CN103285719B - A kind of Low Temperature Plasma Treating is containing the method for the gas of chlorohydrocarbon - Google Patents

A kind of Low Temperature Plasma Treating is containing the method for the gas of chlorohydrocarbon Download PDF

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Publication number
CN103285719B
CN103285719B CN201310198360.2A CN201310198360A CN103285719B CN 103285719 B CN103285719 B CN 103285719B CN 201310198360 A CN201310198360 A CN 201310198360A CN 103285719 B CN103285719 B CN 103285719B
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waste gas
chlorohydrocarbon
low
temperature plasma
unit
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CN103285719A (en
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曾小岚
高倩
朱天乐
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Beihang University
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Beihang University
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Abstract

The invention discloses the method for a kind of Low Temperature Plasma Treating containing the gas of chlorohydrocarbon, belong to technical field of waste gas treatment.Described method concrete steps are, containing chlorohydrocarbon waste gas under air-introduced machine effect, through the oxidation of low-temperature plasma body unit, are discharged in air after up to standard; Or under air-introduced machine effect, successively through the oxidation of low-temperature plasma body unit and activated carbon adsorption unit absorption, last qualified discharge is in air.The method of low concentration chlorohydrocarbon industrial waste gas or room air pollution effectively can be removed under the invention provides a kind of normal temperature and pressure.The method has reaction condition gentleness, flow process is short, technique is simple, the advantage of easy and simple to handle, small investment, economical and efficient.

