CN103118856A - Method for producing elongate material having embossed pattern - Google Patents

Method for producing elongate material having embossed pattern Download PDF

Info

Publication number
CN103118856A
CN103118856A CN2012800004016A CN201280000401A CN103118856A CN 103118856 A CN103118856 A CN 103118856A CN 2012800004016 A CN2012800004016 A CN 2012800004016A CN 201280000401 A CN201280000401 A CN 201280000401A CN 103118856 A CN103118856 A CN 103118856A
Authority
CN
China
Prior art keywords
microscler material
embossing cylinder
microscler
mentioned
embossing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN2012800004016A
Other languages
Chinese (zh)
Other versions
CN103118856B (en
Inventor
神谷昌宏
神谷幸庆
铃木康之
安川直孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ACT Co Ltd
Original Assignee
ACT Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=45782001&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN103118856(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by ACT Co Ltd filed Critical ACT Co Ltd
Publication of CN103118856A publication Critical patent/CN103118856A/en
Application granted granted Critical
Publication of CN103118856B publication Critical patent/CN103118856B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06CFINISHING, DRESSING, TENTERING OR STRETCHING TEXTILE FABRICS
    • D06C23/00Making patterns or designs on fabrics
    • D06C23/04Making patterns or designs on fabrics by shrinking, embossing, moiréing, or crêping

Abstract

Provided is a method for producing an elongate material such that an embossed pattern is formed on the surface of the elongate material by passing the elongate material between a heated embossing roll and a receiving roll, and pressing projections protruding from a base surface of the embossing roll onto the elongate material. When the elongate material passes through the embossing roll, the base surface of the embossing roll is kept from contacting the surface of the elongate material, thus enabling an embossed pattern to be efficiently formed on a sheet cloth surface without defects caused by contact with the high temperature heated roll.

Description

Manufacture method with microscler material of pattern of indentations
Technical field
With plane raw material and be used for other industry materials, and its surface has the manufacture method of the microscler material of relief pattern (pattern of indentations) about the seat of automobile, rolling stock, aircraft, furniture etc. in the present invention.
Background technology
The plane raw material of seat of applicable automobile etc., can be such as take thermoplastic resin fiber etc. as material weave cotton cloth or adhesive-bonded fabric etc. on, form various styles or pattern.
In recent years, due to the raising of echoing the requirement of the quality of the plane raw material of this kind and intention etc., in order to promote the characteristic of these goods, used in plane raw material surface and formed pattern of indentations, with the goods of additional sense of touch or intention.
The embossing processing of in the past plane raw material being carried out, both of the embossing cylinder that heats and the pressure bowl with tabular surface, pressing with suitable pressure on one side and making its rotation on one side, allow plane raw material by between two cylinders, allow the embossing cylinder be pressed on plane former charge level, to give pattern of indentations.
Patent documentation 1(JP 2007-276285 communique for example) in, the heating-up temperature of having put down in writing embossing cylinder and pressure bowl (hot cylinder) is all the manufacture method of the plane raw material of vehicular seats of 100 ℃~250 ℃.
The look-ahead technique document
Patent documentation 1: JP 2007-276285 communique
Yet, embossing cylinder after heating is high temperature very, if and to form deep pattern of indentations on as the plane raw material of material, and can produce easily because of contacting between plane raw material and embossing cylinder, cause dissolving or the problem of damage etc. of plane raw material surface.
In other words, if the embossing cylinder after order heating contacts with each other (Surface Contact) with plane raw material surface, give heat affecting, can be created in the problem that gloss that pleasure sees or variable color, fold appear in plane raw material surface.
Summary of the invention
The objective of the invention is in order to solve above-mentioned existing problem, provide can not produce by with high-temperature heating after the thermo-contact of embossing cylinder and the defective that causes, just can form pattern of indentations on the surface of microscler material, and the microscler material manufacturing method with pattern of indentations of superior quality, aesthetic property.
(1) the microscler material manufacturing method with pattern of indentations of the present invention, it is characterized in that, between embossing cylinder and pressure bowl thereof after making microscler material by heating, the protuberance that forms with the basal surface that vertically is built in above-mentioned embossing cylinder, push microscler material surface, thereby at microscler material surface forming section recess, when microscler material passed through above-mentioned embossing cylinder, the basal surface of above-mentioned embossing cylinder did not touch microscler material surface.
(2) the microscler material manufacturing method with pattern of indentations of the present invention, it is characterized in that, in the manufacture method of above-mentioned (1) microscler material, between basal surface with the above-mentioned microscler material surface of irradiation and embossing cylinder, whether contact with microscler material surface with the basal surface of confirming above-mentioned embossing cylinder.
(3) the microscler material manufacturing method with pattern of indentations of the present invention, it is characterized in that, in the manufacture method of above-mentioned (1) microscler material, measure the value by the embossing cylinder after above-mentioned heating and the microscler material surface glossiness between pressure bowl thereof, compare with above-mentioned mensuration gloss value by front microscler material surface, whether the basal surface that detects above-mentioned embossing cylinder contacts with microscler material surface.
(4) the microscler material manufacturing method with pattern of indentations of the present invention, it is characterized in that, in above-mentioned (1)~(3) in any one, at light projector setting up and down and the light-receiving device by the embossing cylinder after above-mentioned heating and the microscler material between pressure bowl thereof, detect on the embossing processing department pin hole whether occurs.
Description of drawings
Fig. 1 is the Embosser key diagram relevant to embodiment 1.
Fig. 2 is applicable to the embossing cylinder of the Embosser relevant to embodiment 1 and the key diagram of pressure bowl.
Fig. 3 is the Embosser key diagram relevant to embodiment 2.
Fig. 4 is applicable to the embossing cylinder of the Embosser relevant to embodiment 2 and the key diagram of pressure bowl.
Fig. 5 is the embossing processing spec figure in the Embosser relevant to embodiment 2.
Fig. 6 is the embossing processing spec figure in the Embosser relevant to embodiment 2.
Description of reference numerals: 10-is applicable to the Embosser of embodiment 1; 11-embossing cylinder; The slightly cylindric protuberance of 11a-(protuberance); The 11b-basal surface; The 12-pressure bowl; 13,14-tension roller; The 15-winding drum; 16-backrush cylinder; 17,18-mirror surface luster analyzer; The 19-light projector; The 19a-light-receiving device; 20-is applicable to the Embosser of embodiment 2; The 21-light projector; The 22-light-receiving device; The microscler material of S-; The thickness of T, the microscler material of T1-; The thickness of T2-recess.
The specific embodiment
The relevant microscler material manufacturing method with pattern of indentations of this example is that when making microscler material by the embossing cylinder, the basal surface of embossing cylinder does not contact with microscler material surface.
In other words, it is a kind of microscler material to be supplied between embossing cylinder and pressure bowl thereof after heating, pushing vertically is built in the protuberance of the rolling drum surface of above-mentioned embossing cylinder, thereby the manufacture method at the microscler material of microscler material surface forming section recess, when being microscler material by above-mentioned embossing cylinder, the basal surface of above-mentioned embossing cylinder does not contact the structure of microscler material surface.
Thereby, can not produce with high-temperature heating after the defective (Surface Contact) that causes of the thermo-contact of embossing cylinder, can be provided at the microscler material that microscler material surface forms pattern of indentations attractive in appearance, intention excellence.
Microscler material is the plane raw material that is applicable to coat the seats such as automobile, rolling stock, aircraft, furniture, and these plane raw materials have weaving cotton cloth or adhesive-bonded fabric etc. take thermoplastic resins such as polyurethane, polyester, nylon, propylene as material.
Moreover, also can use to make the integrated lamination sheet materials of lamination such as these and polyurethane foam, or with composite wood of the integrated gained of fibrous substrate lamination of synthetic leather or the formed surfacing of synthetic fibers and polyurethane foam or wool felt etc. etc.
