CN103305883A - Cleaning process of coating surface of electronic device - Google Patents

Cleaning process of coating surface of electronic device Download PDF

Info

Publication number
CN103305883A
CN103305883A CN2013101655434A CN201310165543A CN103305883A CN 103305883 A CN103305883 A CN 103305883A CN 2013101655434 A CN2013101655434 A CN 2013101655434A CN 201310165543 A CN201310165543 A CN 201310165543A CN 103305883 A CN103305883 A CN 103305883A
Authority
CN
China
Prior art keywords
minutes
rinsing
washing
water
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2013101655434A
Other languages
Chinese (zh)
Inventor
邓波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUZHOU YIGUANG FILM TECHNOLOGY Co Ltd
Original Assignee
SUZHOU YIGUANG FILM TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUZHOU YIGUANG FILM TECHNOLOGY Co Ltd filed Critical SUZHOU YIGUANG FILM TECHNOLOGY Co Ltd
Priority to CN2013101655434A priority Critical patent/CN103305883A/en
Publication of CN103305883A publication Critical patent/CN103305883A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

The invention discloses a cleaning process of a coating surface of an electronic device. The cleaning process is characterized by comprising the steps of: (1) degreasing: adding 10% an industrial detergent into water, and ultrasonic cleaning for 20 minutes; (2) washing (tap water), and rinsing for 5 minutes; (3) drying; (4) sandblasting to remove an oxidation film: spraying clean quartz sand on the surface of a workpiece; (5) degreasing: adding 10% the industrial detergent into the water, and ultrasonic cleaning for 20 minutes; (6) primary washing (tap water), and ultrasonic rinsing for 2 minutes; (7) secondary washing (purified water), and ultrasonic rinsing for 2 minutes; (8) tertiary washing (purified water), and rinsing for 2 minutes; (9) drying at 120 DEG C; (10) washing (deionized water), and rinsing for 1 minute; (11) drying at 150 DEG C; and (12) linear ion source irradiation in a vacuum container: lasting for 5 minutes, with the air pressure being 0.5Pa, the ion source voltage being 1500V, and the bias voltage being 600V. The cleaning process has the advantage of high environmental protection property, and is beneficial to the improvement of the binding force between a subsequent coating and a substrate.

Description

A kind of cleaning of electron device coated surface
Technical field
The present invention relates to the manufacture field of electron device, particularly a kind of for communication, radar, electronic applications passive RF and the cleaning of microwave filter, duplexer coated surface.
Background technology
Passive RF is widely used in microwave filter, duplexer and communicates by letter, radar, electronic applications, is one of components and parts very crucial in the wireless telecommunication system.This class device all is take aluminium as matrix at present, and the certain thickness copper of its electroplating surface and silver satisfy service requirements to improve its surface conductivity.Because aluminium is comparatively active metal, workpiece all can be looked unfamiliar into the thin or thick very fine and close pellumina of one deck in its change before plating.
In electroplating technology, need workpiece is carried out oil removing before the plated film, the deoxidation film is processed.General method is the alkali cleaning oil removing at present, and strong acid is removed its surface film oxide.The use of strong acid has not only increased cost, the most important thing is to cause serious environmental pollution, and the dilution discharge of strong acid has also caused havoc to water and soil.
Summary of the invention
The present invention the invention provides a kind of cleaning of electron device coated surface in order to address the above problem.
As preferably, described electron device is wave filter or duplexer.
As preferably, described electron device is passive RF and microwave filter or duplexer.
As preferably, described electron device coated surface is aluminum substrate.
Cleaning provided by the invention comprises following steps:
(1). oil removing: water adds 10% industrial cleaning solution, ultrasonic cleaning 20 minutes;
(2). washing (tap water), rinsing 5 minutes;
(3). oven dry;
(4). the sandblast oxide film dissolving: clean quartz sand sprays workpiece surface;
(5). oil removing: water+10% industrial cleaning solution, ultrasonic cleaning 20 minutes;
(6). first washing (tap water), ultrasonic rinsing 2 minutes;
(7). second washing (pure water), ultrasonic rinsing 2 minutes;
(8). the 3rd road washing (pure water), rinsing 2 minutes;
(9) .120 ℃ of oven dry;
(10). washing (deionized water), rinsing 1 minute;
(11) .150 ℃ of oven dry;
(12). linear ion source irradiation in the vacuum vessel: air pressure 0.5Pa, ion source voltage 1500V, bias voltage 600V, 5 minutes time.
The invention beneficial effect:
Purpose of the present invention and distinguishing feature are:
At first, utilize industrial detergent to replace alkali cleaning to remove greasy dirt and other dirt settlings on aluminum products surface.Reduce alkali lye to the pollution of environment.
Secondly, utilize the method for machinery to replace pickling to remove the comparatively thick close oxide film in aluminum products surface, thoroughly get rid of acid solution to the pollution of environment.
Moreover, utilize high energy argon particle that workpiece surface is bombarded, can effectively remove remained on surface impurity and thinner oxide compound, and form the concavo-convex of microcosmic on its surface, be conducive to improve subsequent plating layer and basal body binding force.

Claims (3)

1. the cleaning of an electron device coated surface, it is characterized in that comprising following steps: (1) oil removing: water adds 10% industrial cleaning solution, ultrasonic cleaning 20 minutes; (2) washing (tap water), rinsing 5 minutes; (3) oven dry; (4) sandblast oxide film dissolving: clean quartz sand sprays workpiece surface; (5) oil removing: water+10% industrial cleaning solution, ultrasonic cleaning 20 minutes; (6) first washing (tap water), ultrasonic rinsing 2 minutes; (7) second washing (pure water), ultrasonic rinsing 2 minutes; (8) the 3rd roads washings (pure water), rinsing 2 minutes; (9) 120 ℃ of oven dry; (10) washing (deionized water), rinsing 1 minute; (11) 150 ℃ of oven dry; (12) linear ion source irradiation in the vacuum vessel: air pressure 0.5Pa, ion source voltage 1500V, bias voltage 600V, 5 minutes time.
2. cleaning according to claim 1 is characterized in that described electron device is wave filter or duplexer.
3. cleaning according to claim 1 is characterized in that described electron device is passive RF and microwave filter or duplexer.
CN2013101655434A 2013-05-07 2013-05-07 Cleaning process of coating surface of electronic device Pending CN103305883A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2013101655434A CN103305883A (en) 2013-05-07 2013-05-07 Cleaning process of coating surface of electronic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2013101655434A CN103305883A (en) 2013-05-07 2013-05-07 Cleaning process of coating surface of electronic device

Publications (1)

Publication Number Publication Date
CN103305883A true CN103305883A (en) 2013-09-18

Family

ID=49131589

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2013101655434A Pending CN103305883A (en) 2013-05-07 2013-05-07 Cleaning process of coating surface of electronic device

Country Status (1)

Country Link
CN (1) CN103305883A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114618839A (en) * 2022-03-18 2022-06-14 东风汽车股份有限公司 Cleaning method and cleaning system for aluminum pipe of automobile air conditioner

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1858296A (en) * 2006-06-08 2006-11-08 哈尔滨工业大学 Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition
CN101498013A (en) * 2009-01-07 2009-08-05 嘉兴中科亚美合金技术有限责任公司 Sulfamic acid nickel plating solution and method
CN101962746A (en) * 2010-10-08 2011-02-02 中国航空工业集团公司北京航空制造工程研究所 Method for preparing high-adhesion Ta/TaN laminated film on surface of metal part
CN102465270A (en) * 2010-11-12 2012-05-23 北大方正集团有限公司 Conducting film, preparation device thereof and preparation method thereof
CN102800871A (en) * 2012-08-14 2012-11-28 上海交通大学 Fuel cell metal bipolar plate carbon chromium gradient coating and preparation method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1858296A (en) * 2006-06-08 2006-11-08 哈尔滨工业大学 Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition
CN101498013A (en) * 2009-01-07 2009-08-05 嘉兴中科亚美合金技术有限责任公司 Sulfamic acid nickel plating solution and method
CN101962746A (en) * 2010-10-08 2011-02-02 中国航空工业集团公司北京航空制造工程研究所 Method for preparing high-adhesion Ta/TaN laminated film on surface of metal part
CN102465270A (en) * 2010-11-12 2012-05-23 北大方正集团有限公司 Conducting film, preparation device thereof and preparation method thereof
CN102800871A (en) * 2012-08-14 2012-11-28 上海交通大学 Fuel cell metal bipolar plate carbon chromium gradient coating and preparation method

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
庞明: "《物联网条码技术与射频识别技术》", 31 May 2011, 中国物资出版社 *
陈三斌: "《180种实用化工产品配方与制造》", 31 December 2002, 金盾出版社 *
陈治良: "《电泳涂装实用技术》", 30 September 2009, 上海科学技术出版社 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114618839A (en) * 2022-03-18 2022-06-14 东风汽车股份有限公司 Cleaning method and cleaning system for aluminum pipe of automobile air conditioner

Similar Documents

Publication Publication Date Title
CN103334079A (en) Coating process of electronic device
CN105256342B (en) A kind of super hydrophobic surface based on copper and preparation method thereof
CN110670083A (en) Target cleaning method
CN105002564A (en) Environment-friendly sapphire film deplating solution and using method thereof
CN1970844A (en) Aluminium basis material surface treatment method
JPH11323571A (en) Surface treated magnesium or magnesium alloy product, primary treatment for coating and coating method
CN103305883A (en) Cleaning process of coating surface of electronic device
CN106048543B (en) Semiconductor wafer surface technique for vacuum coating
CN105951109A (en) Rust remover
CN105478321A (en) Surface rust prevention pretreatment solution for metal casting
CN113403671A (en) Metal alloy surface micro-arc cleaning method and application
CN102965626B (en) Nickel plating method of powder metallurgy porous material
CN108866547A (en) A kind of neodymium iron boron magnetic body electric spark on surface enhanced processing method based on laser cleaning
CN100484666C (en) Nd-Fe-B magnet inorganic sealing hole adhesion and cathode electrophoresis composite surface protection technique
JP2011214078A (en) Metal mask and metal mask washing method
WO2024040671A1 (en) Ito etching solution and usage method thereof
CN103266303A (en) Electronic device adopting magnetron sputtering to plate film, and manufacturing method thereof
CN111009713A (en) Surface treatment method of microwave dielectric ceramic filter
CN103730348B (en) A kind of method reducing plasma etching machine cavity pollution in dorsal pore technique
CN104164684A (en) Method for plating nickel on surface of oxygen-free copper
US20180216225A1 (en) Exfoliation process for removal of deposited materials from masks carriers, and deposition tool components
KR20160141148A (en) Apparatus of forming a film and cleaning method thereof
CN205111604U (en) Sand blasting jig
CN205110309U (en) Semiconductor device part clean bench
CN108529899B (en) Chemical method for etching glass surface film

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
DD01 Delivery of document by public notice

Addressee: Suzhou Yiguang Film Technology Co., Ltd.

Document name: Notification of Patent Invention Entering into Substantive Examination Stage

WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20130918

WD01 Invention patent application deemed withdrawn after publication