Description

A kind of Low Temperature Plasma Treating is containing the method for the gas of chlorohydrocarbon
Technical field
The present invention relates to a kind of processing method containing chlorohydrocarbon industrial waste gas and room air, particularly relate to a kind of employing lower temperature plasma technology, purified treatment contains the method for chlorohydrocarbon industrial waste gas and room air.
Background technology
Chlorohydrocarbon, as a kind of important organic solvent, industrial chemicals and intermediate, is widely used in the industries such as chemical industry, medicine, agricultural chemicals, process hides, produces the products such as plastics, pesticide and cold-producing medium.But, in production and use procedure, chlorohydrocarbon organic exhaust gas can be caused to produce, also chlorohydrocarbon can be made to enter indoor environment, not only persistence, the impact of accumulation property are caused on health and the ecosystem, but also can damage the ozone layer, therefore the improvement of chlorohydrocarbon industrial waste gas and room air has caused the concern of international community.In recent years, China is by administrative legislation and scientific research, certain effect has been achieved in harmful gaseous pollutant catabolic gene, but still can not meet there is diversity, the industrial chlorohydrocarbon waste gas of feature and the technical need of pollution control of indoor air such as compound, in the urgent need to research and develop applicable China's national situation and have independent intellectual property right containing chloro appropriate hydrocarbon gas purification treatment technology method.
In prior art, to high concentration chlorohydrocarbon industrial waste gas, usually adopt the methods such as condensation, absorption and sorption, biodegradation, burning and catalytic oxidation to process, to the low concentration chlorohydrocarbon that room air contains, the main method of absorption that adopts processes.As everyone knows, condensation, absorption and absorption for not volatile high boiling point organic compound, not only effectively but also can resource reclaim be realized.But for volatile chlorohydrocarbon, its advantage is restricted.The operation stability of biological degradation method is poor, once system goes to pot, its recovery time is longer, and operation and management expense is huge.Combustion method due to ignition temperature high, its reactor need select exotic material.Direct combustion method is easily blasted in combustion, and wastes heat energy, current less employing.Flame combustion method reclaims heat energy by heat exchanger, reduces ignition temperature, but when chlorohydrocarbon exhaust gas concentration is lower, manually need add auxiliary fuel, to maintain normal ignition temperature, thus increases operating cost.Catalytic oxidation is applied more owing to having the advantages such as initiation temperature is low, energy-conservation, purifying rate is high, floor space is few, but is only applicable to the chlorohydrocarbon exhaust-gas treatment of higher concentration.
Lower temperature plasma technology, as a kind of emerging waste gas pollution control and treatment technology, is specially adapted to the removal of low concentration gas.Compared with said method, low-temperature plasma body method has the advantage such as reaction condition gentleness (normal temperature and pressure), (having the wider scope of application to gas componant, flow velocity and concentration) applied widely, economical and efficient.20 century 70s start the low temperature plasma flue gas managing technique occurred, are low temperature plasma application the earliest in gaseous contaminant improvement.But the research of application of cold temperature plasma method process chlorohydrocarbon industrial waste gas and room air is rarely seen.Therefore, under developing a kind of atmospheric pressure at room condition, employing lower temperature plasma technology efficiently removes the chlorinated hydrocarbon contaminants in air, and the method effectively controlling unexpected product withdraw has very strong scientific meaning and practical value.
Summary of the invention
The present invention is directed to the chlorohydrocarbon industrial waste gas or room air that produce in the industry such as chemical industry, pharmacy, aiming to provide under a kind of normal temperature and pressure conditions can the method for economical and effective degraded low concentration chlorohydrocarbon.
For achieving the above object, the technical solution adopted in the present invention is:
Low Temperature Plasma Treating is containing a method for the gas of chlorohydrocarbon, and described method concrete steps are, containing chlorohydrocarbon waste gas under air-introduced machine effect, through the oxidation of low-temperature plasma body unit, is discharged in air after up to standard; Or under air-introduced machine effect, successively through the oxidation of low-temperature plasma body unit and activated carbon adsorption unit absorption, last qualified discharge is in air.
Activated carbon adsorption unit adsorption treatment can be entered in turn via waste gas after low-temperature plasma body unit oxidation processes, also can directly discharge, chlorohydrocarbon kind and concentration in Main Basis waste gas.Only sometimes processing requirements can not be met by plasma degradation for difficult degradation, high concentration chlorohydrocarbon waste gas, therefore need through activated carbon adsorption unit purified treatment, and the situation of processing requirements can be met for simple plasma degradation, can without activated carbon adsorption unit.
Described low-temperature plasma body unit is made up of some plasma reactors, can realize connected in series or in parallel between these plasma reactors, therefore according to the kind of chlorohydrocarbon, concentration and connection in series-parallel combination can be carried out to realize optimization process effect containing chloro hydrocarbon gas flow amount.As for difficult degradation or high concentration chlorohydrocarbon gas can by as described in plasma reactor carry out connecting the time ensureing sufficient stop, then parallel connection is carried out for appropriate hydrocarbon gas for easily degraded or low-level chlorinated, improves adsorption cleaning efficiency.
Described plasma reactor comprises the reactor shell (metallic cathode) of tubular, bar-shaped metal anode, and is provided with two silicon rubber cappings of air inlet or gas outlet.Plasma reactor housing two ends are by silicon rubber lidstock, bar-shaped metal anode and reactor shell is coaxial is placed in reactor shell, and stretch out outside reactor shell through silicon rubber capping, metal anode is connected with DC high-voltage power supply positive pole, and metallic cathode is connected or ground connection with DC high-voltage power supply negative pole.
Described activated carbon adsorption unit is made up of two charcoal absorption bins in parallel, and after the absorption of one of them active carbon bin is saturated, door is closed, and waste gas enters another active carbon bin adsorption cleaning.Continuous processing requirements can be ensured thus.
Compared with prior art, good effect of the present invention is:
The method of low concentration chlorohydrocarbon industrial waste gas or room air pollution effectively can be removed under the invention provides a kind of normal temperature and pressure.The method has reaction condition gentleness, flow process is short, technique is simple, the advantage of easy and simple to handle, small investment, economical and efficient.
Accompanying drawing explanation
Fig. 1 is the flow chart of a kind of Low Temperature Plasma Treating provided by the invention containing the method for the gas of chlorohydrocarbon.
