CN103182806B - Work mould and film plating layer - Google Patents
Work mould and film plating layer Download PDFInfo
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- CN103182806B CN103182806B CN201110453017.9A CN201110453017A CN103182806B CN 103182806 B CN103182806 B CN 103182806B CN 201110453017 A CN201110453017 A CN 201110453017A CN 103182806 B CN103182806 B CN 103182806B
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Abstract
A kind of work mould and film plating layer, described work mould comprises a die ontology, and at least one film plating layer upwards formed from this die ontology, this film plating layer comprises the high temperature resistance plated film that one deck is formed with the nickel alumin(i)um alloy plating being rich in aluminium, in this high temperature resistance plated film composition, there is trace element, and this trace element is selected from cobalt, iron, chromium, copper, vanadium, or a combination of aforementioned substances; Crystal structure by means of the nickel alumin(i)um alloy of this high temperature resistance plated film make this film plating layer at high temperature anti-be stained with glutinous, anti-oxidation characteristics is better, and allows overall work mould at high temperature can carry out mold forming.
Description
Technical field
The present invention relates to a kind of work mould and film plating layer, particularly relate to a kind of work mould for high temperature process and film plating layer.
Background technology
Consult Fig. 1, existing work mould 1 comprises a mould ground 11, and one is formed at functional film layer 12 on this mould ground 11, this functional film layer 12 has and prevents from causing because being stained with glutinous the effect that damages during product stripping, and the whole service life of work mould 1 can be improved, so the research of this functional film layer 12 is important topics that current industry develops.
TaiWan, China the 093126646th patent application case discloses and utilizes the Diamond-like Carbon rete of rich graphitic carbon phase carbon to be formed on mould ground, and obtain the easy demoulding with the allotment of the ratio of different carbon phase, hardness is high, and the technological means of the work mould of the feature such as long service life.But the temperature tolerance of Diamond-like Carbon rete is not enough, when model temperature is higher than 400 DEG C, Diamond-like Carbon rete can start to produce carbonization and lose original good demoulding effect and the protected effect to mould surface of bottom material.
Again; TaiWan, China the 093121109th patent application case expansion rate is comparable to the ceramic material of diamond as mould ground; and form the technological means of diamond diaphragm thereon, utilize the advantages such as the high rigidity of diamond, high temperature tolerance to obtain can be applicable to the work mould of high temperature model.But no matter be ceramic material, and/or the processing procedure of diamond diaphragm all has suitable process conditions and cost to limit, and makes this type of work mould there is no actual application value.
In addition, then disclose by least both overlapping technology forming nano-multilayer film in the alloy firms such as the platinum of more than 20 ~ 60 layers (Pt), iridium (Ir), ruthenium (Ru), rhodium (Rh) or tungsten (W) in TaiWan, China the 096133395th patent application case, so as to improving the mechanical strength of model temperature with of work mould itself; And for example United States Patent (USP) 5171348 also proposes with precious metal alloys: one of them kind of platinum (Pt), iridium (Ir), ruthenium (Ru), rhodium (Rh), tungsten (W), palladium (Pd), rhenium (Re), tantalum (Ta), osmium (Os) is formed the technology of the function film on mould ground.The shortcoming of this two inventions technology is all the functional film layer forming protection mould ground with noble metal, its material cost and processing procedure cost all very high, will be very restricted for industrial application in large quantities.
Further, TaiWan, China the 094146036th patent application case discloses a kind of with Teflon (Teflon, Polytetrafluoroethene; Abbreviation PTFE), containing the composite of Teflon, and contain the technological means of ceramic one of them function film formed of material, stickiness is stained with to promote the anti-of work mold integral, its shortcoming is when model temperature is higher than 400 DEG C, and Teflon material also can start carbonization and lose and anti-be stained with glutinous characteristic.
From the above, the functional film layer that general work mould uses is broadly divided into alloy, ceramic material containing noble metal, and class diamond carbon (DiamondLikeCarbon, three classes such as DLC), but being film material with alloy or the diamond containing noble metal, cost is high, and ceramic material selectional restriction is many and tack for mould ground is usually poor, in addition, quasi cobalt carbon diaphragm is low for the tolerance of temperature, therefore, all has sizable room for improvement.
In addition, United States Patent (USP) 7618719 discloses a kind of technological means that can be applicable to higher than the glass model instrument of 600 DEG C, it is characterized in that work mould has good demoulding effect and persistent hard films (Hardcoating) when being included in high temperature model, this hard films tungstenic (W), vanadium (V), boron (B), carbon (C), nitrogen (N) is also formed on a noncrystalline CrSiN layer, to overcoming the alloy containing noble metal, ceramic material, and class diamond carbon (DiamondLikeCarbon, etc. DLC) three class materials form the shortcoming of the work mould of functional film layer.Based on the technological means that this Patent Case discloses, develop when having an opportunity that processing procedure cost is cheaper, temperature tolerance Gao Erke is widely used in model, the particularly work mould of high temperature model.
Summary of the invention
The object of the present invention is to provide one high temperature resistant and can be applicable to a large amount of industrial work mould.
Moreover another object of the present invention is to provide a kind of high temperature resistant, film plating layer that cost of material is low.
Work mould of the present invention comprises a die ontology, and at least one film plating layer upwards formed from this die ontology.This film plating layer comprises a high temperature resistance plated film formed with the nickel alumin(i)um alloy plating being rich in aluminium, have trace element, and this trace element is selected from cobalt, iron, chromium, copper, vanadium in this high temperature resistance plated film composition, or a combination of aforementioned substances.
Work mould of the present invention, the atom content percentage of the trace element in this high temperature resistance plated film is not more than 5at%, and this aluminium atom content percentage is 42at% ~ 55at%.
Work mould of the present invention, this film plating layer also comprises one and is selected from the nickel alumin(i)um alloy and one of them anti-diffusion plated film formed of amorphous metal glass that are rich in nickel, and this high temperature resistance plated film is formed on this anti-diffusion plated film surface away from this film tool body.
Work mould of the present invention, this anti-diffusion plated film be rich in nickel nickel alumin(i)um alloy form and nickle atom percentage composition is 51at% ~ 58at%.
Work mould of the present invention, this anti-diffusion plated film is formed with amorphous metal glass, and amorphous metal glass is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
Work mould of the present invention, this die ontology comprises a ground, and one link this ground and this film plating layer in conjunction with material.
Work mould of the present invention, this ground is selected from cast iron, carbon steel, high-speed steel, nickel-base alloy, cobalt-base alloys, or tungsten carbide, and this is be selected from aluminium, copper, chromium, nickel, titanium, vanadium, niobium, tungsten, cobalt, zirconium in conjunction with material, or a combination of aforementioned substances.
Work mould of the present invention, this thickness in conjunction with material is not less than 25nm.
Film plating layer of the present invention comprises a first filming, and this first plating mould is made up of the nickel alumin(i)um alloy being rich in aluminium adding trace element, and this trace element is selected from cobalt, iron, chromium, copper, vanadium, or a combination of aforementioned substances.
Film plating layer of the present invention, the aluminium atom content percentage in this first filming is 42at% ~ 55at%, and the atom content percentage of this trace element is not more than 5at%.
Film plating layer of the present invention, also comprises one and be selected from the nickel alumin(i)um alloy and one of them second plated film formed of amorphous metal glass that are rich in nickel, and this first filming is formed at this second coated surface.
Film plating layer of the present invention, this second plated film is that the nickel alumin(i)um alloy being rich in nickel is formed, and nickle atom percentage composition is 51at% ~ 58at%.
Film plating layer of the present invention, this second plated film is formed with amorphous metal glass, and amorphous metal glass is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
Film plating layer of the present invention, the thickness of this first filming is 300nm ~ 5000nm, and the thickness of this second plated film is 25nm ~ 500nm.
Beneficial effect of the present invention is: the high strength utilizing this film plating layer to have, good engineering properties, high temperature resistance, the characteristic such as anti-oxidant; under meeting high temperature model; still can keep good demoulding effect and protective capability; and do not use noble metal or rare metal as film material because of the present invention, and material cost can be taken into account, be extended to industrial extensive application development.
Accompanying drawing explanation
Fig. 1 is a sectional view, and existing work mould is described.
Fig. 2 is a sectional view, and first preferred embodiment of work mould of the present invention is described.
Fig. 3 is a sectional view, and second preferred embodiment of work mould of the present invention is described.
Fig. 4 is a sectional view, and the 3rd preferred embodiment of work mould of the present invention is described.
Fig. 5 is a sectional view, illustrates that the another kind of this second and third preferred embodiment implements aspect.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is described in detail.Before the present invention is described in detail, it should be noted that in the following description content, similar assembly represents with identical numbering.
Consult Fig. 2, the first preferred embodiment of work mould of the present invention comprises a die ontology 2, and a film plating layer 3 upwards formed from this die ontology 2.
This die ontology 2 comprises a ground 21, and one link this ground 21 and this film plating layer 3 in conjunction with material 22.This ground 21 is formed by metal-containing material, as cast iron, carbon steel, high-speed steel, nickel-base alloy, cobalt-base alloys or tungsten carbide, and for being shaped required product, it is specifically intended that, when the temperature shaped is more than 600 DEG C, to have compared with the nickel-base alloy of high-temperature stability, cobalt-base alloys or tungsten carbide for better selection.And this being formed at this ground 21 finished surface should be selected in conjunction with material 22 and all have good affinity with this ground 21 and this film plating layer 3, the material that joint capacity is good, general based on metal film, such as aluminium (Al), copper (Cu), chromium (Cr), nickel (Ni), titanium (Ti), vanadium (V), niobium (Nb), tungsten (W), cobalt (Co), one of them kind of zirconium (Zr) formed, and this is not less than 25 nanometers (nm) in conjunction with material 22 thickness, strengthen this film plating layer 3 whereby to the adhesive force of this ground 21, and reduce interfacial stress and not easily separated.
In the present embodiment, this ground 21 is that tungsten carbide formed, and this is then be formed at this ground 21 for processing the surface of model with chromium metal in conjunction with material 22, and this chromium metal be about rice in 25 nanometer ~ 500 in conjunction with material 22 thickness, preferably, thickness range is 100 nanometer ~ 300 nanometers.
This film plating layer 3 comprises the high temperature resistance plated film 31 (namely the first filming) in conjunction with material 22 surface that is connected to this die ontology 2, this high temperature resistance plated film 31 is that the nickel alumin(i)um alloy plating being rich in aluminium forms, and wherein the atom content percentage of aluminium at 42at% ~ 55at%, preferably, the atom content percentage of aluminium can have more excellent high temperature life at 51at% ~ 55at%, specifically, also there is the trace element that atom content percentage is not more than 5at% in the high temperature resistance plated film 31 that this nickel alumin(i)um alloy being rich in aluminium is formed, the trace element added is selected from the metal close with nickle atom radius, as cobalt (Co), iron (Fe), chromium (Cr), copper (Cu), one of them kind of vanadium (V), thus, nickle atom vacant locations in the high temperature resistance plated film 31 that this nickel alumin(i)um alloy being rich in aluminium is formed just can replace by this trace meter, reduce the quantity of the crystal structure Atom vacancy of plated film.
This high temperature resistance plated film 31 being rich in the nickel alumin(i)um alloy of aluminium is in B2 type crystal structure, and the top layer contacted with air is very easily oxidized and generates the alumina layer of tool protectiveness.In addition, aluminium content is higher, generating the speed of aluminium oxide, also to reach follow-up film body sooner anti-oxidant, effect against corrosion, and there is good high-temperature oxidation resistance and heat conductivity, but on the nickel alumin(i)um alloy B2 crystal structure that aluminium content is higher, because the more meeting of aluminium atomic quantity causes the position of nickle atom to be easier to produce vacancy, these vacancies will make the oxidizing atmosphere of external environment, or nickel, aluminium atom diffuses into along this vacancy path towards this die ontology 2 direction, and allow this high temperature resistance plated film 31 being rich in the nickel alumin(i)um alloy of aluminium may lose original B2 crystal structure, lose high temperature resistant, oxidation resistant characteristic, therefore, fill up in nickle atom vacancy by the trace meter atom made an addition in this high temperature resistance plated film 31, thus the vacancy quantity of crystal structure in this high temperature resistance plated film 31 is reduced, to reduce if the oxidizing atmospheres such as oxygen and alloy atom are toward the problem of diffusion inside.
Therefore, work mould of the present invention utilizes in this film plating layer 3, to be rich in this high temperature resistance plated film 31 that the nickel alumin(i)um alloy structure of aluminium is main composition, by means of the nickel aluminium crystal structure that aluminium content is many, temperature tolerance, antioxidant are promoted, and anti-ly under taking into account high temperature be stained with glutinous effect, and need using the high material of the material cost such as noble metal, diamond as composition, for the large advantage that a large amount of uses in industry reduce costs especially.
Consult Fig. 3, the second preferred embodiment and this first preferred embodiment of work mould of the present invention are similar, comprise this die ontology 2, and the film plating layer 4 that is upwards formed from this die ontology 2, and different places is the composition of this film plating layer 4.
This film plating layer 4 comprises the anti-diffusion plated film 41 (namely the second plated film) in conjunction with material 22 surface that is connected to this die ontology 2, and one is formed in this anti-diffusion plated film 41 away from the high temperature resistance plated film 42 (namely the first filming) on the surface of this die ontology 2.
This high temperature resistance plated film 42 is that the nickel alumin(i)um alloy plating being rich in aluminium forms, and wherein the atom content percentage of aluminium at 42at% ~ 55at%, preferably, the atom content percentage of aluminium is that 300nm ~ 5000nm has more excellent high temperature life at 51 ~ 55at%, thickness.Specifically, in the high temperature resistance plated film 42 that this nickel alumin(i)um alloy being rich in aluminium is formed, also there is the trace element being not more than 5at%, the trace element added is selected from the metal close with nickle atom radius, as cobalt (Co), iron (Fe), chromium (Cr), copper (Cu), one of them kind of vanadium (V), thus, nickle atom vacant locations in the high temperature resistance plated film 42 that this nickel alumin(i)um alloy being rich in aluminium is formed just can replace by this trace meter, reduce the quantity of the crystal structure Atom vacancy of this high temperature resistance plated film 42.
This anti-diffusion plated film 41 is that the nickel alumin(i)um alloy being rich in nickel formed, and wherein the atom content percentage of nickel is 25nm ~ 500nm at 51at% ~ 58at%, thickness.
And this high temperature resistance plated film 42 being rich in the nickel alumin(i)um alloy of aluminium easily causes the position of nickle atom to be easier to produce vacancy, make the oxidizing atmosphere of external environment, or nickel, aluminium atom diffuses into along this vacancy path towards this die ontology 2 direction, and allow this high temperature resistance plated film 42 being rich in the nickel alumin(i)um alloy of aluminium lose high temperature resistant, the problem of oxidation resistant characteristic, except filling up except nickle atom vacancy by making an addition in this high temperature resistance plated film 42 with trace meter atom, in this second preferred embodiment, this is rich in the anti-diffusion plated film 41 of the nickel alumin(i)um alloy of nickel, because nickle atom radius is less, replace so the vacancy that the aluminium atom in crystal structure causes easily is filled by the nickle atom that content is many, and the metallic atom that can more effectively overcome further in this high temperature resistance plated film 42 is toward diffusion inside, keep good high temperature resistant of this high temperature resistance plated film 42, anti-oxidation characteristics, with the engineering properties of excellence.
What is particularly worth mentioning is that, work mould of the present invention glass sample at high temperature formed thereby is not only without atomization defect, surfacing, also there is good light transmission simultaneously, the particularly demand such as the glass lens of following high optical characteristics or the face glass of high-order electronic product, all will the operating temperature more than 650 DEG C be shaped, work mould of the present invention just also has industrial competitiveness at this.
What remark additionally especially at this is, although nickel alumin(i)um alloy itself has excellent material behavior, low-density, high-melting-point, high rates of heat transfer, high strength, against corrosion, resistance to high temperature oxidation and conduction etc. and can be applicable to the line contacts of semiconductor subassembly, catalyst, tie breaker, or the surperficial heat insulating coating interlayer material of aircraft parts etc., but because the casting difficulty of nickel alumin(i)um alloy, general use PM technique is synthesized and it cannot be applied in a large number high-temperature structural material, also without especially when high temperature (being greater than 650 DEG C) model, for the discussion that nickel alumin(i)um alloy is applied on work mould, therefore, the present invention utilizes sputtering way, but not alloy cube matherial metallurgy synthesis in the past, not only cost degradation on processing procedure, also large-scale work mould is suitable for.
Consult Fig. 4,3rd preferred embodiment of work mould of the present invention, 3rd preferred embodiment and this second preferred embodiment similar, its different place is only that the anti-diffusion plated film 41 ' (namely the second plated film) of this film plating layer 4 is formed with amorphous metal glass, and amorphous metal glass is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
Amorphous metal glass because exist without crystal boundary, the same speed that the atom of this high temperature resistance plated film 42 and oxidizing atmosphere can be made significantly to reduce past diffusion inside, and allow the overall work mold use life-span is longer, usefulness is better.
What supplement especially at this is, in this second and third preferred embodiment above-mentioned all with a film plating layer 4 for implementation, but in fact, may also be and comprise the stacked film plating layer of two or more 4 as shown in Figure 5, focus on, its most end face one is decided to be high temperature resistant, the oxidation resistant high temperature resistance plated film 42 (namely the first filming) of this tool.
In sum, work mould of the present invention reduces film plating layer 3 by means of in conjunction with material 22, stress between 4 and ground 21, and the adhesive force increased to each other, add this to be rich in the high temperature resistance plated film 31 of the nickel alumin(i)um alloy of aluminium, the engineering properties of 42 enhancing working surfaces, promote heatproof, antioxygen characteristic also possesses good removal, and the anti-diffusion plated film 41 of anti-atoms permeating under high temperature, 41 ' consolidates the high temperature resistant of this high temperature resistance plated film 42 further, oxidation resistant crystal structure, therefore, make work mould of the present invention can at processing procedure, the enforcement of high temperature model still can be carried out under the prerequisite that the cost of material is low.
Claims (12)
1. work a mould, comprises a die ontology, it is characterized in that:
This work mould also comprises at least one film plating layer upwards formed from this die ontology, this film plating layer comprises a high temperature resistance plated film formed with the nickel alumin(i)um alloy plating being rich in aluminium, in this high temperature resistance plated film composition, there is trace element, and this trace element is selected from cobalt, iron, chromium, copper, vanadium, or a combination of aforementioned substances, the atom content percentage of the trace element in this high temperature resistance plated film is not more than 5at%, and this aluminium atom content percentage is 42at% ~ 55at%.
2. work mould according to claim 1, it is characterized in that: this film plating layer also comprises one and is selected from the nickel alumin(i)um alloy and one of them anti-diffusion plated film formed of amorphous metal glass that are rich in nickel, and this high temperature resistance plated film is formed on this anti-diffusion plated film surface away from this film tool body.
