CN103165378B - 一种用于等离子体浸没注入中剂量检测方法 - Google Patents
一种用于等离子体浸没注入中剂量检测方法 Download PDFInfo
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- CN103165378B CN103165378B CN201110412670.0A CN201110412670A CN103165378B CN 103165378 B CN103165378 B CN 103165378B CN 201110412670 A CN201110412670 A CN 201110412670A CN 103165378 B CN103165378 B CN 103165378B
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- 238000002513 implantation Methods 0.000 title claims abstract description 55
- 238000001514 detection method Methods 0.000 title claims abstract description 25
- 238000007654 immersion Methods 0.000 title claims abstract description 14
- 150000002500 ions Chemical class 0.000 claims abstract description 208
- 238000000034 method Methods 0.000 claims abstract description 27
- 238000005468 ion implantation Methods 0.000 claims description 30
- 239000007943 implant Substances 0.000 claims description 12
- 230000036962 time dependent Effects 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 13
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 3
- 230000014509 gene expression Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- -1 n in equation (2) Chemical class 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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CN201110412670.0A CN103165378B (zh) | 2011-12-12 | 2011-12-12 | 一种用于等离子体浸没注入中剂量检测方法 |
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CN201110412670.0A CN103165378B (zh) | 2011-12-12 | 2011-12-12 | 一种用于等离子体浸没注入中剂量检测方法 |
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CN103165378A CN103165378A (zh) | 2013-06-19 |
CN103165378B true CN103165378B (zh) | 2016-03-30 |
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CN201110412670.0A Active CN103165378B (zh) | 2011-12-12 | 2011-12-12 | 一种用于等离子体浸没注入中剂量检测方法 |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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SI24727B (sl) | 2014-05-22 | 2023-08-31 | Institut "Jožef Stefan" | Postopek in naprava za detekcijo in merjenje gostote nevtralnih atomov vodika, kisika ali dušika |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050230047A1 (en) * | 2000-08-11 | 2005-10-20 | Applied Materials, Inc. | Plasma immersion ion implantation apparatus |
US20100155600A1 (en) * | 2008-12-23 | 2010-06-24 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for plasma dose measurement |
CN201741661U (zh) * | 2010-08-17 | 2011-02-09 | 中国科学院微电子研究所 | 等离子体浸没注入机的注入离子剂量检测控制装置 |
CN101985739A (zh) * | 2010-10-21 | 2011-03-16 | 复旦大学 | 一种等离子体浸没注入设备的剂量控制系统 |
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Effective date of registration: 20190529 Address after: Room 820, 8th Floor, Building 1, 13 Guocheng Road, Shunqing District, Nanchong City, Sichuan Province Patentee after: Zhongke Jiuwei Technology Co.,Ltd. Address before: No. 3, North Tu Cheng West Road, Chaoyang District, Beijing Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |
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PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
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Denomination of invention: A dose detection method for plasma immersion injection Effective date of registration: 20210129 Granted publication date: 20160330 Pledgee: Sichuan Xichong rural commercial bank Limited by Share Ltd. Pledgor: Zhongke Jiuwei Technology Co.,Ltd. Registration number: Y2021980000875 |
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Date of cancellation: 20231227 Granted publication date: 20160330 Pledgee: Sichuan Xichong rural commercial bank Limited by Share Ltd. Pledgor: Zhongke Jiuwei Technology Co.,Ltd. Registration number: Y2021980000875 |
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PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A Dose Detection Method for Plasma Immersion Injection Effective date of registration: 20231229 Granted publication date: 20160330 Pledgee: Sichuan Xichong rural commercial bank Limited by Share Ltd. Pledgor: Zhongke Jiuwei Technology Co.,Ltd. Registration number: Y2023980075671 |
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Address after: Room 820, 8th Floor, Building 1, 13 Guocheng Road, Shunqing District, Nanchong City, Sichuan Province Patentee after: Zhongke Jiuwei Technology Co.,Ltd. Country or region after: China Address before: Room 820, 8th Floor, Building 1, 13 Guocheng Road, Shunqing District, Nanchong City, Sichuan Province Patentee before: Zhongke Jiuwei Technology Co.,Ltd. Country or region before: China |