CN103184412A - Cleaning equipment for vacuum coating machine - Google Patents
Cleaning equipment for vacuum coating machine Download PDFInfo
- Publication number
- CN103184412A CN103184412A CN2011104441917A CN201110444191A CN103184412A CN 103184412 A CN103184412 A CN 103184412A CN 2011104441917 A CN2011104441917 A CN 2011104441917A CN 201110444191 A CN201110444191 A CN 201110444191A CN 103184412 A CN103184412 A CN 103184412A
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- Prior art keywords
- liquid
- cleaning equipment
- vacuum plating
- returning tube
- valve
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- Cleaning In General (AREA)
Abstract
The invention discloses cleaning equipment for a vacuum coating machine, which is used for cleaning a cooling pipeline in the components of the vacuum coating machine. The cleaning equipment comprises a liquid storage device, wherein the liquid storage device comprises a liquid storage cavity, a liquid outlet tube and a liquid return tube; a plurality of liquid outlet branch tubes are arranged on the liquid outlet tube and the liquid return tube respectively; a plurality of liquid return branch tubes are arranged on the liquid return tube; the liquid outlet branch tubes are communicated with one end of the cooling pipeline in the vacuum coating machine; the liquid return tube is communicated with the other end of the cooling pipeline; and one end of the liquid storage device is connected with a high-pressure air pump. With the adoption of the cleaning equipment disclosed by the invention, the problem of bad cooling effect for a coating chamber, of the traditional cleaning equipment for a vacuum coating machine is overcome; and moreover, the machining cost is low.
Description
[technical field]
The present invention relates to a kind of vacuum plating unit cleaning equipment, relate in particular to a kind of equipment that cooling line in the vacuum plating unit cleaning machine parts is cleaned.
[background technology]
Physical vapor deposition (Physical Vapor Deposition is called for short PVD) is a kind of technology of utilizing physics mode deposit film on base material.The cooling system of Pvd equipment mainly acts on and is the cooling apparatus component, as the vacuum pump group, and oil diffusion pump, reaction chamber wall, target source etc.In order to realize the cooling performance to equipment integral body, present PVD equipment generally adopts the flow channel type cooling, generally, and to the parts of needs cooling, for parts the consideration of corrosion proof function need be arranged, this base part adopts stainless steel or other to have than the strong corrosion resistant materials with function usually.The frozen water machine pumps into the above-mentioned spare part that needs cooling with cooled water, and cooling is by finally being back in the frozen water machine by corresponding pipeline, realize one cooling water circulation.But in actual production process, owing to used cooling water quality etc. and other as can be known reason not, above-mentioned as reacting outdoor wall, diffusion pump outer wall cooling water pipeline produces the dirt deposited phenomenon in the parts such as especially serious is target source, and more common situation is, the yellow suspension thing disperse that the corrosion back produces is in water coolant, and enter above-mentioned all parts that need cool off and being deposited on gradually wherein with water coolant, and cause effective cooling water flow to descend, influence cooling performance.To being deposited on the above-mentioned corrosion thing among diffusion pump outer wall cooling duct and the reaction chamber liquid storage cavity, the way of taking usually is the target source to be disassembled carry out great purge and maintenance, and this will expend more human cost, and cause idle cost easily.
[summary of the invention]
In view of this, the invention provides a kind of vacuum plating unit cleaning equipment simple in structure, easy to use.
A kind of vacuum plating unit cleaning equipment, be used for vacuum plating unit parts cooling line is cleaned, the vacuum plating unit cleaning equipment comprises device for storing liquid, this device for storing liquid comprises liquid storage cavity, drain pipe and liquid returning tube, some fluid arms are set respectively on this drain pipe and the liquid returning tube, this liquid returning tube is provided with the liquid arm some times, this fluid arm establishes with vacuum plating that cooling line one end is communicated with in the machine, this liquid returning tube is communicated with the other end of cooling line, and an end of this device for storing liquid is connected with high-pressure pump.
Compared with prior art, cleaning vacuum plating unit cooling line cleaning equipment provided by the invention can effectively be removed the corrosion thing that deposits in the cooling line of vacuum plating unit parts, can obviously shorten the corrective maintenance cycle and reduce cost of upkeep, save time cost and human cost.
Description of drawings
Fig. 1 is the overall schematic of vacuum plating unit cleaning equipment of the present invention.
The main element nomenclature
The vacuum plating |
100 |
Device for storing |
10 |
The |
11 |
The |
13 |
|
15 |
|
14 |
|
16 |
The |
141 |
The liquid returning |
161 |
The |
143 |
Return the |
163 |
|
20 |
Following embodiment will further specify the present invention in conjunction with above-mentioned accompanying drawing.
[embodiment]
Referring to Fig. 1, the present invention relates to a kind of vacuum plating unit cleaning equipment 100, it comprises device for storing liquid 10, and this device for storing liquid 10 comprises liquid storage cavity 11, drain pipe 14 and liquid returning tube 16, and an end of this device for storing liquid 10 is connected with high-pressure pump 20.
This device for storing liquid 10 is roughly housing empty in, and its inside is provided with a liquid storage cavity 11, is used for storing cleaning liquid.This cleaning liquid can be weak acid, for example acetic acid or acetin.Be respectively equipped with fluid infusion valve 13 and charging valve 15 at this device for storing liquid 10, this fluid infusion valve 13 can be controlled the liquid storage cavity 11 interior additional clean liquid to device for storing liquid 10.This charging valve 15 is connected with high-pressure pump 20, is used for control and charges into gas in liquid storage cavity 11.
This device for storing liquid 10 also comprises a drain pipe 14 and a liquid returning tube 16, be respectively arranged with drain pipe valve 141 and liquid returning tube valve 161 at the drain pipe 14 of this device for storing liquid 10 and the root of liquid returning tube 16, the liquid storage cavity 11 interior scavenging solutions that this valve is used for control device for storing liquid 10 pass in and out.This drain pipe 14 is provided with some fluid arms 143, and this liquid returning tube 16 is provided with liquid arm 163 some times, in this fluid arm 143 and the vacuum coating film equipment arbitrarily parts (not shown) end to be cleaned be communicated with.This time liquid arm 163 is communicated with the other end of equipment to be cleaned.
Be appreciated that the parts that have cooling line in the vacuum plating unit, can be the parts that target, reaction chamber wall and pump group etc. in the vacuum plating unit are provided with cooling line.
The purging method of the above-mentioned vacuum plating unit cleaning equipment of use of the present invention.Concrete step is as follows:
Described vacuum plating unit cleaning equipment 100 is provided, described vacuum plating unit cleaning equipment 100 is opened, in the liquid storage cavity 11 of this device for storing liquid 10, add every 1m by fluid infusion valve 13
3Acetic acid or the acetin of middle adding 2 to 3Kg, shake up static 5 to 10 minutes of back, drain pipe 14 by this device for storing liquid 10 is provided with some fluid arms 143 and is arranged on some times liquid arms 163 on the liquid returning tube 16, and parts one end any to be cleaned in this fluid arm 143 and the vacuum coating film equipment is communicated with.This time liquid arm 163 is communicated with the other end of equipment to be cleaned.Make this cleaning liquid can be passed into the cooling line of the parts such as target, reaction chamber wall and pump group in the vacuum plating unit.
After finishing above-mentioned steps, charging valve 15 in the device for storing liquid 10 is opened, one end of this device for storing liquid 10 is connected with high-pressure pump 20, open high-pressure pump 20, under the effect of high pressure gas, the fluid arm 143 of cleaning liquid from drain pipe 14 flows into the target the vacuum plating unit at a high speed, in the cooling line of parts such as reaction chamber wall and pump group, this scavenging solution is to being deposited on the cooling water channel inwall, corrosion deposits yields corrosive nature on feature bottom to be cooled or the wall, after it is dissolved gradually, some times liquid arms from the liquid returning tube 16 163 reflux again, flow in the liquid storage cavity 11, although scavenging solution enters in each parts that need cool off with cooling water channel, because of acetic acid acidity a little less than, so it is very little to treat cooling-part corrosion.Repeat this step 2 to 3 times.
By the cleaning of above step, the corrosion fouling product in the vacuum plating unit cooling line can be cleaned out basically.Compare with ordinary method, this method does not need the parts of band cooling are dismantled, and has saved great amount of manpower and time cost.
Claims (4)
1. vacuum plating unit cleaning equipment, be used for the cooling line of vacuum plating unit parts is cleaned, it is characterized in that: the vacuum plating unit cleaning equipment comprises device for storing liquid, this device for storing liquid comprises the liquid storage cavity, drain pipe and liquid returning tube, some fluid arms are set respectively on this drain pipe and the liquid returning tube, this liquid returning tube is provided with the liquid arm some times, this fluid arm is communicated with cooling line one end that machine is established in vacuum plating, this liquid returning tube is communicated with the other end of cooling line, one end of this device for storing liquid is connected with high-pressure pump, in the liquid storage cavity, to charge into high pressure gas, make in drain pipe and the liquid returning tube to be full of scavenging solution.
2. vacuum plating unit cleaning equipment as claimed in claim 1, it is characterized in that: be respectively equipped with fluid infusion valve and charging valve on the described device for storing liquid, this make-up valve gate control additional clean liquid in the liquid storage cavity of device for storing liquid, this charging valve is connected with high-pressure pump, is used for charging into gas in its liquid storage cavity.
3. vacuum plating unit cleaning equipment as claimed in claim 1, it is characterized in that: describedly be respectively arranged with drain pipe valve and liquid returning tube valve at the drain pipe of this device for storing liquid and the root of liquid returning tube, this valve is used for the scavenging solution turnover in the liquid storage cavity of control device for storing liquid.
4. vacuum plating unit cleaning equipment as claimed in claim 1, it is characterized in that: parts to be cleaned are target, reaction chamber wall and pump group in the vacuum coating film equipment of place.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011104441917A CN103184412A (en) | 2011-12-27 | 2011-12-27 | Cleaning equipment for vacuum coating machine |
TW100149734A TW201325743A (en) | 2011-12-27 | 2011-12-30 | Washing equipment for PVD device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011104441917A CN103184412A (en) | 2011-12-27 | 2011-12-27 | Cleaning equipment for vacuum coating machine |
Publications (1)
Publication Number | Publication Date |
---|---|
CN103184412A true CN103184412A (en) | 2013-07-03 |
Family
ID=48675855
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2011104441917A Pending CN103184412A (en) | 2011-12-27 | 2011-12-27 | Cleaning equipment for vacuum coating machine |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN103184412A (en) |
TW (1) | TW201325743A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114985385A (en) * | 2022-05-25 | 2022-09-02 | 广东美的厨房电器制造有限公司 | Beverage brewing equipment, control method and device thereof and readable storage medium |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1090693A1 (en) * | 1999-10-06 | 2001-04-11 | Applied Materials, Inc. | Ultrasonic enhancement of cleaning of a liquid delivery system |
DE19955579C2 (en) * | 1999-11-03 | 2002-01-24 | Huang Ta Hsin | Method and arrangement for cleaning a pipeline |
CN1378966A (en) * | 2001-03-29 | 2002-11-13 | 西斯清洁系统股份有限公司 | Storage container of liquid high purity substance |
CN201010990Y (en) * | 2007-02-01 | 2008-01-23 | 武汉都市环保工程技术股份有限公司 | Relay water-control rinsing system |
KR100889260B1 (en) * | 2007-11-20 | 2009-03-17 | 조한식 | Cleaning and disinfection equipment for water pipe |
CN201300135Y (en) * | 2008-05-10 | 2009-09-02 | 奇瑞汽车股份有限公司 | Cleaning device of inner wall of dynamometer water ring |
-
2011
- 2011-12-27 CN CN2011104441917A patent/CN103184412A/en active Pending
- 2011-12-30 TW TW100149734A patent/TW201325743A/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1090693A1 (en) * | 1999-10-06 | 2001-04-11 | Applied Materials, Inc. | Ultrasonic enhancement of cleaning of a liquid delivery system |
DE19955579C2 (en) * | 1999-11-03 | 2002-01-24 | Huang Ta Hsin | Method and arrangement for cleaning a pipeline |
CN1378966A (en) * | 2001-03-29 | 2002-11-13 | 西斯清洁系统股份有限公司 | Storage container of liquid high purity substance |
CN201010990Y (en) * | 2007-02-01 | 2008-01-23 | 武汉都市环保工程技术股份有限公司 | Relay water-control rinsing system |
KR100889260B1 (en) * | 2007-11-20 | 2009-03-17 | 조한식 | Cleaning and disinfection equipment for water pipe |
CN201300135Y (en) * | 2008-05-10 | 2009-09-02 | 奇瑞汽车股份有限公司 | Cleaning device of inner wall of dynamometer water ring |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114985385A (en) * | 2022-05-25 | 2022-09-02 | 广东美的厨房电器制造有限公司 | Beverage brewing equipment, control method and device thereof and readable storage medium |
CN114985385B (en) * | 2022-05-25 | 2023-08-25 | 广东美的厨房电器制造有限公司 | Beverage brewing device, control method and device thereof and readable storage medium |
Also Published As
Publication number | Publication date |
---|---|
TW201325743A (en) | 2013-07-01 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
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C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130703 |