3. work mould according to claim 2, is characterized in that: this anti-diffusion plated film be rich in nickel nickel alumin(i)um alloy form and nickle atom percentage composition is 51at% ~ 58at%.
4. work mould according to claim 2, it is characterized in that: this anti-diffusion plated film is formed with amorphous metal glass, and amorphous metal glass is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
5. work mould according to claim 1 and 2, is characterized in that: this die ontology comprises a ground, and one link this ground and this film plating layer in conjunction with material.
6. work mould according to claim 5, it is characterized in that: this ground is selected from following material formed: cast iron, carbon steel, high-speed steel, nickel-base alloy, cobalt-base alloys, or tungsten carbide, this is be selected from following material formed in conjunction with material: aluminium, copper, chromium, nickel, titanium, vanadium, niobium, tungsten, cobalt, zirconium, or a combination of aforementioned substances.
7. work mould according to claim 6, is characterized in that: this thickness in conjunction with material is not less than 25nm.
8. a film plating layer, comprises a first filming, it is characterized in that:
This first filming is made up of the nickel alumin(i)um alloy being rich in aluminium adding trace element, and this trace element is selected from cobalt, iron, chromium, copper, vanadium, or a combination of aforementioned substances, aluminium atom content percentage in this first filming is 42at% ~ 55at%, and the atom content percentage of this trace element is not more than 5at%.
9. film plating layer according to claim 8, is characterized in that: also comprise one and be selected from the nickel alumin(i)um alloy and one of them second plated film formed of amorphous metal glass that are rich in nickel, and this first filming is formed at this second coated surface.
10. film plating layer according to claim 9, is characterized in that: this second plated film is that the nickel alumin(i)um alloy being rich in nickel is formed, and nickle atom percentage composition is 51at% ~ 58at%.
11. film plating layers according to claim 9, it is characterized in that: this second plated film is formed with amorphous metal glass, and amorphous metal glass is selected among zirconium base metal glass, nickel based metal glass, titanium-based metal glass, copper base metal glass, platinum base metal glass, or palladium-based metal glass.
12. film plating layers according to claim 9, is characterized in that: the thickness of this first filming is 300nm ~ 5000nm, and the thickness of this second plated film is 25nm ~ 500nm.
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| CN201110453017.9A CN103182806B (en) | 2011-12-30 | 2011-12-30 | Work mould and film plating layer |
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| CN201110453017.9A CN103182806B (en) | 2011-12-30 | 2011-12-30 | Work mould and film plating layer |
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| CN103182806B true CN103182806B (en) | 2016-01-20 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1669963A (en) * | 2004-03-15 | 2005-09-21 | 亚洲光学股份有限公司 | Multilayer film mould core for molding glass |
| CN101871061A (en) * | 2010-07-07 | 2010-10-27 | 哈尔滨工业大学 | Preparation method of massive nanocrystalline nickel aluminum alloy |
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| CN1661132A (en) * | 2004-02-26 | 2005-08-31 | 财团法人金属工业研究发展中心 | Hard coat and fabricating method |
| CN100436620C (en) * | 2006-01-08 | 2008-11-26 | 丹阳市高频焊管厂 | Nickel aluminium alloy and preparation method thereof |
| JP4753249B2 (en) * | 2006-01-13 | 2011-08-24 | 株式会社神戸製鋼所 | Mold for glass molding |
| CN101857925B (en) * | 2010-07-07 | 2011-07-13 | 哈尔滨工业大学 | Preparation method of ultrafine grained Ni-Al alloy |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1669963A (en) * | 2004-03-15 | 2005-09-21 | 亚洲光学股份有限公司 | Multilayer film mould core for molding glass |
| CN101871061A (en) * | 2010-07-07 | 2010-10-27 | 哈尔滨工业大学 | Preparation method of massive nanocrystalline nickel aluminum alloy |
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