CN103183801B - Method for preparing polyurethane film by CIMV wheat straw lignin - Google Patents
Method for preparing polyurethane film by CIMV wheat straw lignin Download PDFInfo
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- CN103183801B CN103183801B CN201310091534.5A CN201310091534A CN103183801B CN 103183801 B CN103183801 B CN 103183801B CN 201310091534 A CN201310091534 A CN 201310091534A CN 103183801 B CN103183801 B CN 103183801B
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Abstract
The invention discloses a method for preparing a polyurethane film by CIMV (citrus mosaic virus) wheat straw lignin. The method comprises the steps as follows: mixing the CIMV wheat straw lignin and polyether glycol, forming a CIMV wheat straw lignin polyurethane film and curing the CIMV wheat straw lignin polyurethane film. The polyurethane film takes the CIMV wheat straw lignin as a raw material, and has a higher hydroxy content, low dispersity and good solubleness in a nonaqueous phase polar solvent, so that neither re-separation nor re-modification is required and the CIMV wheat straw lignin can be directly added to replace polyether glycol for preparing the polyurethane film.
Description
Technical field
The invention belongs to xylogen Application Areas, be specifically related to a kind of preparation method of CIMV wheat stalk lignin polyurethane film.
Background technology
Along with the development of science and technology, the application of polymeric film in national economy is more and more extensive, also more and more higher to the requirement of thin-film material use properties.Polyurethane film has high tensile, high-tensile strength, water-proof breathable properties, obdurability and ageing-resistant performance, and there is excellent biology and blood compatibility and chemical proofing, simultaneously because its goods are easy to use, the reasons such as functional diversities, polyurethane film is obtained develop rapidly, and be widely used in multiple fields such as health care, high-grade weaving face fabric, industry, the dark welcome by user and favor.
At present, the exhaustion day by day of fossil resource is one of difficult problem of generally facing of the whole world, and renewable biomass resource just causes and pays close attention to widely, substitutes with biomass resource the only way which must be passed that fossil resource development chemical industry is human kind sustainable development.Xylogen is that vegitabilia is only second to cellulosic the abundantest a kind of larger molecular organics matter, and it is the aromatic polymer of the complexity be aggregating in a certain way by phenylpropyl alcohol alkyl structure unit.Prove after deliberation; the xylogen with a large amount of alcoholic extract hydroxyl groups and phenolic hydroxyl group can replace polyether glycol and isocyanic ester generation nucleophilic addition for the preparation of polyurethane material; so not only can reduce the dependency to petroleum products; improve the added value of xylogen; and reduce cost for polyurethane industrial, to the development of polyurethane industrial and extenuate energy dilemma and be all of great practical significance and strategic importance.
In the present invention, organic solvent type xylogen-CIMV wheat stalk xylogen is chosen for the manufacture of polyurethane film.CIMV wheat stalk xylogen uses the isolated a kind of low polymerization degree of CIMV process, the xylogen of high hydroxyl content by CIMV company.This process is that wheat stalk to be mixed in a kind of acetic acid, formic acid and water be at 105 DEG C, react 3.5h in the mixed solvent of 30:55:15 with volume ratio, afterwards after filtration, pH is regulated, can obtain the paper pulp of 50%, the five-carbon sugar of 25% and the purity of 25% are about the xylogen of 95%.CIMV wheat stalk is wooden to be have the hydroxy radical content identical with enzymolysis xylogen and is about 5mmol/g, it is 2-3 times of the hydroxy radical content such as alkali lignin, calcium lignin sulphonate, but the dispersion coefficient of CIMV wheat stalk xylogen is lower, molecular weight, therefore the solvability in the nonaqueous phase polar solvents such as DMF is relatively good, is more suitable for doing thin polyurethane film material.And be the half of enzymolysis xylogen in price, will more favourable market development potential be had.
Summary of the invention
The technical problem solved: the object of the invention is the preparation method providing a kind of CIMV wheat stalk lignin polyurethane film.Such polyurethane film with a kind of CIMV wheat stalk xylogen for raw material, possess high hydroxy radical content and low dispersiveness, and in nonaqueous phase polar solvent good solvability, therefore without the need to being again separated or modification, directly can add alternative polyether glycol and preparing polyurethane film.
Technical scheme: the preparation method of CIMV wheat stalk lignin polyurethane film, step is:
(1) mixing of CIMV wheat stalk xylogen and polyether glycol: the CIMV wheat stalk xylogen taking 5 ~ 40 mass parts is dissolved in organic solvent, and add the polyether glycol of 15 ~ 75 mass parts, stir 0.5 ~ 1h at 50 ~ 60 DEG C, make it fully mix;
(2) formation of CIMV wheat stalk lignin polyurethane film: the isocyanic ester of 40 ~ 70 mass parts is added in the liquid mixture of step (1) gained and stir, at 50 ~ 75 DEG C after confined reaction 1 ~ 1.5h, pour in Teflon mould, mould is inserted on a horizontal stand, leave standstill 12 ~ 24h;
(3) slaking of CIMV wheat stalk lignin polyurethane film: the film of step (2) gained is put into baking oven slaking 6h at 80 ~ 100 DEG C and obtain finished product.
Described organic solvent is the organic solvent by acetone and DMF 2:3 mixing by volume.
Described polyether polyatomic alcohol component is that in molecule, hydroxy radical content is 2 ~ 3, relative molecular mass is the mixture of one or more in the polyether glycol of 600 ~ 2000.
Described isocyanic ester is tolylene diisocyanate (TDI), diphenylmethanediisocyanate (comprising PAPI and MDI), hexamethylene diisocyanate (HDI) or isophorone diisocyanate (PPDI).
Principle of the present invention is: CIMV wheat stalk xylogen can provide hydroxyl Substitute For Partial polyether glycol, and can well to be dissolved in mixed solvent the abundant contact reacts with isocyanic ester, so it is homogeneous to make quality, and the film of good mechanical property.
Beneficial effect:
(1) the present invention directly adds xylogen Substitute For Partial polyether glycol, separation and Extraction is not carried out to xylogen, also without modification, so just reduce alkali lye used in separation and Extraction to the pollution of environment, and avoid the extra consumption that modification brings, conscientiously reduce raw materials cost, decrease the dependence to petroleum resources, save the energy, and improve the utilization ratio of Liginon Resource.
(2) the present invention utilizes the mixed solvent of acetone and DMF preparation, CIMV wheat stalk xylogen can well be dissolved, itself and other reaction raw materials is well mixed, make the film smooth texture prepared homogeneous, and acetone can volatilize very soon after film forming, the time that static solidification is used can be greatly reduced, than simple use DMF or tetrahydrofuran (THF) more efficient as solvent.
(4) thermal conductivity of lignin polyurethane film that prepared by the present invention is compared conventional polyurethanes film and is reduced about 30%, and namely comparing conventional polyurethanes film has better effect of heat insulation, has promoter action to the research of the thermal insulation of polyurethane film.
(5) the lignin polyurethane film that prepared by the present invention has better tensile strength and elongation rate of tensile failure than traditional lignin polyurethane film, and the practical application for lignin polyurethane film has very large meaning.
Accompanying drawing explanation
Fig. 1 is the tensile stress-strain performance impact of CIMV wheat stalk content of lignin to polyurethane film.As we can see from the figure, tensile strength increases along with the increase of content of lignin, and when content of lignin reaches 40%, tensile strength reaches maximum.This may be due to xylogen as linking agent in urethane with di-isocyanate reaction.Along with the increase of content of lignin, there are more isocyanate groups and xylogen hydroxyl reaction, cause urethane crosslinks density to increase.
Fig. 2 is that CIMV wheat stalk content of lignin is on the impact of polyurethane film thermal decomposition performance.By the increase can found out in TG image along with content of lignin, the initial decomposition temperature of polyurethane film reduces gradually, but the residue after decomposing increases gradually, and finds out that from dTG image the fastest rate of decomposition of polyurethane film reduces along with the increase of xylogen.
Fig. 3 is that CIMV wheat stalk content of lignin is on the impact of polyurethane film glass transition temperature.From in figure, along with the increase of content of lignin, the Tg of polyurethane film increases gradually.Major cause is that the increase of the cross-linking density that the increase of content of lignin causes causes.The hard section formed by isocyanic acid ester bond in urethane is dispersed in the external phase formed by polyether glycol.In figure, the change of Tg means that xylogen is as linking agent, prevents the separation between soft, hard section, and at least making is separated is restricted in a limited scope.
Fig. 4 is that CIMV wheat stalk content of lignin is on the impact of polyurethane film thermal conductivity.Along with the increase of content of lignin, the thermal conductivity of lignin polyurethane film reduces, and namely can increase the heat-proof quality of polyurethane film.When content of lignin is increased to 40%, the xylogen of polyurethane film thermal conductivity ratio 10% content reduces 36%.
