CN103241784A - Method and device for treating solar battery etching waste system - Google Patents
Method and device for treating solar battery etching waste system Download PDFInfo
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- CN103241784A CN103241784A CN2012100323600A CN201210032360A CN103241784A CN 103241784 A CN103241784 A CN 103241784A CN 2012100323600 A CN2012100323600 A CN 2012100323600A CN 201210032360 A CN201210032360 A CN 201210032360A CN 103241784 A CN103241784 A CN 103241784A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/30—Wastewater or sewage treatment systems using renewable energies
- Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy
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Abstract
The invention relates to a method and device for treating a solar battery etching waste system. The method comprises the steps of volatilizing volatile gas in the waste system and heating residual waste liquor. According to the treatment method and the treatment device, the recycle of a solar battery etching solution can be realized, so that the consumption of the etching solution can be reduced, and the emission of waste liquor and toxic waste gas can be eliminated; and in addition, due to stable etching and processing, the battery efficiency can be improved, further the economic benefits can be increased and the environmental friendliness can be achieved.
Description
Technical field
The present invention relates to technical field of solar batteries.Specifically, the present invention relates to treatment process and the treatment unit of solar cell etching waste systems.
Background technology
In solar cell processing course, can beginning to remove with first etching liquid (HF) and be retained in the silicon oxide on the wafer surface in the doping process and use second etching liquid (HF/HCl) wafer of etching wet processes at last endways at production line in cleaning product line, bathe the wafer that (HF/HCl) comes the etching wet processes to cross and in the making herbs into wool production line, use last processing, generally etching liquid is injected on the wafer or with wafer and immerses in the etching liquid.After the processing for some time of using the HF/HCl etching liquid, produce the etching waste systems, wherein comprise HF, HCl, H
2SiF
6And Si.
Chinese patent 200810187371.X discloses a kind for the treatment of process and used system of this treatment process of crystalline silicon etching waste water.By heating and regulate pressure and the pH value, under vacuum state, this waste water is carried out stripping then in the method, discharge after then the chemical oxygen demand in the waste water (COD) being down to lower level.
Chinese patent application 201010286071.4 discloses a kind of photovoltaic solar cell sheet production wastewater treatment technology, wherein need to carry out pH regulator by adding strong acid or highly basic, then treatment solution is carried out defluorination and/or chemical oxygen consumption step, the waste water that will reach emission standard effluxes.
More than in two patent documentations disclosed treatment process all need to use new chemical substance and complex process.
In the at present used common process, the etching waste systems that produces in the solar cell processing course is not handled, but directly it is drained as refuse.Need constantly change etching liquid like this, and the gas that produces in the etching process does not obtain reclaiming.From aspects such as the utilization of resources and environment protection, common process does not take full advantage of etching liquid, the low and not environmental protection of economic benefit.
Wishing has a kind for the treatment of process, and etching liquid is fully used.
Summary of the invention
Technical problem to be solved by this invention provides a kind of method of handling solar cell etching waste systems, so that etching liquid is fully used.
Technical problem to be solved by this invention can be solved by the following technical programs:
An aspect of of the present present invention relates to the treatment process of solar cell etching waste systems, mainly comprises HF, HCl and H in the described waste systems
2SiF
6, the treating method comprises following steps:
A) make volatile gaseous volatilization in the waste systems, with waste gas and the remaining waste liquid that obtains volatilizing;
B) heat remaining waste liquid, make following reaction wherein takes place:
H
2SiF
6→SiF
4+2HF
SiF
4+3H
2O→H
2SiO
3+4HF
And evaporate the waste gas of all volatile gaseses to obtain evaporating;
C) will be from steps A) volatilization waste gas and from step B) the waste gas of evaporation mix and condensation obtains phlegma; With
D) with step C) phlegma that obtains mixes with water.
The present invention also relates in one aspect to the treatment unit of solar cell etching waste systems, and described waste systems is from the etching apparatus in the solar cell system of processing, and described treatment unit comprises:
With described etching apparatus fluid communication, be used for heating liquid and make the evaporation equipment of gas evaporation;
With the injection device that mixes described evaporation equipment and described etching apparatus fluid communication, that be used for gas; With
Condensing equipment with the preparation of condensation described injection device and described etching apparatus fluid communication, that be used for gas and mixing acid.
The advantage for the treatment of process of the present invention and treatment unit is to realize the recycle of solar cell etching liquid, thereby has reduced the consumption of etching liquid, eliminates the discharging of etching waste liquid and poisonous fume, and owing to making the stable efficient that has improved battery of etching process.
Description of drawings
Fig. 1 is the synoptic diagram of the treatment unit of solar cell etching waste systems of the present invention.
Embodiment
Usually contain HF, HCl, H in solar cell etching waste systems
2SiF
6, Si and/or SiO
2Deng composition.In common process, the etching waste systems is not handled, but directly it is drained as waste material.Cause waste like this, increased cost, also increased burden to environmental treatment simultaneously.
Embodiments more of the present invention relate to the treatment process of solar cell etching waste systems, so that etching liquid is fully used.Treatment process of the present invention comprises the steps:
A) make volatile gaseous volatilization in the waste systems, with waste gas and the remaining waste liquid that obtains volatilizing;
B) heat remaining waste liquid, make following reaction wherein takes place:
H
2SiF
6→SiF
4+2HF
SiF
4+3H
2O→H
2SiO
3+4HF
And evaporate the waste gas of all volatile gaseses to obtain evaporating;
C) will be from steps A) volatilization waste gas and from step B) the waste gas of evaporation mix and condensation obtains phlegma; With
D) with step C) phlegma that obtains mixes with water.
In one embodiment, volatilization described steps A) can be carried out under the condition of vacuumizing.
In one embodiment, described step B) can under the condition of vacuumizing, carry out, its Heating temperature is 40-80 ℃.
Embodiments more of the present invention relate to the treatment unit of solar cell etching waste systems, and described waste systems is from the etching apparatus in the solar cell system of processing, and described treatment unit comprises:
With described etching apparatus fluid communication, be used for heating liquid and make the evaporation equipment of gas evaporation;
With the injection device that mixes described evaporation equipment and described etching apparatus fluid communication, that be used for gas; With
Condensing equipment with the preparation of condensation described injection device and described etching apparatus fluid communication, that be used for gas and mixing acid.
In the present invention, can determine each component concentrations that liquid comprises in the condensing equipment by sampling and testing, also can be by linking to each other to detect each concentration of component with a concentration on-line detecting system.
Thereby, in one embodiment, also be provided with a thief hole on the described condensing equipment, so that the wherein sampling of liquid and the test of each concentration of component.
In one embodiment, described treatment unit also comprises: the concentration on-line detecting system that links to each other with described condensing equipment.
Described concentration on-line detecting system can comprise: with described condensing equipment fluid communication, be used for online acquisition liquid spectroscopic data near infrared grating instrument and link to each other with described near infrared grating instrument, for the concentration determination device that described spectroscopic data analysis is drawn the concentration data of described liquid.
In one embodiment, the spectrophotometer with automatic internal calibration function is set in the described near infrared grating instrument.
In one embodiment, also be provided with a liquid that exports to discharge wherein on the described evaporation equipment.
In one embodiment, also be provided with an entrance on the described condensing equipment with to wherein adding liquid.
In one embodiment, described evaporation equipment passes to mutually with a vacuum pump and reduces the required temperature of evaporation.
In one embodiment, described injection device passes to transferring in the injection device of promotion gas mutually with a vacuum pump.
In one embodiment, described condensing equipment passes to mutually with a vacuum pump and promotes gas to transfer in the condensing equipment.
In the present invention, the HF in the etching apparatus, HCl can partly evaporate in the injection device, and remaining waste liquid decomposes in distiller produces HF, it with liquid in original HF, HCl and water vapor in distiller, be distilled away the arrival injection device.In injection device, mix from the HF of etching apparatus, HCl gas with from HF, HCl and the water vapor of distillation plant, enter condensing equipment then.In condensing equipment, be condensed and absorbed the mix acid liquor that forms HF and HCl by water from the mixed gas of injection device.
Treatment process of the present invention can onlinely be used.
Below in conjunction with accompanying drawing the embodiment of the invention is elaborated, so that the feature and advantage for the treatment of process of the present invention and treatment unit are clearer, but the present invention is not limited to the embodiment that lists herein.
As shown in Figure 1, the synoptic diagram of the treatment unit of solar cell etching waste systems, described waste systems is from the etching apparatus 1 in the solar cell system of processing, and described treatment unit comprises:
Those of ordinary skills are understood that, above-mentioned outlet and entrance also can be used for other purpose, perhaps for other purpose, in all devices other outlet and/or entrance can be set also, for example also be provided with an outlet (not shown) on the evaporation equipment 2 to discharge liquid wherein, can also be provided with an entrance (not shown) on the condensing equipment 4 with to wherein adding liquid, perhaps equipment is openable.
