CN102944494A - Measuring device for ultraviolet enhancing pollution materials - Google Patents
Measuring device for ultraviolet enhancing pollution materials Download PDFInfo
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- CN102944494A CN102944494A CN2012104910543A CN201210491054A CN102944494A CN 102944494 A CN102944494 A CN 102944494A CN 2012104910543 A CN2012104910543 A CN 2012104910543A CN 201210491054 A CN201210491054 A CN 201210491054A CN 102944494 A CN102944494 A CN 102944494A
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Abstract
The invention discloses a measuring device for ultraviolet enhancing pollution materials, and belongs to the technical field of space application. The measuring device comprises a liquid nitrogen tank, a liquid nitrogen condensation layer, a vacuum ultraviolet lamp, a sample stage, a quartz-crystal microbalance, a high vacuum gate valve, a molecular pump, a mechanical pump and a vacuum chamber. By combining vacuum ultraviolet and vacuum pollution equipment, the device simulates the polluting effect of the materials according to a space ultraviolet radiation effect, and a space environment effect can be effectively simulated.
Description
Technical field
The present invention relates to a kind of ultraviolet and strengthen the contaminated materials measurement mechanism, belong to technical field of space application.
Background technology
In the spacecraft operational process, material can decomposite little molecule and forms and pollute cloud and be centered around around the spacecraft on it, and may be condensed in the surface of spacecraft.Part sensing surface (such as optical lens, temperature-sensitive surface etc.) can be subject to the impact of this little molecular contamination.For fear of the impact of this pollution on spacecraft, the researchist uses ground experiment that material is monitored screening.But, also have various environmental effects in the space, such as ultraviolet, elemental oxygen etc., and existing ground experiment is only polluting effect and this single effect of temperature to be contacted, not in conjunction with multiple steric effect.Therefore stable in the urgent need to developing, be suitable for testing ultraviolet reliably and strengthen the method for polluting.
Summary of the invention
The object of the present invention is to provide a kind of ultraviolet to strengthen the contaminated materials measurement mechanism, described device adopts vacuum ultraviolet to combine with vacuum pollution equipment, provide the device in conjunction with the simulation material polluting effect of space ultraviolet radiation effect, well the space environmental simulation effect.
Purpose of the present invention is realized by following technical scheme:
A kind of ultraviolet strengthens the contaminated materials measurement mechanism, and described device comprises: liquid nitrogen bottle, liquid nitrogen condensation layer, vacuum UV lamp, sample stage, quartz crystal microbalance (QCM), high vacuum push-pull valve, molecular pump, mechanical pump and vacuum chamber;
Wherein, the liquid nitrogen condensation layer is coated on outside the vacuum chamber, and liquid nitrogen bottle links to each other with the liquid nitrogen condensation layer, and mechanical pump links to each other with molecular pump by valve, and molecular pump links to each other with vacuum chamber, and mechanical pump also directly links to each other with vacuum chamber by valve; Quartz crystal microbalance places in the vacuum chamber, vacuum UV lamp is installed on the vacuum chamber sidewall, vacuum UV lamp and quartz crystal microbalance are in the same level height, guarantee that vacuum UV lamp can the direct projection quartz crystal microbalance, the distance of quartz crystal microbalance and vacuum UV lamp is 300mm; Sample stage is installed on the vacuum chamber sidewall, and an end that stretches into vacuum chamber has through hole, and sample stage contains heating arrangement;
Described vacuum UV lamp is the ultraviolet source of 10～200nm for wavelength is provided.
A kind of measuring method that adopts described ultraviolet to strengthen the contaminated materials measurement mechanism, step is as follows:
(1) sample is put into sample stage, open mechanical pump, open the high vacuum push-pull valve, vacuum chamber is vacuumized;
(2) treat that vacuum degree in vacuum chamber reaches 1 * 10
-1Behind the Pa, open molecular pump, continue vacuum chamber is vacuumized;
(3) treat that vacuum degree in vacuum chamber reaches 3 * 10
-3Behind the Pa, open the heating arrangement of sample stage, open vacuum UV lamp;
(4) after the temperature of sample stage reaches 50 ℃～150 ℃, use liquid nitrogen bottle that condensate layer is passed into liquid nitrogen, vacuum chamber is carried out condensation; Quartz crystal microbalance is started working, and makes quartz crystal microbalance remain on 25 ℃, reads the registration of quartz crystal microbalance after the beginning condensation between 6～48h, i.e. the difference on the frequency of described balance crystal;
(5) after reading finishes, close the sample stage heating arrangement, close vacuum UV lamp;
(6) close the high vacuum push-pull valve, the closure molecule pump cuts out mechanical pump;
Namely obtain the effect of the actual enhancing of material outgassing pollution under the ultraviolet irradiation by above step;
Described sample is nonmetallic materials;
The heating-up temperature of the described sample stage of step (4) is preferably 125 ℃; After reading duration is preferably and begins condensation 24h.
Principle is as follows:
The material sample little molecule of under heat effect, overflowing, be and pollute little molecule, after polluting the through hole of little molecule by sample stage and entering vacuum chamber, condense at quartz crystal microbalance, by vacuum UV lamp quartz crystal microbalance is carried out irradiation simultaneously, can obtain the effect of the actual enhancing of material outgassing pollution under the ultraviolet irradiation.
Beneficial effect
(1) device of the present invention adopts vacuum ultraviolet to combine with vacuum pollution equipment, and the device in conjunction with the simulation material polluting effect of space ultraviolet radiation effect is provided.
(2) optical band that provides of the vacuum UV lamp in the device of the present invention is 10～200nm, does not comprise the visible light and the infrared band that produce heat, has simulated better the actual light source under the space environment.
(3) device of the present invention is at the partial design temperature control QCM that condenses, further controlled adiabatic condensation temperature, to make QCM remain on 25 ℃ (spacecraft common temperatures) in the process of the test, be used for condensing the pollution molecule, molecule is polluted in the Simulated Spacecraft surface condensation better, has solved the problem that can't obtain to coagulate volatile matter behind the ultraviolet irradiation because of temperature problem.
(4) the liquid nitrogen condensation layer in the device of the present invention can adhere to unnecessary pollution molecule, has avoided the unnecessary little molecular contaminants of part to suffer the error that causes after the reflection of vacuum chamber inwall.
Description of drawings
The structural representation of Fig. 1 device of the present invention;
Wherein, 1-liquid nitrogen bottle, 2-liquid nitrogen condensation layer, 3-vacuum UV lamp, 4-sample stage, 5-quartz crystal microbalance, 6-high vacuum push-pull valve, 7-molecular pump, 8-mechanical pump, 9-vacuum chamber.
Embodiment
Below in conjunction with the drawings and specific embodiments in detail the present invention is described in detail, but is not limited to this.
Embodiment 1
As shown in Figure 1, a kind of ultraviolet strengthens the contaminated materials measurement mechanism, and described device comprises: liquid nitrogen bottle 1, liquid nitrogen condensation layer 2, vacuum UV lamp 3, sample stage 4, quartz crystal microbalance 5(QCM), high vacuum push-pull valve 6, molecular pump 7, mechanical pump 8 and vacuum chamber 9;
Wherein, liquid nitrogen condensation layer 2 is coated on outside the vacuum chamber 9, and liquid nitrogen bottle 1 links to each other with liquid nitrogen condensation layer 2, and mechanical pump 8 links to each other with molecular pump 7 by valve, and molecular pump 7 links to each other with vacuum chamber 9, and mechanical pump 8 also directly links to each other with vacuum chamber 9 by valve; Quartz crystal microbalance 5 places in the vacuum chamber 9, vacuum UV lamp 3 is installed on vacuum chamber 9 sidewalls, vacuum UV lamp 3 is in the same level height with quartz crystal microbalance 5, guarantee that vacuum UV lamp 3 can direct projection quartz crystal microbalance 5, quartz crystal microbalance 5 is 300mm with the distance of vacuum UV lamp 3; Sample stage 4 is installed on vacuum chamber 9 sidewalls, and an end that stretches into vacuum chamber 9 has through hole, and sample stage 4 contains heating arrangement;
Described vacuum UV lamp 3 is the ultraviolet source of 10～200nm for wavelength is provided.
A kind of measuring method that adopts described ultraviolet to strengthen the contaminated materials measurement mechanism, step is as follows:
(1) sample is put into sample stage 4, opened mechanical pump 8, open high vacuum push-pull valve 6, vacuum chamber 9 is vacuumized;
(2) treat that vacuum chamber 9 vacuum tightnesss reach 1 * 10
-1Behind the Pa, open molecular pump 7, continue vacuum chamber 9 is vacuumized;
(3) treat that vacuum chamber 9 vacuum tightnesss reach 3 * 10
-3Behind the Pa, open the heating arrangement of sample stage 4, open vacuum UV lamp 3;
(4) after the temperature of sample stage 4 reaches 125 ℃, use 1 pair of condensate layer of liquid nitrogen bottle to pass into liquid nitrogen, vacuum chamber 9 is carried out condensation; Quartz crystal microbalance 5 is started working, and makes quartz crystal microbalance 5 remain on 25 ℃, reads the registration of quartz crystal microbalance 5 behind the condensation 24h, i.e. the difference on the frequency of described balance crystal;
(5) after reading finishes, close sample stage 4 heating arrangements, close vacuum UV lamp 3;
(6) close high vacuum push-pull valve 6, closure molecule pump 7 cuts out mechanical pump 8;
Namely obtain the effect of the actual enhancing of material outgassing pollution under the ultraviolet irradiation by above step;
Described sample is nonmetallic materials;
Principle is as follows:
The material sample little molecule of under heat effect, overflowing, be and pollute little molecule, after polluting the through hole of little molecule by sample stage 4 and entering vacuum chamber 9, condense at quartz crystal microbalance 5, carry out irradiation by 3 pairs of quartz crystal microbalances of vacuum UV lamp 5 simultaneously, can obtain the effect of the actual enhancing of material outgassing pollution under the ultraviolet irradiation.
The present invention includes but be not limited to above embodiment, every any being equal to of carrying out under the principle of spirit of the present invention, replace or local improvement, all will be considered as within protection scope of the present invention.
Claims (6)
1. a ultraviolet strengthens the contaminated materials measurement mechanism, and it is characterized in that: described device comprises: liquid nitrogen bottle (1), liquid nitrogen condensation layer (2), vacuum UV lamp (3), sample stage (4), quartz crystal microbalance (5), high vacuum push-pull valve (6), molecular pump (7), mechanical pump (8) and vacuum chamber (9);
Wherein, liquid nitrogen condensation layer (2) is coated on outside the vacuum chamber (9), liquid nitrogen bottle (1) links to each other with liquid nitrogen condensation layer (2), mechanical pump (8) links to each other with molecular pump (7) by valve, molecular pump (7) links to each other with vacuum chamber (9), and mechanical pump (8) also directly links to each other with vacuum chamber (9) by valve; Quartz crystal microbalance (5) places in the vacuum chamber (9), vacuum UV lamp (3) is installed on vacuum chamber (9) sidewall, vacuum UV lamp (3) is in the same level height with quartz crystal microbalance (5), guarantee that vacuum UV lamp (3) can direct projection quartz crystal microbalance (5), quartz crystal microbalance (5) is 300mm with the distance of vacuum UV lamp (3); Sample stage (4) is installed on vacuum chamber (9) sidewall, and an end that stretches into vacuum chamber (9) has through hole, and sample stage (4) contains heating arrangement.
2. a kind of ultraviolet according to claim 1 strengthens the contaminated materials measurement mechanism, and it is characterized in that: described vacuum UV lamp (3) is the ultraviolet source of 10～200nm for wavelength is provided.
3. measuring method that adopts the described ultraviolet of claim 1 to strengthen the contaminated materials measurement mechanism, it is characterized in that: described method step is as follows:
(1) sample is put into sample stage (4), opened mechanical pump (8), open high vacuum push-pull valve (6), vacuum chamber (9) is vacuumized;
(2) treat that vacuum chamber (9) vacuum tightness reaches 1 * 10
-1Behind the Pa, open molecular pump (7), continue vacuum chamber (9) is vacuumized;
(3) treat that vacuum chamber (9) vacuum tightness reaches 3 * 10
-3Behind the Pa, open the heating arrangement of sample stage (4), open vacuum UV lamp (3);
(4) after the temperature of sample stage (4) reaches 50 ℃～150 ℃, use liquid nitrogen bottle (1) that condensate layer is passed into liquid nitrogen, vacuum chamber (9) is carried out condensation; Quartz crystal microbalance (5) is started working, and makes quartz crystal microbalance (5) remain on 25 ℃, reads the registration of quartz crystal microbalance (5) after the beginning condensation between 6～48h, i.e. the difference on the frequency of described balance crystal;
(5) after reading finishes, close sample stage (4) heating arrangement, close vacuum UV lamp (3);
(6) close high vacuum push-pull valve (6), closure molecule pump (7) cuts out mechanical pump (8);
Namely obtain the effect of the actual enhancing of material outgassing pollution under the ultraviolet irradiation by above step.
4. employing ultraviolet according to claim 3 strengthens the measuring method of contaminated materials measurement mechanism, and it is characterized in that: the described sample of step (1) is nonmetallic materials.
5. employing ultraviolet according to claim 3 strengthens the measuring method of contaminated materials measurement mechanism, and it is characterized in that: the heating-up temperature of the described sample stage of step (4) (4) is 125 ℃.
6. employing ultraviolet according to claim 3 strengthens the measuring method of contaminated materials measurement mechanism, it is characterized in that: the described reading duration of step (4) is for after beginning condensation 24h.
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103674792A (en) * | 2013-12-03 | 2014-03-26 | 上海卫星装备研究所 | Method for testing influence of space charged particle irradiation on molecular contamination effect |
| CN103698245A (en) * | 2013-12-02 | 2014-04-02 | 上海卫星装备研究所 | Ectopic device for detecting gas outlet pollution of spacecraft material and operation method thereof |
| CN103940741A (en) * | 2014-04-17 | 2014-07-23 | 清华大学 | Aerospace material deep space environment ultraviolet irradiation experiment simulation device and method |
| CN104215542A (en) * | 2014-09-18 | 2014-12-17 | 北京卫星环境工程研究所 | Test method for pollution and ultraviolet radiation synergistic effect of solar battery |
| CN109916950A (en) * | 2019-04-01 | 2019-06-21 | 南京理工大学 | A kind of temperature control performance assessment device of heat sink material |
| CN110926762A (en) * | 2019-11-22 | 2020-03-27 | 国网浙江省电力有限公司电力科学研究院 | System and method for detecting out-of-band inhibition capability of ultraviolet imager |
| CN114112774A (en) * | 2021-11-16 | 2022-03-01 | 哈尔滨工业大学 | Device and method for analyzing and testing adsorption and desorption performances of molecular pollutants |
| CN117191959A (en) * | 2023-08-03 | 2023-12-08 | 哈尔滨工业大学 | Pollutant release and adsorption device and method in simulated space environment |
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| CN101876612A (en) * | 2009-12-17 | 2010-11-03 | 中国航天科技集团公司第五研究院第五一○研究所 | In-situ monitoring method for outgasing contamination of nonmetallic materials on optical surface of spacecraft |
| CN102507424A (en) * | 2011-10-20 | 2012-06-20 | 中国航天科技集团公司第五研究院第五一〇研究所 | Ultraviolet irradiation reinforced pollution testing method |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103698245A (en) * | 2013-12-02 | 2014-04-02 | 上海卫星装备研究所 | Ectopic device for detecting gas outlet pollution of spacecraft material and operation method thereof |
| CN103674792A (en) * | 2013-12-03 | 2014-03-26 | 上海卫星装备研究所 | Method for testing influence of space charged particle irradiation on molecular contamination effect |
| CN103674792B (en) * | 2013-12-03 | 2015-09-23 | 上海卫星装备研究所 | Space charged particle irradiation is to the test method of molecular contamination effects |
| CN103940741A (en) * | 2014-04-17 | 2014-07-23 | 清华大学 | Aerospace material deep space environment ultraviolet irradiation experiment simulation device and method |
| CN104215542A (en) * | 2014-09-18 | 2014-12-17 | 北京卫星环境工程研究所 | Test method for pollution and ultraviolet radiation synergistic effect of solar battery |
| CN109916950A (en) * | 2019-04-01 | 2019-06-21 | 南京理工大学 | A kind of temperature control performance assessment device of heat sink material |
| CN110926762A (en) * | 2019-11-22 | 2020-03-27 | 国网浙江省电力有限公司电力科学研究院 | System and method for detecting out-of-band inhibition capability of ultraviolet imager |
| CN110926762B (en) * | 2019-11-22 | 2021-08-27 | 国网浙江省电力有限公司电力科学研究院 | System and method for detecting out-of-band inhibition capability of ultraviolet imager |
| CN114112774A (en) * | 2021-11-16 | 2022-03-01 | 哈尔滨工业大学 | Device and method for analyzing and testing adsorption and desorption performances of molecular pollutants |
| CN117191959A (en) * | 2023-08-03 | 2023-12-08 | 哈尔滨工业大学 | Pollutant release and adsorption device and method in simulated space environment |
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Application publication date: 20130227 |