CN103092379B - The manufacture method of image display system and touch sensing device - Google Patents
The manufacture method of image display system and touch sensing device Download PDFInfo
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- CN103092379B CN103092379B CN201110341188.2A CN201110341188A CN103092379B CN 103092379 B CN103092379 B CN 103092379B CN 201110341188 A CN201110341188 A CN 201110341188A CN 103092379 B CN103092379 B CN 103092379B
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The present invention discloses the manufacture method of a kind of image display system and touch sensing device. This image display system comprises a touch sensing device. Touch sensing device comprises: a transparent substrates, a sensing electrode patterned layer and an Inorganic Dielectric Material layer. Transparent substrates has a sensing area and the non-sensing area in abutting connection with sensing area. Sensing electrode patterned layer is positioned in the transparent substrates of sensing area. Inorganic Dielectric Material layer has the First in the transparent substrates that is positioned at non-sensing area and is positioned at sensing area and local one second of covering sensing electrode patterned layer. The present invention also discloses a kind of manufacture method of touch sensing device.
Description
Technical field
The present invention has about a kind of contact panel technology, relates to especially a kind of shading/decoration for touch sensing deviceFilm is the manufacture method about a kind of image display system and touch sensing device specifically.
Background technology
Touch sensing device be conventionally integrated in a flat display apparatus (for example, liquid crystal display (liquidcrystaldisplay,LCD), active matrix OLED (activematrixorganiclight-emittingdisplay, AMOLED)Etc. in, to form contact panel display. Contact panel display is assemblied in electronic installation conventionally, for example laptop computer,Personal digital assistant (personaldigitalassistants, PDA), e-book (electronicbooks), projector and handMachine etc. Contact panel display can be subject to gradually by the function of the execution inputs such as finger, pointer (stylus), stylusTo attracting attention with universal.
Generally speaking, touch sensing device around sensing area (, non-sensing area or fan-out (fanout) district) conventionallyShielding layer (for example, black matrix" (blackmatrix, BM) layer) is set so that the use of shading and decoration to be provided. At present, industryBoundary adopts conventional black or the white photoresistance material as above-mentioned shielding layer. Moreover shielding layer is conventionally with wet process (exampleAs, screen printing (screenprinting) or rotary coating (spincoating)) make, shielding layer is had enoughThickness (for example, is greater than 1 micron (μ m)) and good shaded effect can be provided. But thick shielding layer can be in fan-outBetween district and sensing area, form section poor (stepheight), make subsequent deposition for after making the transparency conducting layer of sensing electrode,Between fanout area and sensing area, there is rainbow line (mura) phenomenon and affect display quality.
Therefore, be necessary to seek a kind of new shading/decorating film structure, it can improve or address the above problem.
Summary of the invention
One embodiment of the invention provides a kind of image display system, and it comprises: a touch sensing device, comprising: a transparent liningThe end, there is a sensing area and the non-sensing area in abutting connection with sensing area; One sensing electrode patterned layer, is positioned at the transparent lining of sensing areaAt at the end; And an Inorganic Dielectric Material layer, there is the First in the transparent substrates that is positioned at non-sensing area and be positioned at sensingDistrict and local one second of covering sensing electrode patterned layer.
Another embodiment of the present invention provides a kind of manufacture method of touch sensing device, comprising: provide a transparent substrates, its toolThere are a sensing area and the non-sensing area in abutting connection with sensing area; Form a sensing electrode patterned layer in the transparent substrates of sensing area;And forming an Inorganic Dielectric Material layer, it has the First in the transparent substrates that is positioned at non-sensing area and is positioned at sensingDistrict and local one second of covering sensing electrode patterned layer.