Those of ordinary skills will also be understood that, in order accurately to measure and control the concentration of liquid in the condensing equipment 4, treatment unit of the present invention can also comprise the concentration on-line detecting system (not shown) of condensing equipment 4 fluid communication, perhaps can also be provided with a thief hole on the described condensing equipment, so that the wherein sampling of liquid and the test of each concentration of component.
Described concentration on-line detecting system comprises: with described condensing equipment fluid communication, be used for online acquisition liquid spectroscopic data near infrared grating instrument and link to each other with described near infrared grating instrument, for the concentration determination device that described spectroscopic data analysis is drawn the concentration data of described liquid.
In the described near infrared grating instrument spectrophotometer with automatic internal calibration function can be set.
Being example with the etching liquid that comprises HF and HCl below describes treatment process and the treatment unit of etching waste systems of the present invention.
In etching apparatus 1, etching liquid comprises HF, HCl, H after for a long time silicon chip of solar cell being handled in the waste systems
2SiF
6, water and Si and SiO
2
At first, volatile gas HF and HCl evaporate into from etching apparatus 1 in the injection device 3 through first outlet, 12, second entrance 31 by the first valve a, and remaining waste liquid enters evaporation equipment 2 through second outlet, 13, second entrance 21 from etching apparatus 1 by the first pump A and the second valve b.
In distillation plant 2, following reaction takes place in remaining waste liquid (40-80 ℃) under heat effect:
H
2SiF
6→SiF
4+2HF
SiF
4+3H
2O→H
2SiO
3+4HF
And wherein forming HF and originally may be also residual HF and HCl and water vapor is evaporated in the injection device 3 through the 3rd outlet the 22 and the 3rd entrance 31 by the 3rd valve c.
In injection device 3, all HF that come in from the 3rd entrance 31 and the 4th entrance 32 and HCl and water vapor fully mix the formation mixed gas.Mixed gas enters in the condensing equipment 4 through the 4th outlet 33 and second gas inlet 41 by the 4th valve d afterwards.
In condensing equipment 4, mixed gas is condensed into liquid and mixes formation HF and HCl mix acid liquor with water, and this mix acid liquor can temporarily be stored in the condensing equipment and enter in the etching apparatus 1 in order to using through the 5th outlet 42, first entrance 11 by the 5th valve e and the second pump B when needs use.
Be understood that, evaporation equipment 2 can pass to the reduction evaporation mutually with a vacuum pump and react required temperature, injection device 3 can pass to transferring in the injection device 3 of promotion gas mutually with a vacuum pump (not shown), and condensing equipment 4 can pass to mutually with a vacuum pump (not shown) and promote gas to transfer in the condensing equipment 4.
Those of ordinary skills should be appreciated that, can be according to actual needs adjust the concentration of HCl in the etching liquid and/or HF by the fresh etching liquid of other adding proper concn.The method that adds fresh etching liquid is apparent for those of ordinary skills, does not repeat them here.
Above embodiment has mainly illustrated treatment unit and the treatment process of solar cell etching waste systems of the present invention.Those of ordinary skills should understand, and the present invention can be in not departing from its purport and scope implements with many other forms.Therefore, described embodiment and embodiment are regarded as illustrative and not restrictive, under situation about not breaking away from as the defined spirit of the present invention of appended each claim and scope, the present invention can be contained all these class equivalent modifications and the replacements in the claim scope.
Claims (11)
1. the treatment process of a solar cell etching waste systems mainly comprises HF, HCl, H in the described waste systems
2SiF
6And water, it is characterized in that, the treating method comprises following steps:
A) make volatile gaseous volatilization in the waste systems, with waste gas and the remaining waste liquid that obtains volatilizing;
B) heat remaining waste liquid, make following reaction wherein takes place:
H
2SiF
6→SiF
4+2HF
SiF
4+3H
2O→H
2SiO
3+4HF
And evaporate the waste gas of all volatile gaseses to obtain evaporating;
C) will be from steps A) volatilization waste gas and from step B) the waste gas of evaporation mix and condensation obtains phlegma; With
D) with step C) phlegma that obtains mixes with water.
