CN102928900B - Warping-resistant optical thin film, preparation method thereof and display device using optical thin film - Google Patents
Warping-resistant optical thin film, preparation method thereof and display device using optical thin film Download PDFInfo
- Publication number
- CN102928900B CN102928900B CN201210400625.8A CN201210400625A CN102928900B CN 102928900 B CN102928900 B CN 102928900B CN 201210400625 A CN201210400625 A CN 201210400625A CN 102928900 B CN102928900 B CN 102928900B
- Authority
- CN
- China
- Prior art keywords
- particle
- diffusion
- coating
- glue
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Laminated Bodies (AREA)
Abstract
The invention relates to the technical field of optical thin films, in particular to a warping-resistant optical thin film, a preparation method thereof and a display device using the optical thin film, and aims to overcome the defects that a film surface of the conventional diffusion film is easy to warp, and raised grains are generated. The optical thin film comprises a transparent base plate; one side of the transparent base plate is provided with an upper diffusion coating, and the other side of the transparent base plate is provided with a lower diffusion coating; the thickness of the upper diffusion coating is 1 to 50 mu m; and the absolute value of the difference between the thickness of the lower diffusion coating and the upper diffusion coating is less than or equal to 3 mu m. The provided warping-resistant optical thin film has the advantages of the conventional diffusion film; the coatings of the film are low in shrinkage percentage; the warping phenomena can be reduced obviously; the preparation method is simple and easy to operate; and the optical thin film is used as the diffusion film in the display device, a good screen effect can be achieved, and shadows can be avoided.
Description
Technical field
The present invention relates to optical film technology field, be specifically related to a kind of that resist warping optical thin film, its preparation method and use the display device of this optical thin film.
Background technology
Along with popularizing of a series of digital equipments such as mobile phone, notebook computer, panel computer, camera and LCD TV, liquid crystal appearing technique becomes more and more important.And diffusion barrier is as the requisite part of liquid crystal display, its Main Function is that the light making to send in fluorescent tube becomes that area is larger, brightness is higher, homogeneity is better, the secondary souce of chroma stability.
The quality of diffusion barrier directly affects the effect of display frame.In the use procedure of liquid crystal display, inevitably can discharge a part of heat, make the environment temperature of diffusion barrier reach more than 50 DEG C, reply in the process of normal temperature in continuous intensification, face easily produces warpage again, forms ripple glaze.This can make display frame produce shadow, has a strong impact on picture effect.Along with the popular of large-sized monitor and client's requirement frivolous to display, diffusion barrier also corresponding requirements to cut size larger, thickness is thinner, and this also makes warpage issues also become more obvious.In the field of business, the conventional adjuvant adding a large amount of low-shrinkages reduces the contraction of coating or film to a certain extent, but, the adjuvant of these low-shrinkages as: adding of polyvinyl acetate (PVA) (PVAc), polymethylmethacrylate (PMMA), polystyrene (PSt) etc., obviously can affect optical property and the physical property of optical thin film.Therefore the optical thin film working out a kind of that resist warping is extremely urgent.
Summary of the invention
Easily warpage is produced in order to solve existing diffusion barrier face, form the defect of ripple glaze etc., the invention provides a kind of optical thin film of that resist warping, its preparation method and use the display device of this optical thin film, that resist warping optical thin film provided by the invention has the advantage of existing diffusion barrier, and its coating shrinkage rate is lower, obviously can reduce the appearance of warping phenomenon, its preparation method technique is simple, be easy to operation, use this optical thin film good as the display device picture effect of diffusion barrier, can not shadow be produced.
In order to solve the problems of the technologies described above, the present invention adopts following technical proposals:
The invention provides a kind of that resist warping optical thin film, described optical thin film comprises transparency carrier, and the side of described transparency carrier is provided with diffusion coating, and opposite side is provided with lower diffusion coating; Described upper diffusion coating comprises diffusion glue-line and upper diffusion particle (can be called for short diffusion particle, or particle), and upper diffusion particle is bonded in the upper surface of transparency carrier by upper diffusion glue-line; Described lower diffusion coating comprises lower diffusion glue-line and lower diffusion particle (can be called for short diffusion particle, or particle), and lower diffusion particle is bonded in the lower surface of transparency carrier by lower diffusion glue-line; The thickness of described upper diffusion coating is 1-50um, the absolute value≤3um of the difference of the thickness of described lower diffusion coating and the thickness of upper diffusion coating.The thickness of described upper diffusion coating can also be 2-15um, 12-30um, 20-40um, 10-35um, 10um, 15um, 20um or 50um.
Further, described upper diffusion glue-line is identical with the material of lower diffusion glue-line, and described upper diffusion particle is identical with the material of lower diffusion particle, and the weight ratio of lower diffusion particle and upper diffusion particle is 1:1-1.5.Preferably, upper diffusion glue-line is identical with the material of lower diffusion glue-line, and thickness is close, the absolute value≤3um of the difference of the thickness of lower diffusion glue-line and the thickness of upper diffusion glue-line; Warpage and the ripple glaze of face can be reduced in film manufacturing processes.Preferably, the weight ratio of described lower diffusion particle and upper diffusion particle is 1:1,1:1.25 or 1:1.5.
Further, the weight of described lower diffusion particle is 0.01-0.5 times of upper diffusion particle; The thickness of described upper diffusion coating is 1-50um, the thick 1-2um of thickness of diffusion coating on the Thickness Ratio of described lower diffusion coating.This lower diffusion coating containing a small amount of diffusion particle can also be called protective finish.
Preferably, the weight of described lower diffusion particle is 0.05-0.3 times of upper diffusion particle, 0.1-0.2 times or 0.2-0.4 times.
Further, the refractive index of the material of described transparency carrier is 1.4-1.75, is selected from polyethylene terephthalate (PET), polycarbonate (PC), polyamide (PA), polystyrene (PS), tygon (PE) or polymethylmethacrylate (PMMA).Further, the percent thermal shrinkage of the material of described transparency carrier is less than or equal to 2%.The thickness of described transparency carrier is 15um-300um, and preferably, the thickness of described transparency carrier is 20um-30um, 25um-50um, 38um-100um, 75um-150um, 120um-250um, or 200um-280um.
Further, described diffusion particle is spherical or elliposoidal, comprises macroparticle and small-particle, and the particle size range of described macroparticle is 10-50um, and the particle size range of described small-particle is 0.1-10um.
Further, the particle diameter of described macroparticle is 15um, 20um, 25um, 30um, 35um, 40um, or 45um; The particle diameter of described small-particle is 0.2um, 0.5um, 0.9um, 1um, 2um, 3um, 4um, 5um, 6um, 7um, 8um, or 9um.
The kind of diffusion particle should be the material of low-shrinkage, the percent thermal shrinkage impact of interpolation on coating of the particle of low-shrinkage material is little, further, described diffusion particle comprises organic diffusion particle (can be called for short organic filler) and inorganic diffusion particle (can be called for short inorganic particulate).Described organic diffusion particle is selected from the combination of a kind of in plexiglass, polystyrene resin, silicone resin or at least two kinds, and described inorganic diffusion particle is selected from the combination of a kind of in titania, calcium carbonate, barium sulphate, silicon dioxide or at least two kinds.Further, described organic filler is macroparticle, and inorganic particulate is small-particle.Or further, described inorganic particulate is small-particle, and described organic filler comprises macroparticle and small-particle.
Further, described diffusion glue line material is the combination of a kind of in polyacrylic resin, urethane resin, epoxy resin or at least two kinds.
Further, auxiliary agent is contained in described coating.Described auxiliary agent is selected from the combination of a kind of in light stabilizer, antistatic agent, levelling agent, spreading agent, lubricant or at least two kinds.The addition of described auxiliary agent is respectively the 0.01-5% of diffusion glue line material weight.
Further, described upper diffusion glue-line is 100 weight portions, and upper diffusion particle is 70-100 weight portion.Preferably, described upper diffusion particle content is 80-90 weight portion, 85 weight portions, 75 weight portions or 95 weight portions.
Further, described lower diffusion glue-line is 100 weight portions, and lower diffusion particle is 50-100 weight portion.Preferably, described lower diffusion particle is 60-80 weight portion, 70-100 weight portion, 55 weight portions, 85 weight portions, 75 weight portions or 90 weight portions.
Or described lower diffusion glue-line is 100 weight portions, and lower diffusion particle content is 1-20 weight portion.Preferably, described lower diffusion particle is 2-10 weight portion, 5 weight portions, 11 weight portions or 15 weight portions.
The shrinkage factor impact of contraction on whole coating of diffusion glue-line is comparatively large, and in preparation process, the volumetric shrinkage of the glue that diffusion glue-line adopts is less, and the percent thermal shrinkage of glue-line is less, when selecting glue line material, and the glue that should as far as possible select volumetric shrinkage little.Meanwhile, if when the percent thermal shrinkage of glue line material is larger, can add the levelling agent accounting for glue weight 0.01-3% in glue, levelling agent can reduce the surface tension of diffusion coating, reduces percent thermal shrinkage to a certain extent, reduces warpage and the ripple glaze of face generation.
The present invention also provides a kind of preparation method of above-mentioned that resist warping optical thin film, and described preparation method comprises the steps:
(1) diffusion coating coating fluid in preparation: in agitator, add glue successively, particle, auxiliary agent, solvent, stirs 1-4 hour, then adds hardening agent, stirs 0.5-1 hour;
(2) the lower diffusion coating coating fluid of preparation: in agitator, add glue successively, particle, auxiliary agent, solvent, stir 0.5-4 hour, then add hardening agent, stir 0.5-1 hour;
(3) upper diffusion coating coating solution step (1) obtained, on the upper surface of transparent base, at 80-120 DEG C, toasts 1-30 minute;
(4) lower diffusion coating coating solution step (2) obtained, on the lower surface of transparent base, at 80-120 DEG C, toasts 1-30 minute.
Described glue has the glue of cohesive action after being selected from the film-formings such as acrylic acid glue, polyurethane glue, epoxy resin glue.Epoxy glue layer is formed after forming urethane resin glue-line, epoxide-resin glue water cure after forming polyacrylic resin glue-line, polyurethane glue film-forming after acrylate glue water cure film forming.
Further, the coating fluid of described upper diffusion coating comprises the glue of 100 weight portions, the upper diffusion particle of 70-100 weight portion.Preferably, described upper diffusion particle content is 80-90 weight portion, 85 weight portions, 75 weight portions or 95 weight portions.
Further, the coating fluid of described lower diffusion coating comprises the glue of 100 weight portions, the lower diffusion particle of 50-100 weight portion.Preferably, described lower diffusion particle is 60-80 weight portion, 70-100 weight portion, 55 weight portions, 85 weight portions, 75 weight portions or 90 weight portions.
Or the coating fluid of described lower diffusion coating comprises the glue of 100 weight portions, the lower diffusion particle of 1-20 weight portion.Preferably, described lower diffusion particle is 2-10 weight portion, 5 weight portions, 11 weight portions or 15 weight portions.
Further, the material of described transparent base is PC or PA, and the thickness of transparent base is 15-50um; Described diffusion glue line material is polyacrylic resin, and in preparation process, upper diffusion coating coating fluid used comprises 100 parts by weight of acrylic acid glue, diffusion particle on 80 weight portions; Lower diffusion coating coating fluid used comprises the acrylic acid glue of 100 weight portions, the diffusion particle of 80 weight portions.Described upper diffusion particle is identical with lower diffusion particle, comprises organic filler and inorganic particulate, and described inorganic particulate is small-particle, and described organic filler comprises macroparticle and small-particle.The thickness of described upper diffusion coating and the thickness difference of lower diffusion coating are less than 2um.
The present invention also provides a kind of display device, and described display device comprises power supply module, liquid crystal panel assembly and that resist warping optical thin film that at least a slice is above-mentioned.
Can adopt a series of measures to reduce warp value when production that resist warping optical thin film, first when selecting glue, upper and lower coating should select the glue that volumetric shrinkage is close, composition is identical, because in the coating, the factor had the greatest impact to shrinkage factor is exactly the contraction of glue, and the volumetric shrinkage of glue is less, after film forming, the percent thermal shrinkage of glue-line is less.Coating in the curing process, due to the volatilization of thinning agent, the contraction when curing exotherm of glue and glue curing and the volumetric contraction causing coating larger and heat release, face is made to produce warpage and ripple glaze, therefore when selecting glue, the glue that should as far as possible select volumetric shrinkage little, when the shrinkage factor of glue is larger, can add a certain amount of levelling agent in the coating; In addition, when the weight ratio of diffusion particle and upper diffusion particle is 1:1-1.5 instantly, upper diffusion coating and lower diffusion coating thickness should be as far as possible close, and the difference of film forming thickness controls within 3um, so also can reduce warp value; And when the weight of the diffusion particle of diffusion coating (now also known as protective finish) is the 0.01-0.5 times of upper diffusion particle instantly, the thickness of upper diffusion coating should 1-2um less of the thickness of lower diffusion coating.
Compared with prior art, that resist warping optical thin film provided by the invention has good transmittance and mist degree, can use as diffusion barrier, and its coating shrinkage rate is lower, obviously can reduce the appearance of warping phenomenon, its preparation method technique is simple, is easy to operation, use this optical thin film good as the display device picture effect of diffusion barrier, can not shadow be produced.
Accompanying drawing explanation
Fig. 1 is the diagrammatic cross-section of a kind of that resist warping optical thin film provided by the invention;
Fig. 2 is the diagrammatic cross-section of another kind of that resist warping optical thin film provided by the invention;
Fig. 3 is the schematic diagram after the warping of membrane of that resist warping optical thin film provided by the invention.
Wherein, 101 is upper diffusion coating; 102 is transparency carrier; 103 is lower diffusion coating, and 104 is upper diffusion glue-line, and 105 is lower diffusion glue-line; 106 is diffusion particle (comprising the diffusion particle of diffusion particle, lower diffusion particle and protective finish); 107 is protective finish, and 301 is optical thin film, and 302 is glass plate.
Embodiment
As shown in Figure 1, a kind of that resist warping optical thin film provided by the invention, comprise transparency carrier 102, the both sides of described transparency carrier 102 are respectively arranged with diffusion coating 101 and lower diffusion coating 103, and described upper diffusion coating 101 comprises diffusion glue-line 104 and upper diffusion particle 106, and described lower diffusion coating 103 comprises lower diffusion glue-line 105 and lower diffusion particle 106, wherein, L1 is the thickness of upper diffusion coating, and L2 is the thickness of lower diffusion coating, the absolute value≤3um of the thickness difference of L1 and L2.
As shown in Figure 2; a kind of that resist warping optical thin film provided by the invention; comprise transparency carrier 102, the side of described transparency carrier 102 is provided with diffusion coating 101, and opposite side is provided with protective finish 107; described upper diffusion coating 101 comprises diffusion glue-line 104 and upper diffusion particle 106; described protective finish 107 comprises lower diffusion glue-line 105 and diffusion particle 106, and wherein, L1 is the thickness of upper diffusion coating; L2 is the thickness of protective finish, L2-L1≤2um.
As shown in Figure 3, after carrying out camber test, that resist warping optical thin film 301 provided by the invention is lain on glass plate 302, measure the height of the obvious warpage place of film relative to glass plate, get maximal value h, h is the warp value of film, and h value is less, film is warpage more not easily, and its that resist warping performance is better.
The present invention's material and facility used is current material and equipment, such as: esters of acrylic acid glue, polyurethanes glue, epoxy resin glue etc. all can commercially be buied; The adjuvants such as light stabilizer, antistatic agent, levelling agent, spreading agent, lubricant are also product conventional on market.
The preparation method of that resist warping optical thin film provided by the invention comprises the steps:
(1) diffusion coating coating fluid in preparation: in agitator, add the glue of 100 weight portions successively, the diffusion particle of 70-100 weight portion, the auxiliary agent of 0.01-5%, solvent, stirs 1-4 hour, then adds hardening agent, stirs 0.5-1 hour;
(2) the lower diffusion coating coating fluid of preparation: in agitator, add the glue of 100 weight portions successively, 50-100 weight portion, or the diffusion particle of 1-20 weight portion, the auxiliary agent of 0.01-5%, solvent, stirs 0.5-4 hour, then adds hardening agent, stirs 0.5-1 hour;
(3) upper diffusion coating coating solution step (1) obtained, on the upper surface of transparent base, at 80-120 DEG C, toasts 1-30 minute;
(4) lower diffusion coating coating solution step (2) obtained, on the lower surface of transparent base, at 80-120 DEG C, toasts 1-30 minute.
The addition of described solvent should be appropriate, is generally 10-50 weight portion, is suitable for painting process is operating as suitable with the concentration of the coating fluid prepared.Described solvent is selected from a kind of in the common solvent such as water, butyl acetate, ethyl acetate, acetone or the wherein potpourri of at least two kinds.
Described hardening agent can make glue curing film forming used, and its consumption is the consumption usually selected.
Prepare that resist warping optical thin film according to the method described above, the method for testing of the correlated performance of that resist warping optical thin film is as follows:
Percent thermal shrinkage: be placed on by optical thin film in the environment of 150 DEG C, dries 30 minutes, is then cooled to normal temperature, the shrinkage factor of testing film.
Volumetric shrinkage: the volumetric shrinkage of glue can reflect from the warpage of the glue-line after solidification, by glue application on the film of an A4 paper size, dry 30 minutes at 150 DEG C, be cooled to normal temperature afterwards, the warpage of testing film and coating, warpage is less, and the volumetric shrinkage of glue is less, generally selects warpage to be less than the glue of 2mm.
Camber test: by that resist warping optical thin film 65 DEG C, under the environment of 95%RH, place 200h, naturally cool to room temperature afterwards, take out film and put on a glass, record the height h of warpage, as shown in Figure 3.
Brightness: (long and wide is the square film of 7 cun respectively to get the film of 7 cun of sizes, or diagonal line is the film of 7 cun), be placed in backlight, a prismatic lens is placed again on film, prismatic lens is put optical thin film prepared by an anticipatory remark inventive embodiments, test its brightness with brightness detector (model BH-7).
Mist degree: the film getting A4 paper size, is placed on mist degree instrument, tests out its haze value.
Transmittance: the film getting A4 paper size, is placed on mist degree instrument, tests out its light transmittance values.
In following embodiment 1-9, described organic filler is selected from the combination of a kind of in plexiglass, polystyrene resin, silicone resin or at least two kinds, and inorganic particulate is selected from the combination of a kind of in titania, calcium carbonate, barium sulphate, silicon dioxide or at least two kinds.Wherein, macroparticle particle diameter is 1-50um, and small-particle particle diameter is 0.1-10um.
Embodiment 1
Prepare that resist warping optical thin film provided by the invention according to the method described above, as shown in Figure 1, this that resist warping optical thin film comprises a transparency carrier 102, and this transparency carrier material is PET, and thickness is 100um, and percent thermal shrinkage is 0.2%-1.5%.Transparency carrier upper surface is provided with diffusion coating 101, upper diffusion coating is acryl resin, diffusion particle is provided with in described coating, upper diffusion particle comprises organic filler and inorganic particulate, the parts by weight of upper diffusion glue-line 104 are 100 weight portions, and the parts by weight of upper diffusion particle are 75 weight portions.Lower diffusion coating 103 is provided with at transparency carrier lower surface, lower diffusion coating is acryl resin, lower diffusion particle is provided with in set coating, lower diffusion particle comprises organic filler and inorganic particulate, the parts by weight of lower diffusion glue-line 105 are 100 weight portions, and the parts by weight of lower diffusion particle are 50 weight portions.The weight ratio of described lower diffusion particle and upper diffusion particle is 1:1.5; Upper diffusion coating 101 is less than 2um with the absolute value of the thickness difference of lower diffusion coating 103.
Embodiment 2
Prepare that resist warping optical thin film provided by the invention according to the method described above, as shown in Figure 2, transparency carrier 102 is PET, thickness is 38um, percent thermal shrinkage is 0.2%-1.5%, and upper diffusion coating 101 is acryl resin, and contained upper diffusion particle is organic filler and inorganic particulate, the parts by weight of upper diffusion glue-line are 100 weight portions, and the weight portion of upper diffusion particle is 100 weight portions.Protective finish 107 is acryl resin, and contained lower diffusion particle is organic filler, and particle diameter is 3um-20um, and the parts by weight of lower diffusion glue-line are 100 weight portions, and the weight portion of diffusion particle is 20 weight portions.The weight of described lower diffusion particle is 0.2 times of upper diffusion particle, the thick 2um of the thickness of diffusion coating 101 on the Thickness Ratio of protective finish 107.
Embodiment 3
Prepare that resist warping optical thin film provided by the invention according to the method described above, as shown in Figure 2, the transparency carrier 102 of the present embodiment is PC, thickness is 100um, percent thermal shrinkage is 1%-1.5%, and upper diffusion coating 101 is acryl resin, and contained upper diffusion particle is organic filler, the parts by weight of upper diffusion glue-line are 100 weight portions, and the weight portion of upper diffusion particle is 100 weight portions.Protective finish 107 is acryl resin, and contained lower diffusion particle is organic filler, and the parts by weight of lower diffusion glue-line are 100 weight portions, and the weight portion of lower diffusion particle is 1 weight portion.The weight of described lower diffusion particle is 0.01 times of upper diffusion particle, the thick 2um of the thickness of diffusion coating 101 on the Thickness Ratio of protective finish 107.
Embodiment 4
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PA, and thickness is 50um, and percent thermal shrinkage is 0.2-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the urethane resin of 100 weight portions, upper diffusion particle comprises polymethylmethacrylate particle and the TiO 2 particles of 70 weight portions, described lower diffusion particle is 70 weight portions, the weight ratio of described lower diffusion particle and upper diffusion particle is 1:1, the thickness of upper diffusion coating is 10um, and the thickness of lower diffusion coating is 12um.
Embodiment 5
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PS, and thickness is 120um, and percent thermal shrinkage is 0.2-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the acryl resin of 100 weight portions, upper diffusion particle is the polystyrene particle of 80 weight portions, described lower diffusion particle is the polystyrene particle of 20 weight portions, particle diameter is 20um-30um, the weight of described lower diffusion particle is 0.25 times of upper diffusion particle, the thickness of described upper diffusion coating is 30um, lower diffusion coating 2um thicker in the thickness of upper diffusion coating.
Embodiment 6
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PE, and thickness is 75um, and percent thermal shrinkage is 1-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the epoxy resin of 100 weight portions, upper diffusion particle is the combination of the silicone particles of 100 weight portions, calcium carbonate particle and barium sulfate particles, described lower diffusion particle is the combination of the silicone particles of 10 weight portions, calcium carbonate particle and barium sulfate particles, and the weight of described lower diffusion particle is 0.1 times of upper diffusion particle; The thickness of described upper diffusion coating is 20um, lower diffusion coating 2um thicker in the thickness of upper diffusion coating.
Embodiment 7
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PMMA, and thickness is 150um, and percent thermal shrinkage is 0.2-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the urethane resin of 100 weight portions, upper diffusion particle comprises the combination of the polymethylmethacrylate particle of 100 weight portions, TiO 2 particles and silicon dioxide granule, described lower diffusion particle is the combination of 80 weight portion polymethylmethacrylate particles, TiO 2 particles and silicon dioxide granule, and the weight ratio of described lower diffusion particle and upper diffusion particle is 1:1.25; The thickness of described upper diffusion coating is 30um, is less than 3um with the absolute value of the thickness difference of lower diffusion coating.
Embodiment 8
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PE, and thickness is 300um, and percent thermal shrinkage is 0.2-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the epoxy resin of 100 weight portions, upper diffusion particle is the combination of 100 weight portion polystyrene particles and silicon dioxide granule, described lower diffusion particle is the polystyrene particle of 100 weight portions, polystyrene particle particle diameter is 20-50um, silicon dioxide granule particle diameter is 1-10um, and the weight ratio of described lower diffusion particle and upper diffusion particle is 1:1; The thickness of described upper diffusion coating is 50um, and the thickness of lower diffusion coating is 52um.
Embodiment 9
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PMMA, and thickness is 30um, and percent thermal shrinkage is 1-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the acryl resin of 100 weight portions, upper diffusion particle is the barium sulfate particles of 75 weight portions, described lower diffusion particle is the barium sulfate particles of 15 weight portions, diffusion particle particle diameter is 0.1-1um, and the weight of described lower diffusion particle is 0.2 times of upper diffusion particle; The thickness of described upper diffusion coating is 1um, and the thickness of lower diffusion coating is 2um.
Embodiment 10
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PC, and thickness is 15um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises 100 parts by weight of acrylic acid glue, and upper diffusion particle comprises the TiO 2 particles of 100 weight portions and the combination of silicon dioxide granule; Lower diffusion coating coating fluid used comprises 100 parts by weight of acrylic acid glue, and lower diffusion particle is the TiO 2 particles of 100 weight portions and the combination of silicon dioxide granule, and the weight ratio of described lower diffusion particle and upper diffusion particle is 1:1; The thickness of described upper diffusion coating is 1um, and the thickness of described lower diffusion coating is 3um.
Embodiment 11
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PET, and thickness is 200um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and upper diffusion particle is the combination of 80 weight portion polystyrene particles and silicon dioxide granule; Lower diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and lower diffusion particle is the polystyrene particle of 20 weight portions; Polystyrene particle particle diameter is 1um-30um, and silicon dioxide granule particle diameter is 1um-10um; The weight of described lower diffusion particle is 0.25 times of upper diffusion particle; The thickness of described upper diffusion coating is 20um, and the thickness of lower diffusion coating is 21um.
Embodiment 12
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PA, and thickness is 50um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises 100 parts by weight of acrylic acid glue, and upper diffusion particle comprises the polystyrene particle of 80 weight portions and the combination of silicon dioxide granule; Lower diffusion coating coating fluid used comprises 100 parts by weight of acrylic acid glue, and described lower diffusion particle is the polystyrene particle of 80 weight portions and the combination of silicon dioxide granule; The weight ratio of described lower diffusion particle and upper diffusion particle is 1:1; The thickness of described upper diffusion coating is 10um, and the thickness of described lower diffusion coating is 13um.
Embodiment 13
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PET, and thickness is 300um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the urethane resin glue of 100 weight portions, and upper diffusion particle comprises the combination of the polymethylmethacrylate particle of 96 weight portions, TiO 2 particles and silicon dioxide granule; Lower diffusion coating coating fluid used comprises the urethane resin glue of 100 weight portions, and described lower diffusion particle is the combination of 80 weight portion polymethylmethacrylate particles, TiO 2 particles and silicon dioxide granule; The weight ratio of described lower diffusion particle and upper diffusion particle is 1:1.2; The thickness of described upper diffusion coating is 50um, is less than or equal to 3um with the absolute value of the thickness difference of lower diffusion coating.
Embodiment 14
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PMMA, and thickness is 150um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and upper diffusion particle is the combination of 100 weight portion polystyrene particles and silicon dioxide granule; Lower diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and described lower diffusion particle is the polystyrene particle of 50 weight portions; Polystyrene particle particle diameter is 10um-20um, and silicon dioxide granule particle diameter is 1um-10um; The weight of described lower diffusion particle is 0.5 times of upper diffusion particle; The thickness of described upper diffusion coating is 18um, and the thickness of lower diffusion coating is 20um.
Embodiment 15
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PS, and thickness is 180um, and percent thermal shrinkage is 1-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the acryl resin glue of 100 weight portions, and upper diffusion particle is the barium sulfate particles of 80 weight portions; Lower diffusion coating coating fluid used comprises the acryl resin glue of 100 weight portions, and described lower diffusion particle is the barium sulfate particles of 4 weight portions, and diffusion particle particle diameter is 1-10um; The weight of described lower diffusion particle is 0.05 times of upper diffusion particle; The thickness of described upper diffusion coating is 10um, and the thickness of lower diffusion coating is 12um.
Embodiment 16
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PET, and thickness is 75um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the urethane resin glue of 100 weight portions, and upper diffusion particle comprises the combination of the polymethylmethacrylate particle of 90 weight portions, TiO 2 particles and silicon dioxide granule; Lower diffusion coating coating fluid used comprises the urethane resin glue of 100 weight portions, and described lower diffusion particle is the combination of 60 weight portion polymethylmethacrylate particles, TiO 2 particles and silicon dioxide granule; The particle diameter of organic filler is 1-20um, and the particle diameter of inorganic particulate is 0.1-10um; The weight ratio of described lower diffusion particle and upper diffusion particle is 1:1.5; The thickness of described upper diffusion coating is 30um, is less than 3um with the absolute value of the thickness difference of lower diffusion coating.
Embodiment 17
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PMMA, and thickness is 150um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and upper diffusion particle is the combination of 80 weight portion polystyrene particles and silicon dioxide granule; Lower diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and described lower diffusion particle is the polystyrene particle of 16 weight portions; Polystyrene particle particle diameter is 10um-20um, and silicon dioxide granule particle diameter is 1um-10um; The weight of described lower diffusion particle is 0.2 times of upper diffusion particle; The thickness of described upper diffusion coating is 20um, and the thickness of lower diffusion coating is 22um.
Embodiment 18
Prepare that resist warping optical thin film provided by the invention according to the method described above, described transparency carrier material is PS, and thickness is 100um, and percent thermal shrinkage is 1-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the acryl resin glue of 100 weight portions, and upper diffusion particle is the barium sulfate particles of 100 weight portions; Lower diffusion coating coating fluid used comprises the acryl resin glue of 100 weight portions, and described lower diffusion particle is the barium sulfate particles of 1 weight portion, and diffusion particle particle diameter is 1-10um, and the weight of described lower diffusion particle is 0.01 times of upper diffusion particle; The thickness of described upper diffusion coating is 10um, and the thickness of lower diffusion coating is 12um.
Table 1 embodiment 1-18 gained that resist warping optical thin film performance test data
Comparative example 1
The HBS100 ordinary optical film that Ewa Co., Ltd. of Japan produces.
Comparative example 2
The BS507 ordinary optical film that Ewa Co., Ltd. of Japan produces.
Comparative example 3
The DI700C ordinary optical film that Changxing, Taiwan Chemical Co., Ltd. produces.
Comparative example 4
Prepare optical thin film according to the method described above, described transparency carrier material is PC, and thickness is 100um, and percent thermal shrinkage is 1-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the acryl resin of 100 weight portions, and upper diffusion particle comprises the diffusion particle of 100 weight portions, and described lower diffusion particle is 10 weight portions, and the weight of described lower diffusion particle is 0.1 times of upper diffusion particle; The thickness of upper diffusion coating is 50um, and the thickness of lower diffusion coating is 40um.
Compared with technical scheme provided by the invention, the difference in thickness of the upper and lower diffusion coating of this optical thin film is excessive, causes the warp value of film higher.
Comparative example 5
Prepare optical thin film, transparency carrier material is PET, and thickness is 38um, and percent thermal shrinkage is 0.2-1.5%; Upper diffusion glue-line is the acryl resin of 100 weight portions, lower diffusion glue-line is the epoxy resin of 100 weight portions, upper diffusion particle is the barium sulfate particles of 80 weight portions, lower diffusion particle is the barium sulfate particles of 4 weight portions, diffusion particle particle diameter is 1-5um, and the weight of described lower diffusion particle is 0.05 times of upper diffusion particle; The thickness of described upper diffusion coating is 5um, and the thickness of lower diffusion coating is 7um.
Compared with technical scheme provided by the invention, it is different from the material of lower diffusion glue-line this optical thin film to spread glue-line, causes the warp value of film higher.
Table 2 comparative example 1-5 gained optical thin film performance test data
As shown in Table 1 and Table 2, composition graphs 3, the 301 that resist warping optical thin films prepared for the present invention, in camber test test, h is by being surveyed warp value, and h is less than 1mm, and warp value is significantly less than ordinary optical film.That resist warping optical thin film provided by the invention has lower warp value, obviously can reduce the problems such as the picture that warping in optical films in display device causes is not good, shadow.
The above, be only preferred embodiment of the present invention, be not intended to limit protection scope of the present invention.Every equalization done according to content of the present invention changes and modifies, and is all encompassed in the scope of the claims of the present invention.
Claims (3)
1. a that resist warping optical thin film, is characterized in that, described optical thin film comprises transparency carrier, and the side of described transparency carrier is provided with diffusion coating, and opposite side is provided with lower diffusion coating; Described upper diffusion coating comprises diffusion glue-line and upper diffusion particle, and upper diffusion particle is bonded in the upper surface of transparency carrier by upper diffusion glue-line; Described lower diffusion coating comprises lower diffusion glue-line and lower diffusion particle, and lower diffusion particle is bonded in the lower surface of transparency carrier by lower diffusion glue-line;
Described transparency carrier material is PMMA, and thickness is 150um, and percent thermal shrinkage is 0.2-1.5%; Upper diffusion glue-line and lower diffusion glue-line are the urethane resin of 100 weight portions, upper diffusion particle comprises the combination of the polymethylmethacrylate particle of 100 weight portions, TiO 2 particles and silicon dioxide granule, described lower diffusion particle is the combination of 80 weight portion polymethylmethacrylate particles, TiO 2 particles and silicon dioxide granule, and the weight ratio of described lower diffusion particle and upper diffusion particle is 1:1.25; The thickness of described upper diffusion coating is 30um, is less than 3um with the absolute value of the thickness difference of lower diffusion coating;
Or described transparency carrier material is PMMA, thickness is 150um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and upper diffusion particle is the combination of 100 weight portion polystyrene particles and silicon dioxide granule; Lower diffusion coating coating fluid used comprises the epoxy resin glue of 100 weight portions, and described lower diffusion particle is the polystyrene particle of 50 weight portions; Polystyrene particle particle diameter is 10um-20um, and silicon dioxide granule particle diameter is 1um-10um; The weight of described lower diffusion particle is 0.5 times of upper diffusion particle; The thickness of described upper diffusion coating is 18um, and the thickness of lower diffusion coating is 20um;
Or described transparency carrier material is PET, thickness is 75um, and percent thermal shrinkage is 0.2-1.5%; In preparation process, upper diffusion coating coating fluid used comprises the urethane resin glue of 100 weight portions, and upper diffusion particle comprises the combination of the polymethylmethacrylate particle of 90 weight portions, TiO 2 particles and silicon dioxide granule; Lower diffusion coating coating fluid used comprises the urethane resin glue of 100 weight portions, and described lower diffusion particle is the combination of 60 weight portion polymethylmethacrylate particles, TiO 2 particles and silicon dioxide granule; The particle diameter of organic filler is 1-20um, and the particle diameter of inorganic particulate is 0.1-10um; The weight ratio of described lower diffusion particle and upper diffusion particle is 1:1.5; The thickness of described upper diffusion coating is 30um, is less than 3um with the absolute value of the thickness difference of lower diffusion coating.
2. a preparation method for that resist warping optical thin film according to claim 1, is characterized in that, described preparation method comprises the steps:
(1) diffusion coating coating fluid in preparation: in agitator, add glue successively, particle, auxiliary agent, solvent, stirs 1-4 hour, then adds hardening agent, stirs 0.5-1 hour;
(2) the lower diffusion coating coating fluid of preparation: in agitator, add glue successively, particle, auxiliary agent, solvent, stir 0.5-4 hour, then add hardening agent, stir 0.5-1 hour;
(3) upper diffusion coating coating solution step (1) obtained, on the upper surface of transparent base, at 80-120 DEG C, toasts 1-30 minute;
(4) lower diffusion coating coating solution step (2) obtained, on the lower surface of transparent base, at 80-120 DEG C, toasts 1-30 minute.
3. a display device, is characterized in that, described display device comprises power supply module, liquid crystal panel assembly and at least a slice that resist warping optical thin film according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210400625.8A CN102928900B (en) | 2012-10-19 | 2012-10-19 | Warping-resistant optical thin film, preparation method thereof and display device using optical thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210400625.8A CN102928900B (en) | 2012-10-19 | 2012-10-19 | Warping-resistant optical thin film, preparation method thereof and display device using optical thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102928900A CN102928900A (en) | 2013-02-13 |
| CN102928900B true CN102928900B (en) | 2015-06-24 |
Family
ID=47643739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210400625.8A Active CN102928900B (en) | 2012-10-19 | 2012-10-19 | Warping-resistant optical thin film, preparation method thereof and display device using optical thin film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102928900B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103345011B (en) * | 2013-06-28 | 2015-08-05 | 宁波激智科技股份有限公司 | A kind of diffusion barrier being applied to side-light backlight module |
| CN106772724A (en) * | 2016-12-30 | 2017-05-31 | 吴中区穹窿山德毅新材料技术研究所 | A kind of optical diffusion of anti scuffing |
| CN107831560A (en) * | 2017-11-30 | 2018-03-23 | 宁波激智科技股份有限公司 | A kind of Pasting type optical diffusion and preparation method thereof |
| CN111366994A (en) * | 2020-03-03 | 2020-07-03 | 明基材料有限公司 | Anti-dazzle film and polarizing plate with same |
| CN112965151A (en) * | 2021-02-06 | 2021-06-15 | 四川兆纪光电科技有限公司 | Optical diffusion film, preparation method thereof and backlight module |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100680127B1 (en) * | 2005-01-08 | 2007-02-07 | 도레이새한 주식회사 | Light-diffusing sheet for back light unit of liquid crystal display |
| KR100737979B1 (en) * | 2005-03-18 | 2007-07-13 | 도레이새한 주식회사 | Pore-formed light-diffusing film |
| CN100510790C (en) * | 2005-03-30 | 2009-07-08 | 大日本油墨化学工业株式会社 | Light diffusion film |
| KR100716144B1 (en) * | 2005-10-21 | 2007-05-10 | 도레이새한 주식회사 | Diffusing sheet for tft-lcd |
| JP5359275B2 (en) * | 2007-04-13 | 2013-12-04 | 東レ株式会社 | Light diffusion film and liquid crystal backlight unit using the same |
| TWI499808B (en) * | 2011-06-01 | 2015-09-11 | Au Optronics Corp | Optical composite substrate |
| CN102540291B (en) * | 2012-02-08 | 2014-05-07 | 宁波长阳科技有限公司 | Preparation method of optical diffusion film |
-
2012
- 2012-10-19 CN CN201210400625.8A patent/CN102928900B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN102928900A (en) | 2013-02-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102928900B (en) | Warping-resistant optical thin film, preparation method thereof and display device using optical thin film | |
| CN101975973B (en) | Optical reflective film, preparation method thereof and liquid crystal display device using same | |
| CN102925036B (en) | Coating composition and optical diffusion film | |
| CN101881846B (en) | Optical diffusion film and liquid crystal display device using same | |
| CN104880747A (en) | Multi-function composite optical membrane capable of replacing diffusion plate and manufacturing method thereof, and display screen | |
| TWI463216B (en) | Multi-functional optic sheet | |
| CN102928901B (en) | Optical diffusion barrier and preparation method thereof, and liquid crystal display device | |
| CN103345011B (en) | A kind of diffusion barrier being applied to side-light backlight module | |
| JP2007532936A (en) | Method for manufacturing front filter for plasma display panel | |
| TW200907422A (en) | Optical sheets | |
| CN102759761A (en) | Optical thin film with high covering power and high luminance and display device comprising optical thin film | |
| US11353629B2 (en) | Anti-glare film and polarizer with the same | |
| CN106680918A (en) | Diffusion type reflection film and preparation method thereof | |
| KR100909427B1 (en) | Light control film | |
| CN109597243A (en) | Liquid crystal display laminating film and LCD backlight mould group | |
| TW201037368A (en) | Anti-glare film | |
| TW201024811A (en) | Light-diffusing film for back light unit of LCD and manufacturing method thereof | |
| CN117143290A (en) | Dispersing resin for LCD optical diffusion film and preparation method thereof | |
| CN115308830A (en) | Reflective polarizer film and preparation method and application thereof | |
| CN101802654A (en) | Multi-functional optical film | |
| CN110330904B (en) | Optical cement, display panel and display terminal | |
| KR20200097533A (en) | Voc free-coating liquid composition for image formation used in rear projection type beam project screen | |
| KR20050039525A (en) | Apparatus for enhancing contrast ratio of an lcd | |
| JP2011059481A (en) | Antiglare film | |
| TW200905255A (en) | Light regulating apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C53 | Correction of patent for invention or patent application | ||
| CB02 | Change of applicant information |
Address after: 315040, Lingyun Industrial Park, No. 1177 Lingyun Road, Ningbo high tech Zone, Zhejiang, 5 Applicant after: Ningbo Exciton Technology Co., Ltd. Address before: 315040, Lingyun Industrial Park, No. 1177 Lingyun Road, Ningbo high tech Zone, Zhejiang, 5 Applicant before: Ningbo Exciton New Material Technology Co., Ltd. |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: NINGBO EXCITON NEW MATERIAL TECHNOLOGY CO., LTD. TO: NINGBO JIZHI TECHNOLOGY CO., LTD. |
|
| C53 | Correction of patent for invention or patent application | ||
| CB02 | Change of applicant information |
Address after: 315040, No. 9, crystal Road, Ningbo hi tech Development Zone, Zhejiang, Ningbo Applicant after: Ningbo Exciton Technology Co., Ltd. Address before: 315040, Lingyun Industrial Park, No. 1177 Lingyun Road, Ningbo high tech Zone, Zhejiang, 5 Applicant before: Ningbo Exciton Technology Co., Ltd. |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |