CN103341459A - Optical mask cleaning machine and cleaning method thereof - Google Patents
Optical mask cleaning machine and cleaning method thereof Download PDFInfo
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- CN103341459A CN103341459A CN2013102486556A CN201310248655A CN103341459A CN 103341459 A CN103341459 A CN 103341459A CN 2013102486556 A CN2013102486556 A CN 2013102486556A CN 201310248655 A CN201310248655 A CN 201310248655A CN 103341459 A CN103341459 A CN 103341459A
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Abstract
The invention discloses an optical mask cleaning machine and a cleaning method thereof. The optical mask cleaning machine comprises a deionized water spraying unit, an air drying unit, a rotary motor, a central controller and an executing control module, wherein the central controller and the executing control module are connected with the deionized water spraying unit, the air drying unit and the rotary motor. According to the optical mask cleaning machine and the cleaning method thereof, setting, changing and selecting of a cleaning program are conducted through a GUI interface of a display screen, and operators can be helped to monitor the whole cleaning program; the executing control module effectively simplifies the cleaning scheme procedures, and work efficiency is improved; the central controller provides more accurate time length setting for all the steps.
Description
Technical field
The present invention relates to technical field of semiconductors, particularly relate to a kind of photomask cleaning machine and cleaning method thereof.
Background technology
It is the maximum operation of number of repetition in the finished product mask testing process that mask cleans, and the purpose of cleaning is to remove surface particles, and the quality of cleaning directly influences result and the efficient of detection.
What generally adopted in semiconductor devices production countries in the world at present is that Kern is in the RCA standard cleaning method of invention in 1970.Many researchers have carried out big quantity research and improvement to RCA standard cleaning method.From the initial stage nineties, people begin to be devoted to the research of new cleaning technology and cleaning agent to replace the RCA cleaning technique.Cady in 1996 and Varadarajan have proposed the alkaline aqueous solution spraying ablution of employing tetramethyl aqua ammonia [N (CH3) 4OH] with carboxylation buffer agent's configuration; Jeon in 1997 and Raghavan have proposed to utilize mega sonic wave to excite Ozone Water that silicon chip is cleaned; People such as Bakker had proposed water and water/CO2 mixed solution cleaning under high temperature, high pressure etc. in 1998.
Yet cleaning procedure is set complexity in the prior art, in use makes mistakes easily; Man-machine interface is not directly perceived, can't know to show current action; Scavenging period is set inaccuracy, influences cleaning performance; Complex structure, maintenance is inconvenient.
Therefore, at above-mentioned technical problem, be necessary to provide a kind of photomask cleaning machine and cleaning method thereof.
Summary of the invention
In view of this, the object of the present invention is to provide a kind of photomask cleaning machine and cleaning method thereof.
To achieve these goals, the technical scheme that provides of the embodiment of the invention is as follows:
A kind of photomask cleaning machine, described photomask cleaning machine comprises deionized water injection unit, gas drying unit, rotation motor, and described photomask cleaning machine also comprises the central controller that links to each other with rotation motor with deionized water injection unit, gas drying unit and carries out control module.
As a further improvement on the present invention, described central controller comprises:
Control chip is used for control cleaning process duration;
DIP switch is used for the control wash course;
Power supply links to each other with DIP switch with control chip, is used to the central controller power supply;
And some first ports, be used for being connected with the central controller outside.
As a further improvement on the present invention, described first port comprises one or more in RS232C port and the ethernet port.
As a further improvement on the present invention, described execution control module comprises:
The deionized water that links to each other with the deionized water injection unit sprays control module;
The dry control module of the gas that links to each other with the gas drying unit;
The rotation motor control module that links to each other with rotation motor;
And some second ports.
As a further improvement on the present invention, described second port comprises one or more in RS232C port and the ethernet port.
As a further improvement on the present invention, also be connected with display screen for the display graphics user interface on the described central controller.
Correspondingly, a kind of cleaning method of photomask cleaning machine, described method comprises:
S1, by the inject high pressure deionized water mask positive and negative is cleaned simultaneously, and use rotation motor to dry;
S2, utilize Compressed Gas to assist that the space of a whole page is dry to be handled.
As a further improvement on the present invention, the rotating speed of rotation motor is 50-1500RPM among the described step S1.
As a further improvement on the present invention, Compressed Gas is compressed air or compressed nitrogen among the described step S2.
As a further improvement on the present invention, described method comprises cleaning, drying and the dry time set respectively.
The invention has the beneficial effects as follows: photomask cleaning machine of the present invention and cleaning method thereof carry out setting, change and the selection of cleaning procedure by the gui interface of display screen, help operating personnel to the monitoring of whole cleaning procedure; Carried out the control module effective simplification cleaning program flow process has been set, increased work efficiency; Central controller is set for each step provides more accurate duration.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, to do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below, apparently, the accompanying drawing that describes below only is some embodiment that put down in writing among the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the module diagram of photomask cleaning machine in an embodiment of the present invention;
Fig. 2 is the module diagram of WinPLC controller in an embodiment of the present invention;
Fig. 3 is the module diagram of DL205 control module in an embodiment of the present invention;
Fig. 4 is the control circuit schematic diagram of rotation motor control module in an embodiment of the present invention.