2. the described treatment process of claim 1 is characterized in that, described steps A) in volatilization under the condition of vacuumizing, carry out.
3. claim 1 or 2 described treatment processs is characterized in that described step B) be reflected under the condition of vacuumizing and carry out, its Heating temperature is 40-80 ℃.
4. the treatment unit of a solar cell etching waste systems, described waste systems is characterized in that from the etching apparatus in the solar cell system of processing described treatment unit comprises:
With described etching apparatus fluid communication, be used for heating liquid and make the evaporation equipment of gas evaporation;
With the injection device that mixes described evaporation equipment and described etching apparatus fluid communication, that be used for gas; With
Condensing equipment with the preparation of condensation described injection device and described etching apparatus fluid communication, that be used for gas and mixing acid.
5. the described treatment unit of claim 4 is characterized in that, described treatment unit also comprises: the concentration on-line detecting system that links to each other with described condensing equipment.
6. treatment unit according to claim 5, it is characterized in that described concentration on-line detecting system comprises: with described condensing equipment fluid communication, be used for online acquisition liquid spectroscopic data near infrared grating instrument and link to each other with described near infrared grating instrument, for the concentration determination device that described spectroscopic data analysis is drawn the concentration data of described liquid.
7. treatment unit according to claim 6 is characterized in that, the spectrophotometer with automatic internal calibration function is set in the described near infrared grating instrument.
8. the described treatment unit of claim 4 is characterized in that, also is provided with a thief hole on the described condensing equipment, so that the wherein sampling of liquid and the test of each concentration of component.
9. each described treatment unit among the claim 4-8 is characterized in that, described injection device passes to mutually with a vacuum pump and promotes gas to transfer in the injection device.
10. each described treatment unit among the claim 4-8 is characterized in that, described condensing equipment passes to mutually with a vacuum pump and promotes gas to transfer in the described condensing equipment.
11. each described treatment unit is characterized in that among the claim 4-8, described evaporation equipment passes to mutually with a vacuum pump and reduces the required temperature of evaporation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100323600A CN103241784A (en) | 2012-02-14 | 2012-02-14 | Method and device for treating solar battery etching waste system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100323600A CN103241784A (en) | 2012-02-14 | 2012-02-14 | Method and device for treating solar battery etching waste system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103241784A true CN103241784A (en) | 2013-08-14 |
Family
ID=48921697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012100323600A Pending CN103241784A (en) | 2012-02-14 | 2012-02-14 | Method and device for treating solar battery etching waste system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106277085A (en) * | 2016-08-09 | 2017-01-04 | 广州博芳环保科技股份有限公司 | A kind of method utilizing aluminium section bar plant sludge to prepare aluminium polychlorid |
| CN115558930A (en) * | 2022-10-21 | 2023-01-03 | 深圳市捷晶科技股份有限公司 | Etching waste liquid recovery system, control method and storage medium |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0723038A1 (en) * | 1995-01-24 | 1996-07-24 | Zircotube | Process and apparatus for regenerating a used etching solution for zirconium alloys |
| CN202558661U (en) * | 2012-02-14 | 2012-11-28 | 库特勒自动化系统(苏州)有限公司 | Processing device for solar cell etching waste system |
| CN103215593A (en) * | 2012-01-19 | 2013-07-24 | 库特勒自动化系统(苏州)有限公司 | Recovery system and recovery method for treatment of acid etching waste system |
-
2012
- 2012-02-14 CN CN2012100323600A patent/CN103241784A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0723038A1 (en) * | 1995-01-24 | 1996-07-24 | Zircotube | Process and apparatus for regenerating a used etching solution for zirconium alloys |
| CN103215593A (en) * | 2012-01-19 | 2013-07-24 | 库特勒自动化系统(苏州)有限公司 | Recovery system and recovery method for treatment of acid etching waste system |
| CN202558661U (en) * | 2012-02-14 | 2012-11-28 | 库特勒自动化系统(苏州)有限公司 | Processing device for solar cell etching waste system |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106277085A (en) * | 2016-08-09 | 2017-01-04 | 广州博芳环保科技股份有限公司 | A kind of method utilizing aluminium section bar plant sludge to prepare aluminium polychlorid |
| CN115558930A (en) * | 2022-10-21 | 2023-01-03 | 深圳市捷晶科技股份有限公司 | Etching waste liquid recovery system, control method and storage medium |
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Application publication date: 20130814 |