CN103074685A - High concentration Nd-doped YAG laser crystal growth method - Google Patents

High concentration Nd-doped YAG laser crystal growth method Download PDF

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CN103074685A
CN103074685A CN2013100401888A CN201310040188A CN103074685A CN 103074685 A CN103074685 A CN 103074685A CN 2013100401888 A CN2013100401888 A CN 2013100401888A CN 201310040188 A CN201310040188 A CN 201310040188A CN 103074685 A CN103074685 A CN 103074685A
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王彪
权纪亮
朱允中
马德才
杨名鸣
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Sun Yat Sen University
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Abstract

本发明公开一种高浓度Nd掺杂YAG激光晶体生长方法,该方法基于中频感应激光晶体炉,该方法涉及掺钕钇铝石榴石工艺领域,包括七个步骤4个阶段的生长方法。本发明所提供的高浓度Nd掺杂YAG激光晶体生长方法可获得直径Ф25~45mm、掺钕浓度1.17~1.41at%、浓度梯度小、散射颗粒少、质量较高的Nd:YAG激光晶体,工艺稳定,晶体成炉率较高,具有很好的应用前景。

Figure 201310040188

The invention discloses a high-concentration Nd-doped YAG laser crystal growth method. The method is based on an intermediate-frequency induction laser crystal furnace. The method relates to the field of neodymium-doped yttrium aluminum garnet technology, and includes seven steps and four stages of growth methods. The high-concentration Nd-doped YAG laser crystal growth method provided by the present invention can obtain Nd:YAG laser crystals with a diameter of 25-45mm, a neodymium-doped concentration of 1.17-1.41at%, a small concentration gradient, few scattering particles, and high quality. It is stable, has a high crystal formation rate, and has a good application prospect.

Figure 201310040188

Description

A kind of high density Nd doping YAG laser crystal growth method
Technical field
The present invention relates to neodymium-doped yttrium-aluminum garnet technology field (abbreviation Nd:YAG), particularly a kind of high density Nd doping YAG laser crystal growth method.
Background technology
The Nd:YAG laser crystals has the advantages such as optical homogeneity is good, high gain, good mechanical property, is one of best, the most frequently used at present solid laser material.Because the application popularization of solid high power pulse laser welding technique and equipment, accelerated solid statelaser towards superpower, high-level efficiency, the future development of high light velocity quality, demand to high quality YAG series laser crystal increases rapidly, the used Nd:YAG laser crystal material of high power laser is by the Medium frequency induction Czochralski grown at present, the highest 1.1at% that is no more than of its neodymium-doped concentration, cause it by using large size Nd:YAG laser crystal bar or lath-shaped dual-tripler to obtain high-power output, and the use of large size Nd:YAG laser crystals can strengthen the difficulty of cooling, again because the little defective of quantum benefit of himself, be easy to produce thermal lensing effect when working long hours, can make the Laser output Efficiency Decreasing.Investigators had carried out the research of high neodymium-doped Nd:YAG laserable material and substitute in the last few years, such as the terraced method growth of temperature high density, large size Nd:YAG laser crystals, the Nd:YAG transparent laser ceramic that the development doping content is high etc., but because defective is more or also in the stage of fumbling, application all is very limited.
Summary of the invention
Based on this, for above-mentioned problems of the prior art, the object of the present invention is to provide the high density Nd doping YAG laser crystal growth method that a kind of neodymium-doped concentration is high, concentration gradient is little, scattering particles are few, quality is higher.
