CN103412467B - 沿扫描方向进行均匀性补偿装置及利用该装置进行均匀性补偿方法 - Google Patents
沿扫描方向进行均匀性补偿装置及利用该装置进行均匀性补偿方法 Download PDFInfo
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CN105988123B (zh) * | 2015-02-13 | 2018-09-14 | 中国科学院理化技术研究所 | 一种线扫描成像装置 |
CN105652607A (zh) * | 2016-04-08 | 2016-06-08 | 长春长光天辰光电科技有限公司 | 一种用于数字光刻系统的光强不均匀性测量与校正方法 |
CN108062007B (zh) * | 2016-11-07 | 2019-11-12 | 俞庆平 | 一种提高光刻能量均匀性和改善拼接的方法 |
CN108073043A (zh) * | 2016-11-07 | 2018-05-25 | 俞庆平 | 一种直写式丝网制版系统的光均匀性补偿方法 |
CN108181791B (zh) * | 2017-12-27 | 2019-10-11 | 四川大学 | 用探头步进扫描实现ArF准分子激光光强均匀性检测的方法 |
CN111954386A (zh) * | 2019-05-15 | 2020-11-17 | 中山新诺科技股份有限公司 | 一种阻焊线路一体曝光的ld多光谱曝光方法及系统 |
CN112286008B (zh) * | 2020-09-27 | 2022-07-05 | 江苏迪盛智能科技有限公司 | 一种激光直写能量校正方法及装置 |
CN114509916B (zh) * | 2020-11-16 | 2024-03-08 | 香港大学 | 激光干涉光刻设备和方法 |
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DE19944760A1 (de) * | 1999-09-17 | 2001-03-22 | Basys Print Gmbh Systeme Fuer | Vorrichtung und Verfahren zur Kompensation von Inhomogenitäten bei Abbildungssystemen |
US6922483B2 (en) * | 1999-12-28 | 2005-07-26 | Texas Instruments Incorporated | Methods for measuring DMD low frequency spatial uniformity |
US7936445B2 (en) * | 2006-06-19 | 2011-05-03 | Asml Netherlands B.V. | Altering pattern data based on measured optical element characteristics |
CN101226343A (zh) * | 2008-01-29 | 2008-07-23 | 芯硕半导体(中国)有限公司 | 一种采用灰度补偿制提高光刻曝光能量均匀性的方法 |
KR20100030999A (ko) * | 2008-09-11 | 2010-03-19 | 삼성전자주식회사 | 마스크리스 노광 장치 및 이를 이용한 정렬 오차의 보상 방법 |
CN203376558U (zh) * | 2013-08-12 | 2014-01-01 | 中山新诺科技有限公司 | 沿扫描方向进行均匀性补偿装置 |
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