Known according to the technical scheme of the embodiment of the present invention: because sensing electrode is to make before forming shading/decorating film, because ofIt is poor that this can not form section between sensing area and non-sensing area. That is to say, can avoid rainbow line phenomenon, and then promote demonstrationQuality. Moreover, by changing the thickness of Inorganic Dielectric Material layer in shading/decorating film, can make shading/decorating film present requiredColor. In addition, shading/decorating film can be presented metallic luster or be strengthened albedo by reflecting layer. Compared to existing byShading/decorating film that photoresist forms, can provide the more color of user to select. In addition, due in decorating filmInorganic Dielectric Material layer, reflecting layer and protective layer can make with the parts of sensing area that are positioned at touch sensing device simultaneously andBecome, therefore the making of shading/decorating film can be integrated into the manufacture of touch sensing device easily, and then simplifies technique.
Brief description of the drawings
Figure 1A, Figure 1B, Fig. 1 C to Fig. 1 D show according to an embodiment of the invention touch-control sensing in image display systemThe manufacture method generalized section of device;
Fig. 2 shows the structure partial floor map of the sensing area of touch sensing device in Fig. 1 D;
Fig. 3 A, Fig. 3 B to Fig. 3 C show according to another embodiment of the present invention touch sensing device in image display systemManufacture method generalized section;
Fig. 4 A, Fig. 4 B, Fig. 4 C to Fig. 4 D show according to the present invention again touch-control in the image display system of another embodimentThe manufacture method generalized section of sensing apparatus; And
Fig. 5 shows image display system block schematic diagram according to another embodiment of the present invention.
Accompanying drawing number:
10～sensing area;
20～non-sensing area;
100～transparent substrates;
102～sensing electrode patterned layer;
102a～the second sense electrode groups;
102b～electrical connection section;
102c～the first sense electrode groups;
104～Inorganic Dielectric Material layer;
104a～First;
104b～the second;
105a～non-conductive reflecting layer;
105b～metal level;
105c, 106b, 110b～conductor layer;
106a～reflecting layer;
107～the first metal layer;
108～separation layer;
110a～the second metal level;
120～protective layer;
200～touch sensing device;
300～contact panel display;
400～input block;
500～electronic installation;
X～the first is axial; And
Y～the second is axial.
Detailed description of the invention
The image display system of the embodiment of the present invention is below described. But, can only understand easily embodiment provided by the present inventionMake and use the present invention with ad hoc approach for explanation, not in order to limit to scope of the present invention.
The image display system of different embodiments of the invention is below provided. Please refer to Fig. 1 D and Fig. 2, wherein Fig. 1 D showsThe generalized section of touch sensing device 200 in image display system according to an embodiment of the invention, and Fig. 2 illustrates and publishes pictureThe structure partial floor map of the sensing area of touch sensing device 200 in 1D. In the present embodiment, touch sensing device200 comprise: a transparent substrates 100, a sensing electrode patterned layer 102, an inorganic dielectric layer 104, a reflecting layer 106a,One conductor layer 106b and a protective layer 120. In one embodiment, transparent substrates 100 is made up of glass, in order to conductSensing glass and upper cover glass. In other embodiments, transparent substrates 100 also can be by quartz or other elasticity or non-resilient heightMolecule transparent material forms. In the present embodiment, transparent substrates 100 has a sensing area 10 and a non-sensing area 20.Conventionally sensing area 10 is positioned at the center of transparent substrates 100, but not sensing area 20 is adjacent to sensing area 10. At the present embodimentIn, non-sensing area 20 is positioned at the peripheral region of transparent substrates 100 and around sensing area 10.
Sensing electrode patterned layer 102 is positioned in the transparent substrates 100 of sensing area 10. Sensing electrode patterned layer 102 can be by thoroughlyBright conductive pattern layer (for example, indium tin oxide (indiumtinoxide, ITO) or indium-zinc oxide (indiumzincoxide,IZO) layer) institute forms, and generally includes two sense electrode groups that are arranged in array. In one embodiment, sensing electricityUtmost point patterned layer 102 comprise one first sense electrode groups and with its space on insulation (spatiallyinsulated) and be crisscross arrangedOne second sense electrode groups. In order to simplify accompanying drawing, only show a pair of the first sensing electrode 102c and staggered with it hereinA pair of the second sensing electrode 102a arranging, as shown in Figure 2. Each first sensing electrode 102c in the first sense electrode groupsBe electrically connected to each other on one first axial X via an electrical connection section 102b.
Inorganic Dielectric Material layer 104, is positioned in transparent substrates 100, and corresponding to sensing area 10 and non-sensing area 20. LiftExample, Inorganic Dielectric Material layer 104 has the First 104a in the transparent substrates 100 that is positioned at non-sensing area 20,In order to the Part I as shading/decorating film. Moreover Inorganic Dielectric Material layer 104 has the sensing area of being positioned at 10 and officePortion covers one second 104b of sensing electrode patterned layer 102. For instance, second of Inorganic Dielectric Material layer 104104b covers the electrical connection section 102b of sensing electrode patterned layer 102 on one second axial Y, as shown in Figure 2.
The thickness of Inorganic Dielectric Material layer can be less than 0.3 micron, and (μ m). Moreover, in one embodiment, Inorganic Dielectric MaterialLayer 104 can be an individual layer and can comprise one silica layer, a silicon nitride layer or other transparent inorganic polymer layers). In addition,Inorganic Dielectric Material layer 104 also can be sandwich construction (for example, stacking silicon oxide layer, silicon nitride layer or other transparent nothingsMachine macromolecule layer or its combination). The First 104a that in the present embodiment, can change Inorganic Dielectric Material layer 104 (,Shading/decorating film) thickness, make it present different colors because of light principle of interference.
Reflecting layer 106a is arranged at transparent substrates 100 tops of non-sensing area 20, to cover Inorganic Dielectric Material layer 104First 104a, and as a Part II of decorating film. Moreover reflecting layer 106a can further extend to sensing electrodePatterned layer 102, using cabling and connection pad as electrical connection sensing electrode patterned layer 102. In one embodiment, reflecting layer 106aCan be a single-layer metal layer (for example, aluminium, chromium, tin, zirconium or its alloy or its combination) or be sandwich construction (for example,Stacking aluminium, chromium, tin, zirconium or its alloy or its combination), make decorating film can further present metallic luster.
Conductor layer 106b is arranged on second 104b of Inorganic Dielectric Material layer 104. As shown in Fig. 1 D and Fig. 2, theIn two sense electrode groups, each second sensing electrode 102a is electrically connected to each other on the second axial Y via conductor layer 106b.Conductor layer 106b can be a single-layer metal layer (for example, aluminium, chromium, tin, zirconium or its alloy or its combination) or is multilayerStructure (for example, stacking aluminium, chromium, tin, zirconium or its alloy or its combination). In one embodiment, reflecting layer 106a106b is made up of same metal level with conductor layer.
Protective layer 120 is arranged in the transparent substrates 100 of sensing area 10 and non-sensing area 20, and covering reflecting layer 106a,Sensing electrode patterned layer 102 and conductor layer 106b. In one embodiment, protective layer 120 can comprise Inorganic Dielectric Material and beOne individual layer (for example, one silica layer, a silicon nitride layer or a silicon oxynitride layer) or be that sandwich construction is (for example, stackingSilicon oxide layer, silicon nitride layer or silicon oxynitride layer or its combination). In other embodiments, protective layer 120 also can includeMachine photoresist.
Please refer to Fig. 3 C, it shows according to another embodiment of the present invention touch sensing device 200 in image display systemGeneralized section, be wherein same as the parts in Fig. 1 D, use identical label and the description thereof will be omitted. Be different from Fig. 1 DEmbodiment, the touch sensing device 200 of the present embodiment comprises a non-conductive reflecting layer 105a and a metal level 105b. Non-Conductive reflective 105a can be the dielectric layer with high reflectance, for example: ink (for example, silver color or white ink), noContinuous phase metal (discontinuousphaseofmetal) or photoresistance (for example, silver color or white photoresistance). Moreover, goldBelong to layer 105b and be arranged at non-conductive reflecting layer 105a above, and extend to sensing electrode patterned layer 102, to feel as electrical connectionSurvey cabling and the connection pad of electrode pattern layer 102. In one embodiment, metal level 105b and conductor layer 105c are by same materialLayer institute forms, and can be a single-layer metal layer (for example, aluminium, chromium, tin, zirconium or its alloy or its combination) or be multilayerStructure (for example, stacking aluminium, chromium, tin, zirconium or its alloy or its combination). As shown in the conductor layer 106b of Fig. 2,Conductor layer 105c can make in the second sense electrode groups each second sensing electrode 102a electricity each other on the second axial Y equallyConnect.
Please refer to Fig. 4 D, it shows according to the present invention again touch sensing device 200 in the image display system of another embodimentGeneralized section, be wherein same as the parts in Fig. 1 D or Fig. 3 C, use identical label and the description thereof will be omitted. SimilarThe embodiment of Fig. 1 D, the touch sensing device 200 of the present embodiment comprises: a transparent substrates 100, a sensing electrode patterned layer102, an inorganic dielectric layer 104 and a protective layer 120. Moreover the touch sensing device 200 of the present embodiment further wrapsDraw together: a first metal layer 107, one second metal level 110a, a separation layer 108 and a conductor layer 110b. The first metalLayer 107 is arranged at transparent substrates 100 tops of non-sensing area 20, to cover the First 104a of Inorganic Dielectric Material layer 104And as reflecting layer, its material can be same as the reflecting layer 106a in Fig. 1 D. In one embodiment, the first metal layer 107Discontinuous phase metal (discontinuousphaseofmetal) layer that can be non-conductive single or multiple lift structure, it comprises:Aluminium, chromium, tin, zirconium or its alloy or its combination.
The second metal level 110a is arranged at the first metal layer 107 tops, and extends to sensing electrode patterned layer 102, using asCabling and the connection pad of electrical connection sensing electrode patterned layer 102, its material can be same as the metal level 105b in Fig. 3 C.
Separation layer 108 be located in the first metal layer 107 and the second metal level 110a between and extend to the first metal layer 107And the sidewall of below inorganic dielectric layer 104, make the first metal layer 107 and the second metal level 110a electrical isolation. Real oneExecute in example, the material of separation layer 108 can be same as inorganic dielectric layer 104 or protective layer 120.
Conductor layer 110b is arranged on second 104b of Inorganic Dielectric Material layer 104, makes protective layer 120 cover the second gold medalBelong to layer 110a, sensing electrode patterned layer 102 and conductor layer 110b. In addition, as shown in the conductor layer 106b of Fig. 2, wireLayer 110b can make each second sensing electrode 102a in the second sense electrode groups be electrically connected to each other on the second axial Y equally.In one embodiment, conductor layer 110b and the second metal level 110a with formed by same material layer.
Figure 1A, Figure 1B, Fig. 1 C to Fig. 1 D show the manufacture method of touch sensing device according to an embodiment of the inventionGeneralized section. Please refer to Figure 1A, a transparent substrates 100 is provided, it has a sensing area 10 and in abutting connection with sensing area 10One non-sensing area 20. Then, in the upper formation one sensing electrode patterned layer 102 of the transparent substrates 100 of sensing area 10, exampleAs be ITO or IZO patterned layer. Sensing electrode patterned layer 102 comprise one first sense electrode groups, with the first sensing electrodeOne second sense electrode groups and the electrical connection section 102b that on group space, insulate and be crisscross arranged. Attached in order to simplify hereinFigure, only show a pair of the first sensing electrode 102c (as shown in Figure 2) and with its space on insulation and be crisscross arranged a pair ofThe second sensing electrode 102a (as shown in Figure 1A and Fig. 2). Each first sensing electrode 102c in the first sense electrode groupsVia electrical connection section 102b be electrically connected to each other on one first axial X (as shown in Figure 2).
Please refer to Figure 1B, can utilize existing deposition technique, for example chemical vapour deposition (CVD) (chemicalvapordeposition,CVD), in transparent substrates 100, form an Inorganic Dielectric Material layer 104. Afterwards, come by existing photoetching and etching technicsPatterning Inorganic Dielectric Material layer 104, makes it have the First 104a in the transparent substrates 100 that is positioned at non-sensing area 20And be positioned at sensing area 10 and local one second 104b that covers sensing electrode patterned layer 102. First 104a is in order to doFor a Part I of shading/decorating film, and second 104b covers sensing electrode patterned layer 102 on one second axial YElectrical connection section 102b, as shown in Figure 2.
Please refer to Fig. 1 C, for example, in transparent substrates 100, form a conductive layer (not by existing depositing operation (, CVD)Illustrate), to cover Inorganic Dielectric Material layer 104 and the sensing electrode patterned layer 102 in Figure 1B. Afterwards, by existing lightQuarter and etching technics carry out patterned conductive layer, to form a reflecting layer 106a above the transparent substrates 100 at non-sensing area 20And cover the First 104a of Inorganic Dielectric Material layer 104, and at second of the Inorganic Dielectric Material layer 104 of sensing area 10The upper conductor layer 106b that forms of the 104b of portion. Reflecting layer 106a extends to sensing electrode patterned layer 102, to feel as electrical connectionSurvey cabling and the connection pad of electrode pattern layer 102. Moreover conductor layer 106b also extends to sensing electrode patterned layer 102, makes itThe second adjacent sensing electrode 102a be electrically connected the second sense electrode groups on the second axial Y in, as shown in Figure 2.
Please refer to Fig. 1 D, for example, in the structure of Fig. 1 C, form a protective layer 120 by existing depositing operation (, CVD),To cover reflecting layer 106a, sensing electrode patterned layer 102 and conductor layer 106b.
Fig. 3 A, Fig. 3 B to Fig. 3 C show the manufacture method section of touch sensing device according to another embodiment of the present inventionSchematic diagram, is wherein same as the parts in Figure 1A, Figure 1B, Fig. 1 C to Fig. 1 D, uses identical label and omits it and sayBright. Please refer to Fig. 3 A, a transparent substrates 100 is provided, on it, there is a sensing electrode patterned layer 102 and an inorganic dielectricMaterial layer 104, and be same as the structure of Figure 1B. Then, on the First 104a of Inorganic Dielectric Material layer 104, formOne non-conductive reflecting layer 105a, it is the dielectric layer with high reflectance, for example: ink (for example, silver color or white ink),Discontinuous phase metal or photoresistance (for example, silver color or white photoresistance).
Please refer to Fig. 3 B, sequentially for example, by existing depositing operation (, CVD), photoetching and etching technics, at non-sensing area20 the upper metal level 105b that forms of non-conductive reflecting layer 105a, to strengthen albedo. Meanwhile, in the nothing of sensing area 10Second 104b of machine dielectric materials layer 104 be upper forms a conductor layer 105c and via second of Inorganic Dielectric Material layer 104The sidewall of the 104b of portion extends to sensing electrode patterned layer 102. Metal level 105b can be further via non-conductive reflecting layer 105aAnd the sidewall of the First 104a of the Inorganic Dielectric Material layer 104 of below extends to sensing electrode patterned layer 102.
Please refer to Fig. 3 C, for example, in the structure of Fig. 3 B, form a protective layer 120 by existing depositing operation (, CVD),With covering metal layer 105b, sensing electrode patterned layer 102 and conductor layer 105c.
Fig. 4 A, Fig. 4 B, Fig. 4 C to Fig. 4 D show the manufacture of the touch sensing device of another embodiment again according to the present inventionMethod generalized section, is wherein same as the parts in Figure 1A, Figure 1B, Fig. 1 C to Fig. 1 D, use identical label andThe description thereof will be omitted. Please refer to Fig. 4 A, a transparent substrates 100 is provided, on it, there is a sensing electrode patterned layer 102 and oneInorganic Dielectric Material layer 104, and be same as the structure of Figure 1B. Then, sequentially by existing deposition technique (for example, CVD),Photoetching and etching technics form a first metal layer 107 above the transparent substrates 100 of non-sensing area 20, inorganic to coverThe First 104a of dielectric materials layer 104 as a reflecting layer. In other embodiments, can pass through metal non-conducting vacuumElectroplate (non-conductivevacuummetallization, NCVM) technique, form one non-conductive at non-sensing area 20Discontinuous phase metal level, to replace the first metal layer 107.
Please refer to Fig. 4 B, sequentially for example, by existing depositing operation (, CVD) and photoetching and etching technics, at non-sensingOn the first metal layer 107 in district 20, form a separation layer 108. Separation layer 108 can be via the first metal layer 107 and below thereofInorganic Dielectric Material layer 104 First 104a sidewall and extend to sensing electrode patterned layer 102.
Please refer to Fig. 4 C, sequentially for example, by existing depositing operation (, CVD), photoetching and etching technics, at separation layer 108Upper formation one second metal level 110a. Meanwhile, shape on second 104b of the Inorganic Dielectric Material layer 104 of sensing area 10Become a conductor layer 110b and extend to sensing electrode patterned layer via the sidewall of second 104b of Inorganic Dielectric Material layer 104102. Metal level 105b can further extend to sensing electrode patterned layer 102 via the sidewall of separation layer 108. In this situationIn, the second metal level 110a by separation layer 108 and with the first metal layer 107 electrical isolation.
Please refer to Fig. 4 D, for example, in the structure of Fig. 4 C, form a protective layer 120 by existing depositing operation (, CVD),To cover the second metal level 110a, sensing electrode patterned layer 102 and conductor layer 110b.
According to above-described embodiment, because sensing electrode is to make forming before shading/decorating film, therefore not can sensing area withBetween non-sensing area, form section poor. That is to say, can avoid rainbow line phenomenon, and then promote display quality. Moreover, pass throughThe thickness that changes Inorganic Dielectric Material layer in shading/decorating film, can make shading/decorating film present required color. In addition, hideLight/decorating film can be presented metallic luster or be strengthened albedo by reflecting layer. Formed by photoresist compared to existingShading/decorating film, can provide the more color of user to select. In addition, due to the Inorganic Dielectric Material layer in decorating film,Reflecting layer and protective layer can be made with the parts of the sensing area that is positioned at touch sensing device simultaneously, therefore shading/decorating filmMaking can be integrated into the manufacture of touch sensing device easily, and then simplifies technique.
Fig. 5 shows image display system block schematic diagram according to another embodiment of the present invention, and it may be implemented in contact panelDisplay 300 or electronic installation 500, for example: panel computer (tabletpersonalcomputer), projector, e-book,Notebook computer, mobile phone, digital camera, personal digital assistant (PDA), desktop computer, television set, automobile-used demonstrationDevice or Portable DVD player. Can be arranged at contact panel display according to the touch sensing device 200 of the present embodiment300. In other embodiments, touch sensing device 200 can be arranged at electronic installation 500. As shown in Figure 5, electronic installation500 comprise: contact panel display 300 and input block 400. Input block 400 is coupled to contact panel display 300,For example, in order to provide input signal (, signal of video signal) to contact panel display 300, make contact panel display 300 aobviousShow image.
Although the present invention discloses as above with preferred embodiment, so it is not in order to limit the present invention, the technology of any this areaPersonnel, without departing from the spirit and scope of the present invention, when can do change with retouching, therefore protection scope of the present invention when withClaim institute confining spectrum is as the criterion.
Claims (23)
1. an image display system, is characterized in that, described image display system comprises:
One touch sensing device, comprising:
One transparent substrates, has a sensing area and the non-sensing area in abutting connection with described sensing area;
One sensing electrode patterned layer, is positioned in the described transparent substrates of described sensing area;
One Inorganic Dielectric Material layer, has a First and position in the described transparent substrates that is positioned at described non-sensing areaIn described sensing area and local one second of covering described sensing electrode patterned layer; And
One reflecting layer, is arranged at the described transparent substrates top of described non-sensing area, and covers described Inorganic Dielectric MaterialThe described First of layer.
2. image display system as claimed in claim 1, is characterized in that, described sensing electrode patterned layer comprises:
One first sense electrode groups and with its space on insulation and one second sense electrode groups that is crisscross arranged; And
One electrical connection section, is electrically connected described the first sense electrode groups one first on axially;
Described second of wherein said Inorganic Dielectric Material layer covers described electrical connection section one second on axially.
3. image display system as claimed in claim 2, is characterized in that, described touch sensing device more comprises:
One conductor layer, be arranged at described Inorganic Dielectric Material layer described second upper, and described second axially on electrical connectionDescribed the second sense electrode groups.
4. image display system as claimed in claim 3, is characterized in that, described reflecting layer extends to described sensing electrodePatterned layer, and formed by same material layer with described conductor layer.
5. image display system as claimed in claim 3, is characterized in that, described reflecting layer is a non-conductive reflecting layer.
6. image display system as claimed in claim 5, is characterized in that, the material in described non-conductive reflecting layer is to be selected fromInk, photoresistance and discontinuous phase metal level one of them.
7. image display system as claimed in claim 5, is characterized in that, described touch sensing device more comprises:
One metal level, is arranged at above the described transparent substrates of described non-sensing area, to cover described non-conductive reflecting layer.
8. image display system as claimed in claim 7, is characterized in that, described metal level extends to described sensing electrodePatterned layer, and formed by same material layer with described conductor layer.
9. image display system as claimed in claim 8, is characterized in that, described touch sensing device more comprises a protectionLayer covers described metal level, described sensing electrode patterned layer and described conductor layer.
10. image display system as claimed in claim 2, is characterized in that, described touch sensing device more comprises:
One the first metal layer, is arranged at above the described transparent substrates of described non-sensing area, to cover described Inorganic Dielectric MaterialThe described First of layer;
One second metal level, is arranged at described the first metal layer top, and extends to described sensing electrode patterned layer;
One separation layer, is located between described the first metal layer and described the second metal level, make described the first metal layer with described inThe second metal level electrical isolation; And
One conductor layer, be arranged at described Inorganic Dielectric Material layer described second upper, and be electrically connected institute one second on axiallyState the second sense electrode groups, wherein said the second metal level and described conductor layer are made up of same material layer.
11. image display systems as claimed in claim 10, is characterized in that, described touch sensing device more comprises a guarantorSheath, covers described the second metal level, described sensing electrode patterned layer and described conductor layer.
12. image display systems as claimed in claim 1, is characterized in that, more comprise a contact panel display, whereinDescribed contact panel display comprises described touch sensing device.
13. image display systems as claimed in claim 12, is characterized in that, more comprising one, to have described contact panel aobviousShow the electronic installation of device, described electronic installation comprises: a panel computer, a projector, an e-book, a notebook computer,One mobile phone, a digital camera, a personal digital assistant, a desktop computer, a television set, a vehicle display orPortable DVD player.
The manufacture method of 14. 1 kinds of touch sensing devices, is characterized in that, the manufacture method of described touch sensing device comprises:
One transparent substrates is provided, and it has a sensing area and the non-sensing area in abutting connection with described sensing area;
Form a sensing electrode patterned layer in the described transparent substrates of described sensing area;
Form an Inorganic Dielectric Material layer, its have a First in the described transparent substrates that is positioned at described non-sensing area andBe positioned at described sensing area and local one second of covering described sensing electrode patterned layer; And
Form a reflecting layer in the described transparent substrates top of described non-sensing area, to cover the institute of described Inorganic Dielectric Material layerState First.
The manufacture method of 15. touch sensing devices as claimed in claim 14, is characterized in that, described sensing electrode patternLayer comprises:
One first sense electrode groups and with its space on insulation and one second sense electrode groups that is crisscross arranged; And
One electrical connection section, is electrically connected described the first sense electrode groups one first on axially;
Described second of wherein said Inorganic Dielectric Material layer covers described electrical connection section one second on axially.
The manufacture method of 16. touch sensing devices as claimed in claim 15, is characterized in that, described touch sensing deviceManufacture method more comprise:
Form a conductor layer in described Inorganic Dielectric Material layer described second upper, make described conductor layer described second axialDescribed the second sense electrode groups of upper electrical connection.
The manufacture method of 17. touch sensing devices as claimed in claim 16, is characterized in that, described reflecting layer extends toDescribed sensing electrode patterned layer, and formed by same material layer with described conductor layer.
The manufacture method of 18. touch sensing devices as claimed in claim 16, is characterized in that, described reflecting layer is one non-Conductive reflective.
The manufacture method of 19. touch sensing devices as claimed in claim 18, is characterized in that, described touch sensing deviceManufacture method more comprise:
Form a metal level in the described transparent substrates top of described non-sensing area, to cover described non-conductive reflecting layer.
The manufacture method of 20. touch sensing devices as claimed in claim 19, is characterized in that, described metal level extends toDescribed sensing electrode patterned layer, and formed by same material layer with described conductor layer.
The manufacture method of 21. touch sensing devices as claimed in claim 20, is characterized in that, described touch sensing deviceManufacture method more comprise form a protective layer, to cover described metal level, described sensing electrode patterned layer and described conductor layer.
The manufacture method of 22. touch sensing devices as claimed in claim 15, is characterized in that, described touch sensing deviceManufacture method more comprise:
Form a first metal layer in the described transparent substrates top of described non-sensing area, to cover described Inorganic Dielectric Material layerDescribed First;
Form one second metal level in described the first metal layer top and extend to described sensing electrode patterned layer, and forming simultaneouslyOne conductor layer in described Inorganic Dielectric Material layer described second upper, to be electrically connected described the second sensing one second on axiallyElectrode group; And
Form a separation layer and be located between described the first metal layer and described the second metal level, make described the first metal layer and instituteState the second metal level electrical isolation.
The manufacture method of 23. touch sensing devices as claimed in claim 22, is characterized in that, described touch sensing deviceManufacture method more comprise form a protective layer, to cover described the second metal level and described conductor layer.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110341188.2A CN103092379B (en) | 2011-11-02 | 2011-11-02 | The manufacture method of image display system and touch sensing device |
| CN201610218879.6A CN105867690B (en) | 2011-11-02 | 2011-11-02 | The manufacturing method of image display system and touch sensing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110341188.2A CN103092379B (en) | 2011-11-02 | 2011-11-02 | The manufacture method of image display system and touch sensing device |
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| JP5848851B2 (en) * | 2013-07-11 | 2016-01-27 | 株式会社アルバック | Touch panel, manufacturing method thereof, optical thin film substrate, and manufacturing method thereof |
| TWI531939B (en) | 2014-04-22 | 2016-05-01 | 群創光電股份有限公司 | Touch panels |
| CN105005402A (en) * | 2014-04-22 | 2015-10-28 | 群创光电股份有限公司 | Touch panel |
| JP6122216B2 (en) | 2014-05-01 | 2017-04-26 | 株式会社アルバック | Touch panel and method for manufacturing the same, display device and method for manufacturing the same |
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| CN105867690A (en) | 2016-08-17 |
| CN105867690B (en) | 2019-02-12 |
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