CN103096685B - Capillary structure of vapor chamber and forming method thereof - Google Patents
Capillary structure of vapor chamber and forming method thereof Download PDFInfo
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- CN103096685B CN103096685B CN201110341924.4A CN201110341924A CN103096685B CN 103096685 B CN103096685 B CN 103096685B CN 201110341924 A CN201110341924 A CN 201110341924A CN 103096685 B CN103096685 B CN 103096685B
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Abstract
A kind of capillary structure of vapor chamber and forming method thereof, this capillary structure of vapor chamber comprises a body and a capillary structure, this body has one first plate body and one second plate body, this first plate body covers the second plate body relatively, and jointly define the chamber that is filled with working fluid, the opposite side of this first plate body and the second plate body is located at by this capillary structure, and its central authorities respectively towards this chamber from the opposite side of this first and second plate body protrude out formation; By the design of this structure of the present invention, so as to reaching the effect of saving man-hour and promoting production capacity.
Description
Technical field
The invention relates to a kind of capillary structure of vapor chamber and forming method thereof, espespecially a kind of have the capillary structure of vapor chamber and forming method thereof saving man-hour and reach lifting generation.
Background technology
Along with making rapid progress of science and technology, power and the usefulness of electronic component promote day by day, also produce more heat jointly when operating; If these heats are failed timely dissipation and gone out and accumulate on the inside of this electronic component, the temperature of this electronic component will be caused to raise and affect its usefulness, and even severe patient will cause this electronic component failure to damage.So industry is in order to effectively solve the problem of electronic element radiating, just propose to there is heat conduction efficiency preferably soaking plate, effectively to solve the heat dissipation problem of present stage successively.
And known soaking plate comprises chamber and capillary structure, working fluid is filled with in this chamber, and sintering selected by this capillary structure, wire netting and fiber wherein either type are arranged in this chamber or on inwall, and the side of this soaking plate (i.e. evaporating area) is sticked at a heater element (as central processing unit, drawing wafer, north and south bridge wafer, communication wafer) the upper heat adsorbing this heater element and produce, liquid working fluid is made to be converted to steam state in the evaporating area generation evaporation of soaking plate, by heat conduction to (i.e. condensing zone) on the opposite side of this soaking plate, the working fluid of this steam state is made to be condensed into liquid state after this condensing zone is cooled, the working fluid of this liquid state is back to evaporating area by gravity or capillary structure again and continues steam-condensate circulating, effectively to reach temperature uniforming heat radiation effect.
Though known soaking plate can reach the effect of samming, but extend another problem, because the capillary structure of soaking plate in it is attached on this chamber inner wall by such as sintering processing in manufacture, not one-body molded on this chamber inner wall, so make soaking plate easily be subject to the impact of external factor (as distortion such as collision, extruding), cause the capillary structure of soaking plate in it easily to come off, and then cause working fluid to flow, Relative Potential must the overall heat transfer efficiency of impact.
In addition, because known soaking plate is in manufacture process, because by the processing procedure of complexity, as modes such as sintering, wire netting or fibers, capillary structure need being formed in this chamber, therefore making manufacturing step numerous and diverse, and then cause expending man-hour and production capacity reduction.
The above, known have its own shortcomings:
1. expend man-hour;
2. production capacity reduces;
3. processing procedure is numerous and diverse.
Therefore, how to solve above-mentioned public problem and disappearance, the creator being this case and the relevant manufactures of being engaged in the industry desire most ardently the place, direction studied and improve.
Summary of the invention
For this reason, for effectively solving the above problems, main purpose of the present invention is to provide a kind of capillary structure of vapor chamber with saving man-hour.
Secondary objective of the present invention is provide a kind of to have the capillary structure of vapor chamber reaching and promote production capacity.
Secondary objective of the present invention is provide a kind of to have the capillary structure of vapor chamber forming method saving man-hour.
Secondary objective of the present invention is provide a kind of to have the capillary structure of vapor chamber forming method reaching and promote production capacity.
For reaching above-mentioned purpose, a kind of capillary structure of vapor chamber of system of the present invention, system comprises a body and a capillary structure, this body has the second plate body of one first plate body and this first plate body relative, this first and second plate body defines a chamber jointly, be filled with a working fluid in this chamber, this capillary structure system is located at the opposite side of this first plate body and the second plate body, and its central authorities respectively towards this chamber from the opposite side of this first and second plate body protrude out formation; One-body molded on this first and second plate body by this capillary structure, so as to reaching the effect of saving man-hour and promoting production capacity.
The present invention separately provides a kind of capillary structure of vapor chamber forming method, first one first plate body and one second plate body are provided, and on the opposite side of this first plate body and the second plate body, impose machining be formed with a capillary structure, then this first plate body is covered this second plate body relatively, and vacuumize in the chamber simultaneously this first and second plate body defined jointly and insert working fluid and closed operation; So pass through the design of the method for the present invention, thus make effectively to simplify fabrication steps, and then the effect effectively promoting production capacity and save man-hour.
Accompanying drawing explanation
The schematic perspective view of Fig. 1 system capillary structure of vapor chamber of the present invention;
The decomposing schematic representation of Fig. 2 system the first preferred embodiment of the present invention;
The generalized section of Fig. 3 system the first preferred embodiment of the present invention;
The decomposing schematic representation of Fig. 4 system the second preferred embodiment of the present invention;
The decomposing schematic representation of Fig. 5 A system the 3rd preferred embodiment of the present invention;
Another decomposing schematic representation of Fig. 5 B system the 3rd preferred embodiment of the present invention;
The decomposing schematic representation of Fig. 6 A system the 4th preferred embodiment of the present invention;
Another decomposing schematic representation of Fig. 6 B system the 4th preferred embodiment of the present invention;
The schematic flow sheet of Fig. 7 system the 5th preferred embodiment of the present invention;
The schematic flow sheet of Fig. 8 system the 6th preferred embodiment of the present invention;
The schematic flow sheet of Fig. 9 system the 7th preferred embodiment of the present invention.
[main element symbol description]
Body ... 1
First plate body ... 11
Second plate body ... 12
Chamber ... 14
Capillary structure ... 15
Supporting construction ... 17
Radiating fin group ... 2
Radiating fin ... 21
Embodiment
Characteristic on above-mentioned purpose of the present invention and structure and fuction thereof, is explained the preferred embodiment according to institute's accompanying drawings.
A kind of capillary structure of vapor chamber of system of the present invention and forming method thereof, refer to combination and the exploded perspective schematic diagram of Fig. 1, Fig. 2, Fig. 3 system display the first preferred embodiment of the present invention; This capillary structure of vapor chamber system comprises body 1 and a capillary structure 15, this body 1 has one first plate body 11 and one second plate body 12, this first plate body 11 is relatively cover this second plate body 12, and jointly define a chamber 14, be filled with a working fluid in this chamber 14, it is wherein arbitrary that aforementioned operation fluid system is chosen as pure water, inorganic compound, alcohols, ketone, liquid metal, cold coal and organic compound.
The outside (i.e. evaporating area) of aforementioned second plate body 12 is be sticked at a relative heater element (as central processing unit, drawing wafer, north and south bridge wafer, communication wafer etc.; Not shown in the figures) on, its heat produced in order to adsorb this heater element, working fluid liquid on it is made inside this second plate body 12 to absorb aforementioned heat and produce evaporation, to be converted to the working fluid of steam state, by the time the working fluid of this steam state is to (i.e. condensing zone) on this first plate body 11, make the working fluid of steam state after this condensing zone is cooled, be condensed into liquid working fluid, the working fluid of this liquid state is just back to evaporating area by gravity or capillary structure 15 and continues steam-condensate circulating, effectively to reach excellent temperature uniforming heat radiation effect.
Continue and consult Fig. 2, Fig. 3, aforementioned capillary structure 15 is the opposite side being located at this first plate body 11 and the second plate body 12, and its central authorities respectively towards this chamber 14 from the opposite side of this first and second plate body 11,12 protrude out formation, in other words, namely this capillary structure 15 is one-body molded on the opposite side of this first and second plate body 11,12.
And be chosen as matsurface (as Fig. 2) to explain in the aforementioned capillary structure 15 of this better enforcement, but to be not limited thereto, also to can be the groove as Fig. 3, or grid body.
Therefore be one-body molded design on the opposite side of this first and second plate body 11,12 by capillary structure 15 of the present invention, make effectively to avoid capillary structure 15 to come off, relative quality and heat-conducting effect more can reach stable, and then the effect person that more can save man-hour.
Referring to Fig. 4 to show, is the exploded perspective schematic diagram showing the second preferred embodiment of the present invention; The structure of this preferred embodiment and connection relationship itself and effect are roughly identical with aforementioned first preferred embodiment, therefore again do not repeat at this, both differences be in: be provided with a radiating fin group 2 outside aforementioned first plate body 11, this radiating fin group 2 has multiple radiating fin 21, described radiating fin 21 is form from this first plate body 11 lateral extension, and its working fluid in order to this steam state of accelerating cooling is converted to liquid working fluid.
Referring to Fig. 5 A to show, is the exploded perspective schematic diagram showing the 3rd preferred embodiment of the present invention; The structure of this preferred embodiment and connection relationship itself and effect are roughly identical with aforementioned first preferred embodiment, therefore again do not repeat at this, both differences be in: this capillary structure of vapor chamber also comprises at least one supporting construction 17, this supporting construction 17 is select to be arranged at the side this first plate body 11 or the second plate body 12 being formed with aforementioned capillary structure 15, that is aforementioned supporting construction 17 is the one-body molded side being formed with capillary structure 15 on this first plate body 11 or the second plate body 12; Supporting construction 17 in this better enforcement is be disposed on this first plate body 11 with two supporting constructions 17 to explain, but is not limited thereto.
Therefore support relative this first plate body 11 and second plate body 12 by described supporting construction 17, obtain the effect effectively reaching support, and then the effect that (or opposing) this soaking plate more can be prevented to be out of shape by external factor (as extruding).
Refer to Fig. 5 B to show, another exploded perspective schematic diagram of system's this better enforcement of display, mainly be provided with a radiating fin group 2 be made up of multiple radiating fin 21 outside aforementioned first plate body 11, this radiating fin group 2 is be converted to liquid working fluid in order to the working fluid of this steam state of accelerating cooling.
Referring to Fig. 6 A to show, is the exploded perspective schematic diagram showing the 4th preferred embodiment of the present invention, the structure of this preferred embodiment and connection relationship itself and effect are roughly identical with aforementioned first preferred embodiment, therefore again do not repeat at this, both differences be in: this capillary structure of vapor chamber also comprises multiple supporting construction 17, described supporting construction 17 is the side being arranged at and this first plate body 11 and the second plate body 12 being formed with aforementioned capillary structure 15, that is described supporting construction 17 be one-body molded this first, two plate bodys 11, the opposite side of 12 is formed on capillary structure 15, it is except the structure in order to reinforcement (or enhancing) this first plate body 11 and the second plate body 12, and then when this first plate body 11 covers the second plate body 12 relatively, described supporting construction 17 also has effect of support.
Therefore by the one-body molded design on the opposite side of this first and second plate body 11,12 of described supporting construction 17, make effectively to reach the effect supporting and strengthen structure, and then obtain the effect effectively avoiding this soaking plate to produce distortion by external factor (as extruding).
Refer to Fig. 6 B to show, another exploded perspective schematic diagram of system's this better enforcement of display, mainly be provided with a radiating fin group 2 be made up of multiple radiating fin 21 outside aforementioned first plate body 11, this radiating fin group 2 is be converted to liquid working fluid in order to the working fluid of this steam state of accelerating cooling.
Referring to Fig. 7 to show, is the schematic flow sheet showing the 5th preferred embodiment of the present invention, and is aided with and consults Fig. 2, Fig. 3; This preferred embodiment is the capillary structure of vapor chamber forming method of aforementioned first preferred embodiment, and the party's genealogy of law comprises the following steps:
(S1) one first plate body and one second plate body are provided;
This first plate body 11 and the second plate body 12 is provided.
(S2) on the opposite side of this first plate body and the second plate body, impose machining and be formed with a capillary structure;
Machining is imposed on the opposite side of this first plate body 11 and the second plate body 12, as punching press, roll extrusion, plane pin and milling pin wherein arbitrary processing mode, make the opposite side of this first and second plate body to be formed with a capillary structure 15, that is this capillary structure 15 is one-body molded on the opposite side of this first and second plate body; Wherein aforementioned capillary structure 15 is be chosen as the matsurface as Fig. 2, or also can as the groove of Fig. 3, or grid body.
(S3) this first plate body is covered this second plate body relatively, and vacuumize in the chamber simultaneously this first and second plate body defined and insert working fluid and closed operation;
This first plate body 11 is covered relatively the second plate body 12 (i.e. described body 1), and vacuumize in the chamber 14 simultaneously this first and second plate body 11,12 defined and insert working fluid and closed operation.Wherein aforementioned operation fluid system to be chosen as pure water, inorganic compound, alcohols, ketone, liquid metal, cold coal and organic compound wherein arbitrary.
So pass through the design of the method for the present invention, the step that can effectively simplify on processing procedure on manufacturing is made to reach the effect of saving man-hour, and more form the quality of capillary structure 15 in this body of Absorbable organic halogens 1, and then can also according to the demand of user, the capillary structure 15 of design various types.
Referring to Fig. 8 to show, is the schematic flow sheet showing the 6th preferred embodiment of the present invention, and is aided with and consults Fig. 5 A; This preferred embodiment is the capillary structure of vapor chamber forming method of aforementioned 3rd preferred embodiment, and the party's genealogy of law comprises the following steps:
(S1) one first plate body and one second plate body are provided;
(S2) on the opposite side of this first plate body and the second plate body, impose machining and be formed with a capillary structure;
(S3) this first plate body is covered this second plate body relatively, and vacuumize in the chamber simultaneously this first and second plate body defined and insert working fluid and closed operation.
Abovementioned steps S1-S3 system is identical with aforementioned 5th embodiment, therefore will repeat no more at this, only the present embodiment and aforementioned not existing together of 5th embodiment are described step S1: after providing one first plate body and one second this step of plate body, also comprise a step S4: to the side of this first plate body relative to the side of the second plate body or relative first plate body of this second plate body, impose machining and be formed with at least one supporting construction;
That is as imposed machining to the side of this first plate body 11 this second plate body 12 relative, as punching press, roll extrusion, plane pin and milling pin wherein arbitrary processing mode, make this first plate body 11 that it be formed with aforementioned supporting construction 17, or as imposed machining to the side of relative first plate body 11 of this second plate body 12, to make this second plate body 12, it is formed with aforementioned supporting construction 17, therefore utilize this supporting construction 17 effectively can reach effect of support, and then effectively prevent first and second plate body from deforming.
Referring to Fig. 9 to show, is the schematic flow sheet showing the 7th preferred embodiment of the present invention, and is aided with and consults Fig. 6 A; This preferred embodiment is the capillary structure of vapor chamber forming method of aforementioned 4th preferred embodiment, and the party's genealogy of law comprises the following steps:
(S1) one first plate body and one second plate body are provided;
(S2) on the opposite side of this first plate body and the second plate body, impose machining and be formed with a capillary structure;
(S3) this first plate body is covered this second plate body relatively, and vacuumize in the chamber simultaneously this first and second plate body defined and insert working fluid and closed operation.
Abovementioned steps S1-S3 system is identical with aforementioned 5th embodiment, therefore will repeat no more at this, only the present embodiment and aforementioned not existing together of 5th embodiment are described step S1: after providing one first plate body and one second this step of plate body, also comprise a step S4: impose machining to the opposite side of this first plate body and the second plate body and be formed with multiple supporting construction;
Machining is imposed to the opposite side of aforementioned first plate body 11 and the second plate body 12, to make the opposite side of this first plate body 11 and the second plate body 12 is formed with multiple supporting construction 17, therefore utilize described supporting construction 17 to be arranged on the opposite side of this first and second plate body 11,12, effectively to strengthen the structure of this first and second plate body 11,12, and then more effectively reach excellent support effect person.
The above, the present invention has following advantage compared to known:
1. there is saving man-hour;
2. there is the effect promoting production capacity
3. there is the effect strengthening body and prevent from being out of shape.
Claims (10)
1. a capillary structure of vapor chamber, is characterized in that, comprising:
One body, it has one first plate body and one second plate body, and this first plate body is this second plate body relatively, and jointly defines a chamber, is filled with a working fluid in this chamber; And
One capillary structure, is located at the opposite side of this first plate body and the second plate body, and its central authorities respectively towards this chamber from the opposite side of this first and second plate body protrude out formation, and this capillary structure is one-body molded on the opposite side of this first and second plate body.
2. capillary structure of vapor chamber as claimed in claim 1, is characterized in that, also comprise at least one supporting construction, and this supporting construction is selected to be arranged at the side this first plate body or the second plate body being formed with aforementioned capillary structure.
3. capillary structure of vapor chamber as claimed in claim 1, it is characterized in that, also comprise multiple supporting construction, described supporting construction is arranged at the side this first plate body and the second plate body being formed with aforementioned capillary structure.
4. the capillary structure of vapor chamber as described in claim 1 or 2 or 3, is characterized in that, is provided with a radiating fin group outside this first plate body, and this radiating fin group has multiple radiating fin, and described radiating fin is formed from this first plate body lateral extension.
5. capillary structure of vapor chamber as claimed in claim 1, is characterized in that, this capillary structure is that to be chosen as groove, matsurface and grid body wherein arbitrary.
6. a capillary structure of vapor chamber forming method, is characterized in that, comprising:
One first plate body and one second plate body are provided;
On the opposite side of this first plate body and the second plate body, impose machining be formed with a capillary structure, and described capillary structure is one-body molded on the opposite side of this first and second plate body; And
This first plate body is covered this second plate body relatively, and vacuumizes in the chamber simultaneously this first and second plate body defined and insert working fluid and closed operation.
7. capillary structure of vapor chamber forming method as claimed in claim 6, it is characterized in that, after the step of this first plate body and the second plate body is provided, also comprise a step to the side of this first plate body relative to the side of the second plate body or relative first plate body of this second plate body, impose machining and be formed with at least one supporting construction.
8. capillary structure of vapor chamber forming method as claimed in claim 6, it is characterized in that, after the step of this first plate body and the second plate body is provided, also comprises the opposite side of a step to this first plate body and the second plate body and impose machining and be formed with multiple supporting construction.
9. capillary structure of vapor chamber forming method as claimed in claim 6, it is characterized in that, it is wherein arbitrary that this capillary structure is chosen as groove, matsurface and grid body.
10. capillary structure of vapor chamber forming method as claimed in claim 6, is characterized in that, it is wherein arbitrary that aforementioned mechanical processing is chosen as punching press, roll extrusion, plane pin and milling pin.
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| CN201110341924.4A CN103096685B (en) | 2011-11-02 | 2011-11-02 | Capillary structure of vapor chamber and forming method thereof |
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| CN201110341924.4A CN103096685B (en) | 2011-11-02 | 2011-11-02 | Capillary structure of vapor chamber and forming method thereof |
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| CN103096685A CN103096685A (en) | 2013-05-08 |
| CN103096685B true CN103096685B (en) | 2015-12-02 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103712496A (en) * | 2012-10-09 | 2014-04-09 | 元镫金属股份有限公司 | Thin composite-type guide plate pipe |
| KR101600667B1 (en) * | 2013-12-05 | 2016-03-07 | 티티엠주식회사 | Thin Type Heat Pipe Provided with a Wick Fixed Obliquely |
| CN105758240A (en) * | 2014-12-19 | 2016-07-13 | 富葵精密组件(深圳)有限公司 | Vapor chamber and manufacture method thereof |
| CN112857110B (en) * | 2015-01-14 | 2023-03-31 | 奇鋐科技股份有限公司 | Method for manufacturing flat heat pipe |
| CN104713395B (en) * | 2015-02-11 | 2017-01-04 | 上海卫星装备研究所 | High resistance to pressure flat-plate heat pipe and processing method thereof |
| CN105698581B (en) * | 2015-12-14 | 2018-05-29 | 上海利正卫星应用技术有限公司 | The flat-plate heat pipe of frivolous high pressure installation adaptability |
| CN105865243A (en) * | 2016-05-14 | 2016-08-17 | 广东工业大学 | Novel flat plate thiele tube and preparation method thereof |
| CN106225537A (en) * | 2016-07-28 | 2016-12-14 | 苏州聚力电机有限公司 | The capillary structure configuration structure of soaking plate and collocation method thereof |
| CN106152847A (en) * | 2016-07-28 | 2016-11-23 | 苏州聚力电机有限公司 | The capillary structure configuration structure of a kind of soaking plate and collocation method thereof |
| CN107371322A (en) * | 2017-07-25 | 2017-11-21 | 维沃移动通信有限公司 | A kind of preparation method of stiffening plate, stiffening plate and electronic equipment |
| CN110402068A (en) * | 2019-07-27 | 2019-11-01 | Oppo广东移动通信有限公司 | The assemble method of electronic equipment and electronic equipment |
| CN113494864A (en) * | 2020-04-03 | 2021-10-12 | 得意精密电子(苏州)有限公司 | Temperature-equalizing plate and manufacturing method thereof |
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