The embossing cylinder for example can be the metal-made that applies with the paired electroplating surface of the pressure bowl of being located at Embosser, possesses the form of heater in its cylinder inside.The diameter of cylinder of its basal surface (A) is 100mm~700mm, has a plurality of slightly cylindric protuberance that protrudes from the diameter (D) of basal surface with certain height (H) to be arranged as on its rolling drum surface specific interval (L) (with reference to Fig. 2) is arranged each other.
Be applicable to the metal material of embossing cylinder, such as steel, cast iron, copper, aluminium alloy, stainless steel etc. arranged.Wherein again with steel and cast iron, because the reason such as the formative of protuberance is better in the etching method of cylinder is comparatively desirable.
The manufacture method of embossing cylinder for example can be will apply light-sensitive surface at cylindric rolling drum surface, after exposure, keeping to impregnated in for a long time to melt in etching solution does not need the partly step of (part except protuberance), thereby is formed at the shape of the slightly columned protuberance of vertically setting up on the cylinder basal surface.
Moreover, also can be radium-shine or the processing method such as cutting be formed at the protuberance of vertically setting up on the cylinder basal surface.
Pressure bowl is the basal surface with respect to the embossing cylinder, interval specific interval (C) and configuring, its rolling drum surface is for cylindric without the diameter with tabular surface (B) of protuberance, except the metal-mades such as steel or stainless steel, aluminium alloy, also can consist of (with reference to Fig. 2) by the hard resin systems such as pi or the institutes such as silica gel, paper.
Embosser with embossing cylinder and pressure bowl, can be such as the embossing cylinder that vertically sets up protuberance and two cylinders such as pressure bowl with tabular surface, make its rotation with specified pressure while pushing, make tool specific thicknesses (T) microscler material or with the composite wood of microscler material, between two cylinders, make the protuberance of embossing cylinder be urged to microscler material surface, use at microscler material surface and form pattern of indentations.
The glossiness of the microscler material after embossing processing, for example mirror surface luster-the assay method (JIS-Z-8741) of JIS (JIS) defined is measured.Mirror surface luster be the incidence angle stipulated to the light beam at test portion face incident predetermined hole diameter angle, reflex to the light beam at the predetermined hole diameter angle of mirror-reflection direction with the light-receiving device measurement, thereby obtain.At this so-called gloss, be defined as " according to the selective directional characteristic on surface, the bright of object reflects in the visual outward appearance in its surface ", glossiness is the index that this phenomenon value is quantized.
Mensuration is through the Grossmeters of the glossiness of the microscler material of embossing processing, can be the light source of JIS-Z-8741 defined and as the mirror surface luster determinator of light-receiving device etc., is disposed at separately entering end and going out end of embossing cylinder and pressure bowl.
The Embosser that possesses embossing cylinder and pressure bowl has for microscler material being supplied to tension roller or the winding drum of using between these cylinders, can control the tension force that is additional to microscler material.
Moreover, utilize the heater be located at the embossing cylinder, can be with the Temperature Setting of embossing cylinder in particular range.
Such as above-mentioned, the temperature that microscler material is loaded, pressure, process velocity etc. can according to the measured value of utilizing the obtained embossing of glossiness determinator to process front and back, be adjusted.
The embossing cylinder is the embossing cylinder that is applicable to the manufacture method of microscler material, in order not allow the basal surface of embossing cylinder contact microscler material surface (Surface Contact), with the space (gap) of the basal surface of the surface of the microscler material of the basal surface subtend of embossing cylinder and embossing cylinder, more than being set as 0.5mm.
Thereby, carrying out embossing with the microscler material of protuberance pushing of the embossing cylinder after heating and add man-hour, the basal surface of embossing cylinder can not touch microscler material surface.
Therefore, can prevent that microscler material surface is subject to heat affecting and dissolves or thermal metamorphism, thereby cause the deteriorated of quality or intention.
Moreover, the plane raw material of nearest seat, the thicker person of thickness (0.5~1.2mm left and right), fluffing material, braiding material etc. have been adopted, moreover, in order to extend life expectancy, be hopeful to be formed at the darker demand of pattern of indentations recess of plane raw material, form pattern of indentations if want on these plane raw materials, the basal surface of embossing cylinder can be easier and dried rhizome of rehmannia Surface Contact, but by control gap, can positively avoid the problem of these Surface Contacts.
Moreover, in the manufacture method of the microscler material of this example, a wherein side (supply side) by above-mentioned microscler material during by above-mentioned embossing cylinder, space irradiation light to the basal surface of above-mentioned microscler material surface and embossing cylinder, can confirm to pass through the light in this space at the other end, whether contact with microscler material surface with the basal surface of detecting above-mentioned embossing cylinder.In addition, the above-mentioned light that goes out end at the embossing cylinder confirms, can be by the operator with Visual Confirmation, but also can receive above-mentioned irradiation light by light-receiving device, can confirm more reliably.
Thereby, in the Embosser running, can effectively remove the heat affecting of giving microscler material via basal surface.
Moreover, in the manufacture method of the microscler material of this example, measure the value by the embossing cylinder after above-mentioned heating and the microscler material surface glossiness between pressure bowl thereof, compare with the value of the above-mentioned glossiness of measuring by front microscler material surface, whether the basal surface that can detect above-mentioned embossing cylinder contacts with microscler material surface.
Thereby, also can for example utilize above-mentioned embossing cylinder and pressure bowl, adjust temperature, pressure, process velocity that above-mentioned microscler material is loaded, make the glossiness of the microscler material surface of being discharged by above-mentioned embossing cylinder and above-mentioned pressure bowl, the microscler material surface glossiness front with embossing processing equates.
Such as above-mentioned, the embossing cylinder after can preventing from efficiently heating contacts dissolving of producing or the defective such as burns with microscler material, the manufacture method of the microscler material of excellent quality is provided.
Moreover, in the manufacture method of the microscler material of this example, also can be by the embossing cylinder after above-mentioned heating and microscler material light projector setting up and down and light-receiving device between pressure bowl, detecting embossing processing department has free of pinholes to produce.Thereby, can be rapidly and confirm efficiently the pin hole on microscler material after embossing processing.
In addition, the glossiness of the microscler material surface of upper note and pin hole confirmation can be by the operator with direct Visual Confirmations.Discover abnormal operator this moment, but the change of operating operation dish is created conditions.
(embodiment 1)
Below will according to drawing, embodiments of the invention 1 be described more specifically.
As shown in Figure 1, the Embosser 10 of the manufacture method of the applicable microscler material of the present invention is to possess: embossing cylinder 11 and pressure bowl 12 thereof, its be from above-below direction on one side cramping as the microscler material S of seat with plane raw material, Yi Bian carry out the embossing processor; Tension roller 13,14, it is located at respectively on cylinder dirty, microscler material S applied tension force on one side make its traveling between cylinder on one side; Winding drum 15; Light projector 19, it is used for the microscler fault in material after the processing of detecting embossing; And light-receiving device 19a.
In be located at these cylinders driving be the heaters such as heater of system or embossing cylinder 11, controlled by not shown control device.
At this, the feed speed of microscler material S is per minute 0.5~10m if make seat with plane raw material, and making furniture is per minute 2~19m with plane raw material, is supplied between cylinder.
Moreover, be supplied to supply side and the outlet side of the microscler material S of embossing cylinder 11, pressure bowl 12, be provided with the mirror surface luster analyzer 17,18 according to JIS-Z-8741, the glossiness of the microscler material S before and after embossing processing is read to control device.
As shown in Figure 2, embossing cylinder 11 is set as specified temp by the interior heater of establishing, and for example the cast iron of the scope of 180~215 ℃ cylinder processed, arrange most cancellate slightly cylindric protuberance 11a on its rolling drum surface.
Pressure bowl 12 be at least its rolling drum surface by silica gel institute's coating or by the formed cylinder of silica gel, relative with the basal surface of embossing cylinder 11 and configure.
Between embossing cylinder 11 and pressure bowl 12, via tension roller 13,14, backrush cylinder 16, supply with microscler material S.
Therefore, in the embossing cylinder 11 of the present embodiment, the space (K) with the basal surface of the microscler material surface of embossing cylinder basal surface subtend and embossing cylinder is set as K>0.
As shown in Figure 1, light projector 19, light-receiving device 19a are with the microscler material S after the irradiation embossing processing such as visible light or infrared ray, detected the testing fixture of the use of the microscler faults in material such as pin hole by the data of light-receiving device 19a, microscler material with respect to from discharging between embossing cylinder 11 and pressure bowl 12 is arranged at it and is up and down a pair of position.
Thus, can really and promptly carry out qualitative control in Embosser 10 runnings.
(embodiment 2)
The Embosser 20 that embodiment 2 is suitable for as shown in Figure 3, is on the Embosser 10 that embodiment 1 is suitable for, light projector 21 and the light-receiving device in the space of the basal surface 11b of additional detecting microscler material S surface and embossing cylinder 11.
In other words, the space (gap) of the basal surface 11a of microscler material S surface and embossing cylinder 11 utilizes the light of light projector 21 irradiation space detecting use, can light-receiving device 22 detects the light that oneself goes out to hold space thus to spill.
Thereby, the basal surface 11b that can judge embossing cylinder 11 whether with microscler material S Surface Contact, thereby suppress the heat affecting to microscler material surface that the embossing cylinder 11 after heating causes, significantly improve its quality and intention.
At this, as shown in (a) figure of Fig. 4, Fig. 5, light projector 21 and light-receiving device 22 are disposed at the direction of advance of the microscler material S that is supplied to, but as also can be as shown in (b) figure of Fig. 5, be disposed at the cylinder width, also the i.e. direction rectangular with direction of advance.
Such as above-mentioned, the basal surface 11b of microscler material S surface and embossing cylinder 11 contacts, and can utilize light-receiving device 22 to judge irradiation light from light projector 21.
In addition, Fig. 6 is the key diagram when there is no the space between basal surface 11b and microscler material S surface, the figure illustrates by the additional heat affecting of the 11 couples of microscler material S of embossing cylinder after heating and obviously aggravates.
At this, table 1 is the microscler material that shows different-thickness, use embossing cylinder protuberance height to carry out embossing as the cylinder of 1.5mm and add man-hour, irradiation light between basal surface 11b from a side wherein toward microscler material S surface and embossing cylinder during by the embossing cylinder, confirm to be subjected to light the opposing party, be determined at entering end and going out the result of the glossiness variation of end of embossing cylinder.
Embodiments of the invention 1~13 have shown according to microscler material S material glossiness and have presented various different numerical value, but glossiness is all unchanged before and after processing.
On the other hand, as a comparative example, when having shown by the embossing cylinder, carry out embossing from a side wherein toward irradiation light between the basal surface of microscler material surface and embossing cylinder and add man-hour, in the opposing party (the going out to hold of embossing cylinder) and the situation that is subjected to light unconfirmed, as can be known, the glossiness after embossing processing rises in comparative example 1~4.
This may be because microscler material contacts or approached the embossing cylinder, makes microscler material surface be subject to the cause of heat affecting.
[table 1]
Figure BDA00001772377000081
Figure BDA00001772377000091
In addition, in the present embodiment, the microscler material S surface gloss before and after embossing processing is according to JIS-Z-8741 mirror surface luster assay method, measures with light source radiating angle 45 degree.
Touch the microscler material S part of the embossing cylinder 11 after heating, because glossiness increases, so can judge whether to contact with rolling drum surface.
(effect of invention)
According to the microscler material manufacturing method with pattern of indentations of the present invention, when microscler material passes through the embossing cylinder, the basal surface of embossing cylinder can not touch microscler material surface, therefore due to the tabular surface around the recess of the formed pattern of indentations of embossing cylinder protuberance, can not touch the high-temperature heating face of embossing cylinder.
Therefore, can prevent effectively that microscler material surface that the embossing machining brings is subject to heat affecting and causes the defectives such as glossiness is deteriorated to occur, with the microscler material of the high-quality pattern of indentations of low cost fabrication.
(utilizability on industry)
As described above, manufacture method with microscler material of pattern of indentations of the present invention, the basal surface of the embossing cylinder after order heating do not contact with the microscler material surface of processing (Surface Contact), thereby can avoid the bad generation of plane material quality that causes because of heat affecting, utilize possibility high on industry.

