CN103317438B - Dynamic pressure floats off polishing disk dynamic pressure and floats off position accurate adjusting mechanism - Google Patents
Dynamic pressure floats off polishing disk dynamic pressure and floats off position accurate adjusting mechanism Download PDFInfo
- Publication number
- CN103317438B CN103317438B CN201310247261.9A CN201310247261A CN103317438B CN 103317438 B CN103317438 B CN 103317438B CN 201310247261 A CN201310247261 A CN 201310247261A CN 103317438 B CN103317438 B CN 103317438B
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- shaft
- dynamic pressure
- floats
- shaft sleeve
- briquetting
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- 238000005498 polishing Methods 0.000 title claims abstract description 33
- 230000007246 mechanism Effects 0.000 title claims abstract description 18
- 238000007667 floating Methods 0.000 abstract description 8
- 230000008859 change Effects 0.000 abstract description 6
- 230000001737 promoting effect Effects 0.000 abstract description 2
- 239000007788 liquid Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
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CN201310247261.9A CN103317438B (en) | 2013-06-18 | 2013-06-18 | Dynamic pressure floats off polishing disk dynamic pressure and floats off position accurate adjusting mechanism |
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CN201310247261.9A CN103317438B (en) | 2013-06-18 | 2013-06-18 | Dynamic pressure floats off polishing disk dynamic pressure and floats off position accurate adjusting mechanism |
Publications (2)
Publication Number | Publication Date |
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CN103317438A CN103317438A (en) | 2013-09-25 |
CN103317438B true CN103317438B (en) | 2015-08-19 |
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CN201310247261.9A Expired - Fee Related CN103317438B (en) | 2013-06-18 | 2013-06-18 | Dynamic pressure floats off polishing disk dynamic pressure and floats off position accurate adjusting mechanism |
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CN (1) | CN103317438B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105397573B (en) * | 2015-12-09 | 2017-08-18 | 浙江工业大学 | The pressure suspension polishing device that surges based on hydraulic mechanism |
CN105382697B (en) * | 2015-12-09 | 2017-11-07 | 浙江工业大学 | A kind of detection method of hydraulic pressure, buoyancy and floating distance |
CN111283549B (en) * | 2020-03-24 | 2024-07-09 | 中国工程物理研究院激光聚变研究中心 | Planetary disc type ball mill |
CN114603461B (en) * | 2020-12-09 | 2023-04-11 | 中国科学院大连化学物理研究所 | Constant-force floating polishing device |
CN112548832B (en) * | 2020-12-24 | 2022-12-20 | 义乌市子鱼创意设计有限公司 | Water block polishing device for automobile engine |
CN112935996B (en) * | 2021-01-29 | 2023-05-26 | 江西宏信光学科技有限公司 | High-precision polishing machine for optical lenses and upper grinding device thereof |
CN112959170B (en) * | 2021-01-29 | 2023-05-02 | 鹤山市嘉米基光电科技有限公司 | High-precision polishing machine for optical lenses, damping mechanism of high-precision polishing machine and upper grinding device |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0514275A1 (en) * | 1991-05-17 | 1992-11-19 | Aventis Pharma S.A. | Thiopyranopyrrole derivatives, their preparation and pharmaceutical compositions containing them |
CN2181366Y (en) * | 1993-06-14 | 1994-11-02 | 郑州动力机械厂 | Grinding table fast rise-and-fall grinding mechanism with elastic pressure charging device |
CN2319177Y (en) * | 1998-01-21 | 1999-05-19 | 蔡志伟 | Mill lifting device of grinder |
US20070270081A1 (en) * | 2007-08-02 | 2007-11-22 | Epir Technologies, Inc. | Automated Chemical Polishing System Adapted for Soft Semiconductor Materials |
CN201105406Y (en) * | 2007-09-06 | 2008-08-27 | 广东科达机电股份有限公司 | Planetary profile polishing grinding head |
CN101708592A (en) * | 2009-11-05 | 2010-05-19 | 浙江工业大学 | Base disc used for suspension polishing |
CN203317206U (en) * | 2013-06-18 | 2013-12-04 | 浙江工业大学 | Dynamic pressure floating separation position precise adjusting mechanism for dynamic pressure floating separation polishing disk |
-
2013
- 2013-06-18 CN CN201310247261.9A patent/CN103317438B/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0514275A1 (en) * | 1991-05-17 | 1992-11-19 | Aventis Pharma S.A. | Thiopyranopyrrole derivatives, their preparation and pharmaceutical compositions containing them |
CN2181366Y (en) * | 1993-06-14 | 1994-11-02 | 郑州动力机械厂 | Grinding table fast rise-and-fall grinding mechanism with elastic pressure charging device |
CN2319177Y (en) * | 1998-01-21 | 1999-05-19 | 蔡志伟 | Mill lifting device of grinder |
US20070270081A1 (en) * | 2007-08-02 | 2007-11-22 | Epir Technologies, Inc. | Automated Chemical Polishing System Adapted for Soft Semiconductor Materials |
CN201105406Y (en) * | 2007-09-06 | 2008-08-27 | 广东科达机电股份有限公司 | Planetary profile polishing grinding head |
CN101708592A (en) * | 2009-11-05 | 2010-05-19 | 浙江工业大学 | Base disc used for suspension polishing |
CN203317206U (en) * | 2013-06-18 | 2013-12-04 | 浙江工业大学 | Dynamic pressure floating separation position precise adjusting mechanism for dynamic pressure floating separation polishing disk |
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Publication number | Publication date |
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CN103317438A (en) | 2013-09-25 |
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TR01 | Transfer of patent right |
Effective date of registration: 20191225 Address after: 314200 inner northeast building, 4880 Pingshan Avenue, Pinghu Economic Development Zone, Jiaxing City, Zhejiang Province Patentee after: Pinghu Lianxiang Electroplating Technology Co.,Ltd. Address before: 510000 unit 2414-2416, building, No. five, No. 371, Tianhe District, Guangdong, China Patentee before: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Effective date of registration: 20191225 Address after: 510000 unit 2414-2416, building, No. five, No. 371, Tianhe District, Guangdong, China Patentee after: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Address before: The city Zhaohui six districts Chao Wang Road Hangzhou City, Zhejiang province 310014 18 Patentee before: Zhejiang University of Technology |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150819 Termination date: 20200618 |