CN103086386A - Supermacroporous silica gel process flow - Google Patents

Supermacroporous silica gel process flow Download PDF

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Publication number
CN103086386A
CN103086386A CN2012105738770A CN201210573877A CN103086386A CN 103086386 A CN103086386 A CN 103086386A CN 2012105738770 A CN2012105738770 A CN 2012105738770A CN 201210573877 A CN201210573877 A CN 201210573877A CN 103086386 A CN103086386 A CN 103086386A
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Prior art keywords
silica gel
reaction tower
temperature
tank
washing
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CN2012105738770A
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Chinese (zh)
Inventor
乔伟光
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Qingdao Zhongneng Group Co Ltd
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Qingdao Zhongneng Group Co Ltd
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Priority to CN2012105738770A priority Critical patent/CN103086386A/en
Publication of CN103086386A publication Critical patent/CN103086386A/en
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Abstract

The invention relates to a supermacroporous silica gel process flow. The flow comprises mixing, reacting and washing through an alkali preparation pool, an acid preparation tank, a reaction tower and a washing tank. The concrete process flow comprises the steps of preparing sodium silicate solution of which the SiO2 content is 30-40% through the alkali preparation pool on silica gel production equipment, wherein the temperature is 30-35 DEG C; preparing sulfuric acid solution of which the content is 15-25% in the acid preparation tank, wherein the temperature is 20-35 DEG C; adding sulfuric acid solution to the reaction tower; adding the prepared sodium silicate solution to the reaction tower to form silica gel particles after reacting, enabling the silica gel particles to age for 15-18 hours in acid solution of which the pH value is 1-3, and then entering the washing tank to wash in the water at 75-85 DEG C, and soaking for 6-8 hours by ammonia after washing to the finishing point, and then pressing and baking in an oven to obtain the supermacroporous silica gel.

Description

The technical process of a kind of oversized hole silica gel
Technical field
The invention belongs to silica gel manufacturing technology field, be specifically related to the technical process of a kind of oversized hole silica gel.
background technology
The Application Areas of silica gel is day by day extensive; with regard to current should being used for, see; the silica gel majority that plays dry and provide protection at industrial circles such as electronic product dehumidifyings is oversized hole silica gel; oversized hole silica gel has all obtained good application in Application Areass such as flocculating aids, matting agent, tactile flat agent in addition, and the effect that existing Technology obtains on size-grade distribution at present is also not obvious.
Summary of the invention
The present invention has overcome the deficiencies in the prior art, has proposed the technical process of a kind of oversized hole silica gel, and described oversized hole silica gel is to carry out colloidal sol by water glass and sulfuric acid to react and make.
Technical scheme of the present invention is: the technical process of a kind of oversized hole silica gel, and described flow process is mixed, is reacted and washed by joining alkali pond, complex acid tank, reaction tower and water washing tank, and the concrete technology flow process is: on silica gel production equipment, by joining the alkali pond, prepare SiO 2the sodium silicate solution that content is 30-40%, temperature is 30-35 ℃, the sulphuric acid soln that configuration content is 15-25% in the complex acid tank, temperature is 20-35 ℃, sulphuric acid soln is joined in reaction tower, again the sodium silicate solution prepared is joined in reaction tower, form silica gel particle after reaction, silica gel particle is at pH value in the acidic solution at 1-3 after aging 15-18 hour, enter into water washing tank, washed in the water of 75-85 ℃, washing is carried out ammonia bubble 6-8 hour after terminal, then in baking oven, press filtration is dried, and obtains oversized hole silica gel.
The reaction tower interior reaction temperature is 100-110 ℃.
In water washing tank, washing time is 70-75 hour.
The temperature of press filtration baking stage baking oven is 100-150 ℃, and drying time is 48-52 hour.
The present invention has following beneficial effect:
1) without starting material are carried out to special processing.
2) production process is all carried out under condition of normal pressure, is conducive to large-scale production.
3) in water washing process, washing temperature is carried out at normal temperatures, the silica gel even particle size distribution made.
4) can according to the client need to carry out the reaming processing in water washing process, meet different clients' index request.
5) shortened the production cycle, utilization ratio of device obviously improves.
Further illustrate the present invention below in conjunction with embodiment.
Embodiment
Below embodiment of the present invention:
Embodiment 1:
First 10 liter of 15% sulphuric acid soln joined to experiment with in reaction tower, then by 6 liters of SiO that prepare 2the sodium silicate solution that content is 30% is injected to experiment with in reaction tower, in tower, temperature is 105 ℃, enter into the experimental water cleaning of evaporator after aging 16 hours in acidic solution at pH value at 1-3, in the water of 78 ℃, washed, carry out the ammonia bubble after washing to 70 hour 7 hours, then the temperature of press filtration baking stage baking oven is 100 ℃, and drying time is that 50 hours experimental datas are as table 1.
Table 1 experimental data table
Figure 2012105738770100002RE-DEST_PATH_IMAGE002
Embodiment 2:
First 10 liter of 18% sulphuric acid soln joined to experiment with in reaction tower, then by 6 liters of SiO that prepare 2the sodium silicate solution that content is 35% is injected to experiment with in reaction tower, in tower, temperature is 107 ℃, enter into the experimental water cleaning of evaporator after aging 17 hours in acidic solution at pH value at 1-3, in the water of 80 ℃, washed, carry out the ammonia bubble after washing to 72 hour 7 hours, then the temperature of press filtration baking stage baking oven is 130 ℃, and drying time is that 52 hours experimental datas are as table 2.
Table 2 experimental data table
Figure 2012105738770100002RE-DEST_PATH_IMAGE004
Embodiment 3:
First 10 liter of 20% sulphuric acid soln joined to experiment with in reaction tower, then by 6 liters of SiO that prepare 2the sodium silicate solution that content is 38% is injected to experiment with in reaction tower, in tower, temperature is 109 ℃, enter into the experimental water cleaning of evaporator after aging 15 hours in acidic solution at pH value at 1-3, in the water of 85 ℃, washed, carry out the ammonia bubble after washing to 73 hour 7 hours, then the temperature of press filtration baking stage baking oven is 140 ℃, and drying time is that 50 hours experimental datas are as table 3.
Table 3 experimental data table
Embodiment 4:
First 10 liter of 25% sulphuric acid soln joined to experiment with in reaction tower, then by 6 liters of SiO that prepare 2the sodium silicate solution that content is 40% is injected to experiment with in reaction tower, in tower, temperature is 105 ℃, enter into the experimental water cleaning of evaporator after aging 18 hours in acidic solution at pH value at 1-3, in the water of 74 ℃, washed, carry out the ammonia bubble after washing to 75 hour 7 hours, then the temperature of press filtration baking stage baking oven is 148 ℃, and drying time is that 52 hours experimental datas are as table 4.
Table 4 experimental data table
Figure 2012105738770100002RE-DEST_PATH_IMAGE008
Embodiment 5:
First 10 liter of 19% sulphuric acid soln joined to experiment with in reaction tower, then by 6 liters of SiO that prepare 2the sodium silicate solution that content is 38% is injected to experiment with in reaction tower, in tower, temperature is 105 ℃, enter into the experimental water cleaning of evaporator after aging 18 hours in acidic solution at pH value at 1-3, in the water of 85 ℃, washed, carry out the ammonia bubble after washing to 73 hour 7 hours, then the temperature of press filtration baking stage baking oven is 130 ℃, and drying time is that 50 hours experimental datas are as table 5.
Table 5 experimental data table
Figure 2012105738770100002RE-DEST_PATH_IMAGE010

Claims (2)

1. oversized hole silica gel technical process is characterized in that: described flow process is mixed, is reacted and washed by joining alkali pond, complex acid tank, reaction tower and water washing tank, and the concrete technology flow process is: on silica gel production equipment, by joining the alkali pond, prepare SiO 2the sodium silicate solution that content is 30-40%, temperature is 30-35 ℃, the sulphuric acid soln that configuration content is 15-25% in the complex acid tank, temperature is 20-35 ℃, sulphuric acid soln is joined in reaction tower, again the sodium silicate solution prepared is joined in reaction tower, form silica gel particle after reaction, silica gel particle is at pH value in the acidic solution at 1-3 after aging 15-18 hour, enter into water washing tank, in the water of 75-85 ℃, washed, in water washing tank, washing time is 70-75 hour, washing is carried out ammonia bubble 6-8 hour after terminal, then in baking oven, press filtration is dried, obtain oversized hole silica gel.
2. oversized hole silica gel according to claim 1 technical process is characterized in that: the reaction tower interior reaction temperature is 100-110 ℃.
CN2012105738770A 2012-12-26 2012-12-26 Supermacroporous silica gel process flow Pending CN103086386A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107512721A (en) * 2016-06-16 2017-12-26 广州凌玮科技股份有限公司 It is a kind of that the production method of macro porous silica gel is prepared as raw material using the potassium feldspar white residue that gives up

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101591021A (en) * 2009-06-29 2009-12-02 青岛中能集团有限公司 A kind of preparation method of thick-hole block silica gel
CN101591022A (en) * 2009-06-29 2009-12-02 青岛中能集团有限公司 A kind of preparation process of high-purity silica gel and method
CN201660448U (en) * 2009-06-29 2010-12-01 青岛中能集团有限公司 High-purity silica gel washing device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101591021A (en) * 2009-06-29 2009-12-02 青岛中能集团有限公司 A kind of preparation method of thick-hole block silica gel
CN101591022A (en) * 2009-06-29 2009-12-02 青岛中能集团有限公司 A kind of preparation process of high-purity silica gel and method
CN201660448U (en) * 2009-06-29 2010-12-01 青岛中能集团有限公司 High-purity silica gel washing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107512721A (en) * 2016-06-16 2017-12-26 广州凌玮科技股份有限公司 It is a kind of that the production method of macro porous silica gel is prepared as raw material using the potassium feldspar white residue that gives up

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