Claims (4)

1. manufacture method with microscler material of pattern of indentations, it is characterized in that, between embossing cylinder and pressure bowl thereof after making microscler material by heating, the protuberance that forms with the basal surface that vertically is built in above-mentioned embossing cylinder, push microscler material surface, thereby at microscler material surface forming section recess, when microscler material passed through above-mentioned embossing cylinder, the basal surface of above-mentioned embossing cylinder did not touch microscler material surface.
2. the manufacture method with microscler material of pattern of indentations as claimed in claim 1, it is characterized in that, between basal surface with the above-mentioned microscler material surface of irradiation and embossing cylinder, whether contact with microscler material surface with the basal surface of confirming above-mentioned embossing cylinder.
3. the manufacture method with microscler material of pattern of indentations as claimed in claim 1 or 2, it is characterized in that, measure the value by the embossing cylinder after above-mentioned heating and the microscler material surface glossiness between pressure bowl thereof, compare with above-mentioned mensuration gloss value by front microscler material surface, whether the basal surface that detects above-mentioned embossing cylinder contacts with microscler material surface.
4. the manufacture method with microscler material of pattern of indentations as described in any one in claims 1 to 3, it is characterized in that, at light projector setting up and down and the light-receiving device by the embossing cylinder after above-mentioned heating and the microscler material between pressure bowl thereof, detect on the embossing processing department pin hole whether occurs.
CN201280000401.6A 2011-09-12 2012-03-12 There is the manufacture method of the elongated shaped materials of pattern of indentations Active CN103118856B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-198441 2011-09-12
JP2011198441A JP4878660B1 (en) 2011-09-12 2011-09-12 Method for producing long material having embossed pattern
PCT/JP2012/056329 WO2013038731A1 (en) 2011-09-12 2012-03-12 Method for producing elongate material having embossed pattern

Publications (2)

Publication Number Publication Date
CN103118856A true CN103118856A (en) 2013-05-22
CN103118856B CN103118856B (en) 2016-08-17

Family

ID=45782001

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280000401.6A Active CN103118856B (en) 2011-09-12 2012-03-12 There is the manufacture method of the elongated shaped materials of pattern of indentations

Country Status (3)

Country Link
JP (1) JP4878660B1 (en)
CN (1) CN103118856B (en)
WO (1) WO2013038731A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108642787A (en) * 2018-03-23 2018-10-12 宁波希奇服饰有限公司 A kind of cloth salient point pattern forming equipment
CN111826870A (en) * 2019-04-17 2020-10-27 丰田纺织株式会社 Skin article and method of making same

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106922139A (en) * 2014-11-18 2017-07-04 住江织物株式会社 Seat skin material, the manufacture method of seat skin material and knurling rolls
JP6741406B2 (en) * 2015-07-30 2020-08-19 株式会社タチエス Vehicle seat and manufacturing method thereof
JP7099148B2 (en) 2018-08-01 2022-07-12 トヨタ紡織株式会社 Manufacturing method of skin material
JP2020142402A (en) * 2019-03-04 2020-09-10 セーレン株式会社 Embossment processing mold, embossment processing device, and embossment processing method
JP2020142403A (en) * 2019-03-04 2020-09-10 セーレン株式会社 Decorative sheet
CN112127084A (en) * 2020-09-16 2020-12-25 浙江周氏新材料股份有限公司 Processing equipment for embossed decorative sofa fabric

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0489228A (en) * 1990-08-02 1992-03-23 Nissan Motor Co Ltd Embossing method for resin sheet
US20010024710A1 (en) * 1997-05-16 2001-09-27 Ronan John B. Polymeric integral net
JP2007276285A (en) * 2006-04-07 2007-10-25 Suminoe Textile Co Ltd Skin material for seat of vehicle having uneven pattern and method for manufacturing the same
JP2007296841A (en) * 2006-03-30 2007-11-15 Dainippon Printing Co Ltd Embossing apparatus
US20080122129A1 (en) * 2004-08-13 2008-05-29 Pekka Koivukunnas Embossing Device And A Method For Adjusting The Embossing Device
JP2010138529A (en) * 2008-12-15 2010-06-24 Kao Corp Method for producing nonwoven fabric

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3094650B2 (en) * 1992-05-07 2000-10-03 東レ株式会社 Embossing roll
JP2003326598A (en) 2002-05-09 2003-11-19 Suminoe Textile Co Ltd Skin material having concavo-convex pattern and method for manufacturing the same
JP4557135B2 (en) 2004-03-17 2010-10-06 アキレス株式会社 Seat material for seat
JP4853786B2 (en) 2007-03-07 2012-01-11 Tbカワシマ株式会社 Cut pile fabric and pattern processing

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0489228A (en) * 1990-08-02 1992-03-23 Nissan Motor Co Ltd Embossing method for resin sheet
US20010024710A1 (en) * 1997-05-16 2001-09-27 Ronan John B. Polymeric integral net
US20080122129A1 (en) * 2004-08-13 2008-05-29 Pekka Koivukunnas Embossing Device And A Method For Adjusting The Embossing Device
JP2007296841A (en) * 2006-03-30 2007-11-15 Dainippon Printing Co Ltd Embossing apparatus
JP2007276285A (en) * 2006-04-07 2007-10-25 Suminoe Textile Co Ltd Skin material for seat of vehicle having uneven pattern and method for manufacturing the same
JP2010138529A (en) * 2008-12-15 2010-06-24 Kao Corp Method for producing nonwoven fabric

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108642787A (en) * 2018-03-23 2018-10-12 宁波希奇服饰有限公司 A kind of cloth salient point pattern forming equipment
CN111826870A (en) * 2019-04-17 2020-10-27 丰田纺织株式会社 Skin article and method of making same
US11840053B2 (en) 2019-04-17 2023-12-12 Toyota Boshoku Kabushiki Kaisha Skin material and method for producing the same

Also Published As

Publication number Publication date
CN103118856B (en) 2016-08-17
JP2013059881A (en) 2013-04-04
JP4878660B1 (en) 2012-02-15
WO2013038731A1 (en) 2013-03-21

Similar Documents

Publication Publication Date Title
CN103118856A (en) Method for producing elongate material having embossed pattern
US10954636B2 (en) Disposable towel produced with large volume surface depressions
US10083253B2 (en) Method for producing a set of cooperating embossing rollers
US10766184B2 (en) Seat covering material, method for manufacturing the seat covering material, and embossing roll
US9821509B2 (en) Method and device for producing an interior covering part
US20100224612A1 (en) Sheet heating element
KR102025343B1 (en) Embossed Release Paper for Synthetic Leather
JP2007276285A (en) Skin material for seat of vehicle having uneven pattern and method for manufacturing the same
CN108430752B (en) Extrusion pad for hydraulic hot press and method of manufacturing the same
JP2014070321A (en) Method for simultaneously developing color according to embossing process
CN102099181A (en) Device and method for gluing two or more paper webs or plies
US20030227099A1 (en) Embossing rainbow and hologram images
CN113862947A (en) Preparation method of embossed fabric
KR101062194B1 (en) Fabric Lamiembo Device
KR101447649B1 (en) Partial luster I, who I have printing pattern printing fabric and the manufacture method
KR102082633B1 (en) Thermally embossed fleece and method of manufacturing the same
US20200376742A1 (en) Emboss Fabrication Apparatus And Emboss Fabrication Method
EP0733477B1 (en) Methods of forming materials for upholstery use
KR101661122B1 (en) Manufacturing method of functional material having optical illusion
JP6327949B2 (en) Processing method of fiber fabric
EP3723984A1 (en) Textured printable nonwoven media
JPS63134223A (en) Formation of embossed pattern for non-rigid polyvinyl chloride resin sheet
JP6831546B1 (en) Vehicle interior materials and their manufacturing methods
KR101378876B1 (en) Manufacturing method for fabric of moire patten
CN102099180A (en) Device and method for coupling two or more paper webs or plies by gluing

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant