CN102956612B - electric fuse structure - Google Patents
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- CN102956612B CN102956612B CN201110249355.0A CN201110249355A CN102956612B CN 102956612 B CN102956612 B CN 102956612B CN 201110249355 A CN201110249355 A CN 201110249355A CN 102956612 B CN102956612 B CN 102956612B
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- fuse
- extension
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- upper strata
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- 239000010410 layer Substances 0.000 claims abstract description 83
- 239000011229 interlayer Substances 0.000 claims abstract description 33
- 230000000875 corresponding Effects 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 7
- 230000000694 effects Effects 0.000 description 7
- 238000007664 blowing Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000003723 Smelting Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000002035 prolonged Effects 0.000 description 1
Abstract
The open a kind of electric fuse structure of the present invention, this electric fuse structure includes upper conductive pattern layer, underlying conductive pattern and interlayer hole conductive layer.This upper conductive pattern layer includes upper strata fuse and upper strata fuse extension；And this underlying conductive pattern includes lower floor's fuse and lower floor's fuse extension, this lower floor's fuse extension is corresponding with this upper strata fuse extension.Additionally, this interlayer hole conductive layer is arranged between this upper strata fuse extension and this lower floor's fuse extension, and it is electrically connected with this upper strata fuse extension and this lower floor's fuse extension.
Description
Technical field
The present invention relates to a kind of electric fuse (electrical fuse, e-fuse) structure, espespecially one can promote electric fuse
The electric fuse structure of breakdown voltage scope (blowing window).
Background technology
Along with microminiaturization and the raising of complexity of semiconductor technology, semiconductor element becomes easier to by various defects
Affected.For example, the inefficacy of single metal connecting line, diode or transistor etc. i.e. may cause the defect of whole chip.
In order to solve the problems referred to above, it is known that technology forms the connecting line of some fusible, namely fuse the most in integrated circuits
(fuse), to guarantee the utilizability of integrated circuit.
It is said that in general, fuse is electrically connected with the redundant circuit (redundancy circuit) in integrated circuit, once
Detection finds when partial circuit is defective, and these connecting lines are i.e. detected the circuit of defect for reparation or replacement.It addition, mesh
Front fuse design may be provided for the function of sequencing (programming elements), so that the merit that client Ke Yi is different
Design can carry out programmed circuit.
On the other hand, in known technology, it has been suggested that provide off condition (open by cut (Laser zip)
Circuit condition) thermo-fuse (thermal fuse), and according to electromigration (electro-migration,
EM) effect provides the electric fuse (e-fuse) of off condition by suitable electric current.In addition the electric fuse in semiconductor element can
E.g. polysilicon electric fuse (poly efuse), mos capacitance antifuse (MOS capacitor anti-fuse), diffusion electricity
Fuse (diffusion fuse), contact plunger electric fuse (contact e-fuse) and the anti-electric fuse of contact plunger
(contact anti-fuse) etc..
Summary of the invention
According to an aspect of the present invention, it is provided that a kind of electric fuse structure.This electric fuse structure includes Upper conductive figure
Case, underlying conductive pattern and interlayer hole conductive layer.This upper conductive pattern layer includes upper strata fuse and extends with upper strata fuse
Portion；And this underlying conductive pattern includes lower floor's fuse and lower floor's fuse extension, this lower floor's fuse extension with on this
Layer fuse extension is corresponding.Extend additionally, this interlayer hole conductive layer is arranged at this upper strata fuse extension with this lower floor's fuse
Between portion, and it is electrically connected with this upper strata fuse extension and this lower floor's fuse extension.
According to electric fuse structure provided by the present invention, utilize this upper strata fuse extension and this lower floor's fuse extension shape
Become and upper strata fuse and the most estranged structure of lower floor's fuse, and the most estranged structure of electron mobility effect can quilt
Amplify.Therefore, electric fuse structure provided by the present invention can use relatively low blowout current (blowing current) to provide disconnected
Travel permit part, i.e. utilizes relatively low blowout current fusing electric fuse structure.In other words, electric fuse structure provided by the present invention is
Utilize the setting of upper strata fuse extension and this lower floor's fuse extension, reach to increase the purpose of blowout current scope.
Accompanying drawing explanation
Fig. 1 illustrates the disconnection mechanism of electric fuse structure.
Fig. 2 is the schematic diagram of the first preferred embodiment of electric fuse structure provided by the present invention, and Fig. 3 is along A-in Fig. 2
The generalized section of A ' tangent line gained, Fig. 4 Yu Fig. 5 is the generalized section in Fig. 2 along B-B ' tangent line gained, and Fig. 6 is then in Fig. 2
Generalized section along the change type of A-A ' tangent line gained.
Fig. 7 is the schematic diagram of the second preferred embodiment of electric fuse structure provided by the present invention, and Fig. 8 is along A in Fig. 71-
A1' generalized section of tangent line gained, and Fig. 9 Yu Figure 10 is generalized section along B-B ' tangent line gained in Fig. 7, Figure 11 is figure
Along A in 71-A1' generalized section of change type of tangent line gained, Figure 12 is then along A in Fig. 72-A2' change of tangent line gained
The generalized section of type.
Description of reference numerals
1 electric fuse structure 2 transistor
10 intraconnections region, fuse region 20
100 electric fuse structure 110 upper conductive pattern layer
112 upper strata fuse 114 upper strata fuse extensions
114a first paragraph 114b the 3rd section
116 negative electrode 118 upper strata fuse extension tail ends
120 underlying conductive pattern 122 lower floor fuse
124 lower floor's fuse extension 124a second segments
The 4th section of 126 anodes of 124b
128 lower floor's fuse extension tail end 130 interlayer hole conductive layers
200 metal interconnecting structure 210 first dielectric layers
212 first metal interconnecting 220 second dielectric layers
222 second metal interconnecting 230 interlayer hole conductive layers
WOLLap width LOLLength of overlapped part
W electric fuse structure width C the first angle
D the second angle
Detailed description of the invention
Typically the disconnection mechanism of electric fuse is as shown in Figure 1: the negative electrode of electric fuse structure 1 and device for fusing (blowing
Device), the drain electrode of such as transistor 2 is electrically connected with.Voltage Vfs, the grid of transistor 2 are applied on the anode of electric fuse structure 1
Pole applies voltage Vg, the drain electrode of transistor 2 applies voltage Vd, the source ground of transistor 2.Electric current (I) is by electric fuse structure 1
Anode flows to the negative electrode of electric fuse structure 1, electron stream (e-) sun of electric fuse structure 1 is then flowed to by the negative electrode of electric fuse structure 1
Pole.The electric current of fusing electric fuse structure 1 has one section of preferred blowout current scope, and when electric current is the lowest, the resistance of gained is too low,
Cause the imperfect electric fuse structure 1 that cannot fuse of electromigration；When electric current is the highest, then can cause electric fuse structure 1 thermal fracture.One
For as, the blowout current scope of the electric fuse structure of 32/28 nanometer (nanometer, nm) technique is between 21.6～30 milliamperes
Training (mA).
Refer to the schematic diagram of the first preferred embodiment that Fig. 2 to Fig. 6, Fig. 2 are electric fuse structure provided by the present invention,
Fig. 3 is the generalized section in Fig. 2 along A-A ' tangent line gained；And Fig. 4 with Fig. 5 is that in Fig. 2, section along B-B ' tangent line gained shows
Being intended to, Fig. 6 is then the generalized section of change type in Fig. 2 along A-A ' tangent line gained.The electric smelting that this preferred embodiment is provided
Silk structure 100 is arranged in substrate, and is preferably arranged in suprabasil metal interconnecting structure.As shown in Figures 2 to 4,
Electric fuse structure 100 includes upper conductive pattern layer 110 and underlying conductive pattern 120.Upper conductive pattern layer 110 includes upper strata and melts
Silk body 112, upper strata fuse extension 114 and negative electrode 116；Underlying conductive pattern 120 then includes lower floor's fuse
122, lower floor's fuse extension 124 and anode 126.As it was previously stated, negative electrode 116 can be electrically connected with device for fusing (not shown),
Anode 126 then can apply voltage Vfs.Upper strata fuse 112 is electrically connected with upper strata fuse extension 114 and negative electrode 116, and
Lower floor's fuse 122 is electrically connected with lower floor's fuse extension 124 and anode 126.Upper strata fuse is originally in the preferred embodiment
Body 112 is identical with the length of lower floor fuse 122, but is not limited to this.It addition, upper strata fuse 112 is prolonged with upper strata fuse
Extending portion 114 has the first angle C, and the first angle C is not equal to 180 degree.Such as, upper strata fuse in the preferred embodiment
112 is 90 degree with the first angle C of upper strata fuse extension 114.In like manner, lower floor's fuse 122 and lower floor's fuse extension
124 have the second angle D, and the second angle D is not equal to 180 degree.Such as, lower floor's fuse 122 in the preferred embodiment
It it is 90 degree with the second angle D of lower floor fuse extension 124.That is upper strata fuse extension 114 is perpendicular to upper strata fuse
112；And lower floor's fuse extension 124 is perpendicular to lower floor's fuse 122, but it is not limited to this.It should be noted that lower floor's fuse
Extension 124 is the most corresponding with upper strata fuse extension 114.
Additionally, as shown in Figures 2 to 4, upper strata fuse extension 114 has upper strata fuse extension tail end 118；Lower floor melts
Silk extension 124 also has lower floor's fuse extension tail end 128.The more important thing is, the electric fuse that this preferred embodiment is provided
Structure 100 includes interlayer hole conductive layer 130, is arranged between upper strata fuse extension 114 and lower floor's fuse extension 124, especially
It is upper strata fuse extension tail end 118 and lower floor's fuse extension tail end 128, is for electrically connecting to upper strata fuse extension
114 with lower floor's fuse extension 124.
As it was previously stated, the electric fuse structure 100 that this preferred embodiment is provided is arranged in metal interconnecting structure 200.
For example, electric fuse structure 100 is arranged in the fuse region 10 of metal interconnecting structure 200, and metal interconnecting structure
200 also include intraconnections region 20 (being only illustrated in Fig. 4), and intraconnections region 20 includes multiple metal interconnecting.Such as Fig. 4 institute
Showing, metal interconnecting structure 200 includes at least one first dielectric layer 210 and the second dielectric layer 220, underlying conductive pattern 120
Being arranged in the first dielectric layer 210, upper conductive pattern layer 110 and interlayer hole conductive layer 130 are then arranged at the second dielectric layer 220
In.Additionally, metal interconnecting structure 200 also includes at least the first metal interconnecting 212 and the second metal interconnecting 222, respectively
In being arranged at the first dielectric layer 210 and in the second dielectric layer 220, and optionally through being arranged in the second dielectric layer 220
Interlayer hole conductive layer 230 be electrically connected with.
As shown in Figure 4, upper conductive pattern layer 110 (includes that negative electrode 116, upper strata fuse 112 and upper strata fuse extend
Portion 114) can complete to make by same technique with the second metal interconnecting 222, and copline；In like manner underlying conductive pattern 120
(including anode 126, lower floor's fuse 122 and lower floor's fuse extension 124) can be with the first metal interconnecting 212 by same
One technique completes to make, and copline.It is noted that first dielectric layer the 210, second dielectric described in this preferred embodiment
Layer the 220, first metal interconnecting 212 and the second metal interconnecting 222 are only to illustrate its upper and lower relativeness, not use
It is actually formed position limiting these film layers suprabasil.In other words, the electric fuse structure that this preferred embodiment is provided
100 can make with a double layer of metal intraconnections of appointing for metal interconnecting structure 200 simultaneously, and respectively at upper strata metal interconnecting and
Lower metal intraconnections copline.In addition the upper conductive pattern layer 110 of this preferred embodiment sets respectively with underlying conductive pattern 120
Within being placed in the second dielectric layer 220 and the first dielectric layer 210, and corresponding upper strata fuse extension 114 prolongs with lower floor fuse
Extending portion 124 entirely overlaps each other and does not contacts, and is electrically completely cut off by the second dielectric layer 220.Upper strata fuse extension 114 with under
Layer fuse extension 124 is only by the interlayer corresponding to upper strata fuse extension tail end 118 with lower floor's fuse extension tail end 128
Hole conductive layer 130 is electrically connected with, and the critical dimension of interlayer hole conductive layer 130 (critical dimension, CD) can be equal to
Or the width W less than upper strata fuse extension 114 with the lap of lower floor's fuse extension 124OL。
Refer to Fig. 6.Although it addition, the upper strata fuse extension 114 that provided of this preferred embodiment and lower floor fuse prolong
Extending portion 124 is corresponding and completely overlapped structure as shown in Figures 2 to 5, but also can as shown in Figure 6, upper strata fuse extension
114 with lower floor's fuse extension 124 can be do not affect interlayer hole conductive layer 130 make on the premise of formed non-fully
Overlay structure.For example, the width of upper strata fuse extension 114 can be equal to or more than the width W of lapOL, and lower floor
The width of fuse extension 124 can also be equal to or more than the width W of lapOL.It addition, upper strata fuse extension 114 or
The nonoverlapping part of lower floor's fuse extension 124 as shown in Figure 6, can protrude from the arbitrary long limit of lap, even protrudes from
Two long limits of lap.
The most again refering to Fig. 2.Upper strata fuse extension 114 preferably can surpass with the development length of lower floor fuse extension 124
Cross the half of electric fuse structure 100 width W, but be not limited to this.Owing to the fusing position of electric fuse structure 100 is designed not according to structure
With being become, therefore, this preferred embodiment provides the upper strata fuse extension 114 being perpendicular to upper strata fuse 112 and is perpendicular to
Lower floor's fuse extension 124 of lower floor's fuse 122 is to form the most estranged environment, and interlayer hole conductive layer 130 is electrical
It is connected to upper strata fuse extension tail end 118 and lower floor's fuse extension tail end 128.Owing to electron mobility effect is the most estranged
Environment in can be exaggerated, therefore in the fusing technique (blowing process) of electric fuse structure that carries out fusing, this
The electric fuse structure that preferred embodiment is provided can use relatively low blowout current to provide off condition, i.e. utilizes relatively low fusing
Current fusing electric fuse structure 100.
Refer to Fig. 2 and Fig. 5.It is otherwise noted that due to upper strata fuse extension 114 and lower floor's fuse extension
124 constitute the most estranged structure, and the electric fuse structure 100 that therefore this preferred embodiment is provided can ensure that its electromigration effect
Initial void occur in interlayer hole conductive layer 130, and gradually nucleation, the most finally interlayer hole conductive layer 130 is formed such as Fig. 5
Shown striking point (blowing point) 132, striking point 132 electrically isolates upper conductive pattern layer 110 and underlying conductive pattern
120 and cause circuit to be fully disconnected (circuit dead opening).Briefly, the electric smelting that this preferred embodiment is provided
Silk structure 100 can ensure that fusing position occurs in interlayer hole conductive layer 130, and when electric fuse structure 100 is provided for journey
When sequence (programming elements) function or memory function, occur in the fusing position of interlayer hole conductive layer 130
It is difficult to know, therefore the safety (security) of data can be promoted.
Refer to the signal of the second preferred embodiment that Fig. 7 to Figure 12, Fig. 7 are electric fuse structure provided by the present invention
Figure, Fig. 8 is along A in Fig. 71-A1' generalized section of tangent line gained, and Fig. 9 with Figure 10 is cuing open along B-B ' tangent line gained in Fig. 7
Face schematic diagram, Figure 11 is along A in Fig. 71-A1' generalized section of change type of tangent line gained, Figure 12 is then along A in Fig. 72-
A2' generalized section of change type of tangent line gained.First it is noted that the second preferred embodiment is preferable to carry out with first
The element that example is identical, with identical symbol description.Additionally, the electric fuse structure that the second preferred embodiment is provided connects in metal
The relativeness of line structure is identical with the first preferred embodiment, therefore repeats no more in this.The electric smelting that this preferred embodiment is provided
Silk structure 100 is arranged in substrate, and is preferably arranged in suprabasil metal interconnecting structure.As shown in Fig. 7 to Figure 12,
Electric fuse structure 100 includes upper conductive pattern layer 110 and underlying conductive pattern 120.Upper conductive pattern layer 110 includes upper strata and melts
Silk body 112, upper strata fuse extension 114 and negative electrode 116；And underlying conductive pattern 120 also includes lower floor's fuse
122, lower floor's fuse extension 124 and anode 126.As it was previously stated, negative electrode 116 can be with electrically the connecting of device for fusing (not shown)
Connecing, anode 126 then can apply voltage Vfs.Upper strata fuse 112 is electrically connected with upper strata fuse extension 114 and negative electrode
116, and lower floor's fuse 122 is electrically connected with lower floor's fuse extension 124 and anode 126.Upper strata in the preferred embodiment
Fuse 112 is identical with the length of lower floor fuse 122, but is not limited to this.
It should be noted that in the preferred embodiment, upper strata fuse extension 114 has first paragraph 114a and the 3rd section
114b, and as it is shown in fig. 7, the first paragraph 114a of upper strata fuse extension 114 is perpendicular to upper strata fuse 112, and the 3rd section
114b is perpendicular to first paragraph 114a the most again, and is electrically connected with first paragraph 114a.In other words, the of upper strata fuse extension 114
One section of 114a is perpendicular to upper strata fuse 112 parallel to each other and the 3rd section of 114b.Additionally, upper strata fuse extension 114
3rd section of 114b includes upper strata fuse extension tail end 118.Lower floor's fuse extension 124 is with upper strata fuse extension 114 such as
Shown in Fig. 7 to Fig. 9 corresponding, therefore lower floor's fuse extension 124 has second segment 124a and the 4th section of 124b, and such as Fig. 7 institute
Showing, the second segment 124a of lower floor's fuse extension 124 is perpendicular to lower floor's fuse 122, and the 4th section of 124b is perpendicular to the most again
Second segment 124a, and it is electrically connected with second segment 124a.In other words, the second segment 124a of lower floor's fuse extension 124 is perpendicular to
Lower floor's fuse 122 parallel to each other and the 4th section of 124b.Additionally, the 4th of lower floor's fuse extension 124 the section of 124b includes
There is lower floor's fuse extension tail end 128.The more important thing is, the electric fuse structure 100 that this preferred embodiment is provided includes interlayer
Hole conductive layer 130, is arranged between upper strata fuse extension 114 and lower floor's fuse extension 124, and especially upper strata fuse extends
Portion's tail end 118 and lower floor's fuse extension tail end 128, be for electrically connecting to upper strata fuse extension 114 and lower floor's fuse extension
Portion 124.
As it was previously stated, the electric fuse structure that this preferred embodiment is provided is arranged in aforementioned metal internal connection-wire structure 200,
And can with metal interconnecting structure 200 appoint a double layer of metal internal connecting layer make simultaneously, and respectively at upper strata metal interconnecting with
And lower metal intraconnections copline.In addition this preferred embodiment conductive pattern 110 at the middle and upper levels is with underlying conductive pattern 120 respectively
It is arranged in different dielectric layers, and corresponding upper strata fuse extension 114 is the heaviest with lower floor fuse extension 124
Folding and do not contact, and electrically being completely cut off by the second dielectric layer 220, upper strata fuse extension 114 is with lower floor's fuse extension 124 only
By electrically connecting corresponding to the interlayer hole conductive layer 130 of upper strata fuse extension tail end 118 with lower floor fuse extension tail end 128
Connect.As it was previously stated, the critical dimension of interlayer hole conductive layer 130 can be equal to or less than upper strata fuse extension 114 and lower floor's fuse
The lap width W of extension 124OL.The first paragraph 114a of upper strata fuse extension 114 and the 3rd section of 114b and upper strata fuse
Body 112, negative electrode 116 copline；The second segment 124a of lower floor's fuse extension 124 and the 4th section of 124b and lower floor's fuse
122, anode 126 copline.
Refer to Figure 11 and Figure 12.Although it addition, the upper strata fuse extension 114 that provided of this preferred embodiment and lower floor
Fuse extension 124 is corresponding and completely overlapped structure as shown in Figure 7 to 10, but also can as shown in Figure 11 Yu Figure 12,
Upper strata fuse extension 114 and lower floor's fuse extension 124 can be on the premise of not affecting interlayer hole conductive layer 130 making
The non-fully overlay structure formed.For example, as shown in figure 11, the length of the 3rd section of 114b of upper strata fuse extension 114
Degree can be equal to or more than length L of lapOL, and the length of the 4th of lower floor's fuse extension 124 the section of 124b can also wait
In or more than length L of lapOL.The most as shown in figure 12, the width of the first paragraph 114a of upper strata fuse extension 114 can
Width W equal to or more than lapOL, and the width of the second segment 124a of lower floor's fuse extension 124 can also equal to or
Width W more than lapOL.It addition, upper strata fuse extension 114 first paragraph 114a or lower floor's fuse extension 124 second
The section nonoverlapping part of 124a as shown in figure 12, can protrude from the arbitrary long limit of lap, even protrudes from lap
Two long limits.
The most again refering to Fig. 7.The first paragraph 114a of upper strata fuse extension 114 and the second of lower floor's fuse extension 124
The development length of section 124a preferably can exceed the half of electric fuse structure 100 width W, but is not limited to this.Although being originally preferable to carry out
In example, the bearing of trend of the 3rd section of 114b and the 4th section of 124b is towards negative electrode 116 so that upper strata fuse extension tail end 118 with under
Layer fuse extension tail end 128 is partial to negative electrode 116, but the bearing of trend of the 3rd section of 114b and the 4th section of 124b also can be according to product institute
Need to be towards anode 126 so that upper strata fuse extension tail end 118 and lower floor's fuse extension tail end 128 are partial to anode 126.Value
Obtain it is noted that owing to the fusing position of electric fuse structure 100 is become according to structure design difference, therefore, this preferred embodiment carries
Supply the upper strata fuse extension 114 including first paragraph 114a and the 3rd section of 114b and include second segment 124a's and the 4th section of 124b
Lower floor's fuse extension 124 provides estranged environment, and interlayer hole conductive layer 130 is electrically connected at upper strata fuse extension tail end
118 with lower floor's fuse extension tail end 128.As mentioned previously, because electron mobility effect can be put in the most estranged environment
Greatly, so in the fusing technique of electric fuse structure that carries out fusing, the electric fuse structure 100 that this preferred embodiment is provided
Relatively low blowout current can be used to provide off condition, i.e. utilize relatively low blowout current fusing electric fuse structure 100.Citing comes
Saying, the blowout current scope of the electric fuse structure 100 that this preferred embodiment is provided is between 17～30mA.In other words, this is excellent
The electric fuse structure 100 selecting embodiment to be provided has bigger blowout current scope.
Refer to Fig. 7 and Figure 10.It is otherwise noted that due to upper strata fuse extension 114 and lower floor's fuse extension
Portion 124 provides estranged environment, and the electric fuse structure 100 that therefore this preferred embodiment is provided can ensure that its electromigration effect
Initial void occur in interlayer hole conductive layer 130, and gradually nucleation, the most finally interlayer hole conductive layer 130 is formed such as figure
Striking point 132 shown in 10, striking point 132 electrically isolates upper conductive pattern layer 110 and underlying conductive pattern 120 and causes circuit
It is fully disconnected.Briefly, the electric fuse structure 100 that this preferred embodiment is provided can ensure that fusing position occurs at interlayer hole
In conductive layer 130, and when electric fuse structure 100 is provided for programmed functions or memory function, occur at interlayer hole
The fusing position of conductive layer 130 is difficult to know, therefore can promote the safety of data.
In sum according to electric fuse structure provided by the present invention, utilize this upper strata fuse extension and this lower floor's fuse
Extension forms the structure the most estranged with upper strata fuse and lower floor's fuse, and electron mobility effect is the most estranged
Structure can be exaggerated.Therefore, electric fuse structure provided by the present invention can use relatively low blowout current to provide off condition, i.e.
Fusing electric fuse structure.In other words, electric fuse structure provided by the present invention is to utilize upper strata fuse extension and this lower floor
The setting of fuse extension, reaches to increase the purpose of blowout current scope.And owing to blowout current scope increases, the present invention is carried
The electric fuse structure of confession is more beneficial for the micro of element.Additionally, electric fuse structure provided by the present invention more can ensure that fusing position
Put and occur in interlayer hole conductive layer, and when electric fuse structure is provided for programmed functions or memory function, occur
It is difficult to know in the fusing position of interlayer hole conductive layer, therefore the safety of data can be promoted.
The foregoing is only the preferred embodiments of the present invention, all equivalent variations done according to the claims in the present invention with repair
Decorations, all should belong to the covering scope of the present invention.
Claims (22)
1. an electric fuse structure, includes:
Upper conductive pattern layer, includes upper strata fuse and upper strata fuse extension；
Underlying conductive pattern, includes lower floor's fuse and lower floor's fuse extension, this lower floor's fuse extension and this upper strata
Fuse extension is corresponding；And
Interlayer hole conductive layer, is arranged between this upper strata fuse extension and this lower floor's fuse extension, and is electrically connected with on this
Layer fuse extension and this lower floor's fuse extension, wherein this upper strata fuse extension and this lower floor's fuse extension from this Jie
Layer conductive layer junction, hole extends toward equidirectional.
2. electric fuse structure as claimed in claim 1, wherein this upper conductive pattern layer includes respectively with this underlying conductive pattern
Negative electrode and anode.
3. electric fuse structure as claimed in claim 2, wherein this upper strata fuse be electrically connected with upper strata fuse extension with
This negative electrode, and this lower floor's fuse is electrically connected with this lower floor's fuse extension and this anode.
4. electric fuse structure as claimed in claim 1, wherein this upper strata fuse and this upper strata fuse extension copline,
This lower floor's fuse and this lower floor's fuse extension copline.
5. electric fuse structure as claimed in claim 4, also includes the first dielectric layer and the second dielectric layer, this underlying conductive pattern
Being arranged in this first dielectric layer, this upper conductive pattern layer and this interlayer hole conductive layer are arranged in this second dielectric layer.
6. electric fuse structure as claimed in claim 5, connects in also including the first metal interconnecting stacked mutually and the second metal
Line, in being respectively arranged at this first dielectric layer and in this second dielectric layer.
7. electric fuse structure as claimed in claim 6, wherein this first metal interconnecting and this underlying conductive pattern copline,
This second metal interconnecting and this upper conductive pattern layer copline.
8. electric fuse structure as claimed in claim 1, wherein this upper strata fuse extension is relative with this lower floor's fuse extension
Answer but do not contact.
9. electric fuse structure as claimed in claim 8, wherein this upper strata fuse extension is with this lower floor's fuse extension at least
Partly overlap.
10. electric fuse structure as claimed in claim 1, wherein this upper strata fuse and this upper strata fuse extension have the
One angle, and this first angle is not equal to 180 degree, this lower floor's fuse and this lower floor's fuse extension have the second angle,
And this second angle is not equal to 180 degree.
11. electric fuse structures as claimed in claim 1, wherein this upper strata fuse extension includes upper strata fuse extension tail
End, this lower floor's fuse extension includes lower floor's fuse extension tail end.
12. electric fuse structures as claimed in claim 11, wherein this upper strata fuse extension tail end is electrically connected with this interlayer hole
Conductive layer, this lower floor's fuse extension tail end is electrically connected with this interlayer hole conductive layer.
13. electric fuse structures as claimed in claim 11, wherein this upper strata fuse extension includes at least one first paragraph, and should
First paragraph is perpendicular to this upper strata fuse, and this lower floor's fuse extension includes at least one second segment, and this second segment is perpendicular to
This lower floor's fuse.
14. electric fuse structures as claimed in claim 13, wherein first paragraph includes this upper strata fuse extension tail end, and this is second years old
Section includes this lower floor's fuse extension tail end.
15. electric fuse structures as claimed in claim 13, this upper strata fuse extension also includes the 3rd section, and this lower floor's fuse prolongs
Extending portion also includes the 4th section, and the 3rd section is electrically connected with this first paragraph, and the 4th section is electrically connected with this second segment.
16. electric fuse structures as claimed in claim 15, wherein the 3rd section is perpendicular to this first paragraph, and the 4th section vertical
In this second segment.
17. electric fuse structures as claimed in claim 16, wherein the 3rd section with this first paragraph copline, the 4th section with should
Second segment copline.
18. electric fuse structures as claimed in claim 15, wherein the 3rd section includes this upper strata fuse extension tail end, the 4th
Section includes this lower floor's fuse extension tail end.
19. electric fuse structures as claimed in claim 15, wherein this first paragraph is corresponding with this second segment but do not contact, and this is years old
Three sections corresponding with the 4th section but do not contact.
20. electric fuse structures as claimed in claim 19, wherein this first paragraph is least partially overlapped with this second segment, and the 3rd
Section is least partially overlapped with the 4th section.
21. electric fuse structures as claimed in claim 1, also include striking point, and this striking point is formed at this after fusing technique
In interlayer hole conductive layer.
22. electric fuse structures as claimed in claim 21, wherein this striking point electrically isolate this upper conductive pattern layer with this under
Layer conductive pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110249355.0A CN102956612B (en) | 2011-08-26 | electric fuse structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110249355.0A CN102956612B (en) | 2011-08-26 | electric fuse structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102956612A CN102956612A (en) | 2013-03-06 |
| CN102956612B true CN102956612B (en) | 2016-12-14 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101086983A (en) * | 2006-06-06 | 2007-12-12 | 恩益禧电子股份有限公司 | Semiconductor device and method for determining fuse state |
| CN101728359A (en) * | 2008-10-17 | 2010-06-09 | 恩益禧电子股份有限公司 | Semiconductor device |
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101086983A (en) * | 2006-06-06 | 2007-12-12 | 恩益禧电子股份有限公司 | Semiconductor device and method for determining fuse state |
| CN101728359A (en) * | 2008-10-17 | 2010-06-09 | 恩益禧电子股份有限公司 | Semiconductor device |
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