CN103337371B - Full tantalum insulator cover and manufacturing process thereof - Google Patents
Full tantalum insulator cover and manufacturing process thereof Download PDFInfo
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- CN103337371B CN103337371B CN201310293247.2A CN201310293247A CN103337371B CN 103337371 B CN103337371 B CN 103337371B CN 201310293247 A CN201310293247 A CN 201310293247A CN 103337371 B CN103337371 B CN 103337371B
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Abstract
The invention discloses full tantalum insulator cover and manufacturing process thereof, the flat part that this full tantalum insulator cover is integrally machined by tantalum plate, including centre bore, flange; It is characterized in that, described centre bore surrounding is provided with boss, and boss adopts cold-extruded technique to form, and its upper surface is tantalum sheet thickness to the distance of bottom surface; It is provided with liquid injection hole around described centre bore. It is an object of the invention to provide a kind of full tantalum insulator cover for manufacturing tantalum capacitor and manufacturing process thereof, without pulling, without residualinternal stress, to guarantee the sealing of capacitor anode and full tantalum insulator cover centre bore, avoid the occurrence of leakage, reduce the defect rate producing tantalum capacitor, and convenient to capacitor fluid injection.
Description
Technical field
The present invention relates to whole tantalum capacitor field, particularly relate to a kind of full tantalum insulator cover for manufacturing whole tantalum capacitor and the manufacturing process of this full tantalum insulator cover.
Background technology
The quality of tantalum is very hard, and tantalum is rich in ductility, it is possible to pull into filament formula thin foil. Its thermal coefficient of expansion is only small. Tantalum has very outstanding chemical property, has high corrosion resistance. It is no matter when cold-peace heat, hydrochloric acid, concentrated nitric acid and " chloroazotic acid " are not reacted. May be utilized in fabricating evaporator boat etc., it is possible to do the electrode of electron tube, commutator, electrolysis, electric capacity.
Tantalum forms stable anode oxide film in acidic electrolysis bath, the electrolysis condenser made with tantalum, has that capacity is big, volume is little and the advantage such as good reliability, manufactures the most important purposes that capacitor is tantalum.
At present, the full tantalum insulator cover of existing whole tantalum capacitor, it is middle useful in the circular hole holding capacitor anode, circular hole is flange processing, after processing, wall thickness is thinning, and oral area out-of-flatness, there is technique crackle in flange place, when being subsequently used for manufacturing whole tantalum capacitor, need to ensure the sealing of capacitor anode and full tantalum insulator cover centre bore by add-on device, due to existence pull, the situation such as residualinternal stress, its structure is unreliable to be caused and poor sealing performance, easily there is the phenomenon of leakage in the tantalum capacitor manufactured, and defect rate is high. It addition, the fluid injection of tantalum capacitor is not provided with special liquid injection hole, manufacturing process is restricted.
By patent retrieval, there is following known prior art:
Patent 1:
Application: 201010288321.8, the applying date: 2010.09.21, authorized announcement date: 2012.07.1, the invention discloses a kind of insulator cover shaping method, it is characterized in that the repeatedly load-unload that feeding plate first carries out endoporus processes, afterwards the endoporus after drawing is punched out, then to the endoporus deburring shaped, again the endoporus periphery reverse drawing after removing burr is processed, finally endoporus periphery is carried out shaping and trimming, makes product. Elder generation of the present invention drawing endoporus, facilitate the removal of inner-hole burr after punching, ensure the quality of endoporus, and after endoporus shaping, in follow-up forming process, material bottom hole is no longer participate in shaping, so baseplane is smooth, part forming quality is good, and all forming processes are all that profile shapes, it is convenient to measure, and quality is easily controlled.
Patent 2:
Application number: 201010574119.1, the applying date: 2010-12-02, Shen Qing Publication day: 2012.06.06, the invention discloses a kind of whole tantalum capacitor, including full tantalum shell, full tantalum insulator cover, insulator and tantalum rod;Described full tantalum shell is the tubular structure that one end has opening; The opening part of described full tantalum shell is provided with full tantalum insulator cover, is provided with circular hole in the middle part of described full tantalum insulator cover, and described circular hole periphery is provided with upwardly extending boss, and the circular hole of described full tantalum insulator cover is filled partially with insulator; Described tantalum rod is the bar that two ends are smooth, and one end of described tantalum rod is passed described insulator and protruded the bottom surface of full tantalum insulator cover. Technical scheme, strengthens the protection of the full tantalum insulator cover insulator of whole tantalum capacitor, can reach full tantalum insulator and will not deform in processing welding and use procedure, effectively strengthen the sealing between full tantalum insulator cover and tantalum rod.
Patent 3:
Application number 201020642939.5, applying date 2010.12.02, authorized announcement date 2011.09.07, the utility model discloses a kind of whole tantalum capacitor, including full tantalum shell, full tantalum insulator cover, insulator and tantalum pipe; Described full tantalum shell is the tubular structure that one end has opening; The opening part of described full tantalum shell is provided with full tantalum insulator cover, and described full tantalum insulator cover periphery is provided with upwardly extending edge; Being provided with circular hole in the middle part of described full tantalum insulator cover, the circular hole of described full tantalum insulator cover is filled partially with insulator; Described tantalum pipe is hollow tubular and two ends communicate, and one end of described tantalum pipe connects through described insulator with full tantalum shell internal cavities. The technical solution of the utility model, by the periphery of full tantalum insulator cover is formed outward flange, full tantalum insulator cover entirety can be imported inside full tantalum shell, thus reducing the seam welding area of full tantalum insulator cover and full tantalum shell, so, convenient operation can be realized when carrying out the seam welding sealing by full tantalum insulator cover and full tantalum shell, improve the sealing effectiveness of full tantalum insulator cover and full tantalum shell.
Being found by above retrieval, above technical scheme can not affect the novelty of the present invention; And above patent document be mutually combined the creativeness that can not destroy the present invention.
Summary of the invention
It is an object of the invention to provide a kind of full tantalum insulator cover for manufacturing tantalum capacitor and manufacturing process thereof, without pulling, without residualinternal stress, to guarantee the sealing of capacitor anode and full tantalum insulator cover centre bore, avoid the occurrence of leakage, reduce the defect rate producing tantalum capacitor, and convenient to capacitor fluid injection.
For realizing object above, the present invention adopts the following technical scheme that.
A scheme according to the present invention, full tantalum insulator cover includes: the flat part being integrally machined by tantalum plate, including centre bore (1), crimping (4); It is annulus that described centre bore (1) surrounding is provided with cross section, and longitudinal section is trapezoidal boss (2), and boss (2) is highly the 3/4 of tantalum plate, from centre bore (1) inwall to centered by the width of boss (2) outer wall the 1/2 of hole (1) internal diameter. Described boss (2) and full tantalum insulator cover are connected as a single entity, and its upper surface is tantalum sheet thickness to the distance of full tantalum insulator cover bottom surface; Liquid injection hole (3) it is provided with around the centre position of described centre bore (1) and crimping (4).
Further, the trapezoidal side of the longitudinal section of described boss (2) and the angle of vertical direction are 1 °.
Further, centered by liquid injection hole (3) internal diameter the 1/5 of hole (1) internal diameter, and having and boss (2) flange in the same direction, flange height is the 2/3 of boss (2) height.
According to another aspect of the present invention, full tantalum insulator cover manufacturing process includes following operation:
1. blanking operation, adopts 16t common punch press, special blanking die. The descended tantalum plate of blanking operation is less than actual product development size, and it is of a size of the 4/5 of actual product development size.
2. cold-extruded operation, adopts 100t hydraulic press, and special cold extrusion mould, the speed of mainshaft is set to 10r/min. Slow punching press, makes tantalum plate homogeneous deformation, it is to avoid produce machining stress. Cold-extruded adds man-hour, and boss place material does not deform upon, and plate is thinning elsewhere.
3. bending process, adopts 16t common punch press, special bender, is once stamped and formed out crimping.
4. punching operation, adopts 16t common punch press, and Special punching casement, a punching press completes. Centre bore is without turn-ups, liquid injection hole flange.
Wherein, cold-extruded operation 2. in, cold extrusion mould center has central channel, and the shape of groove is consistent with boss profile.
Beneficial effects of the present invention: 1, without pulling, without residualinternal stress, it is ensured that when manufacturing capacitor, the sealing of capacitor anode and full tantalum insulator cover centre bore, it is to avoid leakage occur, reduces the defect rate producing tantalum capacitor.
Independent liquid injection hole, convenient to capacitor fluid injection.
Accompanying drawing explanation
Fig. 1 is the full tantalum insulator cover schematic diagram of the present invention.
Fig. 2 is existing full tantalum insulator cover schematic diagram.
Fig. 3 is boss 2 place partial enlarged drawing in Fig. 1.
Fig. 4 is the full tantalum insulator cover manufacturing process flow diagram of the present invention.
Fig. 5 is blanking operation 1. middle mould therefor schematic diagram.
Fig. 6 is mould therefor schematic diagram during 2. cold-extruded stays platform operation.
Fig. 7 is bending process 3. middle mould therefor schematic diagram.
Fig. 8 is mould therefor schematic diagram in punching molding 4..
Numerical reference described in Fig. 1-Fig. 3 is expressed as: 1, centre bore; 2, boss; 3, liquid injection hole; 4, crimping.
α=1 ° in Fig. 3.
Numerical reference in Fig. 4-Fig. 8 illustrates will narration in example in detail below illustrates.
Detailed description of the invention
In order to make those skilled in the art be more fully understood that technical scheme, describing the present invention below in conjunction with accompanying drawing, the description of this part is only exemplary and explanatory, and protection scope of the present invention should not have any restriction effect.
As it is shown in figure 1, the architectural feature of the present invention is: full tantalum insulator cover, tantalum plate the flat part being integrally machined, including centre bore 1, crimping 4; It is characterized in that, it is annulus that described centre bore 1 surrounding is provided with cross section, and longitudinal section is trapezoidal boss 2, and boss 2 is highly the 3/4 of tantalum plate, centered by from centre bore 1 inwall to the width of boss 2 outer wall the 1/2 of hole 1 internal diameter. Described boss 2 and full tantalum insulator cover are connected as a single entity, and its upper surface is tantalum sheet thickness to the distance of full tantalum insulator cover bottom surface; It is provided with liquid injection hole 3 around the centre position of described centre bore 1 and crimping 4.
Centre bore 1 shown in Fig. 2 is that direct punching press flange is formed, and flange place plate is thinning, it is easy to pull, and produces residualinternal stress.
It is illustrated in figure 3 in Fig. 1 boss 2 place partial enlarged drawing. The trapezoidal side of the longitudinal section of described boss 2 and the angle of vertical direction are 1 °, it is simple to mould is extruded and the demoulding, and enhance the root of boss 2, make boss 2 more solid and reliable, and sealing property is better.
In Fig. 1 centered by liquid injection hole 3 internal diameter the 1/5 of hole 1 internal diameter, and having and boss 2 flange in the same direction, flange height is the 2/3 of boss 2 height.The increase of liquid injection hole 3, facilitates fluid injection during production tantalum capacitor. Simultaneously because liquid injection hole 3 aperture is little compared with centre bore 1, flange height is also low than boss, and liquid injection hole 3 matching requirements do not have centre bore 1 strict, from the convenience of processing and reliability, adopt general piercing and flanging to process.
Adopting the full tantalum insulator cover shown in Fig. 1, use the processing technique of this example, the flange crackle probability occurred during centre bore molding reduces to zero, has stopped the leakage problem owing to processing technique causes.
If Fig. 4 is the present invention full tantalum insulator cover manufacturing process flow diagram: it includes following procedures: 1. form the blanking operation of tantalum plate to be processed; 2. the cold-extruded operation of preliminary deformation is realized; 3. the bending process of crimping function is realized; 4. the punching operation of punching molding is realized.
Fig. 5 is blanking operation 1. middle mould therefor schematic diagram, and wherein 1-1 is upper mould, and 1-2 is counterdie, and 1-3 is tantalum plate. Blanking die is installed on 16t common punch press. The material that this operation falls from tantalum plate, forms tantalum plate to be processed. The descended tantalum plate of blanking operation is less than actual product development size.
Fig. 6 is cold-extruded operation 2. middle mould therefor schematic diagram, and wherein 2-1 is upper mould, and 2-2 is counterdie, and 2-3 is tantalum plate. This operation realizes the preliminary deformation of tantalum plate, and reserves boss. In cold-extruded operation, boss place material does not deform upon, and boss plate elsewhere is thinning, and plate reaches product development size. Cold extrusion mould is arranged on 100t hydraulic press, and arranging the speed of mainshaft is 10r/min, and slow punching press makes tantalum plate homogeneous deformation, it is to avoid produce machining stress.
Fig. 7 is bending process 3. middle mould therefor schematic diagram, and wherein 3-1 is upper mould, and 3-2 is counterdie, and 3-3 is insulator cover. Die with edge-folded is installed on 16t common punch press. This operation crimping forms the crimping 4 of insulator cover.
Fig. 8 is mould therefor schematic diagram in punching molding 4., and wherein 4-1 is upper mould, and 4-2 is counterdie, and 4-3 is drill bit, and 4-4 is insulator cover. Punching die is installed on 16t common punch press. Centre bore 1 is one time punching molded with liquid injection hole 3.
After above four step operations, namely full tantalum insulator cover is formed, and without pulling, without residualinternal stress, ensure that the performance of product from structure and technique, has stopped the phenomenon of leakage owing to full tantalum insulator cover central hole defect causes. Meanwhile, the liquid injection hole full tantalum insulator cover increased facilitates tantalum capacitor and adds fluid injection in man-hour.
It should be noted that, in this article, term " includes ", " comprising " or its any other variant are intended to comprising of nonexcludability, so that include which key element the process of a series of key element, method, article or equipment not only include, but also include other key elements being not expressly set out, or also include the key element intrinsic for this process, method, article or equipment.
Principles of the invention and embodiment are set forth by specific case used herein, and the explanation of above example is only intended to help to understand method and the core concept thereof of the present invention. The above is only the preferred embodiment of the present invention, should be understood that, finiteness due to literal expression, and objectively there is unlimited concrete structure, for those skilled in the art, under the premise without departing from the principles of the invention, it is also possible to make some improvement, retouching or change, it is also possible to above-mentioned technical characteristic is combined by rights;These improve retouching, change or combination, or the not improved design by invention and technical scheme directly apply to other occasion, are regarded as protection scope of the present invention.
Claims (4)
1. full tantalum insulator cover, tantalum plate the flat part being integrally machined, including centre bore (1), crimping (4); It is characterized in that, it is annulus that described centre bore (1) surrounding is provided with cross section, longitudinal section is trapezoidal boss (2), and boss (2) is highly the 3/4 of tantalum plate, from centre bore (1) inwall to centered by the width of boss (2) outer wall the 1/2 of hole (1) internal diameter; Described boss (2) and full tantalum insulator cover are connected as a single entity, and its upper surface is tantalum sheet thickness to the distance of full tantalum insulator cover bottom surface, and boss place material does not deform upon; Liquid injection hole (3) it is provided with around the centre position of described centre bore (1) and crimping (4).
2. full tantalum insulator cover according to claim 1, it is characterised in that the trapezoidal side of the longitudinal section of described boss (2) and the angle of vertical direction are 1 °.
3. full tantalum insulator cover according to claim 1, it is characterised in that centered by liquid injection hole (3) internal diameter the 1/5 of hole (1) internal diameter, and have and boss (2) flange in the same direction, flange height is the 2/3 of boss (2) height.
