN105889660A (en) | Pipeline connecting part with good sealing property | |
| CN204437369U (en) | Bathroom water tap valve core | |
| CN204412483U (en) | A kind of fan-shaped spray discharging device and gondola water faucet | |
| CN203409022U (en) | On-line washing device for aluminum pipe drawing | |
| CN203892783U (en) | Internal thread three-way pipe | |
| CN202698868U (en) | Water outlet mouth | |
| CN203881209U (en) | Spraying type self-cleaning condenser | |
| CN203906908U (en) | Membrane type one-way valve | |
| CN208384514U (en) | A kind of computer water-cooled radiator leakage-proof apparatus | |
| CN205298808U (en) | Safe energy -conservation makes things convenient for tap of dismouting | |
| CN203421287U (en) | Splash-proof device for water faucet | |
| CN203477746U (en) | One-way pipe | |
| CN208443447U (en) | Target type meter rectifier | |
| RU2439252C2 (en) | Liquid drain method | |
| CN217977978U (en) | Acid and alkali corrosion resistant flow guide sleeve | |
| CN203719522U (en) | Detachable heat exchanger | |
| CN215371401U (en) | Copper pipe that heat conduction efficiency is high | |
| CN212151879U (en) | Anti-scaling device for sewage pipeline | |
| KR200441924Y1 (en) | Connection valve for Flowing backward prevention | |
| CN216200798U (en) | Novel water tap | |
| CN220959017U (en) | Turbulent flow type air conditioner distributor | |
| CN216045641U (en) | Portable pipeline check valve |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160120 Termination date: 20180828 |