Fig. 2 is plasma reactor structural representation in the present invention.
In figure:
1-reactor shell (metallic cathode); 2-metal anode; The capping of 3-silicon rubber; 4-air inlet; 5-gas outlet.
Detailed description of the invention
Further illustrate the present invention below by embodiment, but the present invention is not by the restriction of embodiment.
The invention provides the method for a kind of Low Temperature Plasma Treating containing the gas of chlorohydrocarbon, as shown in Figure 1, described method concrete steps are:
Collect containing chlorohydrocarbon waste gas, make containing chlorohydrocarbon waste gas under air-introduced machine effect, successively through the oxidation of low-temperature plasma body unit and activated charcoal unit absorption, then discharge; Or after the oxidation of low-temperature plasma body unit, directly discharge.Concrete condition can be selected according to chlorohydrocarbon kind and concentration in waste gas.Generally, difficult degradation, high concentration chlorohydrocarbon waste gas are only degraded by low-temperature plasma body unit and sometimes can not meet processing requirements, therefore need to proceed purified treatment through activated carbon adsorption unit, and the situation of processing requirements can be met for the oxidative degradation of simple low-temperature plasma body unit, can without activated carbon adsorption unit.
Described low-temperature plasma body unit is made up of some plasma reactors, can realize connected in series or in parallel between these plasma reactors, therefore according to the kind of chlorohydrocarbon, concentration and connection in series-parallel combination can be carried out to realize optimization process effect containing chloro hydrocarbon gas flow amount.As for difficult degradation or high concentration chlorohydrocarbon gas can by as described in plasma reactor carry out connecting the time ensureing sufficient stop, then parallel connection is carried out for appropriate hydrocarbon gas for easily degraded or low-level chlorinated, improves adsorption cleaning efficiency.
As shown in Figure 2, described plasma reactor comprises the reactor shell 1(metallic cathode of tubular), bar-shaped metal anode 2, and two the silicon rubber cappings 3 being provided with air inlet 4 or gas outlet 5.Described reactor shell 1 two ends are sealed by silicon rubber capping 3, one of them silicon rubber capping 3 arranges air inlet 4, another rubber seal 3 sets out gas port 5, bar-shaped metal anode 2 is coaxial and be placed in reactor shell 1 with reactor shell 1, and the two ends of metal anode 2 are exposed outside reactor shell 1 through silicon rubber capping 3, metal anode 2 is connected with DC high-voltage power supply positive pole, and reactor shell 1 is connected or ground connection with DC high-voltage power supply negative pole as metallic cathode.
Described activated carbon adsorption unit is made up of two charcoal absorption bins in parallel, alternation, and after the absorption of one of them active carbon bin is saturated, door is closed, and waste gas enters another active carbon bin adsorption cleaning.Continuous processing requirements can be ensured thus.
embodiment 1
Plasma reactor in low-temperature plasma body unit is in parallel, and low-temperature plasma body unit is connected activated carbon adsorption unit, waste gas containing chlorohydrocarbon enters plasma reactor via air-introduced machine, open high voltage source and regulate applied voltage, fixing Implantation Energy is 100J/L, for the waste gas containing chloromethanes, vinyl chloride, carbon tetrachloride, when its initial concentration is 100mg/m 3, exhaust gas flow is 100L/min, and when waste gas humidity is 20%, after two-step purification cell processing, each chlorohydrocarbon clearance all can reach more than 98%.
embodiment 2
Plasma reactor in low-temperature plasma body unit is in parallel, and low-temperature plasma body unit is connected activated carbon adsorption unit, waste gas enters plasma reactor via air-introduced machine, open high voltage source and regulate applied voltage, fixing Implantation Energy is 100J/L, for the waste gas containing chloromethanes, vinyl chloride, carbon tetrachloride, when its initial concentration is 500mg/m 3, exhaust gas flow is 150L/min, and when waste gas humidity is 20%, after two-stage unit purified treatment, in waste gas, the clearance of each chlorohydrocarbon can reach 95%.Under the same terms, regulate high voltage source applied voltage, raising Implantation Energy is 150J/L, and the clearance of each chlorohydrocarbon can reach more than 98%.
embodiment 3
In low-temperature plasma body unit, plasma reactor is in parallel, and low-temperature plasma body unit is connected activated carbon adsorption unit, waste gas enters plasma reactor via air-introduced machine, open high voltage source and also regulate applied voltage, fixing Implantation Energy is 100J/L, for containing chloromethanes, vinyl chloride, carbon tetrachloride, chloroform, 1,1,1-trichloroethanes, the waste gas of 4-chlorophenol, when its initial concentration is 1000mg/m 3, exhaust gas flow is 150L/min, and when waste gas humidity is 20%, after two-stage unit purified treatment, in waste gas, the clearance of each chlorohydrocarbon is 90%.Under the same terms, only change the connected mode in low-temperature plasma body unit between reactor, by the plasma reactor series connection of four in this unit, after two-stage unit purified treatment, the clearance of each chlorohydrocarbon can reach more than 98%.
embodiment 4
Four plasma reactor series connection in low-temperature plasma body unit, waste gas enters plasma reactor via air-introduced machine, open high voltage source and regulate applied voltage, fixing Implantation Energy is 100J/L, for containing chloromethanes, vinyl chloride, carbon tetrachloride, chloroform, 1,1,1-trichloroethanes, the waste gas of 4-chlorophenol, when its initial concentration is 1000mg/m 3, exhaust gas flow is 30L/min, and when waste gas humidity is 40%, only via after the process of low temperature plasma purification unit, in waste gas, the clearance of each chlorohydrocarbon can reach 98%.
embodiment 5
Plasma reactor in low-temperature plasma body unit is in parallel, waste gas enters plasma reactor via air-introduced machine, open high voltage source and regulate applied voltage, fixing Implantation Energy is 2J/L, for containing chloromethanes, vinyl chloride, carbon tetrachloride, chloroform, 1,1,1-trichloroethanes, the room air of 4-chlorophenol, when its initial concentration is 1mg/m 3, exhaust gas flow is 80L/min, and when waste gas humidity is 40%, only via after the process of low temperature plasma purification unit, in waste gas, the clearance of each chlorohydrocarbon is 86%.Under the same terms, by two plasma reactor series connection in low-temperature plasma body unit, after this purification unit process, the removal chlorine of each chlorohydrocarbon can reach 98%.
embodiment 6
Plasma reactor in low-temperature plasma body unit is in parallel, and low-temperature plasma body unit is connected activated carbon adsorption unit, waste gas enters plasma reactor via air-introduced machine, open high voltage source and also regulate applied voltage, fixing Implantation Energy is 2J/L, for containing chloromethanes, vinyl chloride, carbon tetrachloride, chloroform, 1,1,1-trichloroethanes, the room air of 4-chlorophenol, when its initial concentration is 3mg/m 3, exhaust gas flow is 80L/min, and when waste gas humidity is 40%, after two-stage unit purified treatment, in waste gas, the clearance of each chlorohydrocarbon can reach 95%.Under the same terms, regulate high voltage source applied voltage, raising Implantation Energy is 3J/L, and the clearance of each chlorohydrocarbon can reach more than 98%.

Claims (1)

1. Low Temperature Plasma Treating is containing a method for the gas of chlorohydrocarbon, it is characterized in that: the industrial waste gas containing chlorohydrocarbon, under air-introduced machine effect, successively after low-temperature plasma body unit and activated carbon adsorption unit process, and qualified discharge; Described low-temperature plasma body unit is made up of some plasma reactors, connected in series or in parallel between these plasma reactors; Described plasma reactor comprises the reactor shell of tubular, bar-shaped metal anode, and is respectively arranged with two silicon rubber cappings of air inlet or gas outlet; Plasma reactor housing two ends are by silicon rubber lidstock, bar-shaped metal anode and reactor shell is coaxial is placed in reactor shell, and stretch out outside reactor shell through silicon rubber capping, metal anode is connected with DC high-voltage power supply positive pole, and reactor shell is connected or ground connection with DC high-voltage power supply negative pole as metallic cathode; Described activated carbon adsorption unit is made up of two charcoal absorption bins in parallel, alternation, and after the absorption of one of them active carbon bin is saturated, door is closed, and waste gas enters another active carbon bin adsorption cleaning, ensures continuous processing requirements thus;
Fixing Implantation Energy is 100J/L, for the waste gas containing chloromethanes, vinyl chloride, carbon tetrachloride, when its initial concentration is 500mg/m 3, exhaust gas flow is 150L/min, and when waste gas humidity is 20%, in waste gas, the clearance of chlorohydrocarbon can reach 95%; For containing chloromethanes, vinyl chloride, carbon tetrachloride, chloroform, 1,1,1-trichloroethanes, the waste gas of 4-chlorophenol, when its initial concentration is 1000mg/m 3, exhaust gas flow is 150L/min, and when waste gas humidity is 20%, in waste gas, the clearance of chlorohydrocarbon is 90%.
CN201310198360.2A 2013-05-24 2013-05-24 A kind of Low Temperature Plasma Treating is containing the method for the gas of chlorohydrocarbon Expired - Fee Related CN103285719B (en)

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CN104436983B (en) * 2013-09-17 2017-01-25 珠海格力电器股份有限公司 Air purifier and control method thereof
CN103721510A (en) * 2013-12-13 2014-04-16 江苏中科睿赛污染控制工程有限公司 VOCs high-efficiency processing method
CN104084013A (en) * 2014-07-15 2014-10-08 浙江惠尔涂装环保设备有限公司 Low-temperature plasma waste gas treatment pipe
CN105983304A (en) * 2015-11-26 2016-10-05 安徽世界村新材料有限公司 Modularized green packaged treating process for waste rubber regeneration waste gas
CN105833677A (en) * 2016-04-19 2016-08-10 中国石油化工股份有限公司 Method and equipment for treating volatile organic compounds by low-temperature plasma coupling adsorption
CN106621730B (en) * 2016-12-19 2020-02-11 上海环境集团有限公司 Low-temperature flue gas purification method

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CN1277888A (en) * 2000-06-02 2000-12-27 黄立维 Method for purifying organic waste gas
CN101664626A (en) * 2008-09-01 2010-03-10 复旦大学 Method for treating industrial organic waste gases
CN101797476A (en) * 2010-03-12 2010-08-11 东莞市环顺环保器材有限公司 Waste gas treatment device and method based on functions of low-temperature plasma and activated carbon
CN102728193A (en) * 2012-06-15 2012-10-17 西安建筑科技大学 Low temperature plasma integrated purification plant and method for industrial organic waste gas

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1277888A (en) * 2000-06-02 2000-12-27 黄立维 Method for purifying organic waste gas
CN101664626A (en) * 2008-09-01 2010-03-10 复旦大学 Method for treating industrial organic waste gases
CN101797476A (en) * 2010-03-12 2010-08-11 东莞市环顺环保器材有限公司 Waste gas treatment device and method based on functions of low-temperature plasma and activated carbon
CN102728193A (en) * 2012-06-15 2012-10-17 西安建筑科技大学 Low temperature plasma integrated purification plant and method for industrial organic waste gas

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