4. full tantalum insulator cover manufacturing process, it is characterised in that it includes following procedures:
1. blanking operation, adopts 16t common punch press, special blanking die; The descended tantalum plate of blanking operation is less than actual product development size, and it is of a size of the 4/5 of actual product development size;
2. cold-extruded operation, adopts 100t hydraulic press, special cold extrusion mould, slow punching press, and the speed of mainshaft is set to 10r/min; Boss place material does not deform upon, and plate is thinning elsewhere;
3. bending process, adopts 16t common punch press, special bender, is once stamped and formed out crimping;
4. punching operation, adopts 16t common punch press, Special punching casement, and a punching press completes; Centre bore is without turn-ups, liquid injection hole flange;
Cold-extruded operation 2. in, cold extrusion mould center has central channel, and the shape of groove is consistent with boss profile.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310293247.2A CN103337371B (en) | 2013-07-14 | 2013-07-14 | Full tantalum insulator cover and manufacturing process thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310293247.2A CN103337371B (en) | 2013-07-14 | 2013-07-14 | Full tantalum insulator cover and manufacturing process thereof |
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| Publication Number | Publication Date |
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| CN103337371A CN103337371A (en) | 2013-10-02 |
| CN103337371B true CN103337371B (en) | 2016-06-15 |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1214974A (en) * | 1998-10-27 | 1999-04-28 | 机械工业部北京机电研究所 | Cold-forging forming method for cover of gas generator of car safety air-bag |
| EP1033729A2 (en) * | 1999-03-02 | 2000-09-06 | Matsushita Electric Industrial Co., Ltd. | Capacitor |
| CN201570383U (en) * | 2009-12-08 | 2010-09-01 | 西安华泰有色金属实业有限责任公司 | Glass capping group for fully-sealed mixed tantalum capacitor |
| CN201898031U (en) * | 2010-11-23 | 2011-07-13 | 宁波新容电器科技有限公司 | Capacitor cover |
| CN102486971A (en) * | 2010-12-02 | 2012-06-06 | 东莞市兆丰五金电子配件厂 | Full tantalum capacitor |
| CN203351430U (en) * | 2013-07-14 | 2013-12-18 | 湖南华冉科技有限公司 | Full-tantalum insulator cover |
-
2013
- 2013-07-14 CN CN201310293247.2A patent/CN103337371B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1214974A (en) * | 1998-10-27 | 1999-04-28 | 机械工业部北京机电研究所 | Cold-forging forming method for cover of gas generator of car safety air-bag |
| EP1033729A2 (en) * | 1999-03-02 | 2000-09-06 | Matsushita Electric Industrial Co., Ltd. | Capacitor |
| CN201570383U (en) * | 2009-12-08 | 2010-09-01 | 西安华泰有色金属实业有限责任公司 | Glass capping group for fully-sealed mixed tantalum capacitor |
| CN201898031U (en) * | 2010-11-23 | 2011-07-13 | 宁波新容电器科技有限公司 | Capacitor cover |
| CN102486971A (en) * | 2010-12-02 | 2012-06-06 | 东莞市兆丰五金电子配件厂 | Full tantalum capacitor |
| CN203351430U (en) * | 2013-07-14 | 2013-12-18 | 湖南华冉科技有限公司 | Full-tantalum insulator cover |
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| CN103337371A (en) | 2013-10-02 |
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Effective date of registration: 20210120 Address after: 412100 Wantang village, Lukou Town, Lukou District, Zhuzhou City, Hunan Province (118 Fubo Avenue) Patentee after: Hunan Huadan New Material Co.,Ltd. Address before: 412100 area 1-B, No.8 workshop, Jinshiji Pioneer Park, Lukou Economic Development Zone, Zhuzhou County, Zhuzhou City, Hunan Province Patentee before: HUNAN HUARAN TECHNOLOGY Co.,Ltd. |
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