For achieving the above object, technical solution of the present invention is:
A kind of high density Nd doping YAG laser crystal growth method, the method comprises step based on the Medium frequency induction laser crystal growth furnace:
S1. with purity more than or equal to 99.999% yttrium oxide Y 2O 3, aluminium oxide Al 2O 3, Neodymium trioxide Nd 2O 3600 ~ 800 ℃ of lower calcinations 4 ~ 8 hours, again by default neodymium-doped concentration calculate, weighing is configured to bed material;
S2. the bed material for preparing among the step S1 is packed in the Plastic Bottle, be fixed on the mixer and fully mixed 24 ~ 48 hours;
S3. the powder that mixes among the step S2 is put into the latex mould, pass through again 200 ~ 300MPa isostatic pressing after the sealing;
S4. seed crystal is put into the iridium crucible seed rod of required employing;
S5. the raw material of moulding is put into the iridium crucible of diameter 60~120mm, vacuumized after adjusting the concentricity of coil, heat-insulation system, seed crystal, iridium crucible, when body of heater vacuum tightness reaches 3.5 ~ 4.5Pa, pour argon gas;
S6. starting the Medium frequency induction laser crystal growth furnace heats up the heating system in the burner hearth, after raw material in iridium crucible described in the step S5 all melts, the melt liquid fluid line begins slowly to descend seed crystal when steady and audible, contact liquid level elapsed-time standards is about 1~2 hour from lower seed crystal to seed crystal, and constant temperature was 1 ~ 2 hour when the adjusting melt temperature made seed crystal reduced 1 ~ 2mm;
S7. lift seed crystal, the growth of beginning crystal, its direction of growth is<111 〉, the crystal growth comprises 4 stages:
In the shouldering stage, brilliant raising speed rate is 0.6~0.7mm/h during shouldering, and brilliant rotational speed rate is 16~18 rev/mins, and the shouldering angle is controlled at 40 O~ 50 O, at crystal shouldering growth later stage brilliant raising speed rate to the 0.5~0.55mm/h that will progressively slow down, reducing brilliant rotational speed rate to 14~15 rev/min, it is mild that temperature rate is wanted, and when shouldering place diameter and crystal target diameter differ 2 ~ 4mm, begins constant temperature;
Deng through growth phase, the growth of crystal constant temperature entered the isodiametric growth stage after 15~48 hours, brilliant raising speed rate slows to 0.4~0.45mm/h along with the length increase of isodiametric growth of crystal, brilliant rotational speed rate slowly is decreased to 12~13 rev/mins, crystal growth temperature control speed span can not be excessive, makes the crystal diameter deviation control within 1 ~ 2mm;
The ending stage, the crystal growth begins the ending that heats up after reaching predetermined length, along with diminishing of crystal diameter slowly improved brilliant raising speed rate to 0.6~0.65mm/h, brilliant rotational speed rate also will progressively slow to 9~11 rev/mins, when crystal diameter is reduced to 4~6mm left and right sides, carried out isodiametric growth 8~10 hours, at last cooling makes the crystal diameter change expand into greatly " lid " type again, to prevent crystal cleavage and protection crucible;
Temperature-fall period, crystal growth finish rear temperature with vitellarium in the rate reduction iridium crucible of 10~80 ℃/h, until room temperature.
The high density Nd doping YAG laser crystal growth method that this programme provides can obtain diameter Ф 25~45mm, neodymium-doped concentration 1.17~1.41 at%, concentration gradient is little, scattering particles are few, quality is higher Nd:YAG laser crystals, process stabilizing, crystal become the stove rate higher.This product is made when laser apparatus uses has the advantages that the Output of laser energy is high, service efficiency is high, is suitable for superpower continuous wave laser or pulsed laser; Also can satisfy the miniature laser application demand of some needs output high-powers, have good application prospect.
Further, in one embodiment, the vision slit outer end of described Medium frequency induction laser crystal growth furnace is equipped with YAG polishing eyeglass.In order to reduce radially heat dissipation capacity of crystal, reduce radially thermal stresses, further promote crystal quality.
Further, in one embodiment, the zirconium white annulus is equipped with in the shielding at described Medium frequency induction laser crystal growth furnace top upper end.Axial-temperature gradient when lifting to cold zone in order to reduce crystal further promotes crystal quality.
Further, in one embodiment, the purity of argon that pours among the described step S5 is more than or equal to 99.9999%.Effectively reduce the crucible loss, promote the quality of crystal, prolong pot life.
Compared with prior art, the present invention has following beneficial effect: high density Nd doping YAG laser crystal growth method provided by the present invention can obtain diameter Ф 25~45mm, neodymium-doped concentration 1.17~1.41 at%, concentration gradient is little, scattering particles are few, quality is higher Nd:YAG laser crystals, process stabilizing, crystal becomes the stove rate higher, has good application prospect.
Description of drawings
Fig. 1 is embodiment of the invention Medium frequency induction laser crystal growth furnace structural representation.
Embodiment
The present invention is further detailed explanation below in conjunction with drawings and Examples.
Embodiment one
A kind of high density Nd doping YAG laser crystal growth method, the method is based on the Medium frequency induction laser crystal growth furnace, and it comprises step:
S1. with purity more than or equal to 99.999% yttrium oxide Y 2O 3, aluminium oxide Al 2O 3, Neodymium trioxide Nd 2O 3600 ℃ of lower calcinations 8 hours, again by default neodymium-doped concentration calculate, weighing is configured to bed material;
S2. the bed material for preparing among the step S1 is packed in the Plastic Bottle, be fixed on the mixer and fully mixed 48 hours;
S3. the powder that mixes among the step S2 is put into the latex mould, pass through again the 300MPa isostatic pressing after the sealing;
S4. seed crystal is put into the iridium crucible seed rod of required employing;
S5. the raw material of moulding is put into the iridium crucible of diameter 60~120mm, vacuumized after adjusting the concentricity of coil, heat-insulation system, seed crystal, iridium crucible, when body of heater vacuum tightness reaches the 4.5Pa left and right sides, pour purity greater than 99.9999% argon gas;
S6. starting the Medium frequency induction laser crystal growth furnace heats up the heating system in the burner hearth, after raw material in iridium crucible described in the step S5 all melts, the melt liquid fluid line begins slowly to descend seed crystal when steady and audible, contact liquid level elapsed-time standards is about 2 hours from lower seed crystal to seed crystal, and constant temperature was 2 hours when the adjusting melt temperature made seed crystal reduced 2mm;
S7. lift seed crystal, the growth of beginning crystal, its direction of growth is<111 〉, the crystal growth comprises 4 stages:
In the shouldering stage, brilliant raising speed rate is 0.7mm/h during shouldering, and brilliant rotational speed rate is 18 rev/mins, and the shouldering angle is controlled at 50 O, the later stage to progressively slow down brilliant raising speed rate to 0.55mm/h in crystal shouldering growth, reduce brilliant rotational speed rate to 15 rev/min, it is mild that rate of temperature fall is wanted, and when shouldering place diameter and crystal target diameter differ 4mm, begins constant temperature;
Deng through growth phase, the growth of crystal constant temperature entered the isodiametric growth stage after 48 hours, brilliant raising speed rate slows to 0.45mm/h along with the length increase of isodiametric growth of crystal, brilliant rotational speed rate slowly is decreased to 13 rev/mins, crystal growth temperature control speed span can not be excessive, makes the crystal diameter deviation control within 2mm;
The ending stage, the crystal growth begins the ending that heats up after reaching predetermined length, along with diminishing of crystal diameter slowly improved brilliant raising speed rate to 0.65mm/h, brilliant rotational speed rate also will progressively slow to 11 rev/mins, when crystal diameter is reduced to the 6mm left and right sides, carried out isodiametric growth 10 hours, at last cooling makes the crystal diameter change expand into greatly " lid " type again, to prevent crystal cleavage and protection crucible;
Temperature-fall period, crystal growth finish rear temperature with vitellarium in the rate reduction iridium crucible of 70 ℃/h, until room temperature.
The vision slit outer end of described Medium frequency induction laser crystal growth furnace is equipped with YAG polishing eyeglass.In order to reduce radially heat dissipation capacity of crystal, reduce radially thermal stresses, further promote crystal quality
The zirconium white annulus is equipped with in the shielding upper end at described Medium frequency induction laser crystal growth furnace top.Axial-temperature gradient when lifting to cold zone in order to reduce crystal further promotes crystal quality.
 
Embodiment two
A kind of high density Nd doping YAG laser crystal growth method, the method is based on the Medium frequency induction laser crystal growth furnace, and it comprises step:
S1. with purity more than or equal to 99.999% yttrium oxide Y 2O 3, aluminium oxide Al 2O 3, Neodymium trioxide Nd 2O 3700 ℃ of lower calcinations 5 hours, again by default neodymium-doped concentration calculate, weighing is configured to bed material;
S2. the bed material for preparing among the step S1 is packed in the Plastic Bottle, be fixed on the mixer and fully mixed 30 hours;
S3. the powder that mixes among the step S2 is put into the latex mould, pass through again the 250MPa isostatic pressing after the sealing;
S4. seed crystal is put into the iridium crucible seed rod of required employing;
S5. the raw material of moulding is put into the iridium crucible of diameter 60~120mm, vacuumized after adjusting the concentricity of coil, heat-insulation system, seed crystal, iridium crucible, when body of heater vacuum tightness reaches the 4Pa left and right sides, pour purity greater than 99.9999% argon gas;
S6. starting the Medium frequency induction laser crystal growth furnace heats up the heating system in the burner hearth, after raw material in iridium crucible described in the step S5 all melts, the melt liquid fluid line begins slowly to descend seed crystal when steady and audible, contact liquid level elapsed-time standards is about 1.5 hours from lower seed crystal to seed crystal, and constant temperature was 1.5 hours when the adjusting melt temperature made seed crystal reduced 1.5mm;
S7. lift seed crystal, the growth of beginning crystal, its direction of growth is<111 〉, the crystal growth comprises 4 stages:
In the shouldering stage, brilliant raising speed rate is 0.65mm/h during shouldering, and brilliant rotational speed rate is 17 rev/mins, and the shouldering angle is controlled at 45 O, the later stage to progressively slow down brilliant raising speed rate to 0.52mm/h in crystal shouldering growth, reduce brilliant rotational speed rate to 14.5 rev/min, it is mild that temperature rate is wanted, and when shouldering place diameter and crystal target diameter differ 3mm, begins constant temperature;
Deng through growth phase, the growth of crystal constant temperature entered the isodiametric growth stage after 23 hours, brilliant raising speed rate slows to 0.42mm/h along with the length increase of isodiametric growth of crystal, brilliant rotational speed rate slowly is decreased to 12 rev/mins, crystal growth temperature control speed span can not be excessive, makes the crystal diameter deviation control within 1.5mm;
The ending stage, the crystal growth begins the ending that heats up after reaching predetermined length, along with diminishing of crystal diameter slowly improved brilliant raising speed rate to 0.62mm/h, brilliant rotational speed rate also will progressively slow to 10 rev/mins, when crystal diameter is reduced to the 5mm left and right sides, carried out isodiametric growth 9 hours, at last cooling makes the crystal diameter change expand into greatly " lid " type again, to prevent crystal cleavage and protection crucible;
Temperature-fall period, crystal growth finish rear temperature with vitellarium in the rate reduction iridium crucible of 30 ℃/h, until room temperature.
The vision slit outer end of described Medium frequency induction laser crystal growth furnace is equipped with YAG polishing eyeglass.In order to reduce radially heat dissipation capacity of crystal, reduce radially thermal stresses, further promote crystal quality
The zirconium white annulus is equipped with in the shielding upper end at described Medium frequency induction laser crystal growth furnace top.Axial-temperature gradient when lifting to cold zone in order to reduce crystal further promotes crystal quality.
Embodiment three
A kind of high density Nd doping YAG laser crystal growth method, the method is based on the Medium frequency induction laser crystal growth furnace, and it comprises step:
S1. with purity more than or equal to 99.999% yttrium oxide Y 2O 3, aluminium oxide Al 2O 3, Neodymium trioxide Nd 2O 3800 ℃ of lower calcinations 4 hours, again by default neodymium-doped concentration calculate, weighing is configured to bed material;
S2. the bed material for preparing among the step S1 is packed in the Plastic Bottle, be fixed on the mixer and fully mixed 24 hours;
S3. the powder that mixes among the step S2 is put into the latex mould, pass through again isostatic pressing after the sealing;
S4. seed crystal is put into the iridium crucible seed rod of required employing;
S5. the raw material of moulding is put into the iridium crucible of diameter 60~120mm, vacuumized after adjusting the concentricity of coil, heat-insulation system, seed crystal, iridium crucible, when body of heater vacuum tightness reaches the 3.5Pa left and right sides, pour purity greater than 99.9999% argon gas;
S6. starting the Medium frequency induction laser crystal growth furnace heats up the heating system in the burner hearth, after raw material in iridium crucible described in the step S5 all melts, the melt liquid fluid line begins slowly to descend seed crystal when steady and audible, contact liquid level elapsed-time standards is about 1 hour from lower seed crystal to seed crystal, and constant temperature was 1 hour when the adjusting melt temperature made seed crystal reduced 1mm;
S7. lift seed crystal, the growth of beginning crystal, its direction of growth is<111 〉, the crystal growth comprises 4 stages:
In the shouldering stage, brilliant raising speed rate is 0.6mm/h during shouldering, and brilliant rotational speed rate is 16 rev/mins,, the shouldering angle is controlled at 40 O, the later stage to progressively slow down brilliant raising speed rate to 0.5mm/h in crystal shouldering growth, reduce brilliant rotational speed rate to 14 rev/min, it is mild that temperature rate is wanted, and when shouldering place diameter and crystal target diameter differ 2mm, begins constant temperature;
Deng through growth phase, the growth of crystal constant temperature entered the isodiametric growth stage after 15 hours, brilliant raising speed rate slows to 0.4mm/h along with the length increase of isodiametric growth of crystal, brilliant rotational speed rate slowly is decreased to 12 rev/mins, crystal growth temperature control speed span can not be excessive, makes the crystal diameter deviation control within 1mm;
The ending stage, the crystal growth begins the ending that heats up after reaching predetermined length, along with diminishing of crystal diameter slowly improved brilliant raising speed rate to 0.6mm/h, brilliant rotational speed rate also will progressively slow to 9 rev/mins, when crystal diameter is reduced to the 4mm left and right sides, carried out isodiametric growth 8 hours, at last cooling makes the crystal diameter change expand into greatly " lid " type again, to prevent crystal cleavage and protection crucible;
Temperature-fall period, crystal growth finish rear temperature with vitellarium in the rate reduction iridium crucible of 10 ℃/h, until room temperature.
The vision slit outer end of described Medium frequency induction laser crystal growth furnace is equipped with YAG polishing eyeglass.In order to reduce radially heat dissipation capacity of crystal, reduce radially thermal stresses, further promote crystal quality
The zirconium white annulus is equipped with in the shielding upper end at described Medium frequency induction laser crystal growth furnace top.Axial-temperature gradient when lifting to cold zone in order to reduce crystal further promotes crystal quality.
As shown in Figure 1, the Medium frequency induction laser crystal growth furnace that relates in the various embodiments described above comprises:
Load quartz tube 11 on the ceramic chassis 18 with holes, center, between quartz tube 11 and the zirconium white heat-preservation cylinder 13 oxidation zircon sand 14 is housed, zirconium white heat-preservation cylinder 13 bottoms are provided with center large zirconium white pallet 16 with holes, iridium crucible 5 is placed on zirconium white heat-preservation cylinder 13 inside, iridium crucible has little zirconium white pallet 15 with holes for 5 times, thermopair 17 thermometric ends are contained in iridium crucible 5 bottoms, and 5 mouthfuls of iridium crucibles are equipped with iridium ring 10, iridium crucible 5 is a little more than coil 12, be contained in the top of iridium ring 10 with the zirconium white shielding 7 of vision slit, in the shielding 7 zirconium white annulus 6 is housed, be equipped with YAG polishing eyeglass 8 with shielding 7 aluminum oxide vision slit 9 outer ends that are connected, lifting rod 1 connects seed rod 2, and slowly grows crystal 3 from melt 4 by rotation.
Only be the preferred embodiments of the present invention below, but design concept of the present invention is not limited to this, all insubstantial modifications of utilizing this design that the present invention is made also all fall within protection scope of the present invention.

Claims (4)

1.一种高浓度Nd掺杂YAG激光晶体生长方法,该方法基于中频感应激光晶体炉,其特征在于,包括步骤: 1. A high concentration Nd-doped YAG laser crystal growth method, the method is based on an intermediate frequency induction laser crystal furnace, it is characterized in that, comprising steps: S1.将纯度大于或等于99.999%的氧化钇Y2O3、氧化铝Al2O3、氧化钕Nd2O3在600~800℃下灼烧4~8小时,再按预设的掺钕浓度进行计算、称量配置成底料;  S1. Burn yttrium oxide Y2O3, aluminum oxide Al2O3, and neodymium oxide Nd 2 O 3 with a purity greater than or equal to 99.999% at 600-800°C for 4-8 hours, then calculate and weigh according to the preset neodymium-doped concentration configured as base material; S2.将步骤S1中配好的底料装入塑料瓶中,固定在混料机上充分混合24~48小时; S2. Put the bottom material prepared in step S1 into a plastic bottle, fix it on the mixer and mix it fully for 24 to 48 hours; S3.将步骤S2中混合均匀的粉料放入乳胶模具中,密封后再通过200~300MPa等静压成型; S3. Put the uniformly mixed powder in step S2 into a latex mould, seal it and then form it by isostatic pressing at 200~300MPa; S4.将籽晶放入所需采用的铱坩埚籽晶杆中; S4. Put the seed crystal into the required iridium crucible seed rod; S5.将成型的原料放入直径60~120mm的铱坩埚中,调整好线圈、保温系统、籽晶、铱坩埚的同心度后抽真空,当炉体真空度达到3.5~4.5Pa时冲入氩气; S5. Put the formed raw materials into an iridium crucible with a diameter of 60-120 mm, adjust the concentricity of the coil, heat preservation system, seed crystal, and iridium crucible, and then vacuumize it. When the vacuum degree of the furnace body reaches 3.5-4.5 Pa, pour argon gas; S6. 启动中频感应激光晶体炉使炉膛内的加热系统升温,待步骤S5 中所述铱坩埚中的原料全部熔化后,熔体液流线清晰稳定时开始缓慢下籽晶,从下籽晶到籽晶接触液面处经历时间约1~2小时,调节熔体温度使籽晶直径缩小1~2mm时恒温1~2小时; S6. Start the intermediate frequency induction laser crystal furnace to heat up the heating system in the furnace. After all the raw materials in the iridium crucible described in step S5 are melted, when the melt flow line is clear and stable, start to slowly lower the seed crystal, from the lower seed crystal to The elapsed time for the seed crystal to contact the liquid surface is about 1 to 2 hours, adjust the melt temperature to reduce the diameter of the seed crystal by 1 to 2 mm, and keep the temperature constant for 1 to 2 hours; S7. 提拉籽晶,开始晶体生长,其生长方向为<111>,晶体生长包括4个阶段: S7. Lift the seed crystal and start crystal growth, the growth direction is <111>, and the crystal growth includes 4 stages: 放肩阶段,放肩时晶升速率为0.6~0.7mm/h,晶转速率为16~18转/分钟,放肩角度控制在40~50,在晶体放肩生长后期要逐步减慢晶升速率至0.5~0.55mm/h,降低晶转速率至14~15转/分钟,降温速率要平缓,当放肩处直径与晶体目标直径相差2~4mm时,开始恒温; During the shouldering stage, the crystal rising rate is 0.6-0.7mm/h, the crystal rotation rate is 16-18 rpm, and the shouldering angle is controlled at 40o ~ 50o , which should be gradually slowed down in the later stage of crystal shouldering growth. The crystal rise rate is 0.5-0.55mm/h, and the crystal rotation rate is reduced to 14-15 rpm. The cooling rate should be gentle. When the difference between the diameter of the shoulder and the target diameter of the crystal is 2-4mm, start constant temperature; 等经生长阶段,晶体恒温生长15~48小时后进入等径生长阶段,晶升速率随着晶体等径生长的长度增加而减慢至0.4~0.45mm/h, 晶转速率缓慢减小至12~13转/分钟,晶体生长温控速率幅度不可过大,使晶体直径偏差控制在1 ~2mm之内; After the growth stage, the crystal grows at a constant temperature for 15 to 48 hours and then enters the isometric growth stage. The crystal growth rate slows down to 0.4 to 0.45mm/h with the increase in the length of the crystal isometric growth, and the crystal conversion rate slowly decreases to 12 ~13 rpm, the temperature control rate of crystal growth should not be too large, so that the deviation of crystal diameter can be controlled within 1 ~2mm; 收尾阶段,晶体生长达到预定长度后开始升温收尾,随着晶体直径的变小慢慢提高晶升速率至0.6~0.65mm/h, 晶转速率也要逐步减慢至9~11转/分钟,晶体直径缩至4~6mm左右时,再进行等径生长8~10小时,最后降温使晶体直径变大扩成一个“盖”型,以防止晶体开裂和保护坩埚; In the final stage, after the crystal grows to a predetermined length, it begins to heat up and finish. As the diameter of the crystal becomes smaller, the crystal growth rate is gradually increased to 0.6-0.65mm/h, and the crystal rotation rate is also gradually slowed down to 9-11 rpm. When the diameter of the crystal shrinks to about 4-6mm, it is grown for another 8-10 hours, and finally the temperature is lowered to make the diameter of the crystal larger and expand into a "cover" shape to prevent the crystal from cracking and protect the crucible; 降温阶段,晶体生长结束后以10~70℃速率降低铱坩埚内生长区的温度,直到室温。 In the cooling stage, after the crystal growth is completed, the temperature of the growth area in the iridium crucible is lowered at a rate of 10-70°C until it reaches room temperature. 2.根据权利要求1所述的高浓度Nd掺杂YAG激光晶体生长方法,其特征在于,所述中频感应激光晶体炉的观察孔外端置有YAG抛光镜片。 2. The method for growing high-concentration Nd-doped YAG laser crystals according to claim 1, wherein YAG polished mirrors are arranged at the outer end of the observation hole of the intermediate frequency induction laser crystal furnace. 3.根据权利要求1或2所述的高浓度Nd掺杂YAG激光晶体生长方法,其特征在于,所述中频感应激光晶体炉顶部的屏蔽上端装有氧化锆圆环。 3. The method for growing high-concentration Nd-doped YAG laser crystals according to claim 1 or 2, wherein the shielding upper end of the intermediate frequency induction laser crystal furnace top is equipped with a zirconia ring. 4.根据权利要求1所述的高浓度Nd掺杂YAG激光晶体生长方法,其特征在于,所述步骤S5中冲入的氩气纯度大于等于99.9999%。 4. The high-concentration Nd-doped YAG laser crystal growth method according to claim 1, characterized in that the purity of the argon injected in the step S5 is greater than or equal to 99.9999%.
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CN103422173A (en) * 2013-08-08 2013-12-04 巢湖市环宇光学技术有限公司 Growth method of yttrium aluminum garnet crystal doped with high-concentration neodymium
CN103436962A (en) * 2013-08-08 2013-12-11 巢湖市环宇光学技术有限公司 Large-volume neodymium-doped yttrium vanadate crystal and preparation method thereof
CN103436952A (en) * 2013-08-13 2013-12-11 安徽环巢光电科技有限公司 Neodymium-doped yttrium aluminum garnet and pure yttrium aluminum garnet bonded growth method
CN104357899A (en) * 2014-11-21 2015-02-18 中国电子科技集团公司第二十六研究所 Kyropoulos method-based preparation method of large-size Yb-YAG laser crystals
CN104746135A (en) * 2013-12-27 2015-07-01 成都晶九科技有限公司 Growth method of induction furnace planar-interface large-sized neodymium-doped yttrium aluminium garnet crystal
CN106119965A (en) * 2016-08-25 2016-11-16 广州半导体材料研究所 The preparation method of Er doping LuAG crystal
CN107574474A (en) * 2017-07-10 2018-01-12 合肥嘉东光学股份有限公司 A kind of Laser crystal single crystal furnace pulling growth technique
CN107653487A (en) * 2017-10-23 2018-02-02 安徽中晶光技术股份有限公司 A kind of recycling bin for being used in crystal growing process reclaim iridium powder
CN109338472A (en) * 2018-12-06 2019-02-15 上海超硅半导体有限公司 A method of eliminating YAG laser crystal tail portion cracking
CN109868507A (en) * 2017-12-05 2019-06-11 长春理工大学 A kind of New Type Magneto crystal Tb2YGa5O12(TYGG) preparation method
US10844514B1 (en) 2019-08-21 2020-11-24 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
WO2021031139A1 (en) * 2019-08-21 2021-02-25 眉山博雅新材料有限公司 Multi-component garnet-structured scintillation crystal growth method and equipment

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Cited By (27)

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CN103422173A (en) * 2013-08-08 2013-12-04 巢湖市环宇光学技术有限公司 Growth method of yttrium aluminum garnet crystal doped with high-concentration neodymium
CN103436962A (en) * 2013-08-08 2013-12-11 巢湖市环宇光学技术有限公司 Large-volume neodymium-doped yttrium vanadate crystal and preparation method thereof
CN103436952A (en) * 2013-08-13 2013-12-11 安徽环巢光电科技有限公司 Neodymium-doped yttrium aluminum garnet and pure yttrium aluminum garnet bonded growth method
CN104746135A (en) * 2013-12-27 2015-07-01 成都晶九科技有限公司 Growth method of induction furnace planar-interface large-sized neodymium-doped yttrium aluminium garnet crystal
CN104746135B (en) * 2013-12-27 2017-04-19 成都晶九科技有限公司 Growth method of induction furnace planar-interface large-sized neodymium-doped yttrium aluminium garnet crystal
CN104357899A (en) * 2014-11-21 2015-02-18 中国电子科技集团公司第二十六研究所 Kyropoulos method-based preparation method of large-size Yb-YAG laser crystals
CN106119965A (en) * 2016-08-25 2016-11-16 广州半导体材料研究所 The preparation method of Er doping LuAG crystal
CN107574474A (en) * 2017-07-10 2018-01-12 合肥嘉东光学股份有限公司 A kind of Laser crystal single crystal furnace pulling growth technique
CN107653487A (en) * 2017-10-23 2018-02-02 安徽中晶光技术股份有限公司 A kind of recycling bin for being used in crystal growing process reclaim iridium powder
CN109868507A (en) * 2017-12-05 2019-06-11 长春理工大学 A kind of New Type Magneto crystal Tb2YGa5O12(TYGG) preparation method
CN109338472A (en) * 2018-12-06 2019-02-15 上海超硅半导体有限公司 A method of eliminating YAG laser crystal tail portion cracking
WO2021031142A1 (en) * 2019-08-21 2021-02-25 眉山博雅新材料有限公司 Pull-up open-type single-crystal furnace
US11566342B2 (en) 2019-08-21 2023-01-31 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
WO2021031139A1 (en) * 2019-08-21 2021-02-25 眉山博雅新材料有限公司 Multi-component garnet-structured scintillation crystal growth method and equipment
CN112513344A (en) * 2019-08-21 2021-03-16 眉山博雅新材料有限公司 Upward pulling open type single crystal furnace
CN112703277A (en) * 2019-08-21 2021-04-23 眉山博雅新材料有限公司 Method and apparatus for growing scintillation crystal with multi-component garnet structure
US11155930B2 (en) 2019-08-21 2021-10-26 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US11198947B2 (en) 2019-08-21 2021-12-14 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US10844514B1 (en) 2019-08-21 2020-11-24 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US11566341B2 (en) 2019-08-21 2023-01-31 Meishan Boya Advanced Materials Co., Ltd. Open czochralski furnace for single crystal growth
US11566343B2 (en) 2019-08-21 2023-01-31 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US11572634B2 (en) 2019-08-21 2023-02-07 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US11851782B2 (en) 2019-08-21 2023-12-26 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US11851783B2 (en) 2019-08-21 2023-12-26 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US11885037B2 (en) 2019-08-21 2024-01-30 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US11982014B2 (en) 2019-08-21 2024-05-14 Meishan Boya Advanced Materials Co., Ltd. Open Czochralski furnace for single crystal growth
US12152315B2 (en) 2019-08-21 2024-11-26 Meishan Boya Advanced Materials Co., Ltd. Methods and devices for growing scintillation crystals with multi-component garnet structure

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