CN103094057B - Double-wavelength ultraviolet lamp - Google Patents

Double-wavelength ultraviolet lamp Download PDF

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CN103094057B
CN103094057B CN201310043840.1A CN201310043840A CN103094057B CN 103094057 B CN103094057 B CN 103094057B CN 201310043840 A CN201310043840 A CN 201310043840A CN 103094057 B CN103094057 B CN 103094057B
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double
wavelength
ultraviolet
discharge
rare gas
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CN103094057A (en
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余建军
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Abstract

The invention provides a double-wavelength ultraviolet lamp and relates to an excimer ultraviolet lamp which can produces double-wavelength ultraviolet spectrum. The double-wavelength ultraviolet lamp comprises a lamp tube which penetrates through the ultraviolet light. A closed discharge area of the lamp tube is filled with a needed corresponding rare gas of a vacuum ultraviolet short wave. The corresponding rare gas is one of the helium (He), the neon (Ne), the argon (Ar), the krypton (Kr) and the xenon (Xe). The closed discharge area has the media that is in contact with the vacuum ultraviolet corresponding rare gas in a discharge mode. The media contain 5-200 parts per million (ppm) metallic impurities, and therefore the double-wavelength ultraviolet output of the vacuum ultraviolet and near ultraviolet is obtained, and the method is simple. The double-wavelength of different designs can be obtained, the metallic impurities can be changed and relative radiation intensity of the vacuum ultraviolet and the near ultraviolet can be adjusted by changing the variety of the rare gas used for filling, so that needs of different occasions can be met, flexibility of the preparation of the double-wavelength lamp is enhanced and applied range of the double-wavelength lamp can be expanded.

Description

Double-wavelength ultraviolet lamp
Technical field
The present invention relates to a kind of Excimer UV lamp that can produce dual-wavelength ultraviolet spectrum.
Background technology
Double-wavelength ultraviolet lamp industrially has unique application, and such as, when solidifying for UV ink setting, the short wavelength UV radiation depth of penetration is little, can be used for cured printing ink surface, and long wavelength ultraviolet radiation penetration depth is large, can be used for solidification deep layer ink.Prior art double-wavelength ultraviolet lamp, is mainly the low pressure mercury lamp obtained by filling mercury, utilizes mercury characteristic spectral line to obtain 254 and 185 nm dual wavelengths.But the double-wavelength ultraviolet lamp of this specific wavelength, owing to limiting by principle of luminosity, the ultraviolet light intensity exported is very low, generally be only tens microwatts/centimetres 2, wherein 185 nm vacuum ultraviolet (VUV) export then lower, and only account for about 10% of the output of whole ultraviolet, luminous efficiency is also very low, luminous intensity is low, and photochemical reaction speed is extremely low thus.Secondly, this dual wavelength lamp two wavelength relative intensities can not change in fixing, another radiant output cannot be improved by reducing a radiant output, so be difficult to satisfied different occasion (such as sterilization and organic degradation) needs, purposes scope being restricted; Besides, mercurous waste fluorescent lamp mercury intractability is comparatively large, processes badly can produce mercury pollution.
Prior art also has employing coated optical coating means to obtain dual wavelength, and such as US5557112 is disclosed applies different fluorescent coating at the different physical locations of ultraviolet lamp tube, to obtain ultraviolet B and ultraviolet A Dual Spectral Radiation.This kind obtains two waveband mainly through being coated with different fluorescent coating at a tubes diverse location, is by the shading of fluorescent coating or anti-reflection acquisition two waveband in fact, because fluorescent coated designs is very complicated, adds manufacture difficulty; In addition, coating existence can reduce radiation intensity and the efficiency of light.
Chinese patent CN2206961 Double-wave long fluorescence analysis lamp is by being provided with long wave ultraviolet fluorescent tube side by side and short wavelength UV fluorescent tube realizes dual wavelength.Adopt two different wave length lamp parallel combinations to obtain dual wavelength, in practical application, volume and cost are all larger.
Above-mentioned deficiency still has the place being worth improving.
Summary of the invention
The object of the invention is to overcome above-mentioned the deficiencies in the prior art, and provide a kind of UV radiation intensity high, relative intensity is adjustable, can design the double-wavelength ultraviolet lamp that different dual wavelength requires for application to select.
The object of the invention realizes, the corresponding rare gas of the short wavelength that filling needs in the confined space-region of discharge being mainly improved to fluorescent tube, produce the quasi-molecule of this gas, make gas discharge and the medium contact being mixed with metal impurities, produce long wavelength, overcome the deficiencies in the prior art, realize the object of the invention.Specifically, double-wavelength ultraviolet lamp, comprise the fluorescent tube that can pass through ultraviolet light, it is characterized in that the corresponding rare gas being filled with a required vacuum ultraviolet (VUV) short wavelength in the airtight region of discharge of fluorescent tube, described corresponding rare gas refers to the one of He, Ne, Ar, Kr, Xe; Have the medium contacted with the corresponding noble gas discharge of vacuum ultraviolet (VUV) short wavelength in airtight region of discharge, described medium contains the metal impurities of 5-200 ppm.This metal impurities refer to one or the combination of Al, Fe, Li, Na, B, K, Ca, Mg, Cu, Co, Mn, Ni, Cr, Ti.
Dual wavelength mechanism of production is: first the rare gas of filling be excited at fluorescent tube region of discharge, produce specific wavelength vacuum ultraviolet, then metal-doped vacuum ultraviolet-excited by this wavelength in medium, form " rare gas-metal " and " metal-metal " two kinds of quasi-molecules, the quasi-molecule generated is very unstable to be decomposed very soon, excitation energy is discharged with radiates near ultraviolet and visible ray mode, thus obtain the double-wavelength ultraviolet lamp of design wavelength vacuum ultraviolet (VUV) and near ultraviolet two kinds of different wave lengths, key reaction process is summarized as follows:
X+e → X*+e (X refers to rare gas He, Ne, Ar, Kr, Xe, and X* represents the excitation state of X, and e is electronics);
X*+X+X → X2*+X(X2* represents the quasi-molecule of X);
X2* → 2X+hv (hv is vacuum-ultraviolet light);
M+hv → M* (M refers to one or the combination of Al, Fe, Li, Na, B, K, Ca, Mg, Cu, Co, Mn, Ni, Cr, Ti in medium, and M* is the excitation state of M);
M*+M → M2* (M2* is metal-metal quasi-molecule);
X*+M → XM*(XM* is rare gas-metal excimer).
The short-and-medium wavelength of dual wavelength is determined by filling rare gas (quasi-molecule of generation), long wavelength is then by the metal-doped generation in short wavelength radiation exciting media, when thus designing dual wavelength, rare gas is chosen as by the rare gas corresponding to the short wavelength in design dual wavelength, by the different rare gas of filling in fluorescent tube, the double-wavelength ultraviolet lamp of required different dual wavelength combination can be obtained like this.By regulating the metal-doped amount in dielectric material, can change the relative intensity regulating vacuum ultraviolet (VUV) and near ultraviolet to export, such as metal-doped amount is high, and fluorescent tube vacuum ultraviolet (VUV) output intensity weakens, and near ultraviolet intensity strengthens relatively; Otherwise it is contrary.
The rare gas of filling, mainly for obtaining the vacuum ultraviolet of short wavelength, and another wavelength quasi-molecule of metal-doped generation in exciting media, thus obtain dual wavelength.Rare gas can select a kind of rare gas X, the X designed in dual wavelength relatively corresponding to short wavelength to be the one of He, Ne, Ar, Kr, Xe; In order to improve the generation rate of rare gas quasi-molecule corresponding to short wavelength, obtain stronger short wavelength's vacuum ultraviolet, can also add buffer gas in the rare gas that short wavelength is corresponding, described buffer gas is of the same clan with corresponding rare gas but the rare gas that atomic weight is little.The air pressure ratio of corresponding rare gas and buffer gas and the total the blowing pressure of mist all adopt the routine techniques of Excimer lamp.
Forming the space of filling rare gas, can be that individual layer tube wall forms confined space region of discharge, and also can be that the hollow interlayer between double-layer tube wall forms confined space region of discharge, formation can be arbitrary shape confined space, and can through ultraviolet light; Take into account Uniform discharge, confined space is annular or square preferably; The distance interval of region of discharge, ensures that gas discharge carries out, wherein preferably 1-10 mm.
The material of fluorescent tube can be quartz or sapphire by prior art, can also be can through the magnesium fluoride of short wavelength UV radiation, lithium fluoride, calcirm-fluoride etc., wherein conventional and the fluorescent tube of economy is quartz glass tube.
Doping metals in medium, its effect is subject to vacuum ultraviolet-excited rear generation " rare gas-metal " and " metal-metal " quasi-molecule, thus produce near ultraviolet radiation, obtains the double-wavelength ultraviolet lamp of vacuum ultraviolet (VUV) and near ultraviolet radiation two kinds of different wave lengths.Its doping metals is one or the combination of Al, Fe, Li, Na, B, K, Ca, Mg, Cu, Co, Mn and Ni.Doping determines by vacuum ultraviolet-excited and generate the degree of " rare gas-metal " and " metal-metal " quasi-molecule, metals content impurity is lower, through above-mentioned course of reaction by vacuum ultraviolet-excited and generate " rare gas-metal " and " metal-metal " quasi-molecule amount is then fewer, near ultraviolet output intensity is relatively lower, the output intensity of vacuum ultraviolet (VUV) is relatively higher, until be that nearly monochromatic vacuum ultraviolet (VUV) exports; Otherwise, metals content impurity is higher, and through above-mentioned course of reaction by vacuum ultraviolet-excited and generate " rare gas-metal " and " metal-metal " quasi-molecule amount is then more, near ultraviolet output intensity is relatively higher, vacuum ultraviolet (VUV) output intensity is relatively lower, until be zero.Therefore vacuum ultraviolet (VUV) can be changed near ultraviolet relative output intensities by regulating the metals content impurity in medium.When test finds that in dielectric material, tenor is 5 ppm, namely have above-mentioned functions, the upper limit can be 200 ppm, and doping increases again can reduce quasi-molecule generation efficiency, therefore determination metals content impurity of the present invention is 5-200 ppm, wherein more preferably 5-50 ppm meets application needs completely.Regulate the metal impurities in medium, can be adulterated by current material and/or purifying technique realization.This impurity content interval is only that test obtains better interval value, and should not be construed as and realize the necessary accurate end value of the present invention, a small amount of deviation is not cannot.
Medium can be all or part of tube inner wall contacted with region of discharge, also can be the individual member be put in region of discharge.As the carrier of metal impurities, any material that medium can select chemical stability good, wherein conventional and economy be quartz glass.Consider that metal impurities existence can reduce vacuum ultraviolet (VUV) transmitance, different according to fluorescent tube purposes, the present invention better selects to be that the medium adulterated is not positioned in the light path of vacuum ultraviolet (VUV) output.
Double-wavelength ultraviolet lamp of the present invention, relative to prior art, metal impurities medium is mixed with owing to adopting, at the rare gas that the short-and-medium wavelength of airtight discharge space filling design dual wavelength is corresponding, form rare gas quasi-molecule, excite lower formation " rare gas-metal " and " metal-metal " quasi-molecule at short wavelength radiation, the near ultraviolet producing longer wavelength exports, and obtains vacuum ultraviolet (VUV) and black light double-wavelength ultraviolet lamp simultaneously.Not only can obtain vacuum ultraviolet (VUV) and the output of near ultraviolet dual wavelength ultraviolet, and method is simple, and can by changing filling rare gas kind, obtain different designs dual wavelength, change metal-doped amount, regulate vacuum ultraviolet (VUV) and near ultraviolet relative radiant intensity, meet different occasion demand, improve the flexibility preparing dual wavelength lamp, extend the range of application of dual wavelength lamp.
Below in conjunction with six specific embodiments; essence of the present invention is understood in exemplary illustration and help further; but embodiment detail is only in order to the present invention is described; do not represent the present invention and conceive lower whole technical scheme; therefore should not be construed as the technical scheme total to the present invention to limit, some are In the view of technical staff, and the unsubstantiality not departing from the present invention's design increases and/or changes; such as simply change with the technical characteristic with same or similar technique effect or replace, all belonging to scope.
Accompanying drawing explanation
Accompanying drawing 1 is the structural representation of the embodiment of the present invention 1.
Accompanying drawing 2 is the structural representation of the embodiment of the present invention 3.
Accompanying drawing 3 is the structural representation of the embodiment of the present invention 4.
Accompanying drawing 4 is the structural representation of the embodiment of the present invention 5.
Accompanying drawing 5 is the structural representation of the embodiment of the present invention 6.
Embodiment
Embodiment 1: see accompanying drawing 1, double-wavelength ultraviolet lamp, is made up of outer quartz glass tube 12 and internal layer quartz glass tube 13.Annulus between quartz glass tube 12 and 13 is airtight region of discharge 2, and its spacing distance is 5 mm.One deck stainless steel metal silk screen 3 is wrapped up as one of electrode outside quartz glass tube 12, another electrode 5 adopts UV-reflecting materials mirror finish aluminium flake, its side towards region of discharge carries out anodized, it is round for making cross section, invest the inner surface of quartz glass tube 13 as shown in Figure 1, for the ultra-violet radiation that antireflection part is radially inside, strengthen external ultra-violet radiation.Two electrodes are connected with an alternating source 6, input 20 KHz, 10,000 volts of high-tension currents.Be deionized water cooling fluid in the inner space 4 of quartz glass tube 13.
Quartz glass tube 12 and 13 adopts synthetic quartz pipe respectively and makes containing the quartz ampoule of 30-50 ppm magnitude metal impurities of having an appointment, xenon corresponding to ultraviolet short wavelength and buffer gas argon to 0.1 MPa is filled in region of discharge 2, through spectral detection, obtain vacuum ultraviolet (VUV) 172 nm and near ultraviolet 390 nm(between the peak position of 320 to 460 nm wide ranges) the radiation of dual wavelength Excimer UV, and their output wave spectral amplitude ratio is close.
Embodiment 2, reference example 1, quartz glass tube 13 adopts the quartz ampoule containing 5-20 ppm magnitude metal impurities of having an appointment to make, xenon corresponding to ultraviolet short wavelength and buffer gas argon to 0.1 MPa is filled in region of discharge 2, through spectral detection, obtain vacuum ultraviolet (VUV) 172 nm and near ultraviolet 390 nm(between the peak position of 320 to 460 nm wide ranges) the radiation of dual wavelength Excimer UV, but the output wave spectral amplitude ratio of 172 nm is obviously than the height of 390 nm.
Embodiment 3: see accompanying drawing 2, outer stainless steel 11 encloses structure one confined space, in it, filling Krypton and argon gas (argon gas is buffer gas) are to 0.05 MPa, two electrodes are high conductivity non-oxygen copper bars, its outer surface cover has quartz glass tube 12,13, its fork-shaped is installed and is formed region of discharge 2, the spacing distance of quartz glass tube is 1 mm, in quartz glass tube 12,13, at least one contains 60-100 ppm magnitude metal impurities, the ultraviolet light that region of discharge 2 produces appears outside stainless steel cavity through optical window 3, optical window 3 is magnesium fluoride, calcirm-fluoride or LiF Crystals material.Through spectral detection, obtain the peak position of vacuum ultraviolet (VUV) 146 nm and near ultraviolet 390 nm(between 320 to 460 nm wide ranges) radiation of dual wavelength Excimer UV.
Embodiment 4: see accompanying drawing 3, outer stainless steel tube 11 is as the ground connection in the lump of electrode, and fill argon gas to 0.1 MPa in pipe, another electrode is the solenoid that high conductivity copper free wire is coiled into, and its overcoat has quartz glass tube 12.Form region of discharge 2 between quartz glass tube 12 and stainless steel inside pipe wall, region of discharge distance is 10 mm, and quartz glass tube 12 is the quartz ampoule containing 150-200 ppm magnitude metal impurities.It is external that the optical window 3 of ultraviolet light through stainless steel tube end that region of discharge 2 produces appears stainless steel tube, and optical window 3 is magnesium fluoride, calcirm-fluoride or LiF Crystals material.Through spectral detection, obtain the peak position of vacuum ultraviolet (VUV) 126 nm and near ultraviolet 390 nm(between 320 to 460 nm wide ranges) radiation of dual wavelength Excimer UV.
Embodiment 5: see accompanying drawing 4, quartz glass lamp vessel 12 two ends seal, form the cylindrical discharge district 2 that diameter is 7 mm, interior neon filling to 200 Pa, quartz glass tube 12 adopts the quartz ampoule containing 5-50 ppm magnitude metal impurities of having an appointment to obtain, magnetron 3 produces 2.45 GHz microwaves and enters resonant cavity 4, and excite one end to insert fluorescent tube 12 luminescence of resonant cavity 4, microwave power 0-1000 W is adjustable.Through spectral detection, obtain the peak position of vacuum ultraviolet (VUV) 80-90 nm and near ultraviolet 390 nm(between 320 to 460 nm wide ranges) radiation of dual wavelength Excimer UV.
Embodiment 6: see accompanying drawing 5, as embodiment 5, wherein fluorescent tube 12 is synthetic quartz glass, inside fills helium to 250 Pa, and the built-in quartz plate containing 20-50 ppm magnitude metal impurities of having an appointment of region of discharge 2, pipe or rod 5, by being sintered to fix in region of discharge 2.Through spectral detection, obtain the peak position of vacuum ultraviolet (VUV) 60-100 nm and near ultraviolet 390 nm(between 320 to 460 nm wide ranges) radiation of dual wavelength Excimer UV.
To those skilled in the art, under this patent design and specific embodiment enlightenment, some distortion that can directly derive from this patent disclosure and general knowledge or associate, those of ordinary skill in the art will recognize also can adopt additive method, or in prior art, commonly use substituting of known technology, and the mutual various combination between feature, such as according to design dual wavelength, select corresponding filling rare gas, doped metallic elements changes, etc. unsubstantiality change, can be employed equally, this patent representation function and effect can be realized, expansion of illustrating no longer is one by one described in detail, all belong to this patent protection range.
In the present embodiment, the metal impurities of indication are one or the combinations of Al, Fe, Li, Na, B, K, Ca, Mg, Cu, Co, Mn, Ni, Cr, Ti.
Rare gas in the present invention, for can quasi-molecule be generated and produce the rare gas of vacuum ultraviolet wavelengths radiation, He, Ne, Ar, Kr and Xe in gas discharge, as shown in Table 1.
The said dual wavelength of the present invention, refers to vacuum ultraviolet (VUV) and near ultraviolet radiation.
Table 1: the quasi-molecule vacuum ultraviolet wavelengths that different rare gas produces

Claims (9)

1. double-wavelength ultraviolet lamp, comprise the fluorescent tube that can pass through ultraviolet light, it is characterized in that the corresponding rare gas being filled with a required vacuum ultraviolet (VUV) short wavelength in the airtight region of discharge of fluorescent tube, described corresponding rare gas refers to the one in He, Ne, Ar, Kr, Xe; The medium contacted with the corresponding noble gas discharge of vacuum ultraviolet (VUV) short wavelength is had in airtight region of discharge, described medium contains the metal impurities of 5-200 ppm, metal impurities are subject to vacuum ultraviolet-excited rear generation " rare gas-metal " and " metal-metal " quasi-molecule, produce near ultraviolet radiation; Obtain vacuum ultraviolet (VUV) and near ultraviolet radiation two kinds of different wave lengths.
2. double-wavelength ultraviolet lamp according to claim 1, is characterized in that the metals content impurity in medium is 5-50 ppm.
3. double-wavelength ultraviolet lamp according to claim 1 and 2, is characterized in that metal impurities refer to one or the combination of Al, Fe, Li, Na, B, K, Ca, Mg, Cu, Co, Mn, Ni, Cr, Ti.
4. double-wavelength ultraviolet lamp according to claim 1 and 2, it is characterized in that adding in the corresponding rare gas of short wavelength have buffer gas, described buffer gas is of the same clan with corresponding rare gas but the rare gas that atomic weight is little.
5. double-wavelength ultraviolet lamp according to claim 1, is characterized in that the airtight region of discharge of fluorescent tube, be individual layer tube wall form confined space region of discharge or double-layer tube wall between hollow interlayer form confined space region of discharge.
6. double-wavelength ultraviolet lamp according to claim 5, is characterized in that the shape of confined space region of discharge is for annular or square.
7. the double-wavelength ultraviolet lamp according to claim 5 or 6, is characterized in that the distance of confined space region of discharge is spaced apart 1-10 mm.
8. double-wavelength ultraviolet lamp according to claim 1, is characterized in that medium is all or part of lamp tube wall contacted with region of discharge, or is put in the individual member in region of discharge.
9. double-wavelength ultraviolet lamp according to claim 8, is characterized in that medium is not positioned in the light path of vacuum ultraviolet (VUV) output.
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JP6948606B1 (en) 2020-08-28 2021-10-13 ウシオ電機株式会社 Excimer lamp and light irradiation device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1043037A (en) * 1989-11-11 1990-06-13 复旦大学 The manufacture method of high-efficiency vacuum ultraviolet source
CN101409202A (en) * 2007-10-12 2009-04-15 优志旺电机株式会社 Excimer lamps

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* Cited by examiner, † Cited by third party
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JP2006302720A (en) * 2005-04-22 2006-11-02 Hoya Candeo Optronics株式会社 Excimer lamp

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1043037A (en) * 1989-11-11 1990-06-13 复旦大学 The manufacture method of high-efficiency vacuum ultraviolet source
CN101409202A (en) * 2007-10-12 2009-04-15 优志旺电机株式会社 Excimer lamps

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