The specific embodiment
The invention discloses a kind of photomask cleaning machine, comprise deionized water injection unit, gas drying unit, rotation motor, the photomask cleaning machine also comprises the central controller that links to each other with rotation motor with deionized water injection unit, gas drying unit and carries out control module.
Preferably, central controller comprises:
Control chip is used for control cleaning process duration;
DIP switch is used for the control wash course;
Power supply links to each other with DIP switch with control chip, is used to the central controller power supply;
And some first ports, be used for being connected with the central controller outside.
Preferably, first port comprises one or more in RS232C port and the ethernet port.
Preferably, carrying out control module comprises:
The deionized water that links to each other with the deionized water injection unit sprays control module;
The dry control module of the gas that links to each other with the gas drying unit;
The rotation motor control module that links to each other with rotation motor;
And some second ports.
Preferably, second port comprises one or more in RS232C port and the ethernet port.
Preferably, also be connected with display screen for the display graphics user interface on the central controller.
The invention also discloses a kind of cleaning method of photomask cleaning machine, comprising:
S1, by the inject high pressure deionized water mask positive and negative is cleaned simultaneously, and use rotation motor to dry;
S2, utilize Compressed Gas to assist that the space of a whole page is dry to be handled.
Preferably, the rotating speed of rotation motor is 50-1500RPM among the step S1.
Preferably, Compressed Gas is compressed air or compressed nitrogen among the step S2.
Preferably, method comprises cleaning, drying and the dry time set respectively.
In order to make those skilled in the art person understand technical scheme among the present invention better, below in conjunction with the accompanying drawing in the embodiment of the invention, technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills should belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
Ginseng Figure 1 shows that the module diagram of photomask cleaning machine in the present invention's one preferred embodiment, in the present embodiment, the photomask cleaning machine comprises deionized water injection unit 10, gas drying unit 20, rotation motor 30, and the photomask cleaning machine also comprises the central controller 40 that links to each other with deionized water injection unit 10, gas drying unit 20 and rotation motor 30 and carries out control module 50.
Shown in Figure 2 in conjunction with ginseng, in the present embodiment, central controller 40 is chosen the WinPLC controller that Koyo company produces, and WinPLC (PLC:Programmable Logic Controller) controller is programmable logic controller (PLC), and it comprises:
DIP (dual inline-pin package) switch 42 is used for the control wash course, selects rotary-type DIP switch in the present embodiment for use;
And some first ports 44, being used for linking to each other with the WinPLC controller is outside, first port in the present embodiment comprises RS232C port and ethernet port.
Shown in Figure 3 in conjunction with ginseng, in the present embodiment, to carry out control module 50 and choose the DL205 control module that Koyo company produces, it comprises:
The deionized water that links to each other with deionized water injection unit 10 sprays control module 51;
The dry control module 52 of the gas that links to each other with gas drying unit 20;
The rotation motor control module 53 that links to each other with rotation motor 30;
And some second ports 54, second port 54 comprises RS232C port and ethernet port in the present embodiment.
Preferably, also be connected with the display screen 60 for display graphics user interface (GUI, Graphical User Interface) on the central controller 40, display screen can be made as touch-screen or other forms.
Correspondingly, the cleaning method based on this photomask cleaning machine may further comprise the steps:
S1, by the inject high pressure deionized water mask positive and negative is cleaned simultaneously, and use rotation motor to dry, preferably, the rotating speed of rotation motor is 50-1500RPM, and the user is arranged on any rotating speed in this scope as required;
S2, utilize Compressed Gas to assist that the space of a whole page is dry to be handled, Compressed Gas is compressed air or compressed nitrogen.
Also comprise in the method: set respectively and clean, dry and the dry time, the setting of time span is finished by programming, according to different needs, can set corresponding duration, and programming is simple, grasps easily.
According to each step purpose difference (as cleaning and drying), the rotation motor control module can provide the rotating speed of 50-1500RPM, and can set any rotating speed in this scope for, provides necessary condition for improving cleaning quality.
Ginseng Figure 4 shows that the control circuit schematic diagram of rotation motor control module 53 in the embodiment of the invention.Regulate the rotating speed of rotation motor in the present embodiment according to voltage, when voltage SIG value changes in 0～10V among the figure, rotation motor provides the corresponding rotating speed in the 50-1500RPM respectively, the user is according to different demands, set different voltage, thereby obtain required motor rotary speed, finish each step in the cleaning process.
Photomask cleaning machine of the present invention and cleaning method thereof carry out setting, change and the selection of cleaning procedure by GUI (the Graphical User Interface) graphic user interface of display screen, help operating personnel to the monitoring of whole cleaning procedure; DL205 control module effective simplification the cleaning program flow process is set, increase work efficiency; The WinPLC controller is set for each step provides more accurate duration.
By technique scheme as can be seen, the present invention has following beneficial effect:
Highly versatile, control program is variable, and is easy to use;
Programming is simple, grasps easily;
The design of system, installation, debugging work load are few;
Maintenance load is little, and is easy to maintenance;
Volume is little, and energy consumption is low.
To those skilled in the art, obviously the invention is not restricted to the details of above-mentioned one exemplary embodiment, and under the situation that does not deviate from spirit of the present invention or essential characteristic, can realize the present invention with other concrete form.Therefore, no matter from which point, all should regard embodiment as exemplary, and be nonrestrictive, scope of the present invention is limited by claims rather than above-mentioned explanation, therefore is intended to include in the present invention dropping on the implication that is equal to important document of claim and all changes in the scope.Any Reference numeral in the claim should be considered as limit related claim.
In addition, be to be understood that, though this specification is described according to embodiment, but be not that each embodiment only comprises an independently technical scheme, this narrating mode of specification only is for clarity sake, those skilled in the art should make specification as a whole, and the technical scheme among each embodiment also can form other embodiments that it will be appreciated by those skilled in the art that through appropriate combination.
Claims (10)
1. photomask cleaning machine, described photomask cleaning machine comprises deionized water injection unit, gas drying unit, rotation motor, it is characterized in that described photomask cleaning machine also comprises the central controller that links to each other with rotation motor with deionized water injection unit, gas drying unit and carries out control module.
2. photomask cleaning machine according to claim 1 is characterized in that, described central controller comprises:
Control chip is used for control cleaning process duration;
DIP switch is used for the control wash course;
Power supply links to each other with DIP switch with control chip, is used to the central controller power supply;
And some first ports, be used for being connected with the central controller outside.
3. photomask cleaning machine according to claim 2 is characterized in that, described first port comprises one or more in RS232C port and the ethernet port.
4. photomask cleaning machine according to claim 1 is characterized in that, described execution control module comprises:
The deionized water that links to each other with the deionized water injection unit sprays control module;
The dry control module of the gas that links to each other with the gas drying unit;
The rotation motor control module that links to each other with rotation motor;
And some second ports.
5. photomask cleaning machine according to claim 1 is characterized in that, described second port comprises one or more in RS232C port and the ethernet port.
6. photomask cleaning machine according to claim 1 is characterized in that, also is connected with the display screen for the display graphics user interface on the described central controller.
7. the cleaning method of a photomask cleaning machine as claimed in claim 1 is characterized in that, described method comprises:
S1, by the inject high pressure deionized water mask positive and negative is cleaned simultaneously, and use rotation motor to dry;
S2, utilize Compressed Gas to assist that the space of a whole page is dry to be handled.
8. cleaning method according to claim 7 is characterized in that, the rotating speed of rotation motor is 50-1500RPM among the described step S1.
9. cleaning method according to claim 7 is characterized in that, Compressed Gas is compressed air or compressed nitrogen among the described step S2.
10. cleaning method according to claim 7 is characterized in that, described method comprises setting respectively to be cleaned, dry and the dry time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013102486556A CN103341459A (en) | 2013-06-20 | 2013-06-20 | Optical mask cleaning machine and cleaning method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2013102486556A CN103341459A (en) | 2013-06-20 | 2013-06-20 | Optical mask cleaning machine and cleaning method thereof |
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| CN103341459A true CN103341459A (en) | 2013-10-09 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004071702A (en) * | 2002-08-02 | 2004-03-04 | Toshiba Ceramics Co Ltd | Semiconductor wafer cleaning device |
| JP4047325B2 (en) * | 2004-10-26 | 2008-02-13 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| CN101253604A (en) * | 2005-06-23 | 2008-08-27 | 东京毅力科创株式会社 | Substrate processing method and substrate processing apparatus |
| CN203484365U (en) * | 2013-06-20 | 2014-03-19 | 无锡华润微电子有限公司 | Optical mask cleaning machine |
-
2013
- 2013-06-20 CN CN2013102486556A patent/CN103341459A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004071702A (en) * | 2002-08-02 | 2004-03-04 | Toshiba Ceramics Co Ltd | Semiconductor wafer cleaning device |
| JP4047325B2 (en) * | 2004-10-26 | 2008-02-13 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| CN101253604A (en) * | 2005-06-23 | 2008-08-27 | 东京毅力科创株式会社 | Substrate processing method and substrate processing apparatus |
| CN203484365U (en) * | 2013-06-20 | 2014-03-19 | 无锡华润微电子有限公司 | Optical mask cleaning machine |
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Application publication date: 20131009 |