Embodiment
Following examples further illustrate content of the present invention, but should not be construed as limitation of the present invention.Without departing from the spirit and substance of the case in the present invention, the amendment do the inventive method, step or condition and replacement, all belong to scope of the present invention.
If do not specialize, the conventional means that technique means used in embodiment is well known to those skilled in the art.
Raw material sources:
CIMV wheat stalk xylogen is provided by French Compagnie Industrielle de la Matieere Vegetale company, its number is all respectively 1634g/mol and 2152g/mol with weight-average molecular weight, total hydroxy radical content is 4.917mmol/g, comprises 3.917mmol/g alcoholic extract hydroxyl group.
Tolylene diisocyanate (TDI) is bought from West Asia reagent, is chemical pure;
Cetomacrogol 1000 (PEG1000) is bought from Chemical Reagent Co., Ltd., Sinopharm Group, is chemical pure;
Acetone is bought from Nanjing Chemistry Reagent Co., Ltd., is analytical pure;
Dimethyl formamide (DMF) is bought from Tianjin Tian Yi Science and Technology Development Co., Ltd., is analytical pure.
Detection method:
1, the test of tensile property uses and newly thinks carefully CMT-4304 type electronic universal material testing machine, tests under room temperature (25 DEG C) and normal atmosphere conditions.Tensile property presses the mensuration of GBT528-2009 vulcanized rubber or thermoplastic elastomer tensile stress-strain performance, and testing sample is dumb-bell shape style, and total length is 100mm, and crevice length is 25mm, and narrow parallel width is 5mm, and trial speed is 200mm/min.Tensile strength and elongation at break data are all the mean value at least three parallel sample.
2, TGA analyzes the TG209F1 type thermogravimetric analyzer measuring and adopt German Netzsch company.Amount of samples: 5 ~ 10mg; Crucible material: platinum crucible; Crucible shape: smooth opening; Temperature elevating range: 35 DEG C ~ 800 DEG C; Temperature rise rate: 20 DEG C/min; Type carrier gases: nitrogen.
3, DSC measures the Diamond DSC type differential scanning calorimeter adopting Perkin Elmer company of the U.S..Amount of samples: 2 ~ 5mg; Temperature elevating range :-60 DEG C ~ 150 DEG C; Temperature rise rate: 20 DEG C/min; Type carrier gases: nitrogen; Carrier gas flux: 20mL/min.For avoiding or reducing sample thermal history as far as possible to the impact of DSC data, this experiment is when carrying out DSC thermal analyses, and the data obtained when taking turns temperature programming with second are as the criterion.
4, the mensuration of thermal conductivity adopts Canadian C-THERM company's T 322 type thermal conductivity analyser, and the surfacing of film, fits with the probe of tester, covers and pops one's head in.
Embodiment 1
Take 2g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 18g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 4.58g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 2
Take 4g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 16g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 5.16g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 3
Take 6g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 14g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 5.74g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 4
Take 8g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 12g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 6.32g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 5
Take 10g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 10g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 6.92g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 6
Take 6g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 14g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 6.74g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 7
Take 6g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 14g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 7.74g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 8
Take 6g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 14g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 8.74g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
Embodiment 9
Take 6g CIMV wheat stalk xylogen to be dissolved in the mixed solvent of 40mL acetone and 60mL DMF, and add 14g PEG1000 at 60 DEG C of stirring 0.5h, make it fully mix.The TDI of 9.74g is added, stirs, pour in Teflon mould after confined reaction 1h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24h, finally at 80 DEG C after slaking 6h, take out diaphragm, put into vacuum drying oven, in order to further testing its various performance.
The test data of embodiment 1-9 as table 1 successively shown in:
Table 1
A: relative to the mass percentage of PEG1000.
Claims (1)
- The preparation method of 1.CIMV wheat stalk lignin polyurethane film, it is characterized in that step is: take 6 g CIMV wheat stalk xylogen and be dissolved in the mixed solvent of 40 mL acetone and 60 mL dimethyl formamides, and add 14 g cetomacrogol 1000s at 60 DEG C of stirring 0.5 h, make it fully mix; The tolylene diisocyanate of 7.74 g is added, stirs, pour in Teflon mould after confined reaction 1 h at 75 DEG C, mould is inserted on a horizontal stand, leave standstill 24 h, finally after slaking 6 h, take out diaphragm, put into vacuum drying oven at 80 DEG C; The number of described CIMV wheat stalk xylogen is all respectively 1634 g/mol and 2152 g/mol with weight-average molecular weight, total hydroxy radical content is 4.917 mmol/g, comprises 3.917 mmol/g alcoholic extract hydroxyl groups.
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