CN103042753A - VC/Co toughening coating layer with nanometer multilayer structure and preparation method thereof - Google Patents
VC/Co toughening coating layer with nanometer multilayer structure and preparation method thereof Download PDFInfo
- Publication number
- CN103042753A CN103042753A CN2012105752246A CN201210575224A CN103042753A CN 103042753 A CN103042753 A CN 103042753A CN 2012105752246 A CN2012105752246 A CN 2012105752246A CN 201210575224 A CN201210575224 A CN 201210575224A CN 103042753 A CN103042753 A CN 103042753A
- Authority
- CN
- China
- Prior art keywords
- layer
- nano
- coating
- double
- multilayered structures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a VC/Co toughening coating layer with a nanometer multilayer structure. The coating layer is formed by alternatively depositing VC layers and Co layers; adjacent one VC layer and one Co layer form one double-layer periodic layer; each double-layer periodical layer is 1-88 nm in thickness; the thickness ratio of the VC layer to the Co layer in each double-layer periodic layer is (1.0-3.0):1; and the total thickness of the double-layer periodic layer is 1-5 microns. The invention further discloses a preparation method for the VC/Co toughening coating layer with the nanometer multilayer structure; the method comprises the steps of respectively mounting VC targets and Co targets on medium-frequency cathodes, placing target surfaces perpendicular to a rotary working table, and adopting the magnetron sputtering method to deposit matrixes. At the same time of keeping higher hardness, the VC/Co toughening coating layer with the nanometer multilayer structure improves the toughness, so that the hardness and toughness requirements of protection coating layers and wear-resistant coating layers can be satisfied; and the preparation method has the advantages of strong operability, good controllability and easiness in industrial production.
Description
Technical field
The present invention relates to a kind of hard coat and preparation method thereof, relate in particular to toughness reinforcing coating of VC/Co of a kind of nano-multilayered structures and preparation method thereof, belong to field of ceramic coatings.
Background technology
Hard protection coatings mainly is that the transition metal nitride that is made of metallic bond, carbide, boride and the metal oxide that is made of ionic bond etc. form, the hardness of these coatings is very high, but their toughness is very low, the toughness that improves these coatings is the same important with the hardness that improves them, particularly in the application in fretting wear field.
Transition metal Ti, V, W, Ta, Zr, Mo, Cr etc. can react with carbon atom, generate metal-carbide coating, and metal-carbide coating has the advantages that chemical stability is good, fusing point is high, hardness is large, and still, carbide coating toughness is bad, and is more crisp.Many researchs can change the structure of metal-carbide coating by the relatively poor metal of compound a kind of and C adhesion, thereby change the performance of coating.Now, studying more is to imitate the carbide ceramics of block to improve toughness by adding the 8th family's element (Fe, Co, Ni etc.), but the result is not ideal.Such as (" Surface﹠amp such as jansson; Coatings Technology ", the 206th volume, the 583rd～590,2011) announced a kind of Ti-C-Me coating, wherein Me is Al, Fe, Ni, Cu, one or more among the Pt, still, the hardness of this coating only has 7～18GPa.
Early 1970s, the sandwich construction that Koehler has proposed the sizable two kinds of constituent elements of elastic modelling quantity obtains the model of high strong solid, and its thought is to hinder the generation of dislocation and the effect of motion according to layer material.
Application number is the coating that 03129543.6 Chinese patent application discloses a kind of SiC/TiN super hard nano sandwich construction, formed at the matrix of metal or pottery by TiN layer and SiC layer alternating deposit, the thickness of TiN layer is 4 ~ 50nm, the thickness of SiC layer is 0.4 ~ 0.8nm, the nano-multilayer film gross thickness is 2 ~ 4 μ m, is in the 50nm time in modulation period namely, produces superhard effect, the wearability of coating improves, but the toughness of coating is not improved.
Application number is that 200910055596.4 Chinese invention patent application discloses a kind of VC/Si
3N
4Nano laminated coating and preparation method thereof, described sandwich construction are by VC and Si
3N
4The bi-material alternating deposit forms the sandwich construction of nanometer scale, and in its each double-deck cycle, the thickness of VC layer is 2 ~ 8nm, Si
3N
4The thickness of layer is 0.2 ~ 0.9nm, and the gross thickness of coating is 1 ~ 4 μ m.This VC/Si
3N
4Nano laminated coating adopts the double-target radio frequency magnetron sputtering method alternately to deposit VC layer and Si on the matrix of metal or pottery
3N
4The layer and make.This VC/Si
3N
4The hardness of nano laminated coating is higher than 35GPa, and maximum hardness reaches 43GPa, has preferably hardness, although VC and Si in this coating
3N
4Two interface formation eutectic lattice structures have improved the hardness of coating, but because VC and Si
3N
4Be plasticity index and be no more than 0.4 hard coat, two interface formation eutectic lattice structures have reduced the toughness of coating, and its coating plasticity index is no more than 0.40.
By to further retrieval and the analysis of document do, also do not find the VC/Co coating of nano-multilayered structures, there are not to find to have the toughening effect of excellence and the toughness reinforcing coating that hardness surpasses the VC/Co nano-multilayered structures of 15GPa yet.
Summary of the invention
The objective of the invention is to overcome the deficiencies in the prior art, a kind of toughness reinforcing coating of VC/Co of nano-multilayered structures is provided, when guaranteeing that coating has excellent hardness, improved the toughness of coating, thereby improved the abrasion resistance properties of coating.
The present invention is achieved by the following technical solutions, the toughness reinforcing coating of the VC/Co of nano-multilayered structures of the present invention is formed by VC layer and Co layer alternating deposit, adjacent one deck VC layer and one deck Co layer consist of a double-deck cycle layer, the thickness of each double-deck cycle layer is 1～88nm, the Thickness Ratio of VC layer and Co layer is 1.0～3.0:1 in each double-deck cycle layer, and the gross thickness of the toughness reinforcing coating of VC/Co of nano-multilayered structures is 1 ~ 5 μ m.
For single layer structure, when being subjected to external force, the metal Co individual layer consumes most of energy by detrusion, has reduced stress and has concentrated, and is difficult for the germinating crackle, and ceramic phase VC is because plasticity is very poor, the concentrated stress that can not relax, serious distortion appears at the defective locations of coating, and further causes cracking, the germinating crackle, expanding subsequently and assembling becomes main crackle.But in the toughness reinforcing coating of the VC/Co of nano-multilayered structures of the present invention, when applying applied external force, the Co monofilm relaxes stress by the detrusion consumed energy, is difficult for the germinating crackle, has improved the toughness of coating.Simultaneously, on crystal boundary, suppressed growing up of VC crystal grain in Metal Phase Co segregation on the two-phase interface, the toughness of coating is relative with hardness to be improved.
The uniformity of coating, hardness improves along with double-deck reducing of cycle layer thickness, but along with reducing of double-deck cycle layer thickness, the toughness reinforcing coating of the VC/Co of nano-multilayered structures of the present invention and the difference difficult with coating of homogeneous texture, but, after the thickness of double-deck cycle layer surpasses 88nm, it is obvious that shortcoming in the coating in the single layer structure just becomes, in the time of the hardness of coating and toughness drop, its anti-wear performance reduces, the preferred value of the double-deck cycle layer that is made of adjacent one deck VC layer and one deck Co layer is 3～60nm, and namely the thickness of each double-deck cycle layer is preferably 3～60nm.
As preferably, the thickness of each double-deck cycle layer all equates, namely with a modulation period to VC layer and Co layer alternating deposit so that double-deck cycle layer evenly distributes, can greatly improve toughness and the hardness of coating.
From the characterization data of embodiment 2,3,8,9 and 11 hardness and toughness as can be known, the thickness of each double-deck cycle layer is 6 ~ 24.9nm, the Thickness Ratio of VC layer and Co layer is 2.0～3.0:1 in each double-deck cycle layer, and the thickness of each double-deck cycle layer all equates, so that the toughness reinforcing coating of the VC/Co of nano-multilayered structures of the present invention has excellent hardness and toughness, can satisfy well the requirement of hard wear-resistant coating.
The present invention also provides a kind of preparation method of the toughness reinforcing coating of VC/Co of above-mentioned nano-multilayered structures, comprise: VC target and Co target are installed in respectively on the intermediate frequency negative electrode, target surface is perpendicular to rotary table, matrix is installed on the rotary table, by the rotating speed of adjusting rotary table and the sputtering power of target, adopt magnetically controlled sputter method, matrix is deposited, obtain the toughness reinforcing coating of VC/Co of nano-multilayered structures.
The present invention selects the method for magnetron sputtering to prepare the toughness reinforcing coating of VC/Co of nano-multilayered structures, because during magnetron sputtering, ion beam is to be pencil to be splashed on the matrix by target surface, this kind method can be avoided the premixed of two kinds of retes in the deposition process, obtain having the toughness reinforcing coating of VC/Co of the nano-multilayered structures at clear interface, it is simple to operate, controllability good, easy to implement.
As preferably, before the deposition, the background pressure of vacuum chamber is less than or equal to 5 * 10
-5Pa, namely the background pressure of vacuum chamber is less than or equal to 5 * 10
-5Behind the Pa; pass into the protective gas such as argon gas; can reduce the collision between sputtering particle and gas molecule in the sputter procedure; can reduce simultaneously in the deposition process gas molecule and enter and become impurity in the coating, improve the toughness reinforcing coating of VC/Co of nano-multilayered structures of the present invention density, purity, sedimentation rate and with the adhesive force of matrix.
During deposition, depositing temperature is 200 ℃ ~ 400 ℃, and deposition pressure is 0.3Pa ~ 1.0Pa, under this sputtering parameter, can make the toughness reinforcing coating structure of the VC/Co that deposits the nano-multilayered structures of the present invention that obtains fine and close.
The thickness of double-deck cycle layer is closely related in the Sputtering power density of VC target and Co target and the toughness reinforcing coating of the VC/Co of nano-multilayered structures of the present invention, and can affect the structure of the toughness reinforcing coating of VC/Co of nano-multilayered structures of the present invention, as preferably, during deposition, VC target Sputtering power density is: 4.0～6.5W/cm
2, Co target Sputtering power density is: 0.5～0.8W/cm
2, at this moment, can make the hardness of the toughness reinforcing coating of VC/Co of nano-multilayered structures of the present invention and the requirement of tough sexual satisfaction protective coating and wear-resistant coating.Simultaneously, the rotating speed of rotary table has also determined the thickness of double-deck cycle layer, and as preferably, during deposition, the rotating speed of rotary table is 0.5～4.0 rev/min (r/min).
Compared with prior art, the present invention has the following advantages:
One, the toughness reinforcing coating of the VC/Co of nano-multilayered structures provided by the present invention, when increasing coating toughness, the hardness of coating can reach more than the 15GPa, can satisfy the requirement of protective coating and wear-resistant coating toughness and hardness, has very large using value;
Two, the preparation method of the toughness reinforcing coating of VC/Co of nano-multilayered structures provided by the present invention, it is workable, controllability good, be easy to suitability for industrialized production, has preferably economic benefit.
Description of drawings
Fig. 1 is the structural representation of the toughness reinforcing coating of VC/Co of nano-multilayered structures of the present invention, and wherein 1 is the VC layer, and 2 is the Co layer;
Fig. 2 is the device schematic diagram of the toughness reinforcing coating of VC/Co of preparation nano-multilayered structures of the present invention, and wherein, 3 is matrix, and 4 is anode, and 5,6 is VC target and the Co target that links to each other with the intermediate frequency negative electrode;
Among Fig. 3, (a) be the impression figure of the VC coating of Comparative Examples, (b) be the impression figure of VC/Co coating of the nano-multilayered structures of embodiment 2, (c) being the impression figure of VC/Co coating of the nano-multilayered structures of embodiment 6, (d) is the impression figure of VC/Co coating of the nano-multilayered structures of embodiment 7.
The specific embodiment
The equipment of deposited coatings
Fig. 2 is the preparation method's of the toughness reinforcing coating of VC/Co of enforcement nano-multilayered structures of the present invention device schematic diagram, as shown in Figure 2, this device comprises anode 4, the rotary table that is connected with anode 4, the VC target 5 that is connected with the intermediate frequency negative electrode, Co target 6, VC target 5, Co target 6 are equipped with matrix 3 perpendicular to the table top of rotary table on the rotary table.Adopt magnetron sputtering technique, by the VC target 5 sputter VC that are connected with the intermediate frequency negative electrode, Co target 6 sputter Co obtain the toughness reinforcing coating of VC/Co of nano-multilayered structures.
The method of deposited coatings
The kind of matrix
Employing is of a size of the indices of crystallographic plane of 20mm * 20mm * 0.5mm and is the silicon chip of (100).
The preparation method of Comparative Examples and embodiment 1 ~ 11 floating coat:
Be silicon chip to matrix 3(at first) clean, the ultrasonic cleaning 3 minutes under 60 ℃ temperature of the washing agent of first matrix 3 being put into model that Borer company produces and be HT1401, then the ultrasonic cleaning 3 minutes under 50 ℃ temperature of the washing agent of putting into model that Borer company produces and be HT1233, cleaned 0.5 minute 45 ℃ deionized water for ultrasonic again, matrix 3 after will cleaning is at last put into 95 ℃ vacuum drying chamber baking 3 minutes, puts into after the oven dry on the rotary table of vacuum chamber.
VC target 5 and Co target 6 are installed in respectively on the intermediate frequency negative electrode, vacuum chamber is vacuumized, and matrix is heated to required depositing temperature, when the background pressure (back end vacuum) of vacuum chamber reaches required pressure, pass into Ar gas, pressure is transferred to required deposition pressure, regulate simultaneously power density and the power density of Co target 6 and the rotating speed of rotary table of VC target 5, to matrix 3 sputtering sedimentations, the thickness that obtains Comparative Examples is that VC coating and embodiment 1 ~ 11 thickness of 2 μ m is the VC/Co coating of the nano-multilayered structures of 2 μ m, and the physical property of the experiment parameter in the magnetron sputtering process and the coating that obtains is as shown in table 1.
Table 1
From the results shown in Table 1, the VC coating of the toughness reinforcing coating of the VC/Co of the nano-multilayered structures in the embodiment of the invention in the Comparative Examples, increase along with the double-deck cycle layer thickness of VC/Co, hardness decreases, but its hardness all more than 15GPa, can satisfy the requirement of hardness wear-resistant coating fully.From the characterization data of embodiment 2,3,8,9 and 11 hardness and toughness as can be known, VC coating in hardness and the Comparative Examples is basically identical, but toughness has had greatly raising, so that the toughness reinforcing coating of the VC/Co of nano-multilayered structures of the present invention has excellent hardness and toughness, can satisfy well the requirement of hard wear-resistant coating.
As shown in Figure 1, be the toughness reinforcing coating of the VC/Co of nano-multilayered structures of the present invention, formed by VC layer 1 and Co layer 2 alternating deposit, adjacent one deck VC layer 1 and one deck Co layer 2 consist of a double-deck cycle layer, the thickness of each double-deck cycle layer is 1～88nm, VC layer 1 is 1.0～3.0:1 with the Thickness Ratio of Co layer 2 in each double-deck cycle layer, and the gross thickness of the toughness reinforcing coating of VC/Co of nano-multilayered structures is 1 ~ 5 μ m.
Fig. 3 is the impression figure of coating under the pressure of 3N, figure (a) is the impression figure of the VC coating of Comparative Examples, figure (b), (c), (d) are respectively the impression figure of VC/Co coating of the nano-multilayered structures of embodiment 2, embodiment 6 and embodiment 7, from figure (a), can find out, obvious crackle occurs in simple VC coating under the pressure of 3N, and serious to the angular direction Crack Extension, in figure (b) impression a small amount of impression crackle is arranged, the angular direction flawless is expanded, and figure (c), the obvious impression crackle of (d) middle nothing, nothing be running crack obviously.The toughness of this explanation coating has obtained large increase with respect to simple VC coating toughness.
The present invention adopts the toughness reinforcing coating of VC/Co of the nano-multilayered structures that obtains among the following experimental technique assessment embodiment.
The measurement of hardness
The model that adopts American MTS to produce is the hardness that NANO G200 nano-hardness tester is measured each film system, its configuration tetrahedron Berkvich pressure head, by setting compression distance (100nm), load changes with compression distance, averages behind 6 matrix dots of each sample in measurement.
The measurement of impression
The employing model is that the microhardness testers of HV-1000 carry out micro-impression test to sample.By being applied to the pressure (3N) on the pressure head, observe the length of the crackle of impression generation, the crackle that more different samples produce and spread scenarios.
The measurement of plasticity index
The model that adopts American MTS to produce is that NANO G200 nano-hardness tester is measured coating plasticity and elastic deformation, its configuration tetrahedron Berkvich pressure head, by setting compression distance (100nm), load changes with compression distance, averages behind 6 matrix dots of each sample in measurement.According to the plastic deformation that obtains and elastic deformation, utilize formula (1) computational plasticity index.
δ wherein
HBe plasticity index, ε
pBe plastic deformation, ε
eBe elastic deformation, ε=ε
p+ ε
e
Claims (9)
1. the toughness reinforcing coating of the VC/Co of a nano-multilayered structures, it is characterized in that, formed by VC layer and Co layer alternating deposit, adjacent one deck VC layer and one deck Co layer consist of a double-deck cycle layer, the thickness of each double-deck cycle layer is 1～88nm, the Thickness Ratio of VC layer and Co layer is 1.0～3.0:1 in each double-deck cycle layer, and the gross thickness of the toughness reinforcing coating of VC/Co of nano-multilayered structures is 1 ~ 5 μ m.
2. the toughness reinforcing coating of the VC/Co of nano-multilayered structures according to claim 1 is characterized in that, the thickness of each double-deck cycle layer is 3～60nm.
3. the toughness reinforcing coating of the VC/Co of nano-multilayered structures according to claim 1 and 2 is characterized in that, the thickness of each double-deck cycle layer all equates.
4. the toughness reinforcing coating of the VC/Co of nano-multilayered structures according to claim 1, it is characterized in that, the thickness of each double-deck cycle layer is 6 ~ 24.9nm, and the Thickness Ratio of VC layer and Co layer is 2.0～3.0:1 in each double-deck cycle layer, and the thickness of each double-deck cycle layer all equates.
5. the preparation method of the toughness reinforcing coating of VC/Co of each described nano-multilayered structures according to claim 1 ~ 4, it is characterized in that, comprise: VC target and Co target are installed in respectively on the intermediate frequency negative electrode, target surface is perpendicular to rotary table, matrix is installed on the rotary table, by the rotating speed of adjusting rotary table and the sputtering power of target, adopts magnetically controlled sputter method, matrix is deposited, obtain the toughness reinforcing coating of VC/Co of nano-multilayered structures.
6. the preparation method of the toughness reinforcing coating of VC/Co of nano-multilayered structures according to claim 5 is characterized in that, before the deposition, the background pressure of vacuum chamber is less than or equal to 5 * 10
-5Pa.
7. the preparation method of the toughness reinforcing coating of VC/Co of nano-multilayered structures according to claim 5 is characterized in that, during deposition, depositing temperature is 200 ℃ ~ 400 ℃, and deposition pressure is 0.3Pa ~ 1.0Pa.
8. the preparation method of the toughness reinforcing coating of VC/Co of nano-multilayered structures according to claim 5 is characterized in that, during deposition, VC target Sputtering power density is: 4.0～6.5W/cm
2, Co target Sputtering power density is: 0.5～0.8W/cm
2
9. the preparation method of the toughness reinforcing coating of VC/Co of nano-multilayered structures according to claim 5 is characterized in that, during deposition, the rotating speed of described rotary table is 0.5～4.0 rev/min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210575224.6A CN103042753B (en) | 2012-12-26 | 2012-12-26 | VC/Co toughening coating layer with nanometer multilayer structure and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210575224.6A CN103042753B (en) | 2012-12-26 | 2012-12-26 | VC/Co toughening coating layer with nanometer multilayer structure and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103042753A true CN103042753A (en) | 2013-04-17 |
| CN103042753B CN103042753B (en) | 2015-06-24 |
Family
ID=48055712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210575224.6A Active CN103042753B (en) | 2012-12-26 | 2012-12-26 | VC/Co toughening coating layer with nanometer multilayer structure and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103042753B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101462386A (en) * | 2007-12-21 | 2009-06-24 | 山特维克知识产权股份有限公司 | Coated cutting tool and a method of making a coated cutting tool |
| CN101618615A (en) * | 2009-07-30 | 2010-01-06 | 上海工具厂有限公司 | VC/Si3N4 nano laminated coating and preparation method thereof |
| WO2010050715A2 (en) * | 2008-10-31 | 2010-05-06 | 전북대학교 산학협력단 | Ultra-light metal carbide-metal nanostructured material and method for preparing the same |
| US20110135897A1 (en) * | 2009-12-06 | 2011-06-09 | Iscar, Ltd. | Coated Article and Method for Making a Coated Article |
-
2012
- 2012-12-26 CN CN201210575224.6A patent/CN103042753B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101462386A (en) * | 2007-12-21 | 2009-06-24 | 山特维克知识产权股份有限公司 | Coated cutting tool and a method of making a coated cutting tool |
| WO2010050715A2 (en) * | 2008-10-31 | 2010-05-06 | 전북대학교 산학협력단 | Ultra-light metal carbide-metal nanostructured material and method for preparing the same |
| CN101618615A (en) * | 2009-07-30 | 2010-01-06 | 上海工具厂有限公司 | VC/Si3N4 nano laminated coating and preparation method thereof |
| US20110135897A1 (en) * | 2009-12-06 | 2011-06-09 | Iscar, Ltd. | Coated Article and Method for Making a Coated Article |
Non-Patent Citations (1)
| Title |
|---|
| 杨修春等编著: "《新型建筑玻璃》", 31 January 2009, article "磁控阴极溅射法", pages: 107-112 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103042753B (en) | 2015-06-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103757597B (en) | A kind of TiN/CrAlSiN nanocomposite laminated coating and preparation method thereof | |
| CN108823526B (en) | Nano multilayer composite superhard cutter coating and preparation method thereof | |
| CN105296949B (en) | A kind of nano-structured coating and preparation method thereof with ultrahigh hardness | |
| CN106086886B (en) | A kind of self-lubricating titanium diboride/diamond-like coating and its preparation method and application | |
| CN101798678B (en) | Novel super-hard TiB2/c-BN nano multi-layer film prepared by magnetron sputtering technique | |
| Ma et al. | Effect of Ti content on the microstructure and mechanical properties of TiAlSiN nanocomposite coatings | |
| CN104928637A (en) | Nanometer composite structure protective coating made from high hardness CrAlSiN and preparation method of nanometer composite structure protective coating | |
| Zhao et al. | Ti/TiN multilayer thin films deposited by pulse biased arc ion plating | |
| Wang et al. | Electrical and mechanical properties of nano-structured TiN coatings deposited by vacuum cold spray | |
| CN110029320B (en) | Magnetron sputtering method for preparing titanium diboride/zirconium dioxide gradient nano-structure film and application thereof | |
| CN104029435B (en) | A kind of NbN/WS with high rigidity and low-friction coefficient 2laminated coating and preparation method thereof | |
| CN106848226A (en) | A kind of anisotropy titanium nitride ceramic film and preparation method thereof | |
| CN109097743A (en) | A kind of superhard W-Cr-Al-Ti-N nanometer gradient multilayer film and preparation method thereof | |
| CN102534493A (en) | V-Al-N hard coating with nano composite structure and preparation method thereof | |
| CN100553964C (en) | The method of a kind of nanometer multilayer membrane material and raising multi-layer film structure high-temperature stability | |
| CN102758201B (en) | Composite coating with anti-corrosion lubricating property of surface of magnesium alloy, preparation method thereof | |
| CN105463391B (en) | A kind of nanocrystalline ZrB2Superhard coating and preparation method | |
| He et al. | The influence of varied modulation ratios on crystallization and mechanical properties of nanoscale TiB2/Al2O3 multilayers | |
| Battu et al. | Nanomechanical characterization of titanium incorporated gallium oxide nanocrystalline thin films | |
| CN103895283A (en) | VC/Ni toughening coating of nanometer multilayer structure and preparation method thereof | |
| Song et al. | The adhesion strength and mechanical properties of SiC films deposited on SiAlON buffer layer by magnetron sputtering | |
| CN110257771A (en) | A kind of c-CrAlSiN hard coat of high Al content and preparation method thereof | |
| Zhao et al. | Deposition of thick TiAlN coatings on 2024 AL/SiCp substrate by arc ion plating | |
| CN103042753B (en) | VC/Co toughening coating layer with nanometer multilayer structure and preparation method thereof | |
| Yang et al. | Manufacture, microstructure and mechanical properties of Mo–W–N nanostructured hard films |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |