CN103142421A - Wash-free mask - Google Patents

Wash-free mask Download PDF

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Publication number
CN103142421A
CN103142421A CN 201110404127 CN201110404127A CN103142421A CN 103142421 A CN103142421 A CN 103142421A CN 201110404127 CN201110404127 CN 201110404127 CN 201110404127 A CN201110404127 A CN 201110404127A CN 103142421 A CN103142421 A CN 103142421A
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CN
China
Prior art keywords
wash
skin
free mask
film
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 201110404127
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Chinese (zh)
Inventor
王连义
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN 201110404127 priority Critical patent/CN103142421A/en
Publication of CN103142421A publication Critical patent/CN103142421A/en
Pending legal-status Critical Current

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  • Detergent Compositions (AREA)

Abstract

The invention relates to a mask and especially relates to a wash-free mask and a manufacturing method thereof. The wash-free mask comprises ethanol, glycerol, sodium benzoate, sodium sulfocyanate, perfume, polyvinyl alcohol, boric acid and purified water. Compared with the prior art, the invention provides a novel stain removal method, and in use, only a small amount of the wash-free mask on the face can fast penetrate into the skin and form a film on the face in about 15min and hands gently rub the film so that stain in the skin can fall off with the film without water cleaning or towel wiping and thus the wash-free mask does not damage the skin and is convenient for use and carrying.

Description

A kind of disposable facial film
Technical field
The present invention relates to a kind of facial film, particularly a kind of disposable facial film and preparation method thereof.
Background technology
The facial film that in the past uses all will adopt clear water to clean basically, and whitening, moisturizing, deep-pollution-removing ability are poor.This is for the staff of colliery, petrochemical industry, machinery industry, and field worker, and is very inconvenient, especially difficult especially in the place that lacks the water source.Though previous patent has adopted the method without the clear water washing, the dirt that it is residual must make paper using or cloth carry out the complementary processing such as wiping.
Summary of the invention
Purpose of the present invention: provide that a kind of deep-pollution-removing ability is strong, the moisturizing whitening effect is good, skin without injury, is not washed with water, and the facial film of need not any adminicle processing and preparation method thereof.
Technical scheme: the object of the present invention is achieved like this, and it is comprised of following ingredients:
Figure BSA00000630905600011
The manufacture method of above-mentioned facial milk cleanser is characterized in that:
(1) first add 5-8 part glycerol, 10-15 part spice in reactor, 300-420 part Purified Water uses revolution to be the agitator of 60-90 rev/min, stirs 12-15 minute;
(2) will add 80-110 part polyvinyl alcohol in mentioned solution, be warming up to 100 ℃, kept temperature 40-70 minute, all melt to polyvinyl alcohol;
(3) pour mentioned solution into retort, keep 80 ℃ of temperature, add the ethanol of (200-240) part * 65%, stirred 10-15 minute;
(4) keep in described retort 80 ℃ of solution temperatures, add 5-10 part boric acid, 2-3 part sodium benzoate stirs;
(5) mentioned solution is cooled to room temperature, adds remaining (200-240 part) * 35% of described ethanol, stirred 10-20 minute;
(6) will appeal and add micro-water-soluble sodium rhodanate in solution, stir.
Advantage of the present invention: compare with conventional art, just be that it provides a kind of novel decontamination method, when using, only need pour out a bit and wipe on the face, will infiltrate very soon skin, just form thin film about 15 seconds, with both hands rubbing gently, the dirt that infiltrates skin will split away off with film, need to not make the wipings such as water cleaning or towel, skin without injury, is used and very convenient to carry.
The present invention is described in detail below in conjunction with embodiment.
Embodiment 1: first add 7 parts of glycerol, 12 parts of spice in reactor, and 380 parts of Purified Waters, the use revolution is the agitator of 70 rev/mins, stirs 13 minutes; To add 90 parts of polyvinyl alcohol in mentioned solution, be warming up to 100 ℃, kept temperature 50 minutes, all melt to polyvinyl alcohol; Pour mentioned solution into retort, keep 80 ℃ of temperature, add 220 parts * 65% ethanol, stirred 12 minutes; Keep in described retort 80 ℃ of solution temperatures, add 8 parts of boric acid, 2.5 parts of sodium benzoate stir; Mentioned solution is cooled to room temperature, adds described ethanol remaining 220 parts * 35%, stirred 12 minutes; To appeal and add micro-water-soluble sodium rhodanate in solution, stir, the bottling packing.

Claims (1)

1. disposable facial film, it is characterized in that: it is comprised of following ingredients:
Figure FSA00000630905500011
CN 201110404127 2011-12-07 2011-12-07 Wash-free mask Pending CN103142421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201110404127 CN103142421A (en) 2011-12-07 2011-12-07 Wash-free mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201110404127 CN103142421A (en) 2011-12-07 2011-12-07 Wash-free mask

Publications (1)

Publication Number Publication Date
CN103142421A true CN103142421A (en) 2013-06-12

Family

ID=48540941

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201110404127 Pending CN103142421A (en) 2011-12-07 2011-12-07 Wash-free mask

Country Status (1)

Country Link
CN (1) CN103142421A (en)

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Legal Events

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C06 Publication
PB01 Publication
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20130612