CN103112861A - Siemens joint producing technology for preparing silane through DCS (Distributed Control System) disproportionation - Google Patents
Siemens joint producing technology for preparing silane through DCS (Distributed Control System) disproportionation Download PDFInfo
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Abstract
The invention provides a siemens joint producing technology for preparing silane through DCS (Distributed Control System) disproportionation. According to the siemens joint producing technology, a disproportionation unit (6), a silane product distillation unit (7) and a dichlorosilane distillation unit (8) are connected to the rear surface of a reduction distillation unit (5) in an improved siemens technology for preparing polycrystalline silicon; the high-purity dichlorosilane gained by the reduction distillation unit (5) is fed into the disproportionation unit (6) to accept the disproportionation; an intermediate product of the silane, produced in the disproportionation, is fed into the silane product distillation unit (7) to be distilled and purified so as to obtain a high-purity silane product; the rest mixed chlorosilane is fed into the dichlorosilane distillation unit (8) to be recycled; low-boiling-point substances such as dichlorosilane obtained by being separated by the dichlorosilane distillation unit (8) are returned to the disproportionation unit (6) to be continuously treated by the disproportionation; and the trichlorosilane and little silicon tetrachloride are returned to the reduction distillation unit (5) to be purified. By adopting the siemens joint producing technology, the joint production of the polycrystalline silicon under the siemens process and the silane under the chlorosilane disproportionation is realized, the closed cycle of the materials is realized, the utilization rate of the device is increased, the cost of investment is reduced, and the diversification of enterprise products also can be realized.
Description
Technical field
The present invention relates to the production technique of a kind of high purity silane (SiH4), particularly relate to the production technique of DCS disproportionation silane processed and Siemens Method coproduction.The raw material of wherein producing silane can be produced the reduction tail gas of polysilicon from Siemens Method and effectively recycle.
Background technology
Silane (SiH4), English name: silane is a kind of important silicon source material, can be used for producing the industries such as highly purified electronic-grade polycrystalline silicon, LOW-E coated glass and flat-panel monitor.
At present, the method for production silane mainly contains three kinds: sodium aluminum fluoride method, Si-Mg alloy method and chlorosilane discrimination method.The sodium aluminum fluoride method technique that Chinese patent CN101531367 introduces is that sodium aluminum hydride solution is successively through the first reactor and the second reactor, the tetrafluoride gas SiClx is passed through described the second reactor and the first reactor successively, two kinds of raw material backward feeds, reaction obtains silane gas.Yet the silicon tetrafluoride raw material in this method contains the impurity such as sulfurous gas, and therefore the purifying more complicated of raw material is difficult to obtain highly purified product.The Si-Mg alloy method is take industrial silica fume, MAGNESIUM METAL and ammonium chloride as raw material, make silane through two-step reaction, but cost is higher, accomplishes scale production and has any problem.The chlorosilane discrimination method is that chlorosilane is obtained silane through the multistep disproportionation reaction, and this operational path is shorter, and the silane product purity that obtains is high.
At present, the production of polysilicon mainly contains improved Siemens and two kinds of techniques of silane thermal decomposition process, and reduction obtains polysilicon take high-purity trichlorosilane and silane as raw material respectively, global polysilicon ultimate production be all to adopt improved Siemens to produce more than 80%.Yet in the method technique of improvement west door, a large amount of dichloro-dihydro silicon of reaction process meeting by-product, be unfavorable for the carrying out of main technique, and can't obtain highly purified polysilicon; Existing silane rule exists single flow process loaded down with trivial details, the shortcomings such as investment risk height.The present invention proposes the method that by-product dichloro-dihydro silicon coproduction in a kind of improved Siemens prepares high purity silane, utilizes a large amount of dichloro-dihydro silicon that in improved Siemens, in reaction process, by-product generates, and prepares high purity silane through disproportionation reaction.The present invention's uncorrelated two kinds of production of polysilicon techniques originally integrates, compare with two kinds of single production technique, both can keep the production of polysilicon scale by originally ripe improved Siemens, can utilize again the high-purity dichloro-dihydro silicon without direct utility value of improveing by-product in the method for west door, co-producing high-purity silane, and then obtain distinguishing molten level polysilicon.Novel process has reduced the production cost of simple improved Siemens technique and simple silane thermal decomposition process technique, has improved quality product, has evaded simultaneously operation and the investment risk of scale operation silane.
Summary of the invention
The invention solves the purity problem of producing in silane method, and a kind of siemens's joint process of silane processed is provided.Utilize the dichloro-dihydro silicon disproportionation coproduction silane of by-product in siemens's reduction furnace tail gas, obtain high-purity silane product through purifying.
Disproportionation reaction involved in the present invention has:
2SiH
2Cl
2=SiH
3Cl+SiHCl
3
2SiH
3Cl=SiH
4+SiH
2Cl
2
The present invention utilizes the dichloro-dihydro silicon of by-product to carry out coproduction silane on the basis of improved Siemens technique.Traditional improved Siemens technique mainly is comprised of hydrogenation unit, rectifying and anti-disproportionation unit, trichlorosilane reduction unit, reduction tail gas recycle unit, reduction rectification cell.The raw material such as silica flour and silicon tetrachloride is produced mixed chlorosilane through hydrogenation unit reaction, and mixed chlorosilane enters rectifying and anti-disproportionation unit carries out rectification and purification, obtains high-purity trichlorosilane and supplies with the trichlorosilane reduction unit and carry out reduction reaction and produce polysilicon.Reduction tail gas reclaims through reduction tail gas recycle unit and obtains reducing the dry back rewinding, the chlorosilane that reclaims enters the reduction rectification cell to be separated the high-purity trichlorosilane that obtains and returns to the trichlorosilane reduction unit, the silicon tetrachloride that reclaims is got back to hydrogenation unit, the dichloro-dihydro silicon that reclaims directly drip washing process or return rectifying and anti-disproportionation unit is converted into the trichlorosilane recycle.
Coproduction silane process of the present invention mainly is comprised of hydrogenation unit, rectifying and anti-disproportionation unit, trichlorosilane reduction unit, reduction tail gas recycle unit, reduction rectification cell, disproportionation reaction unit, silane product rectification cell, dichloro-dihydro silicon rectification cell.Increase disproportionation reaction unit, silane product rectification cell, dichloro-dihydro silicon rectification cell on former improved Siemens technique basis.After in improved Siemens technique, in the trichlorosilane reduction unit, the dichloro-dihydro silicon of by-product separates through reduction tail gas recycle unit no longer directly drip washing process or return rectifying and anti-disproportionation unit is converted into the trichlorosilane recycle, carry out disproportionation reaction but enter the disproportionation reaction unit.The silane intermediates that disproportionation reaction is produced enter the silane product rectification cell, obtain high-purity silane product through rectification and purification, remaining chlorosilane enters dichloro-dihydro silicon rectification cell and recycles, dichloro-dihydro silicon rectification cell separates the low-boiling-point substances such as dichloro-dihydro silicon obtain and returns to the disproportionation reaction unit and proceed disproportionation reaction, and trichlorosilane and a small amount of silicon tetrachloride return to the reduction rectification cell and purify.
Concrete technical scheme of the present invention is:
siemens's joint process of DCS disproportionation silane processed is to prepare the back connection of polysilicon process reduction rectification cell (5) disproportionation reaction unit (6), silane product rectification cell (7) and dichloro-dihydro silicon rectification cell (8) at improved Siemens, high-purity dichloro-dihydro silicon that reduction rectification cell (5) obtains enters disproportionation reaction unit (6) and carries out disproportionation reaction, the silane intermediates that disproportionation reaction is produced enter silane product rectification cell (7), obtain high-purity silane product through rectification and purification, remaining mixed chlorosilane enters dichloro-dihydro silicon rectification cell (8) and recycles, the low-boiling-point substances such as dichloro-dihydro silicon that the separation of dichloro-dihydro silicon rectification cell obtains return to disproportionation reaction unit (6) and proceed disproportionation reaction, trichlorosilane and a small amount of silicon tetrachloride return to reduction rectification cell (5) and purify.
Siemens's joint process step of DCS disproportionation silane processed is as follows:
1) raw material is sent into hydrogenation unit (1) reaction and obtained mixed chlorosilane;
2) mixed chlorosilane obtains high-purity trichlorosilane products by rectifying and anti-disproportionation unit (2), and silicon tetrachloride returns to hydrogenation unit (1) and continues reaction;
3) high-purity trichlorosilane products of rectifying and anti-disproportionation unit (2) acquisition enters trichlorosilane reduction unit (3) and produces polysilicon;
4) tail gas of trichlorosilane reduction unit (3) generation through reduction tail gas recycle unit (4), reclaims and obtains the rewinding of chlorosilane reduction dry back;
5) the chlorosilane reduction dry back rewinding that obtains being carried out component through reduction rectification cell (5) separates, the high-purity trichlorosilane products that reclaims returns to trichlorosilane reduction unit (3) and continues reaction, high-purity dichloro-dihydro silicon enters the disproportionation reaction unit, and silicon tetrachloride returns to hydrogenation unit (1);
High-purity dichloro-dihydro silicon that 6) will obtain enters disproportionation reaction unit (6) and carries out disproportionation reaction production silane intermediates;
7) the silane intermediates of the step 6) method being produced are purified by silane product rectification cell (7) and are obtained high-purity silane product, and tower reactor obtains mixed chlorosilane;
8) mixed chlorosilane that step 7) is obtained enters dichloro-dihydro silicon rectification cell (8) to be separated, the dichloro-dihydro silicon that reclaims and chlorine three hydrogen silicon return to disproportionation reaction unit (6) and proceed disproportionation reaction, and the trichlorosilane of recovery and a small amount of silicon tetrachloride return to reduction rectification cell (5) and purify.
Joint process of the present invention has the following advantages:
(1) the present invention compares with traditional single Siemens Method or single chlorosilane discrimination method, has integrated Siemens process and chlorosilane disproportionation processes, realizes the closed cycle of two single techniques.When not affecting Siemens Method production polysilicon, carry out the preparation of silane, improved the utilization ratio of device of Siemens process, reduce cost of investment, can realize again the diversification of enterprise product.
(2) the present invention separates rear the discharge with the dichloro-dihydro silicon of Siemens Method reduction unit by-product, is conducive to reduce Siemens Method reduction furnace production process and the undesirable elements such as atomizing occur, the most important thing is to improve the quality of polysilicon product.
(3) the present invention is used for the dichloro-dihydro silicon of Siemens Method reduction unit by-product the preparation technology of silane, has improved the utilization ratio of chlorosilane material, reduces the pollution to environment.
(4) the present invention compares with traditional direct disproportionation processes of chlorosilane product that hydrogenation is later, the raw material that adopts is to purify from the dichloro-dihydro silicon of trichlorosilane reduction unit by-product and through the reduction rectification cell, in dichloro-dihydro silicon raw material, boron, phosphorus impurities all reach the ppb level, can obtain highly purified silane product, and then the molten grade polysilicon product in production area.
Description of drawings
Fig. 1 is the siemens's joint process scheme schema that shows DCS disproportionation of the present invention silane processed.
Fig. 2 is example 1 of the present invention " 6000+1000 " joint process flow process and material balance figure.
Fig. 3 is example 2 of the present invention " 12000+2000 " joint process flow process and material balance figure.
Embodiment
Hereinafter in conjunction with Fig. 1, embodiment of the present invention are described further, accompanying drawing is not construed as limiting concrete application form of the present invention for explanation the present invention draws.
The present invention is siemens's joint process of DCS disproportionation silane processed, and the productive unit of technique comprises: hydrogenation unit (1), rectifying and anti-disproportionation unit (2), trichlorosilane reduction unit (3), reduction tail gas recycle unit (4), reduction rectification cell (5), disproportionation reaction unit (6), silane product rectification cell (7), dichloro-dihydro silicon rectification cell (8).siemens's joint process of DCS disproportionation silane processed is to prepare the back connection of polysilicon process reduction rectification cell (5) disproportionation reaction unit (6), silane product rectification cell (7) and dichloro-dihydro silicon rectification cell (8) at improved Siemens, high-purity dichloro-dihydro silicon that reduction rectification cell (5) obtains enters disproportionation reaction unit (6) and carries out disproportionation reaction, the silane intermediates that disproportionation reaction is produced enter silane product rectification cell (7), obtain high-purity silane product through rectification and purification, remaining mixed chlorosilane enters dichloro-dihydro silicon rectification cell (8) and recycles, the low-boiling-point substances such as dichloro-dihydro silicon that the separation of dichloro-dihydro silicon rectification cell obtains return to disproportionation reaction unit (6) and proceed disproportionation reaction, trichlorosilane and a small amount of silicon tetrachloride return to reduction rectification cell (5) and purify.
Siemens's joint process step of DCS disproportionation silane processed is as follows:
1) raw material is sent into hydrogenation unit (1) reaction and obtained mixed chlorosilane;
2) mixed chlorosilane obtains high-purity trichlorosilane products by rectifying and anti-disproportionation unit (2), and silicon tetrachloride returns to hydrogenation unit (1) and continues reaction;
3) rectifying and anti-disproportionation unit (2) obtain high-purity trichlorosilane products and enter trichlorosilane reduction unit (3) production polysilicon;
4) tail gas of trichlorosilane reduction unit (3) generation through reduction tail gas recycle unit (4), reclaims and obtains the rewinding of chlorosilane reduction dry back;
5) the chlorosilane reduction dry back rewinding that obtains being carried out component through reduction rectification cell (5) separates, the high-purity trichlorosilane products that reclaims returns to trichlorosilane reduction unit (3) and continues reaction, high-purity dichloro-dihydro silicon enters the disproportionation reaction unit, and silicon tetrachloride returns to hydrogenation unit (1);
High-purity dichloro-dihydro silicon that 6) will obtain enters disproportionation reaction unit (6) and carries out disproportionation reaction production silane intermediates;
7) with unit step 6) the silane intermediates produced of method obtain high-purity silane product by silane product rectification cell (7) purification, and tower reactor obtains mixed chlorosilane;
8) mixed chlorosilane that step 7) is obtained enters dichloro-dihydro silicon rectification cell (8) to be separated, the dichloro-dihydro silicon that reclaims and chlorine three hydrogen silicon return to disproportionation reaction unit (6) and proceed disproportionation reaction, and the trichlorosilane of recovery and a small amount of silicon tetrachloride return to reduction rectification cell (5) and purify.
For the present invention is described better, chooses application example and be illustrated.
Example 1:
Example 1 is adjusted explanation as an example of 1000 ton/years of polycrystalline scales of 6000 ton/years of polysilicon coproduction silane thermal decomposition processes of improved Siemens example, and a year operating time calculates according to 8000h.Concrete technical process and material balance are as shown in Figure 2.
Silica flour and the silicon tetrachloride of 875kg/h change into chlorosilane mixture by hydrogenation unit, and wherein the dichloro-dihydro silicone content is that 899kg/h, trichlorosilane content are that the content of 30578kg/h, silicon tetrachloride is 140388kg/h.Mixed chlorosilane is sent into rectifying and anti-disproportionation unit, first chlorosilane being carried out component separates, the silicon tetrachloride of separating returns to hydrogenation apparatus, the dichloro-dihydro silicon that obtains and silicon tetrachloride carry out anti-disproportionation reaction and change into trichlorosilane, and carrying out rectification and purification together with mixed chlorosilane separates the trichlorosilane that obtains, the high-purity trichlorosilane that finally obtains 33005kg/h is supplied with the trichlorosilane reduction unit together with high-purity trichlorosilane that the reduction rectification cell reclaims.High-purity trichlorosilane and hydrogen are 750kg/h through the quality that reduction obtains polysilicon, produce simultaneously a large amount of tail gas, obtain the rewinding of chlorosilane reduction dry back through tail gas recycle unit recovery.Reduction dry back rewinding with carry out rectifying by the reduction rectification cell together with the chlorosilane of dichloro-dihydro silicon rectification cell, high-purity dichloro hydrogen silicon that high-purity trichlorosilane that the silicon tetrachloride that obtains 9924kg/h returns to hydrogenation unit, 15639kg/h returns to trichlorosilane reduction unit, 1329kg/h enters the disproportionation reaction unit.Dichloro-dihydro silicon carries out disproportionation reaction and generates the silane intermediates that comprise 142.8kg/h silane, and the silane intermediates are purified through the silane rectification cell and obtained high-purity silane product 142.8kg/h, and residual nitrogen silane is transported to dichloro-dihydro silicon rectification cell.Dichloro-dihydro silicon rectification cell is purified to residual nitrogen silane, and the dichloro-dihydro silicon that obtains returns to disproportionation reaction unit continuation disproportionation, and trichlorosilane and a small amount of silicon tetrachloride further utilize as the raw material of reduction rectifying.
This example has been realized the coproduction of Siemens Method and chlorosilane discrimination method, and forms a closed cycle.The silica flour of 875kg/h is produced the 750kg/h polysilicon by improved Siemens behind the unit such as reaction, purification, and coproduction 142.8kg/h high purity silane, and corresponding polysilicon output is 125kg/h.Corresponding 1000 ton/years of polysilicon scales of 6000 ton/years of polysilicon coproduction silane thermal decomposition processes of improved Siemens.
Example 2:
Example 2 is adjusted explanation as an example of 2000 ton/years of polycrystalline scales of 12000 ton/years of polysilicon coproduction silane thermal decomposition processes of improved Siemens example, and a year operating time calculates according to 8000h.Concrete technical process and material balance are as shown in Figure 3.
Silica flour and the silicon tetrachloride of 1750kg/h change into chlorosilane mixture by hydrogenation unit, and wherein the dichloro-dihydro silicone content is that 1798kg/h, trichlorosilane content are that the content of 61156kg/h, silicon tetrachloride is 220776kg/h.Mixed chlorosilane is sent into rectifying and anti-disproportionation unit, first chlorosilane being carried out component separates, the silicon tetrachloride of separating returns to hydrogenation apparatus, the dichloro-dihydro silicon that obtains and silicon tetrachloride carry out anti-disproportionation reaction and change into trichlorosilane, and carrying out rectification and purification together with mixed chlorosilane separates the trichlorosilane that obtains, the high-purity trichlorosilane that finally obtains 66010kg/h is supplied with the trichlorosilane reduction unit together with high-purity trichlorosilane that the reduction rectification cell reclaims.High-purity trichlorosilane and hydrogen are 1500kg/h through the quality that reduction obtains polysilicon, produce simultaneously a large amount of tail gas, obtain the rewinding of chlorosilane reduction dry back through tail gas recycle unit recovery.Reduction dry back rewinding with carry out rectifying by the reduction rectification cell together with the chlorosilane of dichloro-dihydro silicon rectification cell, high-purity dichloro hydrogen silicon that high-purity trichlorosilane that the silicon tetrachloride that obtains 19848kg/h returns to hydrogenation unit, 31278kg/h returns to trichlorosilane reduction unit, 2658kg/h enters the disproportionation reaction unit.Dichloro-dihydro silicon carries out disproportionation reaction and generates the silane intermediates that comprise 285.6kg/h silane, and the silane intermediates are purified through the silane rectification cell and obtained high-purity silane product 285.6kg/h, and residual nitrogen silane is transported to dichloro-dihydro silicon rectification cell.Dichloro-dihydro silicon rectification cell is purified to residual nitrogen silane, and the dichloro-dihydro silicon that obtains returns to disproportionation reaction unit continuation disproportionation, and trichlorosilane and a small amount of silicon tetrachloride further utilize as the raw material of reduction rectifying.
This example has been realized the coproduction of Siemens Method and chlorosilane discrimination method, and forms a closed cycle.The silica flour of 1750kg/h is produced the 1500kg/h polysilicon by improved Siemens behind the unit such as reaction, purification, and coproduction 285.6kg/h high purity silane, and corresponding polysilicon output is 250kg/h.Corresponding 2000 ton/years of polysilicon scales of 12000 ton/years of polysilicon coproduction silane thermal decomposition processes of improved Siemens.
Siemens's joint process of the DCS disproportionation silane processed that the present invention proposes, be described by embodiment, person skilled obviously can be changed system and method as herein described within not breaking away from content of the present invention, spirit and scope or suitably change and combination, realizes technology of the present invention.Special needs to be pointed out is, the replacement that all are similar and change apparent to those skilled in the artly, they are deemed to be included in spirit of the present invention, scope and content.
Claims (2)
1.DCS siemens's joint process of disproportionation silane processed, it is characterized in that, prepare the back connection of polysilicon process reduction rectification cell (5) disproportionation reaction unit (6), silane product rectification cell (7) and dichloro-dihydro silicon rectification cell (8) at improved Siemens, high-purity dichloro-dihydro silicon that reduction rectification cell (5) obtains enters disproportionation reaction unit (6) and carries out disproportionation reaction, the silane intermediates that disproportionation reaction is produced enter silane product rectification cell (7), obtain high-purity silane product through rectification and purification, remaining chlorosilane enters dichloro-dihydro silicon rectification cell (8) and recycles, the low-boiling-point substances such as dichloro-dihydro silicon that the separation of dichloro-dihydro silicon rectification cell obtains return to disproportionation reaction unit (6) and proceed disproportionation reaction, trichlorosilane and a small amount of silicon tetrachloride return to reduction rectification cell (5) and purify.
2. technique as claimed in claim 1 is characterized in that step is as follows:
1) raw material is sent into hydrogenation unit (1) reaction and obtained mixed chlorosilane;
2) mixed chlorosilane obtains high-purity trichlorosilane products by rectifying and anti-disproportionation unit (2), and silicon tetrachloride returns to hydrogenation unit (1) recycle;
3) high-purity trichlorosilane products of rectifying and anti-disproportionation unit (2) acquisition enters trichlorosilane reduction unit (3) and produces polysilicon;
4) produce the tail gas process reduction tail gas recycle unit (4) that produces in the polysilicon process, reclaim and obtain the rewinding of chlorosilane reduction dry back;
5) the chlorosilane reduction dry back rewinding that obtains being carried out component through reduction rectification cell (5) separates, the high-purity trichlorosilane products that reclaims returns to trichlorosilane reduction unit (3) and continues reaction, high-purity dichloro-dihydro silicon enters disproportionation reaction unit (6), and silicon tetrachloride returns to hydrogenation unit (1);
High-purity dichloro-dihydro silicon that 6) will obtain enters disproportionation reaction unit (6) and carries out disproportionation reaction production silane intermediates;
7) the silane intermediates of the step 6) method being produced are purified by silane product rectification cell (7) and are obtained high-purity silane product, and tower reactor obtains mixed chlorosilane;
8) mixed chlorosilane that step 7) is obtained enters dichloro-dihydro silicon rectification cell (8) to be separated, the dichloro-dihydro silicon that reclaims and chlorine three hydrogen silicon return to disproportionation reaction unit (6) and proceed disproportionation reaction, and the trichlorosilane of recovery and a small amount of silicon tetrachloride return to reduction rectification cell (5) and purify.
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Cited By (5)
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CN103523787A (en) * | 2013-10-17 | 2014-01-22 | 天津大学 | Method for producing polycrystalline silicon by coupling silicane thermal decomposition method with improved Siemens method |
CN103708471A (en) * | 2013-12-18 | 2014-04-09 | 天津大学 | Equipment and method for preparing chlorosilane from silane through reverse disproportionation |
CN105036137A (en) * | 2015-07-17 | 2015-11-11 | 江苏中能硅业科技发展有限公司 | Disproportionation method for preparation of silane from raw material of dichloro-dihydro-silicon |
CN113716570A (en) * | 2021-09-30 | 2021-11-30 | 四川永祥多晶硅有限公司 | Method for improving quality of trichlorosilane |
CN115092933A (en) * | 2022-05-16 | 2022-09-23 | 内蒙古鄂尔多斯电力冶金集团股份有限公司 | Processing system of electronic grade polycrystalline silicon reduction tail gas |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103523787A (en) * | 2013-10-17 | 2014-01-22 | 天津大学 | Method for producing polycrystalline silicon by coupling silicane thermal decomposition method with improved Siemens method |
CN103708471A (en) * | 2013-12-18 | 2014-04-09 | 天津大学 | Equipment and method for preparing chlorosilane from silane through reverse disproportionation |
CN105036137A (en) * | 2015-07-17 | 2015-11-11 | 江苏中能硅业科技发展有限公司 | Disproportionation method for preparation of silane from raw material of dichloro-dihydro-silicon |
CN113716570A (en) * | 2021-09-30 | 2021-11-30 | 四川永祥多晶硅有限公司 | Method for improving quality of trichlorosilane |
CN113716570B (en) * | 2021-09-30 | 2023-08-01 | 四川永祥多晶硅有限公司 | Method for improving quality of trichlorosilane |
CN115092933A (en) * | 2022-05-16 | 2022-09-23 | 内蒙古鄂尔多斯电力冶金集团股份有限公司 | Processing system of electronic grade polycrystalline silicon reduction tail gas |
CN115092933B (en) * | 2022-05-16 | 2024-01-12 | 内蒙古鄂尔多斯电力冶金集团股份有限公司 | Treatment system for electronic grade polysilicon reduction tail gas |
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