CN103050133B - Glass base plate for magnetic recording carrier and employ the magnetic recording media of this glass base plate for magnetic recording carrier - Google Patents
Glass base plate for magnetic recording carrier and employ the magnetic recording media of this glass base plate for magnetic recording carrier Download PDFInfo
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Abstract
本发明的目的在于提供一种磁记录介质用玻璃基板及使用了该磁记录介质用玻璃基板的磁记录介质,其中,在磁记录介质用玻璃基板的至少一个主平面(记录再生面)的整体设定的格子状的各评价区域测定了表面粗糙度Ra时,其最大值处于规定的范围内。提供一种磁记录介质用玻璃基板及使用了该磁记录介质用玻璃基板的磁记录介质,该磁记录介质用玻璃基板具有一对主平面,其特征在于,在至少一个主平面上,在主平面整个面上设定的格子状的各评价区域所测定到的表面粗糙度Ra的最大值为所述表面粗糙度Ra的平均值的1.7倍以下。
The object of the present invention is to provide a glass substrate for magnetic recording media and a magnetic recording medium using the glass substrate for magnetic recording media, wherein at least one main plane (recording and reproducing surface) of the glass substrate for magnetic recording media When the surface roughness Ra was measured for each set evaluation area in a grid shape, the maximum value was within a predetermined range. Provided are a glass substrate for a magnetic recording medium and a magnetic recording medium using the glass substrate for a magnetic recording medium. The glass substrate for a magnetic recording medium has a pair of main planes, and is characterized in that on at least one of the main planes The maximum value of the surface roughness Ra measured in the grid-shaped evaluation regions set on the entire plane surface is 1.7 times or less the average value of the surface roughness Ra.
Description
技术领域technical field
本发明涉及磁记录介质用玻璃基板、及使用了该磁记录介质用玻璃基板的磁记录介质。The present invention relates to a glass substrate for a magnetic recording medium, and a magnetic recording medium using the glass substrate for a magnetic recording medium.
背景技术Background technique
作为在磁盘记录装置等中使用的磁记录介质用基板,以往,使用了铝合金基板。然而,近年来,伴随着高密度记录化的要求,与铝合金基板相比更硬且平坦性、平滑性优异的玻璃基板成为主流。Conventionally, aluminum alloy substrates have been used as substrates for magnetic recording media used in magnetic disk recording devices and the like. However, in recent years, glass substrates that are harder than aluminum alloy substrates and have excellent flatness and smoothness have become mainstream in response to demands for high-density recording.
并且,伴随着近年来的磁盘(以下,也称为磁记录介质)的高记录密度化,在磁盘上微细地记录磁信号,伴随于此,信号变得微弱。为了该微弱的信号的读取及记录,要求尽量缩短磁盘与磁头的距离。In addition, with the increase in recording density of magnetic disks (hereinafter, also referred to as magnetic recording media) in recent years, magnetic signals are recorded finely on the magnetic disks, and the signals become weaker as a result. In order to read and record such weak signals, it is required to shorten the distance between the magnetic disk and the magnetic head as much as possible.
为了减小以高速旋转的磁盘与磁头之间的距离、即磁头的浮起量,需要使磁盘的基板即磁记录介质用玻璃基板的表面为极其均一的表面,以避免磁盘与磁头发生接触。In order to reduce the distance between the magnetic disk rotating at high speed and the magnetic head, that is, the floating amount of the magnetic head, it is necessary to make the surface of the magnetic recording medium glass substrate, which is the substrate of the magnetic disk, extremely uniform so that the magnetic disk does not come into contact with the magnetic head.
为了减小磁头与磁盘之间的距离,而对于磁记录介质用玻璃基板的表面特性进行了各种讨论。例如在专利文献1中记载了存在于磁盘用玻璃基板的缺陷的形状造成影响,而使表面粗糙度Ra为规定的值以下的情况。In order to reduce the distance between the magnetic head and the magnetic disk, various studies have been made on the surface properties of the glass substrate for magnetic recording media. For example, Patent Document 1 describes that the shape of a defect existing in a glass substrate for a magnetic disk influences the surface roughness Ra to be a predetermined value or less.
【在先技术文献】【Prior technical literature】
【专利文献】【Patent Literature】
【专利文献1】国际公开第2010/001843号[Patent Document 1] International Publication No. 2010/001843
然而,在专利文献1中,通过原子间力显微镜只不过对于磁记录介质用玻璃基板的记录再生区域中的有限的一部分的区域评价了表面粗糙度Ra,在记录再生区域的大部分的区域未测定表面粗糙度Ra,因此在记录再生区域上存在表面粗糙度Ra的值增大的区域,有时会成为问题。例如,存在难以减小磁头的浮起量且磁盘与磁头之间的距离不稳定而产生磁噪音等的问题。However, in Patent Document 1, the surface roughness Ra is only evaluated for a limited part of the recording and reproducing region of the glass substrate for magnetic recording media by an atomic force microscope, and the surface roughness Ra is not evaluated for most of the recording and reproducing region. Since the surface roughness Ra is measured, there may be an area where the value of the surface roughness Ra increases in the recording/reproducing area, which may cause a problem. For example, there are problems that it is difficult to reduce the floating amount of the magnetic head, and the distance between the magnetic disk and the magnetic head is unstable, and magnetic noise is generated.
另外,在制造磁记录介质时,在磁记录介质用玻璃基板的表面成膜出磁性层,但在磁记录介质用玻璃基板的主平面存在表面粗糙度Ra的值高的区域(表面粗糙度Ra不均一的区域)时,成膜的磁性层的晶粒的尺寸有时会产生不均一性。具有不均一的磁性层(晶粒的尺寸不均一的磁性层)的磁记录介质可能会产生在晶粒的尺寸不均一的区域上的磁噪音增加,基于磁头的向磁记录介质的读写的精度下降、记录密度下降等的问题。In addition, when manufacturing a magnetic recording medium, a magnetic layer is formed on the surface of a glass substrate for a magnetic recording medium, but there is a region where the value of the surface roughness Ra is high on the main plane of the glass substrate for a magnetic recording medium (the surface roughness Ra non-uniform region), the size of the crystal grains of the formed magnetic layer may be non-uniform. A magnetic recording medium having a non-uniform magnetic layer (a magnetic layer with non-uniform crystal grain size) may generate increased magnetic noise in regions where the crystal grain size is non-uniform, based on the read and write of the magnetic head to the magnetic recording medium There are problems such as a decrease in accuracy and a decrease in recording density.
发明内容Contents of the invention
本发明鉴于上述现有技术具有的问题,其目的在于提供一种在磁记录介质用玻璃基板的至少一个主平面(记录再生区域)的整个面上,使表面粗糙度Ra处于规定的范围内的磁记录介质用玻璃基板。In view of the problems in the prior art described above, an object of the present invention is to provide a glass substrate for magnetic recording media in which the surface roughness Ra is within a predetermined range on the entire surface of at least one main plane (recording and reproducing area) of a glass substrate for magnetic recording media. Glass substrate for magnetic recording media.
为了解决上述课题,本发明提供一种磁记录介质用玻璃基板,具有一对主平面,其特征在于,在至少一个主平面上,在主平面整个面上设定的格子状的各评价区域所测定到的表面粗糙度Ra的最大值为所述表面粗糙度Ra的平均值的1.7倍以下。In order to solve the above-mentioned problems, the present invention provides a glass substrate for magnetic recording media, which has a pair of main planes, and is characterized in that, on at least one of the main planes, each evaluation area in a grid shape set on the entire surface of the main planes The maximum value of the measured surface roughness Ra is 1.7 times or less the average value of the surface roughness Ra.
【发明效果】【Invention effect】
本发明的磁记录介质用玻璃基板(以下,也有时仅记载为“玻璃基板”),在玻璃基板的至少一个主平面的整个面设定的格子状的各评价区域中测定了表面粗糙度(算术平均粗糙度)Ra时,其最大值与 平均值处于规定的关系。The glass substrate for a magnetic recording medium of the present invention (hereinafter, sometimes simply referred to as a "glass substrate") was measured in each evaluation area in a grid pattern set on the entire surface of at least one main plane of the glass substrate ( Arithmetic mean roughness) Ra, its maximum value and average value are in a prescribed relationship.
因此,在玻璃基板的至少一个主平面的整个面上,表面粗糙度Ra处于规定的范围内,没有表面粗糙度Ra局部高的区域,从而成为主平面的整个面均一且平滑的玻璃基板。Therefore, on the entire surface of at least one main plane of the glass substrate, the surface roughness Ra is within a predetermined range, and there is no region where the surface roughness Ra is locally high, so that the entire surface of the main plane is uniform and smooth.
根据本发明的磁记录介质用玻璃基板,能够提供一种在玻璃基板的表面上形成磁性层时抑制晶粒的粗大化,且具有晶粒的尺寸均一的磁性层的表面平滑的磁记录介质。According to the glass substrate for a magnetic recording medium of the present invention, it is possible to provide a magnetic recording medium that suppresses coarsening of crystal grains when forming a magnetic layer on the surface of the glass substrate and has a smooth surface of the magnetic layer with uniform crystal grain sizes.
由此,能够抑制磁记录介质的磁噪音的发生,使磁记录介质与磁头之间的距离比以往减小,使磁记录介质与磁头之间的距离稳定化,能够使磁记录介质的记录的读写精度和记录密度比以往升高。Thus, the occurrence of magnetic noise of the magnetic recording medium can be suppressed, the distance between the magnetic recording medium and the magnetic head can be reduced compared to the past, the distance between the magnetic recording medium and the magnetic head can be stabilized, and the recording accuracy of the magnetic recording medium can be improved. Read and write accuracy and recording density are higher than ever.
附图说明Description of drawings
图1是本发明的第一实施方式的磁记录介质用玻璃基板及其评价区域的说明图。FIG. 1 is an explanatory view of a glass substrate for a magnetic recording medium and an evaluation region thereof according to a first embodiment of the present invention.
具体实施方式detailed description
以下,参照附图,说明用于实施本发明的方式,但本发明并不局限于下述的实施方式,在不脱离本发明的范围内能够对下述的实施方式施加各种变形及置换。Hereinafter, modes for implementing the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments, and various modifications and substitutions can be added to the following embodiments without departing from the scope of the present invention.
[第一实施方式][first embodiment]
在本实施方式中,对于本发明的磁记录介质用玻璃基板进行说明。In this embodiment, the glass substrate for magnetic recording media of this invention is demonstrated.
本发明的磁记录介质用玻璃基板的特征在于,在磁记录介质用玻璃基板的至少一个主平面上,在主平面整个面上设定的格子状的各评价区域所测定到的表面粗糙度Ra的最大值为表面粗糙度Ra的平均值的1.7倍以下。The glass substrate for magnetic recording media of the present invention is characterized in that, on at least one main plane of the glass substrate for magnetic recording media, the surface roughness Ra measured in the grid-shaped evaluation regions set on the entire main plane is The maximum value of is less than or equal to 1.7 times the average value of the surface roughness Ra.
关于具体的评价方法,使用图1进行说明。A specific evaluation method will be described using FIG. 1 .
如图1(A)所示,磁记录介质用玻璃基板呈现出在中心部具有圆孔的圆盘形状。并且,在本发明中,在该玻璃基板的至少一个主平面、即作为磁记录介质时的记录再生区域整个面上所设定的格子状的各评价区域中,测定表面粗糙度Ra。如图1(A)和(B)所示,通过将主平面没有间隙地分割为多个部分而形成评价区域。优选将评价区域形成为相同形状。As shown in FIG. 1(A) , the glass substrate for a magnetic recording medium has a disc shape having a circular hole in the center. Furthermore, in the present invention, the surface roughness Ra is measured in each grid-shaped evaluation area set on at least one main plane of the glass substrate, that is, the entire recording and reading area in the case of a magnetic recording medium. As shown in FIGS. 1(A) and (B), the evaluation area is formed by dividing the main plane into a plurality of parts without gaps. It is preferable to form the evaluation regions into the same shape.
对于表面粗糙度(算术平均粗糙度)Ra的测定方法,并未特别限定,只要能够测定在整个面设定为格子状的各评价区域的表面粗糙度即可。例如,可以通过扫描型干涉显微镜等来测定。The method of measuring the surface roughness (arithmetic mean roughness) Ra is not particularly limited, as long as the surface roughness can be measured in each evaluation area set in a grid pattern over the entire surface. For example, it can be measured with a scanning interference microscope or the like.
设定为格子状的评价区域的形状、尺寸并未特别限定,例如,作为评价区域的形状,可列举出正方格子、三角格子、六角格子、菱形格子、矩形格子、平行体格子等格子的形状。The shape and size of the evaluation area set in a grid shape are not particularly limited. For example, the shape of the evaluation area includes square grids, triangular grids, hexagonal grids, rhombus grids, rectangular grids, and parallel grids. .
作为1个评价区域的尺寸,例如在评价区域的形状为正方格子时,可以将1边的长度设定在5μm~50μm的范围内,例如可以设定为50μm见方、40μm见方、30μm见方、20μm见方等所希望的尺寸。As the size of one evaluation area, for example, when the shape of the evaluation area is a square grid, the length of one side can be set within the range of 5 μm to 50 μm, such as 50 μm square, 40 μm square, 30 μm square, or 20 μm Square etc. desired size.
另外,在评价区域的形状为正方格子以外的情况下,可以设定以此为标准的尺寸,即,以使评价区域的面积成为与所述正方格子的情况相同的面积范围(例如,25μm2~2500μm2)的方式设定该尺寸。需要说明的是,以下,对于评价区域的尺寸,记载了以正方格子的1边的长度为基准的情况,但并未限定为正方格子,在正方格子以外的情况下表示以此为标准的尺寸(面积)。In addition, when the shape of the evaluation region is other than a square grid, it is possible to set a size based on this, that is, so that the area of the evaluation region becomes the same area range as that of the square grid (for example, 25 μm 2 ~2500 μm 2 ) to set this dimension. It should be noted that in the following, the size of the evaluation area is based on the length of one side of the square grid, but it is not limited to the square grid. In the case of other than the square grid, this is the standard size (area).
此外,设定为格子状的评价区域的形状、尺寸在主平面的整个面 上,可以不同(例如,将主平面的整个面分割为规定的区域,在各个区域设定评价区域的形状、尺寸等),优选相同。In addition, the shape and size of the evaluation area set in a grid pattern may be different on the entire surface of the main plane (for example, the entire surface of the main plane is divided into predetermined areas, and the shape and size of the evaluation area are set in each area. etc.), preferably the same.
尤其是优选在与磁头相同的尺寸、或比其小的尺寸的各区域进行评价,因此作为评价区域的尺寸,优选以50μm见方以下进行评价,更优选为30μm见方以下。In particular, it is preferable to perform evaluation in each region having the same size as the magnetic head or a smaller size. Therefore, the size of the evaluation region is preferably 50 μm square or less, more preferably 30 μm square or less.
但是,当评价区域的尺寸过小时,评价区域的个数增多,因此数据量增加且其处理变得困难,因此优选为5μm见方以上,更优选为10μm见方以上。However, when the size of the evaluation area is too small, the number of evaluation areas increases, the amount of data increases and its handling becomes difficult, so it is preferably 5 μm square or larger, and more preferably 10 μm square or larger.
在此,对评价区域进行说明。图1(A)、(B)示意性地表示各评价区域。需要说明的是,图中表示了线,但这是用于说明评价区域的线,实际上并未在玻璃基板上划线。在此,使用正方格子的例子说明评价区域。Here, the evaluation area will be described. 1(A) and (B) schematically show each evaluation area. In addition, although a line is shown in a drawing, this is a line for explaining an evaluation area, and a line is not drawn on a glass substrate actually. Here, the evaluation area will be described using an example of a square grid.
图1(B)为了说明评价区域而将图1(A)的一部分放大。图1(B)所示的正方格子(正方形)的各块(例如(a)~(d)所示的部分)表示评价区域,例如将1边的长度A~F均设定为30μm。FIG. 1(B) is an enlarged part of FIG. 1(A) for explaining the evaluation region. Each block (for example, the parts shown in (a) to (d)) of the square grid (square) shown in FIG.
并且,本发明的磁记录介质用玻璃基板中,将根据对于一个主平面整体的各评价区域测定的表面粗糙度的结果而算出的表面粗糙度Ra的平均值设为Raave。此外,将表面粗糙度Ra的最大值、即所述主平面整体的评价区域中的表面粗糙度的值最高的评价区域的表面粗糙度Ra设为Ramax时,满足Ramax≤1.7·Raave的关系,即,表面粗糙度Ra的最大值为表面粗糙度Ra的平均值的1.7倍以下。Moreover, in the glass substrate for magnetic recording media of this invention, the average value of the surface roughness Ra calculated from the result of the surface roughness measurement about each evaluation area of the whole main plane is Ra ave . In addition, when the maximum value of the surface roughness Ra, that is, the surface roughness Ra of the evaluation region having the highest surface roughness value in the evaluation region of the entire main plane is Ra max , Ra max ≤ 1.7·Ra ave In other words, the maximum value of the surface roughness Ra is 1.7 times or less than the average value of the surface roughness Ra.
在此,关于Raave、Ramax的关系,更优选为Ramax≤1.4·Raave,特别优选为Ramax≤1.3·Raave。Here, the relationship between Ra ave and Ra max is more preferably Ra max ≤ 1.4·Ra ave , and particularly preferably Ra max ≤ 1.3·Ra ave .
这是因为随着表面粗糙度Ra的最大值和平均值的比率接近1.0,在主平面整个面上,表面粗糙度Ra的变动减小,表示玻璃基板的主平面更平滑(即,Ramax≥1.0·Raave)。This is because as the ratio of the maximum value of the surface roughness Ra to the average value approaches 1.0, the fluctuation of the surface roughness Ra decreases over the entire surface of the main plane, indicating that the main plane of the glass substrate is smoother (that is, Ra max ≥ 1.0 Rave ).
需要说明的是,主平面在磁记录介质用玻璃基板的上下存在两面,但也有时作为磁盘时成为记录再生区域的为任一方,此时仅任一方满足上述要件即可。在作为磁盘时,上下两面均成为记录再生区域的情况下,优选上下两面按照各自的面测定、算出的表面粗糙度Ra的平均值和最大值均满足上述要件。这对于后述的平均值、标准偏差也同样。It should be noted that there are two main planes above and below the glass substrate for magnetic recording media. However, when the magnetic disk is used as a recording and reproduction area, either one may be used. In this case, only one of them may satisfy the above requirements. In the case of a magnetic disk, when both the upper and lower surfaces serve as recording/reproducing areas, it is preferable that the average value and the maximum value of the surface roughness Ra measured and calculated for each surface of the upper and lower surfaces satisfy the above requirements. The same applies to average values and standard deviations described later.
此外,设定在所述主平面的整个面上的格子状的各评价区域中所测定的表面粗糙度Ra的标准偏差优选为0.012nm以下,更优选为0.010nm以下,特别优选为0.008nm以下。In addition, the standard deviation of the surface roughness Ra measured in the grid-like evaluation regions set on the entire surface of the main plane is preferably 0.012 nm or less, more preferably 0.010 nm or less, particularly preferably 0.008 nm or less .
这是因为,通过减小标准偏差,关于玻璃基板的主平面的整个面,是指表面粗糙度Ra的变动小,表示玻璃基板的主平面更平滑。This is because, by reducing the standard deviation, the fluctuation of the surface roughness Ra is small with respect to the entire surface of the main plane of the glass substrate, which means that the main plane of the glass substrate is smoother.
如此,主平面的整个面平滑且不存在局部高的表面粗糙度Ra的区域,因此在形成磁性层而作为磁记录介质时,抑制晶粒局部的粗大化,晶粒的尺寸均一,从而能够得到表面平滑的磁性膜。In this way, the entire surface of the main plane is smooth and there is no region with locally high surface roughness Ra. Therefore, when forming a magnetic layer as a magnetic recording medium, local coarsening of crystal grains is suppressed, and the size of the crystal grains is uniform, thereby obtaining Magnetic film with smooth surface.
因此,能够缩短磁盘(磁记录介质)与磁头之间的距离。而且,磁盘与磁头之间的距离稳定,因此能够抑制磁噪音的产生,能够使记录的读写精度、记录密度比以往提高。此外,通过具有晶粒的尺寸小且均一的磁性层的磁记录介质,能够减小存储点尺寸,从而能够实现磁记录介质的面记录密度的提高。Therefore, the distance between the magnetic disk (magnetic recording medium) and the magnetic head can be shortened. In addition, since the distance between the magnetic disk and the magnetic head is stable, the generation of magnetic noise can be suppressed, and the read/write accuracy and recording density of recording can be improved compared to conventional ones. In addition, with a magnetic recording medium having a uniform magnetic layer with a small crystal grain size, it is possible to reduce the size of the memory spot and improve the areal recording density of the magnetic recording medium.
另外,设定在所述主平面的整个面上的格子状的各评价区域中所测定的表面粗糙度Ra的平均值优选为0.08nm以下,更优选为0.07nm以下。In addition, the average value of the surface roughness Ra measured in the grid-like evaluation regions set on the entire surface of the main plane is preferably 0.08 nm or less, more preferably 0.07 nm or less.
这是因为,通过减小表面粗糙度Ra的平均值,表示玻璃基板的主平面整体更平滑。This is because the main plane of the glass substrate as a whole becomes smoother by reducing the average value of the surface roughness Ra.
若玻璃基板的主平面整体平滑,则在形成磁性层时,能抑制晶粒的粗大化,能够使晶粒的尺寸减小且均一,从而能够得到表面均一且平滑的磁性膜。When the main plane of the glass substrate is smooth as a whole, coarsening of crystal grains can be suppressed when the magnetic layer is formed, and the size of the crystal grains can be reduced and uniform, so that a magnetic film with a uniform and smooth surface can be obtained.
通过使晶粒的尺寸减小且均一而能够减小存储点尺寸,从而能够实现磁记录介质的面记录密度的提高。而且,能够减小磁盘与磁头之间的距离,且能够减小磁盘与磁头之间的距离的变动,能够抑制磁噪音的发生,比以往更加提高记录的读写精度、记录密度。By making the size of the crystal grains small and uniform, the size of the memory spot can be reduced, and the areal recording density of the magnetic recording medium can be improved. Furthermore, the distance between the magnetic disk and the magnetic head can be reduced, and the variation of the distance between the magnetic disk and the magnetic head can be reduced, the occurrence of magnetic noise can be suppressed, and the read/write accuracy and recording density of recording can be improved more than before.
在此,对本发明的磁记录介质用玻璃基板的制造方法进行说明。Here, the manufacturing method of the glass substrate for magnetic recording media of this invention is demonstrated.
磁记录介质用玻璃基板能够通过包括以下的工序1~4的制造方法制造。The glass substrate for magnetic recording media can be manufactured by the manufacturing method including the following process 1-4.
(工序1)由玻璃原基板,加工成在中央部具有圆孔的圆盘形状的玻璃基板之后,对内周端面和外周端面进行倒角加工的形状赋予工序。(Step 1) A shape-imparting step of chamfering the inner peripheral end surface and the outer peripheral end surface after processing the original glass substrate into a disk-shaped glass substrate having a hole in the center.
(工序2)对玻璃基板的端面(内周端面及外周端面)进行研磨的端面研磨工序。(Process 2) An end surface grinding process of grinding the end surfaces (inner peripheral end surface and outer peripheral end surface) of the glass substrate.
(工序3)对所述玻璃基板的主平面进行研磨的主平面研磨工序。(Step 3) A main plane polishing step of grinding the main plane of the glass substrate.
(工序4)对所述玻璃基板进行精密清洗并进行干燥的清洗工序。(Step 4) A cleaning step of finely cleaning and drying the glass substrate.
然后,利用包含上述各工序的制造方法而得到的磁记录介质用玻璃基板还进行在其上形成磁性层等薄膜的工序,由此能够作为磁记录介质。Then, the glass substrate for magnetic recording media obtained by the manufacturing method including each of the steps described above can be used as a magnetic recording medium by further performing a step of forming a thin film such as a magnetic layer thereon.
在此,(工序1)的形状赋予工序将通过浮法、熔化法、冲压成形法、下拉法或再曳引法而成形的玻璃原基板加工成在中央部具有圆孔的圆盘形状的玻璃基板。需要说明的是,使用的玻璃原基板既可以是非晶形玻璃,也可以是结晶化玻璃,还可以是在玻璃基板的表层具有压缩应力层(强化层)的强化玻璃。Here, in the shape-imparting step of (Step 1), the original glass substrate formed by the float method, the melting method, the press molding method, the down-draw method, or the redraw method is processed into a disc-shaped glass having a round hole in the center. substrate. The original glass substrate used may be amorphous glass, crystallized glass, or strengthened glass having a compressive stress layer (strengthening layer) on the surface of the glass substrate.
然后,(工序2)的端面研磨工序中对玻璃基板的端面(侧面部和倒角部)进行端面研磨。Then, in the end surface grinding process of (process 2), end surface grinding|polishing is performed on the end surface (side surface part and chamfer part) of a glass substrate.
关于(工序3)的主平面研磨工序,使用双面研磨装置,一边向玻璃基板的主平面供给研磨液一边同时研磨玻璃基板的上下主平面。本发明的玻璃基板的研磨既可以仅实施1次研磨,也可以实施1次研磨和2次研磨,还可以在2次研磨之后实施3次研磨。In the main plane polishing step of (Step 3), the upper and lower main planes of the glass substrate are simultaneously ground while supplying a polishing liquid to the main planes of the glass substrate using a double-sided polishing apparatus. The polishing of the glass substrate of the present invention may be performed only once, may be performed once and twice, or may be performed three times after the second grinding.
并且,在研磨工序中使用的研磨垫优选使用预先利用纯水进行了10分钟以上的清洗的研磨垫。这是为了抑制研磨液中含有的磨粒的凝集。In addition, it is preferable to use a polishing pad previously washed with pure water for 10 minutes or longer as the polishing pad used in the polishing step. This is to suppress aggregation of abrasive grains contained in the polishing liquid.
需要说明的是,作为在主平面研磨工序的最后实施的研磨(精研磨)时使用的研磨液,优选使用含有一次粒子径为5nm以上的胶态氧化硅作为磨粒的、pH为3以上的研磨液。It should be noted that, as the polishing liquid used in the polishing (finish polishing) carried out at the end of the main surface polishing step, it is preferable to use colloidal silica having a primary particle diameter of 5 nm or more as abrasive grains and having a pH of 3 or more. Slurry.
这是因为,在研磨液中含有的胶态氧化硅的一次粒子径比5nm小时容易凝集,会产生无法稳定地研磨、主表面的表面粗糙度Ra增大等问题。This is because colloidal silica contained in the polishing liquid has a primary particle size smaller than 5 nm and is likely to aggregate, resulting in problems such as inability to perform stable polishing and an increase in the surface roughness Ra of the main surface.
胶态氧化硅的1次粒子径优选为5nm以上,更优选为8nm以上,特别优选为10nm以上。而且,胶态氧化硅的1次粒子径优选为30nm以下,更优选为28nm以下,特别优选为18nm以下。The primary particle diameter of colloidal silica is preferably 5 nm or more, more preferably 8 nm or more, particularly preferably 10 nm or more. Furthermore, the primary particle diameter of colloidal silica is preferably 30 nm or less, more preferably 28 nm or less, particularly preferably 18 nm or less.
另外,在研磨液的pH小于3时,由于酸的影响而研磨的玻璃基板的主平面的表面粗糙度Ra的值有可能升高。因此,研磨液的pH优选为3以上,更优选为3.5以上,特别优选为4以上。In addition, when the pH of the polishing liquid is less than 3, the value of the surface roughness Ra of the main plane of the glass substrate polished due to the influence of acid may increase. Therefore, the pH of the polishing liquid is preferably 3 or higher, more preferably 3.5 or higher, and particularly preferably 4 or higher.
在上述(工序3)的主平面研磨工序之前,也可以实施主平面的打磨(lapping)(例如,游离磨粒打磨、固定磨粒打磨等)。而且,在各工序间也可以实施玻璃基板的清洗(工序间清洗)、玻璃基板表面的蚀刻(工序间蚀刻)。需要说明的是,主平面的打磨是指广义的主平面的研磨。Before the above-mentioned (step 3) main surface polishing step, lapping (lapping) of the main surface (for example, free abrasive lapping, fixed abrasive lapping, etc.) may be performed. Furthermore, cleaning of the glass substrate (cleaning between processes) and etching of the surface of the glass substrate (etching between processes) may be performed between each process. It should be noted that the grinding of the main plane refers to the grinding of the main plane in a broad sense.
此外,在磁记录介质用玻璃基板要求高的机械强度时,在玻璃基板的表层形成压缩应力层(强化层)的强化工序(例如,化学强化工序)也可以在研磨工序前、或研磨工序后、或研磨工序间实施。In addition, when high mechanical strength is required for the glass substrate for magnetic recording media, the strengthening process (for example, chemical strengthening process) to form a compressive stress layer (strengthening layer) on the surface layer of the glass substrate may be performed before or after the grinding process. , or between grinding processes.
[第二实施方式][Second Embodiment]
在本实施方式中,说明使用了在第一实施方式中说明的磁记录介质用玻璃基板的磁记录介质(磁盘)。In this embodiment, the magnetic recording medium (magnetic disk) using the glass substrate for magnetic recording media demonstrated in 1st Embodiment is demonstrated.
本发明的磁记录介质只要使用了在第一实施方式中说明的磁记录介质用玻璃基板即可,其结构并未被限定,例如可列举出在磁记录介质用玻璃基板表面具备磁性层、保护层、润滑层的结构。As long as the magnetic recording medium of the present invention uses the glass substrate for magnetic recording medium described in the first embodiment, its structure is not limited, for example, a magnetic layer is provided on the surface of the glass substrate for magnetic recording medium, a protective layer, lubricating layer structure.
磁记录介质具有水平磁记录方式、垂直磁记录方式,但在此以垂直磁记录方式为例,以下说明具体的制造方法。The magnetic recording medium has a horizontal magnetic recording method and a perpendicular magnetic recording method, but here the vertical magnetic recording method is taken as an example, and a specific manufacturing method will be described below.
磁记录介质至少在其表面具备磁性层、保护层、润滑层。并且,在垂直磁记录方式的情况下,通常配置有起到使来自磁头的记录磁场环流的作用的软磁性材料构成的软磁性基底层。因此,从玻璃基板的主平面依次层叠有例如软磁性基底层、非磁性中间层、垂直记录用磁性层、保护层、润滑膜。The magnetic recording medium has a magnetic layer, a protective layer, and a lubricating layer at least on its surface. In addition, in the case of a perpendicular magnetic recording method, a soft magnetic underlayer made of a soft magnetic material that functions to circulate a recording magnetic field from a magnetic head is generally arranged. Therefore, for example, a soft magnetic underlayer, a nonmagnetic intermediate layer, a magnetic layer for perpendicular recording, a protective layer, and a lubricating film are laminated in this order from the main plane of the glass substrate.
以下,对各层进行说明。Each layer will be described below.
作为软磁性基底层,可以使用例如CoNiFe、FeCoB、CoCuFe、NiFe、FeAlSi、FeTaN、FeN、FeTaC、CoFeB、CoZrN等。As the soft magnetic underlayer, for example, CoNiFe, FeCoB, CoCuFe, NiFe, FeAlSi, FeTaN, FeN, FeTaC, CoFeB, CoZrN, etc. can be used.
并且,非磁性中间层由Ru、Ru合金等构成。该非磁性中间层具有用于使垂直记录用磁性层的外延生长容易的功能、及将软磁性基底层与记录用磁性层之间的磁交换结合切断的功能。Also, the nonmagnetic intermediate layer is made of Ru, Ru alloy, or the like. The non-magnetic intermediate layer has a function of facilitating the epitaxial growth of the magnetic layer for perpendicular recording and a function of breaking the magnetic exchange coupling between the soft magnetic underlayer and the magnetic layer for recording.
垂直记录用磁性层是磁化容易轴朝向与基板面垂直的垂直方向的磁性膜,至少包括Co、Pt。并且,为了减少成为高的固有介质噪音的原因的粒间交换结合,而优选良好地隔离的微粒子结构(颗粒结构)。具体而言,使用向CoPt系合金等添加了氧化物(SiO2、SiO、Cr2O3、CoO、Ta2O3、TiO2等)、Cr、B、Cu、Ta、Zr等的结构。The magnetic layer for perpendicular recording is a magnetic film whose magnetization easy axis is oriented in a vertical direction perpendicular to the substrate surface, and contains at least Co and Pt. In addition, in order to reduce interparticle exchange bonding that causes high intrinsic medium noise, a well-segregated fine particle structure (grain structure) is preferable. Specifically, a structure in which oxides (SiO 2 , SiO, Cr 2 O 3 , CoO, Ta 2 O 3 , TiO 2 , etc.), Cr, B, Cu, Ta, Zr, etc. are added to a CoPt-based alloy or the like is used.
到此为止说明的软磁性基底层、非磁性中间层、垂直记录用磁性层可以通过在线溅射法、DC磁控管溅射法等来连续制造。The soft magnetic underlayer, nonmagnetic intermediate layer, and magnetic layer for perpendicular recording described so far can be continuously produced by an in-line sputtering method, a DC magnetron sputtering method, or the like.
接下来,保护层防止垂直记录用磁性层的腐蚀,且为了即使在磁头与介质接触的情况下也会防止介质表面的损伤而设置,并设置在垂直记录用磁性层上。作为保护层,可以使用包含C、ZrO2、SiO2等的材料。Next, the protective layer prevents corrosion of the magnetic layer for perpendicular recording and is provided to prevent damage to the surface of the medium even when the magnetic head comes into contact with the medium, and is provided on the magnetic layer for perpendicular recording. As the protective layer, a material containing C, ZrO 2 , SiO 2 or the like can be used.
作为其形成方法,例如可以使用在线溅射法、CVD法、旋涂法等。As its formation method, for example, an in-line sputtering method, a CVD method, a spin coating method, or the like can be used.
在保护层的表面形成有润滑层,以减少磁头与记录介质(磁盘)的摩擦。润滑层可以使用例如全氟聚醚、氟化醇、氟化羧酸等。对于润滑层,可以通过浸渍法、喷射法等形成。A lubricating layer is formed on the surface of the protective layer to reduce the friction between the magnetic head and the recording medium (disk). For the lubricating layer, perfluoropolyether, fluorinated alcohol, fluorinated carboxylic acid, etc. can be used, for example. As for the lubricating layer, it can be formed by a dipping method, a spraying method, or the like.
通过以上说明的顺序而使用本发明的磁记录介质用玻璃基板制成的磁记录介质(磁盘)中,由于玻璃基板的主平面整体的表面粗糙度Ra处于规定的范围,因此在成膜磁性层时能够抑制晶粒的粗大化,从而能够使晶粒的尺寸小且均一。由此,能够减小磁记录介质的存储点尺寸,能够提高磁记录介质的面记录密度。而且,由于能够使磁记录介质与磁头之间的距离比以往减小,能够减小磁记录介质与磁头之间的距离的变动,因此能够抑制磁噪音的产生,与以往相比能够提高记录的读写精度、记录密度。In the magnetic recording medium (magnetic disk) produced by using the glass substrate for magnetic recording medium of the present invention through the procedure described above, since the surface roughness Ra of the main plane of the glass substrate as a whole is within a predetermined range, the magnetic layer formed in the film Coarsening of crystal grains can be suppressed, and the size of crystal grains can be made small and uniform. Thereby, the dot size of the magnetic recording medium can be reduced, and the areal recording density of the magnetic recording medium can be increased. Moreover, since the distance between the magnetic recording medium and the magnetic head can be reduced compared to the past, and the variation of the distance between the magnetic recording medium and the magnetic head can be reduced, the generation of magnetic noise can be suppressed, and the recording efficiency can be improved compared with the past. Read and write accuracy, recording density.
【实施例】【Example】
以下,举出具体的实施例进行说明,但本发明并未限定为这些实施例。Hereinafter, specific examples are given and described, but the present invention is not limited to these examples.
首先,说明以下的实施例、比较例中的磁记录介质用玻璃基板的评价方法、及在玻璃基板表面上成膜出磁性层等薄膜的磁记录介质的评价方法。First, methods for evaluating glass substrates for magnetic recording media in the following Examples and Comparative Examples, and methods for evaluating magnetic recording media in which thin films such as magnetic layers are formed on the surface of glass substrates will be described.
(1)表面粗糙度(算术平均粗糙度)Ra(1) Surface roughness (arithmetic mean roughness) Ra
表面粗糙度Ra使用扫描型干涉显微镜(Zygo公司制,ZeMapper)进行了测定。表面粗糙度Ra的测定区域是包括磁记录介质用玻璃基板的记录再生区域整个面的范围。The surface roughness Ra was measured using a scanning interference microscope (manufactured by Zygo, ZeMapper). The measurement area of the surface roughness Ra is a range including the entire recording/reproducing area of the glass substrate for magnetic recording media.
在本实施例中,在磁记录介质用玻璃基板的一个主平面的整个面上设定1边为30μm的正方格子状的评价区域,对于各个评价区域,求出了表面粗糙度Ra。In this example, evaluation areas in the shape of a square grid with a side of 30 μm were set on the entire surface of one main plane of the glass substrate for magnetic recording media, and the surface roughness Ra was obtained for each evaluation area.
(2)证明测试(2) Proof test
证明测试评价了磁记录介质的磁性层等的缺陷(信号品质)。证明测试用磁头使用设置于头滑动件的测试头,使磁盘装置的磁头与磁盘的关系再现,对于盘的各磁道的每一个进行写入信号的写入、再生、 消去、再再生等而进行了评价。在本实施例中,评价了EP(Extra Pulse:冒脉冲)错误。The proof test evaluates defects (signal quality) of the magnetic layer and the like of the magnetic recording medium. The magnetic head for certification test uses the test head installed on the head slider to reproduce the relationship between the magnetic head and the magnetic disk of the magnetic disk device, and writes, reproduces, erases, and regenerates the write signal for each track of the disk. commented. In this example, EP (Extra Pulse: pulse-eating) errors were evaluated.
EP错误是指在磁记录介质上存在伤痕、异物、粗糙度不良、晶粒的尺寸不均一的区域时,产生从测试头的再生信号的振幅较大脱离的再生信号。EP错误不能进行磁盘的适当的信号处理。The EP error refers to the generation of a reproduced signal that deviates greatly from the amplitude of the reproduced signal of the test head when there is a flaw, foreign matter, poor roughness, or a non-uniform crystal grain size region on the magnetic recording medium. EP errors do not allow proper signal processing of the disk.
在本实施例中,评价了1000张磁记录介质,并将发生了EP错误的磁记录介质的比率设为EP发生率。In this example, 1000 magnetic recording media were evaluated, and the ratio of the magnetic recording media in which EP errors occurred was defined as the EP occurrence rate.
以下的例1~例10中,说明磁记录介质用玻璃基板及在磁记录介质用玻璃基板上形成磁性层等而作为磁记录介质的例子。在此,例1~7是满足本发明的规定的实施例,例8~10是比较例。In the following examples 1 to 10, a glass substrate for a magnetic recording medium and an example in which a magnetic layer and the like are formed on the glass substrate for a magnetic recording medium and used as a magnetic recording medium will be described. Here, Examples 1 to 7 are examples satisfying the requirements of the present invention, and Examples 8 to 10 are comparative examples.
以下说明的例1~例10的磁记录介质用玻璃基板通过以下的顺序制成。The glass substrates for magnetic recording media of Examples 1 to 10 described below were produced by the following procedure.
为了得到外径65mm、内径20mm、板厚0.635mm的磁记录介质用玻璃基板,将通过浮法成形的以SiO2为主成分的玻璃基板加工成在中央部具有圆孔的圆盘形状玻璃基板。In order to obtain a glass substrate for magnetic recording media with an outer diameter of 65 mm, an inner diameter of 20 mm, and a thickness of 0.635 mm, a glass substrate mainly composed of SiO 2 formed by a float process is processed into a disk-shaped glass substrate with a hole in the center .
为了得到倒角宽度0.15mm、倒角角度45°的磁记录介质用玻璃基板而对该圆盘形状玻璃基板的内周端面和外周端面进行了倒角加工(内周倒角工序、外周倒角工序)。In order to obtain a glass substrate for magnetic recording media with a chamfering width of 0.15mm and a chamfering angle of 45°, the inner and outer peripheral end faces of the disk-shaped glass substrate were chamfered (inner peripheral chamfering process, outer peripheral chamfering process) process).
倒角加工后,使用氧化铝磨粒对玻璃基板上下主平面进行打磨加工,将磨粒清洗除去。After the chamfering process, the upper and lower main planes of the glass substrate are ground with alumina abrasive grains, and the abrasive grains are cleaned and removed.
接着,使用研磨刷和含有氧化铈磨粒的研磨液对磁记录介质用玻璃基板的外周侧面部和外周倒角部进行研磨,将外周侧面和外周倒角 部的加工变质层(伤痕等)除去,将外周端面研磨加工成镜面(外周端面研磨工序)。Next, use a polishing brush and a polishing liquid containing cerium oxide abrasive grains to polish the outer peripheral side surface and outer peripheral chamfer of the glass substrate for magnetic recording media, and remove the process-induced deterioration layer (scars, etc.) on the outer peripheral side surface and outer peripheral chamfer , Grinding the outer peripheral end face into a mirror surface (peripheral end face grinding process).
在外周端面研磨后,使用研磨刷和含有氧化铈磨粒的研磨液对磁记录介质用玻璃基板的内周侧面部和内周倒角部进行研磨,将内周侧面部和内周倒角部的加工变质层(伤痕等)除去,将内周端面研磨加工成镜面(内周端面研磨工序)。对于进行了内周端面研磨后的玻璃基板,将磨粒清洗除去。After the outer peripheral end face is ground, use a polishing brush and a polishing liquid containing cerium oxide abrasive grains to grind the inner peripheral side and inner peripheral chamfer of the glass substrate for magnetic recording media, and the inner peripheral side and inner peripheral chamfer The process-altered layer (scratch, etc.) is removed, and the inner peripheral end surface is ground to a mirror surface (inner peripheral end surface grinding process). Abrasive grains were cleaned and removed from the glass substrate after the inner peripheral end surface was ground.
在对玻璃基板的端面进行了加工之后,使用含有金钢石磨粒的固定粒工具和研削液,对玻璃基板上下主平面进行打磨加工、清洗。After the end face of the glass substrate is processed, the upper and lower main planes of the glass substrate are polished and cleaned using a fixed grain tool containing diamond abrasive grains and a grinding fluid.
接着,作为研磨用具,使用硬质聚氨酯制的研磨垫和含有氧化铈磨粒的研磨液(平均粒子直径,以下,简称为平均粒径,含有约1.3μm的氧化铈的研磨液组成物),通过22B型双面研磨装置(SpeedFam公司制,产品名:DSM22B-6PV-4MH)在上下主平面以研磨量成为20μm的方式对玻璃基板进行1次研磨,将氧化铈清洗除去。需要说明的是,1批同时研磨216张玻璃基板。Then, as a polishing tool, use a polishing pad made of hard polyurethane and a polishing liquid containing cerium oxide abrasive grains (average particle diameter, hereinafter, referred to as the average particle diameter, and a polishing liquid composition containing cerium oxide of about 1.3 μm), The glass substrate was polished once with a 22B type double-side polishing device (manufactured by SpeedFam, product name: DSM22B-6PV-4MH) so that the polishing amount becomes 20 μm on the upper and lower main planes, and the cerium oxide was cleaned and removed. In addition, 216 glass substrates were polished simultaneously in one batch.
1次研磨后的玻璃基板使用软质聚氨酯制的研磨垫和含有平均粒径比上述的氧化铈磨粒小的氧化铈磨粒的研磨液(含有平均粒径约0.5μm的氧化铈的研磨液组成物)作为研磨用具,通过22B型双面研磨装置以研磨量成为5μm的方式对上下主平面进行2次研磨,将氧化铈清洗除去。The glass substrate after the primary polishing uses a polishing pad made of soft polyurethane and a polishing liquid containing cerium oxide abrasive grains with an average particle diameter smaller than the above-mentioned cerium oxide abrasive grains (a polishing liquid containing cerium oxide with an average particle diameter of about Composition) as a polishing tool, the upper and lower main planes were polished twice with a 22B type double-sided polishing apparatus so that the polishing amount became 5 μm, and the cerium oxide was cleaned and removed.
对于2次研磨后的玻璃基板进行3次研磨(精研磨)。作为3次研磨的研磨用具,使用软质聚氨酯制研磨垫和含有胶态氧化硅的研磨液,通过双面研磨装置对上下主平面进行了研磨加工。上述软质聚氨酯制研磨垫在粘贴于研磨平台之后,进行修整处理,根据情况以规定时间进行了基于纯水的清洗。The glass substrate polished twice was polished three times (finish polishing). The upper and lower main planes were polished with a double-sided polishing device using a soft polyurethane polishing pad and a polishing liquid containing colloidal silica as a polishing tool for three times of polishing. The above-mentioned soft polyurethane polishing pad was pasted on the polishing table, then subjected to dressing treatment, and washed with pure water for a predetermined period of time in some cases.
另外,双面研磨装置构成为能够供给、排出研磨液,以研磨液的供给流量成为规定的值的方式调整研磨液的供给量并进行了研磨。In addition, the double-sided polishing apparatus was configured to be able to supply and discharge the polishing liquid, and the polishing liquid was polished while adjusting the supply flow rate of the polishing liquid so that the supply flow rate of the polishing liquid became a predetermined value.
关于进行3次研磨时的研磨垫的清洗时间、胶态氧化硅的一次粒子径、研磨液的pH、研磨液中含有的胶态氧化硅的凝集性、研磨液的流量,在后述的例1~10中有记载。Regarding the cleaning time of the polishing pad, the primary particle size of colloidal silica, the pH of the polishing liquid, the cohesiveness of the colloidal silica contained in the polishing liquid, and the flow rate of the polishing liquid when performing three times of polishing, in the following example It is recorded in 1~10.
使用粒度分布测定装置(大塚电子公司制:FPAR-1000),测定研磨玻璃基板之前的研磨液的粒度分布和研磨了玻璃基板之后的研磨液的粒度分布,根据各自的粒度分布而求出d50值,算出玻璃基板的研磨前后的d50值的变化量(差),由此对研磨液中含有的胶态氧化硅的凝集性进行了评价。Using a particle size distribution measuring device (manufactured by Otsuka Electronics Co., Ltd.: FPAR-1000), the particle size distribution of the polishing liquid before polishing the glass substrate and the particle size distribution of the polishing liquid after polishing the glass substrate are measured, and the d50 value is obtained from the respective particle size distributions , the amount of change (difference) in the d50 value before and after polishing of the glass substrate was calculated to evaluate the cohesiveness of the colloidal silica contained in the polishing liquid.
需要说明的是,上述d50值是指由散射强度分布进行了个数换算时的累计值成为50%的粒子径。In addition, the above-mentioned d50 value means the particle diameter at which the integrated value becomes 50% when the number conversion is carried out from the scattering intensity distribution.
具体而言,通过利用以下的式子算出的研磨前后的d50值的变化量进行了评价。由[研磨后的研磨液的d50值(nm)]-[研磨前的研磨液的d50值(nm)]表示。Specifically, evaluation was performed by the amount of change in the d50 value before and after polishing calculated by the following formula. It is represented by [d50 value (nm) of the polishing liquid after polishing]-[d50 value (nm) of the polishing liquid before polishing].
通过上述式算出的研磨前后的d50值的变化量为15nm以下时,研磨液中含有的磨粒(胶态氧化硅)的凝集几乎不产生而分散性良好(A),为16nm~30nm时稍产生凝集(B)。此外,在31nm以上时,产生了会对玻璃基板的主平面的研磨造成影响的程度的凝集(C)。When the change in the d50 value before and after polishing calculated by the above formula is 15nm or less, the aggregation of the abrasive grains (colloidal silica) contained in the polishing liquid hardly occurs and the dispersibility is good (A). Agglutination occurs (B). Moreover, when it is 31 nm or more, the aggregation (C) of the grade which affects the polishing of the main plane of a glass substrate arises.
为了得到满足本发明的规定的磁记录介质用玻璃基板,优选使用研磨液中含有的磨粒的凝集几乎不产生而分散性良好的(A)的研磨液。这是因为,在使用了磨粒容易凝集的研磨液时,在磁记录介质用玻璃基板的表面可能会产生表面粗糙度Ra局部高的部分,进行了精研磨(3 次研磨)的玻璃基板依次进行擦洗、浸渍在洗涤剂溶液中的状态下的超声波清洗、浸渍在纯水中的状态下的超声波清洗(精密清洗),利用异丙醇蒸气进行了干燥。In order to obtain a glass substrate for a magnetic recording medium that satisfies the requirements of the present invention, it is preferable to use a polishing liquid (A) that hardly aggregates abrasive grains contained in the polishing liquid and has good dispersibility. This is because when using a polishing liquid in which abrasive grains tend to agglomerate, a portion with locally high surface roughness Ra may occur on the surface of the glass substrate for magnetic recording media, and the glass substrate that has been finely ground (three times) is sequentially Scrubbing, ultrasonic cleaning in a state of immersion in a detergent solution, ultrasonic cleaning in a state of immersion in pure water (precision cleaning), and drying with isopropanol vapor were performed.
对于通过以上的顺序得到的磁记录介质用玻璃基板的主平面的整个面,通过上述的方法评价了表面粗糙度Ra。Surface roughness Ra was evaluated by the method mentioned above about the whole surface of the main plane of the glass substrate for magnetic recording media obtained by the above procedure.
另外,在通过以上的顺序得到的磁记录介质用玻璃基板的表面,通过以下的顺序成膜出具有磁性层的多层膜而作为磁记录介质,评价了EP发生率。Moreover, on the surface of the glass substrate for magnetic recording media obtained by the above procedure, the multilayer film which has a magnetic layer was formed into a film by the following procedure as a magnetic recording medium, and EP occurrence rate was evaluated.
在进行了成膜前清洗的磁记录介质用玻璃基板的表面,使用在线型溅射装置,依次层叠作为软磁性基底层的NiFe层、作为非磁性中间层的Ru层、作为垂直磁记录层的CoCrPtSiO2的颗粒结构层。接着,利用CVD法形成类金刚石碳膜作为保护层。然后,通过浸渍法形成了含有全氟聚醚的润滑膜。On the surface of the glass substrate for magnetic recording media that has been cleaned before film formation, an NiFe layer as a soft magnetic base layer, a Ru layer as a nonmagnetic intermediate layer, and a Ru layer as a perpendicular magnetic recording layer are sequentially laminated using an in-line sputtering device. Granular structure layer of CoCrPtSiO2 . Next, a diamond-like carbon film is formed as a protective layer by a CVD method. Then, a lubricating film containing perfluoropolyether was formed by a dipping method.
对于得到的磁记录介质,利用上述方法评价了EP错误,求出了EP发生率。With respect to the obtained magnetic recording medium, EP errors were evaluated by the method described above, and the EP occurrence rate was obtained.
主平面的精研磨(3次研磨)的研磨液的条件在以下的例1~例10中有记载。例1~例7是实施例,例8~例10是比较例。The conditions of the polishing solution for the finish polishing (three times polishing) of the main plane are described in the following Examples 1 to 10. Example 1~Example 7 are embodiments, and Example 8~Example 10 are comparative examples.
在例1~例10的加工条件下加工的磁记录介质用玻璃基板的主平面的整个面上的、表面粗糙度Ra最大值/表面粗糙度Ra平均值、表面粗糙度Ra平均值(nm)、表面粗糙度Ra标准偏差(nm)如表1所示。而且,关于磁记录介质的EP发生率(%)也如表1所示。Surface roughness Ra maximum value/surface roughness Ra average value, surface roughness Ra average value (nm) on the entire surface of the main plane of the glass substrate for magnetic recording media processed under the processing conditions of Examples 1 to 10 , Surface roughness Ra standard deviation (nm) as shown in Table 1. Furthermore, Table 1 also shows the EP occurrence rate (%) of the magnetic recording medium.
(例1)(example 1)
对于通过上述的顺序,实施了到主平面研磨的2次研磨为止的处 理后的磁记录介质用玻璃基板,进行了主平面研磨的精研磨(3次研磨工序)。For the glass substrate for magnetic recording media that has been subjected to the processing up to the second grinding of the main plane grinding by the above-mentioned procedure, the finish grinding of the main plane grinding was carried out (three grinding steps).
精研磨使用预先利用纯水进行了10分钟清洗的软质聚氨酯制研磨垫和含有1次粒子径为12nm的胶态氧化硅作为磨粒的pH4的研磨液来实施。在评价了研磨液中含有的磨粒(胶态氧化硅)的凝集性时,研磨前后的研磨液的d50值的变化量为15nm以下,为良好(A)。The finish polishing was performed using a soft polyurethane polishing pad previously washed with pure water for 10 minutes, and a polishing solution of pH 4 containing colloidal silica with a primary particle diameter of 12 nm as abrasive grains. When the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid was evaluated, the amount of change in the d50 value of the polishing liquid before and after polishing was 15 nm or less, which was good (A).
另外,以向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板成为6毫升/分的方式进行了研磨。Moreover, polishing was performed so that the flow rate of the polishing liquid supplied to the polishing surface of a double-sided polishing apparatus might become 6 ml/min per glass substrate for magnetic recording media.
对主平面加工后的玻璃基板实施精密清洗而得到磁记录介质用玻璃基板,测定磁记录介质用玻璃基板的主平面的表面粗糙度Ra,进行了评价。The glass substrate for magnetic recording media was obtained by fine-cleaning the glass substrate after the main plane processing, and the surface roughness Ra of the main plane of the glass substrate for magnetic recording media was measured and evaluated.
另外,如上所述,在磁记录介质用玻璃基板的表面成膜出具有磁性层的多层膜而形成磁记录介质,评价了EP发生率。In addition, as described above, a multilayer film having a magnetic layer was deposited on the surface of a glass substrate for magnetic recording media to form a magnetic recording medium, and the EP generation rate was evaluated.
(例2)(Example 2)
在主平面研磨的精研磨(3次研磨工序)中,除了使向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the finish grinding (three times of grinding process) of the main plane grinding, except that the flow rate of the polishing liquid supplied to the grinding surface of the double-sided grinding device is 2 ml/min for each glass substrate for magnetic recording media, by and Example 1 A glass substrate for a magnetic recording medium and a magnetic recording medium (magnetic disk) were produced in the same manner as in Example 1.
需要说明的是,关于在精研磨时使用的研磨液中含有的磨粒(胶态氧化硅)的凝集性,与例1的情况同样为良好(A)。It should be noted that the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used for finish polishing was good (A) as in the case of Example 1.
另外,对于得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例3)(Example 3)
在主平面研磨的精研磨(3次研磨工序)中,除了设研磨液为pH5、设向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the finishing polishing (three polishing steps) of the main surface polishing, except that the pH of the polishing liquid is set to 5, the flow rate of the polishing liquid supplied to the polishing surface of the double-sided polishing device is set to 2 ml per glass substrate for magnetic recording media. Except /min, the glass substrate for magnetic recording media and a magnetic recording medium (magnetic disk) were manufactured by the method similar to Example 1.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,与例1的情况同样为良好(A)。In addition, the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used at the time of finish polishing was good (A) similarly to the case of Example 1.
另外,对于得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例4)(Example 4)
在主平面研磨的精研磨(3次研磨工序)中,除了使用研磨液中所含有的胶态氧化硅的一次粒子径为20nm的研磨液,且设向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the finishing polishing (three polishing steps) of the main surface polishing, in addition to using a polishing liquid with a primary particle diameter of 20 nm of colloidal silicon oxide contained in the polishing liquid, the polishing liquid supplied to the polishing surface of the double-sided polishing device is provided. The glass substrate for magnetic recording media and the magnetic recording medium (magnetic disk) were manufactured by the method similar to Example 1 except that the flow rate of liquid was 2 ml/min per glass substrate for magnetic recording media.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,与例1的情况同样为良好(A)。In addition, the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used at the time of finish polishing was good (A) similarly to the case of Example 1.
另外,对于得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例5)(Example 5)
在主平面研磨的精研磨(3次研磨工序)中,除了使用研磨液中所含有的胶态氧化硅的一次粒子径为25nm的研磨液,且设向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基 板及磁记录介质(磁盘)。In the finishing polishing (three polishing steps) of the main surface polishing, in addition to using a polishing liquid with a primary particle diameter of 25 nm of colloidal silicon oxide contained in the polishing liquid, the polishing liquid supplied to the polishing surface of the double-sided polishing device is provided. The glass substrate for magnetic recording media and the magnetic recording medium (magnetic disk) were manufactured by the method similar to Example 1 except that the flow rate of liquid was 2 ml/min per glass substrate for magnetic recording media.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,与例1的情况同样为良好(A)。In addition, the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used at the time of finish polishing was good (A) similarly to the case of Example 1.
另外,对于所得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例6)(Example 6)
在主平面研磨的精研磨(3次研磨工序)中,除了设研磨液中所含有的胶态氧化硅的一次粒子径为30nm,且设向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the finishing polishing (three polishing steps) of the main surface polishing, the primary particle diameter of the colloidal silica contained in the polishing liquid is set to 30nm, and the flow rate of the polishing liquid supplied to the polishing surface of the double-side polishing device is set A glass substrate for a magnetic recording medium and a magnetic recording medium (magnetic disk) were produced by the same method as in Example 1 except that the glass substrate for a magnetic recording medium was 2 ml/min.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,与例1的情况同样为良好(A)。In addition, the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used at the time of finish polishing was good (A) similarly to the case of Example 1.
另外,对于所得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例7)(Example 7)
在主平面研磨的精研磨(3次研磨工序)中,除了使研磨液为pH3,且设向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the finish grinding (3 grinding steps) of the main plane grinding, except making the grinding liquid pH3, and the flow rate of the grinding liquid supplied to the grinding surface of the double-sided grinding device is 2 for each glass substrate for magnetic recording media. A glass substrate for a magnetic recording medium and a magnetic recording medium (magnetic disk) were produced by the same method as in Example 1 except for milliliters/minute.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,与例1的情况同样为良好(A)。In addition, the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used at the time of finish polishing was good (A) similarly to the case of Example 1.
另外,对于得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例8)(Example 8)
在主平面研磨的精研磨(3次研磨工序)中,除了使用未进行基于纯水的清洗的研磨垫,且设向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the finishing polishing (three polishing steps) of the main plane polishing, except using a polishing pad that is not cleaned with pure water, and setting the flow rate of the polishing liquid supplied to the polishing surface of the double-sided polishing device for each magnetic recording The glass substrate for magnetic recording media and the magnetic recording medium (magnetic disk) were manufactured by the same method as Example 1 except that the glass substrate for media was 2 ml/min.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,在研磨的前后,研磨液的粒度分布d50进行31nm以上变化,为(C)。In addition, regarding the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used for finishing polishing, the particle size distribution d50 of the polishing liquid changes by 31 nm or more before and after polishing, which is (C) .
另外,对于所得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例9)(Example 9)
在主平面研磨的精研磨(3次研磨工序)中,除了设研磨垫的基于纯水的清洗时间为5分钟,且设向双面研磨装置的研磨面供给的研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the finishing grinding (three times of grinding process) of the main surface grinding, except that the cleaning time of the polishing pad based on pure water is 5 minutes, and the flow rate of the polishing liquid supplied to the polishing surface of the double-sided polishing device is set to be 5 minutes for each The glass substrate for magnetic recording media and the magnetic recording medium (magnetic disk) were manufactured by the method similar to Example 1 except that the glass substrate for magnetic recording media was 2 ml/min.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,在研磨的前后,研磨液的d50值的变化量为16nm以上且30nm以下,为(B)。It should be noted that regarding the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used at the time of finish polishing, the amount of change in the d50 value of the polishing liquid before and after polishing is 16 nm or more and 30 nm or less, for (B).
另外,对于得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
(例10)(Example 10)
在主平面研磨的精研磨(3次研磨工序)中,除了设研磨液为pH2,且设研磨液的流量对于每一张磁记录介质用玻璃基板为2毫升/分以外,通过与例1同样的方法制造了磁记录介质用玻璃基板及磁记录介质(磁盘)。In the fine grinding (3 times of grinding process) of main surface grinding, except that the polishing liquid is pH2, and the flow rate of the polishing liquid is 2 milliliters per minute for each glass substrate for magnetic recording media, the same as in example 1 A glass substrate for a magnetic recording medium and a magnetic recording medium (magnetic disk) were produced by the method.
需要说明的是,关于在精研磨时使用的研磨液中所含有的磨粒(胶态氧化硅)的凝集性,在研磨的前后,研磨液的d50值的变化量为15nm以下,为良好(A)。It should be noted that, regarding the cohesiveness of the abrasive grains (colloidal silica) contained in the polishing liquid used at the time of finish polishing, before and after polishing, the change in the d50 value of the polishing liquid is 15 nm or less, which is good ( A).
另外,对于得到的磁记录介质用玻璃基板、磁记录介质,与例1同样地进行了评价。结果如表1所示。Moreover, it evaluated similarly to Example 1 about the obtained glass substrate for magnetic recording media, and a magnetic recording medium. The results are shown in Table 1.
从表1的结果可以确认的是,使用满足本发明的规定的例1~7的磁记录介质用玻璃基板制成的磁记录介质的EP发生率均减小为1.6%以下。相对于此,可知,作为比较例的例8~10的EP发生率最低也高达2.5%左右。From the results in Table 1, it can be confirmed that the EP generation rate of the magnetic recording media produced using the glass substrates for magnetic recording media of Examples 1 to 7 satisfying the provisions of the present invention was all reduced to 1.6% or less. On the other hand, it can be seen that the incidence of EP in Examples 8 to 10, which are comparative examples, is as high as about 2.5% at the lowest.
这认为是因为,本发明的磁记录介质用玻璃基板的主平面的整个面没有表面粗糙度Ra局部高的区域,主平面的整个面变得平滑,因此在形成磁性层等而作为磁记录介质时,能够抑制晶粒局部性地变大的情况。This is considered to be because the glass substrate for magnetic recording media of the present invention does not have a region where the surface roughness Ra is locally high throughout the main plane, and the entire main plane becomes smooth. When , it is possible to suppress the crystal grains from becoming locally enlarged.
因此,认为是因为,能够抑制磁噪音的发生,能够提高基于磁头的向磁记录介质的读写的精度,能够防止记录密度的下降。Therefore, it is considered that the occurrence of magnetic noise can be suppressed, the accuracy of reading and writing to the magnetic recording medium by the magnetic head can be improved, and a decrease in recording density can be prevented.
【表1】【Table 1】
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