CN102926085A - Left-right twill memory fabric - Google Patents

Left-right twill memory fabric Download PDF

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Publication number
CN102926085A
CN102926085A CN2011102306465A CN201110230646A CN102926085A CN 102926085 A CN102926085 A CN 102926085A CN 2011102306465 A CN2011102306465 A CN 2011102306465A CN 201110230646 A CN201110230646 A CN 201110230646A CN 102926085 A CN102926085 A CN 102926085A
Authority
CN
China
Prior art keywords
twill
weft yarn
semi
warps
wefts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011102306465A
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Chinese (zh)
Inventor
黄志向
翟涛
黄书传
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUZHOU CINC TEXTILE RESEARCH Co Ltd
Original Assignee
SUZHOU CINC TEXTILE RESEARCH Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUZHOU CINC TEXTILE RESEARCH Co Ltd filed Critical SUZHOU CINC TEXTILE RESEARCH Co Ltd
Priority to CN2011102306465A priority Critical patent/CN102926085A/en
Publication of CN102926085A publication Critical patent/CN102926085A/en
Pending legal-status Critical Current

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Abstract

The invention relates to a left-right twill memory fabric, which is interwoven by warps and wefts, wherein the warps and the wefts are left-right independent twill weave structures, the warps adopt DTY semi-dull raw materials, and the wefts adopt FDY (Fully Drawn Yarn) semi-dull twisting. According to the invention, the organization structures are left-right independent twill weave structures, the facing effect of the pattern is fine and strong in stereoscopic impression, the warps adopt DTY semi-dull raw materials of P-30D/48 F, and the wefts adopt FDY semi-dull twisting of F50 D/72 F, so that the memory effect of a cloth surface is shown and the left-right twill memory fabric has smooth and thick hand feel.

Description

A kind of left and right sides twill memory face fabric
Technical field
The present invention relates to a kind of weaving face fabric, particularly a kind of left and right sides twill memory face fabric for cotton clothes, jacket, wind coat, down jackets.
Background technology
Reverie is the prelude of pursuing, because the pressure of work rhythm, the colourful of garment material often can play good regulating action, therefore, terylene is as a kind of widely used light-duty synthetic fiber, through being usually used in cotton clothes, leisure jacket fabric, but because under existing technique, this fabric cloth cover is too dull, and color is single, can not satisfy the demand of people's sense organ.On the other hand, identical clothes are showed with different clothes, can bring the people different sensations, so the innovation of garment material can bring new power for apparel industry with improvement.
Summary of the invention
Technical problem to be solved by this invention is to overcome the deficiencies in the prior art, and a kind of left and right sides twill memory face fabric is provided.
For solving the problems of the technologies described above, the present invention adopts following technical scheme:
A kind of left and right sides twill memory face fabric, it is interweaved by warp thread and weft yarn and forms, wherein warp thread and weft yarn be about the institutional framework of each twill, and warp thread adopts DTY half light raw material, weft yarn adopts the twisting of FDY half light.
Preferably, the thickness of warp thread is 30 DENIER, and the spinneret orifice number is 48F.
Preferably, the thickness of weft yarn is 50 DENIER, and the spinneret orifice number is 72F.
Because adopt the enforcement of above technical scheme, the present invention compared with prior art has following advantage:
The institutional framework that the present invention adopts be about each twill-weave, this colored type be embodied in the effect that faces for fine and smooth, third dimension is strong, adopts the DTY half light raw material of P-30D/48F by longitude and latitude, weft yarn uses the FDY half light twisting of F50D/72F, embody the memory effect of cloth cover, feel is smooth, and is abundant.
Description of drawings
The present invention will be further described in detail below in conjunction with accompanying drawing and specific embodiment.
Fig. 1 is the schematic diagram of the left and right sides twill memory face fabric according to the present invention;
The specific embodiment
As shown in Figure 1, according to the left and right sides twill memory face fabric of the present embodiment, it is interweaved by warp thread and weft yarn and forms, warp thread and weft yarn be about the institutional framework of each twill, and warp thread adopts DTY half light raw material, weft yarn adopts the twisting of FDY half light.
The thickness of above-mentioned warp thread is 30 DENIER, and the spinneret orifice number is 48F.The thickness of weft yarn is 50 DENIER, and the spinneret orifice number is 72F.
The institutional framework that the present invention adopts be about each twill-weave, this colored type be embodied in the effect that faces for fine and smooth, third dimension is strong, adopts the DTY half light raw material of P-30D/48F by longitude and latitude, weft yarn uses the FDY half light twisting of F50D/72F, embody the memory effect of cloth cover, feel is smooth, and is abundant.
Above the present invention has been done detailed description; its purpose is to allow the personage that is familiar with this art can understand content of the present invention and is implemented; can not limit protection scope of the present invention with this; the equivalence that all Spirit Essences according to the present invention are done changes or modifies, and all should be encompassed in protection scope of the present invention.

Claims (3)

1. left and right sides twill memory face fabric, it is interweaved by warp thread and weft yarn and forms, and it is characterized in that: described warp thread and weft yarn be about the institutional framework of each twill, described warp thread adopts DTY half light raw material, described weft yarn adopts the twisting of FDY half light.
2. the left and right sides according to claim 1 twill memory face fabric, it is characterized in that: the thickness of described warp thread is 30 DENIER, the spinneret orifice number is 48F.
3. the left and right sides according to claim 1 twill memory face fabric, it is characterized in that: the thickness of described weft yarn is 50 DENIER, the spinneret orifice number is 72F.
CN2011102306465A 2011-08-12 2011-08-12 Left-right twill memory fabric Pending CN102926085A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011102306465A CN102926085A (en) 2011-08-12 2011-08-12 Left-right twill memory fabric

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011102306465A CN102926085A (en) 2011-08-12 2011-08-12 Left-right twill memory fabric

Publications (1)

Publication Number Publication Date
CN102926085A true CN102926085A (en) 2013-02-13

Family

ID=47641003

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011102306465A Pending CN102926085A (en) 2011-08-12 2011-08-12 Left-right twill memory fabric

Country Status (1)

Country Link
CN (1) CN102926085A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103290594A (en) * 2013-05-22 2013-09-11 苏州志向纺织科研股份有限公司 Striped silk-like fabric

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1651618A (en) * 2004-02-06 2005-08-10 孙锡良 Polyester low elastic wire and its production method
CN101173399A (en) * 2007-11-28 2008-05-07 盛虹集团有限公司 Full-dull twill polyester taffeta
CN101381961A (en) * 2008-10-17 2009-03-11 章国荣 Novel yarn-dyed window decoration fabric and weaving process thereof
JP4362765B2 (en) * 2002-02-28 2009-11-11 東洋紡績株式会社 Fully-dull, high-density fabric that eliminates gloss
CN101724963A (en) * 2008-10-31 2010-06-09 向兴实业纺织整理(苏州)有限公司 Memory metal material

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4362765B2 (en) * 2002-02-28 2009-11-11 東洋紡績株式会社 Fully-dull, high-density fabric that eliminates gloss
CN1651618A (en) * 2004-02-06 2005-08-10 孙锡良 Polyester low elastic wire and its production method
CN101173399A (en) * 2007-11-28 2008-05-07 盛虹集团有限公司 Full-dull twill polyester taffeta
CN101381961A (en) * 2008-10-17 2009-03-11 章国荣 Novel yarn-dyed window decoration fabric and weaving process thereof
CN101724963A (en) * 2008-10-31 2010-06-09 向兴实业纺织整理(苏州)有限公司 Memory metal material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103290594A (en) * 2013-05-22 2013-09-11 苏州志向纺织科研股份有限公司 Striped silk-like fabric

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C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20130213