CN102908958A - Method for mixing and gasifying liquid-phase acetic acid and hydrogen - Google Patents
Method for mixing and gasifying liquid-phase acetic acid and hydrogen Download PDFInfo
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- CN102908958A CN102908958A CN2012104334996A CN201210433499A CN102908958A CN 102908958 A CN102908958 A CN 102908958A CN 2012104334996 A CN2012104334996 A CN 2012104334996A CN 201210433499 A CN201210433499 A CN 201210433499A CN 102908958 A CN102908958 A CN 102908958A
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Abstract
The invention provides a method for mixing and gasifying liquid-phase acetic acid and hydrogen, comprising the steps of mixing and gasifying acetic acid and gas containing hydrogen in an evaporator, wherein the temperature of the hydrogen before mixing is 100-300 DEG C, the temperature of the acetic acid is 30-160 DEG C and the pressure of the acetic acid and the hydrogen is 1.0-20.0 MPa; and controlling the temperature of mixed gas of the top of the evaporator to obtain the mixed gas with an H2/acetic acid mol ratio of 1-250 and the pressure of 1.0-20.0 MPa. According to the method disclosed by the invention, the acetic acid can be gasified at the temperature which is lower than an acetic acid boiling point under operation pressure and the problem of high-temperature corrosion of the liquid-phase acetic acid is solved; and the H2/acetic acid mol ratio in the mixed gas can be well controlled. Furthermore, in a process of mixing and gasifying the liquid-phase acetic acid and the gas containing the hydrogen, the acetic acid is heated by an external heat source to provide gasification latent heat of the acetic aid, and the requirement on an external heat supply can be reduced.
Description
Technical field
The present invention relates to chemical production field, be specifically related to a kind of method of the gas mixture by liquid phase acetic acid and hydrogen.
Technical background
Ethanol is a kind of important basic chemical industry raw material and organic solvent, or the desirable free of contamination vehicle fuel of high-octane rating and additive thereof.The industrial process of existing ethanol adopts fermentation method substantially, and is different according to raw material, can be divided into amylofermentation ethanol processed and cellulose ethanol processed.Alcohol fuel is rapid as the clean energy resource development, but can not significantly promote because of cost of material and food problem restriction in China, needs the new way of exploitation alcohol production badly.In recent years, along with the expansion of industrial acetic acid production capacity, the acetic acid price continued to drop, and adopted acetic acid preparation of ethanol by hydrogenating technology to possess preferably economy, caused the attention of domestic and international scientific research institutions and large enterprise.
Acetic acid is the very strong organic acid of a kind of corrosivity, liquid phase acetic acid has corrosivity and can destroy catalyst and consersion unit under worst hot case, under the worst hot case selection of acetic acid equipment relatively the difficulty, present acetic acid more than 120 ℃ then mainly adopts Hastelloy and zirconium material.And the acetic acid in the gas phase has less corrosivity than the acetic acid in the liquid phase, can reduce the needs to the higher level material, therefore reduces cost.
In recent years, acetic acid gas phase hydrogenation ethanol technology processed obtains broad research, and such as USP 4,517,391 have reported Co-Cu-Mn-Mo sedimentation type catalyst, acetic acid gas phase hydrogenation can be converted into ethanol.USP 7,608, and 744 have reported the catalyst based patent of mineral carbon load Co that is applicable to acetic acid gas phase hydrogenation ethanol processed.USP 4,777, and 303 also react acetic acid in gas phase.
The Introduction To Cn Patent of application number 201180001961.9 method by making gasification acetic acid hydrogenation produce ethanol.The hydrogenation technique of the producing and ethanol of in the presence of hydrogen thereby acetic acid gasification being made a living provides steam feed stream.Acetic acid can be gasified under the temperature that is lower than acetic acid boiling point under the reactor operating pressure.Acetic acid described in this patent and hydrogen mixed gas method have the following disadvantages: at first, can't accurately control the mol ratio of H2/ acetic acid in the mist.Secondly, hydrogen specific heat is little, and under high pressure hydrogen need be heated to very high-temperature guarantee acetic acid gasification, and externally supplying heat source is had relatively high expectations.
Summary of the invention
The purpose of this invention is to provide a kind of method by liquid phase acetic acid and hydrogen mixed gas.
For achieving the above object, a kind of method by liquid phase acetic acid and hydrogen mixed gas provided by the invention, gas mixing gasifying in evaporimeter with acetic acid and hydrogen, the temperature of the gas of hydrogen is 100-300 ℃ before mixing, the acetic acid temperature is 30-160 ℃, the gas-operated pressure of acetic acid and hydrogen is 1.0-20.0MPa, is lower than acetic acid boiling temperature under the operating pressure in evaporimeter top mist temperature under this operating pressure.The gained mixture pressure is 1.0-20.0MPa, and the mol ratio of H2/ acetic acid is 1-250 in the mist.
Mixing gasifying principle of the present invention is: liquid phase acetic acid enters evaporimeter from the bottom, acetic acid is that continuous phase is distributed in the evaporimeter, the gas of hydrogen passes through acetate layer in the mode of bubbling, with the acetic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist temperature, to realize the control for H2/ acetic acid mol ratio in the mist.
Mixing gasifying condition of the present invention is: the gas temperature of hydrogen is 100-300
oC; The acetic acid temperature is 30-160
oC; The gas-operated pressure of acetic acid and hydrogen is 1.0-20.0MPa; Mixture pressure is 1.0-20.0MPa; The mol ratio of H2/ acetic acid is 1-250 in the mist.
Hydrogen described in the gas of hydrogen used in the present invention can be hydrogen, also can be carbon monoxide, methane, acetylene, ethene, ethane, oxygen.Hydrogen content is at 0-100% and greater than 0 in the gas of the hydrogen that adopts.
Acetic acid used in the present invention can be acetic acid, also can be the carboxylic-acid substances such as formic acid, propionic acid, also can be the anhydrides materials such as acetic anhydride, propionic andydride, also can be the aldehyde materials such as acetaldehyde, propionic aldehyde.
The gas of hydrogen is decentralized photo in the evaporimeter of the present invention.
The gas of acetic acid used in the present invention and hydrogen can derived from any suitable source, comprise natural gas, oil, coal, living beings etc.Can produce acetic acid by carbonylation of methanol, oxidation of acetaldehyde, ethylene, oxidative fermentation and anaerobic fermentation.Can pass through electrolysis hydrogen, water-gas method hydrogen, by synthesis gas and the natural gas hydrogen preparation gas of oil pyrolysis.
The gas of hydrogen of the present invention can be through pressure-swing absorber, film, packed tower or their combination to remove impurity for example carbon monoxide and the oxygen in the hydrogen feed line.The gas of described hydrogen can preheat with another material stream by the non-direct contact type heat exchanger, also can adopt external heat source to preheat.
Acetic acid of the present invention can preheat with another material stream by the non-direct contact type heat exchanger, also can adopt external heat source to preheat.
External heat source of the present invention can be steam, conduction oil, fused salt, flue gas, also can adopt Electric heating to heat.
The material of evaporimeter of the present invention can be the corrosion-resistant metal materials such as stainless steel, dual phase steel, senior austenitic stainless steel, such as 304,316L, 2205,2507,904L, 254SMo etc., also can be the more high-grade resistant alloys such as nickel-base alloy, titanium alloy, zircaloy, such as G3, C276,625,800H, Ti2, ZR702 etc.The structure of evaporimeter of the present invention can be shell-and-tube, bushing type, coiled or jacket type.
The present invention has obtained national high-tech research development plan (863 plan) and has subsidized, compared with prior art, the invention has the advantages that: under the temperature that is lower than acetic acid boiling point under the operating pressure, acetic acid is gasified, solve liquid phase acetic acid High Temperature Corrosion, and can well control H2/ acetic acid mol ratio in the mist.In addition, compare with the Chinese patent of application number 201180001961.9, this patent gasifies acetic acid in the presence of hydrogen, hydrogen specific heat is little, under high pressure hydrogen need be heated to very high-temperature guarantee acetic acid gasification, and the external supplying heat source of this patent is had relatively high expectations, and we are in the gas mixture process of liquid phase acetic acid and hydrogen, the gasification latent heat of acetic acid is provided to provide by the external heat source Dichlorodiphenyl Acetate, can reduces the requirement of external supplying heat source.
Description of drawings
Fig. 1 is the evaporimeter schematic diagram.
The specific embodiment
The invention provides a kind of method by liquid phase acetic acid and hydrogen mixed gas.
The present invention will be further described below by specific embodiment.
Embodiment 1
With reference to Fig. 1, this specific embodiment by the following technical solutions: temperature 160
oThe acetic acid 1 of C, pressure 1MPa enters evaporimeter from the bottom, and acetic acid is that continuous phase is distributed in the evaporimeter; Temperature 230
oThe gas 2 of the hydrogen of C, pressure 1MPa passes through acetate layer in the mode of bubbling, with the acetic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain H2/ acetic acid mol ratio and be 15, the mist of pressure 1MPa.Be lower than acetic acid boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 1MPa operating pressure.
Each technological parameter data sees Table 1 among the embodiment 2 to embodiment 7, and other conditions are identical with embodiment 1.
Embodiment 8
Temperature 30
oThe propionic aldehyde 1 of C, pressure 1MPa enters evaporimeter from the bottom, and propionic aldehyde is that continuous phase is distributed in the evaporimeter; Temperature 100
oThe gas 2 of the hydrogen of C, pressure 1MPa passes through the propionic aldehyde layer in the mode of bubbling, with the propionic aldehyde contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain H2/ propionic aldehyde mol ratio and be 1, the mist of pressure 1MPa.Be lower than propionic aldehyde boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 1MPa operating pressure.
Embodiment 9
Temperature 160
oThe propionic aldehyde 1 of C, pressure 20MPa enters evaporimeter from the bottom, and propionic aldehyde is that continuous phase is distributed in the evaporimeter; Temperature 300
oThe gas 2 of the hydrogen of C, pressure 20MPa passes through the propionic aldehyde layer in the mode of bubbling, with the propionic aldehyde contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain H2/ propionic aldehyde mol ratio and be 250, the mist of pressure 20MPa.Be lower than propionic aldehyde boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 20MPa operating pressure.
Embodiment 10
Temperature 30
oThe acetaldehyde 1 of C, pressure 1MPa enters evaporimeter from the bottom, and acetaldehyde is that continuous phase is distributed in the evaporimeter; Temperature 100
oThe gas 2 of the hydrogen of C, pressure 1MPa passes through the acetaldehyde layer in the mode of bubbling, with the acetaldehyde contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain H2/ acetaldehyde mol ratio and be 1, the mist of pressure 1MPa.Be lower than acetaldehyde boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 1MPa operating pressure.
Embodiment 11
Temperature 160
oThe acetaldehyde 1 of C, pressure 20MPa enters evaporimeter from the bottom, and acetaldehyde is that continuous phase is distributed in the evaporimeter; Temperature 300
oThe gas 2 of the hydrogen of C, pressure 20MPa passes through the acetaldehyde layer in the mode of bubbling, with the acetaldehyde contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain H2/ acetaldehyde mol ratio and be 250, the mist of pressure 20MPa.Be lower than acetaldehyde boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 20MPa operating pressure.
Embodiment 12
Temperature 30
oThe acetaldehyde 1 of C, pressure 1MPa enters evaporimeter from the bottom, and acetaldehyde is that continuous phase is distributed in the evaporimeter; Temperature 100
oThe oxygenous gas 2 of C, pressure 1MPa passes through the acetaldehyde layer in the mode of bubbling, with the acetaldehyde contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain O2/ acetaldehyde mol ratio and be 1, the mist of pressure 1MPa.Be lower than acetaldehyde boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 1MPa operating pressure.
Embodiment 13
Temperature 160
oThe acetaldehyde 1 of C, pressure 20MPa enters evaporimeter from the bottom, and acetaldehyde is that continuous phase is distributed in the evaporimeter; Temperature 300
oThe oxygenous gas 2 of C, pressure 20MPa passes through the acetaldehyde layer in the mode of bubbling, with the acetaldehyde contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain O2/ acetaldehyde mol ratio and be 250, the mist of pressure 20MPa.Be lower than acetaldehyde boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 20MPa operating pressure.
Embodiment 14
Temperature 30
oThe acetic acid 1 of C, pressure 1MPa enters evaporimeter from the bottom, and acetic acid is that continuous phase is distributed in the evaporimeter; Temperature 100
oThe gas that contains ethene 2 of C, pressure 1MPa passes through acetate layer in the mode of bubbling, with the acetic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain ethene/acetic acid mol ratio and be 1, the mist of pressure 1MPa.Be lower than acetic acid boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 1MPa operating pressure.
Embodiment 15
Temperature 160
oThe acetic acid 1 of C, pressure 20MPa enters evaporimeter from the bottom, and acetic acid is that continuous phase is distributed in the evaporimeter; Temperature 300
oThe gas that contains ethene 2 of C, pressure 20MPa passes through acetate layer in the mode of bubbling, with the acetic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain ethene/acetic acid mol ratio and be 250, the mist of pressure 20MPa.Be lower than acetic acid boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 20MPa operating pressure.
Embodiment 16
Temperature 30
oThe acetic acid 1 of C, pressure 1MPa enters evaporimeter from the bottom, and acetic acid is that continuous phase is distributed in the evaporimeter; Temperature 100
oThe gas that contains acetylene 2 of C, pressure 1MPa passes through acetate layer in the mode of bubbling, with the acetic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain acetylene/acetic acid mol ratio and be 1, the mist of pressure 1MPa.Be lower than acetic acid boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 1MPa operating pressure.
Embodiment 17
Temperature 160
oThe acetic acid 1 of C, pressure 20MPa enters evaporimeter from the bottom, and acetic acid is that continuous phase is distributed in the evaporimeter; Temperature 300
oThe gas that contains acetylene 2 of C, pressure 20MPa passes through acetate layer in the mode of bubbling, with the acetic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain acetylene/acetic acid mol ratio and be 250, the mist of pressure 20MPa.Be lower than acetic acid boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 20MPa operating pressure.
Embodiment 18
Temperature 30
oThe propionic acid 1 of C, pressure 1MPa enters evaporimeter from the bottom, and propionic acid is that continuous phase is distributed in the evaporimeter; Temperature 100
oThe gas 2 of the hydrogen of C, pressure 1MPa passes through the propionic acid layer in the mode of bubbling, with the propionic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain hydrogen/propionic acid mol ratio and be 1, the mist of pressure 1MPa.Be lower than propionic acid boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 1MPa operating pressure.
Embodiment 19
Temperature 160
oThe propionic acid 1 of C, pressure 20MPa enters evaporimeter from the bottom, and propionic acid is that continuous phase is distributed in the evaporimeter; Temperature 300
oThe gas 2 of the hydrogen of C, pressure 20MPa passes through the propionic acid layer in the mode of bubbling, with the propionic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist 3 temperature, obtain hydrogen/propionic acid mol ratio and be 250, the mist of pressure 20MPa.Be lower than propionic acid boiling temperature under this operating pressure in evaporimeter top mist 3 temperature under the 20MPa operating pressure.
Claims (5)
1. method by liquid phase acetic acid and hydrogen mixed gas it is characterized in that with temperature being that 30-160 ℃ acetic acid is inputted evaporimeter from the bottom, and acetic acid is that continuous phase is distributed in the evaporimeter; Temperature is that the gas of 100-300 ℃ hydrogen passes through acetate layer in the mode of bubbling, with the acetic acid contact process in, externally under the effect of thermal source, by control evaporimeter top mist temperature, the mol ratio that obtains H2/ acetic acid is that 1-250 pressure is the mist of 1.0-20.0MPa; The gas-operated pressure of acetic acid and hydrogen is 1.0-20.0MPa before mixing; Be lower than acetic acid boiling temperature under the operating pressure in evaporimeter top mist temperature under this operating pressure.
2. the method by liquid phase acetic acid and hydrogen mixed gas according to claim 1, wherein any replacement of the oxygen of the hydrogen described in the gas of hydrogen, ethylene gas, acetylene gas; Acetic acid adopts any replacement of acetaldehyde, propionic aldehyde, propionic acid.
3. the method by liquid phase acetic acid and hydrogen mixed gas according to claim 1, hydrogen content is at 0-100% and greater than 0 in the gas of the hydrogen that wherein adopts.
4. the method by liquid phase acetic acid and hydrogen mixed gas according to claim 1, the gas of wherein said hydrogen is decentralized photo in evaporimeter.
5. the method by liquid phase acetic acid and hydrogen mixed gas according to claim 1, the material of wherein said evaporimeter is corrosion resisting alloy.
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| CN201210433499.6A CN102908958B (en) | 2012-11-02 | 2012-11-02 | A kind of method by liquid-phase acetic acid and hydrogen mixed gas |
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| CN201210433499.6A CN102908958B (en) | 2012-11-02 | 2012-11-02 | A kind of method by liquid-phase acetic acid and hydrogen mixed gas |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4517391A (en) * | 1982-06-04 | 1985-05-14 | Basf Aktiengesellschaft | Continuous preparation of ethanol |
| US4990655A (en) * | 1985-04-13 | 1991-02-05 | Bp Chemicals Limited | Alcohols production by hydrogenation of carboxylic acids |
| CN102421732A (en) * | 2010-02-02 | 2012-04-18 | 国际人造丝公司 | Process for vaporizing acetic acid for hydrogenation processes to produce ethanol |
-
2012
- 2012-11-02 CN CN201210433499.6A patent/CN102908958B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4517391A (en) * | 1982-06-04 | 1985-05-14 | Basf Aktiengesellschaft | Continuous preparation of ethanol |
| US4990655A (en) * | 1985-04-13 | 1991-02-05 | Bp Chemicals Limited | Alcohols production by hydrogenation of carboxylic acids |
| CN102421732A (en) * | 2010-02-02 | 2012-04-18 | 国际人造丝公司 | Process for vaporizing acetic acid for hydrogenation processes to produce ethanol |
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| CN102908958B (en) | 2015-10-28 |
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Inventor after: Song Qinhua Inventor after: Peng Jie Inventor after: Tang Li Inventor after: Yu Qingsheng Inventor after: Sun Rongyi Inventor after: Xia Wu Inventor after: Shao Shouyan Inventor after: Xiao Xiaoyu Inventor after: Ling Chen Inventor after: Wang Liushu Inventor after: Zhu Guisheng Inventor after: Yang Jun Inventor after: Zhu Huaisong Inventor before: Song Qinhua Inventor before: Peng Jie Inventor before: Tang Li Inventor before: Xia Wu Inventor before: Shao Shouyan Inventor before: Xiao Xiaoyu Inventor before: Ling Chen Inventor before: Wang Liushu Inventor before: Zhu Guisheng Inventor before: Yang Jun Inventor before: Zhu Huaisong |
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Free format text: CORRECT: INVENTOR; FROM: SONG QINHUA XIA WU SHAO SHOUYAN XIAO XIAOYU LING CHEN WANG LIUSHU ZHU GUISHENG YANG JUN ZHU HUAISONG PENG JIE TANG LI TO: SONG QINHUA XIA WU SHAO SHOUYAN XIAO XIAOYU LING CHEN WANG LIUSHU ZHU GUISHENG YANG JUN ZHU HUAISONG PENG JIE TANG LI YU QINGSHENG SUN RONGYI |
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Effective date of registration: 20200106 Address after: 212006 No. 88 Qiusuo Road, Jingkou District, Zhenjiang City, Jiangsu Province Co-patentee after: China Wuhuan Engineering Co., Ltd. Patentee after: Jiangsu Sopo Chemical Co.,Ltd. Address before: 212006 Long Gang, Dantu, Jiangsu, Zhenjiang Co-patentee before: China Wuhuan Engineering Co., Ltd. Patentee before: Jiangsu Soap (Group) Co., Ltd. |